KR20080059903A - Method of manufacturing plasma display panel and plasma display device thereof - Google Patents

Abstract

A method for manufacturing a plasma display and a plasma display apparatus using the same are provided to improve the reliability of the plasma display panel by reducing the generation of bubbles. Paste for forming a black matrix is located on a substrate(100). Paste for forming an electrode is placed on the substrate(110). Paste for a dielectric is laminated on the substrate(120). The paste for forming the black matrix, the paste for forming the electrode, and the paste for forming the dielectric are simultaneously sintered(130). Thermogravimetry of the paste for forming the electrode is greater than that of the paste for forming the dielectric. Thermogravimetry of the paste for forming the dielectric is greater than that of the paste for forming the black matrix. Therefore, organic components contained in the pastes for forming the black matrix, the dielectric and the electrode are sequentially burned out.

Description

Method for manufacturing plasma display panel and plasma display device using same

1 is a perspective view showing an embodiment of a structure of a plasma display panel according to the present invention;

2 illustrates an embodiment of an electrode arrangement of a plasma display panel;

FIG. 3 illustrates an embodiment of a method of time-divisionally driving a plasma display panel by dividing one frame into a plurality of subfields; FIG.

4 is a flowchart illustrating an embodiment of a method of manufacturing a plasma display panel according to the present invention;

5 is a graph showing thermogravimetric characteristics of a BM, a dielectric layer, and an electrode forming paste formed on a substrate;

FIG. 6 illustrates embodiments of the shape of BM, electrode and dielectric formed on a substrate. FIG.

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma display device, and more particularly, to a method for manufacturing a plasma display panel used in the device, and pastes which are materials of an electrode, a black matrix, and a dielectric layer formed on the panel. It is about.

In general, a plurality of discharge cells are partitioned by partition walls formed between an upper substrate and a lower substrate, and a plasma display panel includes neon (Ne), helium (He), or a mixture of neon and helium (Ne + He). Is filled with a main discharge gas such as) and a small amount of xenon. When discharged by a high frequency voltage, the inert gas generates vacuum ultraviolet rays and emits phosphors formed between the partition walls to realize an image. Such a plasma display panel has been in the spotlight as a next-generation display device because it can be configured to increase in size and thickness.

The plasma display panel includes an upper panel, which is a display surface on which an image is displayed, and a lower panel coupled in parallel with a predetermined distance therebetween, and the upper panel includes a plurality of holdings formed by pairing a scan electrode and a sustain electrode on an upper substrate. An electrode pair, a black matrix, and a dielectric layer are formed, and a plurality of address electrodes, phosphors, dielectric layers, etc. are arranged on the lower substrate so as to intersect with the plurality of sustain electrode pairs.

The conventional plasma display panel having such a structure is largely manufactured through a glass substrate manufacturing process, an upper panel manufacturing process, a lower panel manufacturing process, and an assembly process, and bubbles are generated during the panel manufacturing process, in particular, when firing the electrode, the black matrix, or the dielectric layer. May occur. As a result, the panel is damaged, thereby lowering the reliability of the plasma display apparatus.

In order to solve the above problems, the present invention simplifies the manufacturing process of a plasma display panel and manufactures a plasma display panel using an electrode, a BM, and a dielectric layer forming paste which can prevent the panel from being damaged due to bubble generation. It is an object to provide a method and an apparatus thereof.

Plasma display device according to the present invention for solving the above technical problem is a substrate; Pastes including an electrode, a black matrix (BM) and a dielectric layer formed on the substrate, each paste used to form the electrode, BM and dielectric layer; Thermogravimetry, which appears as the temperature rises upon firing of the pastes, is characterized in that in order of BM, dielectric layer, and electrode.

The thermal weight of each of the pastes for forming the BM, dielectric layer, and electrode is preferably 90% at a firing temperature of 300 ° C to 400 ° C.

It is preferable that the thermal weight of each paste for forming the BM, the dielectric layer, and the electrode is rapidly reduced at a firing temperature of 200 ° C to 400 ° C.

According to an aspect of the present invention, there is provided a method of manufacturing a plasma display panel, comprising: placing a black matrix forming paste on the substrate; Placing an electrode forming paste on the substrate; Laminating a dielectric layer forming paste on the substrate; And simultaneously baking the black matrix forming paste, the electrode forming paste, and the dielectric layer forming paste on the substrate.

Hereinafter, a method of manufacturing a plasma display panel and a plasma display apparatus using the same will be described in detail with reference to the accompanying drawings.

1 is a perspective view showing an embodiment of a plasma display panel according to the present invention.

As shown in FIG. 1, the plasma display panel includes a scan electrode 11, a sustain electrode 12, a sustain electrode pair formed on the upper substrate 10, and an address electrode 22 formed on the lower substrate 20. It includes.

The sustain electrode pairs 11 and 12 generally include transparent electrodes 11a and 12a and bus electrodes 11b and 12b formed of indium tin oxide (ITO), and the bus electrodes 11b and 12b. 12b) may be formed of a metal such as silver (Ag) or chromium (Cr) or a stack of chromium / copper / chromium (Cr / Cu / Cr) or a stack of chromium / aluminum / chromium (Cr / Al / Cr). . The bus electrodes 11b and 12b are formed on the transparent electrodes 11a and 12a to serve to reduce voltage drop caused by the transparent electrodes 11a and 12a having high resistance.

Meanwhile, according to the exemplary embodiment of the present invention, the sustain electrode pairs 11 and 12 have not only a structure in which the transparent electrodes 11a 12a and the bus electrodes 11b and 12b are stacked, but also have no transparent electrodes 11a and 12a. Only the bus electrodes 11b and 12b may be constituted. This structure does not use the transparent electrodes (11a, 12a), there is an advantage that can lower the cost of manufacturing the panel. The bus electrodes 11b and 12b used in this structure may be various materials such as photosensitive materials in addition to the materials listed above.

Light between the scan electrodes 11 and the sustain electrodes 12 between the transparent electrodes 11a and 12a and the bus electrodes 11b and 11c to absorb external light generated outside the upper substrate 10 to reduce reflection. A black matrix (BM, 15) is arranged that functions to block and to improve the purity and contrast of the upper substrate 10.

The black matrix 15 according to the exemplary embodiment of the present invention is formed on the upper substrate 10, the first black matrix 15 and the transparent electrodes 11a and 12a formed at positions overlapping the partition wall 21. And the second black matrices 11c and 12c formed between the bus electrodes 11b and 12b. Here, the first black matrix 15 and the second black matrices 11c and 12c, also referred to as black layers or black electrode layers, may be simultaneously formed and physically connected in the formation process, or may not be simultaneously formed and thus not physically connected. .

In addition, when physically connected and formed, the first black matrix 15 and the second black matrix 11c and 12c may be formed of the same material, but may be formed of different materials when they are formed separately.

The upper dielectric layer 13 and the passivation layer 14 are stacked on the upper substrate 10 having the scan electrode 11 and the sustain electrode 12 side by side. Charged particles generated by the discharge are accumulated in the upper dielectric layer 13, and the protective electrode pairs 11 and 12 may be protected. The protective film 14 protects the upper dielectric layer 13 from sputtering of charged particles generated during gas discharge, and increases the emission efficiency of secondary electrons.

In addition, the address electrode 22 is formed in a direction crossing the scan electrode 11 and the sustain electrode 12. In addition, the lower dielectric layer 23 and the partition wall 21 are formed on the lower substrate 20 on which the address electrode 22 is formed.

In addition, phosphor layers are formed on the surfaces of the lower dielectric layer 23 and the partition wall 21. The partition wall 21 has a vertical partition wall 21a and a horizontal partition wall 21b formed in a closed shape, and physically distinguishes discharge cells, and prevents ultraviolet rays and visible light generated by the discharge from leaking into adjacent discharge cells.

In an embodiment of the present invention, not only the structure of the partition wall 21 illustrated in FIG. 1, but also the structure of the partition wall 21 having various shapes may be possible. For example, a channel in which a channel usable as an exhaust passage is formed in at least one of the differential partition structure, the vertical partition 21a, or the horizontal partition 21b having different heights of the vertical partition 21a and the horizontal partition 21b. A grooved partition structure having a groove formed in at least one of the type partition wall structure, the vertical partition wall 21a, or the horizontal partition wall 21b may be possible.

Here, in the case of the differential barrier rib structure, the height of the horizontal barrier rib 21b is more preferable, and in the case of the channel barrier rib structure or the groove barrier rib structure, the channel or groove is formed in the horizontal barrier rib 21b. Would be desirable.

Meanwhile, in one embodiment of the present invention, although each of the R, G, and B discharge cells are shown and described as being arranged on the same line, it may be arranged in other shapes. For example, a Delta type arrangement in which R, G, and B discharge cells are arranged in a triangular shape may be possible. In addition, the shape of the discharge cell may be not only rectangular, but also various polygonal shapes such as a pentagon and a hexagon.

In addition, the phosphor layer emits light by ultraviolet rays generated during gas discharge to generate visible light of any one of red (R), green (G), and blue (B). Here, an inert mixed gas such as He + Xe, Ne + Xe and He + Ne + Xe for discharging is injected into the discharge space provided between the upper / lower substrates 10 and 20 and the partition wall 21.

FIG. 2 illustrates an embodiment of an electrode arrangement of a plasma display panel, and a plurality of discharge cells constituting the plasma display panel are preferably arranged in a matrix form as shown in FIG. 2. The plurality of discharge cells are provided at the intersections of the scan electrode lines Y1 to Ym, the sustain electrode lines Z1 to Zm, and the address electrode lines X1 to Xn, respectively. The scan electrode lines Y1 to Ym may be driven sequentially or simultaneously, and the sustain electrode lines Z1 to Zm may be driven simultaneously. The address electrode lines X1 to Xn may be driven by being divided into odd-numbered lines and even-numbered lines, or sequentially driven.

Since the electrode arrangement shown in FIG. 2 is only an embodiment of the electrode arrangement of the plasma panel according to the present invention, the present invention is not limited to the electrode arrangement and driving method of the plasma display panel shown in FIG. 2. For example, a dual scan method in which two scan electrode lines among the scan electrode lines Y1 to Ym are simultaneously scanned is also possible. In addition, the address electrode lines X1 to Xn may be driven by being divided up and down in the center portion of the panel.

3 is a timing diagram illustrating an embodiment of a time division driving method by dividing a frame into a plurality of subfields. The unit frame may be divided into a predetermined number, for example, eight subfields SF1, ..., SF8 to realize time division gray scale display. Each subfield SF1, ... SF8 is divided into a reset section (not shown), an address section A1, ..., A8 and a sustain section S1, ..., S8.

Here, according to an embodiment of the present invention, the reset period may be omitted in at least one of the plurality of subfields. For example, the reset period may exist only in the first subfield or may exist only in a subfield about halfway between the first subfield and all the subfields.

In each address section A1, ..., A8, a display data signal is applied to the address electrode X, and scan pulses corresponding to each scan electrode Y are sequentially applied.

In each of the sustain periods S1, ..., S8, a sustain pulse is alternately applied to the scan electrode Y and the sustain electrode Z to form wall charges in the address periods A1, ..., A8. Sustain discharge occurs in the discharge cells.

The luminance of the plasma display panel is proportional to the number of sustain discharge pulses in the sustain discharge periods S1, ..., S8 occupied in the unit frame. When one frame forming one image is represented by eight subfields and 256 gradations, each subfield in turn has different sustains at a ratio of 1, 2, 4, 8, 16, 32, 64, and 128. The number of pulses can be assigned. In order to obtain luminance of 133 gradations, cells may be sustained by addressing the cells during the subfield 1 section, the subfield 3 section, and the subfield 8 section.

The number of sustain discharges allocated to each subfield may be variably determined according to weights of the subfields according to the APC (Automatic Power Control) step. That is, in FIG. 3, a case in which one frame is divided into eight subfields has been described as an example. However, the present invention is not limited thereto, and the number of subfields forming one frame may be variously modified according to design specifications. . For example, a plasma display panel may be driven by dividing one frame into eight or more subfields, such as 12 or 16 subfields.

The number of sustain discharges allocated to each subfield can be variously modified in consideration of gamma characteristics and panel characteristics. For example, the gray level assigned to subfield 4 may be lowered from 8 to 6, and the gray level assigned to subfield 6 may be increased from 32 to 34.

4 is a flowchart illustrating an embodiment of a method of manufacturing a plasma display panel according to the present invention. The black matrix forming paste is applied to the upper substrate (step 100), and the electrode forming paste is applied onto the coated black matrix forming paste (step 110). At this time, the upper substrate is preferably made of glass (glass) material.

The black matrix paste applied on the substrate is composed of an organic component which is burned out upon firing and an inorganic component including glass frit and an oxidizing material. The glass frit is a glass in a dissolved form, and when firing, the paste adheres to the substrate so that a black matrix is formed on the substrate.

The organic component included in the black matrix paste may include a photosensitive component including a photosensitive unit, a photosensitive oligomer, or a photosensitive polymer, and preferably, a binder, a photopolymerization initiator, an ultraviolet absorber, a sensitizer, a sensitizer, and a polymerization. It may further comprise components such as inhibitors, plasticizers, midpoints, organic solvents, antioxidants, dispersants, organic or inorganic precipitation inhibitors or leveling agents.

The electrode forming paste applied on the substrate is composed of an organic component which is burned out during firing and an inorganic component including glass frit and silver (Ag). The glass frit of the electrode paste is preferably made of a material capable of maintaining the adhesion and stability of the paste, reducing the bubble generation during firing, and improving the exposure and development margin of the black matrix.

The organic component included in the electrode forming paste may include a photosensitive component including a photosensitive unit, a photosensitive oligomer, or a photosensitive polymer, and preferably, a binder, a photopolymerization initiator, an ultraviolet absorber, a neutralizing agent, a neutralizing agent, and a polymerization inhibitor. It may further include additive components such as plasticizers, midpoints, organic solvents, antioxidants, dispersants, organic or inorganic precipitation inhibitors or leveling agents.

Silver (Ag) contained in the electrode forming paste may be replaced with a metal having other conductivity, such as copper or two or more metal compounds. The scan electrode and the sustain electrode are formed on the upper substrate by the electrode paste having the above configuration.

In addition, it is preferable that a paste for forming an ITO electrode is first applied to the upper substrate before 100 steps formed on the ITO electrode, which is a transparent electrode on the upper substrate, so that the black matrix is positioned between the ITO electrode and the bus electrode.

Laminating the dielectric layer forming paste on the upper substrate to which the black matrix paste and the electrode paste are applied (step 120), and the black matrix forming paste and the electrode forming paste and the laminated dielectric layer forming paste applied on the upper substrate. Simultaneously firing (step 130). Here, baking refers to the process of heating the combined raw material to make a curable material.

As shown in FIG. 5, the electrode forming paste (C), the BM forming paste (A), and the dielectric layer forming paste (B) have respective thermal weights (Tg) at a temperature of 200 ° C to 300 ° C during firing. In this case, it is preferable that the material is rapidly reduced. This is because as the calcination temperature is increased, the organic components are burned out and evaporated. The thermogravimetry (Tg) is preferably about 90% at 300 ° C to 400 ° C. In such a case, before the firing temperature is 500 ° C. or higher, and all of the organic components are burned out before being cured by the inorganic components included in each paste, bubbles and cracks do not occur.

In addition, the electrode forming paste, the BM forming paste, and the dielectric layer forming paste should have a similar ratio as shown in FIG. 5 in which the thermal weight changes in the above temperature range as the firing temperature is increased. The thermal weight (Tg) at the same temperature at the same time is preferably high in order of BM, dielectric layer, and paste for forming electrodes. As described above, an embodiment of a method of simultaneously baking an electrode, a BM, and a dielectric layer by using pastes each having a thermogravimetric (Tg) characteristic will be described. As the firing temperature is increased from a low temperature to a high temperature, The channel is formed therein by the organic component vaporized in the black matrix coated with the organic solvent, the channel is formed inside the dielectric by the solvent of the laminated dielectric and the organic component vaporized at low temperature. The components are burned out through the channels inside the dielectric and the channels inside the black matrix, so that the electrodes and dielectric are finally baked and formed on the upper substrate.

6 illustrates embodiments of the shape of the BM, the electrode and the dielectric formed on the substrate through the firing process. Referring to FIG. 6, cracks and bubbles are not generated when electrodes, black matrices, and dielectric layers are formed on an upper substrate by co-firing pastes having thermogravimetric characteristics as shown in FIG. 5. When the upper panel is formed by simultaneously baking the respective pastes for forming the electrode, the BM, and the dielectric layer, as shown in FIG. 6, it can be seen that bubbles are generated in the electrode, the BM, and the dielectric layer to form cracks.

As described above, when simultaneously firing using the paste having the thermogravimetric characteristics according to the present invention, the paste for forming the dielectric layer, bubbles and cracks are not generated, and thus the reliability of the plasma display panel can be ensured. The process makes it possible to simplify the manufacturing process.

Although the preferred embodiments of the present invention have been described in detail above, those skilled in the art to which the present invention pertains should make the present invention without departing from the spirit and scope of the present invention as defined in the appended claims. It will be appreciated that various modifications or changes can be made. Accordingly, modifications to future embodiments of the present invention will not depart from the technology of the present invention.

According to the present invention configured as described above, in manufacturing a plasma display panel by forming an electrode and a dielectric on a substrate, the panel manufacturing process can be simplified by simultaneously baking the electrode, the dielectric and the black matrix on the substrate, and the black matrix By designing thermal properties such that the organic components included in the dielectric layers and the pastes of the electrodes are burned out in the order of the black matrix, the dielectric layers, and the electrodes, bubble generation can be reduced to improve reliability of the PDP.

Claims (4)

Board; In the plasma display device comprising an electrode, a black matrix (BM) and a dielectric layer formed on the substrate, Respective pastes used to form the electrode, BM and dielectric layers; The thermogravimetry that appears as the temperature rises upon firing of the pastes is high in the order of BM, dielectric layer, electrode. The method according to claim 1, The thermogravimetry of the respective pastes for forming the BM, dielectric layer and electrode is And a firing temperature of 90% at 300 ° C to 400 ° C. The method according to claim 1, The thermogravimetry of the respective pastes for forming the BM, dielectric layer and electrode is Plasma display device, characterized in that the firing temperature is rapidly reduced at 200 ℃ to 400 ℃. In the method of forming an electrode, a dielectric layer and a black matrix (BM) on a substrate, Placing a black matrix forming paste on the substrate; Placing an electrode forming paste on the substrate; Laminating a dielectric layer forming paste on the substrate; And simultaneously baking the black matrix forming paste, the electrode forming paste, and the dielectric layer forming paste on the substrate.

Images