KR20120112261A - 플라즈마 처리 장치 및 플라즈마 발생용 안테나 - Google Patents

플라즈마 처리 장치 및 플라즈마 발생용 안테나 Download PDF

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Publication number
KR20120112261A
KR20120112261A KR1020120033519A KR20120033519A KR20120112261A KR 20120112261 A KR20120112261 A KR 20120112261A KR 1020120033519 A KR1020120033519 A KR 1020120033519A KR 20120033519 A KR20120033519 A KR 20120033519A KR 20120112261 A KR20120112261 A KR 20120112261A
Authority
KR
South Korea
Prior art keywords
plasma
shower head
gas
antenna
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020120033519A
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English (en)
Korean (ko)
Inventor
타로 이케다
토모히토 고마츠
시게루 가사이
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20120112261A publication Critical patent/KR20120112261A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
KR1020120033519A 2011-03-31 2012-03-30 플라즈마 처리 장치 및 플라즈마 발생용 안테나 Ceased KR20120112261A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2011-078029 2011-03-31
JP2011078029 2011-03-31
JP2012072759A JP2012216525A (ja) 2011-03-31 2012-03-28 プラズマ処理装置及びプラズマ発生用アンテナ
JPJP-P-2012-072759 2012-03-28

Publications (1)

Publication Number Publication Date
KR20120112261A true KR20120112261A (ko) 2012-10-11

Family

ID=47269094

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120033519A Ceased KR20120112261A (ko) 2011-03-31 2012-03-30 플라즈마 처리 장치 및 플라즈마 발생용 안테나

Country Status (3)

Country Link
JP (1) JP2012216525A (https=)
KR (1) KR20120112261A (https=)
TW (1) TW201304617A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101485964B1 (ko) * 2013-01-16 2015-01-27 주식회사 아이브이웍스 마이크로파 플라즈마 반응기
CN106416431A (zh) * 2014-06-16 2017-02-15 威特尔有限公司 等离子体产生装置

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6338462B2 (ja) * 2013-09-11 2018-06-06 東京エレクトロン株式会社 プラズマ処理装置
JP6356415B2 (ja) * 2013-12-16 2018-07-11 東京エレクトロン株式会社 マイクロ波プラズマ源およびプラズマ処理装置
JP6580830B2 (ja) * 2015-01-22 2019-09-25 株式会社Ｓｃｒｅｅｎホールディングス プラズマ処理装置
JP6671230B2 (ja) 2016-04-26 2020-03-25 東京エレクトロン株式会社 プラズマ処理装置およびガス導入機構
JP6796450B2 (ja) 2016-10-25 2020-12-09 東京エレクトロン株式会社 プラズマ処理装置
JP6283438B2 (ja) * 2017-03-28 2018-02-21 東京エレクトロン株式会社 マイクロ波放射アンテナ、マイクロ波プラズマ源およびプラズマ処理装置
JP7058485B2 (ja) * 2017-05-16 2022-04-22 東京エレクトロン株式会社 プラズマ処理装置
JP6914149B2 (ja) * 2017-09-07 2021-08-04 東京エレクトロン株式会社 プラズマ処理装置
JP7026498B2 (ja) 2017-12-12 2022-02-28 東京エレクトロン株式会社 アンテナ及びプラズマ成膜装置
CN108566717B (zh) * 2018-06-29 2024-07-02 合肥中科离子医学技术装备有限公司 采用微波垂直注入激励等离子体发生装置
TW202233887A (zh) * 2021-02-03 2022-09-01 美商Ｍｋｓ儀器公司 利用微波輻射能量對原子層沉積製程進行微波輔助表面化學退火的微波系統
JP2024106239A (ja) * 2023-01-26 2024-08-07 東京エレクトロン株式会社 分散板、ガス供給機構及び基板処理装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2662219B2 (ja) * 1987-04-22 1997-10-08 株式会社日立製作所 プラズマ処理装置
JP3164188B2 (ja) * 1994-06-14 2001-05-08 日本電気株式会社 プラズマ処理装置
JP5082459B2 (ja) * 2006-01-20 2012-11-28 東京エレクトロン株式会社 プラズマ処理装置及び天板の製造方法
JP5213530B2 (ja) * 2008-06-11 2013-06-19 東京エレクトロン株式会社 プラズマ処理装置
JP5309847B2 (ja) * 2008-09-30 2013-10-09 東京エレクトロン株式会社 プラズマ処理装置
JP2010244805A (ja) * 2009-04-03 2010-10-28 Tokyo Electron Ltd プラズマ処理装置
JPWO2010140526A1 (ja) * 2009-06-01 2012-11-15 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理装置の給電方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101485964B1 (ko) * 2013-01-16 2015-01-27 주식회사 아이브이웍스 마이크로파 플라즈마 반응기
CN106416431A (zh) * 2014-06-16 2017-02-15 威特尔有限公司 等离子体产生装置
CN106416431B (zh) * 2014-06-16 2019-05-21 威特尔有限公司 等离子体产生装置

Also Published As

Publication number Publication date
JP2012216525A (ja) 2012-11-08
TW201304617A (zh) 2013-01-16

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