KR20120135788A - Large area imprinting apparatus with uniform pressing structure - Google Patents

Abstract

PURPOSE: A large-area imprinting apparatus having a uniform pressing structure is provided to install an ultraviolet light source in a space between meshes of one side of a chamber so that ultraviolet lights can be reached a shadow region. CONSTITUTION: A large-area imprinting apparatus having a uniform pressing structure comprises chambers(100,110,120), an ultraviolet ray transmitting plate(230), a substrate(20), a stamp(10), an elastic plate(220), and a gas supplying unit(240). The chamber provides an internal space(212) and one side of the chamber is formed into a mesh form. The ultraviolet ray transmitting plate is arranged in an inner surface of one side of the chamber. The substrate is arranged in the ultraviolet ray transmitting plate. Patterns placed on the substrate are carved on the stamp. The elastic plate is arranged on the stamp. The elastic plate is pressed by providing a gas in the inside of the chamber so that the patterns on the stamp are imprinted on the substrate.

Description

LARGE AREA IMPRINTING APPARATUS WITH UNIFORM PRESSING STRUCTURE}

The present invention relates to a large area imprinting apparatus having a uniform pressurized structure and an imprinting method using the same. More particularly, the present invention relates to an imprinting apparatus and an imprinting method using the same, capable of uniformly applying pressure to a large area stamp or substrate without damaging the ultraviolet ray transmitting plate.

The technique for forming nanoscale patterns is often referred to as nanotechnology. Nanotechnology is a technology that produces and utilizes nanoscale materials, structures, instruments, machines, and devices. Nanotechnology is a foundational technology that realizes information technology and biotechnology. Most of the production, processing and application technologies are closely related to nanotechnology.

The core technology in nano technology with the above meaning is nano process technology that enables the production and utilization of nano sized materials, devices, and the like. Nano process technology is divided into top down method such as planar technology in semiconductor device fixing and bottom up method for manufacturing nanomaterials and devices using self-assembly technology of atoms and molecules. The bottom up method is not used at present stage due to technical limitations, but the top town method is commercially available at this stage.

Nano process technology is the core technology of lithography technology that forms nano-sized ultra-fine patterns. Currently, optical lithography is mainly used as a lithography technique for forming fine patterns. However, the optical lithography technique can be excellently applied to the formation of micron-sized patterns having a size of 100 nm or more, but there is a limit to the formation of ultra-fine micro-patterns having a size of less than that.

Thus, there is a need for a new type of lithography technique that can form nanopatterns in place of optical lithography techniques. X-ray lithography, e-beam lithography, proximal lithography, and nano imprinting lithography are alternatives to optical lithography. Was presented.

X-ray lithography technology can form a nano-pattern of 20nm or less, but it is difficult to manufacture the optical system to be used and the high cost is required, there is a problem that is not commercially practical.

Electron beam lithography techniques can form nanopatterns at low cost, but have a low process yield.

The proximal lithography technique may form nano-patterns having a size of several nanometers corresponding to the size of atoms or molecules, but as a representative bottom-up technique, as described above, there is a problem in that practical use is low.

On the other hand, nano imprinting lithography technology can easily form nano-patterns and can be mass-produced to have high process yields. Such nanoimprinting lithography techniques can also be used to form micrometer-sized patterns. That is, imprint lithography techniques may be used in place of optical lithography techniques to form micrometer-sized patterns.

Brief description of a conventional nanoimprinting lithography process for forming a pattern of nanometer or micrometer size, first, the elastic plate is pressed by a predetermined gas flowing into the imprint process space, so that the elastic plate pressurizes the stamp and the substrate. The predetermined pattern can be transferred to the polymer layer on the substrate. In addition, ultraviolet rays may be irradiated onto the substrate during the imprint process to cure the polymer layer of the substrate.

However, such a conventional nanoimprinting lithography apparatus is mainly intended to use a wafer-based circular substrate, which has a limited substrate size. Therefore, the conventional nanoimprinting lithography technology has a problem in that a large area pattern manufacturing cost is required by repetitive work or a uniform pattern cannot be transferred even by a repetitive imprint process.

In order to use nanoimprinting lithography technology on a large-area substrate, an imprinting device that applies a uniform pressure to the large-area is required. In this case, it is able to transmit ultraviolet rays irradiated from an ultraviolet light source and support ultraviolet rays. There was a problem that the permeable plate can not withstand the pressure. This problem causes the pattern of the stamp to not be imprinted accurately on the substrate, which is an obstacle to applying nanoimprint lithography technology to a large area substrate.

In addition, according to the conventional nanoimprinting lithography apparatus, ultraviolet rays irradiated from an ultraviolet light source do not evenly reach a large area substrate, which causes a pattern of a stamp not to be imprinted correctly on a large area substrate. .

Accordingly, the present invention has been made to solve the above problems of the prior art, a large-area imprinting apparatus and a large area using the same can be applied to uniform pressure on a large area stamp or substrate without damaging the UV transmission plate The purpose is to provide an imprinting method.

In order to achieve the above object, a large area imprinting apparatus according to an embodiment of the present invention provides a predetermined internal space and one side of the chamber having a mesh (mesh) shape, on the inner surface of the one side of the chamber A UV transmission plate disposed, a substrate disposed on the UV transmission plate, a stamp in which a pattern disposed on the substrate is imprinted, an elastic body plate disposed on the stamp, and a gas supply unit supplying gas into the chamber; The pattern of the stamp is imprinted on the substrate by supplying the gas to the inner space of the chamber and pressurizing the elastic body plate.

In order to achieve the above object, a large area imprinting apparatus according to an embodiment of the present invention provides a predetermined internal space and one side of the chamber having a mesh (mesh) shape, on the inner surface of the one side of the chamber An ultraviolet transmitting plate disposed on the substrate, a substrate disposed on the ultraviolet transmitting plate, a stamp in which the pattern disposed on the substrate is stamped, an elastic plate disposed on the stamp, and a flat plate disposed on the elastic plate; The elastic plate is pressed by the flat plate, characterized in that the pattern of the stamp is imprinted on the substrate.

The inner space is divided into a first inner space and a second inner space which are separated from each other by the elastic plate, and the gas flows in the first inner space to press the elastic plate, and in the second inner space, the elastic plate The vacuum state can be maintained while pressurizing.

The outer side of the chamber may further include an ultraviolet light source disposed to face the ultraviolet transmission plate.

The apparatus may further include an ultraviolet light source disposed to face the ultraviolet transmission plate in a space between the meshes of the one surface of the chamber.

The apparatus may further include a reflector disposed behind the ultraviolet light source.

The ultraviolet transmission plate may be composed of a plurality of unit ultraviolet transmission plate.

The material of the ultraviolet transmitting plate may include quartz.

The material of the elastic plate may include silicon.

The apparatus may further include a gasket disposed between an inner side surface of the one surface of the chamber and the ultraviolet ray transmitting plate.

The process of pressurizing the elastic plate by supplying gas into the internal space may apply uniform pressure to the entire elastic plate.

In order to achieve the above object, a large area imprinting method according to an embodiment of the present invention provides a predetermined internal space and one side of the chamber having a mesh (mesh), on the inner surface of the one side of the chamber A UV transmissive plate disposed on the substrate, a substrate disposed on the UV transmissive plate, a stamp on which the pattern disposed on the substrate is imprinted, an elastic plate disposed on the stamp, and a gas supply unit supplying gas into the chamber. By using an area imprinting device, the pattern of the stamp is imprinted on the substrate by supplying the gas to the inner space of the chamber to pressurize the elastic body plate.

In order to achieve the above object, a large area imprinting method according to an embodiment of the present invention provides a predetermined internal space and one side of the chamber having a mesh (mesh), on the inner surface of the one side of the chamber A large area comprising an ultraviolet transmissive plate disposed on the substrate, a substrate disposed on the ultraviolet transmissive plate, a stamp with a pattern disposed on the substrate, an elastic plate disposed on the stamp, and a flat plate disposed on the elastic plate Using an imprinting device, the pattern of the stamp is imprinted on the substrate by pressing the elastic plate by the flat plate.

According to the present invention, it is possible to provide a large-area imprinting apparatus capable of uniformly applying pressure to a large-area stamp or substrate without damaging the ultraviolet transmission plate by configuring one surface of the chamber in a mesh form.

In addition, according to the present invention, by performing the imprinting process using the above-described imprinting apparatus, it is possible to effectively imprint the pattern of the stamp on the substrate.

In addition, according to the present invention, by providing an ultraviolet light source in the space between the mesh on one side of the chamber, the ultraviolet ray can also reach the shaded portion generated in the substrate by the mesh form on one side of the chamber.

In addition, according to the present invention, by damaging the ultraviolet transmitting plate by configuring the ultraviolet transmitting plate with a plurality of unit ultraviolet transmitting plates, it is possible to overcome manufacturing limitations.

1 is a view showing the configuration of a large-area imprinting apparatus according to a first embodiment of the present invention.
2 is a view showing the configuration of a large-area imprinting apparatus according to a second embodiment of the present invention.
3 is a view showing the configuration of a large-area imprinting apparatus according to a third embodiment of the present invention.
4 is a view showing the configuration of a large-area imprinting apparatus according to a fourth embodiment of the present invention.

DETAILED DESCRIPTION The following detailed description of the invention refers to the accompanying drawings that show, by way of illustration, specific embodiments in which the invention may be practiced. These embodiments are described in sufficient detail to enable those skilled in the art to practice the invention. It should be understood that the various embodiments of the present invention are different, but need not be mutually exclusive. For example, certain features, structures, and characteristics described herein may be implemented in other embodiments without departing from the spirit and scope of the invention in connection with an embodiment. It is also to be understood that the position or arrangement of the individual components within each disclosed embodiment may be varied without departing from the spirit and scope of the invention. The following detailed description is, therefore, not to be taken in a limiting sense, and the scope of the present invention is to be limited only by the appended claims, along with the full scope of equivalents to which such claims are entitled, if properly explained. In the drawings, like reference numerals refer to the same or similar functions throughout the several views, and length and area, thickness, and the like may be exaggerated for convenience.

DETAILED DESCRIPTION Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art can easily implement the present invention.

The large-area imprinting apparatus described below is a device for providing the stamp 10 or the substrate 20 with a pressure for imprinting the pattern formed on the stamp 10 onto the substrate 20.

In the present invention, the stamp 10 may be configured to have a predetermined pattern and may be used to imprint the pattern on the substrate 20. The stamp 10 may be manufactured using silicon, glass, metal, etc., but preferably, may be manufactured using a polymer such as PDMS, h-PDMS, PVC, and the like.

In addition, in the present invention, the substrate 20 is a plate-shaped member that requires an imprinting process. The substrate 20 may generally mean a silicon substrate, but in some cases, may also mean a gallium arsenide substrate, a quartz substrate, an alumina substrate, or the like. In addition, the substrate 20 of the present invention may include a predetermined layer such as a polymer layer (not shown) formed on a substrate generally used in a semiconductor process, such as a silicon substrate. In particular, the substrate 20 of the present invention may include a large area substrate, such as a substrate used in LCD manufacturing.

1 is a view showing the configuration of a large-area imprinting apparatus according to a first embodiment of the present invention.

Referring to FIG. 1, a large area imprinting apparatus according to a first exemplary embodiment of the present invention may include chambers 100 and 110 and 120 that provide an imprinting process space, internal spaces 211 and 212 of the chamber, and an ultraviolet light source. It can be seen that comprises a 300).

First, the chamber provides a process space for imprinting a pattern formed on the stamp 10 on the substrate 20. The internal spaces 211 and 212 of the chambers 100 and 110 may include a stamp 10, a substrate 20, and an elastic plate 220, and the gas supply unit 240 and the vacuum pump 250 may be provided. Can be connected. The material of the chamber is not limited as long as it can withstand the pressure of the gas introduced therein and can stably provide a nanoimprint lithography process space.

The chamber 100 may include an upper chamber 110 corresponding to the first internal space 211 and a lower chamber 120 corresponding to the second internal space. As shown in FIG. 1, one surface of the chamber 100, more specifically, one surface of the lower chamber 120 supporting the ultraviolet ray transmitting plate 230 to be described later may have a mesh shape. An effect when one surface of the chamber 100 has a mesh shape will be described in detail below.

The inner space of the chamber 100 may be divided by the elastic plate 220 into the first inner space 211 and the second inner space 212. When the gas is introduced by the gas supply unit 240, the first internal space 211 may pressurize the elastic body plate 220 to apply pressure to the stamp 10 and the substrate 20, and the supplied gas may be discharged to the outside. It may be sealed to prevent exit. The second internal space 212 is a space in which the stamp 10, the substrate 20, and the ultraviolet ray transmitting plate 230 are positioned. As the elastic plate 220 is pressed, the pattern of the stamp 10 is applied to the substrate 20. An imprint lithography process that transfers to can be performed.

The elastic body plate 220 may be included in the internal space of the chamber 100 to serve to compress the stamp 10 and the substrate 20. More specifically, the elastic body plate 220 may be elastically deformed by being pressed by a gas supplied from the outside, and the stamp 10 and the substrate 20 may be compressed by such elastic deformation. The elastic plate 110 may be made of an elastic polymer material such as polydimethylsiloxane (polydimethylsiloxane) or silicone rubber.

The ultraviolet transmission plate 230 supports the substrate 20 and may be configured to transmit ultraviolet rays so that ultraviolet rays emitted from the ultraviolet light source 300 to be described later can easily reach the substrate 20. For example, the ultraviolet transmission plate 230 may be selected and configured as a material transparent to ultraviolet or infrared rays, such as quartz. The ultraviolet transmission plate 230 may be supported by the lower chamber 230 in the form of a mesh 230.

Meanwhile, a gasket 260 may be further installed between the lower chamber 120 and the ultraviolet ray transmitting plate 230. The gasket 260 may perform a function of protecting the ultraviolet ray transmitting plate 230 from an external shock and improving a vacuum holding performance of the lower chamber 120.

A gas supply unit 240 penetrating the upper chamber 110 may be installed at one side of the first internal space 211. The gas supply unit 240 may perform a function of supplying a gas existing outside to the first internal space 211. As described above, the elastic body plate 220 may be pressurized by the gas supplied to the first internal space 211. In addition, the gas supply unit 240 may include a valve (not shown). By using such a valve, the operator may automatically or manually control the input amount or pressure of the gas supplied to the first internal space 211.

The vacuum pump 250 may be installed at one side of the second internal space 212. When the second space 212 is formed in the vacuum state using the vacuum pump 250, the imprinting process may be more smoothly performed. More specifically, when the second internal space 212 is formed in the vacuum state by using the vacuum pump 250, the pressure difference between the first internal space 211 and the second internal space 212 is increased, so that the first internal space is increased. Even when a small amount of gas is supplied to the space 211, a high pressure can be obtained. The position where the vacuum pump 250 is installed is not particularly limited but may be preferably installed through the lower chamber 120.

Referring to FIG. 1, the large area imprinting apparatus according to the first exemplary embodiment of the present invention may include an ultraviolet light source 300. The ultraviolet light source 300 may perform ultraviolet ray irradiation on the substrate 20 to cure the polymer layer on the substrate 20. As the ultraviolet light source 300, a known light lamp for irradiating ultraviolet rays or infrared rays may be used without limitation. The ultraviolet light source 300 is installed at the lower portion of the chamber 100, and the ultraviolet light is transmitted to the substrate 20 by transmitting ultraviolet rays to the lower chamber 120 having one surface of a mesh shape. To be able.

This will be described in more detail as follows.

The conventional imprinting apparatus has a form in which the lower part of the chamber supporting the ultraviolet transmitting plate is partially opened in order to transmit ultraviolet rays irradiated from the ultraviolet light source to the substrate. In addition, the general ultraviolet light transmitting plate is weak in durability because it uses a material of a transparent material that can transmit a light source, such as quartz. Therefore, when the nanoimprinting lithography technique is used in an imprinting apparatus for imprinting a pattern on a large-area substrate, unlike the conventional optical lithography technique, the ultraviolet transmission plate must be directly pressurized for the input of the pattern. There was a problem of being unbearable and damaged.

However, according to the present invention, in the conventional imprinting apparatus, one surface of the chamber 100, that is, the lower chamber 120, positioned below the ultraviolet ray transmitting plate 230, is configured in the form of a mesh as illustrated in FIG. 1. One problem can be solved. In this case, the lower chamber in the form of a mesh may transmit the ultraviolet rays emitted from the ultraviolet light source 300 to the substrate 20 having a large area, and stably support the ultraviolet transmitting plate 230 to the ultraviolet transmitting plate 230. By uniformly dispersing the pressure in the chamber 100 can be solved the problem that the ultraviolet transmission plate 230 is damaged.

Referring back to FIG. 1, the large area imprinting apparatus according to the first embodiment of the present invention may include a reflecting plate 310. The reflector 310 may serve to adjust the irradiation amount of ultraviolet rays by reflecting the ultraviolet rays emitted from the ultraviolet light source 300. The reflective plate 310 is made of a metal having high reflectance, a resin having a high reflectance by dispersing a white resin (for example, a liquid crystal polymer resin), and a light scattering agent (titanium dioxide or silica). A coated resin or the like can be used, and any material having a high reflectance is not particularly limited.

2 is a view showing the configuration of a large-area imprinting apparatus according to a second embodiment of the present invention.

The second embodiment of the present invention is a modification of the first embodiment of the present invention will be omitted for the same or corresponding configuration as the first embodiment of the present invention and will be described only for the configuration added or modified Shall be.

Referring to FIG. 2, in the large area imprinting apparatus according to the second embodiment of the present invention, the ultraviolet light source 300 is disposed to face the ultraviolet transmission plate 230 in the space between the meshes of the lower chamber 120. can confirm.

When the ultraviolet light transmitting plate 300 is installed outside the chamber 100 as in the first embodiment of the present invention, the light source does not pass through the mesh-shaped support of the lower chamber 120 so that the ultraviolet light transmitting plate 230 and There may be a problem that a shadow region occurs in the substrate 20. However, when the ultraviolet light source 300 is inserted into the space between the meshes using a plurality of ultraviolet lamps as shown in FIG. 2, the ultraviolet rays reach the shaded portion by the light scattering effect.

In addition, referring to FIG. 2, the ultraviolet light source 300 may include a reflector 310 at the rear. According to the structural design of the reflector 310, the irradiation amount of ultraviolet rays irradiated to the shaded portion may be adjusted, thereby irradiating UV rays uniform to the entire area of the ultraviolet transmission plate 230 and the substrate 20.

3 is a view showing the configuration of a large-area imprinting apparatus according to a third embodiment of the present invention.

The third embodiment of the present invention is a modification of the second embodiment of the present invention will be omitted for the same or corresponding configuration as the second embodiment of the present invention and will be described only for the configuration added or modified. Shall be.

Referring to FIG. 3, in order to implement a large area imprinting apparatus according to the present invention, the ultraviolet light transmitting plate 230 should also have a large area shape. In this case, since there may be a limitation of the size due to the manufacturing limitation of the ultraviolet transmission plate 230, the ultraviolet transmission plate 230 may be composed of a plurality of unit ultraviolet transmission plate. When a plurality of unit UV transmitting plate 230 is provided, it is possible to prevent the concentration of pressure in the local area in the large UV transmitting plate 230, thereby preventing damage to the ultraviolet transmitting plate 230.

4 is a view showing the configuration of a large-area imprinting apparatus according to a fourth embodiment of the present invention.

The fourth embodiment of the present invention is a modification to the third embodiment of the present invention will be omitted for the same or corresponding configuration as the third embodiment of the present invention will be described only for the configuration added or modified Shall be.

Referring to Figure 4, it can be seen that the large-area flat plate 270 is located on the elastic plate. The plate 270 may be installed to enable vertical movement, and the pattern of the stamp 10 may be imprinted onto the substrate 20 by pressing the elastic plate 220 by the downward movement of the plate 270 instead of the gas supply. have. In this case, since a uniform pressure may not be transmitted to the stamp 10 than when the gas is supplied and pressurized inside the chamber 100, in order to uniformly press the stamp 10 and the substrate 20 having a large area. The thickness of the elastic plate 220 is preferably as thick as possible. An air cylinder 280 coupled to the flat plate 270 may be installed to allow the flat plate 270 to move up and down. The material of the flat plate 270 may be a metal or a polymer, and is not particularly limited as long as it can stably press the elastic plate 220 having a large area.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is clearly understood that the same is by way of illustration and example only and is not to be taken in conjunction with the present invention. Variations and changes are possible. Such modifications and variations are intended to fall within the scope of the invention and the appended claims.

10: stamp
20: substrate
100: chamber
110: upper chamber
120: lower chamber
211: first interior space
212: second interior space
220: elastic body plate
230: UV transmission plate
240: gas supply unit
250: vacuum pump
260: gasket
270: reputation
280: air cylinder
300: ultraviolet light source
310: reflector

Claims (24)

A chamber providing a predetermined internal space and having a mesh shape on one surface thereof;
An ultraviolet transmitting plate disposed on an inner side of the one side of the chamber;
A substrate disposed on the ultraviolet transmission plate;
A stamp with a pattern disposed on the substrate;
An elastic plate disposed on the stamp; And
Gas supply unit for supplying gas into the chamber
Including,
And the pattern of the stamp is imprinted on the substrate by supplying the gas to the inner space of the chamber to pressurize the elastic body plate. A chamber providing a predetermined internal space and having a mesh shape on one surface thereof;
An ultraviolet transmitting plate disposed on an inner side of the one side of the chamber;
A substrate disposed on the ultraviolet transmission plate;
A stamp with a pattern disposed on the substrate;
An elastic plate disposed on the stamp; And
A flat plate disposed on the elastic plate;
Including,
And the pattern of the stamp is imprinted on the substrate by the elastic plate being pressed by the flat plate. The method according to claim 1 or 2,
The inner space is divided into a first inner space and a second inner space blocked by each other by the elastic plate,
In the first internal space the gas is introduced to press the elastic plate,
The large area imprinting apparatus of claim 2, wherein a vacuum state is maintained while pressing the elastic body plate in the second internal space. The method according to claim 1 or 2,
The large-area imprinting apparatus, further comprising an ultraviolet light source disposed opposite the ultraviolet transmission plate on the outside of the chamber. The method according to claim 1 or 2,
And a UV light source disposed in a space between the meshes of the one surface of the chamber to face the ultraviolet transmission plate. 5. The method of claim 4,
A large area imprinting apparatus, further comprising a reflector disposed behind the ultraviolet light source. The method of claim 5,
A large area imprinting apparatus, further comprising a reflector disposed behind the ultraviolet light source. The method according to claim 1 or 2,
The ultraviolet transmissive plate is a large area imprinting apparatus, characterized in that composed of a plurality of unit ultraviolet transmissive plate. The method according to claim 1 or 2,
The large-area imprinting device, characterized in that the material for the ultraviolet transmission plate comprises quartz. The method according to claim 1 or 2,
Large-area imprinting apparatus, characterized in that the material of the elastic plate comprises silicon. The method according to claim 1 or 2,
And a gasket disposed between an inner side surface of the one surface of the chamber and the ultraviolet ray transmitting plate. The method according to claim 1 or 2,
The process of pressurizing the elastic plate by supplying gas into the inner space is characterized in that to apply a uniform pressure to the entire elastic plate. A chamber having a predetermined internal space and having one surface formed of a mesh, an ultraviolet transmitting plate disposed on an inner side of the one surface of the chamber, a substrate disposed on the ultraviolet transmitting plate, and disposed on the substrate Using a large-area imprinting apparatus including a stamp stamped in the pattern, an elastic plate disposed on the stamp and a gas supply unit for supplying gas into the chamber, wherein the gas is supplied to the inner space of the chamber and the elastic body And the pattern of the stamp is imprinted on the substrate by pressing a plate. A chamber having a predetermined internal space and having one surface formed of a mesh, an ultraviolet transmitting plate disposed on an inner side of the one surface of the chamber, a substrate disposed on the ultraviolet transmitting plate, and disposed on the substrate A large-area imprinting apparatus including a stamp having a pattern imprinted therein, an elastic plate disposed on the stamp, and a flat plate disposed on the elastic plate, wherein the elastic plate is pressed by the flat plate so that the stamp is placed on the substrate. Large area imprinting method, characterized in that the pattern of imprinting. The method according to claim 13 or 14,
The inner space is divided into a first inner space and a second inner space blocked by each other by the elastic plate,
In the first internal space the gas is introduced to press the elastic plate,
A large area imprinting method according to claim 2, wherein a vacuum state is maintained while pressing the elastic body plate in the second internal space. The method according to claim 13 or 14,
The large-area imprinting method of claim 1, further comprising an ultraviolet light source disposed opposite the ultraviolet transmission plate on the outside of the chamber. The method according to claim 13 or 14,
And an ultraviolet light source disposed in the space between the meshes of the one surface of the chamber to face the ultraviolet transmission plate. 17. The method of claim 16,
A large area imprinting method further comprising a reflector disposed behind the ultraviolet light source. 18. The method of claim 17,
A large area imprinting method further comprising a reflector disposed behind the ultraviolet light source. The method according to claim 13 or 14,
The ultraviolet transmission plate is a large area imprinting method, characterized in that composed of a plurality of unit ultraviolet transmission plate. The method according to claim 13 or 14,
The large-area imprinting method, characterized in that the material of the ultraviolet transmission plate comprises quartz. The method according to claim 13 or 14,
Large-area imprinting method, characterized in that the material of the elastic plate comprises silicon. The method according to claim 13 or 14,
And a gasket disposed between the inner surface of the one surface of the chamber and the ultraviolet light transmitting plate. The method according to claim 13 or 14,
The process of pressurizing the elastic plate by supplying gas into the internal space is characterized in that to apply a uniform pressure to the entire elastic plate.

Images