KR20110040515A - Chemical application nozzle and chemical application apparatus including the same - Google Patents

Chemical application nozzle and chemical application apparatus including the same Download PDF

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Publication number
KR20110040515A
KR20110040515A KR1020090097818A KR20090097818A KR20110040515A KR 20110040515 A KR20110040515 A KR 20110040515A KR 1020090097818 A KR1020090097818 A KR 1020090097818A KR 20090097818 A KR20090097818 A KR 20090097818A KR 20110040515 A KR20110040515 A KR 20110040515A
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KR
South Korea
Prior art keywords
chemical liquid
body portion
recess
flow path
nozzle
Prior art date
Application number
KR1020090097818A
Other languages
Korean (ko)
Inventor
현재일
Original Assignee
세메스 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 세메스 주식회사 filed Critical 세메스 주식회사
Priority to KR1020090097818A priority Critical patent/KR20110040515A/en
Publication of KR20110040515A publication Critical patent/KR20110040515A/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1026—Valves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0225—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet

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Abstract

The chemical liquid application nozzle includes a first body portion and a second body portion, the first body portion extends in one direction and has one or more protrusions formed along one direction on one surface thereof, such that the second body portion faces each other with the first body portion. It is coupled to form a flow path for the chemical liquid, and has a discharge port at the end of the flow path has one or more grooves formed in one direction on one surface facing the first body portion and the projection is inserted. The recess has a shape in which the inside is rounded. Therefore, it is possible to suppress the vortex generation of the chemical liquid passing through the recess, thereby enabling uniform chemical liquid discharge.

Description

Chemical liquid application nozzle and the chemical liquid application apparatus including the same {chemical application Nozzle and chemical application apparatus including the same}

The present invention relates to a chemical liquid applying nozzle and a chemical liquid applying apparatus including the same, and more particularly, to a chemical liquid applying nozzle capable of uniform chemical liquid discharge from a slit discharge port and a chemical liquid applying apparatus including the same.

In general, a flat panel display device includes a liquid crystal display device (LCD) using liquid crystal, a plasma display device (PDP) using plasma, an organic light emitting display device (OLED) using an organic light emitting element, and the like.

Recently, among them, a liquid crystal display device having low power consumption and volume and capable of low power driving has been widely used. The liquid crystal display device includes a display panel for substantially displaying an image. The display panel is typically manufactured by repeatedly performing various unit processes to form a circuit pattern on the substrate using a large-area substrate made of glass.

A process of manufacturing the display panel includes a developing process, and the developing process is performed by uniformly supplying a developing solution to the surface of the substrate. For example, development is performed by uniformly applying a developer on the exposed substrate surface to form a puddle for a predetermined time. A chemical solution applying nozzle having a slit discharge port is used to apply the developer, and a uniform developer may be applied only when a curtain formed by the developer discharged from the nozzle is maintained in a constant shape without cracking.

However, the conventional chemical liquid application nozzle has a problem in that comb teeth are formed in the developer curtain that is finally discharged due to the vortex generated in the buffer part provided on the discharge port.

Accordingly, one problem to be solved by the present invention is to provide a chemical liquid applying nozzle which can uniformly discharge the chemical liquid curtain finally discharged without cracking or combing by suppressing the vortex generated inside the nozzle.

In addition, it is to provide a chemical liquid applying apparatus capable of uniform application of the chemical liquid, including the chemical liquid application nozzle.

In order to achieve the above object of the present invention, the chemical liquid application nozzle includes a first body part and a second body part. The first body portion extends in one direction and has one or more protrusions formed along one direction on one surface thereof. The second body portion is coupled to face the first body portion to form a flow path for the chemical liquid flow, has a discharge port at the end of the flow path, is formed along the one direction on one surface facing the first body portion It has at least one recess in which the protrusion is inserted. In particular, the groove portion is characterized in that the inside is rounded.

At this time, the first body portion in the chemical liquid applying nozzle according to an embodiment has a first protrusion and a second protrusion formed on the one surface at a predetermined interval from each other, the second body portion on one surface facing the first body portion It may have a first groove portion and a second groove portion which is formed, respectively, the first protrusion and the second protrusion is inserted.

In the chemical liquid application nozzle according to another embodiment, the length from the recess to the discharge port may be 13 mm to 17 mm.

In order to achieve the above object of the present invention, a chemical liquid applying apparatus according to the present invention includes a chemical liquid supply source for supplying a chemical liquid, a pipe connected to the chemical liquid supply source for delivering the chemical liquid, and connected to the piping to form the chemical liquid on a substrate. It includes a chemical liquid application nozzle for discharging. Here, the chemical liquid applying nozzle includes a first body portion and a second body portion, wherein the first body portion extends in one direction, and has one or more protrusions formed along the one direction on one surface thereof, and the second body portion includes the first body portion. One or more body portion is coupled to face each other to form a flow path for the chemical liquid, and has a discharge port at the end of the flow path, at least one side formed in one direction on the surface facing the first body portion and the protrusion is inserted It has a groove portion, the groove portion has a shape in which the inside is rounded.

The chemical liquid application nozzle according to the present invention configured as described above has a processed shape in which the inside of the groove portion connected to the flow path is rounded, thereby suppressing vortex of the chemical liquid flowing in the groove portion to suppress cracking and combing of the chemical liquid curtain finally discharged. Can be.

In addition, by forming the length from the groove portion to the discharge port to a predetermined length or more, a flow path (or time) for stabilizing the chemical liquid discharged through the groove portion to the discharge hole can be stabilized, so that the influence of the vortex that may occur in the groove portion It can be improved.

Therefore, it is possible to form a uniform chemical liquid curtain and to discharge the uniform chemical liquid.

Hereinafter, a chemical liquid applying nozzle and a chemical liquid applying apparatus including the same will be described with reference to the accompanying drawings.

As the inventive concept allows for various changes and numerous embodiments, particular embodiments will be illustrated in the drawings and described in detail in the text. However, this is not intended to limit the present invention to the specific disclosed form, it should be understood to include all modifications, equivalents, and substitutes included in the spirit and scope of the present invention. Like reference numerals are used for like elements in describing each drawing. In the accompanying drawings, the dimensions of the structures are enlarged to illustrate the invention, and are actually shown in a smaller scale than the actual dimensions in order to explain the schematic configuration. The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as the second component, and similarly, the second component may also be referred to as the first component.

The terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting of the present invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this application, the terms "comprise" or "have" are intended to indicate that there is a feature, number, step, action, component, part, or combination thereof described on the specification, and one or more other features. It is to be understood that the present invention does not exclude the possibility of the presence or the addition of numbers, steps, operations, components, parts, or combinations thereof.

On the other hand, unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art. Terms such as those defined in the commonly used dictionaries should be construed as having meanings consistent with the meanings in the context of the related art and shall not be construed in ideal or excessively formal meanings unless expressly defined in this application. Do not.

1 is a cross-sectional view schematically showing a chemical liquid application nozzle according to an embodiment of the present invention, Figure 2 is an enlarged view showing the recess of the chemical liquid application nozzle shown in Figure 1, Figure 3 is a chemical liquid application shown in Figure 1 A side cross-sectional view schematically showing a nozzle.

1 to 3, the chemical liquid applying nozzle 100 according to the exemplary embodiment of the present invention includes a first body part 110 and a second body part 120. The chemical liquid applying nozzle 100 may have a length corresponding to the width direction of the substrate.

The chemical liquid applying nozzle 100 may be preferably used to discharge and apply the chemical liquid onto the glass substrate in the manufacturing process of the flat panel display panel. It can also be used in the manufacturing process of semiconductor devices as a technology similar to display manufacturing. Here, the chemical liquid may be, for example, a developing solution for a developing process. Alternatively, the chemical liquid may be a processing liquid used for a substrate processing process, such as an etching solution for an etching process and a cleaning solution for a cleaning process.

The first body part 110 extends in one direction. As the chemical liquid applying nozzle 100 has a length corresponding to the width of the substrate, the first body part 110 also has a length corresponding to the width of the substrate. The first body part 110 has one or more protrusions 112 on one surface facing the second body part 120. For example, the first body part 110 has a first protrusion 112 and a second protrusion 114 on one surface thereof. The first protrusion 112 and the second protrusion 114 are formed to be spaced apart from each other, and are formed to extend in one direction, which is an extension direction of the first body portion 110.

The second body portion 120 extends in one direction. The second body part 120 has a length corresponding to the first body part 110. As the first body portion 110 has a length corresponding to the width of the substrate, the second body portion 120 also has a length corresponding to the width of the substrate. The second body part 120 is coupled to face the first body part 110. That is, the second body portion 120 is coupled such that one surface thereof faces one surface of the first body portion 110. The second body part 120 forms a slit-shaped flow path 130 through which the chemical liquid flows through coupling with the first body part 110, and an outlet 132 for discharging the chemical liquid at the end of the flow path 130. Have One surface of the first body part 110 or the second body part 120 has a pattern for forming the flow path 130. 2 illustrates a case in which a pattern forming the flow path 130 is formed in the second body part 120.

The second body portion 120 has one or more recesses 122 on one surface facing the first body portion 110. For example, the second body 120 has a first recess 122 and a second recess 124 on one surface thereof. The first and second recesses 122 and 124 are formed to be spaced apart from each other, and the second recess 124 is located behind the first recess 122 on the path of the flow path 130. The first and second recesses 122 and 124 are formed to extend along one direction in which the second body portion 120 extends. In addition, the first recess 122 is formed at a position corresponding to the first protrusion 112, and the second recess 124 is formed at a position corresponding to the second protrusion 114. In addition, the first protrusion 112 is inserted into the first recess 122, and the second protrusion 114 is inserted into the second recess 124. When the first protrusion 112 is inserted into the first recess 122, the first protrusion 112 is inserted into the first recess 122 in a floating state so that the chemical liquid flows. To this end, the width of the first protrusion 112 has a width shorter than the depth of the first recess 122. Therefore, the chemical liquid flowing into the first recess 122 through the flow path 130 flows through a space formed between the first protrusion 112 and the first recess 122. As a result, it has a flow path bent by the first recess 122 and the first protrusion 112. The second protrusion 114 is also formed in the same manner as the first protrusion 112.

A chemical liquid supply pipe 222 is connected to the second body 120 to deliver an external chemical liquid to the flow path 130. A supply hole 126 is provided between the pipe 222 and the flow path 130 for chemical liquid delivery. Preferably, the pipe 222 and the supply hole 126 are provided in plural to uniformly discharge the chemical liquid. The plurality of pipes 222 and the supply holes 126 are arranged along the length direction of the second body part 120 and are arranged at regular intervals from each other. Meanwhile, the pipe 222 and the supply hole 126 may not be formed in the second body part 120 but may be provided in the first body part 110 in the same configuration. In addition, the pipe 222 may be formed in a single line, and may have a structure in which a plurality of branches are adjacent to the second body part 120 by an additional branch member.

According to the chemical liquid application nozzle 100 having such a structure, the chemical liquid delivered to the flow path 130 is discharged to the discharge port 132 through the first recess 122 and the second recess 124 in order. In particular, the chemical liquid is formed along the interior of the first and second recesses 122 and 124 by the first and second protrusions 112 and 114 respectively inserted into the first and second recesses 122 and 124, respectively. Will flow. In other words, the flow path 130 has a bent structure by the first and second recesses 122 and 124 and the first and second protrusions 112 and 114.

When the chemical liquid flows along the inner walls of the first and second recesses 122 and 124, when the inner walls of the first and second recesses 122 and 124 have angled corners, the chemical liquid is formed at the angled corners. Vortex may occur. In this way, the vortex generated in the chemical liquid is a factor causing cracking or combing phenomenon in the chemical liquid curtain finally discharged through the discharge port 132 is required to improve. Therefore, it is preferable to suppress the vortex inside the first and second recesses 122 and 124 for uniform chemical liquid discharge.

To this end, in the present embodiment, the interior of the first and second recesses 122 and 124 has a rounded structure. As the inside of the first and second recesses 122 and 124 has a rounded structure, the chemical liquid flowing along the inside of the first and second recesses 122 and 124 flows naturally along the rounded surface. Therefore, it has the effect that generation | occurrence | production of a vortex is suppressed. Therefore, it is possible to improve the cracking or combing phenomenon of the chemical curtain that is discharged through the discharge port 132.

In addition, in the present embodiment, the length from the second recess 124 to the discharge port 132 is formed to have a predetermined distance or more for uniform chemical liquid discharge. As such, the distance from the second recess 124 to the discharge port 132 is formed to have a predetermined distance or more, so that the vortices that may occur in the chemical solution may be stabilized while passing through the first and second recesses 122 and 124. Get a route (or time) For example, the length from the second recess 124 to the discharge port 132 may have a length of about 13 mm to 17 mm. More preferably about 15 mm in length. If the length from the second recess 124 to the discharge port 132 is too short than the above range, the path (time) for stabilization of the chemical solution may be insufficient, and if the length is longer than the above range, the discharge pressure of the chemical solution is longer. This may be lowered, which is undesirable.

Hereinafter, a chemical liquid applying apparatus including the chemical liquid applying nozzle 100 will be described.

4 is a view schematically showing a chemical liquid applying apparatus according to an embodiment of the present invention.

Here, since the chemical liquid application nozzle 100 shown in FIG. 4 is the same as the chemical liquid application nozzle 100 described with reference to FIGS. 1 to 3, the same reference numerals are used for the same members, and the overlapping portions will be described in detail. Omit and briefly explain the differences.

Referring to FIG. 4, the chemical liquid applying apparatus 200 includes a chemical liquid supply source 220, a pipe 222, and a chemical liquid applying nozzle 100.

The chemical liquid applying apparatus 200 serves to apply the chemical liquid to the surface of the substrate 10 transferred in one direction by the substrate transfer unit 20.

The chemical liquid source 220 stores the chemical liquid to be applied to the surface of the substrate 10 and supplies the chemical liquid as necessary. The chemical liquid source 220 may include a storage tank. The chemical liquid may be, for example, a developer for a developing process. Alternatively, the chemical liquid may be an etching liquid for an etching process, or may be a cleaning liquid for a cleaning process, and may be various kinds of chemical liquids used for treating other substrates.

The pipe 222 is connected to the chemical liquid supply source 220, and serves to supply the chemical liquid of the chemical liquid supply source 220 to the chemical liquid application nozzle 100. On the pipe 222, a valve 224 is provided to open and close the pipe 222 to control the chemical liquid supply, and the supply amount of the chemical liquid is adjusted by adjusting the valve 224. In the figure, the pipe 222 is shown in a single structure. However, the pipe 222 may be provided with a pipe 222 for supplying a chemical liquid and an auxiliary pipe (not shown) for removing air in the chemical liquid. The auxiliary pipe (not shown) may be connected to the pipe 222 in a parallel structure, and may include an auxiliary valve (not shown) for discharging air.

In addition, although not shown, the pipe 222 and the connection portion of the chemical liquid application nozzle 100 has a structure in which the pipe 222 is branched to be connected to the chemical liquid application nozzle 100 and a plurality of points, or for branching structure It can be connected via the member.

The chemical liquid applying nozzle 100 is connected to the pipe 222 and serves to discharge the chemical liquid provided through the pipe 222 onto the substrate 10. The chemical liquid application nozzle 100 discharges the chemical liquid through a slit-shaped discharge port 132 in a curtain structure. Thus, the chemical is applied onto the substrate 10 as the substrate 10 passes through the chemical curtain.

The chemical liquid application nozzle 100 includes a first body portion 110 and a second body portion 120. The first body part 110 has first and second protrusions 112 and 114 formed at predetermined intervals. The second body part 110 has first and second recesses 122 and 124 into which the first and second protrusions 112 and 114 are inserted, respectively. In particular, the first and second recesses 122 and 124 have a structure in which the inside is rounded to suppress vortices formed in the chemical liquid flowing therein. In addition, the length from the second groove portion 124 to the discharge port 132 has a length of about 13mm to 17mm for chemical stabilization.

As described above, in the preferred embodiment of the present invention, since the chemical liquid applying nozzle and the chemical liquid applying device including the same have a structure in which the inside of the chemical damping groove is rounded, the vortex generated in the chemical flowing through the groove is suppressed and the chemical liquid The cracking or combing of the curtain is improved. Through this, uniform chemical liquid discharge is possible, and uniform chemical liquid application is possible.

In addition, the length from the damping groove portion to the discharge port is formed to have a predetermined length range, so that the flow path (time) for stabilizing the chemical liquid passing through the groove portion is secured, so that the influence of the chemical liquid by vortex can be improved. Therefore, the chemical liquid can be discharged uniformly, and uniform chemical liquid application is possible.

Therefore, the chemical liquid applying nozzle and the chemical liquid applying apparatus including the same may be preferably used in the chemical liquid applying apparatus for uniform chemical liquid discharge by improving the cracking or combing of the chemical liquid curtain to be discharged.

While the foregoing has been described with reference to preferred embodiments of the present invention, those skilled in the art will be able to variously modify and change the present invention without departing from the spirit and scope of the invention as set forth in the claims below. It will be appreciated.

1 is a cross-sectional view schematically showing a chemical liquid applying nozzle according to an embodiment of the present invention.

FIG. 2 is an enlarged view illustrating a recess of the chemical liquid application nozzle shown in FIG. 1.

3 is a side cross-sectional view schematically showing the chemical liquid application nozzle shown in FIG.

4 is a view schematically showing a chemical liquid applying apparatus according to an embodiment of the present invention.

Explanation of symbols on the main parts of the drawings

100: chemical liquid application nozzle 110: the first body portion

112: first protrusion 114: second protrusion

120: second body portion 122: first groove portion

124: second groove 126: supply hole

130: flow path 132: discharge port

200: chemical liquid application device 220: chemical liquid supply source

222: piping 224: valve

10: substrate 20: substrate transfer unit

Claims (4)

A first body portion extending in one direction and having one or more protrusions formed on one surface thereof in one direction; And It is coupled to face each other with the first body portion to form a flow path for the chemical liquid, has a discharge port at the end of the flow path, is formed in one direction on the surface facing the first body portion and the protrusion is inserted A second body portion having one or more recesses, The recess is a chemical liquid application nozzle, characterized in that the inside is rounded. The method of claim 1, wherein the first body portion has a first protrusion and a second protrusion formed on the surface at regular intervals from each other, The second body portion is formed on one surface facing the first body portion, the chemical liquid applying nozzle, characterized in that it has a first groove portion and a second groove portion is inserted into the first projection and the second projection, respectively. The chemical liquid applying nozzle according to claim 1, wherein the length from the groove portion to the discharge port is 13 mm to 17 mm. A chemical liquid source for supplying a chemical liquid; A pipe connected to the chemical liquid supply source to deliver the chemical liquid; And A chemical liquid applying nozzle connected to the pipe and discharging the chemical liquid onto a substrate; The chemical liquid application nozzle, A first body portion extending in one direction and having one or more protrusions formed on one surface thereof in one direction; And It is coupled to face each other with the first body portion to form a flow path for the chemical liquid, has a discharge port at the end of the flow path, is formed in one direction on the surface facing the first body portion and the protrusion is inserted At least one recess, wherein the recess is a chemical liquid applying device, characterized in that it comprises a second body portion rounded.
KR1020090097818A 2009-10-14 2009-10-14 Chemical application nozzle and chemical application apparatus including the same KR20110040515A (en)

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KR1020090097818A KR20110040515A (en) 2009-10-14 2009-10-14 Chemical application nozzle and chemical application apparatus including the same

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Application Number Priority Date Filing Date Title
KR1020090097818A KR20110040515A (en) 2009-10-14 2009-10-14 Chemical application nozzle and chemical application apparatus including the same

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KR20110040515A true KR20110040515A (en) 2011-04-20

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107433233A (en) * 2017-08-18 2017-12-05 武汉华星光电技术有限公司 A kind of developing apparatus and its nozzle

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107433233A (en) * 2017-08-18 2017-12-05 武汉华星光电技术有限公司 A kind of developing apparatus and its nozzle

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