KR20060049086A - A correcting apparatus for fine-pitch pattern - Google Patents

Abstract

An object of the present invention is to provide a fine pattern correction apparatus having a small distance from an observation position to an application position, and in a solution for achieving the above object, a correction liquid application mechanism 4 included in the fine pattern correction apparatus. The coating needle 11 for applying the correction liquid to the defect, the application palette 14 supporting the correction liquid tank 15 and the like, and the application needle 11 are moved in the Z direction while moving the application needle 11 in the XY plane. And a linear actuator 12 for positioning the coating needle 11 at any one of a coating standby position in the visual field of the observation optical system 2 and a preparation position near the coating palette 14. Therefore, the distance which moves the X stage 7 and the Y stage 8 from the state which specifies the application | coating position by the observation optical system 2 to the application | coating position becomes remarkably small compared with the past.

Fine pattern correction

Description

A Correcting Apparatus for Fine-Pitch Pattern

BRIEF DESCRIPTION OF THE DRAWINGS The figure which shows the whole structure of the micro pattern correction apparatus by Embodiment 1 of this invention.

FIG. 2 is a view showing the configuration and operation of the correction liquid application mechanism shown in FIG. 1. FIG.

3 is a diagram showing a modification of Embodiment 1;

4 is a diagram showing another modified example of the first embodiment;

FIG. 5 is a diagram showing the configuration and operation of the correction liquid application mechanism included in the fine pattern correction apparatus according to Embodiment 2 of the present invention. FIG.

FIG. 6 is a diagram showing the configuration and operation of the correction liquid application mechanism included in the fine pattern correction apparatus according to Embodiment 3 of the present invention. FIG.

7 is a diagram showing the configuration of a conventional correction liquid application mechanism.

(Explanation of symbols for the main parts of the drawing)

DESCRIPTION OF SYMBOLS 1 Substrate to be edited 2: Observation optical system

3: laser device 4: correction liquid application mechanism

5: curing light source 6: Z stage

7: X stage 8: Y stage

9 control unit 10 control panel

11, 21, 25, 71: coating needles 12, 27, 30, 31, 72: actuator

13, 33: linear guide 14, 73: application palette

15, 75: correction liquid tank 16, 76: cleaning unit

17, 77: drying unit 18, 78: notch portion

19, 74: motor 20: objective lens

26: attachment portion 32: cylinder

34: coating base 35: hook

36: pin

Technical Field

The present invention relates to a fine pattern correction apparatus, and more particularly, to a fine pattern correction apparatus for correcting a defect of a fine pattern formed on a substrate.

Prior art

Background Art Conventionally, fine pattern correction apparatuses are known in which an electrode defect (open defect) lacking an electrode of a liquid crystal display device (LCD) or a correction liquid is applied by a needle to a color dropout portion of a color filter of a liquid crystal. In this fine pattern correction apparatus, the crystal head including the observation optical system and the correction liquid application mechanism and the substrate are observed while observing the surface of the substrate while relatively moving in the XYZ direction, and the crystal head is positioned so that the needle is located at the specific defect position. Is moved, the needle is lowered vertically until the needle tip contacts the substrate, and the correction liquid attached to the needle tip is applied to the defect.

FIG. 7: is a figure which shows the correction liquid application | coating mechanism 70 contained in such a fine pattern correction apparatus. In FIG. 7, in the correction liquid application mechanism 70, the application needle 71 is provided to be movable in the vertical direction by the actuator 72, and the application pallet 73 is in the horizontal plane by the motor 74. It is rotatably provided in. On the application | coating pallet 73, the some correction liquid tank 75, the washing unit 76, and the drying unit 77 in which the different types of correction liquid were injected are provided. A part of the circular application palette 73 is provided with a cutout 78 for allowing the application needle 71 to pass therethrough.

When correcting a defect, the application palette 73 is rotated so that the desired correction liquid tank 75 is moved below the application needle 71, and the application needle 71 is moved up and down by the actuator 72, thereby applying the application needle. A desired correction liquid is attached to the tip of (71). Next, the application palette 73 is rotated so that the notch portion 78 of the application palette 73 is moved below the application needle 71, and the application needle 71 is moved up and down by the actuator 72. The tip of the coating needle 71 contacts the defect portion of the substrate (not shown), and the correction liquid is applied to the defect portion.

After application of the correction liquid, the washing unit 76 is moved below the coating needle 71 so that the coating needle 71 is inserted into the cleaning unit 76, and the unnecessary correction liquid is removed from the coating needle 71 by the washing liquid. do. Thereafter, the drying unit 77 is moved below the coating needle 71, and the coating needle 71 is inserted into the drying unit 77 and dried (see Patent Document 1, for example).

Moreover, some correction liquid tanks etc. are arrange | positioned in a row on a rectangular application | coating pallet, and an actuator may reciprocate the application | coating pallet below a coating needle (for example, refer patent document 2).

[Patent Document 1] Japanese Patent Application Laid-Open No. 2002-333725

[Patent Document 2] Japanese Patent Application Laid-Open No. 2000-55615

However, in the conventional fine pattern correction apparatus, the distance between the optical axis of the observation optical system and the tip of the coating needle 71 is limited by the respective geometric shapes. In particular, when the observation optical system includes a revolver for exchanging the objective lens, the application needle 71 needs to be disposed outside the rotation range of the objective lens barrel attached to the revolver, so that the observation optical system The distance between the optical axis and the tip of the coating needle 71 becomes long.

After observing a defect with an observation optical system and specifying the application position by the observation result, in the application | coating operation, a correction head is applied from an observation position in order to match the tip position of the application | coating needle 71 to the application | coated position specified. Move to. At this time, it is necessary to move the entire weighted quartz head over a long distance, which takes time.

In addition, since the size of the XYZ stage increases with the expansion of the substrate size, the amount of deformation of the stage due to the change in the center position or the temperature change accompanying the movement of the crystal head increases, and the positioning error is large depending on the position of the defect on the substrate. Distract For this reason, the error of the actual application | coating position with respect to the position designated by the observation optical system becomes large.

Therefore, the main object of the present invention is to provide a fine pattern correction apparatus having a small distance from the observation position to the application position.

The fine pattern correction apparatus which concerns on this invention is a fine pattern correction apparatus which correct | amends the defect of the micropattern formed on the board | substrate, The correction head which contains the observation optical system which observes a defect, and the correction liquid application | coating mechanism which apply | coats a correction liquid to a defect, An XY stage for relatively positioning the crystal head and the substrate in an XY plane parallel to the substrate, and a Z stage for relatively positioning the crystal head and the substrate in the Z direction perpendicular to the substrate. Here, the correction liquid applying mechanism is provided at a predetermined position outside the field of view of the observation optical system, the coating needle for attaching the correction liquid attached to the tip thereof to a defect, and the coating palette for storing the correction liquid, and the application needle within the XY plane. And an actuator which moves in the Z direction with the application and positions the coating needle at any one of an application standby position in or near the field of view of the observation optical system and a preparation position near the application palette.

Preferably, the actuator is a linear actuator provided by tilting the Z-direction by a predetermined angle.

Also preferably, the actuator is a linear-rotating actuator that performs linear positioning in the Z-direction of the coating needle and rotational positioning in the XY plane.

Also preferably, the actuator is a two degree of freedom linear actuator that performs linear positioning in the Z direction of the coating needle and linear positioning in a predetermined direction within the XY plane.

Also preferably, at least the tip portion of the applicator is provided substantially perpendicular to the substrate, and the correction liquid application mechanism is further provided between the applicator and the actuator and linearly supports the applicator freely in the Z direction. Includes a guide.

In the fine pattern correction apparatus according to the present invention, the needle tip of the coating needle can be positioned in or near the field of view of the observation optical system by moving the coating needle in the vertical and horizontal directions with the substrate by the actuator. Therefore, the distance which moves an XY stage from the state which specifies the application | coating position with an observation optical system to the application | coating position becomes remarkably small compared with the past. Therefore, even when the large XY stage which can respond to a large substrate is provided, the error of an application | coating position can be made small. In addition, the actuator for moving the coating needle can be driven at a higher speed than the XY stage, so that the time required for coating can be shortened.

Embodiment 1

FIG. 1: is an external appearance which shows the whole structure of the fine pattern correction apparatus by Embodiment 1 of this invention. In FIG. 1, the fine pattern correction apparatus includes an observation optical system 2 for observing a defective portion of a fine pattern formed on the surface of the substrate to be etched 1, and a laser device for removing foreign matter defects of the fine pattern. (3), a correction liquid application mechanism 4 for applying the correction liquid to the defect portion, and a curing light source 5 for photocuring or thermosetting the applied correction liquid.

The observation optical system 2 comprises a microscope including a plurality of objective lenses and a revolver for selecting any of them, and a CCD camera. The observation optical system 2 also serves as the optical system of the laser device 3. The observation optical system 2, the laser apparatus 3, the correction liquid application | coating mechanism 4, and the hardening light source 5 comprise a crystal head.

In addition, the fine pattern correction apparatus includes a Z stage (6) mounted with the correction head and movable in the Z direction, an X stage (7) mounted with the Z stage (6) and movable in the X direction; The Y stage 8 which mounts the target board | substrate 1, and is movable to a Y direction, the control part 9 which controls the whole fine pattern correction apparatus, and the operation part 10 which consists of a user interface are provided.

The Z stage 6 performs the relative adjustment of the observation optical system 2 or the application position by performing relative positioning of the substrate 1 and the quartz head in the Z direction perpendicular to the substrate to be modified 1. It is used to lower the coating needle positioned at and to contact the tip with the substrate 1. The X stage 7 and the Y stage 8 are used to perform relative positioning of the substrate 1 and the quartz head in an XY plane parallel to the substrate to be modified 1. The control part 9 sends a control signal to the whole fine pattern correction apparatus based on the command signal from the operation part 10. The operation unit 10 includes a display device for an image photographed by a CCD camera, a coordinate input device, an instruction device for various operations, and the like.

FIG.2 (a) (b) is a figure which shows the structure and operation | movement of the correction liquid application | coating mechanism 4 which is the characteristic of this fine pattern correction apparatus. In FIG.2 (a) (b), the correction liquid application | coating mechanism 4 is application | coating in which the coating needle 11, the linear actuator 12, the linear guide 13, the correction liquid tank 15, etc. were mounted. A pallet 14.

The coating needle 11 adhere | attaches a correction liquid to the front-end | tip, transfers a defect part, and apply | coats. The distal end of the coating needle 11 is composed of a tapered portion tapering toward the distal end and a flat surface perpendicular to the central axis provided at the distal end of the tapered portion. The coating needle 11 is bent so that the center axis of the distal end portion thereof may be perpendicular to the substrate to be modified 1, and the proximal end thereof is supported at the distal end of the drive shaft of the actuator 12 via the linear guide 13. The coating needle 11 is freely supported by the linear guide 13 by a predetermined distance in the direction perpendicular to the substrate 1.

The linear actuator 12 moves the coating needle 11 in a direction inclined with respect to the substrate 1, that is, in a direction perpendicular to and parallel to the substrate 1, and the coating standby position shown in Fig. 2A. And it stops in two places of the preparation position shown by FIG.2 (b). The application | coating waiting position contacts the board | substrate 1 with the front-end | tip of the coating needle 11 slightly upward of the board | substrate 1 in the vicinity of the visual field of the objective lens 20 of the observation optical system 2, or near the center of the visual field. We do not take position. In addition, the preparation position is made into the position which can insert the coating needle 11 in each of correction liquid tanks 15 etc. on the application | coating palette 14 outside the visual field of the objective lens 20 of the observation optical system 2.

Next, the operation of this fine pattern correction apparatus will be described. In the initial state, the drive shaft of the linear actuator 12 is reduced to hold the coating needle 11 at the coating preparation position. At this time, the coating needle 11 and the like are positioned at a sufficient distance from the observation optical system 2, and the operation of replacing the objective lens 20 of the observation optical system 2 (rotation of the revolver) can be performed without interruption.

Subsequently, the relative positions of the crystal head and the substrate 1 are moved by the X stage 7 and the Y stage 8, and the defect portion of the fine pattern is positioned almost at the center of the field of view of the observation optical system 2, The application position is specified. The application position can be specified by, for example, displaying an image of the defect portion captured by the CCD camera on the screen of the display device, and designating the application position on the screen using a coordinate input device such as a mouse.

Next, the drive shaft of the linear actuator 12 is extended, and the coating needle 11 is moved to the coating standby position and held there. Subsequently, the needle at the coating standby position based on the coordinate relationship origin of the field of view of the observation optical system 2 and the position of the needle tip at the coating standby position and the coordinates of the specified coating position, which were previously stored in the control unit 9. The X stage 7 and the Y stage 8 are moved so that the tip and the specified application position coincide.

At this time, since the coating needle 11 is located within the field of view of the objective lens 20 of the observation optical system 2, the X stage 7 when transferring from the specification of the application position by the observation optical system 2 to the application operation. And the movement distance of the Y stage 8 is only the range of a microscope visual field. For this reason, compared with the prior art, the movement distance of the X stage 7 and the Y stage 8 may be very small, the time required for an application | coating operation can be shortened, and the precision of the position where a correction liquid is apply | coated actually can be improved. have.

Next, the flat surface at the tip of the coating needle 11 is applied by moving the Z stage 6 in the direction of approaching the substrate 1 by the amount of the Z movement amount which is previously stored in the control unit 9. It is brought into contact with the position, and the correction liquid attached to the flat surface is transferred to the application position.

At this time, the tip of the coating needle 11 is fixed so that the tip of the coating needle 11 is substantially perpendicular to the substrate 1 (the flat surface of the tip of the coating needle 11 is almost parallel to the substrate 1). For this reason, almost the entire surface of the flat surface is in contact with the substrate 1. In addition, since the coating needle 11 is freely supported by the linear guide 13 in the vertical direction with respect to the board | substrate 1, Z in the state which the front-end | tip of the coating needle 11 contacted the board | substrate 1 again is carried out. Even if the stage 6 moves in the direction approaching the substrate 1, the load applied to the needle tip is constant. Moreover, since the operation | movement which makes the tip of the coating needle 11 contact the application | coating position of the board | substrate 1 is performed by the Z stage 6 of high precision, when the coating needle 11 contacts the board | substrate 1, It is possible to control the posture and speed of reproducibly well. In this way, stable application is possible.

After the application is completed, the Z stage 6 is raised to the original position, and the coating needle 11 is returned to the ready position by the operation of the actuator 12. In the preparation position, the needle tip can be washed and dried by operating the actuator 12 and the application palette 14 again. In addition, while waiting in the preparation position, the needle tip may be soaked in the correction liquid in the correction liquid tank 15. In this case, it is possible to prevent the fixed correction liquid from sticking to the tip of the coating needle 11.

In this way, when the distance between the objective lens 20 and the substrate 1 is small, the tip portion of the coating needle 11 is bent to apply the coating within the field of view of the objective lens 20 of the observation optical system 2. The tip of the needle 1 can be positioned. On the other hand, when the distance between the objective lens 20 and the board | substrate 1 of the observation optical system 2 is large, as shown in FIG.3 (a) (b), the straight coating needle 21 is attached to the board | substrate 1 It can be attached to the linear guide 13 in a direction perpendicular to the.

In addition, a plurality of correction liquid tanks 15, a washing unit 16, and a drying unit 17 are provided on the application palette 14, and the application palette 14 allows the linear actuator 12 to pass therethrough. The notch part 18 is formed. The application palette 14 is rotated by the motor 19. Since the notch part 18 was provided in the application | coating pallet 14, the application | coating needle 21 can be moved from the preparation position of the upper side of the application | coating pallet 14 to the application | coating waiting position below the application | coating pallet 14. Fig. 3 (a) shows the state of the coating standby position, and Fig. 3 (b) shows the state of the preparation position.

At the preparation position, the application needle 21 is raised to the position where the application needle 21 does not interfere with the correction liquid tank 15, the cleaning unit 16, and the drying unit 17 on the application palette 14, and the application palette. The tip of the coating needle 21 is fixed to the correction liquid tank 15 by rotating 14 to a predetermined position by the motor 19 and stopping, and then lowering the coating needle 21 by a predetermined distance. The correction liquid can be attached by inserting. In the same manner, the washing unit 16 and the drying unit 17 can wash and dry the tip end portion of the coating needle 21.

In addition, when the focal length of the objective lens 20 is short and the application | coating waiting position of the application needle 21 cannot be set under the objective lens 20, as shown in FIG. 4, the application needle 21 is shown. May be set in the vicinity of the side surface of the objective lens 20. Also in this case, by moving the coating needle 21 in the horizontal direction with the substrate 1, it becomes possible to set the coating standby position of the coating needle 21 within the rotation range of the revolver, and to specify the observation and application position. The movement distance of the X stage 7 and the Y stage 8 at the time of transferring to the application | coating operation | movement can be reduced significantly compared with the former, and shortening of an application time and improving the application position precision can be aimed at.

[Embodiment 2]

5 (a) and 5 (b) are diagrams showing the configuration and operation of the correction liquid application mechanism included in the micropattern correction apparatus according to the second embodiment of the present invention, as compared with FIG. 2 (a) and (b). Drawing. In (a) and (b) of FIG. 5, the correction liquid application mechanism includes the application needle 25, the attachment member 26, the linear-rotating actuator 27, the linear guide 13, and the correction liquid tank 15. ) And a coating pallet 14 mounted thereon.

The coating needle 25 adheres a correction liquid to the tip, transfers to a defect part, and apply | coats. The distal end of the coating needle 25 is composed of a tapered portion tapering toward the distal end and a flat surface perpendicular to the central axis provided at the distal end of the tapered portion. The coating needle 25 is held at the tip end side of the drive shaft of the actuator 27 via the attachment member 26 and the linear guide 13 so that the central axis thereof is perpendicular to the substrate to be modified. In the correction liquid application mechanism 4 of FIG. 2, a bent shape application needle 11 is used. In the correction liquid application mechanism of FIG. 5, a straight application needle 25 is used. Thereby, it is possible to use the material which is excellent in abrasion resistance, such as cemented carbide, but difficult to bend as a material of the coating needle 25, and the coating needle 25 excellent in durability can be obtained. The coating needle 25 is freely supported by the linear guide 13 by a predetermined distance in the direction perpendicular to the substrate 1.

The linear motion-rotating actuator 27 can perform linear positioning in a substantially vertical direction with respect to the substrate to be modified 1, and positioning in a rotational direction within a plane parallel to the substrate to be edited 1. have. The linear-rotating actuator 27 moves the applicator 25 in the vertical direction and the parallel direction with respect to the substrate 1, and the application standby position shown in Fig. 5 (a) and Fig. 5 (b). It stops at two places of the preparation position shown by the mark. The application | coating waiting position is the vicinity of the visual field of the objective lens 20 of the observation optical system 2, or the center of the visual field, and the tip of the coating needle 25 is slightly above the board | substrate 1, and does not contact the board | substrate 1 Do not position. In addition, the preparation position is made into the position which can insert the coating needle 25 in each of correction liquid tank 15 on the application | coating pallet 14, etc. Since other configurations and operations are the same as those in the first embodiment, the description is not repeated.

Also in the second embodiment, the same effect as in the first embodiment can be obtained.

[Embodiment 3]

6 (a) and 6 (b) are diagrams showing the configuration and operation of the correction liquid application mechanism included in the fine pattern correction apparatus according to Embodiment 3 of the present invention, as compared with FIG. 2 (a) and (b). Drawing. In Fig. 6 (a) and (b), the correction liquid application mechanism includes a coating needle 25, two linear actuators 30 and 31, and an application palette 14 on which the correction liquid tank 15 and the like are mounted. do.

The drive shaft of the linear actuator 30 operates in a direction parallel to the substrate to be modified 1. The linear actuator 31 is provided at the tip of the drive shaft of the linear actuator 30 and includes an air cylinder 32, a liner guide 33, and a coating needle base 34. By the air cylinder 32, the coating needle base 34 operates in a direction perpendicular to the substrate to be modified 1. The applicator 25 is attached to the applicator base 34 so as to be approximately perpendicular to the substrate to be edited. In addition, the coating needle 25 is freely supported by the linear guide 33 by a predetermined distance in the direction perpendicular to the substrate 1.

The air cylinder 32 can stop at two points, a rising end and a falling end. In the application | coating waiting position shown to FIG. 6 (a), the air cylinder 32 stops at a lower end and the hook 35 provided in the rod tip of the air cylinder 32 was integrally provided in the coating needle base 34. As shown in FIG. In contact with the pin 36, the coating needle 25 is supported so that it may not fall further. When the Z stage 6 drops to the substrate 1 side and the tip of the coating needle 25 contacts the substrate 1, the hook 35 is the pin 36 when the Z stage 6 drops further. Apart from this, only the own weight of the coating needle 25 and the coating needle base 34 is applied to the tip of the coating needle 25.

From the application standby position, the air cylinder 32 is moved to the rising end, and the application needle 25 is moved to the right side of the drawing by the linear actuator 30 to the ready position shown in Fig. 6B. Is moved. In the case where the application palette 14 is moved at this position, the position of the rising end of the air cylinder 32 is set so that the tip of the application needle 25 does not interfere with the correction liquid tank 15 or the like on the application palette 14. do. In addition, the stop position of the drive shaft of the linear actuator 30 is a position where the tip of the coating needle 25 can be inserted into the correction liquid tank 15 or the like by rotating the coating palette 14. For example, when the correction liquid is affixed to the tip of the coating needle 25, the application palette 14 is moved to position the correction liquid tank 15 under the coating needle 25, and the air cylinder 32 is moved. By operating in the lower end, the applicator 25 is inserted into the correction liquid tank 15. Since other configurations and operations are the same as those in the first embodiment, the description is not repeated.

Also in Embodiment 3, the same effect as Embodiment 1 can be obtained.

In addition, as in the first embodiment, when the single linear actuator 12 provided at an angle makes the horizontal and vertical directions move with respect to the substrate 1, the configuration and control of the actuator are simplified. There is this. On the other hand, as in the second and third embodiments, the actuator for moving the coating needle 25 from the ready position to the coating standby position can be individually controlled in the vertical direction and the parallel direction with respect to the substrate 1. In the case of the configuration, when the working distance of the objective lens 20 is long and the distance between the substrate 1 and the objective lens 20 can be sufficiently taken, the application standby position is set within the observation field under the objective lens 20. If the working distance of the objective lens 20 is short and the application needle 25 cannot be placed under the lens 20, the application standby position is set near the barrel of the objective lens 20 depending on the situation. There is an advantage that an optimal application waiting position can be set.

It should be thought that embodiment disclosed this time is an illustration and restrictive at no points. The scope of the present invention is shown by above-described not description but Claim, and it is intended that the meaning of a claim and equality and all the changes within a range are included.

In the fine pattern correction apparatus according to the present invention, the needle tip of the coating needle can be positioned in or near the field of view of the observation optical system by moving the coating needle in the vertical and horizontal directions with the substrate by the actuator. Therefore, the distance which moves an XY stage from the state which specifies the application | coating position with an observation optical system to the application | coating position becomes remarkably small compared with the past. Therefore, even when the large XY stage which can respond to a large substrate is provided, the error of an application | coating position can be made small. In addition, the actuator for moving the coating needle can be driven at a higher speed than the XY stage, so that the time required for coating can be shortened.

Claims (5)

A fine pattern correction apparatus for correcting a defect of a fine pattern formed on the substrate 1, Correction heads 2 to 5 including an observation optical system 2 for observing the defect and a correction liquid application mechanism 4 for applying the correction liquid to the defect, XY stages 7 and 8 for relatively positioning the quartz heads 2 to 5 and the substrate 1 in an XY plane parallel to the substrate 1, and And a Z stage 6 for relatively positioning the quartz heads 2 to 5 and the substrate 1 in the Z direction perpendicular to the substrate 1, The correction liquid application mechanism 4, An applicator 11, 21, or 25 for attaching the correction liquid attached to the tip to the defect, An application palette 14 provided at a predetermined position outside the field of view of the observation optical system 2, and storing the correction liquid, and The coating needles 11, 21, or 25 are moved in the Z direction while moving in the XY plane, and the coating standby position and the coating palette 14 in or near the field of view of the observation optical system 2. And an actuator (12; 27; or 30, 31) for positioning the applicator (11, 21, or 25) at any one of the ready positions in the vicinity of the < RTI ID = 0.0 > The method of claim 1, The said actuator (12) is a fine pattern correction apparatus characterized by the above-mentioned linear actuator provided inclined by the predetermined angle with respect to the said Z direction. The method of claim 1, The actuator 27 is a linear pattern correcting device, which is a linear-rotating actuator 27 which performs linear positioning in the Z direction of the coating needle 25 and rotational positioning in the XY plane. . The method of claim 1, The actuators 30 and 31 are two degree of freedom linear actuators 30 and 31 which perform linear positioning in the Z direction of the coating needle 25 and linear positioning in a predetermined direction in the XY plane. Fine pattern correction device, characterized in that). The method according to any one of claims 1 to 4, The coating needles 11, 21, or 25, at least the tip portion thereof is provided substantially perpendicular to the substrate 1, The correction liquid application mechanism 14 is further provided between the application needles 11, 21, or 25 and the actuators 12; 27; or 30, 31, and the application needles 11, 21, or 25. ) Is a fine pattern correction device, characterized in that it comprises a linear guide (13, 33) to move freely in the Z direction.

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