KR20130128370A - 음극-방식 패드 컨디셔너 및 사용 방법 - Google Patents

음극-방식 패드 컨디셔너 및 사용 방법 Download PDF

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Publication number
KR20130128370A
KR20130128370A KR1020137003514A KR20137003514A KR20130128370A KR 20130128370 A KR20130128370 A KR 20130128370A KR 1020137003514 A KR1020137003514 A KR 1020137003514A KR 20137003514 A KR20137003514 A KR 20137003514A KR 20130128370 A KR20130128370 A KR 20130128370A
Authority
KR
South Korea
Prior art keywords
pad conditioner
abrasive
metallic substrate
anode
cathodic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020137003514A
Other languages
English (en)
Korean (ko)
Inventor
빈센트 제이 라라이아
분 키아트 림
Original Assignee
쓰리엠 이노베이티브 프로퍼티즈 컴파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쓰리엠 이노베이티브 프로퍼티즈 컴파니 filed Critical 쓰리엠 이노베이티브 프로퍼티즈 컴파니
Publication of KR20130128370A publication Critical patent/KR20130128370A/ko
Ceased legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/001—Devices or means for dressing or conditioning abrasive surfaces involving the use of electric current
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Prevention Of Electric Corrosion (AREA)
KR1020137003514A 2010-07-15 2011-06-24 음극-방식 패드 컨디셔너 및 사용 방법 Ceased KR20130128370A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/837,055 US8496511B2 (en) 2010-07-15 2010-07-15 Cathodically-protected pad conditioner and method of use
US12/837,055 2010-07-15
PCT/US2011/041843 WO2012009139A1 (en) 2010-07-15 2011-06-24 Cathodically-protected pad conditioner and method of use

Publications (1)

Publication Number Publication Date
KR20130128370A true KR20130128370A (ko) 2013-11-26

Family

ID=44628604

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137003514A Ceased KR20130128370A (ko) 2010-07-15 2011-06-24 음극-방식 패드 컨디셔너 및 사용 방법

Country Status (7)

Country Link
US (1) US8496511B2 (enExample)
JP (1) JP5972264B2 (enExample)
KR (1) KR20130128370A (enExample)
CN (1) CN103003026B (enExample)
SG (1) SG187009A1 (enExample)
TW (1) TWI531444B (enExample)
WO (1) WO2012009139A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9550247B2 (en) * 2013-07-18 2017-01-24 Aps Materials, Inc. Double coupon reference cell and methods of making same
JP7232763B2 (ja) * 2016-12-21 2023-03-03 スリーエム イノベイティブ プロパティズ カンパニー スペーサ及びウェハ平坦化システムを有するパッドコンディショナ
EP3691830A4 (en) * 2017-10-04 2021-11-17 Saint-Gobain Abrasives, Inc. ABRASIVE ARTICLE AND ITS FORMATION PROCESS
US11490664B2 (en) * 2018-02-23 2022-11-08 Linderton Holdings, Inc. Supporting garments and sizing systems
EP3948702A4 (en) 2019-03-29 2023-07-26 Saint-Gobain Abrasives, Inc. POWER LOOP SOLUTIONS
WO2020206382A1 (en) 2019-04-03 2020-10-08 Saint-Gobain Abrasives, Inc. Abrasive article, abrasive system and method for using and forming same

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2817634A (en) 1953-09-22 1957-12-24 Texas Co Device for preventing corrosion
US3022234A (en) 1958-06-30 1962-02-20 Engelhard Ind Inc Cathodic protection of ships
US5352342A (en) 1993-03-19 1994-10-04 William J. Riffe Method and apparatus for preventing corrosion of metal structures
ZA9410384B (en) 1994-04-08 1996-02-01 Ultimate Abrasive Syst Inc Method for making powder preform and abrasive articles made therefrom
US6123612A (en) 1998-04-15 2000-09-26 3M Innovative Properties Company Corrosion resistant abrasive article and method of making
US6176992B1 (en) * 1998-11-03 2001-01-23 Nutool, Inc. Method and apparatus for electro-chemical mechanical deposition
US6203413B1 (en) 1999-01-13 2001-03-20 Micron Technology, Inc. Apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies
JP3665523B2 (ja) * 1999-12-28 2005-06-29 株式会社東芝 ドレッシング方法
US6264536B1 (en) * 2000-02-01 2001-07-24 Lucent Technologies Inc. Reducing polish platen corrosion during integrated circuit fabrication
US6811680B2 (en) * 2001-03-14 2004-11-02 Applied Materials Inc. Planarization of substrates using electrochemical mechanical polishing
EP1446514A4 (en) * 2001-11-13 2007-11-28 Acm Res Inc ELECTROPOLIER ASSEMBLY AND METHOD FOR ELECTROPOLISHING CONDUCTIVE LAYERS
US7276454B2 (en) 2002-11-02 2007-10-02 Taiwan Semiconductor Manufacturing Co., Ltd. Application of impressed-current cathodic protection to prevent metal corrosion and oxidation
CA2434986A1 (en) 2003-07-11 2005-01-11 G.I. Russell & Company Ltd. Method and apparatus for instrumental analysis in remote locations
US7125324B2 (en) 2004-03-09 2006-10-24 3M Innovative Properties Company Insulated pad conditioner and method of using same
CN1562566A (zh) * 2004-04-06 2005-01-12 北京工业大学 金属结合剂砂轮在线电解磨削修整法及其装置
US7608173B2 (en) 2004-12-02 2009-10-27 Applied Materials, Inc. Biased retaining ring
JP2007537052A (ja) 2004-05-13 2007-12-20 アプライド　マテリアルズ　インコーポレイテッド 導電部を備えた保持リング
JP2008192749A (ja) * 2007-02-02 2008-08-21 Matsushita Electric Ind Co Ltd 研磨装置および研磨方法

Also Published As

Publication number Publication date
CN103003026A (zh) 2013-03-27
US20120015589A1 (en) 2012-01-19
WO2012009139A1 (en) 2012-01-19
TWI531444B (zh) 2016-05-01
US8496511B2 (en) 2013-07-30
JP5972264B2 (ja) 2016-08-17
SG187009A1 (en) 2013-02-28
CN103003026B (zh) 2016-01-20
JP2013534734A (ja) 2013-09-05
TW201206628A (en) 2012-02-16

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