KR20070115909A - 패턴 형성 방법 - Google Patents

패턴 형성 방법 Download PDF

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Publication number
KR20070115909A
KR20070115909A KR1020077019483A KR20077019483A KR20070115909A KR 20070115909 A KR20070115909 A KR 20070115909A KR 1020077019483 A KR1020077019483 A KR 1020077019483A KR 20077019483 A KR20077019483 A KR 20077019483A KR 20070115909 A KR20070115909 A KR 20070115909A
Authority
KR
South Korea
Prior art keywords
exposure
drawing part
light
area
pattern
Prior art date
Application number
KR1020077019483A
Other languages
English (en)
Korean (ko)
Inventor
마사노부 타카시마
카츠토 스미
카즈테루 코와다
잇세이 스즈키
타카유키 우에무라
Original Assignee
후지필름 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤
Publication of KR20070115909A publication Critical patent/KR20070115909A/ko

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
KR1020077019483A 2005-03-31 2006-02-22 패턴 형성 방법 KR20070115909A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005103677A JP2006284842A (ja) 2005-03-31 2005-03-31 パターン形成方法
JPJP-P-2005-00103677 2005-03-31

Publications (1)

Publication Number Publication Date
KR20070115909A true KR20070115909A (ko) 2007-12-06

Family

ID=37114879

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077019483A KR20070115909A (ko) 2005-03-31 2006-02-22 패턴 형성 방법

Country Status (5)

Country Link
JP (1) JP2006284842A (ja)
KR (1) KR20070115909A (ja)
CN (1) CN101156109A (ja)
TW (1) TW200705546A (ja)
WO (1) WO2006112137A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4606949B2 (ja) * 2005-03-31 2011-01-05 富士フイルム株式会社 描画装置および描画方法
JP4903479B2 (ja) 2006-04-18 2012-03-28 富士フイルム株式会社 金属パターン形成方法、金属パターン、及びプリント配線板
JP4884917B2 (ja) * 2006-10-23 2012-02-29 富士フイルム株式会社 カラーフィルタの製造方法及びカラーフィルタ並びに液晶表示装置
JP5354803B2 (ja) * 2010-06-28 2013-11-27 株式会社ブイ・テクノロジー 露光装置
KR102120624B1 (ko) 2013-04-04 2020-06-10 삼성디스플레이 주식회사 Glv를 이용한 디지털 노광기 및 dmd를 이용한 디지털 노광기
JP7239388B2 (ja) * 2019-05-09 2023-03-14 株式会社アドテックエンジニアリング 直描式露光装置
CN117250831A (zh) * 2023-07-26 2023-12-19 无锡物联网创新中心有限公司 一种光机电控制系统及阵列化数字光刻机

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09152660A (ja) * 1995-09-27 1997-06-10 Fuji Photo Film Co Ltd 画像プリンタ
JP2003295326A (ja) * 2002-04-02 2003-10-15 Noritsu Koki Co Ltd プリント装置およびプリント調整方法
JP4731787B2 (ja) * 2002-04-10 2011-07-27 富士フイルム株式会社 露光ヘッド及び露光装置
JP3938714B2 (ja) * 2002-05-16 2007-06-27 大日本スクリーン製造株式会社 露光装置
JP2004009595A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光ヘッド及び露光装置
JP4150250B2 (ja) * 2002-12-02 2008-09-17 富士フイルム株式会社 描画ヘッド、描画装置及び描画方法
JP4390189B2 (ja) * 2003-04-10 2009-12-24 大日本スクリーン製造株式会社 パターン描画装置
JP4486323B2 (ja) * 2003-06-10 2010-06-23 富士フイルム株式会社 画素位置特定方法、画像ずれ補正方法、および画像形成装置
JP2005022250A (ja) * 2003-07-02 2005-01-27 Fuji Photo Film Co Ltd 画像記録方法及び画像記録装置
JP2005055881A (ja) * 2003-07-22 2005-03-03 Fuji Photo Film Co Ltd 描画方法および描画装置
JP4450689B2 (ja) * 2003-07-31 2010-04-14 富士フイルム株式会社 露光ヘッド
JP4823581B2 (ja) * 2004-06-17 2011-11-24 富士フイルム株式会社 描画装置および描画方法
JP2006030966A (ja) * 2004-06-17 2006-02-02 Fuji Photo Film Co Ltd 描画方法および装置

Also Published As

Publication number Publication date
WO2006112137A1 (ja) 2006-10-26
CN101156109A (zh) 2008-04-02
TW200705546A (en) 2007-02-01
JP2006284842A (ja) 2006-10-19

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