KR20120036939A - 2성분 에칭 - Google Patents

2성분 에칭 Download PDF

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Publication number
KR20120036939A
KR20120036939A KR1020127000228A KR20127000228A KR20120036939A KR 20120036939 A KR20120036939 A KR 20120036939A KR 1020127000228 A KR1020127000228 A KR 1020127000228A KR 20127000228 A KR20127000228 A KR 20127000228A KR 20120036939 A KR20120036939 A KR 20120036939A
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KR
South Korea
Prior art keywords
composition
fluoride
acid
group
ink
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020127000228A
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English (en)
Korean (ko)
Inventor
올리버 돌
에드워드 플러머
마크 제임스
잉고 쾰러
Original Assignee
메르크 파텐트 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 메르크 파텐트 게엠베하 filed Critical 메르크 파텐트 게엠베하
Publication of KR20120036939A publication Critical patent/KR20120036939A/ko
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/121—The active layers comprising only Group IV materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/547—Monocrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Weting (AREA)
KR1020127000228A 2009-06-04 2010-05-12 2성분 에칭 Ceased KR20120036939A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP09007411.3 2009-06-04
EP09007411 2009-06-04

Publications (1)

Publication Number Publication Date
KR20120036939A true KR20120036939A (ko) 2012-04-18

Family

ID=42830717

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127000228A Ceased KR20120036939A (ko) 2009-06-04 2010-05-12 2성분 에칭

Country Status (8)

Country Link
US (1) US8647526B2 (https=)
EP (1) EP2438140A1 (https=)
JP (1) JP5801798B2 (https=)
KR (1) KR20120036939A (https=)
CN (1) CN102449112B (https=)
SG (1) SG176274A1 (https=)
TW (1) TWI481693B (https=)
WO (1) WO2010139390A1 (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013008877A (ja) * 2011-06-24 2013-01-10 Kuraray Co Ltd カーボンナノチューブ層とオーバーコート層とを具備する複合層のパターン形成方法、及び前記方法で形成されたパターン
CN102929418A (zh) * 2011-08-09 2013-02-13 群康科技(深圳)有限公司 装饰膜、影像显示系统及触控感测装置的制造方法
TWI495560B (zh) * 2011-08-09 2015-08-11 Chimei Innolux Corp 透明基底上的裝飾膜、影像顯示系統及觸控感測裝置之製造方法
EP2743969A4 (en) * 2011-08-12 2015-04-01 Univ Osaka METHOD AND METHOD FOR PERFORMING SURFACE TREATMENT ON SOLID MATERIAL FOR A SOLAR CELL
JP6136186B2 (ja) * 2012-10-16 2017-05-31 日立化成株式会社 液状組成物
JP6011234B2 (ja) * 2012-10-16 2016-10-19 日立化成株式会社 組成物
JP6060611B2 (ja) * 2012-10-16 2017-01-18 日立化成株式会社 組成物
JP2014082330A (ja) * 2012-10-16 2014-05-08 Hitachi Chemical Co Ltd ＳｉＮ膜の除去方法
US9550940B2 (en) 2012-10-16 2017-01-24 Hitachi Chemical Company, Ltd. Etching material
CN104854684B (zh) 2012-11-14 2017-10-10 太阳化学公司 用于制造背面钝化太阳能电池的组合物和方法
JP6369460B2 (ja) * 2013-05-31 2018-08-08 日立化成株式会社 エッチング組成物
CN104993019A (zh) * 2015-07-09 2015-10-21 苏州阿特斯阳光电力科技有限公司 一种局部背接触太阳能电池的制备方法
TWI550886B (zh) * 2015-07-10 2016-09-21 國立屏東科技大學 矽基板表面粗糙化方法
JP2016086187A (ja) * 2016-02-01 2016-05-19 日立化成株式会社 ＳｉＮ膜の除去方法
JP7603517B2 (ja) * 2021-04-26 2024-12-20 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法、および、基板処理装置

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3979241A (en) * 1968-12-28 1976-09-07 Fujitsu Ltd. Method of etching films of silicon nitride and silicon dioxide
US4781792A (en) * 1985-05-07 1988-11-01 Hogan James V Method for permanently marking glass
GB9210514D0 (en) * 1992-05-16 1992-07-01 Micro Image Technology Ltd Etching compositions
WO1997002958A1 (en) 1995-07-10 1997-01-30 Advanced Chemical Systems International Organic amine/hydrogen fluoride etchant composition and method
US5698503A (en) 1996-11-08 1997-12-16 Ashland Inc. Stripping and cleaning composition
DE19962136A1 (de) * 1999-12-22 2001-06-28 Merck Patent Gmbh Verfahren zur Rauhätzung von Siliziumsolarzellen
RU2274615C2 (ru) 2000-04-28 2006-04-20 Мерк Патент Гмбх Гравировальные пасты для неорганических поверхностей
JP2004503081A (ja) * 2000-06-30 2004-01-29 エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド シリコンウェーハのエッチング方法
GB2367788A (en) * 2000-10-16 2002-04-17 Seiko Epson Corp Etching using an ink jet print head
DE10241300A1 (de) * 2002-09-04 2004-03-18 Merck Patent Gmbh Ätzpasten für Siliziumoberflächen und -schichten
US20040188385A1 (en) * 2003-03-26 2004-09-30 Kenji Yamada Etching agent composition for thin films having high permittivity and process for etching
AU2003901559A0 (en) 2003-04-07 2003-05-01 Unisearch Limited Glass texturing method
WO2005036268A1 (ja) * 2003-10-14 2005-04-21 Asahi Denka Co., Ltd. フォトレジスト組成物
CN1950338B (zh) * 2004-03-05 2012-05-16 霍尼韦尔国际公司 杂环胺的离子液体
DE102005007743A1 (de) * 2005-01-11 2006-07-20 Merck Patent Gmbh Druckfähiges Medium zur Ätzung von Siliziumdioxid- und Siliziumnitridschichten
DE102005033724A1 (de) * 2005-07-15 2007-01-18 Merck Patent Gmbh Druckfähige Ätzmedien für Siliziumdioxid-und Siliziumnitridschichten
GB0608463D0 (en) * 2006-04-27 2006-06-07 Sericol Ltd A printing ink
EP1918985B1 (en) * 2006-10-31 2010-05-26 S.O.I.TEC. Silicon on Insulator Technologies S.A. Methods for characterizing defects on silicon surfaces, etching composition for silicon surfaces and process of treating silicon surfaces with the etching composition
US7582398B2 (en) * 2007-06-13 2009-09-01 Xerox Corporation Inkless reimageable printing paper and method
JP4947654B2 (ja) * 2007-09-28 2012-06-06 シャープ株式会社 誘電体膜のパターニング方法

Also Published As

Publication number Publication date
JP2012529163A (ja) 2012-11-15
WO2010139390A1 (en) 2010-12-09
US20120085965A1 (en) 2012-04-12
US8647526B2 (en) 2014-02-11
CN102449112A (zh) 2012-05-09
CN102449112B (zh) 2014-09-24
TW201116612A (en) 2011-05-16
EP2438140A1 (en) 2012-04-11
SG176274A1 (en) 2012-01-30
JP5801798B2 (ja) 2015-10-28
HK1169136A1 (en) 2013-01-18
TWI481693B (zh) 2015-04-21

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