KR20140049933A - 경화성 조성물, 경화막 및 표시 소자 - Google Patents

경화성 조성물, 경화막 및 표시 소자 Download PDF

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Publication number
KR20140049933A
KR20140049933A KR1020130121714A KR20130121714A KR20140049933A KR 20140049933 A KR20140049933 A KR 20140049933A KR 1020130121714 A KR1020130121714 A KR 1020130121714A KR 20130121714 A KR20130121714 A KR 20130121714A KR 20140049933 A KR20140049933 A KR 20140049933A
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KR
South Korea
Prior art keywords
group
meth
curable composition
mass
acrylate
Prior art date
Application number
KR1020130121714A
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English (en)
Korean (ko)
Inventor
히로유키 고마츠
가즈히로 고바야시
교이치로 류
마사츠구 아야베
Original Assignee
제이에스알 가부시끼가이샤
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Filing date
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Application filed by 제이에스알 가부시끼가이샤 filed Critical 제이에스알 가부시끼가이샤
Publication of KR20140049933A publication Critical patent/KR20140049933A/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
KR1020130121714A 2012-10-18 2013-10-14 경화성 조성물, 경화막 및 표시 소자 KR20140049933A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2012-231096 2012-10-18
JP2012231096 2012-10-18

Publications (1)

Publication Number Publication Date
KR20140049933A true KR20140049933A (ko) 2014-04-28

Family

ID=50569875

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130121714A KR20140049933A (ko) 2012-10-18 2013-10-14 경화성 조성물, 경화막 및 표시 소자

Country Status (4)

Country Link
JP (1) JP6183044B2 (ja)
KR (1) KR20140049933A (ja)
CN (1) CN103777464B (ja)
TW (1) TWI592441B (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI675907B (zh) 2015-01-21 2019-11-01 日商Ｊｓｒ股份有限公司 固體攝像裝置
JP2017073338A (ja) * 2015-10-09 2017-04-13 東京エレクトロン株式会社 検査装置、減圧乾燥装置および減圧乾燥装置の制御方法
JP2017116659A (ja) * 2015-12-22 2017-06-29 三菱ケミカル株式会社 保護膜用硬化性組成物、保護膜、ｔｆｔアクティブマトリックス基板、及び画像表示装置
JP2017129674A (ja) * 2016-01-19 2017-07-27 凸版印刷株式会社 緑色感光性着色組成物、それを用いたカラーフィルタ及びカラー表示装置
JP7185415B2 (ja) * 2018-03-30 2022-12-07 株式会社日本触媒 新規重合体、硬化性樹脂組成物、及びその用途
KR20210098943A (ko) * 2018-11-28 2021-08-11 세키스이가가쿠 고교가부시키가이샤 경화성 수지 조성물, 경화물, 및, 유기 el 표시 소자

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3329877B2 (ja) * 1993-03-02 2002-09-30 互応化学工業株式会社 プリント回路基板製造用レジストインク組成物、それを用いたレジスト膜及びプリント回路基板
JP2008088394A (ja) * 2006-09-07 2008-04-17 Showa Highpolymer Co Ltd アルカリ現像可能な感光性樹脂及びそれを含む感光性樹脂組成物
JP5504738B2 (ja) * 2009-08-05 2014-05-28 東洋インキＳｃホールディングス株式会社 感光性組成物
JP2012031447A (ja) * 2010-07-29 2012-02-16 Fujifilm Corp 被めっき層形成用組成物、表面金属膜材料およびその製造方法、並びに、金属パターン材料およびその製造方法
JP2012229304A (ja) * 2011-04-25 2012-11-22 Nippon Shokubai Co Ltd 側鎖ラジカル重合性基含有重合体、製造方法、及び感光性樹脂組成物

Also Published As

Publication number Publication date
CN103777464B (zh) 2019-11-08
JP6183044B2 (ja) 2017-08-23
TWI592441B (zh) 2017-07-21
TW201431942A (zh) 2014-08-16
CN103777464A (zh) 2014-05-07
JP2014098140A (ja) 2014-05-29

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