KR20120032695A - Chamber line - Google Patents

Chamber line Download PDF

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KR20120032695A
KR20120032695A KR1020100094156A KR20100094156A KR20120032695A KR 20120032695 A KR20120032695 A KR 20120032695A KR 1020100094156 A KR1020100094156 A KR 1020100094156A KR 20100094156 A KR20100094156 A KR 20100094156A KR 20120032695 A KR20120032695 A KR 20120032695A
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chamber
top plate
opening
sprocket
roller chain
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KR1020100094156A
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KR101171758B1 (en
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이츠시 이이오
마사히토 잇시키
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스미도모쥬기가이고교 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE: A chamber line is provided to secure a wide and safe working area the upper side of a chamber by moving an opening/closing unit together with a cover part separated from the chamber. CONSTITUTION: A chamber line comprises a rail part(11) and an opening/closing unit(13). The rail part is arranged in the array direction of chambers. The opening/closing unit can move along the rail part and lifts a cover part installed on a chamber to open and close the chamber. The opening/closing unit comprises a roller chain, a sprocket to which the roller chain is coupled, and a driving part. The cover part can be separated from the chamber and has a holding portion in which other cover parts can be piled and supported.

Description

챔버라인{Chamber line}Chamber line

본 발명은, 성막장치 등의 복수의 챔버를 구비한 챔버라인에 관한 것으로서, 특히, 챔버에 장착된 덮개부를, 청소나 유지보수 등을 위해 개폐할 수 있는 챔버라인에 관한 것이다.
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chamber line including a plurality of chambers, such as a film forming apparatus, and more particularly, to a chamber line capable of opening and closing a lid portion mounted to a chamber for cleaning, maintenance, and the like.

이온플레이팅 장치나 증착장치 등의 성막장치(특허문헌 1 참조)에서는, 인접하여 나열된 복수의 챔버에 의하여 구축된 챔버라인을 구비한다. 이런 종류의 챔버라인에서는, 진공챔버인 성막실을 기판이 통과할 때, 그 기판에 대해 소정의 성막처리가 실시된다(특허문헌 1 참조). 성막처리에 수반되는 증착물질의 부착이나 오염물을 제거하기 위하여, 성막실 내부는 정기적인 청소가 필요하고, 또한, 그 외의 챔버도 적절히 유지보수할 필요가 있다. 이를 위하여, 챔버의 천정부분에는, 유지보수용 개구가 형성되어 있고, 일반적으로는, 이 개구를 폐쇄하는 천정덮개가 힌지부를 통해 본체부분에 연결되어 있다. 천정덮개는, 중량이 500㎏ 이상이나 되는 중량물이기 때문에, 각 챔버에는, 천정덮개를 끌어올려 챔버를 개방하고, 또 개방한 챔버를 지지하기 위한 개폐장치가 설치되어 있다.In film-forming apparatuses (for example, patent document 1), such as an ion plating apparatus and a vapor deposition apparatus, the chamber line comprised by the several chamber arranged adjacently is provided. In this kind of chamber line, when a substrate passes through the film formation chamber which is a vacuum chamber, a predetermined film-forming process is performed with respect to the board | substrate (refer patent document 1). In order to remove deposition of contaminants and contaminants involved in the film forming process, the inside of the film forming chamber needs to be cleaned regularly, and other chambers need to be properly maintained. For this purpose, an opening for maintenance is formed in the ceiling portion of the chamber, and in general, a ceiling cover for closing the opening is connected to the main body portion through the hinge portion. Since the ceiling lid is a heavy object having a weight of 500 kg or more, each chamber is provided with an opening and closing device for lifting the ceiling lid to open the chamber and supporting the opened chamber.

일본 공개특허공보 2006-299358호Japanese Patent Laid-Open No. 2006-299358

그러나, 종래의 챔버라인에서는, 복수의 챔버 각각에 천정덮개의 개폐장치가 필요하여, 설비가 복잡하고 대형화되기 쉬워서, 설비비용의 증대를 쉽게 초래하였다.However, in the conventional chamber line, the opening and closing device of the ceiling cover is required in each of the plurality of chambers, and the equipment is complicated and easily enlarged, resulting in an increase in equipment cost.

본 발명은, 이상의 과제를 해결하는 것을 목적으로 하고 있고, 덮개부를 개폐하기 위한 설비를 심플하게 구축하기 쉬워지고, 비용절감에도 유효한 챔버라인을 제공하는 것을 목적으로 한다.
An object of the present invention is to solve the above problems, and an object of the present invention is to provide a chamber line which is easy to construct a facility for opening and closing a lid part and which is effective in cost reduction.

본 발명은, 덮개부를 가지는 챔버를 복수 인접하여 나열한 챔버라인에 있어서, 챔버의 나열방향을 따라 배치된 레일부와, 레일부를 따라 이동 가능하며, 챔버에 설치된 덮개부를 승강시켜서 챔버를 개폐 가능한 개폐수단을 구비하는 것을 특징으로 한다.According to the present invention, in a chamber line in which a plurality of chambers having a cover part are arranged adjacently, a rail part arranged along the direction of the chamber and a rail part movable along the rail part, and the opening and closing means capable of opening and closing the chamber by lifting and lowering the cover part provided in the chamber It characterized by having a.

본 발명에 의하면, 개폐수단은, 복수의 챔버의 나열방향을 따라 배치된 레일부를 따라 이동 가능하다. 따라서, 하나의 챔버의 덮개부를 승강시켜 챔버를 개폐하고, 다시 다른 챔버까지 이동하여 다른 챔버의 덮개부를 승강시켜 다른 챔버를 개폐하는 것도 가능해진다. 그 결과, 적어도 하나의 개폐수단으로 복수의 챔버를 개폐시킬 수 있게 되어, 복수의 챔버 각각에 개폐장치를 설치할 필요가 없어져서 설비를 심플하게 구축하기 쉬워지고, 비용절감에도 유효하다.According to the present invention, the opening and closing means is movable along the rail portion arranged along the direction of alignment of the plurality of chambers. Therefore, it is also possible to open and close the chamber by raising and lowering the lid of one chamber, and moving to another chamber to lift and open the lid of another chamber to open and close the other chamber. As a result, it is possible to open and close the plurality of chambers by at least one opening and closing means, and there is no need to provide an opening and closing device in each of the plurality of chambers, thereby making it easy to construct a facility and effective for cost reduction.

또한, 덮개부는, 챔버로부터 이탈 가능하면 바람직하다. 챔버로부터 이탈한 덮개부와 함께 개폐수단을 이동시킴으로써, 덮개부가 제거된 챔버의 상방에, 넓고 안전한 작업영역을 확보할 수 있게 된다.Moreover, it is preferable that a lid part is detachable from a chamber. By moving the opening and closing means together with the cover part removed from the chamber, it is possible to secure a wide and safe working area above the chamber from which the cover part is removed.

또한, 덮개부에는, 다른 덮개부를 겹쳐 쌓아 지지하는 홀드부가 설치되어 있으면 바람직하다. 개폐수단에 의해 챔버로부터 이탈된 덮개부는, 예컨대 이웃의 덮개부에 겹쳐 쌓아 임시 적치할 수 있으므로, 개폐수단이 상시, 덮개부를 지지해 두지 않아도 되게 되어, 복수의 덮개부를 동시에 개방할 수 있다.Moreover, it is preferable that the hold part is provided with the hold part which piles up and supports another cover part. The cover part detached from the chamber by the opening / closing means can be piled up temporarily, for example, by overlapping the cover part of the neighbor, so that the opening / closing means does not have to support the cover part at all times, and the plurality of cover parts can be opened simultaneously.

또한, 개폐수단은, 일단이 덮개부에 결합 가능한 롤러체인과, 롤러체인이 감겨진 스프라킷과, 스프라킷을 회전 구동하는 구동부를 가지며, 롤러체인의 타단은 스프라킷에 결합되어 있으면 바람직하다. 롤러체인의 타단은 스프라킷에 결합되어 있기 때문에, 스프라킷의 회전에 따라 롤러체인은 확실히 감아올려져, 그 결과 덮개부의 확실한 상승이 가능해진다. 또한, 상기 구성에 의하면, 승강 스트로크가 짧은 경우에 적용할 수 있으므로, 설비의 컴팩트화에 유리하다.
In addition, the opening and closing means has a roller chain, one end of which can be coupled to the cover portion, a sprocket on which the roller chain is wound, and a driving portion for rotationally driving the sprocket, and the other end of the roller chain is coupled to the sprocket. desirable. Since the other end of the roller chain is coupled to the sprocket, the roller chain is reliably rolled up as the sprocket rotates, and as a result, the cover portion can be surely raised. Moreover, according to the said structure, since it can apply when a lifting stroke is short, it is advantageous for compact installation.

본 발명에 의하면, 설비의 단순화가 용이하고 비용절감에도 유효한 챔버라인을 제공할 수 있다.
According to the present invention, it is possible to provide a chamber line that is easy to simplify the equipment and effective in cost reduction.

도 1은, 본 발명의 실시형태에 관한 성막장치의 측면도이다.
도 2는, 본 실시형태에 관한 천판(天板) 체인저의 평면도이다.
도 3은, 도 2의 III-III선을 따른 단면도이다.
도 4는, 도 2의 IV-IV선을 따른 단면도이다.
도 5는, 성막장치의 일부를 확대하여 나타내는 측면도이다.
도 6은, 천판의 사시도이다.1 is a side view of a film forming apparatus according to an embodiment of the present invention.
2 is a plan view of a top plate changer according to the present embodiment.
3 is a cross-sectional view taken along the line III-III of FIG. 2.
4 is a cross-sectional view taken along the line IV-IV of FIG. 2.
5 is an enlarged side view showing a part of the film forming apparatus.
6 is a perspective view of the top plate.

이하, 본 발명에 관한 챔버라인의 바람직한 실시형태에 대해 도면을 참조하면서 설명한다. 본 실시형태에서는, 챔버라인을 구성하는 성막장치(1)를 예로 하여 설명한다.EMBODIMENT OF THE INVENTION Hereinafter, preferred embodiment of the chamber line which concerns on this invention is described, referring drawings. In this embodiment, the film-forming apparatus 1 which comprises a chamber line is demonstrated as an example.

도 1에 나타내는 바와 같이, 성막장치(1)는, 기판에, 다양한 증착법에 의해 성막하는 장치이며, 통칭, 인라인 타입으로 불리는 반송형태를 채용하고 있다. 성막장치(1)는, 가설대(3) 상에 설치된 복수의 챔버(4A~4E)를 구비하고 있고, 각 챔버(4A~4E) 내에는, 소정의 경로를 따라 캐리어를 반송(搬送)하는 구동기구가 설치되어 있다. 캐리어란, 트레이 및 기판을 포함한 반송체이다.As shown in FIG. 1, the film-forming apparatus 1 is an apparatus which forms into a film by the various vapor deposition methods on a board | substrate, and employ | adopts the conveyance form called a general name and inline type. The film forming apparatus 1 includes a plurality of chambers 4A to 4E provided on the temporary stand 3, and in each of the chambers 4A to 4E, carriers are transported along a predetermined path. The drive mechanism is installed. The carrier is a carrier including a tray and a substrate.

복수의 챔버(4A~4E)의 역할은 각각 상이하여, 캐리어가 통과하는 경로의 상류측에서부터 순서대로 로드 락 챔버(4A), 전단(前段) 버퍼챔버(4B), 성막챔버(4C), 후단(後段) 버퍼챔버(4D), 언로드 락 챔버(4E)가 설치되어 있다. 각 챔버(4A~4E)는, 각각 개폐 가능한 진공 게이트밸브(5)에 의해 구획되어 있다.The roles of the plurality of chambers 4A to 4E are different from each other, so that the load lock chamber 4A, the front buffer chamber 4B, the film formation chamber 4C, and the rear end are sequentially formed from the upstream side of the path through which the carrier passes. (Iii) The buffer chamber 4D and the unload lock chamber 4E are provided. Each chamber 4A-4E is divided by the vacuum gate valve 5 which can be opened and closed, respectively.

로드 락 챔버(4A) 및 전단 버퍼챔버(4B)는, 기판을 받아들여 순차 감압한다. 또한, 로드 락 챔버(4A) 및 전단 버퍼챔버(4B)에서는, 반송 중인 기판을 소정의 온도까지 가열한다. 소정의 온도까지 가열된 기판은, 성막챔버(4C)에 반입된다.The load lock chamber 4A and the front end buffer chamber 4B receive the substrate and sequentially reduce the pressure. Moreover, in the load lock chamber 4A and the front end buffer chamber 4B, the board | substrate currently conveyed is heated to predetermined temperature. The board | substrate heated to predetermined | prescribed temperature is carried in 4 C of film-forming chambers.

성막챔버(4C)는, 서로 연통하는 3개의 진공챔버로 이루어지고, 성막챔버(4C) 내부는 고온 분위기로 유지되어 있다. 중앙의 진공챔버의 저부(底部)에는, 다양한 증착법에 의한 증착장치가 설치되고, 증착입자에 의해 기판의 성막이 행하여진다.The film forming chamber 4C is composed of three vacuum chambers communicating with each other, and the film forming chamber 4C is maintained in a high temperature atmosphere. The vapor deposition apparatus by various vapor deposition methods is provided in the bottom part of the central vacuum chamber, and a film-forming of a board | substrate is performed by vapor deposition particle | grains.

성막 후의 기판은, 후단 버퍼챔버(4D)로 배출된다. 후단 버퍼챔버(4D)에는, 수냉판이 설치되어 있어서, 기판은, 후단 버퍼챔버(4D) 내에서 복사(輻射)에 의해 서서히 냉각된다. 그 후, 기판은, 조압(調壓) 후에 언로드 락 챔버(4E)를 거쳐 성막장치(1) 밖으로 반출된다.The substrate after film formation is discharged to the rear buffer chamber 4D. A water cooling plate is provided in the rear buffer chamber 4D, and the substrate is gradually cooled in the rear buffer chamber 4D by radiation. Then, the board | substrate is carried out out of the film-forming apparatus 1 via unloading lock chamber 4E after pressure regulation.

각 챔버(4A~4E)에는, 그 역할에 따라 각종 배관이나 기기가 장착되어 있다. 그러나, 각 챔버의 개략적인 구성은 공통적이고, 각각 본체부가 되는 케이스부(7)를 구비하고 있다(도 5 참조). 케이스부(7)는, 직사각형으로 둘러싸는 외벽(7a)을 구비하고, 상부는 개방되어 유지보수용 개구(7b)가 형성되어 있다. 이 개구를 막도록, 직사각형의 천판(덮개부)(9)이 착탈 가능하게 장착되어 있다. 천판(9)은, 500㎏이나 되는 중량물이다.Various chambers and devices are attached to each of the chambers 4A to 4E according to their role. However, the schematic structure of each chamber is common and is provided with the case part 7 which becomes a main-body part, respectively (refer FIG. 5). The case part 7 has the outer wall 7a enclosed by a rectangle, and the upper part is opened and the opening 7b for maintenance is formed. The rectangular top plate (cover portion) 9 is detachably attached so as to close the opening. The top plate 9 is a heavy product of 500 kg.

도 6에 나타내는 바와 같이, 천판(9)에는, 2개의 행잉 플레이트(9a)가 연결되어 있다. 행잉 플레이트(9a)는 길이가 긴 직사각형 판형상이며, 천판(9)의 길이방향에 직교하여 뻗어 있고, 또한 천판(9)에 대해 세워서 설치되어 있다. 행잉 플레이트(9a)는, 천판(9)의 양측 가장자리로부터 외측으로 돌출된 양쪽의 단부(9b)를 가진다. 단부(9b)에는, 다른 천판(9)을 지지하는 천판받이 지주(홀드부)(9c)가 세워서 설치되어 있다. 천판받이 지주(9c)의 상단에는, 다른 천판(9)의 천판받이 지주(9c)의 하단에 맞닿아 지지하기 위한 컷아웃(받이부)(9d)이 마련되어 있고, 하단에는, 받이부(9d)에 대응한 치수의 맞닿음부(9e)가 설치되어 있다.As shown in FIG. 6, two hanging plates 9a are connected to the top plate 9. The hanging plate 9a has a long rectangular plate shape, extends orthogonally to the longitudinal direction of the top plate 9, and is placed upright with respect to the top plate 9. The hanging plate 9a has both ends 9b protruding outward from both edges of the top plate 9. The top plate support post (hold part) 9c which supports the other top plate 9 is provided in the edge part 9b upright. At the upper end of the top plate support post 9c, a cutout (dwelling section) 9d for abutting and supporting the lower end of the top plate support post 9c of the other top plate 9 is provided. The contact part 9e of the dimension corresponding to) is provided.

행잉 플레이트(9a) 각각에는, 행잉 다운을 위해서 브래킷부(27c)(도 3 참조)가 걸리는 관통공(걸어맞춤부)(9f)이 2군데에 형성되어 있다. 관통공(9f)은, 천판(9) 상에 겹쳐지는 위치에 마련되어 있고, 또한, 천판(9)을 매달았을 때의 밸런스를 고려해 천판받이 지주(9c)에 가까운 위치에 각각 설치되어 있다.In each of the hanging plates 9a, two through-holes (engaging portions) 9f through which the bracket portion 27c (see Fig. 3) is engaged for hanging down are formed. The through-hole 9f is provided in the position which overlaps on the top plate 9, and is provided in the position close | similar to the top plate support | pillar 9c in consideration of the balance at the time of hanging the top plate 9, respectively.

도 1에 나타내는 바와 같이, 각 챔버(4A~4E)는, 가설대(3) 상에서 일렬로 인접해 나열되어 있다. 가설대(3) 상에는, 각 챔버(4A~4E)의 나열방향(D)을 따라 설치된 2개의 레일(레일부)(11, 12)(도 4 참조)가 부설되어 있다. 2개의 레일(11, 12)은, 각 챔버(4A~4E)를 사이에 두도록 하여 배치되어 있어, 천판 체인저(13)의 이동을 안내한다. 일방의 레일(12)의 상면은 단면 역V자 형상으로 되어 있으며, 길이방향을 따라 천판 체인저(13)의 롤러(15a)의 어긋남을 방지하는 첨형(尖形)부(11a)가 형성되어 있다. 또한, 타방의 레일(12)의 상면은, 롤러(15b)가 순조롭게 구름운동되도록 평평한 평면으로 되어 있다.As shown in FIG. 1, each of the chambers 4A to 4E is arranged adjacently in a row on the temporary table 3. On the temporary table 3, two rails (rail parts) 11 and 12 (refer FIG. 4) provided along the row direction D of each chamber 4A-4E are provided. The two rails 11 and 12 are arrange | positioned so that each chamber 4A-4E may be interposed, and guide the movement of the top plate changer 13. The upper surface of one rail 12 has a cross-sectional reverse V-shape, and a sharp portion 11a is formed to prevent the roller 15a of the top plate changer 13 from shifting along the longitudinal direction. . In addition, the upper surface of the other rail 12 is a flat plane so that the roller 15b may roll smoothly.

도 2 내지 도 4에 나타내는 바와 같이, 천판 체인저(개폐수단)(13)는, 각 챔버(4A~4E)에 걸치듯이 형성된 문형 프레임(15)과, 문형 프레임(15)의 좌우의 다리부(15c)의 하단에 설치된 롤러(15a, 15b)의 주행부를 구비하고 있다. 좌우란, 레일(11, 12)의 길이방향에 직교하는 방향을 의미하고, 또한, 기판의 반송방향을 기준으로 보았을 경우의 좌우를 의미하고 있다. 또한, 후술하는 전후란, 레일(11, 12)의 길이방향을 따른 방향을 의미하고, 기판의 반송방향의 전후방향을 의미하고 있다. 다만, 도 4에서는, 기판의 반송방향과는 역방향에서 보았을 경우의 도면이기 때문에, 도면상의 좌우와는 반대로 되어 있다.As shown in FIGS. 2-4, the top plate changer (opening / closing means) 13 has the door frame 15 formed so that it may span each chamber 4A-4E, and the left-right leg part of the door frame 15 ( The traveling part of the roller 15a, 15b provided in the lower end of 15c is provided. The left and right means the direction orthogonal to the longitudinal direction of the rails 11 and 12, and also means the left and right when it sees with respect to the conveyance direction of a board | substrate. In addition, the back and front mentioned later means the direction along the longitudinal direction of the rails 11 and 12, and means the front-back direction of the conveyance direction of a board | substrate. However, in FIG. 4, since it is a figure seen from the reverse direction to the conveyance direction of a board | substrate, it is reversed to the left and right on drawing.

좌측의 다리부(15c)에는, 2개의 롤러(15a, 15a)가 앞뒤로 설치되어 있고, 우측의 다리부(15c)에는, 2개의 롤러(15b, 15b)가 앞뒤로 설치되어 있다. 롤러(15a)에는, 레일(11)의 첨형부(11a)가 끼워 넣어져 좌우의 어긋남이 방지되는 홈(15d)이 형성되어 있다(도 4 참조). 롤러(15b)에는, 레일(12) 상의 구름운동 저항을 억제하기 위하여 요철이 없는 평평한 둘레면(15e)이 마련되어 있다.Two rollers 15a and 15a are provided back and forth on the left leg portion 15c, and two rollers 15b and 15b are provided back and forth on the right leg portion 15c. The roller 15a is formed with a groove 15d in which the sharp portion 11a of the rail 11 is fitted to prevent left and right shifts (see FIG. 4). In order to suppress rolling motion resistance on the rail 12, the roller 15b is provided with the flat peripheral surface 15e without an unevenness | corrugation.

도 2에 나타내는 바와 같이, 문형 프레임(15)의 천정부분(도 2 참조)은, 평면에서 보아 직사각형의 프레임바디를 형성하는 4개의 프레임부(17L, 17R, 17F, 17B)로 이루어진다. 좌우에 배치된 프레임부(17L, 17R)는, 각각 레일(11, 12)과 동일 방향으로 뻗어 있고, 전후에 배치된 프레임부(17F, 17B)는, 레일(11, 12)과 직교하는 방향으로 뻗어 있다. 또한, 프레임바디의 내측에는, 좌우의 프레임부(17L, 17R)와 평행한 2개의 보조프레임부(18L, 18R)가 배치되어 있고, 보조프레임부(18L, 18R)의 양단은 전후의 프레임부(17F, 17B)에 고정되어 있다.As shown in FIG. 2, the ceiling part (refer FIG. 2) of the door-shaped frame 15 consists of four frame parts 17L, 17R, 17F, and 17B which form a rectangular frame body in plan view. The frame portions 17L and 17R arranged on the left and right sides extend in the same direction as the rails 11 and 12, respectively, and the frame portions 17F and 17B arranged before and after are perpendicular to the rails 11 and 12. Is laid out. In addition, two auxiliary frame portions 18L and 18R parallel to the left and right frame portions 17L and 17R are disposed inside the frame body, and both ends of the auxiliary frame portions 18L and 18R are formed at the front and rear frame portions. It is fixed to 17F and 17B.

문형 프레임(15)의 천정부분에는, 천판(9)을 승강시키는 승강기구(19)가 설치되어 있다. 승강기구(19)는, 축 동기부(21)와, 천판승강부(23)를 구비한다. 축 동기부(21)는, 좌우의 프레임부(17L, 17R) 및 좌우의 보조프레임부(18L, 18R)에 회전 가능하게 지지된 구동축부(21a)와, 구동축부(21a)에 연결된 구동모터(감속기 포함)(21b)를 가진다. 구동모터(21b)는, 좌측의 프레임부(17L)에 고정되어 있고, 구동축부(21a)는 구동모터(21b)의 구동에 의해 순방향 또는 역방향으로 회전한다. 여기서, 순방향이란, 천판(9)을 상승시키는 방향으로의 회전이고, 역방향이란 천판(9)을 강하시키는 방향으로의 회전이다.A lifting mechanism 19 for lifting the top plate 9 is provided in the ceiling portion of the door-shaped frame 15. The lifting mechanism 19 includes an shaft synchronizer 21 and a top plate lifting unit 23. The shaft synchronizer 21 includes a drive shaft portion 21a rotatably supported by the left and right frame portions 17L and 17R and the left and right auxiliary frame portions 18L and 18R, and a drive motor connected to the drive shaft portion 21a. 21b (including a reducer). The drive motor 21b is fixed to the frame portion 17L on the left side, and the drive shaft portion 21a rotates in the forward or reverse direction by the drive of the drive motor 21b. Here, the forward direction is rotation in the direction of raising the top plate 9, and the reverse direction is rotation in the direction of lowering the top plate 9.

또한, 축 동기부(21)는, 좌측의 프레임부(17L) 및 좌측의 보조프레임부(18L)에 회전 가능하게 지지된 제1 종동축부(21c)를 가진다. 제1 종동축부(21c)에는, 회전력이 전달되는 제1 종동스프라킷(21d)이 설치되어 있다. 또한, 축 동기부(21)는, 우측의 프레임부(17R) 및 우측의 보조프레임부(18R)에 회전 가능하게 지지된 제2 종동축부(21e)를 가진다. 제2 종동축부(21e)에는, 회전력이 전달되는 제2 종동스프라킷(21f)이 설치되어 있다. 그리고, 구동축부(21a)에는, 롤러체인(21j)을 통해 제1 종동스프라킷(21d)에 회전력을 전달하기 위한 제1 구동스프라킷(21k)과, 롤러체인(21g)을 통해 제2 종동스프라킷(21f)에 회전력을 전달하기 위한 제2 구동스프라킷(21h)이 설치되어 있다.The shaft synchronization portion 21 also has a first driven shaft portion 21c rotatably supported by the frame portion 17L on the left side and the auxiliary frame portion 18L on the left side. The first driven shaft 21c is provided with a first driven sprocket 21d through which rotational force is transmitted. In addition, the shaft synchronization part 21 has the 2nd driven shaft part 21e rotatably supported by the frame part 17R of the right side, and the auxiliary frame part 18R of the right side. In the second driven shaft portion 21e, a second driven sprocket 21f through which rotational force is transmitted is provided. The drive shaft portion 21a includes a first drive sprocket 21k for transmitting rotational force to the first driven sprocket 21d via the roller chain 21j and a roller chain 21g. The second drive sprocket 21h for transmitting the rotational force to the second driven sprocket 21f is provided.

천판승강부(23)는, 제1 종동축부(21c)에 설치된 승강스프라킷(25), 제2 종동축부(21e)에 설치된 승강스프라킷(25) 및 구동축부(21a)의 좌우 2군데에 설치된 승강스프라킷(25, 25)을 가진다. 또한, 천판승강부(23)는, 4개의 승강스프라킷(25) 각각에 연결된 롤러체인(27)을 가진다.The top plate elevating portion 23 is formed by the elevating sprocket 25 provided on the first driven shaft portion 21c, the elevating sprocket 25 provided on the second driven shaft portion 21e, and the driving shaft portion 21a. Lifting sprockets 25 and 25 are provided at two positions on the left and right sides. In addition, the top plate elevating unit 23 has a roller chain 27 connected to each of four elevating sprockets 25.

4개의 승강스프라킷(25) 및 롤러체인(27)의 구성은 동일하므로, 하나의 구성을 대표로 설명한다. 도 3에 나타내는 바와 같이, 롤러체인(27)은 고리형이 아니고, 양쪽의 단부(27a, 27b)를 가진다. 롤러체인(27)은, 승강스프라킷(25)에 부분적으로 감겨 있고, 일방의 단부(상단부)(27a)가 브래킷(27g)에 의해 승강스프라킷(25)에 결합되어 있다.Since the structures of the four lifting sprockets 25 and the roller chain 27 are the same, one structure is demonstrated as a representative. As shown in FIG. 3, the roller chain 27 is not annular but has both ends 27a and 27b. The roller chain 27 is partially wound on the lifting sprocket 25, and one end (upper end) 27a is coupled to the lifting sprocket 25 by a bracket 27g.

타방의 단부(하단부)(27b)에는, 천판(9)을 들어올리기 위한 브래킷부(27c)가 고정되어 있다. 브래킷부(27c)는, 행잉 플레이트(9a)를 끼우도록 삽입되는 U자 형상의 핀 지지부(27d)와, 핀 지지부(27d) 및 행잉 플레이트(9a)의 관통공(9f)(도 6 참조)을 관통하여, 브래킷부(27c)와 행잉 플레이트(9a)를 연결하는 고정핀(27e)을 구비하고 있다.A bracket portion 27c for lifting the top plate 9 is fixed to the other end portion (lower end portion) 27b. The bracket portion 27c has a U-shaped pin support portion 27d inserted to sandwich the hanging plate 9a, and a through hole 9f of the pin support portion 27d and the hanging plate 9a (see Fig. 6). The fixing pin 27e which penetrates through and connects the bracket part 27c and the hanging plate 9a is provided.

롤러체인(27)의 길이는, 문형 프레임(15)의 높이에 의존하여 바뀌지만, 챔버(4A~4E)에 장착된 상태에서의 천판(9)에 닿을 필요가 있다. 또한, 승강스프라킷(25)의 회전에 따라 천판(9)을 가장 높이 들어올린 상태에서의 승강스프라킷(25)에 대한 롤러체인(27)의 권취 길이는, 승강스프라킷(25)의 전체둘레의 3/4 정도의 길이가 되도록 설정한다.Although the length of the roller chain 27 changes depending on the height of the door frame 15, it is necessary to touch the top plate 9 in the state attached to chamber 4A-4E. In addition, the winding length of the roller chain 27 with respect to the elevating sprocket 25 in the state where the top plate 9 is lifted the highest with the rotation of the elevating sprocket 25 is the elevating sprocket 25. Set it to be about 3/4 of the total circumference.

4개의 승강스프라킷(25) 및 롤러체인(27)의 배치는, 천판(9)의 행잉 플레이트(9a)에 마련된 관통공(9f)에 대응하고 있고, 천판(9)을 밸런스 좋게 승강시키는 것에 배려하여, 4개의 롤러체인(27)의 중심과 천판(9)의 무게중심이 일치하게 되는 배치로 되어 있다. 다만, 좌우로 나열된 브래킷부(27c, 27c)는, 연결 브래킷(27f)(도 4 참조)을 통해 서로 연결되어 있다.The arrangement of the four lifting sprockets 25 and the roller chains 27 corresponds to the through holes 9f provided in the hanging plate 9a of the top plate 9, and allows the top plate 9 to move up and down in a balanced manner. In consideration of this, the arrangement is such that the center of the four roller chains 27 and the center of gravity of the top plate 9 coincide. However, the bracket parts 27c and 27c arranged to the left and right are mutually connected via the connection bracket 27f (refer FIG. 4).

다음으로, 성막장치(1)의 유지보수를 위한 천판(9)의 개폐작업의 순서에 대해 설명한다. 예컨대, 전단 버퍼챔버(4B)(도 1 참조)를 유지보수하는 경우에는, 천판 체인저(13)의 주행부의 롤러(15a, 15b)에 의하여, 전단 버퍼챔버(4B)를 걸치는 소정 위치까지 천판 체인저(13)를 이동시킨다.Next, the procedure of opening and closing the top plate 9 for maintenance of the film forming apparatus 1 will be described. For example, when maintaining the front end buffer chamber 4B (refer FIG. 1), the top plate changer is made to the predetermined position which hangs up the front end buffer chamber 4B by the rollers 15a and 15b of the running part of the top plate changer 13. Move (13).

다음으로, 천판 체인저(13)의 구동모터(21b)를 구동 제어하여, 승강스프라킷(25)에 고정된 4개의 롤러체인(27)의 브래킷부(27c)를 강하시킨다. 다음으로, 4개의 롤러체인(27) 모두의 브래킷부(27c)를 천판(9)의 행잉 플레이트(9a)에 걸어 고정한다.Next, the drive motor 21b of the top plate changer 13 is drive-controlled to lower the bracket portion 27c of the four roller chains 27 fixed to the lifting sprocket 25. Next, the bracket part 27c of all four roller chains 27 is fixed to the hanging plate 9a of the top plate 9, and is fixed.

다음으로, 구동모터(21b)를 구동 제어하여, 4개의 롤러체인(27) 모두를 동기하여 끌어올려, 천판(9)을 상승시킨다. 소정 위치까지 천판(9)이 상승하면 구동모터(21b)를 정지시키고, 그 위치에서 천판(9)을 지지한다.Next, drive control of the drive motor 21b is carried out, and all four roller chains 27 are pulled up synchronously, and the top plate 9 is raised. When the top plate 9 is raised to a predetermined position, the driving motor 21b is stopped and the top plate 9 is supported at the position.

다음으로, 천판 체인저(13)의 주행부의 롤러(15a, 15b)에 의하여, 예컨대, 이웃의 로드 락 챔버(4A)를 걸치는 소정 위치까지 천판 체인저(13)를 이동시킨다. 소정 위치에 도달하면, 구동모터(21b)를 구동 제어하여 천판(9)을 강하시켜서, 로드 락 챔버(4A)의 천판(9) 위에 실어놓는다(도 5 및 도 6 참조). 반송되어 온 천판(9)이 로드 락 챔버(4A)의 천판(9) 위에 실려서, 4개의 천판받이 지주(9c)에 의하여 확실히 지지되면, 천판(9)으로부터 롤러체인(27)의 브래킷부(27c)를 제거한다.Next, the top plate changer 13 is moved by the rollers 15a and 15b of the traveling part of the top plate changer 13 to a predetermined position that is, for example, the neighboring load lock chamber 4A. When the predetermined position is reached, the drive motor 21b is drive-controlled to lower the top plate 9, and is placed on the top plate 9 of the load lock chamber 4A (see FIGS. 5 and 6). When the conveyed top plate 9 is loaded on the top plate 9 of the load lock chamber 4A and securely supported by the four top plate support posts 9c, the bracket portion of the roller chain 27 from the top plate 9 ( Remove 27c).

이 상태에서 전단 버퍼챔버(4B)의 상방에는 천판(9)은 존재하지 않아, 작업자는 안심하고 유지보수 작업을 행할 수가 있다. 여기서, 전단 버퍼챔버(4B)의 유지보수 작업과 병행하여, 예컨대, 후단 버퍼챔버(4D)의 유지보수 작업을 행하는 경우에는, 천판(9)을 내려서 비워져 있는 천판 체인저(13)를, 후단 버퍼챔버(4D)를 걸치는 소정 위치까지 이동시켜서, 상술한 순서와 마찬가지의 순서에 의하여 천판(9)을 제거한다.In this state, the top plate 9 does not exist above the front end buffer chamber 4B, and the worker can perform maintenance work in peace. Here, in parallel with the maintenance work of the front end buffer chamber 4B, for example, when performing the maintenance work of the rear end buffer chamber 4D, the top plate changer 13 which is empty by lowering the top plate 9 is buffered at the rear end. The top plate 9 is removed by the same procedure as described above by moving the chamber 4D to a predetermined position.

유지보수 작업이 종료되면, 로드 락 챔버(4A)의 천판(9) 위에 실려 있는 천판(9)을 다시 롤러체인(27)에 장착하여 들어올려, 전단 버퍼챔버(4B)의 상방 위치까지 반송하고 내려서, 전단 버퍼챔버(4B)의 개구(7b)에 장착한다.When the maintenance work is finished, the top plate 9 loaded on the top plate 9 of the load lock chamber 4A is mounted on the roller chain 27 again, lifted up, and conveyed to the upper position of the front buffer chamber 4B. It lowers and attaches to the opening 7b of the front end buffer chamber 4B.

이상의 성막장치(챔버라인)(1)에 의하면, 천판 체인저(개폐수단)(13)는, 복수의 챔버(4A~4E)의 나열방향(D)을 따라서 배치된 레일(11, 12)을 따라 이동 가능하다. 따라서, 예컨대, 전단 버퍼챔버(4B)의 천판(9)을 승강시켜서 전단 버퍼챔버(4B)를 개폐하고, 또한 후단 버퍼챔버(4D)까지 이동하여 후단 버퍼챔버(4D)를 개폐하는 것도 가능해진다. 그 결과로, 적어도 하나의 천판 체인저(13)로 복수의 챔버(4A~4E)를 개폐시킬 수 있게 되어, 복수의 챔버(4A~4E) 각각에 천판의 개폐장치를 설치할 필요가 없어져서 설비를 심플하게 구축하기 쉬워지고, 비용절감에도 유효하다.According to the above film forming apparatus (chamber line) 1, the top plate changer (opening and closing means) 13 is along the rails 11 and 12 arranged along the direction D of the plurality of chambers 4A to 4E. It is mobile. Therefore, for example, it is also possible to open and close the front buffer chamber 4B by lifting and lowering the top plate 9 of the front buffer chamber 4B, and move to the rear buffer chamber 4D to open and close the rear buffer chamber 4D. . As a result, the plurality of chambers 4A to 4E can be opened and closed by the at least one top plate changer 13, so that it is not necessary to install the opening and closing apparatus of the top plate in each of the plurality of chambers 4A to 4E, thereby simplifying the installation. It is easy to build and effective for cost reduction.

또한, 힌지식 개폐기구에서는, 천판의 개방시라 하더라도 천판이 작업자의 머리 위에 남아 있어서, 작업자의 안전 측면을 고려하여 매우 강고하게 천판을 지지하는 기구를 구축해 놓을 필요가 있다. 특히, 천판은, 500㎏ 이상이나 되는 중량물이기 때문에, 천판을 받쳐서 지지해 두기 위한 설비는 엄청나게 대단한 것이 되기 쉽다. 그러나, 본 실시형태에서는, 천판(9)은, 챔버(4A~4E)로부터 이탈 가능하기 때문에, 챔버(4A~4E)로부터 이탈한 천판(9)과 함께 천판 체인저(13)를 이동시킴으로써, 천판(9)이 제거된 챔버(4A~4E)의 상방에, 넓고 안전한 작업영역을 간단히 확보할 수 있어서, 컴팩트하고 심플한 설비의 구축에 유효하다.In addition, in the hinge type opening and closing mechanism, even when the top plate is opened, the top plate remains on the operator's head, and it is necessary to construct a mechanism that supports the top plate very firmly in consideration of the safety aspect of the operator. In particular, since the top plate is a heavy product of 500 kg or more, the equipment for supporting and supporting the top plate tends to be enormous. However, in this embodiment, since the top plate 9 can be separated from the chambers 4A to 4E, the top plate 9 is moved by moving the top plate changer 13 together with the top plate 9 separated from the chambers 4A to 4E. Above the chambers 4A to 4E from which (9) has been removed, a wide and safe working area can be easily secured, which is effective for constructing a compact and simple facility.

또한, 예컨대, 힌지식 개폐기구에서는, 천정덮개의 개도(開度)는 90° 이하로서 충분하지는 않아서, 유지보수시의 작업성이 나빴지만, 본 실시형태에서는, 천판(9)을 제거함으로써 완전히 개방되기 때문에, 유지보수시의 작업성도 매우 높아진다.For example, in the hinge type opening / closing mechanism, the opening degree of the ceiling cover was not enough as 90 degrees or less, and the workability at the time of maintenance was bad, but in this embodiment, by removing the top plate 9 completely, Since it is open, workability during maintenance also becomes very high.

게다가, 천판(9)에는, 다른 천판(9)을 겹쳐 쌓아 지지하는 천판받이 지주(홀드부)(9c)가 설치되어 있다. 따라서, 천판 체인저(13)에 의해 챔버(4A~4E)로부터 제거된 천판(9)은, 예컨대 이웃의 천판(9)에 겹쳐 쌓아 임시 적재 가능하므로, 복수의 천판(9)을 동시에 개방할 수가 있다.In addition, the top plate 9 is provided with a top plate support post (hold portion) 9c for stacking and supporting the other top plates 9. Therefore, the top plate 9 removed from the chambers 4A to 4E by the top plate changer 13 can be stacked temporarily on the top plate 9 of the neighbor, for example, so that the plurality of top plates 9 can be opened at the same time. have.

또한, 천판 체인저(13)의 승강기구(19)는, 하단부(27b)가 천판(9)에 결합되는 롤러체인(27)과, 롤러체인(27)이 감겨진 승강스프라킷(25)과, 승강스프라킷(25)을 회전 구동하는 구동모터(21b)부를 가지고, 롤러체인(27)의 상단부(27a)는 승강스프라킷(25)에 결합되어 있다. 따라서, 승강스프라킷(25)의 회전에 따라 롤러체인(27)은 확실히 감아 올라가게 되고, 그 결과로 천판(9)을 확실히 상승시킬 수 있다.In addition, the lifting mechanism 19 of the top plate changer 13 includes a roller chain 27 having a lower end portion 27b coupled to the top plate 9, a lifting sprocket 25 on which the roller chain 27 is wound, And a drive motor 21b portion for driving the lifting sprocket 25 to rotate, and the upper end portion 27a of the roller chain 27 is coupled to the lifting sprocket 25. Therefore, the roller chain 27 is reliably wound up with the rotation of the elevating sprocket 25, and as a result, the top plate 9 can be reliably raised.

특히, 천정 높이의 제한이 엄격한 클린룸 내에서는, 심플하고 높이가 낮은 천판 개폐장치가 요구되는데, 상기의 승강기구(19)로 함으로써, 컴팩트하고 심플한 장치로 하는 것이 가능해진다.In particular, in a clean room where the ceiling height is severely restricted, a simple and low height top plate opening and closing device is required. By using the elevating mechanism 19 described above, a compact and simple device can be obtained.

또한 천판 체인저(13)의 승강기구(19)는, 축 동기부(21)를 가지므로, 4개의 체인을 동시에 어긋남 없이 승강시킬 수 있어, 천판(9)을 안정적으로 승강시킬 수 있으며, 설비의 컴팩트화에 유리하다.In addition, since the elevating mechanism 19 of the top plate changer 13 has an axial synchronizer 21, the four chains can be raised and lowered at the same time without misalignment, so that the top plate 9 can be raised and lowered stably. It is advantageous for compactness.

이상, 본 발명을 그 실시형태에 근거하여 구체적으로 설명하였지만, 본 발명은, 상기 실시형태에 한정되는 것은 아니다. 예컨대, 본 실시형태에서는, 단일의 성막 라인을 구성하는 성막장치에, 하나의 개폐수단(천판 체인저)을 설치한 예를 설명하였지만, 서로 간섭하지 않는 배치로 설치한다거나, 이동범위나 이동순서를 제어한다거나 함으로써 복수의 개폐수단을 설치하는 것도 가능하다. 또한, 복수의 성막 라인에 대해서 단일의 개폐수단이 덮개부를 개폐할 수 있는 구성을 채용하는 것도 가능하다.
As mentioned above, although this invention was concretely demonstrated based on the embodiment, this invention is not limited to the said embodiment. For example, in the present embodiment, an example in which one opening / closing means (top plate changer) is provided in the film forming apparatus constituting a single film forming line, is provided in an arrangement that does not interfere with each other, or the movement range and the movement order are controlled. It is also possible to provide a plurality of opening and closing means. Moreover, it is also possible to employ | adopt the structure which a single opening / closing means can open and close a cover part with respect to several film-forming lines.

1…성막장치(챔버라인) 4A~4E…챔버
9…천판 9c…천판받이 지주(홀드부)
11, 12…레일(레일부) 13…천판 체인저(개폐수단)
21b…구동모터(구동부) 25…승강스프라킷
27…롤러체인 27a…상단부(일단)
27b…하단부(타단) D…나열방향One… Film deposition apparatus (chamber line) 4A ~ 4E. chamber
9 ... Top plate 9c... Top plate prop (hold part)
11, 12... Rail (rail part) 13.. Top plate changer
21b... Drive motor 25. Lifting Sprocket
27 ... Roller chain 27a... Upper part (one end)
27b... Lower end (the other end) D... List Direction

Claims (4)

덮개부를 가지는 챔버를 복수 인접하여 나열한 챔버라인에 있어서,
상기 챔버의 나열방향을 따라서 배치된 레일부와,
상기 레일부를 따라서 이동 가능하며, 상기 챔버에 설치된 상기 덮개부를 승강시켜서 상기 챔버를 개폐할 수 있는 개폐수단
을 구비하는 것을 특징으로 하는 챔버라인.In the chamber line which arranged the chamber which has a cover part adjacently,
A rail unit disposed along the alignment direction of the chamber,
Opening and closing means which can move along the rail part and opens and closes the chamber by elevating the cover part installed in the chamber.
Chamber line comprising a. 청구항 1에 있어서,
상기 덮개부는, 상기 챔버로부터 이탈 가능한 것을 특징으로 하는 챔버라인.The method according to claim 1,
The cover part, characterized in that the chamber is separated from the chamber. 청구항 2에 있어서,
상기 덮개부에는, 다른 상기 덮개부를 겹쳐 쌓아서 지지하는 홀드부가 설치되어 있는 것을 특징으로 하는 챔버라인.The method according to claim 2,
And the lid portion is provided with a hold portion for stacking and supporting the other lid portions. 청구항 1 내지 청구항 3 중 어느 한 항에 있어서,
상기 개폐수단은, 일단이 상기 덮개부에 결합될 수 있는 롤러체인과, 상기 롤러체인이 감겨진 스프라킷과, 상기 스프라킷을 회전 구동하는 구동부를 가지고,
상기 롤러체인의 타단은 상기 스프라킷에 결합되어 있는 것을 특징으로 하는 챔버라인.The method according to any one of claims 1 to 3,
The opening and closing means has a roller chain, one end of which can be coupled to the cover part, a sprocket on which the roller chain is wound, and a driving part to rotationally drive the sprocket,
Chamber line, characterized in that the other end of the roller chain is coupled to the sprocket.
KR1020100094156A 2010-09-29 2010-09-29 Chamber line KR101171758B1 (en)

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JP4302693B2 (en) 2003-05-30 2009-07-29 東京エレクトロン株式会社 Lid opening / closing mechanism of vacuum processing chamber and lid opening / closing method
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