TW200705546A - Process for forming pattern - Google Patents

Process for forming pattern

Info

Publication number
TW200705546A
TW200705546A TW095109820A TW95109820A TW200705546A TW 200705546 A TW200705546 A TW 200705546A TW 095109820 A TW095109820 A TW 095109820A TW 95109820 A TW95109820 A TW 95109820A TW 200705546 A TW200705546 A TW 200705546A
Authority
TW
Taiwan
Prior art keywords
pattern
pixel portion
exposing
photo
sensitive layer
Prior art date
Application number
TW095109820A
Other languages
English (en)
Inventor
Masanobu Takashima
Katsuto Sumi
Kazuteru Kowada
Issei Suzuki
Takayuki Uemura
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200705546A publication Critical patent/TW200705546A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
TW095109820A 2005-03-31 2006-03-22 Process for forming pattern TW200705546A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005103677A JP2006284842A (ja) 2005-03-31 2005-03-31 パターン形成方法

Publications (1)

Publication Number Publication Date
TW200705546A true TW200705546A (en) 2007-02-01

Family

ID=37114879

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095109820A TW200705546A (en) 2005-03-31 2006-03-22 Process for forming pattern

Country Status (5)

Country Link
JP (1) JP2006284842A (zh)
KR (1) KR20070115909A (zh)
CN (1) CN101156109A (zh)
TW (1) TW200705546A (zh)
WO (1) WO2006112137A1 (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4606949B2 (ja) * 2005-03-31 2011-01-05 富士フイルム株式会社 描画装置および描画方法
JP4903479B2 (ja) 2006-04-18 2012-03-28 富士フイルム株式会社 金属パターン形成方法、金属パターン、及びプリント配線板
JP4884917B2 (ja) * 2006-10-23 2012-02-29 富士フイルム株式会社 カラーフィルタの製造方法及びカラーフィルタ並びに液晶表示装置
JP5354803B2 (ja) * 2010-06-28 2013-11-27 株式会社ブイ・テクノロジー 露光装置
KR102120624B1 (ko) 2013-04-04 2020-06-10 삼성디스플레이 주식회사 Glv를 이용한 디지털 노광기 및 dmd를 이용한 디지털 노광기
JP7239388B2 (ja) * 2019-05-09 2023-03-14 株式会社アドテックエンジニアリング 直描式露光装置
CN117250831A (zh) * 2023-07-26 2023-12-19 无锡物联网创新中心有限公司 一种光机电控制系统及阵列化数字光刻机

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09152660A (ja) * 1995-09-27 1997-06-10 Fuji Photo Film Co Ltd 画像プリンタ
JP2003295326A (ja) * 2002-04-02 2003-10-15 Noritsu Koki Co Ltd プリント装置およびプリント調整方法
JP4731787B2 (ja) * 2002-04-10 2011-07-27 富士フイルム株式会社 露光ヘッド及び露光装置
JP3938714B2 (ja) * 2002-05-16 2007-06-27 大日本スクリーン製造株式会社 露光装置
JP2004009595A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光ヘッド及び露光装置
JP4150250B2 (ja) * 2002-12-02 2008-09-17 富士フイルム株式会社 描画ヘッド、描画装置及び描画方法
JP4390189B2 (ja) * 2003-04-10 2009-12-24 大日本スクリーン製造株式会社 パターン描画装置
JP4486323B2 (ja) * 2003-06-10 2010-06-23 富士フイルム株式会社 画素位置特定方法、画像ずれ補正方法、および画像形成装置
JP2005022250A (ja) * 2003-07-02 2005-01-27 Fuji Photo Film Co Ltd 画像記録方法及び画像記録装置
JP2005055881A (ja) * 2003-07-22 2005-03-03 Fuji Photo Film Co Ltd 描画方法および描画装置
JP4450689B2 (ja) * 2003-07-31 2010-04-14 富士フイルム株式会社 露光ヘッド
JP4823581B2 (ja) * 2004-06-17 2011-11-24 富士フイルム株式会社 描画装置および描画方法
JP2006030966A (ja) * 2004-06-17 2006-02-02 Fuji Photo Film Co Ltd 描画方法および装置

Also Published As

Publication number Publication date
JP2006284842A (ja) 2006-10-19
CN101156109A (zh) 2008-04-02
WO2006112137A1 (ja) 2006-10-26
KR20070115909A (ko) 2007-12-06

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