KR20060135457A - Gas processing system - Google Patents

Gas processing system Download PDF

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Publication number
KR20060135457A
KR20060135457A KR1020050055424A KR20050055424A KR20060135457A KR 20060135457 A KR20060135457 A KR 20060135457A KR 1020050055424 A KR1020050055424 A KR 1020050055424A KR 20050055424 A KR20050055424 A KR 20050055424A KR 20060135457 A KR20060135457 A KR 20060135457A
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South Korea
Prior art keywords
valve
gas
gas supply
connection
line
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KR1020050055424A
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Korean (ko)
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박동하
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삼성전자주식회사
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Publication of KR20060135457A publication Critical patent/KR20060135457A/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16L—PIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
    • F16L55/00—Devices or appurtenances for use in, or in connection with, pipes or pipe systems
    • F16L55/07—Arrangement or mounting of devices, e.g. valves, for venting or aerating or draining
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Pipeline Systems (AREA)

Abstract

A gas feed system having a reinforced connecting portion is provided to prevent a tube of valve from bursting out at a week connecting portion by installing a fitting onto a threaded portion of a valve. A gas feed system includes a gas feed unit(110) and a connection(120). The gas feed unit has a gas line(111) supplying gas and a fitting(113) installed in the gas line. The connection has a connecting line(125) connected to manufacturing equipment and a valve(127) installed to one end of the connecting line and having a threaded portion(129). The valve is a solenoid valve or an air valve.

Description

밸브 연결부위가 강화된 가스공급 시스템{GAS PROCESSING SYSTEM}Gas supply system with reinforced valve connection {GAS PROCESSING SYSTEM}

도 1은 종래의 반도체장치 제조설비의 가스 공급시스템의 구성을 개략적으로 나타낸 구성도, 1 is a schematic view showing the configuration of a gas supply system of a conventional semiconductor device manufacturing facility;

도 2a 및 도2b는 종래의 밸브 연결라인 및 밸브의 연결부위를 간략히 나타낸 도면, Figure 2a and 2b is a simplified view showing the connection portion of the conventional valve connection line and valve,

도 3a 및 도3b는 본 발명의 일 실시예에 따른 밸브 연결부위가 강화된 가스공급 시스템의 구성도이다.3A and 3B are schematic diagrams of a gas supply system in which a valve connection portion is strengthened according to an embodiment of the present invention.

<도면의 주요부분에 대한 부호설명> <Code Description of Main Parts of Drawing>

110: 가스공급부 11, 111:가스라인110: gas supply unit 11, 111: gas line

113: 피팅 120: 연결부113: fitting 120: connection

15, 125: 연결라인 13, 127: 밸브15, 125: connection line 13, 127: valve

129: 나사산129: thread

본 발명은 반도체장치 제조설비의 가스공급 시스템에 관한 것으로써, 보다 상세하게는 반도체장치 제조공정에 소요되는 공정가스의 공급 중 가스 압력이 강하여 연결 부위가 약한 밸브의 튜브가 터지는 등의 문제를 방지함으로서, 계속적으로 가스 공급이 이루어지도록 하여 공정설비의 가동 중단을 방지하여 그 효율을 높이도록 하는 밸브 연결부위가 강화된 가스공급 시스템에 관한 것이다.The present invention relates to a gas supply system of a semiconductor device manufacturing facility, and more particularly, to prevent problems such as bursting of a tube of a valve having a weak connection part due to a high gas pressure during supply of process gas required for a semiconductor device manufacturing process. As a result, the present invention relates to a gas supply system with an enhanced valve connection portion that prevents downtime of the process equipment and increases its efficiency by continuously supplying gas.

일반적으로 반도체장치는, 웨이퍼 상에 사진, 식각, 확산, 금속증착 등의 공정을 선택적이고도 반복적으로 수행하게 됨으로써 이루어지고, 이들 각 공정 중 식각, 확산, 금속증착 등의 공정은 소정 분위기 하의 웨이퍼 상에 요구되는 공정가스를 공급하여 반응토록 하는 공정이다.In general, a semiconductor device is formed by selectively and repeatedly performing a process such as photographing, etching, diffusion, and metal deposition on a wafer, and among these processes, processes such as etching, diffusion, and metal deposition are performed on a wafer under a predetermined atmosphere. It is a process to supply the process gas required for the reaction.

이러한 공정을 수행하는 제조설비에는 상술한 공정가스를 선택적이고도 안정적으로 공급하도록 하는 가스 공급시스템이 설치되며, 이러한 가스 공급시스템의 종래 기술에 대하여 첨부된 도면을 참조하여 설명하기로 한다.A manufacturing system for performing such a process is provided with a gas supply system for selectively and stably supplying the above-described process gas, and the prior art of such a gas supply system will be described with reference to the accompanying drawings.

도 1에 도시된 가스 공급시스템의 구성은, 소정량의 공정가스를 수용하는 적어도 두 개 이상의 바틀(10a, 10b)이 선택적으로 교체 가능하게 설치되고, 이들 바틀(10a, 10b)의 일측 부위에는 바틀(10a, 10b)에서 제조설비(도면의 단순화를 위하여 생략함)로 공정가스가 유동하도록 통로를 이루는 가스공급관(12a, 12b)이 각각 연통하여 연결된다. 또한, 상술한 각각의 바틀(10a, 10b)로부터 분리되어 연장 형성된 각 가스공급관(12a, 12b)은 제조설비와 연결되는 부위에서 하나의 통로를 이루도록 합체 형성되고, 이렇게 합체되는 부위 이전의 각 가스공급관(12a, 12b) 상에는, 도 1에 도시된 바와 같이, 가스공급관(12a, 12b)을 따라 유동하는 가스의 흐름을 콘트롤러(도면의 단순화를 위하여 생략함)로부터 인가되는 개폐 제어신호에 따라 선택적으로 차단하게 되는 복수의 밸브수단(14a, 14b, 14c, 14d)이 설치된다.In the configuration of the gas supply system shown in FIG. 1, at least two or more bottles 10a and 10b for accommodating a predetermined amount of process gas are selectively installed in a replaceable manner, and at one side of the bottles 10a and 10b. Gas supply pipes 12a and 12b constituting a passage to flow the process gas from the bottles 10a and 10b to the manufacturing equipment (not shown for simplicity of the drawing) are connected in communication with each other. In addition, each of the gas supply pipes 12a and 12b formed to be separated and extended from the respective bottles 10a and 10b described above is coalesced to form one passage at a portion connected to the manufacturing facility, and thus each gas before the coalesced portion is formed. On the supply pipes 12a and 12b, as shown in FIG. 1, the flow of gas flowing along the gas supply pipes 12a and 12b is selectively selected according to the opening / closing control signal applied from the controller (omitted for simplification of the drawing). A plurality of valve means (14a, 14b, 14c, 14d) are blocked to be installed.

여기서 상술한 각 밸브수단(14a, 14b, 14c, 14d) 중 바틀(10a, 10b)과 제조설비 사이의 각 가스공급관(12a, 12b) 소정 구간을 선택적으로 구획토록 하는 제 1 밸브수단(14a)과 제 2 밸브수단(14b)이 구분 설치되고, 이들 제 1, 2 밸브수단(14a, 14b) 사이의 가스공급관(12a, 12b) 상에는 유동하는 공정가스의 유동량을 측정하여 그 신호를 콘트롤러에 인가하도록 형성된 레귤레이터(16a, 16b)가 연통하여 설치되고, 또 이 레귤레이터(16a, 16b)를 중심으로 한 양측 가스공급관(12a, 12b) 상에는 내부의 압력 상태를 감지하여 그 신호를 콘트롤러에 인가하도록 하는 압력센서(18a, 18b)가 각각 연통하여 설치된다. 한편, 상술한 각 바틀(10a, 10b)로부터 제 1 밸브수단(14a)으로 이어지는 가스공급관(12a, 12b)의 일측 부위는 분기되어 외부로부터의 퍼지가스 공급라인(20a, 20b)과 연통하게 연결되고, 이렇게 연결되는 부위의 퍼지가스 공급라인(20a, 20b) 상에는, 상술한 바와 같이, 콘트롤러에 의해 제어되는 제 3 밸브수단(14c)이 설치된다. 그리고, 상술한 레귤레이터(16a, 16b)에서 제조설비 측으로 이어지는 가스공급관(12a, 12b) 일측 부위는 다시 분기되어 외부의 배기덕트(도면의 단순화를 위하여 생략함)로 이어지는 배출라인(22a, 22b)과 연통하게 연결되며, 이렇게 연결되는 부위의 배출라인(22a, 22b) 상에는 역시 콘트롤러에 의해 제어되는 제 4 밸브수단(14d)이 설치된 구성을 이룬다.The first valve means (14a) for selectively partitioning a predetermined section of each of the gas supply pipes (12a, 12b) between the bottle (10a, 10b) and the manufacturing facility among the valve means (14a, 14b, 14c, 14d) described above. And second valve means 14b are separately provided, and the flow rate of the process gas flowing on the gas supply pipes 12a and 12b between the first and second valve means 14a and 14b is measured and the signal is applied to the controller. The regulators 16a and 16b are formed in communication with each other, and on both gas supply pipes 12a and 12b centered on the regulators 16a and 16b, the internal pressure is sensed and the signal is applied to the controller. Pressure sensors 18a and 18b are provided in communication with each other. On the other hand, one side of the gas supply pipes (12a, 12b) leading from the above-described bottle (10a, 10b) to the first valve means (14a) is branched and connected in communication with the purge gas supply lines (20a, 20b) from the outside As described above, the third valve means 14c controlled by the controller is provided on the purge gas supply lines 20a and 20b of the portions thus connected. In addition, one side of the gas supply pipes 12a and 12b leading to the manufacturing equipment side from the above-described regulators 16a and 16b is branched again to discharge lines 22a and 22b leading to an external exhaust duct (omitted for simplification of the drawing). The fourth valve means 14d, which is also controlled by the controller, is installed on the discharge lines 22a and 22b of the portions connected to each other.

상술한 구성에 있어서, 각 밸브수단(14a, 14b, 14c, 14d)에는 복수의 연결라인(24a, 24b, 24c, 24d)이 각각 대응 연결되는 에어밸브 또는 솔레노이드밸브로 구 성되고, 여기서, 상술한 각 연결라인(24a, 24b, 24c, 24d)은, 각 밸브수단(14a, 14b, 14c, 14d)이 에어밸브일 경우 콘트롤러의 개폐 제어신호에 따라 각 연결라인(24a, 24b, 24c, 24d)을 통해 유체가 공급되는 유무에 의해 개폐되고, 또 솔레노이드밸브일 경우에는 콘트롤러의 개폐 제어신호에 따른 각 연결라인(24a, 24b, 24c, 24d)을 통해 전원의 인가 여부에 의해 개폐 구동하게 구성된다.In the above-described configuration, each of the valve means 14a, 14b, 14c, 14d comprises an air valve or a solenoid valve to which a plurality of connection lines 24a, 24b, 24c, 24d are respectively connected. Each connection line 24a, 24b, 24c, 24d is connected to each connection line 24a, 24b, 24c, 24d according to the open / close control signal of the controller when the valve means 14a, 14b, 14c, 14d are air valves. Open and close by the presence of fluid supply through the), and in the case of the solenoid valve is configured to open and close the drive by whether power is applied through each connection line (24a, 24b, 24c, 24d) according to the open and close control signal of the controller do.

그러나, 도2a 및 도2b를 참조하면, 공급 가스 압력이 높은 경우에는 가스라인(11)과 밸브(13)가 분리되어, 경우 정상적인 공정가스의 공급이 어려워지게 되어 공정 불량이 초래되고, 웨이퍼 손상이 발생할뿐만 아니라, 제조설비의 가동을 중단하게 됨에 따라 설비의 가동 효율이 저하되는 등의 문제가 있게 된다.However, referring to FIGS. 2A and 2B, when the supply gas pressure is high, the gas line 11 and the valve 13 are separated, and in this case, supply of normal process gas becomes difficult, resulting in process failure, and wafer damage. In addition to the occurrence of this, there is a problem that the operation efficiency of the facility is lowered as the operation of the manufacturing facility is stopped.

따라서, 본 발명은 이와 같은 문제점을 감안한 것으로써, 본 발명의 목적은 공급 가스 압력이 강한 경우에도 연결 부위가 약한 밸브의 튜브가 터지는 것을 방지함으로서, 계속적으로 가스 공급이 이루어지도록 하여 공정설비의 가동 중단을 방지하여 그 효율을 높이도록 하는 밸브 연결부위가 강화된 가스 공급시스템을 제공함에 있다. Accordingly, the present invention has been made in view of such a problem, and an object of the present invention is to prevent gas from being blown through a tube of a valve having a weak connection part even when the supply gas pressure is high, so that the gas can be continuously supplied to the process equipment. It is to provide a gas supply system with an enhanced valve connection to prevent the interruption to increase the efficiency.

가스공급부 및 연결부로 구성된 가스공급 사스템에 있어서, In the gas supply system consisting of a gas supply and a connection,

상기 가스 공급부는 가스를 공급하는 가스라인과 상기 가스라인 상에 형성된 피팅을 포함하고,The gas supply unit includes a gas line for supplying gas and a fitting formed on the gas line,

상기 연결부는 그 일측이 제조설비에 연결되는 연결라인 및 상기 연결라인의 타측에 설치된 나사산이 형성된 밸브를 포함하는 것을 특징으로 하는 밸브 연결부위가 강화된 가스공급 시스템.The connection part is a gas supply system with a reinforced valve connection portion, characterized in that one side of the connection line is connected to the manufacturing facility and the threaded valve installed on the other side of the connection line.

상기 밸브는 솔레노이드 밸브 또는 에어밸브인 것을 특징으로 한다. The valve is characterized in that the solenoid valve or air valve.

이하, 첨부된 도면을 참조하여 본 발명에 따른 웨이퍼 이송 장치에 대해 상세하게 설명한다.Hereinafter, a wafer transfer apparatus according to the present invention will be described in detail with reference to the accompanying drawings.

도 3a 및 도3b는 본 발명의 일 실시예에 따른 밸브 연결부위가 강화된 가스공급 시스템의 구성도이다.3A and 3B are schematic diagrams of a gas supply system in which a valve connection portion is strengthened according to an embodiment of the present invention.

도3a를 참조하면, 본 발명에 따른 밸브(127) 연결부위가 강화된 가스공급 시스템(100)은 가스공급부(110) 및 연결부(120)로 구성되며, 상기 가스 공급부는 가스를 공급하는 가스라인(111)과 상기 가스라인(111) 상에 설치된 피팅(113)으로 구성된다. Referring to FIG. 3A, a gas supply system 100 having an enhanced connection portion of a valve 127 according to the present invention includes a gas supply unit 110 and a connection unit 120, and the gas supply unit supplies a gas line to supply gas. And a fitting 113 installed on the gas line 111.

상기 연결부(120)는 그 일측이 제조설비에 연결되는 연결라인(125) 및 상기 연결라인(125)의 타측에 설치된 나사산(129)이 형성된 밸브(127)를 포함하여 구성된다. The connection part 120 includes a connection line 125 having one side connected to a manufacturing facility and a valve 127 having a thread 129 installed at the other side of the connection line 125.

즉, 본 발명에 따른 밸브 연결부위가 강화된 가스공급 시스템(100)은 밸브(127)에 나사산(129)을 형성하고 가스라인(111) 상에 피팅(113)을 설치하여 상기 가스라인(111)과 연결라인(125)이 강하게 결합되도록 함으로서, 제조 설비에 공급되는 가스의 압력이 강한 경우에도 가스라인(111)과 밸브(127)가 분리되지 않도록 하는 것이다(도3b참조). That is, the gas supply system 100 having a reinforced valve connection portion according to the present invention forms a thread 129 on the valve 127 and installs a fitting 113 on the gas line 111 to install the gas line 111. ) And the connection line 125 is strongly coupled, so that the gas line 111 and the valve 127 are not separated even when the pressure of the gas supplied to the manufacturing facility is strong (see FIG. 3B).

이때, 상기 밸브(127)는 에어밸브나 솔레노이드 밸브로 구성된다. At this time, the valve 127 is composed of an air valve or a solenoid valve.

본 발명에 따른 본 발명에 따른 밸브 연결부위가 강화된 가스공급 시스템(100)은, 밸브 연결부위가 있는 종래의 모든 반도체 제조 설비에서 사용할 수 있음은 물론이다. Gas supply system 100 with a reinforced valve connection according to the present invention according to the present invention, of course, can be used in all conventional semiconductor manufacturing equipment having a valve connection.

본 발명은 상기 실시예에 한정되지 않으며 당분야에서의 통상의 지식을 가진자에 의하여 본 발명의 기술적 사상내에서 많은 변형에 의한 실시가능함은 명백하다. It is apparent that the present invention is not limited to the above embodiments and can be implemented by many modifications within the technical idea of the present invention by those skilled in the art.

이와 같이 본 발명에 의한 밸브 연결부위가 강화된 가스공급 시스템에 따르면, 밸브에 나사산(129)을 형성하고 가스라인 상에 피팅(113)을 설치함으로서, 공급 가스 압력이 강한 경우에도 연결 부위가 약한 밸브의 튜브가 터지는 것을 방지하여 계속적으로 가스 공급이 이루어지도록 하여 공정설비의 가동 중단을 방지하여 그 효율을 높일 수 있다. As described above, according to the gas supply system in which the valve connection part is strengthened, the thread 129 is formed in the valve and the fitting 113 is installed on the gas line, so that the connection part is weak even when the supply gas pressure is strong. The tube of the valve can be prevented from bursting so that the gas can be continuously supplied, thereby preventing the downtime of the process equipment and improving the efficiency thereof.

Claims (2)

가스공급부 및 연결부로 구성된 가스공급 사스템에 있어서, In the gas supply system consisting of a gas supply and a connection, 상기 가스 공급부는 가스를 공급하는 가스라인과 상기 가스라인 상에 형성된 피팅을 포함하고,The gas supply unit includes a gas line for supplying gas and a fitting formed on the gas line, 상기 연결부는 그 일측이 제조설비에 연결되는 연결라인 및 상기 연결라인의 타측에 설치된 나사산이 형성된 밸브를 포함하는 것을 특징으로 하는 밸브 연결부위가 강화된 가스공급 시스템.The connection part is a gas supply system with a reinforced valve connection portion, characterized in that one side of the connection line is connected to the manufacturing facility and the threaded valve installed on the other side of the connection line. 제1항에 있어서, The method of claim 1, 상기 밸브는 솔레노이드 밸브 또는 에어밸브인 것을 특징으로 하는 밸브 연결부위가 강화된 가스공급 시스템.And the valve is a solenoid valve or an air valve.
KR1020050055424A 2005-06-25 2005-06-25 Gas processing system KR20060135457A (en)

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