KR20120038988A - 신규 불소?함유 공중합체 및 막 - Google Patents

신규 불소?함유 공중합체 및 막 Download PDF

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Publication number
KR20120038988A
KR20120038988A KR1020127002571A KR20127002571A KR20120038988A KR 20120038988 A KR20120038988 A KR 20120038988A KR 1020127002571 A KR1020127002571 A KR 1020127002571A KR 20127002571 A KR20127002571 A KR 20127002571A KR 20120038988 A KR20120038988 A KR 20120038988A
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KR
South Korea
Prior art keywords
monomer
unit
monomer unit
moles
fluorine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020127002571A
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English (en)
Korean (ko)
Inventor
엘 사피르 아담
송 리
신지 오카다
노부유키 가사하라
가츠야 우에노
요시토미 모리자와
다카시 오카조에
Original Assignee
아사히 가라스 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 아사히 가라스 가부시키가이샤 filed Critical 아사히 가라스 가부시키가이샤
Publication of KR20120038988A publication Critical patent/KR20120038988A/ko
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C08F214/18—Monomers containing fluorine
    • C08F214/24—Trifluorochloroethene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C08F214/18—Monomers containing fluorine
    • C08F214/24—Trifluorochloroethene
    • C08F214/242—Trifluorochloroethene with fluorinated vinyl ethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
    • C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Paints Or Removers (AREA)
KR1020127002571A 2009-07-31 2010-07-28 신규 불소?함유 공중합체 및 막 Withdrawn KR20120038988A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2009-178797 2009-07-31
JP2009178797A JP5423214B2 (ja) 2009-07-31 2009-07-31 新規な含フッ素共重合体および膜

Publications (1)

Publication Number Publication Date
KR20120038988A true KR20120038988A (ko) 2012-04-24

Family

ID=42797308

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127002571A Withdrawn KR20120038988A (ko) 2009-07-31 2010-07-28 신규 불소?함유 공중합체 및 막

Country Status (6)

Country Link
US (1) US20120148818A1 (https=)
EP (1) EP2459604A1 (https=)
JP (1) JP5423214B2 (https=)
KR (1) KR20120038988A (https=)
CN (1) CN102471413A (https=)
WO (1) WO2011013849A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5423214B2 (ja) * 2009-07-31 2014-02-19 旭硝子株式会社 新規な含フッ素共重合体および膜
JP6398224B2 (ja) * 2013-12-27 2018-10-03 ダイキン工業株式会社 α−フルオロアクリル酸エステル類の製造方法
TW201708276A (zh) * 2015-02-20 2017-03-01 Daikin Ind Ltd 親水化劑、含有親水化劑之組成物及高分子多孔質膜
US12435174B2 (en) 2018-04-10 2025-10-07 Arkema Inc. Functional fluoropolymers

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB596943A (en) 1944-08-04 1948-01-14 Du Pont Process for the production of copolymers containing chlorotrifluoroethylene and vinyl esters
US4622364A (en) * 1983-04-11 1986-11-11 Daikin Kogyo Co., Ltd. Fluorine-containing copolymer and composition containing the same
JPS605203A (ja) * 1983-06-21 1985-01-11 Asahi Glass Co Ltd 薄膜化の容易な分離膜素材
FR2646429B1 (fr) * 1989-04-28 1991-07-26 Atochem Copolymere durcissable fluore, son procede de fabrication et son application dans les vernis et peintures
WO1993006158A1 (en) * 1991-09-27 1993-04-01 Allied-Signal Inc. High barrier pctfe film
EP0765812B1 (en) 1991-10-03 2000-08-16 ISHIDA CO., Ltd. Transverse sealer for packaging machine
JPH06116465A (ja) * 1992-07-29 1994-04-26 Asahi Glass Co Ltd 新規含フッ素重合体の製造方法、および硬化性組成物
JP3473049B2 (ja) * 1992-07-29 2003-12-02 旭硝子株式会社 硬化性組成物
IT1301451B1 (it) * 1998-06-04 2000-06-13 Ausimont Spa Copolimeri del clorotrifluoroetilene
US6369178B1 (en) * 1998-12-23 2002-04-09 Alliedsignal Inc. Poly (chlorotrifluoroethylene/vinylidenefluoride/vinylester) copolymers with excellent long-term ultraviolet light resistance
JP2003007733A (ja) * 2001-06-19 2003-01-10 Mitsubishi Electric Corp 半導体製造装置およびこれを用いた半導体装置の製造方法
US6809132B2 (en) * 2001-10-29 2004-10-26 Hercules Incorporated Suppression of aqueous viscosity of associating polyacetal-polyethers
US6900267B2 (en) * 2001-12-12 2005-05-31 North Carolina State University Methods of CO2-assisted reactive extrusion
JP4582091B2 (ja) * 2004-04-13 2010-11-17 ダイキン工業株式会社 クロロトリフルオロエチレン共重合体
FR2887886B1 (fr) * 2005-07-01 2010-01-08 Oreal Polymere cationique neutralise, composition le comprenant et procede de traitement cosmetique
WO2007067648A2 (en) * 2005-12-06 2007-06-14 Osmose, Inc. Fluoro-compound water repellent composition for wood product dimensional stability
JP2007225647A (ja) * 2006-02-21 2007-09-06 Tokyo Ohka Kogyo Co Ltd 超臨界現像プロセス用レジスト組成物
DE102006047734A1 (de) * 2006-10-06 2008-04-10 Tesa Ag Klebeband mit einem Träger, der sich aus einer oder aus mehreren Trägerfolien zusammensetzt, wobei auf den Träger zumindest einseitig eine Klebemasse zumindest partiell aufgebracht ist
WO2008093776A1 (ja) * 2007-02-02 2008-08-07 Daikin Industries, Ltd. 硬化性樹脂組成物およびその製造方法
FR2912649B1 (fr) * 2007-02-19 2009-05-08 Oreal Dispersion de particules de polymere, composition la comprenant et procede de traitement cosmetique
JP2009070528A (ja) * 2007-09-18 2009-04-02 Hitachi Global Storage Technologies Netherlands Bv 磁気ヘッドスライダ及び磁気ディスク装置
FR2927082B1 (fr) * 2008-02-01 2010-02-19 Oreal Dispersion de particules de polymere, composition la comprenant et procede de traitement cosmetique.
JP5423214B2 (ja) * 2009-07-31 2014-02-19 旭硝子株式会社 新規な含フッ素共重合体および膜
JP2011042713A (ja) * 2009-08-19 2011-03-03 Asahi Glass Co Ltd 主鎖に環状構造を有する含フッ素共重合体及びその製造方法

Also Published As

Publication number Publication date
JP5423214B2 (ja) 2014-02-19
EP2459604A1 (en) 2012-06-06
WO2011013849A1 (en) 2011-02-03
CN102471413A (zh) 2012-05-23
JP2011032341A (ja) 2011-02-17
US20120148818A1 (en) 2012-06-14

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PA0105 International application

Patent event date: 20120130

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid