KR20070090378A - Device for washing substrate and method to supply washing solution - Google Patents

Abstract

A substrate cleaning apparatus is provided to reduce a fabricating cost of a substrate and contamination of the environment by reducing greatly the quantity of used cleaning water. An injection part(100) includes a first injection part(110) and a final injection part(130). The first injection part firstly injects cleaning water to a substrate(S) transferred along a substrate transfer path. The final injection part finally injects cleaning water to the substrate. A storage part(200) collects the cleaning water injected from the final injection part to the substrate and circulates the cleaning water to the first injection part positioned in the rear of the final injection part through a circulation line(201,202). A main regenerating part(500) collects and regenerates the cleaning water injected from the first injection part to the substrate and supplies the regenerated cleaning water to the final injection part. The main regenerating part can be provided with cleaning water of high purity from a cleaning water supply source.

Description

Device for washing substrate and method to supply washing solution

1 is a schematic configuration diagram of a conventional substrate cleaning apparatus.

Figure 2 is a schematic first embodiment of the substrate cleaning apparatus of the present invention.

Figure 3 is a schematic second embodiment of the substrate cleaning apparatus of the present invention.

Figure 4 is a schematic third embodiment of the substrate cleaning apparatus of the present invention.

* Description of the symbols for the main parts of the drawings *

100: injection unit 110: the first injection unit

120: intermediate injection unit 130: the final injection unit

131: first nozzle unit 132: second nozzle unit

200: storage unit 201, 202: circulation line

210: first storage unit 220: second storage unit

300: substrate transfer unit 400: washing water supply source

410: supply line 420: branch line

500: main regeneration unit 501: recovery tank

502: primary filter 503: polisher

504: secondary filter 510: playback line

520: discharge line 530: resistivity meter

540, 550: auxiliary regeneration unit 600: dry section

S: Substrate P1, P2: Pump

M1, M2: Valve

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate cleaning apparatus and a washing water supplying method, and more particularly, to a substrate cleaning apparatus and a washing water supplying method for spraying and washing a plurality of times with respect to a substrate conveyed in one direction.

In general, a semiconductor wafer or a flat panel display (FPD) substrate is manufactured through various manufacturing processes, and the surface treatment process of such a manufacturing process is performed by treating a substrate with a treatment liquid such as washing water, etching solution or developer. Is a process of cleaning, etching, developing or stripping.

That is, in the surface treatment process, the surface of the substrate is cleaned, etched, developed or stripped by treating the treatment liquid on the upper surface, the lower surface, or the upper and lower surfaces of the substrate which are horizontally transferred at a constant speed by a conveying means such as a conveyor.

In addition, when the substrate undergoes various manufacturing processes including the surface treatment process, the surface is contaminated by particles and contaminants, so that the cleaning process is performed before and after some manufacturing processes to remove the substrate.

As such, the cleaning process is a process for cleaning the surface of the substrate. For example, the wet cleaning process includes a chemical liquid treatment process, a rinsing process, and a drying process, and a bath for removing particles and contaminants on the substrate surface. Cleaning water such as deionized water or chemical is treated to the substrate transferred in one direction from the inside.

Meanwhile, some of the washing water treated on the substrate in the wet cleaning process is recovered and reused in a storage unit provided under the bath.

1 is a schematic configuration diagram of a conventional substrate cleaning apparatus.

Referring to FIG. 1, a conventional substrate cleaning apparatus includes an irradiation section 60 for irradiating ultraviolet rays to a substrate S installed at a beginning of a substrate transfer path and forward of the irradiation section 60. A plurality of spray units 10 (11, 12, 13) sequentially installed along the substrate transfer path, and the washing water sprayed from the spray unit 10 to the substrate (S) to recover the spray unit adjacent to the rear ( And a storage unit 20 for supplying it to 10).

In one example, the substrate S is horizontally transferred in one direction by a substrate transfer unit 30 such as a conveyor installed along the substrate transfer direction.

Subsequently, the substrate S is horizontally moved in one direction and receives ultraviolet rays from the irradiating portion 61 installed in the irradiating section 60 to remove the organic matter from the surface thereof, and then passes through the respective spraying portions 11, 12, 13 and is cleaned. It is washed sequentially by water.

That is, the injection unit 10 sprays the washing water a plurality of times on the substrate S so that the substrate S is properly cleaned.

Accordingly, the injection unit 10 is provided with the first injection unit 11, the second injection unit 12 and the third injection unit 13 in sequence along the substrate transfer path, the first injection unit 11 and the first injection unit The two spraying unit 12 and the third spraying unit 13 sequentially spray the washing water onto the substrate S that is horizontally transported downward.

Since the substrate cleaning apparatus is supplied with the washing water to each of the spraying parts 11, 12, and 13, the consumption thereof is excessive and disadvantageous in terms of manufacturing cost, and thus, ultrapure is directly supplied from the washing water source 40. Is supplied to the third injection unit 13, which is a final rinse section, and sprayed, and the washing water sprayed on the substrate S is recovered from the third injection unit 13, and the second injection unit ( 12) and the first injecting section (11).

Thus, the storage unit 20 (21, 21) is the first storage unit 21 for recovering the washing water sprayed on the substrate (S) from the third spraying unit 13 to supply to the second spraying unit 12 And a second storage part 22 which recovers the washing water sprayed onto the substrate S from the second injection part 12 and supplies it to the first injection part 11.

As such, the conventional substrate cleaning apparatus recovers the washing water sprayed onto the substrate from the third spraying unit 13 to reduce the amount of washing water used, and re-supply the second spraying unit 12 and the first spraying unit 11. Finally discharge through the discharge line (50).

However, the conventional substrate cleaning apparatus has a disadvantage in that the size of the substrate is gradually increased so that the amount of the washing water is not adequately increased, and the washing water is discharged to the waste water at the final stage, which is disadvantageous in terms of washing water recycling.

In view of the above problems, an object of the present invention is to provide a substrate cleaning apparatus and a washing water supply method capable of minimizing the amount of washing water while spraying the washing water a plurality of times.

The present invention for achieving the above object, an injection unit including an initial injection unit for the first injection of the cleaning water and the final injection unit for the final injection of the cleaning water to the substrate transported along the substrate transfer path, and the final injection unit Collects and recycles the washing water sprayed onto the substrate through the circulation line to the first spraying unit, and recovers and recycles the washing water sprayed on the substrate from the initial spraying to the final spraying unit. And a main reproducing unit.

In addition, the present invention, (a) recovering the washing water discharged from the first injection portion on the substrate transfer path, (b) regenerating the washing water recovered in the step (a), and (c (B) supplying the washing water regenerated in step (b) to the final jetting part on the substrate transfer path, and (d) the washing water supplied to the final jetting part in step (c) and injected onto the substrate for the first time. Circulating supply to the dead part.

When described in detail with reference to the accompanying drawings, embodiments of the present invention configured as described above are as follows.

<Example 1>

Figure 2 is a schematic first embodiment of the substrate cleaning apparatus of the present invention.

2, the first embodiment of the substrate cleaning apparatus according to the present invention is an irradiation section 700 for irradiating ultraviolet rays to the substrate (S) is installed at the beginning of the substrate transfer path and transported, the irradiation The first spraying unit 110, the intermediate spraying unit 120, and the final spraying unit 130 spraying the washing water on the substrate S sequentially installed along the substrate transfer path in front of the section 700. The first storage part 210 and the intermediate part which collects the injection part 100 and the washing water injected and discharged from the final injection part 130 to the substrate S and supplies them to the intermediate injection part 120. Storage unit 200, the first injection unit including a second storage unit 220 for recovering the washing water discharged from the injection unit 120 to the substrate (S) and supplied to the first injection unit 110 The main regeneration for recovering and regenerating the washing water discharged from the 110 to the substrate (S) and supplied to the final injection unit 130 It comprises 500.

The substrate S is horizontally transferred in one direction by a substrate transfer part 300 such as a conveyor installed along the substrate transfer direction.

Subsequently, the substrate S is horizontally moved in one direction and irradiated with ultraviolet rays from the irradiation unit 701 installed in the irradiation section 700 to remove organic substances on the surface thereof, and then passes through the respective injection units 110, 120, 130. The water is sequentially washed by the washing water sprayed from the spraying units 110, 120, and 130.

The irradiation unit 701 installed in the irradiation section 700 may be a mercury lamp or an excimer laser.

The jetting unit 100 essentially includes an initial jetting unit 110 and a final jetting unit 130 to spray the washing water a plurality of times on the transferred substrate S, and the initial jetting unit 110 and the final jetting unit Between the 130 is preferably a single or a plurality of intermediate injection unit 120 is further provided.

For example, each of the spraying units 110, 120, and 130 includes a plurality of hole shower type nozzles to spray washing water.

The storage unit 200 may be considered to be configured as a single unit to recover the washing water discharged by being injected to the substrate (S) from the final injection unit 130 and the intermediate injection unit 120, as described above The first storage unit 210 for recovering the washing water injected from the final injection unit 130 and the second storage unit 220 for recovering the washing water injected from the intermediate injection unit 120 are preferably provided separately. .

Therefore, each of the jetting parts 110, 120, and 130 is gradually supplied with increasingly high purity cleaning water along the substrate transfer direction.

That is, the high-purity washing water injected from the first injection unit 110 and recovered and regenerated by the main regeneration unit 500 is supplied to the final injection unit 130 and injected, and then injected from the final injection unit 130 to store the first. The medium purity washing water recovered in the unit 210 is supplied to the intermediate spraying unit 120 and sprayed, and the low purity washing water sprayed in the intermediate spraying unit 120 and recovered in the second storage unit 220 is It is supplied to the first injection unit 110 is injected.

The main regeneration unit 500 removes a relatively large foreign matter contained in the recovery tank 501 for recovering the washing water discharged from the first injection unit 110 and the washing water recovered in the recovery tank 501. A primary filter 502 and a regeneration line 510 for irradiating ultraviolet light by passing the washing water through the irradiation section 700 to remove bacteria and the like contained in the washing water passing through the primary filter 502; And a polisher 503 for removing ions contained in the washing water passing through the regeneration line 510 and a secondary filter for removing fine foreign matter contained in the washing water passing through the polisher 503. 504.

In particular, the main regeneration unit 500 may be provided directly with an ultraviolet irradiation device for removing bacteria and the like contained in the washing water, but the inside of the main regeneration unit 500 via the washing water to the irradiation line 700 used in the entire substrate cleaning process. Since the irradiation apparatus can be omitted, the size of the apparatus can be reduced and the manufacturing cost can be reduced.

Specifically, the portion passing through the irradiation section 700 of the regeneration line 510 may be configured to be irradiated by the ultraviolet light by using a transparent tube such as glass material.

As such, the main regeneration unit 500 is circulated and used in each of the injection units 110, 120, and 130 to compensate the washing water containing foreign substances and the purity is lower than a predetermined reference value, and thus the final injection unit through the regeneration line 510. Supply to 130.

By the above configuration, the injection unit 100 injects increasingly high-purity washing water along the substrate transfer direction. In particular, the final injection unit 130 performs final rinse on the substrate S. The high purity washing water regenerated by the main regeneration unit 500 is supplied.

The rinsing water is composed of a final injection unit 130, a first storage unit 210, an intermediate injection unit 120, a second storage unit 220, an initial injection unit 110, and a main regeneration unit 500. Since the continually circulating may be left in various parts or naturally reduced shortage may occur, when the shortage occurs, the shortage should be supplemented to the circulation system from the washing water supply 400.

For example, although the washing water supply source 400 may supply the ultra-pure washing water to the main regeneration unit 500 or the storage unit 200, this embodiment illustrates that the washing water is supplied to the main regeneration unit 500. .

That is, when the rinsing water is circulated and used continuously for a predetermined number of times or more, the content of metal ions is increased by the washing action with the substrate S, and the purity and washing ability thereof are lowered. Thus, there is a limit in compensating and regenerating the purity of the washing water in the main regeneration unit 500, and the main regeneration unit 500 continuously regenerates the washing water whose purity is extremely reduced in excess of its capacity. Its life can also be shortened.

Therefore, when the purity of the washing water recovered therein falls below a predetermined reference value, the main regeneration unit 500 receives the supplementary supply of ultrapure washing water from the washing water source 400 to recover the inside of the washing water. It is desirable to increase the purity of the water.

Specifically, the recovery tank 501 of the main regeneration unit 500 is connected by the washing water supply source 400 and the supply line 410, the recovery line 501 in the supply line 410 in the washing water supply source 400 Is provided with a valve (M1) that intercepts the supply of the washing water.

The valve M1 is opened at an initial standby so that the washing water can be circulated smoothly in the circulation system and closed after filling the storage 200 and the collecting tank 501 with the washing water. As described above, when the lack of washing water occurs or when the purity of the washing water is decreased, the washing water is opened to supply the washing water to the recovery tank 501.

In the above configuration, the main regeneration unit 500 preferably further includes a resistivity meter 530 for measuring the purity of the washing water.

That is, the main regeneration unit 500 is configured to receive the ultra-pure washing water from the washing water supply source 400 when it is determined that the purity of the washing water recovered therein is lower than the reference value.

The resistivity meter 530 measures a high value of the specific resistance when the purity of the washing water is high and a low value of the specific resistance when the purity is low.

In the above configuration, the main regeneration unit 500 preferably further includes a resistivity meter 560 for measuring the purity of the regenerated washing water on the regeneration line 510.

That is, the main regeneration unit 500 does not sufficiently regenerate the washing water when a problem occurs in the filters 502, 504, the polisher 503, or the like, or when the service life is over.

Thus, the washing water recycled in a state insufficient for the cleaning process is measured to have a purity lower than a reference value in the resistivity meter 560 before being supplied to the final injection unit 130 through the regeneration line 510.

Accordingly, the user may determine that a problem occurs in the regeneration process of the main regeneration unit 500 and replace the corresponding component in the main regeneration unit 500.

As described above, it may be considered to add a notification means (not shown) for notifying the user by visual or auditory sound when the purity of the washing water in the resistivity meter 560 is measured below the reference value.

For example, the main regeneration unit 500 may include a pump therein such that the recovered washing water is smoothly supplied to the final injection unit 130 through the filters 502 and 504, the polisher 503, and the irradiation section 700. It is preferable to include P3).

As described above, in the first embodiment of the substrate cleaning apparatus of the present invention, the washing water injected from the final injection unit 130 is recovered to the storage unit 200 and circulated and supplied to the initial injection unit 110, and the initial injection unit ( Since a series of circulation processes are repeated after the injection from the main regeneration unit 500 and re-supplied to the final injection unit 130 after the injection, the washing water discharged through the discharge line 520 is minimized, thereby greatly increasing the total amount of washing water used. The advantage is that it can be saved.

On the other hand, the substrate (S) passing through the final injection unit 130 in the drying section 600 enters the cleaning process is completed.

Meanwhile, reference numerals P1 and P2 which are not described are pumps installed in the respective circulation lines 201 and 202 for supplying the washing water from the storage units 210 and 220 to the injection units 110 and 120.

<Example 2>

Figure 3 is a schematic second embodiment of the substrate cleaning apparatus of the present invention. Here, the same reference numerals as in the above-described drawings indicate members having the same function.

Referring to FIG. 3, the second embodiment of the substrate cleaning apparatus according to the present invention regenerates the washing water recovered in the first storage unit 210 and supplied to the intermediate injection unit 120 in the configuration of the first embodiment. The auxiliary regeneration unit 540 and the auxiliary regeneration unit 550 for regenerating the washing water recovered in the second storage unit 220 and supplied to the first injection unit 110 are further included.

The auxiliary regeneration unit 540 is installed in the circulation line 201 connecting the first storage unit 210 and the intermediate injection unit 120, and passes through the washing water supplied to the intermediate injection unit 120 for regeneration. Supplied to the sand 120, the auxiliary regeneration unit 550 is installed in the circulation line 202 connecting the second storage unit 220 and the first injection unit 110 is supplied to the first injection unit 110 The washing water is regenerated and supplied to the initial injection unit 110.

As such, the washing water supplied to each of the spraying units 110, 120, and 130 passes through the regenerating units 500, 540, and 550, thereby increasing purity and increasing substrate cleaning power.

<Example 3>

Figure 4 is a schematic third embodiment of the substrate cleaning apparatus of the present invention. Here, the same reference numerals as in the above-described drawings indicate members having the same function.

Referring to FIG. 4, in the third embodiment of the substrate cleaning apparatus according to the present invention, in the configuration of the first embodiment, the first nozzle in which the final injection unit 130 is supplied with the washing water supplied from the main regeneration unit 500 is provided. A part 131 and a second nozzle part 132 which is supplied with ultrapure cleaning water directly from the cleaning water supply source 400 in front of the first nozzle part 131 along the substrate transfer direction.

Specifically, the first nozzle unit 131 receives the washing water from the regeneration line 510 connected to the main regeneration unit 500, and the second nozzle unit 132 is a branch line branched from the supply line 410. At 420, the ultra pure water is directly supplied.

Therefore, the substrate S passing through the final injection unit 130 is first washed by the high-purity washing water injected from the first nozzle unit 131, and then the ultra-pure injected from the second nozzle unit 132. The second wash is performed by the washing water of to wash more completely.

On the other hand, the valve M1 installed in the supply line 410 intercepts the washing water supplied from the washing water supply source 400 to the main regeneration unit 500, and the valve M2 installed in the branch line 420 washes. It maintains an open state during the process to ensure that the second nozzle portion 131 is continuously supplied with the ultrapure cleaning water.

The present invention has been shown and described with reference to certain preferred embodiments, but the present invention is not limited to the above-described embodiments and has ordinary skill in the art to which the present invention pertains without departing from the concept of the present invention. Various changes and modifications are possible by the user.

As described above, the present invention can significantly reduce the amount of washing water, thereby reducing the cost of manufacturing the substrate, and it is advantageous in terms of reducing environmental pollution.

In addition, the present invention, it is easy to detect the decrease in the purity of the rinsing water used for circulation and can quickly and conveniently compensate for the purity of the washing water has the effect of improving the device operating efficiency.

In addition, the present invention has the effect that it can be applied to a cleaning process that requires a high level of cleaning since the injection of the ultra-pure cleaning water to the substrate in the section where the cleaning water injection is completed.

In addition, the present invention, since the washing water during the regeneration process via the irradiation line used for the entire substrate cleaning process, it is not necessary to include a separate ultraviolet irradiation device in the regeneration unit, it is possible to reduce the size of the regeneration unit and reduce the production cost There is.

In addition, the present invention, it is possible to know the replacement time of the regeneration unit in advance by measuring the specific resistance value of the regenerated washing water has the effect of improving the device operating efficiency.

Claims (12)

An injection unit including an initial injection unit for initially spraying the washing water and a final injection unit for final spraying the washing water with respect to the substrate transferred along the substrate transfer path; A storage unit which recovers the washing water sprayed onto the substrate from the final spray unit and circulates through the circulation line to the first spray unit at the rear thereof; And And a main regeneration unit for recovering and regenerating the washing water sprayed onto the substrate by the first injection unit and supplying the water to the final injection unit. The method of claim 1, The main regeneration unit is a substrate cleaning apparatus, characterized in that for receiving the ultra-pure cleaning water from the cleaning water supply source. The method of claim 2, And a resistivity meter for measuring the purity of the washing water returned to the main regeneration unit. The method of claim 2, The final injection unit, A first nozzle part which sprays the washing water supplied from the main regeneration part; And And a second nozzle part installed in front of the first nozzle part and finally spraying the cleaning water directly supplied from the cleaning water supply source to the substrate. The method of claim 1, Substrate cleaning device further comprises a single or a plurality of intermediate injection portion between the first injection portion and the final injection portion. The method of claim 5, And an auxiliary regeneration unit for regenerating the washing water circulated and supplied to the first injection unit or the intermediate injection unit in the circulation line. The method of claim 1, And a resistivity meter for measuring the purity of the washing water supplied from the main regeneration unit to the final injection unit. The method according to any one of claims 1 to 7, And a irradiation section for irradiating ultraviolet rays to the substrate before the substrate is transferred to the spraying unit on the substrate transfer path. The method of claim 8, And the main regeneration unit includes a regeneration line for passing the washing water therein to the irradiation section. (a) recovering the washing water discharged from the first jetting part on the substrate transfer path; (b) regenerating the washing water recovered in step (a); (c) supplying the washing water regenerated in step (b) to the final jetting part on the substrate transfer path; And and (d) circulating and supplying the washing water supplied to the final spraying unit in step (c) to the first spraying unit. The method of claim 10, Washing water supply method characterized in that for measuring the specific resistance value of the washing water recovered in the step (b) and the measured value is measured to be less than the reference value supplemented with the washing water of ultra-pure. The method according to claim 10 or 11, wherein Washing water supply method characterized in that for measuring the specific resistance value to determine whether or not abnormality of the regeneration water is completed in step (b).

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