KR20080044181A - 구배된 하이브리드 비정질 규소 나노와이어 태양광 전지 - Google Patents
구배된 하이브리드 비정질 규소 나노와이어 태양광 전지 Download PDFInfo
- Publication number
- KR20080044181A KR20080044181A KR1020070115979A KR20070115979A KR20080044181A KR 20080044181 A KR20080044181 A KR 20080044181A KR 1020070115979 A KR1020070115979 A KR 1020070115979A KR 20070115979 A KR20070115979 A KR 20070115979A KR 20080044181 A KR20080044181 A KR 20080044181A
- Authority
- KR
- South Korea
- Prior art keywords
- amorphous layer
- layer
- semiconductor
- elongated
- nanostructures
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 239000002070 nanowire Substances 0.000 title abstract description 36
- 229910021417 amorphous silicon Inorganic materials 0.000 title abstract description 14
- 239000004065 semiconductor Substances 0.000 claims abstract description 91
- 239000002086 nanomaterial Substances 0.000 claims abstract description 71
- 239000000758 substrate Substances 0.000 claims abstract description 51
- 239000000463 material Substances 0.000 claims abstract description 46
- 239000000203 mixture Substances 0.000 claims abstract description 26
- 238000000034 method Methods 0.000 claims description 50
- 239000002019 doping agent Substances 0.000 claims description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 20
- 229910052710 silicon Inorganic materials 0.000 claims description 20
- 239000010703 silicon Substances 0.000 claims description 20
- 238000004519 manufacturing process Methods 0.000 claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 15
- 239000002184 metal Substances 0.000 claims description 15
- 239000011669 selenium Substances 0.000 claims description 14
- 239000004020 conductor Substances 0.000 claims description 13
- 238000000151 deposition Methods 0.000 claims description 13
- 239000002243 precursor Substances 0.000 claims description 13
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 11
- -1 GaInP Chemical compound 0.000 claims description 10
- 229910052714 tellurium Inorganic materials 0.000 claims description 8
- FTWRSWRBSVXQPI-UHFFFAOYSA-N alumanylidynearsane;gallanylidynearsane Chemical compound [As]#[Al].[As]#[Ga] FTWRSWRBSVXQPI-UHFFFAOYSA-N 0.000 claims description 6
- 230000008021 deposition Effects 0.000 claims description 6
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 6
- 229910052711 selenium Inorganic materials 0.000 claims description 6
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 5
- 238000005137 deposition process Methods 0.000 claims description 5
- 239000002082 metal nanoparticle Substances 0.000 claims description 5
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 claims description 4
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 4
- 239000005751 Copper oxide Substances 0.000 claims description 4
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims description 4
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims description 4
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 claims description 4
- 229910017231 MnTe Inorganic materials 0.000 claims description 4
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims description 4
- 229910007709 ZnTe Inorganic materials 0.000 claims description 4
- NWAIGJYBQQYSPW-UHFFFAOYSA-N azanylidyneindigane Chemical compound [In]#N NWAIGJYBQQYSPW-UHFFFAOYSA-N 0.000 claims description 4
- AQCDIIAORKRFCD-UHFFFAOYSA-N cadmium selenide Chemical compound [Cd]=[Se] AQCDIIAORKRFCD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 229910000431 copper oxide Inorganic materials 0.000 claims description 4
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 239000012780 transparent material Substances 0.000 claims description 4
- 239000011787 zinc oxide Substances 0.000 claims description 4
- 238000000231 atomic layer deposition Methods 0.000 claims description 3
- 238000010248 power generation Methods 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 claims description 3
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052582 BN Inorganic materials 0.000 claims description 2
- 229910002601 GaN Inorganic materials 0.000 claims description 2
- 229910005540 GaP Inorganic materials 0.000 claims description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 2
- 238000005234 chemical deposition Methods 0.000 claims description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 2
- 238000004070 electrodeposition Methods 0.000 claims description 2
- 229910052733 gallium Inorganic materials 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 2
- 229910004613 CdTe Inorganic materials 0.000 claims 2
- 238000004050 hot filament vapor deposition Methods 0.000 claims 2
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 claims 2
- 230000007547 defect Effects 0.000 abstract description 14
- 238000011426 transformation method Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 129
- 230000006798 recombination Effects 0.000 description 19
- 238000005215 recombination Methods 0.000 description 19
- 239000002800 charge carrier Substances 0.000 description 13
- 230000000694 effects Effects 0.000 description 10
- 239000002356 single layer Substances 0.000 description 10
- 238000000926 separation method Methods 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- 239000012535 impurity Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 238000002161 passivation Methods 0.000 description 6
- 229910052698 phosphorus Inorganic materials 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000011574 phosphorus Substances 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 230000005611 electricity Effects 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 238000005452 bending Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 3
- 230000005693 optoelectronics Effects 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 241000272194 Ciconiiformes Species 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical group [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000002071 nanotube Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 241000894007 species Species 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910021424 microcrystalline silicon Inorganic materials 0.000 description 1
- 239000002073 nanorod Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000013082 photovoltaic technology Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/13—Photovoltaic cells having absorbing layers comprising graded bandgaps
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/16—Photovoltaic cells having only PN heterojunction potential barriers
- H10F10/164—Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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- Photovoltaic Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/599,722 | 2006-11-15 | ||
| US11/599,722 US20080135089A1 (en) | 2006-11-15 | 2006-11-15 | Graded hybrid amorphous silicon nanowire solar cells |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20080044181A true KR20080044181A (ko) | 2008-05-20 |
Family
ID=39103185
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020070115979A Withdrawn KR20080044181A (ko) | 2006-11-15 | 2007-11-14 | 구배된 하이브리드 비정질 규소 나노와이어 태양광 전지 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20080135089A1 (enExample) |
| EP (1) | EP1923918A2 (enExample) |
| JP (1) | JP2008177539A (enExample) |
| KR (1) | KR20080044181A (enExample) |
| CN (1) | CN101183689B (enExample) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011066570A3 (en) * | 2009-11-30 | 2011-11-10 | California Institute Of Technology | Semiconductor wire array structures, and solar cells and photodetectors based on such structures |
| KR101120009B1 (ko) * | 2011-08-03 | 2012-03-16 | 한국기계연구원 | 나노 돌기를 갖는 태양 전지 및 이의 제조 방법 |
| WO2013016339A3 (en) * | 2011-07-26 | 2013-04-25 | Nanosys, Inc. | Nanostructured battery active materials and methods of producing same |
| US8618407B2 (en) | 2009-08-18 | 2013-12-31 | Samsung Electronics Co., Ltd. | Solar cells having nanowires and methods of fabricating nanowires |
| KR101435458B1 (ko) * | 2011-12-12 | 2014-09-01 | 동국대학교 산학협력단 | 나노로드를 이용한 태양전지 및 그의 제조 방법 |
| KR20140123205A (ko) * | 2013-04-11 | 2014-10-22 | 제일모직주식회사 | 태양전지 전극 형성용 조성물 및 이로부터 제조된 전극 |
| US9263612B2 (en) | 2010-03-23 | 2016-02-16 | California Institute Of Technology | Heterojunction wire array solar cells |
| US9553223B2 (en) | 2013-01-24 | 2017-01-24 | California Institute Of Technology | Method for alignment of microwires |
| US9947816B2 (en) | 2012-04-03 | 2018-04-17 | California Institute Of Technology | Semiconductor structures for fuel generation |
| US10090425B2 (en) | 2012-02-21 | 2018-10-02 | California Institute Of Technology | Axially-integrated epitaxially-grown tandem wire arrays |
| CN108701653A (zh) * | 2016-02-25 | 2018-10-23 | 株式会社索思未来 | 半导体集成电路装置 |
| US10862114B2 (en) | 2016-07-15 | 2020-12-08 | Oned Material Llc | Manufacturing apparatus and method for making silicon nanowires on carbon based powders for use in batteries |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100593264B1 (ko) * | 2003-06-26 | 2006-06-26 | 학교법인 포항공과대학교 | p-타입 반도체 박막과 n-타입 산화아연(ZnO)계나노막대의 이종접합 구조체, 이의 제법 및 이를 이용한소자 |
| US8003883B2 (en) * | 2007-01-11 | 2011-08-23 | General Electric Company | Nanowall solar cells and optoelectronic devices |
| US20080264479A1 (en) * | 2007-04-25 | 2008-10-30 | Nanoco Technologies Limited | Hybrid Photovoltaic Cells and Related Methods |
| WO2008156421A2 (en) * | 2007-06-19 | 2008-12-24 | Qunano Ab | Nanowire-based solar cell structure |
| KR101503557B1 (ko) * | 2007-09-25 | 2015-03-17 | 퍼스트 솔라, 인코포레이티드 | 계면 층을 포함한 광기전 장치 |
| US8106289B2 (en) * | 2007-12-31 | 2012-01-31 | Banpil Photonics, Inc. | Hybrid photovoltaic device |
| KR100935322B1 (ko) * | 2008-01-02 | 2010-01-06 | 삼성전기주식회사 | 고효율 태양전지 및 이의 제조방법 |
| CN101561194B (zh) * | 2008-04-18 | 2010-12-29 | 清华大学 | 太阳能集热器 |
| US7902540B2 (en) * | 2008-05-21 | 2011-03-08 | International Business Machines Corporation | Fast P-I-N photodetector with high responsitivity |
| WO2009151979A2 (en) * | 2008-06-09 | 2009-12-17 | 4Power, Llc | High-efficiency solar cell structures and methods |
| US20100012190A1 (en) * | 2008-07-16 | 2010-01-21 | Hajime Goto | Nanowire photovoltaic cells and manufacture method thereof |
| GB2462108A (en) * | 2008-07-24 | 2010-01-27 | Sharp Kk | Deposition of a thin film on a nanostructured surface |
| KR101613083B1 (ko) * | 2008-08-21 | 2016-04-20 | 삼성전자주식회사 | 디지털 저작권 관리에서 컨텐츠 정보를 사용하기 위한 장치및 방법 |
| US20100139747A1 (en) * | 2008-08-28 | 2010-06-10 | The Penn State Research Foundation | Single-crystal nanowires and liquid junction solar cells |
| KR101002682B1 (ko) * | 2008-08-28 | 2010-12-21 | 삼성전기주식회사 | 태양전지 및 그 제조방법 |
| WO2010071658A1 (en) * | 2008-12-19 | 2010-06-24 | Hewlett-Packard Development Company, Hewlett-Packard Development Company, L.P. | Photovoltaic structure and method of fabrication employing nanowire on stub |
| CN102325719A (zh) * | 2008-12-30 | 2012-01-18 | 3M创新有限公司 | 纳米结构化制品和制备纳米结构化制品的方法 |
| KR101915868B1 (ko) * | 2008-12-30 | 2018-11-06 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 반사방지 용품 및 이의 제조 방법 |
| TWI447917B (zh) * | 2009-01-10 | 2014-08-01 | Nexpower Technology Corp | 薄膜太陽能電池及其前電極層之製作方法 |
| KR101040956B1 (ko) * | 2009-02-26 | 2011-06-16 | 전자부품연구원 | 산화아연 나노와이어를 이용한 박막 실리콘 태양전지 및 그의 제조방법 |
| US20110124146A1 (en) * | 2009-05-29 | 2011-05-26 | Pitera Arthur J | Methods of forming high-efficiency multi-junction solar cell structures |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN101183689A (zh) | 2008-05-21 |
| CN101183689B (zh) | 2012-08-01 |
| US20080135089A1 (en) | 2008-06-12 |
| JP2008177539A (ja) | 2008-07-31 |
| EP1923918A2 (en) | 2008-05-21 |
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