KR20110016400A - 측정 장치, 노광 장치 및 디바이스 제조 방법 - Google Patents

측정 장치, 노광 장치 및 디바이스 제조 방법 Download PDF

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Publication number
KR20110016400A
KR20110016400A KR1020100074657A KR20100074657A KR20110016400A KR 20110016400 A KR20110016400 A KR 20110016400A KR 1020100074657 A KR1020100074657 A KR 1020100074657A KR 20100074657 A KR20100074657 A KR 20100074657A KR 20110016400 A KR20110016400 A KR 20110016400A
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KR
South Korea
Prior art keywords
substrate
light
measurement
light beam
detection units
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020100074657A
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English (en)
Korean (ko)
Inventor
료 사사끼
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20110016400A publication Critical patent/KR20110016400A/ko
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G01B9/02028—Two or more reference or object arms in one interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02022—Interferometers characterised by the beam path configuration contacting one object by grazing incidence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/0209—Low-coherence interferometers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034—Leveling
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020100074657A 2009-08-10 2010-08-02 측정 장치, 노광 장치 및 디바이스 제조 방법 Ceased KR20110016400A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2009-186143 2009-08-10
JP2009186143A JP5406623B2 (ja) 2009-08-10 2009-08-10 計測装置、露光装置及びデバイスの製造方法

Publications (1)

Publication Number Publication Date
KR20110016400A true KR20110016400A (ko) 2011-02-17

Family

ID=43534614

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020100074657A Ceased KR20110016400A (ko) 2009-08-10 2010-08-02 측정 장치, 노광 장치 및 디바이스 제조 방법

Country Status (4)

Country Link
US (1) US8593615B2 (enExample)
JP (1) JP5406623B2 (enExample)
KR (1) KR20110016400A (enExample)
TW (1) TWI427433B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103207532A (zh) * 2013-04-21 2013-07-17 中国科学院光电技术研究所 一种同轴检焦测量系统及其测量方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5971965B2 (ja) * 2012-02-07 2016-08-17 キヤノン株式会社 面形状計測方法、面形状計測装置、プログラム、および、光学素子の製造方法
CN103309163B (zh) * 2012-03-07 2015-08-26 上海微电子装备有限公司 外参考干涉硅片对准系统
US10152998B2 (en) * 2014-04-07 2018-12-11 Seagate Technology Llc Features maps of articles with polarized light
JP6412710B2 (ja) * 2014-04-08 2018-10-24 株式会社ミツトヨ 光干渉測定装置
WO2016084194A1 (ja) * 2014-11-27 2016-06-02 株式会社東京精密 形状測定装置
JP6685741B2 (ja) * 2015-02-16 2020-04-22 キヤノン株式会社 形状計測方法、形状計測装置、プログラム、記録媒体及び光学素子の製造方法
JP2017090395A (ja) * 2015-11-17 2017-05-25 株式会社ミツトヨ 干渉対物レンズ及び参照面ユニットセット
JP6704813B2 (ja) * 2016-08-05 2020-06-03 キヤノン株式会社 計測装置、露光装置、および物品の製造方法
CN107966453B (zh) 2016-10-20 2020-08-04 上海微电子装备（集团）股份有限公司 一种芯片缺陷检测装置及检测方法
US10794688B2 (en) * 2018-03-07 2020-10-06 Mitutoyo Corporation Optical interference measuring device
KR20230099850A (ko) * 2021-12-28 2023-07-05 삼성전자주식회사 이미징 어셈블리 및 이를 포함하는 분광 영상 타원분광기

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4340306A (en) * 1980-02-04 1982-07-20 Balasubramanian N Optical system for surface topography measurement
US6560299B1 (en) * 1999-07-30 2003-05-06 Christopher H Strolle Diversity receiver with joint signal processing
DE10039239A1 (de) 2000-08-11 2002-03-07 Bosch Gmbh Robert Optische Messvorrichtung
JP4216805B2 (ja) 2002-07-01 2009-01-28 ライトゲイジ インコーポレイテッド 非鏡面基準表面をもつ周波数走査型干渉計
KR100641885B1 (ko) 2004-06-15 2006-11-02 주식회사 나노시스템 수평 방향 스캐닝 방식의 광위상 간섭측정방법 및 장치
JP4554385B2 (ja) * 2005-01-27 2010-09-29 浜松ホトニクス株式会社 表面形状計測方法及び計測装置
JP2006242570A (ja) * 2005-02-28 2006-09-14 Fuji Xerox Co Ltd 表面形状測定装置
WO2007044786A2 (en) * 2005-10-11 2007-04-19 Zygo Corporation Interferometry method and system including spectral decomposition
KR101257538B1 (ko) 2006-02-01 2013-04-24 토레 엔지니어링 가부시키가이샤 표면형상의 측정방법 및 이것을 이용한 장치
JP4884850B2 (ja) * 2006-06-13 2012-02-29 浜松ホトニクス株式会社 干渉測定装置
JP4987359B2 (ja) * 2006-06-13 2012-07-25 浜松ホトニクス株式会社 表面形状計測装置
US7916284B2 (en) 2006-07-18 2011-03-29 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
JP4512627B2 (ja) 2007-10-03 2010-07-28 キヤノン株式会社 測定装置、露光装置及びデバイス製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103207532A (zh) * 2013-04-21 2013-07-17 中国科学院光电技术研究所 一种同轴检焦测量系统及其测量方法

Also Published As

Publication number Publication date
TW201107905A (en) 2011-03-01
US20110032504A1 (en) 2011-02-10
JP5406623B2 (ja) 2014-02-05
JP2011040548A (ja) 2011-02-24
US8593615B2 (en) 2013-11-26
TWI427433B (zh) 2014-02-21

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