KR20140112020A - 하이테크놀러지 제조 및 조립 공정을 위한 클린스페이스 제조기 - Google Patents

하이테크놀러지 제조 및 조립 공정을 위한 클린스페이스 제조기 Download PDF

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Publication number
KR20140112020A
KR20140112020A KR1020147019197A KR20147019197A KR20140112020A KR 20140112020 A KR20140112020 A KR 20140112020A KR 1020147019197 A KR1020147019197 A KR 1020147019197A KR 20147019197 A KR20147019197 A KR 20147019197A KR 20140112020 A KR20140112020 A KR 20140112020A
Authority
KR
South Korea
Prior art keywords
substrate
tool
clean space
carrier
processing tools
Prior art date
Application number
KR1020147019197A
Other languages
English (en)
Korean (ko)
Inventor
프레데릭 에이. 플릿취
Original Assignee
퍼트팹, 아이엔씨.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 퍼트팹, 아이엔씨. filed Critical 퍼트팹, 아이엔씨.
Publication of KR20140112020A publication Critical patent/KR20140112020A/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67178—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers vertical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020147019197A 2012-01-11 2013-01-09 하이테크놀러지 제조 및 조립 공정을 위한 클린스페이스 제조기 KR20140112020A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261585368P 2012-01-11 2012-01-11
US61/585,368 2012-01-11
PCT/US2013/020904 WO2013106486A1 (en) 2012-01-11 2013-01-09 Cleanspace fabricators for high technology manufacturing and assembly processing

Publications (1)

Publication Number Publication Date
KR20140112020A true KR20140112020A (ko) 2014-09-22

Family

ID=48781878

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147019197A KR20140112020A (ko) 2012-01-11 2013-01-09 하이테크놀러지 제조 및 조립 공정을 위한 클린스페이스 제조기

Country Status (6)

Country Link
KR (1) KR20140112020A (zh)
CN (1) CN104081497B (zh)
IL (1) IL233403A0 (zh)
SG (2) SG11201403183XA (zh)
TW (1) TWI608980B (zh)
WO (1) WO2013106486A1 (zh)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9059227B2 (en) * 2005-06-18 2015-06-16 Futrfab, Inc. Methods and apparatus for vertically orienting substrate processing tools in a clean space
US7513822B2 (en) * 2005-06-18 2009-04-07 Flitsch Frederick A Method and apparatus for a cleanspace fabricator
US9339900B2 (en) * 2005-08-18 2016-05-17 Futrfab, Inc. Apparatus to support a cleanspace fabricator
US9457442B2 (en) * 2005-06-18 2016-10-04 Futrfab, Inc. Method and apparatus to support process tool modules in a cleanspace fabricator
US7467024B2 (en) * 2005-08-26 2008-12-16 Flitsch Frederick A Method and apparatus for an elevator system for a multilevel cleanspace fabricator
CN102986016B (zh) * 2005-09-18 2015-11-25 弗雷德里克·A·弗里奇 用于在洁净空间中垂直定位基片处理设备的方法和装置
US20110245964A1 (en) * 2010-04-06 2011-10-06 Sullivan Robert P Self Aligning Automated Material Handling System

Also Published As

Publication number Publication date
SG11201403183XA (en) 2014-09-26
CN104081497A (zh) 2014-10-01
WO2013106486A1 (en) 2013-07-18
TW201339074A (zh) 2013-10-01
SG10201608779VA (en) 2016-12-29
IL233403A0 (en) 2014-08-31
TWI608980B (zh) 2017-12-21
CN104081497B (zh) 2017-02-22

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