KR20060124100A - 연성 인쇄회로기판 제조용 양면 노광장치 - Google Patents
연성 인쇄회로기판 제조용 양면 노광장치 Download PDFInfo
- Publication number
- KR20060124100A KR20060124100A KR1020050045858A KR20050045858A KR20060124100A KR 20060124100 A KR20060124100 A KR 20060124100A KR 1020050045858 A KR1020050045858 A KR 1020050045858A KR 20050045858 A KR20050045858 A KR 20050045858A KR 20060124100 A KR20060124100 A KR 20060124100A
- Authority
- KR
- South Korea
- Prior art keywords
- copper foil
- exposure
- foil film
- exposing
- film
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/43—Arrangements comprising a plurality of opto-electronic elements and associated optical interconnections
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
Description
Claims (4)
- 공급롤에서 공급되어 내부를 통과하는 동박 필름의 상부면을 노광시키는 상면 노광부;상기 상면 노광부와 동일한 구조를 갖고, 상면 노광부와 소정의 간격으로 배치되되, 동박 필름의 하부면을 노광시키는 하면 노광부;상기 상면 노광부와 하면 노광부 사이에 마련되어, 상기 상면 노광부를 통과한 동박 필름의 상부면과 하부면을 반전시켜 하면 노광부로 인입시키는 반전부;로 이루어지는 것을 특징으로 하는 연성 인쇄회로기판 제조용 양면 노광장치.
- 제1항에 있어서,상기 반전부는,상기 상면 노광부를 통과한 동박 필름의 상부면과 외측면이 접하여 회전하는 다수의 반전롤러가 구비되어, 동박 필름을 반전시켜 하면 노광부로 유입되도록 하는 것을 특징으로 하는 연성 인쇄회로기판 제조용 양면 노광장치.
- 제1항에 있어서,동박 필름의 일측에는 일정한 간격으로 위치결정공이 형성되고,상기 상면 노광부 및 하면 노광부에는 각각 상기 위치결정공의 위치를 파악하는 위치결정수단이 구비된 것을 특징으로 하는 연성 인쇄회로기판 제조용 양면 노광장치.
- 제3항에 있어서,상기 위치결정수단은 광센서 인것을 특징으로 하는 연성 인쇄회로기판 제조용 양면 노광장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050045858A KR100696160B1 (ko) | 2005-05-31 | 2005-05-31 | 연성 인쇄회로기판 제조용 양면 노광장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050045858A KR100696160B1 (ko) | 2005-05-31 | 2005-05-31 | 연성 인쇄회로기판 제조용 양면 노광장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20060124100A true KR20060124100A (ko) | 2006-12-05 |
KR100696160B1 KR100696160B1 (ko) | 2007-03-20 |
Family
ID=37728888
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020050045858A KR100696160B1 (ko) | 2005-05-31 | 2005-05-31 | 연성 인쇄회로기판 제조용 양면 노광장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100696160B1 (ko) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012108211A1 (de) * | 2012-09-04 | 2014-03-06 | Kleo Halbleitertechnik Gmbh | Belichtungsanlage |
KR20170000448A (ko) * | 2015-06-23 | 2017-01-03 | 아주하이텍(주) | 드럼형 LDI In-Line 양면 노광장치 |
CN109884861A (zh) * | 2019-03-26 | 2019-06-14 | 中山新诺科技股份有限公司 | 一种柔性板双面激光直写数字化曝光机 |
CN110955118A (zh) * | 2018-09-27 | 2020-04-03 | 株式会社Orc制作所 | 曝光装置 |
-
2005
- 2005-05-31 KR KR1020050045858A patent/KR100696160B1/ko active IP Right Grant
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012108211A1 (de) * | 2012-09-04 | 2014-03-06 | Kleo Halbleitertechnik Gmbh | Belichtungsanlage |
KR20170000448A (ko) * | 2015-06-23 | 2017-01-03 | 아주하이텍(주) | 드럼형 LDI In-Line 양면 노광장치 |
CN110955118A (zh) * | 2018-09-27 | 2020-04-03 | 株式会社Orc制作所 | 曝光装置 |
CN109884861A (zh) * | 2019-03-26 | 2019-06-14 | 中山新诺科技股份有限公司 | 一种柔性板双面激光直写数字化曝光机 |
Also Published As
Publication number | Publication date |
---|---|
KR100696160B1 (ko) | 2007-03-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI382276B (zh) | Exposure device | |
KR100696160B1 (ko) | 연성 인쇄회로기판 제조용 양면 노광장치 | |
KR101901429B1 (ko) | 포토이미징 | |
WO2007141852A1 (ja) | 露光方法および露光装置 | |
KR20080005845A (ko) | 다층회로기판 제조에 사용되는 마킹장치 | |
JP2006292919A (ja) | 露光方法および露光装置 | |
KR20030035872A (ko) | 다층 회로기판 제조용 표시장치 | |
KR100562890B1 (ko) | 띠형상 워크의 노광장치 | |
JP2010266763A (ja) | 露光装置 | |
JP5178501B2 (ja) | 認識マークを備えたメタルマスク及びその製造方法 | |
KR102137278B1 (ko) | 고속타발기 연동형 정밀 롤투롤 소재 연성회로기판 제조 방법 | |
JP5685756B2 (ja) | フィルム露光方法 | |
JP3678144B2 (ja) | フィルム回路基板の周辺露光装置 | |
JP2004094142A (ja) | 幅広露光機 | |
JP2012220760A (ja) | 筒状体マスク及びこれを使用した露光装置 | |
KR960036872A (ko) | 플렉시블 프린트 배선판의 회로패턴 연속노광장치 | |
CN104471486A (zh) | 照明装置、处理装置及器件制造方法 | |
KR102137277B1 (ko) | 고속타발기 연동형 롤투롤 소재 노광 시스템 및 그 운용방법 | |
CN113784533A (zh) | 一种电路板的制作方法 | |
JP2018105906A (ja) | 露光装置 | |
US3671243A (en) | Mask registration during continuous photoetching of strip material | |
JP2005056869A (ja) | 露光装置の移送式基板ステージ | |
GB2091493A (en) | Method and Apparatus for Making Printed Circuit Boards | |
JP3626163B2 (ja) | 両面露光装置 | |
US7538853B2 (en) | Exposure process and apparatus using glass photomasks |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20130228 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20140221 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20150303 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20160303 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20170207 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20180305 Year of fee payment: 12 |
|
FPAY | Annual fee payment |
Payment date: 20190304 Year of fee payment: 13 |
|
FPAY | Annual fee payment |
Payment date: 20200309 Year of fee payment: 14 |