KR20080089225A - 보관 장치 - Google Patents
보관 장치 Download PDFInfo
- Publication number
- KR20080089225A KR20080089225A KR1020080028533A KR20080028533A KR20080089225A KR 20080089225 A KR20080089225 A KR 20080089225A KR 1020080028533 A KR1020080028533 A KR 1020080028533A KR 20080028533 A KR20080028533 A KR 20080028533A KR 20080089225 A KR20080089225 A KR 20080089225A
- Authority
- KR
- South Korea
- Prior art keywords
- storage chamber
- storage
- filter
- gas
- flow path
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Warehouses Or Storage Devices (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007092685A JP5145541B2 (ja) | 2007-03-30 | 2007-03-30 | 保管装置 |
JPJP-P-2007-00092685 | 2007-03-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20080089225A true KR20080089225A (ko) | 2008-10-06 |
Family
ID=39976505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020080028533A KR20080089225A (ko) | 2007-03-30 | 2008-03-27 | 보관 장치 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5145541B2 (ja) |
KR (1) | KR20080089225A (ja) |
CN (1) | CN101274701B (ja) |
TW (1) | TW200848334A (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103768905A (zh) * | 2012-10-19 | 2014-05-07 | 和舰科技(苏州)有限公司 | 一种移动式空气化学过滤装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6332950A (ja) * | 1986-07-25 | 1988-02-12 | Hitachi Electronics Eng Co Ltd | ウエハカセツト収納ボツクス |
US5607647A (en) * | 1993-12-02 | 1997-03-04 | Extraction Systems, Inc. | Air filtering within clean environments |
US6284020B1 (en) * | 1997-12-02 | 2001-09-04 | Kabushiki Kaisha Toshiba | Method of maintaining cleanliness of substrates and box for accommodating substrates |
WO2000037160A1 (fr) * | 1998-12-22 | 2000-06-29 | Taisei Corporation | Milieu filtrant pour filtre a air et procede de fabrication correspondant |
JP3595791B2 (ja) * | 2001-11-19 | 2004-12-02 | キヤノン株式会社 | 半導体製造装置 |
JP2006156712A (ja) * | 2004-11-30 | 2006-06-15 | Sony Corp | 基板収納搬送容器 |
-
2007
- 2007-03-30 JP JP2007092685A patent/JP5145541B2/ja not_active Expired - Fee Related
-
2008
- 2008-03-26 TW TW097110682A patent/TW200848334A/zh unknown
- 2008-03-27 KR KR1020080028533A patent/KR20080089225A/ko not_active Application Discontinuation
- 2008-03-28 CN CN2008100902024A patent/CN101274701B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN101274701A (zh) | 2008-10-01 |
CN101274701B (zh) | 2013-01-16 |
JP5145541B2 (ja) | 2013-02-20 |
JP2008251926A (ja) | 2008-10-16 |
TW200848334A (en) | 2008-12-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E601 | Decision to refuse application |