KR20080014224A - Barrier rib material and manufacturing method of plasma display panel using it - Google Patents

Abstract

A barrier rib material is provided to reduce a production cost of a plasma display panel, form high-definition barrier ribs by a simple process, and thus enhance stability of barrier ribs. A barrier rib material includes 50-90wt% of an inorganic material and 10-50wt% of an organic material, wherein a glass powder in the inorganic material comprises at least 50wt% of a dielectric paste. A method for manufacturing a plasma display panel includes the steps of: forming a barrier rib layer on a lower plate(111) using the barrier rib material; patterning the barrier rib layer using laser imaging; developing the patterned barrier rib layer; and firing the developed barrier rib layer to form barrier ribs(112a). Further, the barrier rib material is coated on a dielectric substance layer of the lower plate.

Description

Barrier material and manufacturing method of plasma display panel using the same {BARRIER RIB MATERIAL AND MANUFACTURING METHOD OF PLASMA DISPLAY PANEL USING IT}

1 is a perspective view illustrating an example of a general plasma display panel.

2 is a schematic block diagram showing a step of forming a partition wall using a general photosensitive method.

3 is a schematic block diagram illustrating a step of forming a partition wall using a general DFR.

4 is a schematic cross-sectional view of a rear substrate of a plasma display panel according to an embodiment of the present invention.

5 is a flowchart illustrating a method of manufacturing a plasma display panel according to an exemplary embodiment of the present invention.

6A-6E are schematic cross-sectional views illustrating the step of forming a partition using a partition material according to an embodiment of the present invention.

7A-7D are schematic cross-sectional views illustrating the step of forming a partition using a partition material according to an embodiment of the present invention.

<Brief description of the main parts of the drawing>

110: bottom plate 111: rear glass

115 and 130: dielectric layers 113 and 120: address electrodes

140: partition wall layer 141: fired partition wall layer

142: barrier rib before firing 150: photoresist

112a, 160: bulkhead

The present invention relates to a barrier material and a method of manufacturing a plasma display panel using the same.

Plasma Display Panel (PDP) is a type of light emitting device that displays an image by using a discharge phenomenon, and there is no need to mount an active device for each cell, so the manufacturing process is simple and the screen is easily enlarged. As a result, the response speed is fast becoming a display element of an image display device having a large screen.

As shown in FIG. 1, the plasma display panel has a structure in which the upper panel 10 and the lower panel 20 face each other and overlap each other. The upper panel 10 has a pair of sustain electrodes arranged on an inner surface of the transparent substrate 11, and usually the sustain electrodes comprise a transparent electrode 12 and a bus electrode 13, respectively.

The sustain electrode is covered with a dielectric layer 14 for AC driving, and a protective film 15 is formed on the surface of the dielectric layer 14.

On the other hand, the inner surface of the lower panel 20, the address electrode 22 is arranged on the lower plate 21, the dielectric layer 23 is formed thereon, and the address electrode 22 is partitioned on the dielectric layer 23. A stripe or well type barrier rib 24 is formed, and red, blue, and green phosphor layers 26 for color display are applied to the cells partitioned by the barrier rib 24 to form a subpixel.

The discharge cell 25 is divided into subpixels by the partition wall 24, and discharge gas is enclosed in the discharge cell 25, and one pixel includes the three subpixels.

As the method for forming the partition wall 24, a printing method, a sand blasting method, an etching method, and a photolithography method using a photosensitive material are mainly applied.

The printing method is a method of forming a partition of a desired degree by printing a glass paste having a high thixotropy several times, sandblasting method after applying a dry film resist (DFR) on the partition material before firing, After exposure and development using a photo mask, the patterned DFR is used as a mask to form a barrier rib pattern by sand blasting and then fire.

In addition, the etching method is similar to the sandblasting process, but instead of the sandblasting, an etching solution is used to form partition walls.

However, two methods are currently applied to the etching method, and there are two cases of DFR placed on the partition material, that is, a film form and a liquid photoresist (PR). Therefore, there is a difference in the method according to this material.

2 shows a process of the photosensitive method currently applied. After the electrode layer is formed on the lower glass, a dielectric is coated and the barrier material is coated on the sheet through printing, sheeting, or die coating (S10) and dried.

The bulkhead material used here is not a material used in the conventional sanding or printing method, but is a paste or sheet made of a paste containing a powder suitable for photosensitivity and a photocurable vehicle that can be cured by being exposed to UV light. It is a material of form.

Here, the non-exposed part is developed (S30) through an alkali solution through UV exposure (S20) to obtain a desired partition pattern, and then fired (S40) to obtain a final partition.

3 is a method of forming a barrier rib for etching using a DFR. After the barrier material is applied (S10) using a powder which can be easily etched in an acid in the general barrier material (S10), it is fired and coated with an organic DFR (S11), followed by UV exposure (S20), and the development ( S30) is used to obtain a primary pattern in the DFR, which is then used as a resist to be etched (S50) with an acid such as nitric acid to finally obtain a partition.

However, in order to obtain a high-definition pattern by the conventional barrier rib forming method as described above, due to problems such as a small contact surface of the DFR and poor adhesion, There was a problem that a high-definition patterned partition wall cannot be obtained and the process and cost of using a photomask during patterning are increased.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and the barrier material capable of forming a high-definition barrier by patterning a barrier layer coated with a barrier material suitable for the photosensitive method using laser imaging, and a method of manufacturing a plasma display panel using the same. To provide.

In order to achieve the object of the present invention as described above, the partition material according to an embodiment of the present invention is composed of 50 to 90% by weight of inorganic material and 10 to 50% by weight of organic material, and the glass powder in the inorganic material (glass powder) 50 wt% or more of dielectric paste.

Here, it is preferable that the refractive index difference of an inorganic substance and organic substance is -0.05-0.1, and it is preferable that the average refractive index of this inorganic substance and organic substance is 1.4-2.0, respectively.

At this time, it is preferable that the partition material has a transmittance of 40 to 80% with respect to the laser light.

In order to achieve the above object, a method of manufacturing a plasma display panel according to an embodiment of the present invention is

Forming a partition layer on the lower plate using the aforementioned partition material;

Patterning the barrier layer using laser imaging;

Developing the patterned partition wall layer; And

And firing the developed partition wall layer to form a partition wall.

Here, the partition material is applied on the lower dielectric layer in the form of a paste, green sheet or slurry.

Here, patterning uses a laser of 405 nm wavelength.

In addition, the partition wall formed here may adjust the heights of the horizontal partition walls and the vertical partition walls that partition the discharge cells by adjusting the intensity of the laser wavelength, and form the height of the vertical partition walls higher than the height of the horizontal partition walls.

Hereinafter, with reference to the accompanying drawings illustrating the configuration and operation of the embodiment of the present invention, the configuration and operation of the present invention shown in the drawings and described by it will be described as at least one embodiment, By the technical spirit of the present invention described above and its core configuration and operation is not limited.

4 is a schematic cross-sectional view of a rear substrate of a plasma display panel according to an embodiment of the present invention.

The front substrate of the plasma display panel according to the embodiment of the present invention is the same as the conventional technology, and the rear substrate has a plurality of discharge spaces, that is, the partition walls 112a of the stripe type (or well type) for forming the discharge cells are parallel to each other. Is arranged by holding. In addition, a plurality of address electrodes 113 which perform address discharge to generate vacuum ultraviolet rays are arranged in parallel with the partition wall. On the upper side of the rear substrate, R, G, and B phosphors 114 which emit visible light for image display during address discharge are coated. A lower dielectric layer 115 is formed between the address electrode 113 and the phosphor 114 to protect the address electrode 113.

On the front glass, which is a display surface on which an image is displayed, a plurality of sustain electrode pairs formed by pairing a scan electrode and a sustain electrode are arranged. In addition, a plurality of address electrodes 113 are arranged on the rear glass 111 to intersect the plurality of sustain electrode pairs described above with reference to FIG. 1, and the rear substrate and the front substrate are coupled in parallel at a predetermined distance. . In addition, barrier ribs 112a are formed on the rear substrate to partition the R, G, and B discharge cells, respectively.

The partition wall 112a is composed of 50 to 90% by weight of inorganic material and 10 to 50% by weight of organic material, glass powder in the inorganic material is 50% by weight or more, and the refractive index difference between the inorganic material and the organic material is -0.05 to It is formed by applying a barrier material containing a dielectric paste of 0.1, and is a differential partition wall having a height different from a height of a horizontal partition wall and a vertical partition wall partitioning a discharge cell. Here, the height of the vertical barrier ribs is formed higher than the height of the horizontal barrier ribs. The vertical barrier ribs separate R, G, and B phosphors, respectively, to partition unit pixels. To improve it.

Here, the organic material and the inorganic material each have an average refractive index of 1.4 to 2.0, and the refractive index difference (N2-N1) between the organic material (N1) and the inorganic material (N2) is -0.05 to 0.1, and is formed by being applied to the partition layer on the dielectric layer. The transmittance of the film is 40 to 80% with respect to the laser light, thereby enabling the formation of a high definition partition wall.

5 is a flowchart illustrating a method of manufacturing a plasma display panel according to an embodiment of the present invention.

As shown, the step of applying the aforementioned partition material in the form of a paste, green sheet or slurry (S510) and using the applied partition material, forming a partition by laser imaging on the dielectric layer of the lower plate (S520) S540).

In the forming of the barrier rib through the laser imaging (S520 to S540), instead of exposing the barrier material applied on the dielectric layer to ultraviolet rays using a photo mask, the imaging is directly performed by using a laser light source having a wavelength of 405 nm. (S520). Next, the shaped imaging is developed (S530), and the partition wall is fired according to the developed image (S540).

6A to 6E illustrate an embodiment in which the partition wall is formed using the partition material according to the present invention having the above characteristics.

As shown in FIG. 6A, an address electrode 120 is formed on the lower plate 110, and a dielectric layer 130 covering the address electrode 120 is formed, and then patterning is possible using a laser on the dielectric layer 130. The partition layer 140 is coated using the partition material.

Thereafter, as shown in FIG. 6B, the barrier layer 140 is fired, and a liquid photoresist (PR) 150 having excellent sensitivity is applied on the fired barrier layer 141.

Instead of exposing UV on the applied photoresist 150 using a photo mask, imaging is imaged directly on the photoresist 150 using a laser light source of 405 nm wavelength, as shown in FIG. 6C.

Thereafter, when the image development is performed with the laser light source, as shown in FIG. 6D, the patterning of the photoresist 150 is completed.

Finally, as shown in FIG. 6E, the barrier rib 160 is formed by various etching methods such as etching and sand blasting using the patterned photoresist 150, and the remaining photoresist 150 is peeled off.

7A to 7D illustrate a step of forming a partition by mixing the advantages of the photosensitive method and the advantages of laser imaging.

First, as shown in FIG. 7A, an address electrode 220 is formed on the lower substrate 210, a dielectric layer 230 covering the address electrode 220 is formed, and then a laser is applied on the dielectric layer 230. Patterning is used to coat and coat the barrier layer 240 using the barrier material according to the present invention.

As described above, the photosensitive partition wall material is composed of 50 to 90% by weight of inorganic material and 10 to 50% by weight of organic material, and includes a dielectric paste having 50% by weight or more of glass powder in the inorganic material. The refractive index difference between the inorganic and organic materials is -0.05 to 0.1, the average refractive index is 1.4 to 2.0, respectively, and the transmittance of the film formed by applying the dielectric paste is 40 to 80% with respect to the laser light.

In addition, a material including a photoinitiator to have photosensitivity and a vehicle containing a photomonomer and causing a reaction to laser light is used.

Thereafter, as shown in FIG. 7B, imaging is performed according to the pattern of the partition wall to be formed on the partition layer 240 using a laser light source without firing the partition layer 240.

The partition layer 240 on which the imaging is performed is formed in a pattern of the partition wall 242 as illustrated in FIG. 7C.

Thereafter, when the barrier rib 242 having the pattern is fired, the barrier rib 160 is formed as shown in FIG. 7D.

As described above, when the partition wall material having high sensitivity is used and the partition wall is formed through laser imaging, it is possible to obtain a high-definition partition wall by shortening the process, reducing the material cost, and reducing the process cost. A high-definition partition can be formed at a vertical pitch of 167 µm and a horizontal pitch of 546 µm of a 50 FHD (flame hydrolysis deposition) partition wall spec.

In addition, when the partition wall is formed by using the laser light source in the above-described step, when the horizontal partition wall is patterned by adjusting the intensity of the laser light source, a laser beam source having a wavelength of 405 nm is formed, and then 365 nm when patterning the vertical partition wall. When formed using a laser light source of a wavelength, it is possible to easily form a differential partition wall whose height of the vertical partition wall is higher than the height of the horizontal partition wall.

The above embodiment is an example for explaining the technical idea of the present invention in detail, and the present invention is not limited to the above embodiment, various modifications are possible, and various embodiments of the technical idea are all protected by the present invention. It belongs to the scope.

The partition material and the method of manufacturing the plasma display panel using the same according to the present invention can reduce the number of manufacturing steps, thereby manufacturing the partition wall, thereby reducing the manufacturing cost.

Furthermore, since a high-definition partition can be formed by a simple process, there is an effect of increasing the stability of the partition.

Those skilled in the art will appreciate that various changes and modifications can be made without departing from the spirit of the present invention.

Therefore, the technical scope of the present invention should not be limited to the contents described in the embodiments, but should be defined by the claims.

Claims (11)

50 to 90% by weight of inorganic matter and 10 to 50% by weight of organic matter, A partition material comprising a dielectric paste having a glass powder of at least 50% by weight in the inorganic material. The method of claim 1, A partition material, wherein the difference in refractive index between the inorganic material and the organic material of the dielectric paste is -0.05 to 0.1. The method of claim 1, An average refractive index of the inorganic and organic materials of the dielectric paste is 1.4 to 2.0, wherein the partition material. The method of claim 1, The barrier material is a barrier material, wherein the dielectric paste has a transmittance of 40 to 80% with respect to laser light. Forming a partition layer on a lower plate using the partition material according to any one of claims 1 to 4; Patterning the barrier layer using laser imaging; Developing the patterned partition wall layer; And Firing the developed barrier rib layer to form a barrier rib. The method of claim 5, wherein the partition material, The method of manufacturing a plasma display panel, characterized in that the paste is applied on the dielectric layer of the lower plate. The method of claim 5, wherein the partition material, The method of manufacturing a plasma display panel, characterized in that applied to the dielectric layer of the lower plate in the form of a green sheet. The method of claim 5, wherein the partition material, The method of manufacturing a plasma display panel, characterized in that applied to the dielectric layer of the lower plate in the form of a slurry. The method of claim 5, wherein the patterning step, A method of manufacturing a plasma display panel using laser light having a wavelength of 405 nm. The method of claim 5, wherein the partition wall, A method of manufacturing a plasma display panel, wherein differential barrier ribs having different heights are formed by adjusting wavelengths of laser light. The method of claim 5 or 10, wherein the partition wall, The height of the vertical partition wall is formed higher than the height of the horizontal partition wall manufacturing method of the plasma display panel.

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