KR20080024349A - Fabricating method of plasma display panel - Google Patents

Abstract

A method for manufacturing a plasma display panel is provided to form a barrier rib with a high aspect ratio and a high reflectance by using a dry film resist. A photosensitive barrier rib material is coated on an upper surface of a dielectric(403) of a glass(401). A dry film for photosensitive barrier rib is laminated on the photosensitive barrier rib material. A photosensitive barrier rib pattern is formed on the dry film for the photosensitive barrier rib, and a water-jet development process is performed. A barrier rib(430) is formed by delaminating the dry film for the photosensitive barrier rib and performing a bake process. The photosensitive barrier rib material includes one of a cellulose-based binder or cellulose-based binder mixture.

Description

Manufacturing method of plasma display panel {FABRICATING METHOD OF PLASMA DISPLAY PANEL}

1 is a structural diagram showing the structure of a conventional plasma display panel.

2 is a schematic block diagram showing a method of forming a partition wall using a conventional photosensitive method.

3 is a schematic block diagram illustrating a method of forming a partition wall using a conventional DFR.

4A to 4I are flowcharts illustrating a method of manufacturing a plasma display panel according to an exemplary embodiment of the present invention.

5A through 5F are flowcharts illustrating a method of manufacturing a plasma display panel according to an exemplary embodiment of the present invention.

<Explanation of symbols for the main parts of the drawings>

401, 501: lower plate (rear glass)

402 and 502 address electrodes

403 and 703: dielectric layers

404, 505, 505: partition wall

410, 510: DFR

430, 530, 531: bulkhead

The present invention relates to a method of manufacturing a plasma display panel including a partition wall.

Plasma Display Panel (PDP) is a type of light emitting device that displays an image by using a discharge phenomenon, and there is no need to mount an active device for each cell, so the manufacturing process is simple and the screen is easily enlarged. As a result, the response speed is fast becoming a display element of an image display device having a large screen.

As shown in FIG. 1, the plasma display panel has a structure in which the upper panel 10 and the lower panel 20 face each other and overlap each other. The upper panel 10 has a pair of sustain electrodes arranged on an inner surface of the transparent substrate 11, and usually the sustain electrodes comprise a transparent electrode 12 and a bus electrode 13, respectively.

The sustain electrode is covered with a dielectric layer 14 for AC driving, and a protective film 15 is formed on the surface of the dielectric layer 14.

On the other hand, the inner surface of the lower panel 20, the address electrode 22 is arranged on the lower plate 21, the dielectric layer 23 is formed thereon, and the dielectric layer 23 is formed on the dielectric layer 23 for partitioning the address electrode 22 A stripe or well type partition wall 24 is formed, and red, blue, and green phosphor layers 26 for color display are applied to the cells partitioned by the partition walls 24 to form a subpixel.

The photosensitive partition wall 24 divides the discharge cell 25 into subpixels, and discharge gas is enclosed in the discharge cell 25, and one pixel includes the three subpixels.

As the method of forming the photosensitive partition wall 24, a printing method, a sand blasting method, an etching method, and a photolithography method using a photosensitive material are mainly applied.

The printing method is a method of forming a partition of a desired degree by printing a glass paste having a high thixotropy several times, sandblasting method after applying a dry film resist (DFR) on the partition material before firing, After exposure and development using a photo mask, the patterned DFR is used as a mask to form a barrier rib pattern by sand blasting and then fire.

In addition, the etching method is similar to the sandblasting process, but instead of the sandblasting, an etching solution is used to form partition walls.

However, two methods are currently applied to the etching method, and there are two cases of DFR placed on the partition material, that is, a film form and a liquid photoresist (PR). Therefore, there is a difference in the method according to this material.

2 shows a process of the photosensitive method currently applied. After forming the electrode layer on the lower glass, a dielectric is coated and the barrier material is coated on the substrate through printing, sheeting, or die coating (S10) and dried.

The bulkhead material used here is not a material used in the conventional sanding or printing method, but a paste made of a paste containing a powder suitable for photosensitivity and a photocuring vehicle which can be cured by being exposed to UV light or hardened. It is a material in the form of a sheet.

Here, the non-exposed part is developed (S30) through an alkali solution through UV exposure (S20) to obtain a desired partition pattern, and then fired (S40) to obtain a final partition.

3 is a method of forming a barrier rib for etching using a DFR. After the barrier material is applied (S10) using a powder which can be easily etched in an acid in the general barrier material (S10), it is fired and coated with an organic DFR (S11), followed by UV exposure (S20), and the development ( S30) is used to obtain a primary pattern in the DFR, which is then used as a resist to be etched (S50) with an acid such as nitric acid to finally obtain a partition.

However, the conventional barrier rib forming method as described above is difficult to obtain a high aspect ratio and a complicated process. In addition, the photosensitive bulkhead forming method currently applied has a problem that the process and cost increase and the residual carbon ratio is high by using an exposure acrylate twice and an expensive acrylate-based binder as the photosensitive material.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and to provide a method for manufacturing a plasma display panel that can reduce the manufacturing process and cost in the partition wall forming method using DFR.

In addition, the present invention is to provide a method for manufacturing a plasma display panel that can easily control the cross-sectional shape of the partition wall in the partition wall formation method using the DFR.

In order to achieve the above object of the present invention, a method of manufacturing a plasma display panel according to an embodiment of the present invention, in the method of manufacturing a plasma display panel including a discharge cell partitioned by a partition wall

(a) applying a barrier material over the dielectric of the glass and laminating the dry film for the barrier,

(b) forming a pattern of the partition on the photosensitive partition dry film, and then performing waterjet development, and

(c) peeling and firing the dry film for photosensitive barrier ribs to form a barrier rib.

In addition, in order to achieve the above object of the present invention, a method of manufacturing a plasma display panel according to an embodiment of the present invention, in the method of manufacturing a plasma display panel including a discharge cell divided into a horizontal partition and a vertical partition,

(a) applying a barrier material over the dielectric of the glass and laminating the dry films for the horizontal and vertical bulkheads,

(b) forming a pattern of the horizontal barrier ribs and the vertical barrier ribs in the dry film for the horizontal barrier ribs and the vertical barrier ribs, and then performing waterjet development, and

(c) peeling and firing the dry film for photosensitive barrier ribs to form a horizontal barrier rib and a vertical barrier rib.

Here, the photosensitive partition wall material includes any one selected from a cellulose-based binder or a cellulose-based binder mixture, and the firing temperature is 330 ° C. or less.

Moreover, the residual carbon ratio of the said photosensitive partition is less than 10%, the reflectance is 50 to 80%, and the dielectric constant is 8 to 20%.

The vertical partition wall is formed higher than the horizontal partition wall, and the pattern width in the vertical direction for forming the vertical partition wall is wider than the pattern width in the horizontal direction for forming the horizontal partition wall.

Here, the horizontal barrier ribs and the vertical barrier rib dry film may be formed of a plurality of layers of different materials, and the plurality of layers may have different waterjet development characteristics for each layer.

Hereinafter, with reference to the accompanying drawings illustrating the configuration and operation of the embodiment of the present invention, the configuration and operation of the present invention shown in the drawings and described by it will be described as at least one embodiment, By the technical spirit of the present invention described above and its core configuration and operation is not limited.

4A to 4I are flowcharts illustrating a method of manufacturing a plasma display panel according to an exemplary embodiment of the present invention.

In the process of manufacturing the back substrate of the plasma display panel, as shown in FIG. 4A, the soda lime glass or PD200 is suitable for preparing the back glass 401 as the bottom plate.

Next, as shown in FIG. 4B, an address electrode 402 is formed on the back glass 401, and as shown in FIG. 4C, the back glass 401 and the address electrode 402 are protected and generated during discharge. A white back layer (not shown) and a lower dielectric layer 403 are formed to serve as a reflective layer for reflecting light passing back from the back substrate. Then, a partition wall is formed on the lower dielectric layer 403.

The formation process of a partition is explained in full detail as follows. First, a photosensitive partition material is applied onto the lower dielectric layer 403 as shown in FIG. 4D. In this case, the photosensitive barrier material is printed by pasting the photosensitive barrier material composition in the form of a paste or laminating the partition green sheet in the form of a slurry. In addition, the barrier material is a material that can be developed, using a photosensitive barrier material containing any one selected from a cellulose binder or a cellulose binder mixture.

Next, as shown in FIG. 4E, a predetermined photoresist film such as a dry film resin (hereinafter referred to as DFR) 410 is formed on the barrier layer 404 to which the barrier material is applied. It is formed through a method such as a laminating process.

Next, as shown in FIG. 4F, in order to form a partition wall, a well type photomask 411 is exposed to ultraviolet light. This light is exposed as light emitted from the exposure machine 420. This exposure is performed to harden the partition layer 404 according to the pattern of the photomask 411.

Next, as shown in Fig. 4G, after the above-described exposure step, the developing step is performed. In the exemplary embodiment of the present invention, the DFR 410 of a region exposed to light by the waterjet development process (hereinafter referred to as an “exposure region”) is a water development process using a waterjet, and remains on the partition layer 404.

Next, as shown in FIG. 4H, the DFR 410 of the region not exposed to light (hereinafter referred to as the 'non-exposure region') is removed, and as shown in FIG. 4I, calcined to 330 ° C. or lower and dried. The partition wall 430 is formed through the process.

Since the photosensitive partition wall 430 is formed by a single exposure process using a partition material including an inexpensive cellulose-based or cellulose-based mixture and a low firing temperature, the manufacturing cost of the plasma display panel can be lowered, and the residual carbon ratio is further reduced. It can be formed to be less than 10%, reflectance to 50 to 80%, and dielectric constant to 8 to 20%.

5A through 5F are flowcharts illustrating a method of manufacturing a plasma display panel according to an exemplary embodiment of the present invention.

As shown in FIG. 5A, as a process of manufacturing a rear substrate of a plasma display panel, a rear glass 501 is prepared as a lower plate, an address electrode 502 is formed on the rear glass 501, and a rear glass ( A white back layer (not shown) and a lower dielectric layer 503 are formed to protect the 501 and the address electrode 502 and serve as a reflective layer that reflects the light generated during discharge to pass backwards from the rear substrate. Then, the first partition layer 504 and the second partition layer 505 are formed on the lower dielectric layer 503 using the photosensitive partition material. In this case, the photosensitive barrier material is printed by pasting the photosensitive barrier material composition in the form of a laminate or laminate the partition green sheet of the slurry form. In addition, the barrier material is a material that can be developed, using a photosensitive barrier material containing any one selected from a cellulose binder or a cellulose binder mixture.

Next, a predetermined photoresist film, such as a dry film resin (hereinafter referred to as DFR) 510, on the second partition wall layer 505 is described in FIG. 5B. It is formed through.

Next, as shown in FIG. 5C, an exposure process is performed with light emitted from the exposure machine 520 using the photomask 511 on the DFR 510 to form the partition wall. Here, the reason why the pattern width in the vertical direction should be wider than the pattern width in the horizontal direction is to put a height difference between the laterally formed partition walls and the vertical partition walls. Preferably, the height of the vertical barrier ribs is higher than that of the horizontal barrier ribs. The vertical barrier ribs separate R, G, and B phosphors to partition unit pixels to prevent color mixing between the phosphors and exhaust the plasma display panel. To improve the characteristics

Next, as shown in Fig. 5D, after the above-described exposure step, the developing step is performed. In the exemplary embodiment of the present invention, the DFR 510 of a region exposed to light by the waterjet development process (hereinafter, referred to as an “exposure region”) is a water development process using a waterjet, and remains on the second partition wall layer 505. According to an exemplary embodiment of the present invention, a plurality of partition layers, that is, the first partition layer 504 and the second partition wall layer 505 may be formed by the first partition wall layer 504 due to different development characteristics. The differential barrier ribs having different heights of the barrier ribs formed by the second barrier rib layer 505 may be formed.

Next, as shown in FIG. 5E, the DFR 510 of an area not exposed to light (hereinafter referred to as a 'non-exposure area') is removed, and as shown in FIG. 5F, calcined to 330 ° C. or lower and dried. The first partition 530 and the second partition 531 are formed through the process.

As described above, the differential barrier ribs 530 and 531 are formed in a single exposure process using a barrier material including an inexpensive cellulose-based or cellulose-based mixture and at a low firing temperature, thereby lowering the manufacturing cost of the plasma display panel. In addition, the residual carbon ratio can be formed to be less than 10%, the reflectance to 50 to 80%, and the dielectric constant to 8 to 20%.

The above embodiment is an example for explaining the technical idea of the present invention in detail, and the present invention is not limited to the above embodiment, various modifications are possible, and various embodiments of the technical idea are all protected by the present invention. It belongs to the scope.

According to the plasma display manufacturing method according to the present invention as described above, there is an effect that the manufacturing process and cost is reduced in the partition wall forming method using the DFR.

In addition, according to the plasma display manufacturing method according to the present invention, a partition having a high aspect ratio can be obtained in the method of forming a partition using DFR, and a partition having a low residual carbon ratio and a high reflectance can be obtained.

Those skilled in the art will appreciate that various changes and modifications can be made without departing from the spirit of the present invention.

Therefore, the technical scope of the present invention should not be limited to the contents described in the embodiments, but should be defined by the claims.

Claims (11)

In the method of manufacturing a plasma display panel including a discharge cell partitioned by a partition wall, (a) applying a barrier material over the dielectric of the glass and laminating a dry film for the barrier; (b) forming a pattern of the partition on the photosensitive partition dry film, and then performing waterjet development; And (c) peeling and firing the dry film for photosensitive barrier ribs to form a barrier rib. In the method of manufacturing a plasma display panel comprising a discharge cell divided into a horizontal partition wall and a vertical partition wall, (a) applying a barrier material over the dielectric of the glass and laminating a dry film for the horizontal bulkhead and the vertical bulkhead; (b) forming a pattern of the horizontal partition wall and the vertical partition wall in the dry film for the horizontal partition wall and the vertical partition wall, and then performing waterjet development; And (c) peeling and firing the dry film for photosensitive barrier ribs to form horizontal barrier ribs and vertical barrier ribs. The method of claim 1 or 2, wherein the photosensitive partition material, A method of manufacturing a plasma display panel comprising any one selected from a cellulose binder or a cellulose binder mixture. The method of claim 1 or 2, wherein the firing temperature, It is 330 degrees C or less, The manufacturing method of the plasma display panel. The residual carbon ratio of the photosensitive partition wall according to claim 1 or 2, A method of manufacturing a plasma display panel, characterized in that less than 10%. The method of claim 1 or claim 2, wherein the reflectance of the photosensitive partition wall, It is 50 to 80%, The manufacturing method of the plasma display panel. The dielectric constant of claim 1 or 2, wherein It is 8 to 20%, The manufacturing method of the plasma display panel. The method of claim 2, And wherein the vertical barrier ribs are formed higher than the horizontal barrier ribs. The method of claim 2, And the pattern width in the vertical direction for forming the vertical partition wall is wider than the pattern width in the horizontal direction for forming the horizontal partition wall. The method of claim 2, And wherein the horizontal barrier ribs and the vertical barrier rib layer are formed of a plurality of layers of different materials. The method of claim 10, And the plurality of layers have different waterjet development characteristics for each layer.

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