KR20130095724A - Aqueous processing solution for fixed abrasive grain wire saw - Google Patents

Aqueous processing solution for fixed abrasive grain wire saw Download PDF

Info

Publication number
KR20130095724A
KR20130095724A KR1020137001523A KR20137001523A KR20130095724A KR 20130095724 A KR20130095724 A KR 20130095724A KR 1020137001523 A KR1020137001523 A KR 1020137001523A KR 20137001523 A KR20137001523 A KR 20137001523A KR 20130095724 A KR20130095724 A KR 20130095724A
Authority
KR
South Korea
Prior art keywords
water
mass
fixed abrasive
soluble
processing liquid
Prior art date
Application number
KR1020137001523A
Other languages
Korean (ko)
Other versions
KR101788901B1 (en
Inventor
나오키 마루오
야스노리 누마타
히로아키 다카하시
Original Assignee
유시로 가가쿠 고교(주)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 유시로 가가쿠 고교(주) filed Critical 유시로 가가쿠 고교(주)
Publication of KR20130095724A publication Critical patent/KR20130095724A/en
Application granted granted Critical
Publication of KR101788901B1 publication Critical patent/KR101788901B1/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0076Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M173/00Lubricating compositions containing more than 10% water
    • C10M173/02Lubricating compositions containing more than 10% water not containing mineral or fatty oils
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2201/00Inorganic compounds or elements as ingredients in lubricant compositions
    • C10M2201/06Metal compounds
    • C10M2201/062Oxides; Hydroxides; Carbonates or bicarbonates
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2207/00Organic non-macromolecular hydrocarbon compounds containing hydrogen, carbon and oxygen as ingredients in lubricant compositions
    • C10M2207/02Hydroxy compounds
    • C10M2207/021Hydroxy compounds having hydroxy groups bound to acyclic or cycloaliphatic carbon atoms
    • C10M2207/022Hydroxy compounds having hydroxy groups bound to acyclic or cycloaliphatic carbon atoms containing at least two hydroxy groups
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2207/00Organic non-macromolecular hydrocarbon compounds containing hydrogen, carbon and oxygen as ingredients in lubricant compositions
    • C10M2207/04Ethers; Acetals; Ortho-esters; Ortho-carbonates
    • C10M2207/046Hydroxy ethers
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2207/00Organic non-macromolecular hydrocarbon compounds containing hydrogen, carbon and oxygen as ingredients in lubricant compositions
    • C10M2207/10Carboxylix acids; Neutral salts thereof
    • C10M2207/12Carboxylix acids; Neutral salts thereof having carboxyl groups bound to acyclic or cycloaliphatic carbon atoms
    • C10M2207/121Carboxylix acids; Neutral salts thereof having carboxyl groups bound to acyclic or cycloaliphatic carbon atoms having hydrocarbon chains of seven or less carbon atoms
    • C10M2207/124Carboxylix acids; Neutral salts thereof having carboxyl groups bound to acyclic or cycloaliphatic carbon atoms having hydrocarbon chains of seven or less carbon atoms containing hydroxy groups; Ethers thereof
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2207/00Organic non-macromolecular hydrocarbon compounds containing hydrogen, carbon and oxygen as ingredients in lubricant compositions
    • C10M2207/10Carboxylix acids; Neutral salts thereof
    • C10M2207/12Carboxylix acids; Neutral salts thereof having carboxyl groups bound to acyclic or cycloaliphatic carbon atoms
    • C10M2207/125Carboxylix acids; Neutral salts thereof having carboxyl groups bound to acyclic or cycloaliphatic carbon atoms having hydrocarbon chains of eight up to twenty-nine carbon atoms, i.e. fatty acids
    • C10M2207/127Carboxylix acids; Neutral salts thereof having carboxyl groups bound to acyclic or cycloaliphatic carbon atoms having hydrocarbon chains of eight up to twenty-nine carbon atoms, i.e. fatty acids polycarboxylic
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2209/00Organic macromolecular compounds containing oxygen as ingredients in lubricant compositions
    • C10M2209/02Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C10M2209/06Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds containing monomers having an unsaturated radical bound to an acyloxy radical of saturated carboxylic or carbonic acid
    • C10M2209/062Vinyl esters of saturated carboxylic or carbonic acids, e.g. vinyl acetate
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2209/00Organic macromolecular compounds containing oxygen as ingredients in lubricant compositions
    • C10M2209/10Macromolecular compoundss obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • C10M2209/103Polyethers, i.e. containing di- or higher polyoxyalkylene groups
    • C10M2209/104Polyethers, i.e. containing di- or higher polyoxyalkylene groups of alkylene oxides containing two carbon atoms only
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2215/00Organic non-macromolecular compounds containing nitrogen as ingredients in lubricant compositions
    • C10M2215/02Amines, e.g. polyalkylene polyamines; Quaternary amines
    • C10M2215/04Amines, e.g. polyalkylene polyamines; Quaternary amines having amino groups bound to acyclic or cycloaliphatic carbon atoms
    • C10M2215/042Amines, e.g. polyalkylene polyamines; Quaternary amines having amino groups bound to acyclic or cycloaliphatic carbon atoms containing hydroxy groups; Alkoxylated derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2217/00Organic macromolecular compounds containing nitrogen as ingredients in lubricant compositions
    • C10M2217/02Macromolecular compounds obtained from nitrogen containing monomers by reactions only involving carbon-to-carbon unsaturated bonds
    • C10M2217/028Macromolecular compounds obtained from nitrogen containing monomers by reactions only involving carbon-to-carbon unsaturated bonds containing monomers having an unsaturated radical bound to a nitrogen-containing hetero ring
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2020/00Specified physical or chemical properties or characteristics, i.e. function, of component of lubricating compositions
    • C10N2020/01Physico-chemical properties
    • C10N2020/04Molecular weight; Molecular weight distribution
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2020/00Specified physical or chemical properties or characteristics, i.e. function, of component of lubricating compositions
    • C10N2020/01Physico-chemical properties
    • C10N2020/055Particles related characteristics
    • C10N2020/06Particles of special shape or size
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2030/00Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
    • C10N2030/02Pour-point; Viscosity index
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2030/00Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
    • C10N2030/04Detergent property or dispersant property
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2040/00Specified use or application for which the lubricating composition is intended
    • C10N2040/20Metal working
    • C10N2040/22Metal working with essential removal of material, e.g. cutting, grinding or drilling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Organic Chemistry (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Lubricants (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

본 발명의 (A) 폴리비닐피롤리돈, 및 비닐피롤리돈을 포함하는 공중합물로부터 선택되는 적어도 1종류 이상의 수용성 고분자, 및 (B) 물을 함유하는 고정 지립 와이어 소용 수용성 가공액에 따르면, 칩이 혼입된 가공액의 증점을 억제할 수 있고, 가공액과 칩과의 반응을 억제하여 수소의 발생을 억제할 수 있고, 칩이 혼입된 가공액의 증점ㆍ겔화를 억제할 수 있다.According to the water-soluble processing liquid for fixed abrasive wire containing at least 1 type or more water-soluble polymer chosen from the copolymer containing (A) polyvinylpyrrolidone, and vinylpyrrolidone of this invention, and (B) water, The thickening of the processing liquid into which the chip is mixed can be suppressed, the reaction between the processing liquid and the chip can be suppressed to suppress the generation of hydrogen, and the thickening and gelation of the processing liquid into which the chip is mixed can be suppressed.

Description

고정 지립 와이어 소용 수용성 가공액{AQUEOUS PROCESSING SOLUTION FOR FIXED ABRASIVE GRAIN WIRE SAW}Aqueous processing liquid for fixed abrasive wire use {AQUEOUS PROCESSING SOLUTION FOR FIXED ABRASIVE GRAIN WIRE SAW}

본 발명은, 고정 지립 와이어 소(wire saw)용 수용성 가공액에 관한 것이며, 상세하게는 실리콘 웨이퍼를 고정 지립 와이어 소에 의해 절단 가공할 때에 사용하는 고정 지립 와이어 소용 수용성 가공액에 관한 것이다.TECHNICAL FIELD This invention relates to the water-soluble process liquid for fixed abrasive wire saws, and relates to the water-soluble process liquid for fixed abrasive wire saws used when cut | disconnecting a silicon wafer with a fixed abrasive wire saw in detail.

실리콘 웨이퍼의 제조 비용 감소를 도모하기 위해, 실리콘 웨이퍼의 절단 가공 기술의 향상이 중요해지고 있다. 실리콘 웨이퍼의 가공에 있어서는 유리 지립 방식에서의 와이어 소에 의한 절단이 주류를 이루고 있지만, 상기 유리 지립 방식의 가공에 있어서 이하의 다양한 문제가 있다.In order to reduce the manufacturing cost of a silicon wafer, improvement of the cutting process technology of a silicon wafer becomes important. In the processing of a silicon wafer, although the cutting by the wire saw in a glass abrasive grain type | system | group is the mainstream, there exist the following various problems in the process of the said glass abrasive grain type | system | group.

(1) 가공액으로서, 오일제에 지립을 분산시킨 슬러리를 사용하기 때문에 유리 지립과 절단 부스러기와의 분리가 곤란하다. (2) 와이어 주행 속도에 제한이 있어 가공 능률 향상에 한계가 있다. (3) 절단 손실(kerf-loss)을 적게 하기 위해 와이어를 세선화한 경우에는, 가공 중에 단선이 일어나고, 수율이 저하된다. (4) 절단 손실을 적게 하기 위해 지립을 미립화한 경우에는, 슬러리 점도가 상승하고, 절단 손실을 많게 한다는 등 역효과의 문제가 지적되어 있다.(1) As a processing liquid, since the slurry which disperse | distributed the abrasive grain to oil was used, it is difficult to isolate | separate a glass abrasive grain and cutting chips. (2) There is a limitation in improving the processing efficiency because there is a limitation in the wire traveling speed. (3) When the wire is thinned so as to reduce the kerf-loss, disconnection occurs during processing and the yield decreases. (4) In the case where the abrasive grains are atomized in order to reduce the cutting loss, problems of adverse effects have been pointed out such that the slurry viscosity increases and the cutting loss is increased.

이러한 문제에 대하여, 최근 피아노선 등의 와이어 표면에 전착이나 레진 본드 등에 의해 다이아몬드 지립을 고정한 고정 지립 와이어 소가 개발되어 있다(특허문헌 1). 고정 지립 와이어 소를 이용하여 취성 재료를 가공하는 경우, 윤활, 냉각, 발생하는 칩(cut debris; 절단 부스러기)의 분산을 목적으로서 가공액을 이용한다. 상기 가공액으로서는, 인화성의 문제 등도 함께 생각하면, 수용성 가공액을 이용하는 것이 바람직하다. 그러나, 피삭재가 실리콘인 경우, 일반재에 비해 칩과 가공액과의 반응성이 높고, 실리콘 부스러기(칩)가 가공액 중의 수분 또는 알칼리와 반응하여 수소를 발생시키고, 인화될 우려가 있다. 따라서, 실리콘과의 반응성을 억제시킨 가공액인 것이 바람직하다. 이러한 관점에서 특허문헌 2에 개시된 바와 같은 가공액이 제안되어 있다.In response to such a problem, a fixed abrasive wire saw in which diamond abrasive grains are fixed to electrode surfaces such as piano wires by electrodeposition, resin bond, or the like has been recently developed (Patent Document 1). When a brittle material is processed using a fixed abrasive wire saw, a processing liquid is used for the purpose of lubricating, cooling, and dispersing cut debris. As said processing liquid, when a flammability problem etc. are also considered, it is preferable to use a water-soluble processing liquid. However, when the workpiece is silicon, the reactivity between the chip and the processing liquid is higher than that of the general material, and the silicon chips (chip) may react with moisture or alkali in the processing liquid to generate hydrogen and ignite. Therefore, it is preferable that it is a process liquid which suppressed the reactivity with silicone. From this viewpoint, the process liquid as disclosed in patent document 2 is proposed.

일본 특허 출원 제2001-054850호Japanese Patent Application No. 2001-054850 일본 특허 출원 제2003-082334호Japanese Patent Application No. 2003-082334

그러나, 최근 가공 정밀도를 향상시킴으로써 칩이 미세해지고, 특허문헌 2에 개시된 바와 같은 가공액에서는 충분한 안정성이 얻어지지 않는다는 것을 알 수 있었다. 특히, 칩이 혼입된 가공액의 점도가 상승하여, 다양한 문제가 발생한다는 것을 알 수 있었다. 또한, 수분을 다량으로 함유하여, pH가 알칼리성인 가공액의 경우에는 수소가 발생한다는 문제 뿐만 아니라, 증점, 겔화가 발생한다는 문제가 있었다.However, it has been found that chips have become finer by improving processing accuracy in recent years, and sufficient stability cannot be obtained in the processing liquid as disclosed in Patent Document 2. In particular, it has been found that the viscosity of the processing liquid into which the chips are mixed increases, causing various problems. In addition, in the case of the processing liquid containing a large amount of water and having a pH of alkaline, not only the problem of generating hydrogen but also the problem of thickening and gelation occurred.

가공액의 증점, 겔화는, 하기의 문제를 발생한다.Thickening and gelation of the processing liquid cause the following problems.

(1) 와이어에 의해 반입되는 도입 유량이 변화되어, 두께 변동이 커진다(제품 품위의 열화).(1) The introduction flow volume carried in by a wire changes, and thickness fluctuation becomes large (deterioration of product quality).

(2) 와이어 슬립이 발생하고, 와이어가 단선된다(수율의 저하).(2) Wire slip occurs and the wire is disconnected (decrease in yield).

(3) 후속 공정에서의 세정이 어려워진다(웨이퍼간의 칩, 오일제의 제거가 어려움).(3) It becomes difficult to wash | clean in a subsequent process (it is difficult to remove the chip | tip and oil agent between wafers).

(4) 오일제의 수명이 짧고, 갱액량(更液量)이 증가한다(비용 증가).(4) The oil life is short, and the amount of fluid is increased (cost increases).

따라서, 본 발명에서는, 칩이 혼입된 가공액의 증점을 억제할 수 있고, 가공액과 칩과의 반응을 억제하여 수소의 발생을 억제할 수 있고, 나아가 가공액의 증점ㆍ겔화를 억제할 수 있는 고정 지립 와이어 소용 수용성 가공액을 제공하는 것을 과제로 한다.Therefore, in the present invention, the thickening of the processing liquid into which the chip is mixed can be suppressed, the reaction between the processing liquid and the chip can be suppressed to suppress the generation of hydrogen, and further the thickening and gelation of the processing liquid can be suppressed. It is a subject to provide the water-soluble processing liquid for fixed abrasive grain wire use.

이상의 문제를 해결하기 위해 본 발명자들은 예의 검토하여, 이하의 사항을 발견하였다.MEANS TO SOLVE THE PROBLEM In order to solve the above problem, the present inventors earnestly examined and found the following matter.

(1) Si 칩의 혼입에 의한 점도의 상승은 혼입되는 Si 칩이 미분이기 때문에, 또한, Si 칩의 분산성이 떨어지기 때문에 발생한다.(1) The increase in viscosity due to the mixing of Si chips occurs because the Si chips to be mixed are fine powders and the dispersibility of the Si chips is inferior.

(2) 상기 점도의 상승은 가공액에 소정의 수용성 고분자를 함유시키고, Si 칩의 분산성을 향상시킴으로써 해결할 수 있다.(2) The increase in viscosity can be solved by containing a predetermined water-soluble polymer in the processing liquid and improving the dispersibility of the Si chip.

(3) 가공액에 Si 칩이 포함되어 있는 경우, Si 칩과 가공액이 반응하여, 수소가 발생하는 경우가 있다.(3) When a Si chip is contained in a process liquid, Si chip and a process liquid may react, and hydrogen may generate | occur | produce.

(4) 수분을 다량으로 함유하는 가공액의 경우에는, Si 칩을 함유함으로써 증점, 겔화가 발생하는 경우가 있다.(4) In the case of a processing liquid containing a large amount of water, thickening and gelation may occur by containing Si chips.

(5) 상기 (3) 및 (4)의 문제는, 가공액에 소정의 수용성 고분자를 함유시킴으로써 해결할 수 있다.(5) The problems of (3) and (4) can be solved by containing a predetermined water-soluble polymer in the processing liquid.

본 발명자들은, 상기 문제에 대하여 예의 검토하여 이하의 발명을 완성시키기에 이르렀다.MEANS TO SOLVE THE PROBLEM The present inventors earnestly examined the said problem, and came to complete the following invention.

제1 본 발명은, (A) 폴리비닐피롤리돈, 및 비닐피롤리돈을 포함하는 공중합물로부터 선택되는 적어도 1종류 이상의 수용성 고분자, 및 (B) 물을 함유하는 고정 지립 와이어 소용 수용성 가공액(이하, 「본 발명의 가공액」이라 하는 경우가 있음)이다.1st this invention is water-soluble processing liquid for fixed abrasive wire containing at least 1 sort (s) or more water-soluble polymer chosen from the copolymer containing (A) polyvinylpyrrolidone and vinylpyrrolidone, and (B) water. (Hereinafter, it may be called "the processing liquid of this invention.").

본 발명의 가공액은, (A) 성분으로서 소정의 수용성 고분자를 함유함으로써, 가공액 중에 실리콘 분말을 함유하는 경우 실리콘 분말의 분산성을 향상시킬 수 있으며, 실리콘 분말을 함유하는 가공액의 점도 상승을 억제할 수 있다. 또한, 가공액과 실리콘 분말이 반응하여 수소가 발생하는 것을 억제함과 함께, 실리콘 분말을 함유하는 가공액의 증점, 겔화를 억제할 수 있다.When the processing liquid of the present invention contains a predetermined water-soluble polymer as the component (A), when the processing liquid contains silicon powder, the dispersibility of the silicon powder can be improved, and the viscosity of the processing liquid containing the silicon powder is increased. Can be suppressed. In addition, while the processing liquid and the silicon powder react with each other to suppress the generation of hydrogen, the thickening and gelation of the processing liquid containing the silicon powder can be suppressed.

제1 본 발명에 있어서, 상기 (A) 성분의 중량 평균 분자량은 2,000 내지 1,000,000인 것이 바람직하다.In 1st this invention, it is preferable that the weight average molecular weights of the said (A) component are 2,000-1,000,000.

제1 본 발명에 있어서, 상기 (A) 성분의 함유량은 고정 지립 와이어 소용 수용성 가공액 전체의 질량을 100 질량%로 하여, 0.02 질량% 이상 7 질량% 이하로 하는 것이 바람직하다.In 1st this invention, it is preferable to make content of the said (A) component into the mass of the whole water-soluble process liquid for fixed abrasive wires 100 mass%, and to set it as 0.02 mass% or more and 7 mass% or less.

제1 본 발명의 고정 지립 와이어 소용 수용성 가공액은, (C) 다가 카르복실산의 알칼리염을 더 함유하는 것이 바람직하다. 상기 (C) 성분의 함유량은, 고정 지립 와이어 소용 수용성 가공액 전체의 질량을 100 질량%로 하여, 0.01 질량% 이상 10 질량% 이하인 것이 바람직하다. 본 발명의 가공액은, (C) 성분으로서 다가 카르복실산의 알칼리염을 함유함으로써 분산성, 세정성, 내부식성을 부여하는 것이 용이해진다.It is preferable that the water-soluble process liquid for fixed abrasive wire strips of 1st this invention further contains the alkali salt of (C) polyhydric carboxylic acid. It is preferable that content of the said (C) component makes the mass of the whole water-soluble processing liquid for fixed abrasive wires small 100 mass%, and is 0.01 mass% or more and 10 mass% or less. The processing liquid of the present invention can easily impart dispersibility, detergency, and corrosion resistance by containing an alkali salt of a polyvalent carboxylic acid as the component (C).

제1 본 발명의 고정 지립 와이어 소용 수용성 가공액은, (D) 글리콜류, 글리콜에테르류, 및 폴리옥시알킬렌글리콜류로 이루어지는 군으로부터 선택되는 1종 이상을 더 함유하는 것이 바람직하다. 상기 (D) 성분의 함유량은, 고정 지립 와이어 소용 수용성 가공액 전체의 질량을 100 질량%로 하여, 0.1 질량% 이상 95 질량% 이하인 것이 바람직하다.It is preferable that the water-soluble process liquid for fixed abrasive wire use of 1st this invention further contains 1 or more types chosen from the group which consists of (D) glycols, glycol ethers, and polyoxyalkylene glycols. It is preferable that content of the said (D) component makes 0.1 mass% or more and 95 mass% or less the mass of the whole water-soluble processing liquid for fixed abrasive wires as 100 mass%.

제1 본 발명의 고정 지립 와이어 소용 수용성 가공액의 점도는, 25 ℃에서 50 mPaㆍs 이하인 것이 바람직하다. 가공액 자체의 점도가 높으면, 실리콘 분말을 함유하는 가공액의 점도는 더욱 높아진다. 따라서, 가공액 자체의 점도는 소정의 값 이하인 것이 바람직하다.It is preferable that the viscosity of the water-soluble process liquid for fixed abrasive wires of 1st this invention is 50 mPa * s or less at 25 degreeC. When the viscosity of the processing liquid itself is high, the viscosity of the processing liquid containing silicon powder becomes higher. Therefore, it is preferable that the viscosity of process liquid itself is below a predetermined value.

제1 본 발명의 고정 지립 와이어 소용 수용성 가공액에, 평균 입경 1.5 ㎛의 실리콘 분말을 10 질량% 첨가하여 교반하여 형성한 가공액(의사 사용액)의 점도는, 25 ℃에서 100 mPaㆍs 이하인 것이 바람직하다. 소정의 실리콘 분말을 함유하는 의사 사용액의 점도가 높으면, 상기 과제의 란에 기재한 여러 문제가 발생할 우려가 있다.The viscosity of the processing liquid (pseudo-use liquid) formed by adding 10 mass% of silicon powder having an average particle diameter of 1.5 µm to the water-soluble processing liquid for fixed abrasive wire for use according to the first aspect of the invention and stirring it is 100 mPa · s or less at 25 ° C. desirable. When the viscosity of the pseudo-use liquid containing a predetermined | prescribed silicone powder is high, there exists a possibility that the various problems described in the column of the said subject may arise.

본 발명의 고정 지립 와이어 소용 수용성 가공액에 따르면, 소정의 수용성 고분자를 함유하고 있기 때문에, 상기 가공액이 실리콘칩인 실리콘 분말을 함유하는 경우 상기 실리콘 분말을 가공액 중에 분산시킬 수 있다. 따라서, 실리콘 분말을 함유하는 가공액의 점도 상승을 억제할 수 있다. 또한, 본 발명의 가공액은, 소정의 수용성 고분자를 함유하고 있기 때문에 실리콘 분말과 가공액이 반응하여 수소를 발생하는 것을 억제할 수 있으며, 실리콘 분말을 함유하는 가공액의 증점, 겔화를 억제할 수 있다.According to the water-soluble processing liquid for fixed abrasive wire use of this invention, since it contains a predetermined water-soluble polymer, when the processing liquid contains the silicon powder which is a silicon chip, the said silicon powder can be disperse | distributed in a processing liquid. Therefore, the viscosity rise of the processing liquid containing a silicon powder can be suppressed. In addition, since the processing liquid of the present invention contains a predetermined water-soluble polymer, it is possible to suppress the reaction between the silicon powder and the processing liquid to generate hydrogen, and to suppress the thickening and gelation of the processing liquid containing the silicon powder. Can be.

<고정 지립 와이어 소용 수용성 가공액><Water-soluble processing liquid for fixed abrasive wire use>

본 발명의 고정 지립 와이어 소용 수용성 가공액은, (A) 폴리비닐피롤리돈, 및 비닐피롤리돈을 포함하는 공중합물로부터 선택되는 적어도 1종류 이상의 수용성 고분자, 및 (B) 물을 함유하고 있다.The water-soluble processing liquid for fixed abrasive wire strips of this invention contains at least 1 type or more water-soluble polymer chosen from the copolymer containing (A) polyvinylpyrrolidone, and vinylpyrrolidone, and (B) water. .

((A) 성분)(Component (A))

본 발명의 가공액은, (A) 성분으로서 폴리비닐피롤리돈, 및 비닐피롤리돈을 포함하는 공중합물로부터 선택되는 적어도 1종류 이상의 수용성 고분자를 함유하고 있다. 이 수용성 고분자를 가공액에 함유시킴으로써, 실리콘 분말을 함유하여 이루어지는 가공액 중에서 상기 실리콘 분말의 분산성을 향상시킬 수 있다. 그 때문에, 실리콘 분말을 함유하여 이루어지는 가공액의 점도의 상승을 억제할 수 있다. 또한, 실리콘 분말과 가공액과의 반응을 억제하여, 실리콘 분말을 함유하여 이루어지는 가공액에 있어서 수소가 발생하는 것을 억제할 수 있다. 또한, 실리콘 분말을 함유하여 이루어지는 가공액의 증점, 겔화를 억제할 수 있다.The processing liquid of the present invention contains at least one or more water-soluble polymers selected from copolymers containing polyvinylpyrrolidone and vinylpyrrolidone as the component (A). By containing this water-soluble polymer in a processing liquid, the dispersibility of the said silicon powder can be improved in the processing liquid containing a silicon powder. Therefore, the raise of the viscosity of the processing liquid containing a silicon powder can be suppressed. Moreover, reaction of a silicon powder and a processing liquid can be suppressed, and generation | occurrence | production of hydrogen in the processing liquid containing a silicon powder can be suppressed. Moreover, the thickening and gelatinization of the processing liquid containing a silicon powder can be suppressed.

겔 투과 크로마토그래피/다각도 레이저 광 산란 검출기법에 의한 (A) 성분의 수용성 고분자의 중량 평균 분자량은 하한이 바람직하게는 2,000 이상, 보다 바람직하게는 8,000 이상이고, 상한이 바람직하게는 1,000,000 이하, 보다 바람직하게는 700,000 이하, 더욱 바람직하게는 500,000 이하이다. 상기 범위를 벗어나 분자량이 지나치게 작으면, (A) 성분을 넣는 효과가 발현되지 않게 될 우려가 있고, 반대로 분자량이 지나치게 크면 응집이나 가공액의 점도가 지나치게 높아질 우려가 있다.The weight average molecular weight of the water-soluble polymer of the component (A) by gel permeation chromatography / multi-angle laser light scattering detector method is preferably at least 2,000, more preferably at least 8,000, and preferably at most 1,000,000, Preferably it is 700,000 or less, More preferably, it is 500,000 or less. If the molecular weight is too small out of the above range, the effect of adding the component (A) may not be expressed. On the contrary, if the molecular weight is too large, the aggregation or the viscosity of the processing liquid may be too high.

(A) 성분의 함유량은, 고정 지립 와이어 소용 수용성 가공액 전체의 질량을 기준(100 질량%)으로 하여, 하한이 바람직하게는 0.02 질량% 이상, 보다 바람직하게는 0.05 질량% 이상, 더욱 바람직하게는 0.2 질량% 이상이고, 상한이 바람직하게는 7 질량% 이하, 보다 바람직하게는 5 질량% 이하, 더욱 바람직하게는 3 질량% 이하이다. 상기 범위를 벗어나 (A) 성분의 함유량이 지나치게 적으면 증점의 억제 효과, 수소 발생 억제 효과가 불충분해질 우려가 있고, 반대로 지나치게 많으면 가공액의 점도가 높아질 우려가 있다.As for content of (A) component, the lower limit becomes like this. Preferably it is 0.02 mass% or more, More preferably, 0.05 mass% or more, More preferably, the mass of the whole water-soluble processing liquid for fixed abrasive wires is a reference | standard (100 mass%). Is 0.2 mass% or more, and an upper limit becomes like this. Preferably it is 7 mass% or less, More preferably, it is 5 mass% or less, More preferably, it is 3 mass% or less. If the content of the component (A) is too small outside the above range, the effect of inhibiting thickening and the effect of inhibiting hydrogen generation may become insufficient. On the contrary, when too large, the viscosity of the processing liquid may increase.

(A) 성분의 수용성 고분자는, 폴리비닐피롤리돈, 또는 비닐피롤리돈을 포함하는 공중합체이며, 이들은 2종 이상을 혼합하여 사용할 수도 있다. 비닐피롤리돈을 포함하는 공중합체는, 비닐피롤리돈 단위의 비율이 공중합체 전체를 기준으로 하여 바람직하게는 60 몰% 이상이다. 비닐피롤리돈과 공중합시키는 단량체로서는, 아세트산비닐을 들 수 있다.The water-soluble polymer of (A) component is a copolymer containing polyvinylpyrrolidone or vinylpyrrolidone, These can also be used in mixture of 2 or more type. In the copolymer containing vinylpyrrolidone, the proportion of vinylpyrrolidone units is preferably 60 mol% or more based on the entire copolymer. Vinyl acetate is mentioned as a monomer copolymerized with vinylpyrrolidone.

((C) 성분)((C) component)

본 발명의 가공액은, (C) 성분으로서 다가 카르복실산의 알칼리염을 더 함유하고 있을 수도 있다. (C) 성분을 첨가하여, 그의 첨가량을 조정함으로써, 분산성, 세정성이나 내부식성을 부여한다는 효과가 있다.The process liquid of this invention may further contain the alkali salt of polyhydric carboxylic acid as (C) component. By adding (C) component and adjusting the addition amount, it has the effect of providing dispersibility, washability, and corrosion resistance.

다가 카르복실산으로서는, 아디프산, 옥살산, 도데칸디오산, 시트르산, 말산 등을 들 수 있다. 알칼리로서는, 수산화칼륨, 수산화나트륨 등의 알칼리 금속의 수산화물, 트리에탄올아민, 트리이소프로판올아민, 에틸렌디아민, N-(2-아미노에틸)-2-아미노에탄올 등의 아민을 들 수 있다.As polyhydric carboxylic acid, adipic acid, oxalic acid, dodecanedioic acid, citric acid, malic acid, etc. are mentioned. Examples of the alkali include amines such as hydroxides of alkali metals such as potassium hydroxide and sodium hydroxide, triethanolamine, triisopropanolamine, ethylenediamine, and N- (2-aminoethyl) -2-aminoethanol.

(C) 성분의 함유량은, 본 발명의 가공액 전체의 질량을 기준(100 질량%)으로 하여, 하한이 바람직하게는 0.01 질량% 이상, 보다 바람직하게는 0.1 질량% 이상이고, 상한이 바람직하게는 10 질량% 이하, 보다 바람직하게는 2 질량% 이하, 더욱 바람직하게는 1 질량% 이하이다. 상기 범위를 벗어나 (C) 성분의 함유량이 지나치게 적으면, (C) 성분을 첨가하는 효과가 발휘되기 어려워지고, 반대로 지나치게 많으면 증점, 겔화나 원액으로부터의 석출의 우려가 있다.As for content of (C) component, the lower limit becomes like this. Preferably it is 0.01 mass% or more, More preferably, it is 0.1 mass% or more, and an upper limit is preferable based on the mass of the whole process liquid of this invention as a reference | standard (100 mass%). Is 10 mass% or less, More preferably, it is 2 mass% or less, More preferably, it is 1 mass% or less. If the content of the component (C) is too small outside the above range, the effect of adding the component (C) is hardly exerted. On the contrary, if the content is too large, thickening, gelation or precipitation from the stock solution may occur.

((D) 성분)(Component (D))

본 발명의 가공액은, (D) 성분으로서 글리콜류, 글리콜에테르류, 및 폴리옥시알킬렌글리콜류로 이루어지는 군으로부터 선택되는 1종 이상을 더 함유하고 있을 수도 있다. (D) 성분을 함유함으로써, 윤활성, 습윤성을 부여한다는 효과가 있다.The processing liquid of the present invention may further contain one or more selected from the group consisting of glycols, glycol ethers, and polyoxyalkylene glycols as the component (D). By containing (D) component, there exists an effect of providing lubricity and wettability.

글리콜류로서는, 프로필렌글리콜, 디에틸렌글리콜, 에틸렌글리콜, 부틸렌글리콜 등을 들 수 있다. 글리콜에테르류로서는 상기 글리콜류의 알킬에테르를 들 수 있고, 알킬기로서는 메틸기, 에틸기, 부틸기 등을 들 수 있다. 또한, 글리콜류의 히드록시기의 일부가 알킬에테르로 되어 있을 수도 있고, 전부가 알킬에테르로 되어 있을 수도 있다. 글리콜에테르류의 구체예로서는, 디에틸렌글리콜모노에틸에테르, 디에틸렌글리콜디에틸에테르, 프로필렌글리콜모노에틸에테르 등을 들 수 있다.Examples of the glycols include propylene glycol, diethylene glycol, ethylene glycol, butylene glycol, and the like. Examples of the glycol ethers include alkyl ethers of the above glycols, and examples of the alkyl group include a methyl group, an ethyl group, and a butyl group. In addition, a part of the hydroxyl groups of glycols may be alkyl ether, and all may be alkyl ether. As an example of glycol ethers, diethylene glycol monoethyl ether, diethylene glycol diethyl ether, propylene glycol monoethyl ether, etc. are mentioned.

폴리옥시알킬렌글리콜류로서는, 폴리에틸렌글리콜, 폴리프로필렌글리콜, 폴리옥시에틸렌과 폴리옥시프로필렌의 공중합체 등을 들 수 있으며, 중량 평균 분자량(겔 투과 크로마토그래피를 이용한 폴리스티렌 환산)이 바람직하게는 10000 이하, 보다 바람직하게는 5000 이하, 더욱 바람직하게는 400 이하인 것을 이용한다.Examples of the polyoxyalkylene glycols include polyethylene glycol, polypropylene glycol, copolymers of polyoxyethylene and polyoxypropylene, and the weight average molecular weight (polystyrene conversion using gel permeation chromatography) is preferably 10000 or less. More preferably, it is 5000 or less, More preferably, it is 400 or less.

(D) 성분의 함유량은, 본 발명의 가공액 전체의 질량을 기준(100 질량%)으로 하여, 하한이 바람직하게는 0.1 질량% 이상, 보다 바람직하게는 0.5 질량% 이상, 더욱 바람직하게는 1 질량% 이상, 더욱 바람직하게는 3 질량% 이상, 특히 바람직하게는 10 질량% 이상이고, 상한이 바람직하게는 95 질량% 이하, 보다 바람직하게는 90 질량% 이하, 더욱 바람직하게는 80 질량% 이하이다. 상기 범위를 벗어나 (D) 성분의 함유량이 지나치게 적으면 (D) 성분을 넣는 효과가 발현되지 않게 되고, 반대로 (D) 성분의 함유량이 지나치게 많으면 냉각성이 저하될 우려가 있다.As for content of (D) component, as a reference | standard (100 mass%) the mass of the whole process liquid of this invention, a minimum is preferably 0.1 mass% or more, More preferably, it is 0.5 mass% or more, More preferably, 1 It is mass% or more, More preferably, it is 3 mass% or more, Especially preferably, it is 10 mass% or more, An upper limit becomes like this. Preferably it is 95 mass% or less, More preferably, it is 90 mass% or less, More preferably, it is 80 mass% or less to be. If the content of the component (D) is too small outside the above range, the effect of adding the component (D) will not be expressed. On the contrary, if the content of the component (D) is too large, the cooling property may be lowered.

본 발명의 가공액은 상기한 (A) 성분을 함유하고, 경우에 따라서는 (C) 성분 및 (D) 성분을 더 함유하고 있으며, 잔부는 (B) 물로 되어 있다. 물로서는, 증류수, 수돗물 등, 그의 종류는 특별히 한정되지 않는다. 또한, (B) 물의 함유량이 많은 가공액에서는, 실리콘 분말을 함유하는 가공액이 증점되고, 겔화되기 쉽다. 이에 비해, 본 발명의 가공액에서는 물의 함유량이 많은 조성, 예를 들면 가공액 전체의 질량을 기준으로서 물이 90 질량% 이상이 된 조성에 있어서도, 실리콘 분말을 함유하는 가공액의 증점ㆍ겔화를 억제할 수 있다.The processing liquid of the present invention contains the above-mentioned (A) component, and optionally contains (C) component and (D) component, and remainder becomes (B) water. As water, the kind, such as distilled water and tap water, is not specifically limited. Moreover, in the processing liquid with much content of (B) water, the processing liquid containing a silicon powder thickens and gelatinizes easily. In contrast, in the processing liquid of the present invention, thickening and gelation of the processing liquid containing silicon powder are prevented even in a composition having a large amount of water, for example, a composition in which water is 90% by mass or more based on the mass of the entire processing liquid. It can be suppressed.

<가공액의 성상><Appearance of Processing Amount>

본 발명의 가공액의 점도는 25 ℃에서 바람직하게는 50 mPaㆍs 이하이고, 보다 바람직하게는 25 mPaㆍs 이하, 더욱 바람직하게는 20 mPaㆍs 이하이다. 또한, 본 발명의 가공액에 소정의 실리콘 분말을 분산시킨 가공액(의사 사용액)의 점도는 25 ℃에서 100 mPaㆍs, 바람직하게는 55 mPaㆍs 이하이고, 보다 바람직하게는 50 mPaㆍs 이하이고, 더욱 바람직하게는 45 mPaㆍs 이하이다. 상기 의사 사용액의 점도는, 본 발명의 가공액에 실리콘 분말(입경: 1.5 ㎛)을 10 질량% 첨가하고, 교반 혼합한 후, 스테인리스강구(직경 2 mm)를 넣고, 1000 rpm으로 10시간 동안 교반하고, 상기 스테인리스강구를 여과 분별하여 얻어진 의사 사용액에 대하여 측정한 것이다. 상기한 가공액 자체의 점도가 지나치게 높으면, 실리콘 분말을 함유하는 의사 사용액의 점도도 필연적으로 높아진다. 또한, 의사 사용액의 점도가 지나치게 높으면, 상기 과제의 란에서 설명한 여러 문제가 발생할 우려가 있다. 또한, 가공액 및 의사 사용액의 점도는 브룩필드(Brookfield)형 점도계로 측정할 수 있다.The viscosity of the processing liquid of the present invention is preferably 50 mPa · s or less at 25 ° C., more preferably 25 mPa · s or less, still more preferably 20 mPa · s or less. Moreover, the viscosity of the processing liquid (pseudo-use liquid) in which the predetermined | prescribed silicone powder was disperse | distributed to the processing liquid of this invention is 100 mPa * s at 25 degreeC, Preferably it is 55 mPa * s or less, More preferably, it is 50 mPa * s It is below, More preferably, it is 45 mPa * s or less. As for the viscosity of the said pseudo-use liquid, 10 mass% of silicon powder (particle diameter: 1.5 micrometers) is added to the process liquid of this invention, after stirring-mixing, stainless steel balls (diameter 2 mm) are put, and it stirs at 1000 rpm for 10 hours. In addition, it measures about the pseudo-use liquid obtained by filtering and filtering the said stainless steel ball. If the viscosity of the above-mentioned processing liquid itself is too high, the viscosity of the pseudo-use liquid containing the silicon powder also inevitably increases. Moreover, when the viscosity of a pseudo use liquid is too high, there exists a possibility that the various problems described in the column of the said subject may arise. In addition, the viscosity of a process liquid and pseudo use liquid can be measured with a Brookfield viscometer.

가공액의 pH는, 바람직하게는 5.0 이상 9.0 이하이다. 가공액의 pH가 지나치게 낮은 경우에는, 상기 가공액이 닿는 철재 또는 와이어의 부식이 발생할 우려가 있으며, 반대로 가공액의 pH가 지나치게 높은 경우에는, 가공액과 실리콘 분말이 반응하여 수소가 발생할 우려가 있다. 본 발명의 가공액은 물에 희석하여 사용할 수도 있지만, 이 경우에도 희석 후의 가공액의 pH는 상기 범위인 것이 바람직하다.The pH of the processing liquid is preferably 5.0 or more and 9.0 or less. If the pH of the processing liquid is too low, there is a risk of corrosion of the steel or wire to which the processing liquid contacts. Conversely, if the pH of the processing liquid is too high, the processing liquid and the silicon powder may react to generate hydrogen. have. Although the processing liquid of this invention can also be diluted and used in water, also in this case, it is preferable that the pH of the processing liquid after dilution is in the said range.

[실시예][Example]

<실시예 1 내지 13, 비교예 1 내지 5><Examples 1 to 13, Comparative Examples 1 to 5>

본 발명의 고정 지립 와이어 소용 수용성 가공액(실시예 1 내지 13) 및 본 발명 이외의 고정 지립 와이어 소용 수용성 가공액(비교예 1 내지 5)을 표 1 내지 3에 나타낸 바와 같은 조성이 되도록 제작하였다. 제작한 가공액의 pH를 측정함과 함께, 브룩필드형 점도계로 25 ℃에서의 점도를 측정하였다.The water-soluble processing liquid for fixed abrasive wire wire (Examples 1-13) of this invention, and the water-soluble processing liquid for fixed abrasive wire wire (Comparative Examples 1-5) other than this invention were produced so that it might become a composition as shown in Tables 1-3. . While measuring the pH of the produced process liquid, the viscosity in 25 degreeC was measured with the Brookfield viscometer.

또한, 각 가공액에 실리콘 분말(평균 입자계 1.5 m)을 10 질량% 첨가하고, 교반 혼합한 후, 스테인리스강구(직경 2 mm)를 넣고, 1000 rpm으로 10시간 동안 교반하여 의사 사용액을 형성하였다. 상기 의사 사용액으로부터, 철망(50 메쉬)으로 스테인리스강구를 여과 분별한 후, 브룩필드형 점도계로 상기 의사 사용액의 점도(mPaㆍs, 25 ℃)를 측정하였다. 또한, 의사 사용액 10 ml를 50 ℃로 가열하고, 30분간에 발생하는 수소량(ml)을 측정하였다.Furthermore, 10 mass% of silicon powder (average particle system 1.5 m) was added to each process liquid, and after stirring and mixing, stainless steel balls (diameter 2 mm) were put, and it stirred at 1000 rpm for 10 hours, and formed the pseudo use liquid. . The stainless steel balls were separated by filtration using a wire mesh (50 mesh) from the pseudo use liquid, and the viscosity (mPa · s, 25 ° C.) of the pseudo use liquid was measured by a Brookfield viscometer. Furthermore, 10 ml of pseudo-use liquids were heated to 50 degreeC, and the amount of hydrogen (ml) generate | occur | produced in 30 minutes was measured.

또한, 폴리비닐피롤리돈(PVP)의 중량 평균 분자량은 PVP K-15가 9700이고, PVP K-30이 70000이고, PVP K-60이 400000이었다. 또한, PVP/VA는 비닐피롤리돈과 아세트산비닐과의 공중합체이고, 중량 평균 분자량이 32,000, 공중합체 중의 비닐피롤리돈의 비율이 70 몰%이다.In addition, the weight average molecular weight of polyvinylpyrrolidone (PVP) was 9700 for PVP K-15, 70000 for PVP K-30, and 400000 for PVP K-60. Moreover, PVP / VA is a copolymer of vinylpyrrolidone and vinyl acetate, the weight average molecular weight is 32,000 and the ratio of the vinylpyrrolidone in a copolymer is 70 mol%.

Figure pct00001
Figure pct00001

Figure pct00002
Figure pct00002

Figure pct00003
Figure pct00003

비교예의 가공액에서는 모두 의사 사용액 점도가 상승하고, 55 mPaㆍs를 초과하였다. 이에 비해, 본 발명의 가공액(실시예 1 내지 13)은 의사 사용액에 있어서도 점도 변화가 작고, 모두 45 mPaㆍs 이하이다.In the processing liquid of the comparative example, the pseudo-use liquid viscosity rose all and exceeded 55 mPa * s. On the other hand, the process liquid (Examples 1-13) of this invention is small in viscosity change also in pseudo use liquid, and all are 45 mPa * s or less.

실시예 1 내지 3, 비교예 1, 2는 원액을 10배로 희석한 것이다. 따라서, 원액의 조성은 각 화합물이 10배량이다.In Examples 1 to 3 and Comparative Examples 1 and 2, the stock solution was diluted 10 times. Therefore, the composition of the stock solution is 10 times each compound.

(그룹 I)(Group I)

그룹 I은 실시예 1 내지 6, 및 비교예 1 내지 3이며, 수분량이 많은 가공액의 예이다. 비교예의 가공액이며, 수분량이 많은 조성(비교예 1 내지 3)은, 모두 증점ㆍ겔화되었지만, PVP를 첨가한 본 발명의 가공액(실시예 1 내지 6)은 겔화되지 않고, 거의 증점되지 않았다.Group I is Examples 1-6 and Comparative Examples 1-3, and is an example of the processing liquid with a large amount of moisture. Although the compositions (Comparative Examples 1 to 3), which were the processing liquids of the comparative examples and had a large amount of moisture, were all thickened and gelled, the processing liquids (Examples 1 to 6) of the present invention to which PVP was added were not gelled and hardly thickened. .

또한, 수소 발생량에 대해서는, 실시예 1 내지 6에서는 수소 발생이 5 ml 이하인 데 비해, 비교예 1 내지 3에서는 수소 발생량이 15 ml 이상으로 매우 많았다.In addition, about the hydrogen generation amount, in Examples 1-6, hydrogen generation was 5 ml or less, whereas in Comparative Examples 1-3, the hydrogen generation amount was 15 ml or more.

(그룹 II)(Group II)

그룹 II는 실시예 7 내지 12, 및 비교예 4이며, (C) 성분 및 (D) 성분의 종류 및 양을 통일시키고, (A) 성분에 대하여 변화시킨 것이다. 이로부터, 각종 폴리비닐피롤리돈(PVP), 비닐피롤리돈/아세트산비닐 공중합체(PVP/VA)의 증점 억제 효과가 나타났다.Groups II are Examples 7 to 12 and Comparative Example 4, in which the kind and amount of the component (C) and the component (D) were unified and changed with respect to the component (A). From this, the thickening inhibitory effect of various polyvinylpyrrolidone (PVP) and vinylpyrrolidone / vinyl acetate copolymer (PVP / VA) was shown.

또한, 수소 발생량에 대해서는, 실시예 7 내지 12와 비교예 4를 비교하면, 폴리비닐피롤리돈 등을 포함하는 본 발명의 가공액은 수소 발생량이 적었다.In addition, about the amount of hydrogen generation, compared with Examples 7-12 and the comparative example 4, the process liquid of this invention containing polyvinylpyrrolidone etc. had little hydrogen generation amount.

(그룹 III)(Group III)

그룹 III은 실시예 13과 비교예 5이며, 그룹 I, 그룹 II와 상이한 (D) 성분을 포함하는 것이다. 이로부터 (D) 성분의 종류를 막론하고 폴리비닐피롤리돈(PVP)에 의한 증점 억제의 효과가 나타났다.Group III is Example 13 and Comparative Example 5, and contains a component (D) different from Groups I and II. From this, the effect of the thickening suppression by polyvinylpyrrolidone (PVP) appeared regardless of the kind of (D) component.

또한, 실시예 13과 비교예 5를 비교하면, 폴리비닐피롤리돈을 포함하는 실시예 13은 수소 발생량이 적었다.In addition, when Example 13 was compared with Comparative Example 5, Example 13 containing polyvinylpyrrolidone had little hydrogen generation amount.

이상으로부터, 폴리비닐피롤리돈, 및 비닐피롤리돈을 포함하는 공중합물로부터 선택되는 적어도 1종류 이상의 수용성 고분자를 포함하는 본 발명의 가공액은, 실리콘 분말을 분산시킨 의사 사용액에 있어서, 점도 상승을 억제함과 함께 수소 발생을 억제하는 효과가 있다는 것이 나타났다.From the above, the processing liquid of the present invention containing at least one or more water-soluble polymers selected from polyvinylpyrrolidone and a copolymer containing vinylpyrrolidone has a viscosity increase in the pseudo-use liquid in which silicone powder is dispersed. It has been shown that there is an effect of suppressing the generation of hydrogen while suppressing.

이상, 현시점에서 가장 실천적이면서도 바람직하다고 생각되는 실시 형태와 관련하여 본 발명을 설명했지만, 본 발명은, 본원 명세서 중에 개시된 실시 형태로 한정되는 것은 아니며, 특허청구범위 및 명세서 전체로부터 이해되는 발명의 요지 또는 사상에 반하지 않는 범위에서 적절하게 변경 가능하고, 그와 같은 변경을 수반하는 고정 지립 와이어 소용 수용성 가공액도 또한 본 발명의 기술적 범위에 포함되는 것으로서 이해되어야 한다.As mentioned above, although this invention was demonstrated regarding embodiment which is considered most practical and desirable at this time, this invention is not limited to embodiment disclosed in this specification, and the summary of invention understood from a claim and the whole specification. Or it can be suitably changed in the range which does not contrary to an idea, and it should also be understood that the water-soluble processing liquid for fixed abrasive wire accompanying such a change is also included in the technical scope of this invention.

본 발명의 고정 지립 와이어 소용 수용성 가공액은, 고정 지립 와이어 소를 이용하여 실리콘 웨이퍼를 절단할 때에 특히 바람직하게 사용할 수 있다.The water-soluble processing liquid for fixed abrasive wire saw of this invention can be used especially preferably when cut | disconnecting a silicon wafer using a fixed abrasive wire saw.

Claims (9)

(A) 폴리비닐피롤리돈, 및 비닐피롤리돈을 포함하는 공중합물로부터 선택되는 적어도 1종류 이상의 수용성 고분자, 및 (B) 물을 함유하는 고정 지립 와이어 소(wire saw)용 수용성 가공액.A water-soluble process liquid for fixed abrasive wire saws containing (A) at least one or more water-soluble polymers selected from a copolymer comprising polyvinylpyrrolidone and vinylpyrrolidone, and (B) water. 제1항에 있어서, 상기 (A) 성분의 중량 평균 분자량이 2,000 내지 1,000,000인 고정 지립 와이어 소용 수용성 가공액.The water-soluble process liquid for fixed abrasive wires of Claim 1 whose weight average molecular weights of the said (A) component are 2,000-1,000,000. 제1항 또는 제2항에 있어서, 상기 (A) 성분의 함유량이 고정 지립 와이어 소용 수용성 가공액 전체의 질량을 100 질량%로 하여, 0.02 질량% 이상 7 질량% 이하인 고정 지립 와이어 소용 수용성 가공액.The water-soluble working solution for fixed abrasive wire firing according to claim 1 or 2, wherein the content of the component (A) is 0.02% by mass or more and 7% by mass or less as the mass of the whole water-soluble working solution for fixed abrasive wires is 100% by mass. . 제1항 내지 제3항 중 어느 한 항에 있어서, (C) 다가 카르복실산의 알칼리염을 더 함유하는 고정 지립 와이어 소용 수용성 가공액.(C) The water-soluble process liquid for fixed abrasive wire use of any one of Claims 1-3 which further contains the alkali salt of polyhydric carboxylic acid. 제4항에 있어서, 상기 (C) 성분의 함유량이 고정 지립 와이어 소용 수용성 가공액 전체의 질량을 100 질량%로 하여, 0.01 질량% 이상 10 질량% 이하인 고정 지립 와이어 소용 수용성 가공액.The water-soluble process liquid for fixed abrasive wire grades of Claim 4 whose content of the said (C) component is 0.01 mass% or more and 10 mass% or less as the mass of the whole water-soluble process liquid for fixed abrasive wires. 제1항 내지 제5항 중 어느 한 항에 있어서, (D) 글리콜류, 글리콜에테르류, 및 폴리옥시알킬렌글리콜류로 이루어지는 군으로부터 선택되는 1종 이상을 더 함유하는 고정 지립 와이어 소용 수용성 가공액.The water-soluble processing for fixed abrasive wire use according to any one of claims 1 to 5, further comprising one or more selected from the group consisting of (D) glycols, glycol ethers, and polyoxyalkylene glycols. liquid. 제6항에 있어서, 상기 (D) 성분의 함유량이 고정 지립 와이어 소용 수용성 가공액 전체의 질량을 100 질량%로 하여, 0.1 질량% 이상 95 질량% 이하인 고정 지립 와이어 소용 수용성 가공액.The water-soluble working solution for fixed abrasive wires according to claim 6, wherein the content of the component (D) is 0.1% by mass or more and 95% by mass or less as the mass of the whole water-soluble working solution for fixed abrasive wires is 100% by mass. 제1항 내지 제7항 중 어느 한 항에 있어서, 가공액의 점도가 25 ℃에서 50 mPaㆍs 이하인 고정 지립 와이어 소용 수용성 가공액.The water-soluble process liquid for fixed abrasive wires of any one of Claims 1-7 whose viscosity of a process liquid is 50 mPa * s or less at 25 degreeC. 제1항 내지 제8항 중 어느 한 항에 있어서, 상기 가공액에 평균 입경 1.5 ㎛의 실리콘 분말을 10 질량% 첨가하여 교반하여 형성한 의사 사용액의 점도가 25 ℃에서 100 mPaㆍs 이하인 고정 지립 와이어 소용 수용성 가공액.The fixed abrasive grain as described in any one of Claims 1-8 whose viscosity of the pseudo-use liquid formed by adding 10 mass% of silicon powder with an average particle diameter of 1.5 micrometers to the said process liquid and stirring it is 100 mPa * s or less at 25 degreeC. Aqueous processing liquid for wire use.
KR1020137001523A 2010-08-03 2011-07-29 Aqueous processing solution for fixed abrasive grain wire saw KR101788901B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010174673A JP5420498B2 (en) 2010-08-03 2010-08-03 Water-soluble machining fluid for fixed abrasive wire saws
JPJP-P-2010-174673 2010-08-03
PCT/JP2011/067457 WO2012017947A1 (en) 2010-08-03 2011-07-29 Aqueous processing solution for fixed abresive grain wire saw

Publications (2)

Publication Number Publication Date
KR20130095724A true KR20130095724A (en) 2013-08-28
KR101788901B1 KR101788901B1 (en) 2017-10-20

Family

ID=45559447

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137001523A KR101788901B1 (en) 2010-08-03 2011-07-29 Aqueous processing solution for fixed abrasive grain wire saw

Country Status (7)

Country Link
EP (1) EP2602058A4 (en)
JP (1) JP5420498B2 (en)
KR (1) KR101788901B1 (en)
CN (1) CN103025486B (en)
SG (1) SG186486A1 (en)
TW (1) TWI522457B (en)
WO (1) WO2012017947A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012172117A (en) * 2011-02-23 2012-09-10 Yushiro Chemical Industry Co Ltd Water-soluble working fluid for fixed abrasive grain wire saw
JP6039935B2 (en) * 2012-06-29 2016-12-07 出光興産株式会社 Aqueous processing fluid
JP6819619B2 (en) * 2018-01-22 2021-01-27 信越半導体株式会社 Work cutting method and wire saw
CN110497546A (en) * 2019-08-26 2019-11-26 哈尔滨商业大学 The method and apparatus of free-consolidation abrasive compound multiline cut silicon chips

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6243482A (en) * 1985-08-21 1987-02-25 Sanyo Chem Ind Ltd Abrasion working fluid
CN1057478A (en) * 1990-06-22 1992-01-01 薛志纯 Metal working fluid
US5401428A (en) * 1993-10-08 1995-03-28 Monsanto Company Water soluble metal working fluids
JP3869520B2 (en) * 1997-03-21 2007-01-17 株式会社ネオス Water-soluble cutting fluid for wire saw
JP2000296455A (en) * 1999-04-09 2000-10-24 Tokyo Seimitsu Co Ltd Fixed abrasive grain multi-wire saw
JP2001054850A (en) 1999-08-11 2001-02-27 Osaka Diamond Ind Co Ltd Hard brittle material cutting method by means of fixed abrasive grain wire saw
JP2002096251A (en) * 1999-09-17 2002-04-02 Sumitomo Special Metals Co Ltd Cutting method and cutting apparatus for rare earth alloys
JP2001138205A (en) * 1999-11-08 2001-05-22 Sumitomo Special Metals Co Ltd Method and apparatus for cutting rare earth alloy
JP2002167589A (en) * 2000-11-30 2002-06-11 Nippon Shokubai Co Ltd Metal working oil
JP4497767B2 (en) 2001-09-06 2010-07-07 ユシロ化学工業株式会社 Water-soluble machining fluid composition for fixed abrasive wire saw
TW575660B (en) * 2001-09-07 2004-02-11 Dai Ichi Kogyo Seiyaku Co Ltd Nonflammable water-based cutting fluid composition and nonflammable water-based cutting fluid
JP2008161992A (en) * 2006-12-28 2008-07-17 Asahi Diamond Industrial Co Ltd Cutting method for processed member and manufacturing method for wafer
JP4874853B2 (en) * 2007-04-09 2012-02-15 Dowaホールディングス株式会社 Cutting method of sintered rare earth magnet alloy
JP5253765B2 (en) * 2007-07-05 2013-07-31 株式会社Adeka Additive for dicing cutting water and cutting method using the same
US8157876B2 (en) * 2007-07-31 2012-04-17 Cabot Microelectronics Corporation Slurry composition containing non-ionic polymer and method for use
US20090149359A1 (en) * 2007-12-10 2009-06-11 Hundley Lloyd E Formulation of a metal working fluid

Also Published As

Publication number Publication date
WO2012017947A1 (en) 2012-02-09
CN103025486B (en) 2016-03-30
KR101788901B1 (en) 2017-10-20
JP5420498B2 (en) 2014-02-19
TW201211235A (en) 2012-03-16
EP2602058A4 (en) 2014-12-24
EP2602058A1 (en) 2013-06-12
TWI522457B (en) 2016-02-21
JP2012035336A (en) 2012-02-23
SG186486A1 (en) 2013-02-28
CN103025486A (en) 2013-04-03

Similar Documents

Publication Publication Date Title
JP5639996B2 (en) Processing fluid for brittle materials and processing fluid for hard materials
KR102060953B1 (en) Aqueous processing liquid
CN103391992B (en) Water-soluble working fluid for fixed-abrasive wire saw
CN102597189B (en) Cutting fluids with improved performance
KR20100130159A (en) Aqueous cutting fluid and aqueous cutting agent
TW201033341A (en) Slurry composition containing non-ionic polymer and method for use
KR20130095724A (en) Aqueous processing solution for fixed abrasive grain wire saw
TW201441361A (en) Aqueous working fluid
KR20120036796A (en) Aqueous cutting fluid and aqueous cutting agent
JP2010202826A (en) Processing oil for brittle material, and processing oil composition
KR101505334B1 (en) Carrier fluids for abrasives
CN103242944A (en) Multifunctional water-based environment-friendly recyclable crystal silicon precision cutting liquid
KR20160018470A (en) Water soluble cutting fluid for fixed abrasive grain wire saw, ingot cutting method using same, and substrate for electronic material obtained by means of same
JP2012214638A (en) Water-containing cutting fluid composition and method for producing the same
KR101809778B1 (en) Silicon wafer processing solution and silicon wafer processing method
JP5750525B2 (en) Water-soluble machining fluid for fixed abrasive wire saws
JP6232480B2 (en) Aqueous processing fluid

Legal Events

Date Code Title Description
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant