KR20160127237A - 그래핀 제조방법 - Google Patents
그래핀 제조방법 Download PDFInfo
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- KR20160127237A KR20160127237A KR1020150057815A KR20150057815A KR20160127237A KR 20160127237 A KR20160127237 A KR 20160127237A KR 1020150057815 A KR1020150057815 A KR 1020150057815A KR 20150057815 A KR20150057815 A KR 20150057815A KR 20160127237 A KR20160127237 A KR 20160127237A
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- graphite
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- acid
- graphene
- sulfuric acid
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 140
- 229910021389 graphene Inorganic materials 0.000 title claims abstract description 60
- 238000000034 method Methods 0.000 title claims abstract description 43
- 238000004519 manufacturing process Methods 0.000 title abstract description 35
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 103
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 69
- 239000010439 graphite Substances 0.000 claims abstract description 69
- 239000012286 potassium permanganate Substances 0.000 claims abstract description 36
- 239000002002 slurry Substances 0.000 claims abstract description 31
- 239000002253 acid Substances 0.000 claims abstract description 21
- 239000007864 aqueous solution Substances 0.000 claims abstract description 19
- 238000003756 stirring Methods 0.000 claims abstract description 10
- 239000000203 mixture Substances 0.000 claims abstract description 5
- 239000000243 solution Substances 0.000 claims description 27
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 14
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 14
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 13
- 239000003638 chemical reducing agent Substances 0.000 claims description 9
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 claims description 8
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 7
- 229910017604 nitric acid Inorganic materials 0.000 claims description 7
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 claims description 6
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 6
- 239000000654 additive Substances 0.000 claims description 5
- 230000000996 additive effect Effects 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 4
- 235000010344 sodium nitrate Nutrition 0.000 claims description 4
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 claims description 3
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 claims description 3
- 235000010323 ascorbic acid Nutrition 0.000 claims description 3
- 229960005070 ascorbic acid Drugs 0.000 claims description 3
- 239000011668 ascorbic acid Substances 0.000 claims description 3
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 claims description 3
- 239000008103 glucose Substances 0.000 claims description 3
- 239000012279 sodium borohydride Substances 0.000 claims description 3
- 229910000033 sodium borohydride Inorganic materials 0.000 claims description 3
- 229910000104 sodium hydride Inorganic materials 0.000 claims description 3
- 239000012312 sodium hydride Substances 0.000 claims description 3
- 239000004317 sodium nitrate Substances 0.000 claims description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 2
- 235000011007 phosphoric acid Nutrition 0.000 claims 3
- 235000011149 sulphuric acid Nutrition 0.000 claims 1
- 238000004880 explosion Methods 0.000 abstract description 16
- 230000008569 process Effects 0.000 abstract description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 11
- 238000006243 chemical reaction Methods 0.000 abstract description 9
- 239000011229 interlayer Substances 0.000 abstract description 7
- 230000003647 oxidation Effects 0.000 abstract description 3
- 238000007254 oxidation reaction Methods 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 7
- 238000006722 reduction reaction Methods 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 230000009467 reduction Effects 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000004148 unit process Methods 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
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- 238000010298 pulverizing process Methods 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000000432 density-gradient centrifugation Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
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- 239000006185 dispersion Substances 0.000 description 1
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- 238000005516 engineering process Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000007726 management method Methods 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
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- 239000007800 oxidant agent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 230000001699 photocatalysis Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
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- 238000009832 plasma treatment Methods 0.000 description 1
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- 239000002904 solvent Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000002525 ultrasonication Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C01B31/0446—
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- C01B31/0469—
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
Abstract
본 발명에 따르면 흑연의 산화를 통한 그래핀의 층간간격을 증가시키고 산소 관능기를 삽입하기 위한 과정에서 투입되는 황산의 양을 최소화하고 이에 따라 황산(H2SO4) 및 과망간산칼륨(KMnO4)의 반응을 최소화 시킴으로써 폭발의 위험성을 최소화시킬 수 있다.
Description
도 2는 다른 실시예에 따른 그래핀 제조방법을 나타내는 순서도이다.
Claims (13)
- 흑연에 강산을 흡수시켜 슬러리를 형성하는 제1단계;
과망간산칼륨(KMnO4) 수용액을 상기 슬러리에 투입하여 교반하는 제2단계;
상기 슬러리를 박리시키는 제3단계; 및
상기 슬러리를 환원시키는 제4단계;를 포함하는 그래핀 제조방법. - 제1항에 있어서,
상기 흑연에 흡수되는 강산 용액은 황산(H2SO4), 인산(H3PO4), 질산(HNO3) 및 염산(HCl) 중 적어도 어느 하나를 포함하는 그래핀(graphene) 제조방법. - 제1항에 있어서,
상기 제2단계에서 상기 과망간산칼륨(KMnO4) 수용액은 질산나트륨(NaNO3)을 더 포함하는 그래핀 제조방법. - 제1항에 있어서,
상기 제1단계에서 상기 흑연은 분말 타입으로 제공되는 그래핀 제조방법. - 제1항에 있어서,
상기 제1단계에서 상기 강산은 투입 중량에 대한 상기 흑연에 흡수되지 않은 중량의 비율이 5% 이내가 되도록 투입되어 산화흑연 슬러리를 형성하는 그래핀 제조방법. - 제5항에 있어서,
상기 강산은 시간적 간격을 두고 2회 이상 점층적으로 투입되는 그래핀 제조방법. - 제5항에 있어서,
상기 제1단계는,
상기 강산이 상기 흑연의 중량 대비 미리 설정된 양만큼 투입되는 제1a단계; 및
상기 강산이 투입된 흑연을 교반하는 제1b단계;를 포함하는 그래핀 제조방법. - 제5항에 있어서,
상기 강산은 대기압을 초과하는 압력의 환경에서 투입되는 그래핀 제조방법. - 제1항에 있어서,
상기 제3단계는 초음파의 조사를 통하여 수행되는 그래핀 제조방법. - 제1항에 있어서,
상기 제2단계에서의 교반 및 상기 제3단계에서의 박리는 고압 호모게나이져를 이용하여 하나의 단계로서 수행되는 그래핀 제조방법. - 제1항에 있어서,
상기 제4단계는 하이드리진(hydrazine), 나트륨 하이드라이드, 하이드로퀴논(hydroquinone), 나트륨 보로하이드라이드(sodium borohydride), 아스코빅산(ascorbic acid) 및 글루코스(glucose) 중 적어도 어느 하나의 환원제의 투입에 의하여 수행되는 그래핀 제조방법. - 제1항에 있어서,
상기 2단계 이후 상기 슬러리를 과산화수소(H2O2)처리하는 단계를 더 포함하는 그래핀 제조방법. - 제1항에 있어서,
상기 제2단계에서 과망간산칼륨(KMnO4) 수용액에는 황산(H2SO4), 인산(H3PO4), 질산(HNO3) 및 염산(HCl) 중 적어도 어느 하나를 첨가제로서 포함하는 그래핀 제조방법.
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107200320A (zh) * | 2017-07-21 | 2017-09-26 | 长沙紫宸科技开发有限公司 | 一种用电解铝废阴极炭制备膨胀石墨或石墨烯的方法 |
KR20180089770A (ko) | 2017-02-01 | 2018-08-09 | 한국과학기술원 | 그래핀 및 이의 제조방법 |
KR20190083547A (ko) * | 2018-01-04 | 2019-07-12 | 한국전기연구원 | 반죽을 이용한 산화흑연 제조방법 및 반죽을 이용해 제조된 산화흑연 |
WO2022180564A1 (en) | 2021-02-25 | 2022-09-01 | Politechnika Warszawska | A method for producing flaked graphene by intercalation and exfoliation of graphite |
CN115057435A (zh) * | 2022-08-03 | 2022-09-16 | 山东海科创新研究院有限公司 | 一种循环利用浓硫酸制备氧化石墨烯的方法及其所得产品的应用 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100254483B1 (ko) * | 1998-01-13 | 2000-05-01 | 황해웅 | 팽창흑연 제조방법 |
KR101109961B1 (ko) * | 2010-11-29 | 2012-02-15 | 주식회사 오리엔트정공 | 그래핀 제조방법 |
JP5357323B1 (ja) * | 2012-12-27 | 2013-12-04 | 株式会社Micc Tec | 酸化グラフェンの製造方法 |
KR101337970B1 (ko) * | 2009-08-10 | 2013-12-06 | 주식회사 아이디티인터내셔널 | 나노 크기의 그래핀 구조 물질의 제조방법 및 그 제조장치 |
KR20140082595A (ko) * | 2011-05-06 | 2014-07-02 | 더 리서치 파운데이션 포 더 스테이트 유니버시티 오브 뉴욕 | 자기 그래핀-유사 나노입자 또는 흑연 나노- 또는 마이크로입자 및 이의 생성 방법 및 용도 |
-
2015
- 2015-04-24 KR KR1020150057815A patent/KR102313691B1/ko active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100254483B1 (ko) * | 1998-01-13 | 2000-05-01 | 황해웅 | 팽창흑연 제조방법 |
KR101337970B1 (ko) * | 2009-08-10 | 2013-12-06 | 주식회사 아이디티인터내셔널 | 나노 크기의 그래핀 구조 물질의 제조방법 및 그 제조장치 |
KR101109961B1 (ko) * | 2010-11-29 | 2012-02-15 | 주식회사 오리엔트정공 | 그래핀 제조방법 |
KR20140082595A (ko) * | 2011-05-06 | 2014-07-02 | 더 리서치 파운데이션 포 더 스테이트 유니버시티 오브 뉴욕 | 자기 그래핀-유사 나노입자 또는 흑연 나노- 또는 마이크로입자 및 이의 생성 방법 및 용도 |
JP5357323B1 (ja) * | 2012-12-27 | 2013-12-04 | 株式会社Micc Tec | 酸化グラフェンの製造方法 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180089770A (ko) | 2017-02-01 | 2018-08-09 | 한국과학기술원 | 그래핀 및 이의 제조방법 |
CN107200320A (zh) * | 2017-07-21 | 2017-09-26 | 长沙紫宸科技开发有限公司 | 一种用电解铝废阴极炭制备膨胀石墨或石墨烯的方法 |
KR20190083547A (ko) * | 2018-01-04 | 2019-07-12 | 한국전기연구원 | 반죽을 이용한 산화흑연 제조방법 및 반죽을 이용해 제조된 산화흑연 |
WO2022180564A1 (en) | 2021-02-25 | 2022-09-01 | Politechnika Warszawska | A method for producing flaked graphene by intercalation and exfoliation of graphite |
CN115057435A (zh) * | 2022-08-03 | 2022-09-16 | 山东海科创新研究院有限公司 | 一种循环利用浓硫酸制备氧化石墨烯的方法及其所得产品的应用 |
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