CN107795546B - Fluid supply device for glass synthesis - Google Patents
Fluid supply device for glass synthesis Download PDFInfo
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- CN107795546B CN107795546B CN201710756151.3A CN201710756151A CN107795546B CN 107795546 B CN107795546 B CN 107795546B CN 201710756151 A CN201710756151 A CN 201710756151A CN 107795546 B CN107795546 B CN 107795546B
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- Prior art keywords
- air
- supply line
- purge gas
- line
- fluid supply
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- 239000012530 fluid Substances 0.000 title claims abstract description 118
- 239000011521 glass Substances 0.000 title claims abstract description 65
- 230000015572 biosynthetic process Effects 0.000 title claims abstract description 50
- 238000003786 synthesis reaction Methods 0.000 title claims abstract description 50
- 238000006243 chemical reaction Methods 0.000 claims abstract description 46
- 238000011144 upstream manufacturing Methods 0.000 claims abstract description 41
- 238000010926 purge Methods 0.000 claims description 111
- 230000002159 abnormal effect Effects 0.000 abstract description 9
- 230000006866 deterioration Effects 0.000 abstract description 5
- 239000007789 gas Substances 0.000 description 132
- 230000005856 abnormality Effects 0.000 description 10
- 230000003247 decreasing effect Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011859 microparticle Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- 229910006113 GeCl4 Inorganic materials 0.000 description 1
- 229910003910 SiCl4 Inorganic materials 0.000 description 1
- 229910004014 SiF4 Inorganic materials 0.000 description 1
- 229910003074 TiCl4 Inorganic materials 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000001784 detoxification Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002737 fuel gas Substances 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- RLOWWWKZYUNIDI-UHFFFAOYSA-N phosphinic chloride Chemical compound ClP=O RLOWWWKZYUNIDI-UHFFFAOYSA-N 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
Images
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15B—SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL; FLUID-PRESSURE ACTUATORS, e.g. SERVOMOTORS; DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
- F15B20/00—Safety arrangements for fluid actuator systems; Applications of safety devices in fluid actuator systems; Emergency measures for fluid actuator systems
- F15B20/002—Electrical failure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15B—SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL; FLUID-PRESSURE ACTUATORS, e.g. SERVOMOTORS; DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
- F15B13/00—Details of servomotor systems ; Valves for servomotor systems
- F15B13/02—Fluid distribution or supply devices characterised by their adaptation to the control of servomotors
- F15B13/021—Valves for interconnecting the fluid chambers of an actuator
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15B—SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL; FLUID-PRESSURE ACTUATORS, e.g. SERVOMOTORS; DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
- F15B20/00—Safety arrangements for fluid actuator systems; Applications of safety devices in fluid actuator systems; Emergency measures for fluid actuator systems
- F15B20/004—Fluid pressure supply failure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15B—SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL; FLUID-PRESSURE ACTUATORS, e.g. SERVOMOTORS; DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
- F15B21/00—Common features of fluid actuator systems; Fluid-pressure actuator systems or details thereof, not covered by any other group of this subclass
- F15B21/08—Servomotor systems incorporating electrically operated control means
- F15B21/087—Control strategy, e.g. with block diagram
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Vapour Deposition (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Abstract
Provided is a fluid supply device for glass synthesis, which can restrain the deterioration of a pipe or a flow control device even when the air pressure for operating an air type operation valve is lower than an appropriate range when power supply is recovered from an abnormal state such as power failure. The reactor is provided with a corrosive fluid supply line (L1) for supplying a corrosive fluid to a reaction vessel (11) and an MFC (15) provided in the corrosive fluid supply line (L1), wherein air-type operation valves (17a, 17c) operated by solenoid valves (16a, 16c) are provided in the corrosive fluid supply line (L1) on the upstream side of the MFC (15) and the corrosive fluid supply line (L1) on the downstream side of the MFC (15) in the path of the corrosive fluid flowing through the MFC (15), respectively, the air-type operation valves (17a, 17c) are all of a normally closed type, and the operating pressure of the air-type operation valve (17c) provided on the downstream side of the MFC (15) is higher than the operating pressure of the air-type operation valve (17a) provided on the upstream side of the MFC (15).
Description
Technical Field
The present invention relates to a fluid supply device for glass synthesis.
Background
A glass synthesis fluid supply device is known which supplies a corrosive fluid and a purge gas used in synthesizing glass to a glass synthesis device (for example, see patent document 1).
Patent document 1: japanese patent laid-open No. 2014-131946
For example, in a fluid supply device for glass synthesis described in patent document 1, an air-operated valve is provided in a path for supplying a corrosive fluid and a purge gas used in synthesizing glass to the glass synthesis device. The air-operated valve opens and closes in accordance with the supplied air pressure, and opens when the air pressure is greater than or equal to the working pressure, and closes when the air pressure is less than the working pressure. The air-operated valve is of a normally closed type (if no air pressure is applied, the closed state is maintained).
In addition, in the case where the supplied air pressure and the operating pressure are substantially equal to each other, there is a possibility that only some of the plurality of air-operated valves will be in the open state due to individual differences of the air-operated valves.
Therefore, when the supplied air pressure is in a low state, some of the normally closed air-operated valves may not be opened. For example, if the air-operated valve provided downstream of the flow rate control device is opened and the air-operated valve provided upstream of the flow rate control device is closed, the gas in the reaction vessel and the abatement device may flow back to the upstream side of the pipe and diffuse.
On the other hand, the supply of air pressure to the air-operated valve is controlled by opening and closing an electromagnetic valve provided in the air pressure supply path. The opening and closing of the solenoid valve is electrically controlled, and there are a normally closed type in which a closed state is maintained and a normally open type in which an open state is maintained when power is not supplied, such as in the event of a power failure.
In general, in a fluid supply device for glass synthesis, normally closed type and normally open type are appropriately arranged with respect to electromagnetic valves provided in respective paths for controlling air-operated valves, and when power supply is cut off due to an abnormality such as a power failure, purge gas is caused to flow through piping before and after a flow rate control device and the flow rate control device. However, when the power supply is returned from an abnormal state such as a power failure, the air pressure for operating the air-operated valve may fall below the appropriate range, and in this case, as described above, for example, a phenomenon such as backflow or diffusion of the gas in the reaction vessel or the abatement device to the upstream side of the piping may occur, and the deterioration prevention of the piping or the flow rate control device may become insufficient.
Disclosure of Invention
The invention aims to provide a fluid supply device for glass synthesis, which can inhibit the deterioration of a pipe or a flow control device even if the air pressure for operating an air-operated valve is lower than an appropriate range when power supply is recovered from abnormal conditions such as power failure.
A fluid supply device for glass synthesis according to an aspect of the present invention includes:
a corrosive fluid supply line which supplies a corrosive fluid to the reaction vessel; and
a flow control device provided to the corrosive fluid supply line,
an air-type operation valve operated by an electromagnetic valve is provided in each of the corrosive fluid supply line on the upstream side of the flow rate control device and the corrosive fluid supply line on the downstream side of the flow rate control device in the path of the corrosive fluid flowing through the flow rate control device,
the air-operated valves are all of the normally closed type,
the air-operated valve disposed on the downstream side of the flow rate control device has a higher operating pressure than the air-operated valve disposed on the upstream side of the flow rate control device.
In addition, a fluid supply device for glass synthesis according to an aspect of the present invention includes:
a purge gas supply line for supplying a purge gas to the reaction vessel; and
a flow rate control device provided to the purge gas supply line,
an air-operated valve operated by an electromagnetic valve is provided in each of the purge gas supply line on the upstream side of the flow rate control device and the purge gas supply line on the downstream side of the flow rate control device in the path of the purge gas flowing through the flow rate control device,
the air-operated valves are all of the normally closed type,
the air-operated valve disposed on the downstream side of the flow rate control device has a higher operating pressure than the air-operated valve disposed on the upstream side of the flow rate control device.
In addition, a fluid supply device for glass synthesis according to an aspect of the present invention includes:
a corrosive fluid supply line which supplies a corrosive fluid;
a purge gas supply line which supplies a purge gas;
a bus line that is formed by the purge gas supply line and the corrosive fluid supply line;
a flow rate control device provided to the bus line;
a reaction vessel line branching from the bus line on a downstream side of the flow rate control device and leading to a reaction vessel; and
an exhaust gas line branching from the bus line on a downstream side of the flow rate control device toward a detoxifying device,
air-operated valves operated by electromagnetic valves are provided in the corrosive fluid supply line, the purge gas supply line, the reaction vessel line, and the exhaust gas line, respectively,
the solenoid valve for the air-operated valve provided in the purge gas supply line and the solenoid valve for the air-operated valve provided in the exhaust gas line are normally open,
the solenoid valve for the air-operated valve provided in the corrosive fluid supply line and the solenoid valve for the air-operated valve provided in the reaction vessel line are normally closed,
the air-operated valve provided in the reaction vessel line has a higher operating pressure than that of the air-operated valve provided in the corrosive fluid supply line,
the air-operated valve provided in the exhaust gas line has a higher operating pressure than an operating pressure of the air-operated valve provided in the purge gas supply line.
ADVANTAGEOUS EFFECTS OF INVENTION
According to the above invention, even when the air pressure for operating the air-operated valve is lower than the appropriate range, such as when the power supply is returned from an abnormal state such as a power failure, deterioration of the piping or the flow rate control device can be suppressed.
Drawings
Fig. 1 is a block diagram showing a schematic configuration of a fluid supply apparatus for glass synthesis according to the present embodiment.
Description of the reference numerals
1 fluid supply device 11 for glass synthesis reactor 12 harming device 13 corrosive fluid supply unit 14 purge gas supply unit 15 flow control devices (MFCs) 16a to 16d solenoid valves 17a to 17d air operated valve 18 flow throttle valve L1 corrosive fluid supply line L2 purge gas supply line L3 bus L4 reactor line L5 exhaust gas line
Detailed Description
(description of embodiments of the invention)
First, embodiments of the present invention will be described.
A fluid supply device for glass synthesis according to one embodiment of the present invention,
(1) it has the following components:
a corrosive fluid supply line which supplies a corrosive fluid to the reaction vessel; and
a flow control device provided to the corrosive fluid supply line,
an air-type operation valve operated by an electromagnetic valve is provided in each of the corrosive fluid supply line on the upstream side of the flow rate control device and the corrosive fluid supply line on the downstream side of the flow rate control device in the path of the corrosive fluid flowing through the flow rate control device,
the air-operated valves are all of the normally closed type,
the air-operated valve disposed on the downstream side of the flow rate control device has a higher operating pressure than the air-operated valve disposed on the upstream side of the flow rate control device.
According to the above configuration, since the air-operated valve provided on the downstream side of the flow rate control device has the operating pressure higher than the operating pressure of the air-operated valve provided on the upstream side of the flow rate control device, when the air pressure for operating the air-operated valve is gradually increased from a state lower than the appropriate range, the air-operated valve on the upstream side is opened first, and the air-operated valve on the downstream side is opened later. This prevents the gas in the reaction vessel from flowing back to the upstream side of the pipe and diffusing when the air pressure for operating the air-operated valve is lower than the appropriate range, such as when power is returned from an abnormal state such as a power failure.
Further, a fluid supply apparatus for glass synthesis according to an embodiment of the present invention,
(2) it has the following components:
a purge gas supply line for supplying a purge gas to the reaction vessel; and
a flow rate control device provided to the purge gas supply line,
an air-operated valve operated by an electromagnetic valve is provided in each of the purge gas supply line on the upstream side of the flow rate control device and the purge gas supply line on the downstream side of the flow rate control device in the path of the purge gas flowing through the flow rate control device,
the air-operated valves are all of the normally closed type,
the air-operated valve disposed on the downstream side of the flow rate control device has a higher operating pressure than the air-operated valve disposed on the upstream side of the flow rate control device.
According to the above configuration, since the air-operated valve provided on the downstream side of the flow rate control device has the operating pressure higher than the operating pressure of the air-operated valve provided on the upstream side of the flow rate control device, when the air pressure for operating the air-operated valve is gradually increased from a state lower than the appropriate range, the air-operated valve on the upstream side is opened first, and the air-operated valve on the downstream side is opened later. This prevents the gas in the reaction vessel from flowing back to the upstream side of the pipe and diffusing when the air pressure for operating the air-operated valve is lower than the appropriate range, such as when power is returned from an abnormal state such as a power failure.
Further, a fluid supply apparatus for glass synthesis according to an embodiment of the present invention,
(3) it has the following components:
a corrosive fluid supply line which supplies a corrosive fluid;
a purge gas supply line which supplies a purge gas;
a bus line that is formed by the purge gas supply line and the corrosive fluid supply line;
a flow rate control device provided to the bus line;
a reaction vessel line branching from the bus line on a downstream side of the flow rate control device and leading to a reaction vessel; and
an exhaust gas line branching from the bus line on a downstream side of the flow rate control device toward a detoxifying device,
air-operated valves operated by electromagnetic valves are provided in the corrosive fluid supply line, the purge gas supply line, the reaction vessel line, and the exhaust gas line, respectively,
the solenoid valve for the air-operated valve provided in the purge gas supply line and the solenoid valve for the air-operated valve provided in the exhaust gas line are normally open,
the solenoid valve for the air-operated valve provided in the corrosive fluid supply line and the solenoid valve for the air-operated valve provided in the reaction vessel line are normally closed,
the air-operated valve provided in the reaction vessel line has a higher operating pressure than that of the air-operated valve provided in the corrosive fluid supply line,
the air-operated valve provided in the exhaust gas line has a higher operating pressure than an operating pressure of the air-operated valve provided in the purge gas supply line.
According to the above configuration, since the air-operated valve provided on the downstream side of the flow rate control device has the operating pressure higher than the operating pressure of the air-operated valve provided on the upstream side of the flow rate control device, when the air pressure for operating the air-operated valve is gradually increased from a state lower than the appropriate range, the air-operated valve of the corrosive fluid supply line or the purge gas supply line is opened first, and the air-operated valve of the reaction vessel line or the vent gas line is opened later. This prevents the gas in the reaction vessel or the abatement device from flowing back to the upstream side of the pipe and diffusing when the air pressure for operating the air-operated valve is lower than the appropriate range, such as when power is returned from an abnormal state such as a power failure.
(4) Preferably, a flow rate throttle valve is provided in the purge gas supply line.
Since the flow rate throttle valve is provided in the purge gas supply line, the purge gas flow rate at the time of power failure can be suppressed. This can save the purge gas and suppress a decrease in purge pressure when the power supply is resumed.
(details of the embodiment of the present invention)
Next, a specific example of the fluid supply device for glass synthesis according to the embodiment of the present invention will be described with reference to the drawings.
The present invention is not limited to these examples, but is defined by the claims, and includes all modifications within the meaning and range equivalent to the claims.
Fig. 1 is a diagram showing an example of a fluid supply apparatus for glass synthesis.
The fluid supply apparatus 1 for glass synthesis shown in fig. 1 supplies a corrosive fluid used in glass synthesis to the reaction vessel 11. The fluid supply device 1 for glass synthesis discharges a corrosive fluid, which is not used in glass synthesis, to the detoxifying device 12.
In the reaction vessel 11, glass synthesis of a cylindrical glass base material for an optical fiber or the like is performed by, for example, OVD method or VAD method. In the case of the OVD method, in the reaction vesselThe initial glass rod is rotated while reciprocating in the axial direction in the glass rod 11, and a corrosive fluid to be a glass raw material supplied from a corrosive fluid supply part 13 is mixed with H2Iso fuel gas and O2And the combustion-supporting gas is jetted from the burner to the outer periphery thereof together. Then, glass microparticles are generated and deposited by flame hydrolysis reaction, and a cylindrical glass base material is synthesized as a glass microparticle deposit. In the detoxification device 12, a corrosive fluid that is not used in glass synthesis is purified. As the corrosive fluid, a raw material gas or liquid (POCl) for glass synthesis is used3、TiCl4、SiCl4、GeCl4Etc.), process gases or liquids (BCl)3、SF6、Cl2、SiF4、CF4Etc.).
The fluid supply device 1 for glass synthesis includes, as flow paths for supplying fluids: a corrosive fluid supply line L1 for supplying a corrosive fluid from the corrosive fluid supply unit 13 to the reaction vessel 11, and a purge gas supply line L2 for supplying a purge gas from the purge gas supply unit 14 to the reaction vessel 11. Further, the fluid supply device 1 for glass synthesis includes: a bus line L3 that merges the corrosive fluid supply line L1 and the purge gas supply line L2; a reaction vessel line L4 branched from the bus line L3 and directed to the reaction vessel 11; and an exhaust gas line L5 branched from the bus line L3 and directed to the detoxifying device 12.
An air-type operation valve 17a operated by the solenoid valve 16a is provided in the corrosive fluid supply line L1, and an air-type operation valve 17b operated by the solenoid valve 16b is provided in the purge gas supply line L2. Further, a flow rate throttle valve (for example, a needle valve or the like) 18 capable of controlling the flow rate of the purge gas passing therethrough is provided on the upstream side of the air-operated valve 17b in the purge gas supply line L2. The downstream side of the air-operated valve 17a of the corrosive fluid supply line L1 and the downstream side of the air-operated valve 17b of the purge gas supply line L2 merge together to form a merge line L3.
A Flow rate control device (for example, Mass Flow Controller: MFC)15 capable of controlling the Flow rate of a fluid passing therethrough is provided in the middle of the bus line L3 (corrosive fluid supply line L1 and purge gas supply line L2). Further, on the downstream side of MFC15 from bus line L3, reaction vessel line L4 and exhaust gas line L5 branch off from bus line L3.
An air-operated valve 17c operated by an electromagnetic valve 16c is provided in the reaction vessel line L4, and an air-operated valve 17d operated by an electromagnetic valve 16d is provided in the exhaust gas line L5. Further, the reaction vessel 11 is connected to the reaction vessel line L4 downstream of the air-operated valve 17c, and the abatement device 12 is connected to the exhaust gas line L5 downstream of the air-operated valve 17 d. Since the corrosive fluid flows through the reactor line L4, the reactor line L4 is also referred to as a corrosive fluid supply line on the downstream side of the MFC 15. Since the purge gas flows through the off-gas line L5, the off-gas line L5 is also referred to as a purge gas supply line on the downstream side of the MFC 15.
The air-operated valves 17a to 17d are valves that are opened and closed by the air pressure for driving. The solenoid valves 16a to 16d are valves that supply current to the coil of the solenoid to perform opening and closing operations. The solenoid valves 16a to 16d are controlled to open and close by a solenoid valve control unit, not shown. By turning on/off the solenoid valves 16a to 16d, the purge gas from the purge gas supply unit 14 acts on the air-type operation valves 17a to 17d as the air pressure for driving, and the air-type operation valves 17a to 17d are opened and closed by the air pressure. That is, the air-operated valves 17a to 17d provided in the respective flow paths (L1, L2, L4, and L5) are operated by controlling the driving solenoid valves 16a to 16d, and the respective flow paths (L1, L2, L4, and L5) can be opened or closed.
The air-type operation valve 17c provided in the reaction vessel line L4 on the downstream side of MFC15 is a valve having a higher operating pressure than the air-type operation valve 17a provided in the corrosive fluid supply line L1 on the upstream side of MFC 15. Further, the air-type operation valve 17d provided in the discharge gas line L5 on the downstream side of MFC15 is a valve having a higher operating pressure than the air-type operation valve 17b provided in the purge gas supply line L2 on the upstream side of MFC 15.
The air-operated valves 17a to 17d are of a normally closed type in which the flow path is closed when not operating. The solenoid valves 16a and 16c are normally closed type valves in which the flow path is closed when the solenoid is not operated, and the solenoid valves 16b and 16d are normally open type valves in which the flow path is open when the solenoid is not operated. MFC15 is of a normally open type in which a flow path is open during non-operation.
Next, the operation of the fluid supply apparatus 1 for glass synthesis will be described.
(when glass is synthesized)
In the glass synthesis, the fluid supply device 1 for glass synthesis is controlled such that the electromagnetic valve 16b is closed to close the air-type operation valve 17b, and the electromagnetic valve 16a is opened to open the air-type operation valve 17 a. Accordingly, on the upstream side of MFC15 of bus line L3, a corrosive fluid such as a glass raw material gas is supplied from corrosive fluid supply line L1 without supplying a purge gas from purge gas supply line L2. Then, the flow rate is appropriately controlled by MFC15, and the corrosive fluid is supplied to the downstream side of MFC 15.
Further, the control is performed such that the air-type operation valve 17d is closed by closing the electromagnetic valve 16d, and the air-type operation valve 17c is opened by opening the electromagnetic valve 16 c. Thus, the corrosive fluid is supplied to the reaction vessel 11 without supplying the corrosive fluid to the destruction device 12 from the downstream side of the MFC 15.
(when glass is not synthesized)
When glass is not synthesized, the fluid supply device 1 for glass synthesis is controlled such that the electromagnetic valve 16a is closed to close the air-operated valve 17a, and the electromagnetic valve 16b is opened to open the air-operated valve 17 b. Accordingly, on the upstream side of MFC15 of bus line L3, a corrosive fluid such as a glass raw material gas is not supplied from corrosive fluid supply line L1, and a purge gas is supplied from purge gas supply line L2. Then, the flow rate is appropriately controlled by MFC15, and a purge gas is supplied to the downstream side of MFC 15.
Then, the air-type operation valve 17c is closed by closing the electromagnetic valve 16c, and the air-type operation valve 17d is opened by opening the electromagnetic valve 16 d. Thus, the corrosive fluid remaining in the interior of MFC15 and in the lines before and after MFC15 is discharged to detoxifying device 12 through exhaust gas line L5 together with the purge gas.
Next, the operation of the fluid supply apparatus 1 for glass synthesis in the case where an abnormality such as a power failure occurs will be described by referring to an operation example.
(operation example 1)
When an abnormality such as a power failure occurs and the supply of power is interrupted, the fluid supply device 1 for glass synthesis operates as follows.
The solenoid valve 16a is normally closed, and therefore, is automatically maintained in a closed state by the interruption of the power supply. Therefore, the normally closed air-operated valve 17a is closed without applying the air pressure (purge gas) for driving. Since the solenoid valve 16b is normally open, it is automatically maintained in an open state by the interruption of the power supply. Therefore, the air-operated valve 17b is opened without applying the driving air pressure. Accordingly, on the upstream side of MFC15 of bus line L3, the corrosive fluid is not supplied from corrosive fluid supply line L1, and the purge gas is supplied from purge gas supply line L2.
MFC15 is normally open, and therefore automatically turns on when the power supply is turned off. Therefore, the purge gas on the upstream side of MFC15 is supplied to the downstream side of MFC 15. The solenoid valve 16c is normally closed, and therefore, is automatically maintained in a closed state by the interruption of the power supply. Therefore, the normally closed air-operated valve 17c is closed without being supplied with the driving air pressure. Since the solenoid valve 16d is normally open, it is automatically maintained in an open state by the interruption of the power supply. Therefore, the air-operated valve 17d is opened without applying the driving air pressure. Thus, the purge gas on the downstream side of MFC15 is supplied to hazard removal device 12 from exhaust gas line L5, without being supplied to reaction vessel 11. At this time, for example, the corrosive fluid remaining in the MFC15 and in the lines before and after the MFC15 is discharged to the detoxifying device 12 through the exhaust gas line L5 together with the purge gas.
When an abnormality such as a power failure occurs, MFC15 is fully opened because it is normally open, and the flow rate is throttled by flow throttle valve 18. This suppresses the flow rate of the purge gas supplied from the purge gas supply unit 14.
(operation example 2)
When an abnormality such as a power failure occurs and the air pressure for driving the air-operated valve (the pressure of the purge gas) is reduced, the glass-synthesizing fluid supply apparatus 1 operates as follows.
As described above, during a power outage, the air-type operation valve 17b and the air-type operation valve 17d are opened, and the purge gas supplied from the purge gas supply unit 14 flows to the hazard eliminator 12 through the purge gas supply line L2, the bus line L3, and the exhaust gas line L5.
In the above-described state, if the pressure of the purge gas is gradually decreased, the operation of the air-type operation valve 17d having a high operating pressure, out of the air-type operation valve 17b and the air-type operation valve 17d that are in the open state, is first changed. If the pressure of the purge gas is lower than the operating pressure of the air-operated valve 17d, the air-operated valve 17d is closed. At this time, air-operated valve 17b, which has a lower operating pressure than air-operated valve 17d, maintains the open state. When the pressure of the purge gas is further reduced to be lower than the operating pressure of the air-operated valve 17b, the air-operated valve 17b is closed. As described above, the downstream air-operated valve 17d is closed before the upstream air-operated valve 17 b.
(operation example 3)
When the power supply is resumed from an abnormal state such as a power failure, and an abnormality occurs in which the air pressure for driving the air-operated valve (the pressure of the purge gas) is reduced, the fluid supply apparatus 1 for glass synthesis operates as follows.
When the system is in the process of starting up immediately after the power supply is restored, the pressure of the purge gas may be unstable and may be reduced.
The glass-synthesizing fluid supply apparatus 1 is set to, for example, maintain the same state as the above-described operation example 1 when the power supply is resumed. That is, the air-operated valves 17b and 17d are set to the open state, and the purge gas flows to the hazard eliminator 12 through the purge gas supply line L2, the bus line L3, and the exhaust gas line L5.
Therefore, when the pressure of the purge gas is reduced at the time of returning the power supply, the downstream air-operated valve 17d is closed before the upstream air-operated valve 17b, as in the above-described operation example 2.
(operation example 4)
When an abnormality occurs in which the air pressure for driving the air-operated valve (the pressure of the purge gas) is reduced during glass synthesis, the glass synthesis fluid supply device 1 operates as follows.
In the glass synthesis, as described above, the air-operated valve 17b is closed, the air-operated valve 17a is opened, the air-operated valve 17d is closed, and the air-operated valve 17c is opened. Thereby, the corrosive fluid is supplied to the reaction vessel 11 through the reaction vessel line L4.
In the above-described state, if the pressure of the purge gas is gradually decreased, the air-type operation valve 17c having a high operating pressure among the air- type operation valves 17a and 17c that are in the open state is first in the closed state. Then, if the pressure of the purge gas is further decreased, the air-operated valve 17a having a lower operating pressure than the air-operated valve 17c is closed. As described above, the downstream air-operated valve 17c is closed before the upstream air-operated valve 17 a.
(operation example 5)
When an abnormality occurs in which the air pressure for driving the air-operated valve (the pressure of the purge gas) is reduced during non-glass synthesis, the glass synthesis fluid supply device 1 operates as follows.
When the glass is not synthesized, as described above, the control is performed such that the air-operated valve 17a is closed, the air-operated valve 17b is opened, the air-operated valve 17c is closed, and the air-operated valve 17d is opened. Thereby, the purge gas is supplied to the poisoning device 12 through the exhaust gas line L5.
In the above state, if the pressure of the purge gas is reduced, the air-operated valve 17d having a high operating pressure is first closed. Then, if the pressure of the purge gas is further gradually decreased, the air-operated valve 17b having a lower operating pressure than the air-operated valve 17d is closed. As described above, the downstream air-operated valve 17d is closed before the upstream air-operated valve 17 b.
(operation example 6)
In the above-described operation examples 2 to 5, when an abnormality occurs in which the air pressure for driving the air-type operation valve (the pressure of the purge gas) is lower than the operating pressure of the air-type operation valves 17a to 17d and then gradually increases, the glass-synthesizing fluid supply apparatus 1 operates as follows.
In the case of the operation examples 2, 3, and 5, of the air- type operation valves 17b and 17d in the closed state, the air-type operation valve 17b of the purge gas supply line L2 on the upstream side is first opened, and the air-type operation valve 17d of the exhaust gas line L5 on the downstream side is then opened. In operation example 4, of the air-operated valves 17a and 17c in the closed state, the air-operated valve 17a of the corrosive fluid supply line L1 on the upstream side is first opened, and the air-operated valve 17c of the reaction vessel line L4 on the downstream side is then opened.
As described above, according to the fluid supply device 1 for glass synthesis of the present embodiment, when the air pressure for driving (the pressure of the purge gas) for operating the air-operated valve is abnormal, for example, the pressure of the purge gas is gradually decreased, the air-operated valve on the downstream side is first closed, and the air-operated valve on the upstream side is thereafter closed. For example, when the pressure of the purge gas is gradually increased after being reduced to be lower than the operating pressure of the air-operated valve, the upstream air-operated valve is opened first, and the downstream air-operated valve is opened thereafter. Therefore, even when an abnormality occurs in which the pressure of the purge gas is reduced, for example, at the time of power failure, power restoration, glass synthesis, or glass non-synthesis, the gas can be prevented from flowing back from the reaction vessel 11 or the detoxifying device 12 to the upstream side of the piping and from diffusing. This can suppress deterioration of the piping or MFC 15.
In addition, at the time of power failure, since the MFC is fully opened, an excessive flow rate of purge gas flows. Therefore, if the power failure continues for a long time, the purge gas supply unit becomes short of gas and cannot perform the purge, which increases the gas loss and increases the cost. In addition, when the supply source of the purge gas is the same as the supply source of the drive gas for the air-operated valve, the drive of the air-operated valve cannot be performed due to the lack of the purge gas.
In contrast, according to the fluid supply device 1 for glass synthesis, since the flow rate throttle valve 18 is provided in the purge gas supply line L2, the flow rate of the purge gas supplied during a power failure can be suppressed by adjusting the flow rate throttle valve 18. This can save the purge gas and suppress a decrease in purge pressure when the power supply is resumed.
While the present invention has been described in detail and with reference to the specific embodiments, it will be apparent to one skilled in the art that various changes and modifications can be made therein without departing from the spirit and scope thereof. The number, position, shape, and the like of the components described above are not limited to those of the above embodiments, and may be changed to those suitable for carrying out the present invention.
Claims (5)
1. A fluid supply device for glass synthesis, comprising:
a corrosive fluid supply line which supplies a corrosive fluid to the reaction vessel; and
a flow control device provided to the corrosive fluid supply line,
an air-type operation valve operated by an electromagnetic valve is provided in each of the corrosive fluid supply line on the upstream side of the flow rate control device and the corrosive fluid supply line on the downstream side of the flow rate control device in the path of the corrosive fluid flowing through the flow rate control device,
the air-operated valves are all of the normally closed type,
the air-operated valve disposed on the downstream side of the flow rate control device has a higher operating pressure than the air-operated valve disposed on the upstream side of the flow rate control device.
2. A fluid supply device for glass synthesis, comprising:
a purge gas supply line for supplying a purge gas to the reaction vessel; and
a flow rate control device provided to the purge gas supply line,
an air-operated valve operated by an electromagnetic valve is provided in each of the purge gas supply line on the upstream side of the flow rate control device and the purge gas supply line on the downstream side of the flow rate control device in the path of the purge gas flowing through the flow rate control device,
the air-operated valves are all of the normally closed type,
the air-operated valve disposed on the downstream side of the flow rate control device has a higher operating pressure than the air-operated valve disposed on the upstream side of the flow rate control device.
3. The fluid supply apparatus for glass synthesis according to claim 2,
a flow throttle valve is provided in the purge gas supply line.
4. A fluid supply device for glass synthesis, comprising:
a corrosive fluid supply line which supplies a corrosive fluid;
a purge gas supply line which supplies a purge gas;
a bus line that is formed by the purge gas supply line and the corrosive fluid supply line;
a flow rate control device provided to the bus line;
a reaction vessel line branching from the bus line on a downstream side of the flow rate control device and leading to a reaction vessel; and
an exhaust gas line branching from the bus line on a downstream side of the flow rate control device toward a detoxifying device,
air-operated valves operated by electromagnetic valves are provided in the corrosive fluid supply line, the purge gas supply line, the reaction vessel line, and the exhaust gas line, respectively,
the solenoid valve for the air-operated valve provided in the purge gas supply line and the solenoid valve for the air-operated valve provided in the exhaust gas line are normally open,
the solenoid valve for the air-operated valve provided in the corrosive fluid supply line and the solenoid valve for the air-operated valve provided in the reaction vessel line are normally closed,
the air-operated valve provided in the reaction vessel line has a higher operating pressure than that of the air-operated valve provided in the corrosive fluid supply line,
the air-operated valve provided in the exhaust gas line has a higher operating pressure than an operating pressure of the air-operated valve provided in the purge gas supply line.
5. The fluid supply apparatus for glass synthesis according to claim 4,
a flow throttle valve is provided in the purge gas supply line.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016-172613 | 2016-09-05 | ||
| JP2016172613A JP6683077B2 (en) | 2016-09-05 | 2016-09-05 | Fluid supply device for glass synthesis |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107795546A CN107795546A (en) | 2018-03-13 |
| CN107795546B true CN107795546B (en) | 2020-09-15 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710756151.3A Expired - Fee Related CN107795546B (en) | 2016-09-05 | 2017-08-29 | Fluid supply device for glass synthesis |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6683077B2 (en) |
| CN (1) | CN107795546B (en) |
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| JPH09283504A (en) * | 1996-02-15 | 1997-10-31 | Fujikin:Kk | Feed of mixed gas, mixed gas feeding device and semiconductor manufacturing device provided with these |
| CN1501440A (en) * | 2002-11-15 | 2004-06-02 | ��ʽ���������Ƽ� | Semiconductor manufacturing apparatus enabling inspection of mass flow controller maintaining connection thereto |
| JP2009146939A (en) * | 2007-12-11 | 2009-07-02 | Taiyo Nippon Sanso Corp | Apparatus for manufacturing compound thin-film semiconductor, and device and method of supplying ammonia gas |
| CN102192400A (en) * | 2010-03-03 | 2011-09-21 | 中外炉工业株式会社 | High-pressure dry air supply system |
| JP2014131946A (en) * | 2013-01-04 | 2014-07-17 | Sumitomo Electric Ind Ltd | Fluid supply apparatus for synthesizing glass |
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|---|---|---|---|---|
| JPS61254242A (en) * | 1985-05-01 | 1986-11-12 | Sumitomo Electric Ind Ltd | Apparatus for supplying stock material |
| JPS6340739A (en) * | 1986-08-06 | 1988-02-22 | Sumitomo Electric Ind Ltd | Method and apparatus for calibrating mass flow rate controller |
| JPS6483665A (en) * | 1987-09-25 | 1989-03-29 | Furukawa Electric Co Ltd | Liquid raw material evaporating device |
| JP3515894B2 (en) * | 1997-12-16 | 2004-04-05 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
| JP2003212554A (en) * | 2002-01-24 | 2003-07-30 | Sumitomo Electric Ind Ltd | Method and apparatus for manufacturing fine glass particle deposit |
| JP2003277072A (en) * | 2002-03-25 | 2003-10-02 | Sumitomo Electric Ind Ltd | Cycle purge method for flow controller |
| JP2009102207A (en) * | 2007-10-25 | 2009-05-14 | Sumitomo Electric Ind Ltd | Method and apparatus for manufacturing fine glass particle deposit |
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- 2016-09-05 JP JP2016172613A patent/JP6683077B2/en not_active Expired - Fee Related
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09283504A (en) * | 1996-02-15 | 1997-10-31 | Fujikin:Kk | Feed of mixed gas, mixed gas feeding device and semiconductor manufacturing device provided with these |
| CN1501440A (en) * | 2002-11-15 | 2004-06-02 | ��ʽ���������Ƽ� | Semiconductor manufacturing apparatus enabling inspection of mass flow controller maintaining connection thereto |
| JP2009146939A (en) * | 2007-12-11 | 2009-07-02 | Taiyo Nippon Sanso Corp | Apparatus for manufacturing compound thin-film semiconductor, and device and method of supplying ammonia gas |
| CN102192400A (en) * | 2010-03-03 | 2011-09-21 | 中外炉工业株式会社 | High-pressure dry air supply system |
| JP2014131946A (en) * | 2013-01-04 | 2014-07-17 | Sumitomo Electric Ind Ltd | Fluid supply apparatus for synthesizing glass |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107795546A (en) | 2018-03-13 |
| JP6683077B2 (en) | 2020-04-15 |
| JP2018039679A (en) | 2018-03-15 |
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