KR20030083644A - imprinting substrate holding device and imprinting device - Google Patents

Abstract

PURPOSE: An imprinting substrate support apparatus and an imprinting apparatus are provided to be capable of stably fixing a stamp and a base substrate, and accurately carrying out the position alignment of the stamp and the base substrate for forming an aiming nanometer or micrometer pattern at the base substrate. CONSTITUTION: An imprinting substrate support apparatus(200) is provided with a pattern formed stamp(210) and a polymer stacked base substrate(211). At this time, the pattern of the stamp is directly formed at the base substrate by carrying out an imprinting process after fixing the base substrate under the predetermined position aligning state. The imprinting substrate support apparatus further includes a cavity part(228) for storing the stamp and the base substrate, an exhaust part(222) for generating a vacuum state of the cavity part, a storage body having an exhaust port(221), connected with the exhaust part, and sealing part for blocking the cavity part from the outside.

Description

Imprinting substrate holding device and imprinting device

The present invention relates to an imprinting apparatus and an imprinting substrate support apparatus for imprinting a pattern, and in particular, an imprinting apparatus and an imprinting substrate support for imprinting a pattern having a nanometer or micrometer size. Relates to a device.

The technique for forming nanometer-sized patterns is often referred to as nanotechnology (NT). Nanotechnology is a technology that produces and utilizes nanometer-sized materials, structures, instruments, machines, and devices. In general, materials and devices having a size of 100 nm or less belong to the category of nanotechnology. Nanotechnology is a basic technology for realizing information technology (IT) and biotechnology (BT). Most production, processing and application technologies are closely related to nanotechnology.

A key technology in nanotechnology with the above meaning is nanoprocessing technology that enables the production and utilization of nanometer-sized materials and devices. Nano process technology is a top down method such as planar technology in semiconductor device fixing and a bottom up method for manufacturing nanomaterials and devices using self-assembly technology of atoms and molecules. Divided. The bottom up method is not currently used due to technical limitations, but the top town method is currently a commercially available technology.

Nano-process technology is a lithography technology that forms nanometer-sized ultra-fine patterns is a key technology. Currently, optical lithography is mainly used as a lithography technique for forming fine patterns. However, the optical lithography technique is excellent for forming a micron pattern having a size of 100 nm or more, but has a limitation in forming an ultra-fine nano pattern having a size of less than that.

Therefore, in order to form nanopatterns, a new type of lithography technology is required instead of optical lithography technology. As a typical lithography technology for forming nanopatterns, x-ray lithography technology and electron beam (e-beam) lithography are required. Technology, proximal lithography technology, nano imprinting lithography technology and the like have been proposed as an alternative to optical lithography technology.

X-ray lithography technology can form a nano-pattern of 20nm or less, but it is difficult to manufacture the optical system used and requires a high cost, there is a problem that is not commercially practical. Electron beam lithography technology can form nanopatterns at low cost, but has a problem of low process yield. The proximal lithography technique can form nanoscale patterns of several nanometers corresponding to the size of atoms or molecules, but as a representative bottom-up technique, as described above, there is a problem of low practical use.

On the other hand, nano imprinting lithography (nano imprinting lithography) technology can easily form a nano-pattern (nano pattern), it is possible to mass production has the advantage of high process yield.

The nanoimprinting lithography technique described above can also be used to form micrometer-sized patterns. That is, imprinting lithography techniques can be used in place of optical lithography techniques to form micrometer-sized patterns.

Hereinafter, an imprinting lithography technique for forming a pattern of nanometer or micrometer size will be described.

1A-1C illustrate an imprinting lithography process. As shown, the stamp 9 on which the pattern structure 11 of nanometer or micrometer size is formed and the base substrate 19 on which the polymer 22 is formed are correspondingly located.

The stamp 9 has a predetermined pattern structure 11 formed below the first substrate 10. As the first substrate 10, a silicon substrate which is easy to process is mainly used, and a glass substrate may be used instead to manufacture the transparent stamp 9. The pattern structure formed on the first substrate 10 is generally made of silicon oxide (SiO _x ). The silicon oxide is deposited on the first substrate 10, and the pattern structure 11 is formed by performing an electron beam lithography process and an etching process.

The polymer 21 is laminated on the base substrate 19 on the second substrate 20. As the second substrate, a silicon substrate is mainly used, and a gallium arsenide (GaAs) substrate, a quartz substrate, and an alumina substrate may be used. As the polymer 21 formed on the second substrate 20, a thermoplastic resin such as polymethylmethacrylate (PMMA, hereinafter referred to as PMMA) is generally used. A transparent stamp 9 is used. In the case of use, a resin polymerized by ultraviolet rays can be used.

Hereinafter, an imprint lithography process of imprinting the pattern structure 11 of the stamp 9 on the base substrate 19 will be described.

As shown in Fig. 1A, the stamp 9 on which the pattern structure 11 is formed and the base substrate 19 on which the polymer 21 is laminated are correspondingly positioned. In order to form a desired pattern on the base substrate 19, the stamp 9 and the base substrate 19 must be accurately aligned.

Thereafter, as shown in FIG. 1B, pressure is applied to the stamp 9 and the base substrate 19 to compress the stamp 9 and the base substrate 19. When pressed, the pattern structure 11 formed on the stamp 9 is imprinted on the polymer 21. The imprinting process requires a constant pressure and temperature. When using PMMA as a polymer, a pressure of 1000 psi and a temperature of 180 ° C or more are required.

Thereafter, as shown in FIG. 1C, the compressed stamp 9 and the base substrate 19 are separated. The two substrates 9 and 19 are separated from each other so as not to damage the pattern 22 formed on the base substrate 19.

Through the nano-imprinting lithography process as described above, the pattern structure 11 formed on the stamp 9 is imprinted on the polymer 21 of the base substrate 19.

In order to correctly imprint the pattern structure 11 formed on the stamp 9 on the base substrate 19 in the above-described imprint lithography process, the stamp 9 and the base substrate 19 must be correctly aligned. A constant pressure must be applied to the stamp 9 and the base substrate 19. For alignment and pressure application, the stamp 9 and the base substrate 19 are placed in an imprinting substrate holder and undergo an imprint lithography process.

2 shows a conventional imprinting substrate support device 100.

As shown in the drawing, the conventional imprinting substrate supporting apparatus 100 is composed of elastic plates 131 and 132 having elastic force and fixing bodies 141 and 142 for fixing the elastic plates 131 and 132. The elastic plates 131 and 132 include a first elastic plate 131 and a second elastic plate 132, and the fixing bodies 141 and 142 include the first fixing body 141 and the second fixing body 142. It consists of.

The elastic plates 131 and 132 have a disc shape and are made of a polymer polymer such as rubber having elastic force. The stamp 109 and the base substrate 119 are positioned between the first elastic plate 131 and the second elastic plate 132. In order to imprint the pattern structure of the stamp 109 on the base substrate 119, pressure is applied to the first elastic plate 131 and the second elastic plate 132. The stamp 109 and the base substrate 119 are compressed by the applied pressure to form a pattern on the base substrate 119.

Each of the first fixing body 141 and the second fixing body 142 has an inner space that is opened up and down and fixes the first elastic body plate 131 and the second elastic body plate 132 so as not to move.

When pressure is applied to the conventional imprinting support apparatus 100 configured as described above, pressure is applied to the first elastic plate 131 and the second elastic plate 132 to compress the stamp 109 and the base substrate 119. As a result, a pattern is formed on the base substrate 119.

In order to apply pressure to the imprinting substrate support device 100, the imprinting substrate support device 100 is positioned in the chamber 150 of FIG. 3.

As shown, the imprinting support device 100 in which the stamp 109 and the base substrate 119 are located is positioned in the chamber 150, and the pressure in the chamber 150 is raised through the valve 160. The pattern is formed on the base substrate 119 by the pressure in the chamber 150.

By the way, in the case of using the imprinting substrate supporting apparatus 100 described above, the position alignment relationship between the stamp 109 and the base substrate 119 is disturbed, so that a pattern is not preferably formed on the base substrate 119. Since the pattern is an ultrafine pattern of nanometer or micrometer size, if the alignment of the stamp 109 and the base substrate 119 is disturbed, a desired pattern may not be formed on the base substrate 119.

SUMMARY OF THE INVENTION An object of the present invention for solving the above problems is an imprinting substrate support device capable of correctly aligning a stamp and a base substrate to form a desired pattern of nanometer or micrometer size on the base substrate In providing a printing apparatus.

1A-1C are perspective views illustrating an imprinting lithography process.

Figure 2 is a cross-sectional view showing a conventional imprinting substrate support device.

Figure 3 is a cross-sectional view schematically showing a conventional imprinting substrate support device and the imprinting chamber.

4 is a cross-sectional view showing an imprinting substrate supporting apparatus according to a first embodiment of the present invention.

5A and 5B are a plan view and a cut perspective view, respectively, of a container according to a first embodiment of the present invention;

6 is a perspective view showing an elastic body plate according to the first embodiment of the present invention.

7a and 7b are cut perspective views showing a fixture and a coupling means according to the first embodiment of the present invention.

8A and 8B are cross-sectional views showing the operation of the imprinting substrate supporting apparatus according to the first embodiment of the present invention.

9 is a cross-sectional view showing an imprinting substrate supporting apparatus and an imprinting chamber according to the first embodiment of the present invention.

10 is a cross-sectional view showing an imprinting substrate supporting apparatus according to a second embodiment of the present invention.

11 is a cut perspective view of a container according to a second embodiment of the present invention;

12A and 12B are perspective views showing first and second elastic plates according to a second embodiment of the present invention, respectively.

13 is a perspective view showing a first buffer member according to a second embodiment of the present invention.

14 is a perspective view showing a transparent plate according to a second embodiment of the present invention.

Figure 15 is a perspective view of the cutting and the coupling means according to a second embodiment of the present invention.

16A and 16B are cross-sectional views showing the operation of the imprinting substrate supporting apparatus according to the second embodiment of the present invention.

17 is a cross-sectional view showing an imprinting substrate supporting apparatus and an imprinting chamber according to a second embodiment of the present invention.

18 is a cross-sectional view showing an imprinting substrate supporting apparatus according to a third embodiment of the present invention.

19 is a sectional view showing an imprinting substrate supporting apparatus according to a fourth embodiment of the present invention.

20 is a cut perspective view of a substrate support according to a fourth embodiment of the present invention;

21A and 21B are sectional views showing an operation process of the imprinting substrate supporting apparatus according to the fourth embodiment of the present invention.

<Description of Symbols for Major Parts of Drawings>

200: nano imprinting substrate support device 210: nano stamp

211: base substrate 220: support

221: outlet 222: discharge pipe

224a, 224b: protrusion 225: first valve

228: first hollow portion 241, 242: fixed body

In order to achieve the object as described above, the present invention, by fixing the position alignment state of the stamped pattern and the base substrate laminated the polymer on which the pattern is imprinted to form the pattern on the base substrate, A receiver having a hollow portion for receiving the stamp and the base substrate, the receptacle having a discharge port connected to discharge means for vacuuming the hollow portion; It provides an imprinting substrate supporting apparatus comprising a sealing member for sealing the hollow from the outside.

Here, the sealing member, the first and second elastic body plates having an elastic force to seal the hollow portion from the outside and face each other; The first and second elastic plates may be pressed in the direction in which the first and second elastic plates face each other, and may include a fixing member for exposing the first and second elastic plates to the outside.

An elastic body plate having elastic force and a transparent plate transparent to light, which seal the hollow part from the outside and face each other; The elastic plate and the transparent plate may include a fixing member for pressing the elastic plate and the transparent plate in a direction facing each other, exposing the elastic plate and the transparent plate to the outside.

The sealing member may include: an elastic body plate having an elastic force and a heat transfer plate for transferring heat to the polymer to seal the hollow part from the outside and face each other; The elastic plate and the heat transfer plate in a direction facing each other may press the elastic plate and the heat transfer plate, and may include a fixing member for exposing the elastic plate and the heat transfer plate to the outside.

It is placed on the elastic plate, the stamp and the base substrate is placed, has an inner space open in the direction of the elastic plate and the transparent plate, the hollow portion prevents the elastic plate is deformed to block the outlet in a vacuum state The substrate support may further include.

And, placed on the elastic plate, the stamp and the base substrate is placed, has an inner space open in the direction of the elastic plate and the heat transfer plate, the hollow portion deforms the elastic plate in the vacuum state to block the outlet It may further include a substrate support for preventing.

The receptor may be in the shape of a ring. The receptor may have one or more protrusions protruding in the direction of each of the first and second elastic body plates. The receptor may have one or more protrusions protruding in the elastic plate direction.

The fixing member includes: first and second fixing bodies for pressing the first and second elastic body plates, respectively; It may include a coupling means for coupling the first and second fixtures. The fixing member may include: first and second fixing bodies for pressing the transparent plate and the elastic plate, respectively; It may include a coupling means for coupling the first and second fixtures. In addition, the fixing member, the first and second fixing body for pressing each of the heat transfer plate and the elastic plate; It may include a coupling means for coupling the first and second fixtures.

The hollow body may further include a plate-shaped elastic body placed on the stamp and having the elastic force contacting the transparent plate in a vacuum state. And, it may further include a plate-shaped elastic body placed on the stamp, the hollow portion has an elastic force in contact with the heat transfer plate in a vacuum state.

The transparent plate may be made of a material transparent to a selected one of ultraviolet rays and infrared rays, and the transparent plate may be made of quartz. The apparatus may further include a temperature controller for raising and lowering the temperature of the heat transfer plate, wherein the temperature controller includes: a coil configured to increase the temperature of the heat transfer plate by flowing current; A low temperature fluid flow may include a cooling device for lowering the temperature of the heat transfer plate.

The substrate support may include a protruding end protruding from an inner circumferential surface of the substrate support, on which the stamp and the base substrate are placed; Protruding to the outer peripheral surface of the substrate support, the hollow portion may have a preventive end to prevent the elastic plate is deformed in the vacuum state to block the outlet.

In another aspect, the present invention provides a printing apparatus comprising: at least one imprinting substrate support device for fixing the pattern on the base substrate by fixing a position alignment of a base substrate having a stamp having a pattern formed thereon and a polymer into which the pattern is imprinted; A chamber accommodating the imprinting substrate support device in an inner space; And a pressure applying means connected to the chamber, wherein the imprinting substrate supporting apparatus has a hollow portion for receiving the stamp and the base substrate, and has a discharge port connected to discharge means for making the hollow portion in a vacuum state. And it provides an imprinting apparatus having a sealing member for sealing the hollow from the outside.

Here, the at least one imprinting substrate support device may be arranged in parallel in the chamber.

The sealing member may include: first and second elastic body plates having the elastic force to seal the hollow part from the outside and face each other; The first and second elastic plates may be pressed in the direction in which the first and second elastic plates face each other, and may include a fixing member for exposing the first and second elastic plates to the outside.

The sealing member may include: an elastic body plate having elastic force and a transparent plate transparent to light to seal the hollow part from the outside and face each other; The elastic plate and the transparent plate may include a fixing member for pressing the elastic plate and the transparent plate in a direction facing each other, exposing the elastic plate and the transparent plate to the outside.

The sealing member may include an elastic body plate having an elastic force and a heat transfer plate for transferring heat to the polymer to seal the hollow part from the outside and face each other; the elastic body in a direction in which the elastic plate and the heat transfer plate face each other. The plate and the heat transfer plate may be pressed, and may include a fixing member for exposing the elastic plate and the heat transfer plate to the outside.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

<First Embodiment>

4 is a view illustrating an imprinting substrate supporting apparatus 200 according to a first embodiment of the present invention, in which a first valve 225 operates to receive a receiver 220 in which a stamp 210 and a base substrate 211 are located. The imprinted substrate support apparatus 200 in which the 1st hollow part 228 of () is made into the vacuum state is shown.

The imprinting substrate supporting apparatus 200 correctly corrects the base substrate 211 on which the stamp 210 and the polymer 213 are laminated on the substrate 212 in order to proceed with an imprinting lithography process in a vacuum environment. By alignment, the nanometer or micrometer sized pattern structure formed on the stamp 210 is imprinted on the polymer 213 of the base substrate 211 to form a desired pattern.

The imprinting substrate supporting apparatus 200 has a first hollow portion 228 which receives the stamp 210 and the base substrate 211, and discharge means for discharging the air of the first hollow portion 228. The substrate container 220 having a discharge port 221 connected to the first valve 225, and a sealing member sealing the first hollow part 228 from the outside.

The sealing member includes elastic members 231 and 232 contacting the upper and lower surfaces of the receiver 220, and fixing members for fixing the receiver 220 and the elastic plates 231 and 232. 241 and 242 and coupling means 223 for fixing the fixtures 241 and 242. Herein, the elastic plates 231 and 232 are formed of the first elastic plate 231 and the second elastic plate 232 facing each other, and the fixing bodies 241 and 242 are the first fixing bodies 241 facing each other. And a second fixture 242.

Since the first hollow part 228 is in a vacuum state, the first elastic plate 231 and the second elastic plate 232 are pressurized in a direction facing each other due to the pressure difference between the first hollow part 228 and the outside. The shape is elastically deformed. The first elastic plate 231 and the second elastic plate 232 elastically deformed press the stamp 210 and the base substrate 211, so that the alignment state of the stamp 210 and the base substrate 211 is It is fixed.

Hereinafter, the imprinting substrate supporting apparatus 200 will be described in detail with reference to FIGS. 4 to 7.

5A and 5B are respectively a plan view and a cutaway perspective view of the receptor 220, FIG. 6 is a perspective view of the elastic plates 231 and 232, and FIGS. 7A and 7B are fixed bodies 241 and 242, It is a cutting perspective view which shows the coupling means 223 penetrating the fixtures 241 and 242. As shown in FIG.

The receptor 220 is formed in a ring shape with a first hollow portion 228 open up and down in the receptor inner peripheral surface 226. The receptor 220 has a discharge port 221 penetrating through the receptor inner circumferential surface 226 and the outer circumferential surface 227, and a discharge pipe 222 connected to the discharge port 221 and the first valve 225. In addition, protrusions 224a and 224b protruding outward are formed on the upper and lower surfaces of the receiver 220, respectively. The receptor 220 is made of a metal material to minimize the shape change.

The stamp 210 and the base substrate 211 are positioned in the first hollow portion 228 of the receiver 220. Meanwhile, the receptor 220 may have a polygonal shape in which the inner circumferential surface 226 is opened up and down to accommodate the stamp 210 and the base substrate 211. The first hollow part 228 forms a closed space by the first elastic body plate 231 and the second elastic body plate 232.

The discharge port 221 and the discharge pipe 222 formed in the container 220 have a first hollow portion 228 forming a space closed by the first elastic plate 231 and the second elastic plate 232. In connection with 225, the pressure of the first hollow part 228 is adjusted.

For example, when the stamp 210 and the base substrate 211 are positioned in the first hollow portion 228 in a state where they are aligned to form a pattern, the first valve 225 may be operated to form the container 220. The air of the first hollow portion 228 exits through the outlet 221 and the discharge pipe 222, whereby the first hollow portion 228 of the receiver 220 is in a vacuum state. Accordingly, pressure is applied to the first elastic body plate 231 and the second elastic body plate 232 due to the pressure difference between the outside and the first hollow part 228, and the first elastic body plate 231 and the second elastic body plate. 232 presses the stamp 210 and the base substrate 211, so that the alignment state of the stamp 210 and the base substrate 211 is continuously maintained.

The protrusions 224a and 224b formed on the upper and lower surfaces of the receiver 220 are press-fitted into the first elastic body plate 231 and the second elastic body plate 232 having elastic force. In particular, the fixtures 241 and 242 press the elastic plates 231 and 232 to exert pressure, and the protrusions 224a and 224b are press-fitted into the elastic plates 231 and 232 by the applied pressure. Accordingly, the first hollow portion 228 is completely blocked from the outside, and the outside air does not enter the first hollow portion 228. Thus, when the first valve 225 is operated, the outside air does not enter the first hollow portion 228, so that the first hollow portion 228 is in a complete vacuum state.

In addition, movement of the first elastic plate 231 and the second elastic plate 232 is prevented by the protrusions 224a and 224b, thereby preventing the movement of the stamp 210 and the base substrate 211.

A plurality of protrusions 224a and 224b formed on the upper and lower surfaces of the receptor 220 may be formed within an acceptable range. When the protrusions 224a and 224b increase, the first hollow part 228 may be further blocked from the outside, and the receiver 220 may more firmly fix the elastic plates 231 and 232.

Each of the first elastic body plate 231 and the second elastic body plate 232 has a disk shape and faces each other. The first elastic plate 231 and the second elastic plate 232 are made of an elastic polymer material such as polydimethylsiloxane (PDMS) and silicone rubber.

As described above, each of the surfaces facing the first elastic plate 231 and the second elastic plate 232 is in contact with the upper and lower surfaces of the receiver 220 to close the first hollow portion 228 of the receiver 220. To become a free space. Therefore, when the first hollow portion 228 of the container 220 is in a vacuum state, the first elastic body plate 231 and the second elastic body plate 232 are deformed in a direction facing each other due to the pressure difference, Accordingly, the stamp 210 and the base substrate 211 are pressed. Therefore, the alignment state of the stamp 210 and the base substrate 211 is fixed.

The first fixing body 241 and the second fixing body 242 include a second hollow part 261 and a third opening vertically open in the inner circumferential surface of each of the first fixing body 241 and the second fixing body 242. It is formed in an annular structure having a hollow portion 262 and faces each other.

The first fixing member 241 and the second fixing member 242 are provided with a first coupling end 245 and a second coupling end 246 which protrude from each other along the outer circumferential surface thereof, and have a first coupling. A plurality of coupling holes 251 and 252 are formed at the stage 245 and the second coupling stage 246. The coupling means 223 fixes the first fixture 241 and the second fixture 242 through coupling holes 251 and 252 formed in the first coupling end 245 and the second coupling end 246. . Coupling means 223 is to use a screw (screw) or the like.

Each of the facing surfaces of the first fixing body 241 and the second fixing body 242 is in contact with the outer surfaces of the first elastic plate 231 and the second elastic plate 232, and the first coupling end 241. The inner circumferential surface of the second coupling end 242 is in contact with the outer circumferential surface of the first elastic plate 231, the outer circumferential surface of the second elastic plate 232, and the outer circumferential surface 227 of the receiver. The first fixture 241 and the second fixture 242 having such a structure prevent the first elastic plate 231, the second elastic plate 232, and the receiver 220 from being moved by tightening them. Fix it.

Each of the first fixture 241 and the second fixture 242 coupled by the coupling means 223 presses the first elastic plate 231 and the second elastic plate 232, thereby receiving the receiver 220. Each of the protrusions 224a and 224b formed on the upper and lower surfaces of the upper and lower surfaces is pressed into the first elastic body plate 231 and the second elastic body plate 232. Therefore, the first hollow part 228 is completely blocked from the outside, and the first elastic plate 231 and the second elastic plate 232 are fixed without being moved.

Each of the first fixing body 241 and the second fixing body 242 has a second hollow part 261 and a third hollow part 262, and the second hollow part 261 and the third hollow part are respectively. The first elastic plate 231 and the second elastic plate 232 are exposed to the outside through 262. Accordingly, the pressure applied from the outside to form the pattern acts on the first elastic plate 231 and the second elastic plate 232 through the second hollow part 261 and the third hollow part 262. . In addition, when the first hollow part 228 in the container 220 is in a vacuum state, the first elastic body plate 231 and the second elastic body plate 232 are caused by the pressure difference between the first hollow part 228 and the outside. The pressure applied to) acts through the second hollow part 261 and the third hollow part 262.

As described above, the first hollow portion 228, the second hollow portion 261, and the third hollow portion 262 preferably have coincident central axes, and also the central axis and the stamp and base substrate ( The central axes of 210 and 211 are preferably coincident.

The imprinting substrate supporting apparatus 200 having the above-described configuration makes the first hollow portion 228 in a vacuum state to form a pattern so that the stamp 210 and the base substrate 211 are correctly aligned. Therefore, when pressure is applied to the first elastic plate 231 and the second elastic plate 232, the pattern formed on the stamp 210 is imprinted correctly on the base substrate 211.

Hereinafter, an operation process of the imprinting substrate supporting apparatus 200 according to the embodiment of the present invention will be described with reference to FIGS. 8A and 8B.

As shown in FIG. 8A, the stamp 210 and the base substrate 211 are placed on the second elastic plate 232 to form a pattern, and are located in the first hollow part 228. The stamp 210 and the base substrate 211 are correctly positioned so that the pattern of the stamp 210 is imprinted correctly on the polymer 213 of the base substrate 211. Preferably, the stamp 210 and the base substrate 211 are placed in the middle of the first hollow portion 228.

The first fixture 241 and the second fixture 242 are coupled by the coupling means 223. Each of the first fixing body 241 and the second fixing body 242 coupled to each other presses the first elastic body plate 231 and the second elastic body plate 232, and thus the upper and lower surfaces of the receiver 220. The formed protrusions 224a and 224b are pressed into the first elastic body plate 231 and the second elastic body plate 232 so that the first hollow part 228 forms a closed space. In addition, the first elastic plate 231 and the second elastic plate 232 are fixed to prevent movement.

After the first fixture 241 and the second fixture 242 are coupled, as shown in FIG. 8B, the first valve 225 connected to the discharge pipe 222 is operated. The first valve 225 discharges the air of the first hollow portion 228 to the outside, so that the closed first hollow portion 228 is in a vacuum state.

When the first hollow part 228 is in a vacuum state, the first hollow part 228 has a lower pressure than the outside, so that each of the first elastic plate 231 and the second elastic plate 232 receives pressure from the outside. Will receive. The first elastic body plate 231 and the second elastic body plate 232 are deformed in a direction facing each other by the pressure applied from the outside. Each of the deformed first elastic plate 231 and the second elastic plate 232 presses the stamp 210 and the base substrate 211, whereby the position alignment of the stamp 210 and the base substrate 211 is firm. Is fixed.

As described above, the imprinting substrate supporting apparatus 200 makes the first hollow portion 228 in a vacuum state to firmly fix the position alignment state of the stamp 210 and the base substrate 211.

The stamp 210 and the base substrate 211 correctly positioned by the imprinting substrate support device 200 are compressed by the pressure applied from the outside during the imprinting lithography process so that the pattern is correctly placed on the base substrate 211. It is printed.

FIG. 9 illustrates an imprinting chamber 300 in which one or more imprinting substrate support devices 200 are disposed to proceed with an imprinting lithography process.

As shown, a plurality of imprinting substrate support devices 200 having a first valve 225 are disposed in parallel in the imprinting chamber 300. In addition, a second valve 350 for adjusting the air pressure in the imprinting chamber 300 is connected to the imprinting chamber 300.

As described above, the imprinting substrate supporting apparatus 200 uses the first valve 225 to vacuum the first hollow portion (see 228 of FIG. 4) inside the container 220 and the stamp 210. The position alignment state of the base substrate 211 is firmly fixed.

Accordingly, at least one imprinting substrate support device 200 for firmly fixing the position alignment of the stamp 210 and the base substrate 211 may be positioned in the imprinting chamber 300 to simultaneously perform an imprinting lithography process. Will be. In particular, the imprinting substrate supporting apparatus 200 may be configured in parallel to efficiently use the internal space of the imprinting chamber 300.

When the at least one imprinting substrate support device 200 in which the first hollow part 228 is in a vacuum is disposed in parallel in the imprinting chamber 300, the imprinting chamber 300 and the imprinting lithography process may be used to proceed with the imprinting lithography process. The connected second valve 350 is activated.

In order to form the pattern on the base substrate 211, the second valve 350 injects air into the imprinting chamber 300 to increase the pressure in the space inside the imprinting chamber 300. When the predetermined pressure is reached, the stamp 210 and the base substrate 211 are compressed to form a pattern on the base substrate 211.

In particular, since the stamp 210 and the base substrate 211 are firmly fixed by the first elastic plate 231 and the second elastic plate 232 having elastic force, the first elastic plate 231 and the second elastic body are fixed. An isotropic pressure is applied to the plate 232, so that an isotropic pressure is applied to the stamp 210 and the base substrate 211 so that the pattern is correctly formed on the base substrate 211.

After the pattern is formed on the base substrate 211, the second valve 350 is operated to discharge the air inside the imprinting chamber 300.

In the same manner as described above, an imprinting lithography process is performed and a pattern is preferably formed on the base substrate 211.

One or more imprinting substrate supporting apparatuses 200 are arranged in parallel in the imprinting chamber 300, and the number of imprinting substrate supporting apparatuses 200 is determined within a range allowed by the imprinting chamber 300. . In addition, the imprinting substrate support apparatus 200 may be disposed using the internal space of the imprinting chamber 300 to the maximum. Therefore, the imprinting lithography process may be simultaneously performed on one or more imprinting substrate supporting apparatuses 200. In addition, an isotropic pressure is applied to the imprinting substrate supporting apparatus 200 so that a pattern may be preferably formed on the base substrate 211.

Second Embodiment

FIG. 10 illustrates an imprinting substrate supporting apparatus 400 according to a second embodiment of the present invention, in which a first valve 425 operates to accommodate a receiver 420 on which a stamp 410 and a base substrate 411 are located. The imprinted substrate supporting apparatus 400 in which the first hollow part 428 of the cavities is in a vacuum state is illustrated.

The imprinting substrate supporting apparatus 400 according to the second embodiment of the present invention correctly positions the base substrate 411 on which the stamp 410 and the polymer 413 are stacked in order to proceed with the imprinting lithography process in a vacuum state. Aligned, a device for forming a desired pattern by imprinting the nanometer or micrometer sized pattern structure formed on the stamp 410 to the polymer 413 of the base substrate 411.

In particular, the imprinting substrate supporting apparatus 400 according to the second embodiment of the present invention is a transparent plate 450, a first elastic plate 431, a stamp 410 transparent to ultraviolet (Infrared ray) or infrared ray (infrared ray) In the imprinting lithography process, ultraviolet rays or infrared rays are irradiated so that the pattern formed on the polymer 413 may be UV-cured or thermally cured to easily form the polymer 413. The polymer 413 to be used is a resin that is cured by ultraviolet rays or infrared rays.

The imprinting substrate supporting apparatus 400 has a first hollow portion 428 for receiving the stamp 410 and the base substrate 411, and discharge means for discharging the air of the first hollow portion 428. Receptor 420 having a discharge port 421 connected to the first valve 425 and the first hollow portion 428 is composed of a sealing member for sealing from the outside.

The sealing member includes a second elastic body plate 432 in contact with the bottom surface of the container 420, a first buffer material 460 positioned on the container 420, and a transparent plate 450 located on the first buffer material 460. And a fixing member for fixing the receptor 420, the second elastic plate 432, and the transparent plate 450.

The fixing member is composed of fixing members 441 and 442 and coupling means 423 for fixing the fixing members 441 and 442. Here, the fixtures 441 and 442 may include a first fixture 441 and a second fixture 442 facing each other. In addition, the first elastic body plate 431 is positioned on the stamp 410. A second buffer member 470 is interposed between the first fixture 441 and the transparent plate 450.

Since the first hollow part 428 is in a vacuum state, the second elastic plate 432 is pressurized in a direction facing the transparent plate 450 due to a pressure difference between the first hollow part 428 and the outside. Is elastically deformed. As the second elastic plate 432 is elastically deformed, the first elastic plate 431 placed on the stamp 410 is in contact with the transparent plate 450 and presses the transparent plate 450, thereby reacting accordingly. As a result, the transparent plate 450 exerts a pressure on the first elastic body plate 431. Accordingly, the first elastic plate 431 and the second elastic plate 432 press the stamp 410 and the base substrate 411, so that the alignment state of the stamp 410 and the base substrate 411 is fixed.

Hereinafter, the imprinting substrate supporting apparatus 400 will be described in detail with reference to FIGS. 10 to 15.

FIG. 11 is a cutaway perspective view of the receptor 420, and FIGS. 12A and 12B are perspective views of the first and second elastic plates 431 and 432, respectively, and FIG. 13 is a view of the first buffer material 460. 14 is a perspective view of the transparent plate 450, and FIG. 15 is a cut perspective view of the fixing members 441 and 442 and the coupling means 423 penetrating through the fixing members 441 and 442. FIG. .

The container 420 is formed in the annular structure which has the 1st hollow part 428 opened up and down in the inner peripheral surface 426 of the container. The receptor 420 has a discharge port 421 penetrating through the receptor inner circumferential surface 426 and the outer circumferential surface 427, and a discharge pipe 422 connected to the discharge port 421 and the first valve 425. And the lower surface of the container 420 is formed with a protrusion 424 protruding outward. On the other hand, the receptor 420 is made of a metal material to minimize the shape change.

The stamp 410 and the base substrate 411 are positioned in the first hollow portion 428 of the container 420 having an annular shape. Meanwhile, the receptor 420 may have a polygonal shape in which the inner circumferential surface 426 is opened up and down to accommodate the stamp 410 and the base substrate 411. The first hollow part 428 forms a space closed by the second elastic body plate 432, the first cushioning material 460, and the transparent plate 450.

The discharge hole 421 and the discharge pipe 422 formed in the container 420 may include a first hollow part constituting a space closed by the second elastic body plate 432, the first cushioning material 460, and the transparent plate 450 ( 428 is connected with the first valve 425 to regulate the pressure of the first hollow part 428.

For example, when the stamp 410 and the base substrate 411 are positioned in the first hollow portion 428 in a state where they are aligned to form a pattern, the first valve 425 operates to operate the first hollow portion ( 428, the air exits through the discharge port 421 and the discharge pipe 422, so that the first hollow part 428 is in a vacuum state. Pressure is applied to the second elastic plate 432 by the pressure difference between the outside and the first hollow part 428 so that the second elastic plate 432 is elastically deformed in a direction facing the transparent plate 450. . As the second elastic plate 432 is elastically deformed, the first elastic plate 431 placed on the stamp 410 is in contact with the transparent plate 450 and presses the transparent plate 450, thereby reacting accordingly. As a result, the transparent plate 450 exerts a pressure on the first elastic body plate 431. Accordingly, the first elastic plate 431 and the second elastic plate 432 press the stamp 410 and the base substrate 411, so that the alignment state of the stamp 410 and the base substrate 411 is fixed.

The protrusion 424 formed on the lower surface of the receiver 420 is pressed into the second elastic plate 432 having elastic force. In particular, the second fixing body 442 applies a pressure to the second elastic body plate 432, and the protrusion 424 is press-fitted into the second elastic body plate 432 by the applied pressure, so that the outside air is the first air. It is impossible to enter the hollow part 428.

In addition, the first fixing member 441 exerts a pressure on the transparent plate 450, and the first shock absorbing material 460 is deformed by the applied pressure so that the outside air is transferred to the first hollow part 428. You won't be invading.

Accordingly, the first hollow part 428 is completely blocked from the outside, and the outside air does not enter the first hollow part 428 when the first valve 425 is operated, so that the first hollow part 428 Is a complete vacuum.

In addition, the second elastic plate 432 is prevented from moving by the protrusion 424, and thus the movement of the stamp 410 and the base substrate 411 placed on the second elastic plate 432 is prevented.

A plurality of protrusions 424 formed on the bottom surface of the receptor 420 may be formed within an acceptable range. As the protrusion 424 increases, the first hollow part 428 may be further completely blocked from the outside, and the receiver 420 may more firmly fix the second elastic plate 432.

The first elastic body plate 431 has a disc shape and is formed of a thin thin plate. The first elastic plate 431 is placed on the stamp 410, and the first hollow portion 428 is in contact with the transparent plate 450 when the vacuum state. Since the first elastic plate 431 has elastic force, when the first hollow part 428 is in a vacuum state, the first elastic plate 431 is in contact with the transparent plate 450 and presses the transparent plate 450. The stamp 410 is pressed by the pressure from the 450. In addition, when the first hollow part 428 is in a vacuum state, the first hollow part 428 is interposed between the stamp 410 and the transparent plate 450 to serve as a buffer material.

The first elastic plate 431 is made of an elastic material transparent to ultraviolet or infrared light. Accordingly, the pattern is easily formed on the base substrate 411 by ultraviolet curing or thermosetting the pattern formed on the polymer 413 by passing ultraviolet or infrared rays irradiated from the outside in the imprinting lithography process.

The second elastic body plate 432 has a disk shape. The second elastic plate 432 is made of an elastic polymer material such as polydimethylsiloxane and silicone rubber.

The second elastic plate 432 is in contact with the bottom surface of the container 420 so that the first hollow portion 428 of the container 420 is a closed space. Therefore, when the first hollow part 428 of the container 420 is in a vacuum state, the second elastic body plate 432 is deformed in a direction facing the transparent plate 450 by the pressure difference.

As the second elastic plate 432 is deformed by a pressure difference, the first elastic plate 431 is in contact with the transparent plate 450, and the transparent plate 450 presses the first elastic plate 431. Accordingly, the first elastic plate 431 and the second elastic plate 432 press the stamp 410 and the base substrate 411, so that the alignment state of the stamp 410 and the base substrate 411 is fixed.

The first buffer material 460 is interposed between the transparent plate 450 and the container 420. The first cushioning material 460 is made of a material having an elastic force and is formed in an O-ring shape. When pressure is applied to the transparent plate 450 by the first fixing member 441, the first shock absorbing material 460 is deformed to block the first hollow part 428 from the outside, and external air is removed. 1 to prevent entry into the hollow 428. In addition, the transparent plate 450 is interposed between the receptor 420 to prevent the defect from occurring in the transparent plate 450.

The transparent plate 450 is formed in a disc shape and is fixed by the first fixing member 441, and the first hollow part 428 is blocked from the outside by pressing the first buffer member 460. When the first hollow part 428 is in a vacuum state, the transparent plate 450 is in contact with the first elastic body plate 431. In the vacuum state, the transparent plate 450 exerts a pressure on the first elastic body plate 431, whereby the position alignment of the stamp 410 and the base substrate 411 is fixed.

On the other hand, the transparent plate 450 is made of a material transparent to ultraviolet or infrared light, such as quartz, to pass the ultraviolet or infrared light emitted from the outside during the imprinting lithography process.

Since the transparent plate 450 is made of a material such as quartz that is not easily deformed by a pressure applied from the outside, the first fixing member 441 and the transparent plate 450 are in direct contact with each other. In order to prevent that, a second cushioning material 470 having an elastic force is positioned between the first fixing member 441 and the transparent plate 450.

The first fixing body 441 and the second fixing body 442 are each of the second hollow portion 461 and the third opening that are vertically opened in the inner circumferential surface of each of the first fixing body 441 and the second fixing body 442. It is made of an annular shape having a hollow portion 462, and facing each other.

The first fixing member 441 and the second fixing member 442 are provided with a first coupling end 445 and a second coupling end 446 protruding from each other along the outer circumferential surface thereof, respectively, A plurality of coupling holes 451 and 452 are formed at the stage 445 and the second coupling stage 446. The coupling means 423 fixes the first fixture 441 and the second fixture 442 through coupling holes 451 and 452 formed in the first coupling end 445 and the second coupling end 446. . Coupling means 423 is to use a screw or the like.

The first fixture 441 and the second fixture 442 clamp the transparent plate 450, the second elastic plate 432, and the receiver 420 to prevent movement.

The first fixture 441 coupled by the coupling means 423 presses the transparent plate 450, and thus the first buffer 460 is deformed in shape. In addition, the second fixing body 442 presses the second elastic plate 432, and thus the protrusion 424 formed on the lower surface of the container 420 is pressed into the second elastic plate 432. Therefore, the first hollow part 428 is completely blocked from the outside, and the second elastic plate 432 is fixed without moving.

In addition, each of the first fixing member 441 and the second fixing member 442 has a second hollow part 461 and a third hollow part 462, and the second hollow part 461 and the third hollow part are provided. The transparent plate 450 and the second elastic plate 432 are exposed to the outside through the 462.

The pressure applied from outside to form the pattern acts on the second elastic plate 432 through the third hollow portion 462. In addition, when the first hollow part 428 in the container 420 is in a vacuum state, the pressure applied to the second elastic body plate 432 due to the pressure difference between the first hollow part 428 and the outside is increased to the third. It acts through the hollow portion 462.

As described above, the first hollow portion 428, the second hollow portion 461, and the third hollow portion 462 preferably have coincident central axes, and also the central axis and the stamp and base substrate ( The central axes of 410 and 411 are preferably coincident.

The imprinting substrate supporting apparatus 400 having the above-described configuration may fix the position alignment of the stamp 410 and the base substrate 411 by vacuuming the first hollow portion 428 to form a pattern. do. Therefore, when pressure is applied to the second elastic plate 432, the pattern formed on the stamp 410 is imprinted correctly on the base substrate 411.

Hereinafter, an operation process of the imprinting substrate supporting apparatus 400 according to the embodiment of the present invention will be described with reference to FIGS. 16A and 16B.

As shown in FIG. 16A, a stamp 410 and a base substrate 411 are placed on the second elastic plate 432 to form a pattern, and are located in the first hollow part 428 and the first elastic body. Plate 431 is placed on stamp 410. The stamp 410 and the base substrate 411 are correctly aligned so that the pattern of the stamp 410 is imprinted correctly on the polymer 413 of the base substrate 411. Preferably, the stamp 410 and the base substrate 411 are placed in the middle of the first hollow portion 428.

The first fixture 441 and the second fixture 442 are coupled by the coupling means 423. Each of the coupled first fixture 441 and the second fixture 442 presses the transparent plate 450 and the second elastic plate 432. The transparent plate 450 presses the first buffer member 460, and the protrusion 424 formed on the lower surface of the container 420 is pressed into the second elastic plate 432 so that the first hollow part 428 is closed. Will be achieved. In addition, the second elastic plate 432 is fixed to prevent movement.

After the first fixture 441 and the second fixture 442 are coupled, as shown in FIG. 16B, the first valve 425 connected to the discharge pipe 422 is operated. The first valve 425 discharges the air of the first hollow portion 428 to the outside, so that the closed first hollow portion 428 is in a vacuum state.

When the first hollow part 428 is in a vacuum state, the pressure of the first hollow part 428 is lower than that of the external space, and the second elastic plate 432 is pressurized from the outside. The second elastic body plate 432 is deformed in a direction facing the transparent plate 450 by the pressure applied from the outside. By deformation of the second elastic plate 432, the first elastic plate 431 placed on the stamp 410 is in contact with the transparent plate 450 and presses the transparent plate 450, and in response, the transparent plate The pressure 450 acts on the first elastic body plate 431.

Therefore, the first elastic plate 431 and the second elastic plate 432 press the stamp 410 and the base substrate 411, the position alignment state of the stamp 410 and the base substrate 411 is firmly fixed do.

As described above, the imprinting substrate support device 400 makes the first hollow part 428 in a vacuum state to firmly fix the position alignment of the stamp 410 and the base substrate 411.

The stamp 410 and the base substrate 411 correctly positioned by the imprinting substrate support device 400 are compressed by the pressure applied from the outside during the imprinting lithography process so that the pattern is correctly placed on the base substrate 411. It is printed.

FIG. 17 illustrates an imprinting chamber 500 in which one or more imprinting substrate support devices 400 are disposed to proceed with an imprinting lithography process.

As shown, at least one imprinting substrate support device 400 having a first valve 425 is disposed in parallel in the imprinting chamber 500. In addition, a second valve 550 for controlling the air pressure in the imprinting chamber 500 is connected to the imprinting chamber 500.

As described above, the imprinting substrate supporting apparatus 400 uses the first valve 425 to vacuum the first hollow portion (see 428 in FIG. 10) inside the container 420 and the stamp 410. The position alignment of the base substrate 411 is firmly fixed.

Accordingly, at least one imprinting substrate support device 400 for firmly fixing the position alignment of the stamp 410 and the base substrate 411 may be positioned in the imprinting chamber 500, and the imprinting lithography process may be performed at the same time. Will be. In particular, the imprinting substrate support device 400 may be disposed in parallel to efficiently use the internal space of the imprinting chamber 500.

When the at least one imprinting substrate support device 400 in which the first hollow part 428 is in a vacuum is disposed in parallel in the imprinting chamber 500, the imprinting chamber 500 and the imprinting lithography process are performed in order to proceed with the imprinting lithography process. The connected second valve 550 is activated.

In order to form the pattern on the base substrate 411, the second valve 550 injects air into the imprinting chamber 500 to increase the pressure in the space inside the imprinting chamber 500. When a certain pressure is reached, the stamp 410 and the base substrate 411 are compressed to form a pattern on the base substrate 411.

In particular, the imprinting substrate supporting apparatus 400 is firmly fixed by the first elastic plate and the transparent plates 431 and 450 having the elastic force between the stamp 410 and the base substrate 411 by the second elastic plate 432. As the isotropic pressure is applied to the second elastic plate 432, the isotropic pressure is applied to the stamp 410 and the base substrate 411 so that the pattern is correctly formed on the base substrate 411.

After the pattern is formed on the base substrate 411, the second valve 550 is operated to discharge the air inside the imprinting chamber 500.

In the same manner as described above, an imprinting lithography process is performed and a pattern is preferably formed on the base substrate 411.

Meanwhile, the pattern is more easily formed on the base substrate 411 by curing ultraviolet light or infrared rays through the transparent plate 431 to cure the polymer (see 413 in FIG. 10) during the imprinting lithography process.

One or more imprinting substrate support devices 400 are arranged in parallel in the imprinting chamber 500, and the number of imprinting substrate support devices 400 is determined within a range allowed by the imprinting chamber 500. . In addition, the imprinting substrate supporting apparatus 400 may be disposed by making the most of the internal space of the imprinting chamber 500. Therefore, the imprinting lithography process can be simultaneously performed on one or more imprinting substrate support devices 400. In addition, an isotropic pressure is applied to the imprinting substrate support device 400 so that a pattern may be preferably formed on the base substrate 411.

Third Embodiment

FIG. 18 illustrates an imprinting substrate supporting apparatus 400 according to a third embodiment of the present invention, in which a first valve 425 operates to accommodate a receiver 420 on which a stamp 410 and a base substrate 411 are located. The imprinted substrate supporting apparatus 400 in which the first hollow part 428 of the cavities is in a vacuum state is illustrated. The third embodiment of the present invention is a modification to the second embodiment of the present invention, and the description of the same or corresponding configuration as that of the second embodiment of the present invention will be omitted.

The imprinting substrate supporting apparatus 400 according to the third embodiment of the present invention uses a heat transfer plate 455 for heat transfer instead of the transparent plate (see 450 of FIG. 10) used in the second embodiment of the present invention. . The coil 457 and the cooling device 459 are used as a temperature controller for heating and cooling the heat transfer plate 455. By using the heat transfer plate 455, it is possible to quickly raise and lower the process temperature during the imprinting lithography process, so that a pattern is easily formed in the polymer 413.

The heat transfer plate 455 is heated through the coil 457 during the imprinting lithography process to thermally harden the patterned polymer 413. The heat transfer plate 455 is a metal material used to increase the heat transfer efficiency. In addition, after the polymer 413 is thermoset, the heat transfer plate 455 is cooled through the cooling device 459.

The coil 457 is a temperature rising device for heating the heat transfer plate 455. In the imprinting lithography process, a current flows to heat the heat transfer plate 455.

The cooling device 459 is a temperature lowering device for cooling the heat transfer plate 455. After the polymer having the pattern is thermoset, a low temperature fluid such as cooling water flows to cool the heat transfer plate 455.

As described above, in the imprinting substrate supporting apparatus 400 according to the third embodiment of the present invention, the heat transfer plate 455 may be easily heated and cooled through the coil 457 and the cooling device 459. In the imprinting lithography process, the process temperature can be quickly raised and lowered so that a pattern is easily formed in the polymer 413.

In addition, the imprinting substrate supporting apparatus 400 according to the third embodiment of the present invention includes a base substrate 411 having a stamp 410 and a polymer 413 laminated with the first hollow part 428 in a vacuum state. Correctly positioned, one or more imprinted substrate support devices 400 are disposed in parallel in the imprinting chamber (see 500 of FIG. 17) during the imprinting lithography process.

Fourth Example

19 is a view illustrating an imprinting substrate supporting apparatus 400 according to a fourth embodiment of the present invention, in which a first valve 425 operates to accommodate a receiver 420 on which a stamp 410 and a base substrate 411 are located. The imprinted substrate supporting apparatus 400 in which the first hollow part 428 of the cavities is in a vacuum state is illustrated.

20 illustrates a substrate support 480 according to a fourth embodiment of the present invention, and FIGS. 21A and 21B illustrate an operation process of an imprinting substrate supporting apparatus 400 according to a fourth embodiment of the present invention. It is shown.

The fourth embodiment of the present invention is a modification of the second embodiment of the present invention, and description of the same or corresponding configuration as that of the second embodiment of the present invention will be omitted.

In the imprinting substrate supporting apparatus 400 according to the fourth embodiment of the present invention, the substrate support 480 is positioned in the first hollow portion 428, and the first hollow portion 428 is formed in a vacuum state. 2, the elastic plate 432 is deformed to prevent the outlet 421 from being blocked, and the position alignment of the stamp 410 and the base substrate 411 is fixed.

The substrate support 480 is formed in an annular structure having a fourth hollow portion 481 whose interior is opened up and down. An inner peripheral surface of the substrate support 480 is formed with a protruding end 483 protruding inwardly, and an outer peripheral surface with a protruding end 485 protruding outwardly.

Positioned stamps 410 and the base substrate 411 are placed on the placement end 483 formed on the inner circumferential surface of the substrate support 480, and movement thereof is prevented. In addition, the prevention end 485 formed on the outer circumferential surface of the substrate support 480 has a container for preventing the second elastic plate 432 from being deformed and blocking the outlet 421 in the process of making the first hollow part 428 in a vacuum state. It protrudes toward 420, and is formed.

In addition, the second cushioning material 470 is formed in an o-ring shape to cushion the gap between the transparent plate and the first fixture. Of course, the second cushioning material 470 may be formed in the shape shown in FIG. 10 of the second embodiment.

In addition, the outlet 421 is formed so as not to be blocked by the substrate support in the process of making the first hollow portion 428 in a vacuum state, and is bent in the direction of the transparent plate 450 to be connected to the first hollow portion 428.

In the operation of the imprinting substrate supporting apparatus 400 according to the fourth embodiment of the present invention, the substrate support may include a second elastic body plate (1) when the first valve 425 is operated so that the first hollow part 428 is in a vacuum state. The 432 is deformed in a direction facing the transparent plate 450 and rises in the direction of the first elastic plate 431. In addition, the second elastic body plate 432 is deformed along the shape of the placing end 483 formed on the inner circumferential surface of the substrate support 480. Meanwhile, the prevention end 485 formed on the outer circumferential surface of the substrate support 480 prevents the second elastic plate 432 from being deformed to block the outlet 421.

As described above, the imprinting substrate supporting apparatus 400 according to the fourth embodiment of the present invention prevents the movement of the aligned stamp 410 and the base substrate 411 by using the substrate support. The elastic plate 432 does not block the outlet 421.

In addition, the imprinting substrate supporting apparatus 400 according to the fourth embodiment of the present invention includes a base substrate 411 having a stamp 410 and a polymer 413 laminated with the first hollow part 428 in a vacuum state. Correctly positioned, one or more imprinted substrate support devices 400 are disposed in parallel in the imprinting chamber (see 500 of FIG. 17) during the imprinting lithography process.

Meanwhile, the substrate support 480 may be used for the imprinting substrate supporting apparatus 400 according to the third embodiment of the present invention.

The above-described embodiments of the present invention can be variously modified within the scope included in the spirit of the present invention, and such modifications fall within the scope of the present invention.

As described above, the present invention has an effect that the pattern formed on the stamp is imprinted on the base substrate during the imprinting lithography process by firmly fixing the stamp and the base substrate using the imprinting substrate support apparatus.

In addition, by placing at least one imprinting substrate support device in the imprinting chamber, the imprinting lithography process can be performed at the same time, thereby increasing the process yield.

Claims (24)

The pattern is formed on the base substrate by fixing a position alignment state of a stamped pattern and a base substrate on which the polymer on which the pattern is imprinted is laminated. A container having a hollow portion for receiving the stamp and the base substrate, the container having a discharge port connected to discharge means for making the hollow portion in a vacuum state; Sealing member for sealing the hollow from the outside Imprinting substrate support device comprising a. The method of claim 1, The sealing member, First and second elastic body plates having the elastic force to seal the hollow part from the outside and face each other; Fixing member for pressing the first and second elastic plate in the direction facing the first and second elastic plate, and exposes the first and second elastic plate to the outside Imprinting substrate support device comprising a. The method of claim 1, The sealing member, An elastic body plate having an elastic force and a transparent plate transparent to light, which seal the hollow part from the outside and face each other; A holding member which presses the elastic plate and the transparent plate in a direction in which the elastic plate and the transparent plate face each other, and exposes the elastic plate and the transparent plate to the outside Imprinting substrate support device comprising a. The method of claim 1, The sealing member, An elastic body plate having an elastic force and sealing the hollow part from the outside and facing each other, and a heat transfer plate for transferring heat to the polymer; A holding member which presses the elastic plate and the heat transfer plate in a direction in which the elastic plate and the heat transfer plate face each other, and exposes the elastic plate and the heat transfer plate to the outside; Imprinting substrate support device comprising a. The method of claim 3, wherein It is placed on the elastic plate, the stamp and the base substrate is placed, has an inner space open in the direction of the elastic plate and the transparent plate, the hollow portion prevents the elastic plate is deformed to block the outlet in a vacuum state An imprinting substrate support device further comprising a substrate support. The method of claim 4, wherein It is placed on the elastic plate, the stamp and the base substrate is placed, has an inner space open in the direction of the elastic plate and the heat transfer plate, the hollow portion prevents the elastic plate is deformed to block the outlet in a vacuum state An imprinting substrate support device further comprising a substrate support. The method according to any one of claims 1 to 6, The receptor is an imprinting substrate support device consisting of an annular shape. The method of claim 2, The receptor, the imprinting substrate supporting apparatus having one or more protrusions protruding in the direction of each of the first and second elastic body plates. The method according to claim 3 or 4, The receptor, the imprinting substrate supporting apparatus having one or more protrusions protruding in the elastic plate direction. The method of claim 2, The fixing member, First and second fixing bodies for pressing the first and second elastic body plates, respectively; Coupling means for coupling the first and second fixtures Imprinting substrate support device comprising a. The method of claim 3, wherein The fixing member, First and second fixing bodies for pressing the transparent plate and the elastic plate respectively; Coupling means for coupling the first and second fixtures Imprinting substrate support device comprising a. The method of claim 4, wherein The fixing member, First and second fixtures for pressing the heat transfer plate and the elastic plate, respectively; Coupling means for coupling the first and second fixtures Imprinting substrate support device comprising a. The method of claim 3, wherein An imprinting substrate supporting apparatus placed on the stamp, the hollow portion further comprising a plate-shaped elastic body having an elastic force in contact with the transparent plate in a vacuum state. The method of claim 4, wherein And a plate-shaped elastic body placed on the stamp, the hollow portion having an elastic force in contact with the heat transfer plate in a vacuum state. The method of claim 3, wherein The transparent plate is an imprinting substrate support device made of a transparent material to the selected one of ultraviolet and infrared. The method of claim 15, The transparent plate is imprinting substrate support device made of quartz. The method of claim 4, wherein Imprinting substrate support device further comprises a temperature control device for raising and lowering the temperature of the heat transfer plate. The method of claim 17, The temperature control device, A coil through which current flows to raise the temperature of the heat transfer plate; Cooling device that lowers the temperature of the heat transfer plate by flowing a low temperature fluid Imprinting substrate support device comprising a. The method according to claim 5 or 6, The substrate support, A protruding end projecting on an inner circumferential surface of the substrate support, on which the stamp and the base substrate are placed; An imprinting substrate supporting apparatus protruding from an outer circumferential surface of the substrate support, the hollow portion having a prevention end to prevent the elastic plate from being deformed in a vacuum state and blocking the outlet. At least one imprinting substrate supporting device for fixing the pattern on the base substrate by fixing a position alignment state of a base substrate having a stamp having a pattern and a polymer to which the pattern is imprinted; A chamber accommodating the imprinting substrate support device in an inner space; A pressure applying means connected to the chamber, The imprinting substrate support device, A hollow part for receiving the stamp and the base substrate is formed, and has a container having a discharge port connected to the discharge means for making the hollow part in a vacuum state, and a sealing member for sealing the hollow part from the outside. Imprinting device. The method of claim 20, The at least one imprinting substrate support device is disposed in parallel in the chamber. The method of claim 20 or 21, The sealing member, First and second elastic body plates which seal the hollow part from the outside and face each other; Fixing member for pressing the first and second elastic plate in the direction facing the first and second elastic plate, and exposes the first and second elastic plate to the outside Imprinting apparatus comprising a. The method of claim 20 or 21, The sealing member, An elastic body plate having an elastic force and a transparent plate transparent to light, which seal the hollow part from the outside and face each other; A holding member which presses the elastic plate and the transparent plate in a direction in which the elastic plate and the transparent plate face each other, and exposes the elastic plate and the transparent plate to the outside Imprinting apparatus comprising a. The method of claim 20 or 21, The sealing member, An elastic body plate having an elastic force and sealing the hollow part from the outside and facing each other, and a heat transfer plate for transferring heat to the polymer; A holding member which presses the elastic plate and the heat transfer plate in a direction in which the elastic plate and the heat transfer plate face each other, and exposes the elastic plate and the heat transfer plate to the outside; Imprinting apparatus comprising a.