JP4802027B2 - Pattern correction device and application unit thereof - Google Patents

Pattern correction device and application unit thereof Download PDF

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JP4802027B2
JP4802027B2 JP2006094527A JP2006094527A JP4802027B2 JP 4802027 B2 JP4802027 B2 JP 4802027B2 JP 2006094527 A JP2006094527 A JP 2006094527A JP 2006094527 A JP2006094527 A JP 2006094527A JP 4802027 B2 JP4802027 B2 JP 4802027B2
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container
arm
application
application needle
unit
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JP2007268353A (en
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昌良 松島
昭浩 山中
孝誌 小池
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NTN Corp
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Priority to CN2007100917114A priority patent/CN101047090B/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/02Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to separate articles
    • B05C1/027Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to separate articles only at particular parts of the articles

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  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Optical Filters (AREA)

Description

この発明はパターン修正装置およびその塗布ユニットに関し、特に、基板上に形成された微細パターンの欠陥部を修正するパターン修正装置およびその塗布ユニットに関する。より特定的には、この発明は、フラットパネルディスプレイの製造工程において発生する電極のオープン欠陥、プラズマディスプレイのリブ(隔壁)欠損、液晶カラーフィルタの白抜け欠陥、マスクの欠陥などを修正するパターン修正装置と、それに用いられる塗布ユニットに関する。   The present invention relates to a pattern correcting apparatus and a coating unit thereof, and more particularly to a pattern correcting apparatus and a coating unit for correcting a defective portion of a fine pattern formed on a substrate. More specifically, the present invention relates to pattern correction for correcting electrode open defects, plasma display rib (partition wall) defects, liquid crystal color filter blank defects, mask defects, etc., which occur in the manufacturing process of flat panel displays. The present invention relates to an apparatus and a coating unit used therefor.

近年、プラズマディスプレイ、液晶ディスプレイ、ELディスプレイなどのフラットパネルディスプレイの大型化、高精細化に伴って、ディスプレイの製造工程において、基板上の電極やリブなどに欠陥が発生したり、液晶カラーフィルタの着色層に欠陥が発生したりする確率が高くなっている。このため、歩留まりの向上を図り、各種欠陥を修正するパターン修正装置が提案されている。   In recent years, with the increase in size and definition of flat panel displays such as plasma displays, liquid crystal displays, and EL displays, defects have occurred in the electrodes and ribs on the substrate in the display manufacturing process, and liquid crystal color filters There is a high probability that defects will occur in the colored layer. For this reason, there has been proposed a pattern correcting apparatus that improves the yield and corrects various defects.

たとえば、液晶カラーフィルタの着色層の一部が色抜けした白欠陥を修正する装置として、塗布針の先端部に付着させた修正用インクを白欠陥に塗布して修正するものがある(たとえば、特許文献1参照)。また、プラズマディスプレイの背面ガラス基板上に形成されたリブの一部が欠けたリブ欠け欠陥を修正する装置として、塗布針の先端部に付着させた修正用ペーストをリブ欠け欠陥に塗布して修正するものがある(たとえば、特許文献2参照)。   For example, as an apparatus for correcting a white defect in which a part of a colored layer of a liquid crystal color filter is missing, there is an apparatus that corrects a white defect by applying a correction ink attached to the tip of an application needle (for example, Patent Document 1). In addition, as a device that corrects a rib chip defect in which a part of the rib formed on the back glass substrate of the plasma display is chipped, a correction paste attached to the tip of the coating needle is applied to the rib chip defect and corrected. (For example, refer to Patent Document 2).

これらのパターン修正装置では、容器に注入された修正液(修正用インク、修正用ペースト)の液面の上で塗布針を上下動させて塗布針の先端部に修正液を付着させた後、その塗布針を欠陥部(白欠陥、リブ欠け欠陥)の上で上下動させて塗布針先端部の修正液を欠陥部に塗布していた。
特開平9−61296号公報 特開2000−299059号公報
In these pattern correction devices, after the application needle is moved up and down on the liquid surface of the correction liquid (correction ink, correction paste) injected into the container to attach the correction liquid to the tip of the application needle, The application needle was moved up and down on the defect portion (white defect, rib defect defect) to apply the correction liquid at the tip of the application needle to the defect portion.
Japanese Patent Laid-Open No. 9-61296 JP 2000-299059 A

しかし、従来のパターン修正装置では、欠陥部が大きい場合は修正液を欠陥部に複数回塗布する必要があり、塗布する度に塗布針を欠陥部から容器まで戻して、塗布針に修正液を付着し直す必要があった。このため、欠陥部の修正時間が長くなるという問題があった。   However, in the conventional pattern correction device, when the defect portion is large, it is necessary to apply the correction liquid to the defect portion a plurality of times.Each time the coating is applied, the application needle is returned from the defect portion to the container, and the correction liquid is applied to the application needle. It was necessary to reattach. For this reason, there has been a problem that the time required for correcting the defective portion becomes long.

それゆえに、この発明の主たる目的は、簡単な構成で欠陥部を迅速に修正することが可能なパターン修正装置およびその塗布ユニットを提供することである。   SUMMARY OF THE INVENTION Therefore, a main object of the present invention is to provide a pattern correction apparatus and its coating unit that can quickly correct a defective portion with a simple configuration.

この発明に係る塗布ユニットは、基板上に形成された微細パターンの欠陥部を修正するパターン修正装置の塗布ユニットであって、その底に貫通孔が開口され、修正液が注入された容器と、貫通孔と略同じ径を有し、欠陥部に修正液を塗布するための塗布針と、容器および塗布針を上下動可能に支持する第1の直動案内部材と、容器および塗布針を相対的に上下動可能に支持する第2の直動案内部材と、容器および塗布針を上下動させるとともに、容器および塗布針を相対的に上下動させ、貫通孔から塗布針の先端部を突出させて先端部に修正液を付着させる駆動部とを備えたものであり、駆動部の駆動軸は1本のみである。 The coating unit according to the present invention is a coating unit of a pattern correction device for correcting a defective portion of a fine pattern formed on a substrate, a through hole is opened at the bottom, and a container into which a correction liquid is injected, A coating needle having a diameter substantially the same as that of the through-hole, for applying the correction liquid to the defective portion, a first linear motion guide member that supports the container and the coating needle so as to be movable up and down, and the container and the coating needle are relatively The second linear motion guide member that is supported so as to be movable up and down, the container and the application needle are moved up and down, and the container and the application needle are relatively moved up and down to project the tip of the application needle from the through hole. der that a drive unit for attaching the correction fluid to the distal end portion Te is, the drive shaft of the drive unit is Ru der only one.

た好ましくは、駆動部は、容器および塗布針を下降させた後に塗布針のみを下降させて、貫通孔から塗布針の先端部を突出させる。 Also preferably, the drive unit is lowered only applied needle after lowering the container and coating the needle to protrude the leading end of the coating the needle through the through hole.

また好ましくは、さらに、支持台と、その先端部に塗布針が設けられ、その基端部が第1の直動案内部材を介して支持台に結合され、支持台に対して上下動可能に設けられた第1のアームと、その先端部に容器が設けられ、その基端部が第2の直動案内部材を介して第1のアームに結合され、第1のアームに対して相対的に上下動可能に設けられた第2のアームと、第1のアームに対する第2のアームの上下方向の相対移動量を、第1のアームの上下移動量よりも少ない範囲に限定する移動範囲限定機構とを備え、駆動部は、第1のアームの基端部のみを上下動させて、容器および塗布針を上下動させるとともに、容器および塗布針を相対的に上下動させる。   In addition, preferably, a support base and an application needle are provided at a tip portion thereof, and a base end portion thereof is coupled to the support base via a first linear motion guide member so as to be movable up and down with respect to the support base. A first arm provided, and a container at a distal end portion thereof, and a proximal end portion thereof coupled to the first arm via a second linear motion guide member, relative to the first arm; Movement range limitation that limits the vertical movement amount of the second arm relative to the first arm to the first arm so as to be movable in the vertical direction to a range smaller than the vertical movement amount of the first arm. And a drive unit that moves only the proximal end portion of the first arm up and down to move the container and the application needle up and down, and relatively moves the container and the application needle up and down.

また好ましくは、第1および第2のアームは支持台の一方側に配置され、駆動部は支持台の他方側に配置され、容器は駆動部よりも低い位置に設けられている。   Preferably, the first and second arms are disposed on one side of the support base, the drive unit is disposed on the other side of the support base, and the container is provided at a position lower than the drive unit.

また、この発明に係るパターン修正装置は、上記塗布ユニットを備えたものである。
好ましくは、さらに、塗布ユニットが待機状態にあるとき容器の底の下方に配置され、貫通孔から漏れた修正液を受ける遮蔽板を備える。
Moreover, the pattern correction apparatus according to the present invention includes the coating unit.
Preferably, the apparatus further includes a shielding plate that is disposed below the bottom of the container when the coating unit is in a standby state and receives correction liquid leaking from the through hole.

また好ましくは、さらに、塗布動作時に塗布ユニットを水平方向に移動させて容器を遮蔽板から離間させる移動手段を備え、駆動部は、遮蔽板から離間された容器の底を遮蔽板よりも低い位置まで下降させる。   Further preferably, the apparatus further comprises a moving means for moving the coating unit in the horizontal direction during the coating operation to separate the container from the shielding plate, and the drive unit is located at a position where the bottom of the container separated from the shielding plate is lower than the shielding plate. To lower.

また好ましくは、互いに異なる種類の修正液が注入された複数の塗布ユニットを備え、複数の塗布ユニットのうちの欠陥部の種類に応じて選択された塗布ユニットの修正液を欠陥部に塗布する。   Preferably, a plurality of application units into which different types of correction liquids are injected are provided, and the correction liquid of the application unit selected according to the type of the defective part among the plurality of application units is applied to the defective part.

この発明に係る塗布ユニットおよびパターン修正装置では、その底に貫通孔が開口され、修正液が注入された容器と、貫通孔と略同じ径を有し、欠陥部に修正液を塗布するための塗布針と、容器および塗布針を上下動可能に支持する第1の直動案内部材と、容器および塗布針を相対的に上下動可能に支持する第2の直動案内部材と、容器および塗布針を上下動させるとともに、容器および塗布針を相対的に上下動させ、貫通孔から塗布針の先端部を突出させて先端部に修正液を付着させる駆動部とが設けられ、駆動部の駆動軸は1本のみである。したがって、容器の底の貫通孔から塗布針の先端部を突出させて先端部に修正液を付着させ、その状態で塗布針の先端を欠陥部に接触させれば欠陥部に修正液を塗布できる。よって、容器と欠陥部の間で塗布針を移動させる必要があった従来に比べ、簡単な構成で欠陥部を迅速に修正することができる。 In the coating unit and the pattern correction device according to the present invention, a through hole is opened at the bottom, the container into which the correction liquid is injected, and a diameter substantially the same as the through hole, and for applying the correction liquid to the defective portion An application needle, a first linear guide member that supports the container and the application needle so as to be movable up and down, a second linear motion guide member that supports the container and the application needle so as to be relatively movable up and down, a container, and an application needle with vertically moving the, container and coating the needle is relatively vertically movable, a driving unit for adhering the correction fluid to the tip portion is protruded tip portion of the application needle from the through hole is provided, the drive of the drive unit axis Ru der only one. Therefore, the correction liquid can be applied to the defective portion by causing the tip of the application needle to protrude from the through-hole at the bottom of the container so that the correction liquid adheres to the tip, and the tip of the application needle is brought into contact with the defect in that state. . Therefore, the defective portion can be quickly corrected with a simple configuration as compared with the conventional case where the application needle needs to be moved between the container and the defective portion.

図1は、この発明の一実施形態によるパターン修正装置の全体構成を示す図である。図1において、パターン修正装置1は、基板の表面を観察する観察光学系2と、観察された画像を映し出すモニタ3と、観察光学系2を介して基板にレーザ光を照射し不要部をカットするカット用レーザ部4と、修正液を塗布針先端に付着させて基板の欠陥部に塗布する塗布機構部5と、欠陥部に塗布された修正液を加熱する基板加熱部6と、欠陥部を認識する画像処理部7と、装置全体を制御するホストコンピュータ8と、装置機構部の動作を制御する制御用コンピュータ9とを備える。さらに、その他に欠陥部を有する基板をXY方向(水平方向)に移動させるXYステージ10と、XYステージ10上で基板を保持するチャック部11と、観察光学系2や塗布機構部5をZ方向(垂直方向)に移動させるZステージ12などが設けられている。   FIG. 1 is a diagram showing the overall configuration of a pattern correction apparatus according to an embodiment of the present invention. In FIG. 1, a pattern correction apparatus 1 includes an observation optical system 2 for observing the surface of a substrate, a monitor 3 for displaying an observed image, and irradiating the substrate with laser light through the observation optical system 2 to cut unnecessary portions. A cutting laser unit 4 to be applied, a coating mechanism unit 5 for applying a correction liquid to the tip of the coating needle and coating the defective part of the substrate, a substrate heating unit 6 for heating the correction liquid applied to the defective part, and a defective part An image processing unit 7 for recognizing the image, a host computer 8 for controlling the entire apparatus, and a control computer 9 for controlling the operation of the apparatus mechanism unit. In addition, an XY stage 10 that moves a substrate having a defective portion in the XY direction (horizontal direction), a chuck unit 11 that holds the substrate on the XY stage 10, and the observation optical system 2 and the coating mechanism unit 5 are moved in the Z direction. A Z stage 12 that is moved in the (vertical direction) is provided.

XYステージ10は、塗布機構部5によって修正液を欠陥部に塗布する際や、観察光学系2によって基板の表面を観察する際などに、基板を適切な位置に相対移動させるために用いられる。図1に示したXYステージ10は、2つの一軸ステージを直角方向に重ねた構成を有している。ただし、このXYステージ10は、観察光学系2や塗布機構部5に対して基板を相対的に移動させることができるものであればよく、図1に示すXYステージ10の構成に限定されるものではない。近年では、基板サイズの大型化に伴い、X軸方向とY軸方向にそれぞれ独立して移動可能なガントリ型のXYステージが多く採用されている。   The XY stage 10 is used to relatively move the substrate to an appropriate position when the correction liquid is applied to the defective portion by the application mechanism unit 5 or when the surface of the substrate is observed by the observation optical system 2. The XY stage 10 shown in FIG. 1 has a configuration in which two uniaxial stages are stacked in a perpendicular direction. However, the XY stage 10 only needs to be able to move the substrate relative to the observation optical system 2 and the coating mechanism unit 5, and is limited to the configuration of the XY stage 10 shown in FIG. is not. In recent years, gantry-type XY stages that can move independently in the X-axis direction and the Y-axis direction have been widely adopted as the substrate size increases.

図2は、図1に示した塗布機構部5に含まれる塗布ユニット20の構成を示す断面図である。図2において、塗布ユニット20は、その底に第1の孔21aが開口され、修正液22が注入された容器21と、第2の孔23aが開口され、容器21を密封する蓋23と、第1および第2の孔21a,23aと略同じ径を有する塗布針24とを含む。   FIG. 2 is a cross-sectional view showing the configuration of the coating unit 20 included in the coating mechanism unit 5 shown in FIG. In FIG. 2, the coating unit 20 has a container 21 in which a first hole 21 a is opened at the bottom thereof and a correction liquid 22 is injected, a lid 23 in which a second hole 23 a is opened and the container 21 is sealed, It includes an application needle 24 having substantially the same diameter as the first and second holes 21a and 23a.

塗布針24の先端部24aは、第2の孔23aを貫通して修正液22内に浸漬される。第1および第2の孔21a,23aの径は、それらに貫通する塗布針24の径よりも少し大きいが微小であるので、修正液22の表面張力や容器23の撥水・撥油性により、第1の孔21aからの修正液22の漏れはほとんど無い。   The distal end portion 24 a of the application needle 24 penetrates the second hole 23 a and is immersed in the correction liquid 22. Since the diameters of the first and second holes 21a and 23a are slightly larger than the diameter of the coating needle 24 penetrating them, the surface tension of the correction liquid 22 and the water / oil repellency of the container 23 There is almost no leakage of the correction liquid 22 from the first hole 21a.

容器21に形成され、修正液22を注入するための穴は、孔21aに近づくに従って断面積が小さくなるテーパ形状を有する。したがって、少ない修正液22でも塗布針24の先端部24aを浸漬することができ、経済的である。修正液22の量は、たとえば20μl(マイクロリットル)である。修正液22は日持ちしないものもあり、容器21は定期的に交換する。あるいは、使用済み容器21を洗浄後、再利用することも可能である。容器21の着脱を簡単にするため、手でつかみ易い構造にする方が使い勝手は向上する。   The hole formed in the container 21 for injecting the correction liquid 22 has a tapered shape in which the cross-sectional area decreases as the hole 21a is approached. Therefore, the tip portion 24a of the application needle 24 can be immersed with a small amount of correction liquid 22, which is economical. The amount of the correction liquid 22 is, for example, 20 μl (microliter). Some correction fluids 22 do not last for a long time, and the container 21 is periodically replaced. Alternatively, the used container 21 can be reused after washing. In order to simplify the attachment and detachment of the container 21, usability is improved by making the structure easy to grasp by hand.

塗布針24の基端部は塗布針固定板25に固着され、塗布針固定板25はアーム26の先端部26aに固定される。塗布針固定板25は、たとえばネジ止め、磁石の吸引力などの方法でアーム26に固定される。アーム26はL字形状を成し、その基端部は直動案内部材30を介して支持台33に結合される。アーム26は、直動案内部材30により、支持台33に対して上下動可能に支持される。   The base end portion of the application needle 24 is fixed to the application needle fixing plate 25, and the application needle fixing plate 25 is fixed to the distal end portion 26 a of the arm 26. The application needle fixing plate 25 is fixed to the arm 26 by a method such as screwing or magnet attraction. The arm 26 has an L shape, and a base end portion of the arm 26 is coupled to the support base 33 via the linear motion guide member 30. The arm 26 is supported by the linear motion guide member 30 so as to be movable up and down with respect to the support base 33.

容器21は、もう1つのアーム28の先端部28aに固定される。容器21は、アーム28の先端部28aに設けた突き当て部28bにより位置決めされ、たとえばネジ止め、磁石の吸引力などの方法でアーム28に固定される。アーム28はL字形状を成し、その基端部は直動案内部材29を介してアーム26に結合される。アーム28は、直動案内部材29により、アーム26に対して上下動可能に支持される。   The container 21 is fixed to the distal end portion 28 a of the other arm 28. The container 21 is positioned by an abutting portion 28b provided at the distal end portion 28a of the arm 28, and is fixed to the arm 28 by a method such as screwing or magnet attraction. The arm 28 has an L shape, and a base end portion of the arm 28 is coupled to the arm 26 via a linear motion guide member 29. The arm 28 is supported by the linear motion guide member 29 so as to be movable up and down with respect to the arm 26.

直動案内部材29,30の各々は、レール部とスライド部の間に転動体(ボールなど)を介在させた転がり案内の構成を有し、レール部とスライド部とは極軽い力で自在に直線運動することが可能なリニアガイドとなっている。塗布精度を向上するために、軽い予圧を与える場合もある。   Each of the linear motion guide members 29 and 30 has a rolling guide configuration in which a rolling element (such as a ball) is interposed between the rail portion and the slide portion, and the rail portion and the slide portion can be freely operated with an extremely light force. It is a linear guide that can move linearly. In order to improve application accuracy, a light preload may be applied.

アーム26と28の上下方向の相対移動量は、アーム26に固定支持されたピン27と、アーム28に設けた切り欠き孔28cにより限定される。すなわち、相対移動範囲は、ピン27が切り欠き孔28cの中を移動可能な範囲となるため、直動案内部材29に抜け防止のためのストッパを設けなくてもよい。直動案内部材30の上下には、支持台33に固定されたストッパ31,32が設けられ、アーム26の上下動はストッパ31,32により拘束される。なお、下側のストッパ32は、アーム28の動作範囲を制限するストッパを兼ねている。ストッパ31,32、ピン27および切り欠き孔28cにより、アーム26に対するアーム28の上下方向の相対移動量は、アーム26の上下移動量よりも少ない範囲に限定されている。   The amount of relative movement of the arms 26 and 28 in the vertical direction is limited by the pin 27 fixedly supported by the arm 26 and the notch hole 28 c provided in the arm 28. That is, the relative movement range is a range in which the pin 27 can move in the cutout hole 28c, and therefore it is not necessary to provide a stopper for preventing the linear motion guide member 29 from coming off. Stoppers 31 and 32 fixed to the support base 33 are provided above and below the linear motion guide member 30, and the vertical movement of the arm 26 is restrained by the stoppers 31 and 32. The lower stopper 32 also serves as a stopper that limits the operating range of the arm 28. Due to the stoppers 31 and 32, the pin 27, and the notch hole 28c, the amount of relative movement of the arm 28 in the vertical direction with respect to the arm 26 is limited to a range smaller than the amount of vertical movement of the arm 26.

支持台33のアーム26,28の反対側には、出力軸34aを下向きにしてエアシリンダ34が設けられている。エアシリンダ34の出力軸34aの先端には、先端にピン35aを固着した駆動板35が水平に固定されており、出力軸34aと一体となって上下動する。ピン35aは、アーム26の基端部に設けた切り欠き部26bに下方から接していて、エアシリンダ34の出力軸34aの上下動により、アーム26を上下に移動させる機能を持つ。   An air cylinder 34 is provided on the opposite side of the support base 33 from the arms 26 and 28 with the output shaft 34a facing downward. A drive plate 35 having a pin 35a fixed to the tip is fixed horizontally at the tip of the output shaft 34a of the air cylinder 34, and moves up and down integrally with the output shaft 34a. The pin 35a is in contact with a notch 26b provided at the base end of the arm 26 from below, and has a function of moving the arm 26 up and down by the vertical movement of the output shaft 34a of the air cylinder 34.

図2では、エアシリンダ34の出力軸34aが上方にあり(この例では出力軸34aが引き込まれた状態)、アーム26は上端に位置し、アーム28は、ピン27に吊り下がる状態、すなわち、切り欠き孔28cの上端とピン27が接する状態にある。このとき、塗布針24の先端部24aは、容器21内に入れた修正液22に浸漬された状態にある。このように、塗布ユニット20の先端部(塗布針24および容器21の周りの部分)を上下方向に薄く構成し、かつ先端部をエアシリンダ34よりも下に配置したので、塗布ユニット20の先端部を観察光学系2の対物レンズと基板との間に挿入することも可能となる。   In FIG. 2, the output shaft 34 a of the air cylinder 34 is on the upper side (in this example, the output shaft 34 a is retracted), the arm 26 is positioned at the upper end, and the arm 28 is suspended from the pin 27, that is, The pin 27 is in contact with the upper end of the cutout hole 28c. At this time, the tip 24 a of the application needle 24 is in a state of being immersed in the correction liquid 22 placed in the container 21. As described above, the tip of the coating unit 20 (the portion around the coating needle 24 and the container 21) is configured to be thin in the vertical direction, and the tip is disposed below the air cylinder 34. It is also possible to insert the portion between the objective lens of the observation optical system 2 and the substrate.

図3は、観察光学系2の対物レンズ40で基板41の欠陥部41aを観察している状態を示している。対物レンズ40と離れた位置に塗布ユニット20は配置され、修正指令を待っている。塗布ユニット20は図示しない副XYZステージに固定され、紙面左右方向、前後方向、上下方向に移動可能であり、副XYZステージは、たとえば観察光学系2を固定するZステージ12に固定される。なお、場合によって、副Yステージを省略してもよい。   FIG. 3 shows a state where the defective portion 41 a of the substrate 41 is observed with the objective lens 40 of the observation optical system 2. The coating unit 20 is arranged at a position away from the objective lens 40 and is waiting for a correction command. The coating unit 20 is fixed to a sub XYZ stage (not shown), and can move in the left and right direction, the front and rear direction, and the vertical direction of the paper. The sub XYZ stage is fixed to, for example, a Z stage 12 that fixes the observation optical system 2. In some cases, the secondary Y stage may be omitted.

ここで塗布指令が与えられると、図4(A)〜(D)に示す動作を行って塗布が行われる。まず、図4(A)に示すように副Xステージと副Yステージの動作により塗布ユニット20の先端部が対物レンズ40と基板41との隙間に挿入され、塗布針24の直下に欠陥部41aが位置するように位置決めされる。   When a coating command is given here, coating is performed by performing the operations shown in FIGS. First, as shown in FIG. 4A, the tip of the coating unit 20 is inserted into the gap between the objective lens 40 and the substrate 41 by the operations of the sub-X stage and the sub-Y stage, and the defective portion 41a is directly below the coating needle 24. Is positioned.

対物レンズ40の作動距離(対物レンズ40から焦点位置までの距離)が短くて、塗布ユニット20が挿入できない場合は、図示しないレボルバを回転させて作動距離の長い対物レンズ40に変更する。一般的に低倍率のレンズの方が作動距離は長くなる。たとえば、10倍の対物レンズ40の作動距離は約30mmあり、塗布ユニット20の塗布部の高さを低く設計すれば容易に挿入可能である。   When the working distance of the objective lens 40 (distance from the objective lens 40 to the focal position) is short and the coating unit 20 cannot be inserted, the revolver (not shown) is rotated to change to the objective lens 40 having a long working distance. In general, the working distance is longer for a low magnification lens. For example, the working distance of the 10 × objective lens 40 is about 30 mm, and can be easily inserted if the height of the coating portion of the coating unit 20 is designed to be low.

その後、エアシリンダ34の出力軸34aを下方に突出させて駆動板35を下降させる。図4(B)は、出力軸34aが下降する途中過程を示したものであり、図4(C)は出力軸34aが最下端に到達した状態を示している。   Thereafter, the output shaft 34a of the air cylinder 34 is protruded downward, and the drive plate 35 is lowered. FIG. 4B shows a process in which the output shaft 34a is lowered, and FIG. 4C shows a state in which the output shaft 34a has reached the lowest end.

エアシリンダ34の出力軸34aが下方に突出すると、出力軸34aに固定された駆動板35、および、駆動板35の先端に固着したピン35aも一緒に下方に移動するので、ピン35aによって支えられたアーム26もそれに合わせて下方に移動する。また、アーム26に固着したピン27に吊り下げられた状態でアーム28もそれに合わせて下方に移動するが、始めの間は、2つのアーム26,28の上下方向の相対位置は変化しない。   When the output shaft 34a of the air cylinder 34 protrudes downward, the drive plate 35 fixed to the output shaft 34a and the pin 35a fixed to the tip of the drive plate 35 also move downward together, so that they are supported by the pin 35a. The arm 26 also moves downward accordingly. Further, the arm 28 also moves downward in accordance with the state suspended from the pin 27 fixed to the arm 26, but the relative position in the vertical direction of the two arms 26 and 28 does not change during the beginning.

図4(B)に示すように、アーム28の基端部の下端がストッパ32に当接すると、アーム28の下降が停止され、その後は、アーム26のみが下降する。アーム26のみが下降すると、アーム26に固定された塗布針24の先端24aは、容器21の底面に設けた第1の孔21aから突出を開始し、その突出は、図4(C)に示すように、アーム26の基端部の下端がストッパ32に当接することで停止する。この状態では、塗布針24の先端部24aに修正液22が付着しており、塗布の準備が完了する。その後、図4(D)に示すように、図示しない副Zステージを用いて塗布ユニット20全体を下降させ、塗布針24の先端を基板41の欠陥部41aに接触させる。これにより、塗布針24の先端部24aに付着していた修正液22が欠陥部41aに塗布される。   As shown in FIG. 4B, when the lower end of the base end portion of the arm 28 comes into contact with the stopper 32, the lowering of the arm 28 is stopped, and thereafter, only the arm 26 is lowered. When only the arm 26 is lowered, the tip 24a of the application needle 24 fixed to the arm 26 starts to protrude from the first hole 21a provided in the bottom surface of the container 21, and the protrusion is shown in FIG. In this way, the lower end of the base end portion of the arm 26 stops when it comes into contact with the stopper 32. In this state, the correction liquid 22 is attached to the tip portion 24a of the application needle 24, and preparation for application is completed. Thereafter, as shown in FIG. 4D, the entire coating unit 20 is lowered using a sub-Z stage (not shown), and the tip of the coating needle 24 is brought into contact with the defective portion 41 a of the substrate 41. Thereby, the correction liquid 22 adhering to the tip portion 24a of the application needle 24 is applied to the defective portion 41a.

塗布針24の先端が基板41の欠陥部41aに接触してから、さらに、副Zステージを用いて、塗布ユニット20を0.5mmから1mm程度下方に移動させるが、この際、塗布針24は、直動案内部材30によりアーム26とともに上方に退避するので、塗布針24に過大な力は働かない。   After the tip of the application needle 24 comes into contact with the defective portion 41a of the substrate 41, the application unit 20 is further moved downward by about 0.5 mm to 1 mm using the sub-Z stage. Since the linear guide member 30 is retracted upward together with the arm 26, no excessive force is applied to the application needle 24.

塗布後、エアシリンダ34の出力軸34aを上方に引き込んで元の状態(図4(A))に戻り、1回の塗布が完了する。欠陥部41aに修正液22をさらに塗布する必要がある場合は、この塗布動作を繰り返して行なえばよい。また、欠陥部41aが大きいほど必要な塗布動作の回数は多くなるが、塗布針24を上下に移動させるだけで塗布針先端部24aに修正液22を付着し直すことができる。   After the application, the output shaft 34a of the air cylinder 34 is pulled upward to return to the original state (FIG. 4A), and one application is completed. If it is necessary to further apply the correction liquid 22 to the defective portion 41a, this application operation may be repeated. In addition, the larger the defect portion 41a, the greater the number of necessary application operations. However, the correction liquid 22 can be reattached to the application needle tip 24a simply by moving the application needle 24 up and down.

したがって、この実施の形態では、従来のように塗布針を欠陥部と容器(インクタンクまたはペーストタンク)との間を往復動させる工程が省略されるため、欠陥修正に要する時間が短縮される。   Therefore, in this embodiment, since the step of reciprocating the coating needle between the defective portion and the container (ink tank or paste tank) as in the prior art is omitted, the time required for defect correction is shortened.

また、修正液22は孔21a,23aを除いて密閉された容器21内に入っており、塗布針24は容器21の蓋23の孔23aに微小な隙間を持って常に挿入された状態にあるため、修正液22が大気に直接触れる面積は少ない。したがって、修正液22の希釈液(溶媒)の蒸発を防止することができ、修正液22の使用可能な日数(交換周期)を長くすることが可能となり、パターン修正装置1の保守が軽減化される。   The correction liquid 22 is contained in the sealed container 21 except for the holes 21a and 23a, and the application needle 24 is always inserted into the hole 23a of the lid 23 of the container 21 with a small gap. Therefore, the area where the correction liquid 22 directly contacts the atmosphere is small. Therefore, evaporation of the dilution liquid (solvent) of the correction liquid 22 can be prevented, the number of days (exchange period) in which the correction liquid 22 can be used can be increased, and maintenance of the pattern correction apparatus 1 is reduced. The

また、塗布動作の待機状態において塗布針先端部24aを修正液22の中に浸けているため、塗布針先端部24aに付着した修正液22の乾燥を防ぐことができ、塗布針先端部24aの洗浄工程も省略可能となる。   Further, since the application needle tip 24a is immersed in the correction liquid 22 in the standby state of the application operation, it is possible to prevent the correction liquid 22 adhering to the application needle tip 24a from being dried. The cleaning process can also be omitted.

また、従来は塗布針先端部24aに修正液22を付着させたとき、塗布針先端部24aの修正液溜まりの下部が自重で膨らんだ状態になっているので、修正液溜まりが上方に移動して塗布針先端面に修正液22の薄い層ができるまで待機していた。しかし、この実施の形態では、塗布針先端部24aが第1の孔21aから突出したときに塗布針先端部24aの修正液溜まりが上方に移動して塗布針先端面に修正液22の薄い層ができた状態になっているので、待機時間を設ける必要がなくなる、あるいは待機時間を短縮することが可能となる。   Further, conventionally, when the correction liquid 22 is attached to the application needle tip 24a, the lower part of the correction liquid reservoir of the application needle tip 24a is swollen by its own weight, so that the correction liquid reservoir moves upward. Then, it waited until a thin layer of the correction liquid 22 was formed on the tip surface of the application needle. However, in this embodiment, when the application needle tip 24a protrudes from the first hole 21a, the correction liquid reservoir of the application needle tip 24a moves upward, and a thin layer of the correction liquid 22 is applied to the application needle tip surface. Therefore, it is not necessary to provide a waiting time or the waiting time can be shortened.

また、従来は先端部分の径が異なる複数の塗布針を用意しておき、欠陥部の大きさに応じて塗布針を選択して使用していた。しかし、この実施の形態では1回の塗布動作に要する時間が短いため、先端部分の径が最も小さい塗布針24を1本だけ用いて、塗布動作の回数を調整すればよい。その分、装置の構成が簡略化される。   Conventionally, a plurality of application needles having different tip diameters are prepared, and the application needles are selected and used according to the size of the defect portion. However, since the time required for one application operation is short in this embodiment, the number of application operations may be adjusted by using only one application needle 24 having the smallest tip diameter. Accordingly, the configuration of the apparatus is simplified.

また、従来は塗布ユニットと観察光学系とが水平方向に離れた位置に固定されていたため、観察光学系で欠陥部を観察している位置から塗布ユニットの直下に欠陥部が来るように基板をオフセット移動させることが必要であり、修正液塗布後の状態を観察するには再び基板をオフセット移動する必要があり、タクトタイムの長時間化を招いていた。しかし、この実施の形態では、観察光学系2の対物レンズ40と基板41の間に容器21および塗布針24を挿入できるので、基板41のオフセット移動が不要となり、タクトタイムの短縮化を図ることができる。   In addition, since the coating unit and the observation optical system are conventionally fixed at positions separated in the horizontal direction, the substrate is placed so that the defective part comes directly under the coating unit from the position where the defective part is observed by the observation optical system. It is necessary to move the offset, and it is necessary to offset the substrate again to observe the state after the application of the correction liquid, resulting in a longer tact time. However, in this embodiment, since the container 21 and the application needle 24 can be inserted between the objective lens 40 of the observation optical system 2 and the substrate 41, the offset movement of the substrate 41 becomes unnecessary, and the tact time can be shortened. Can do.

また、アーム26,28の上下動、言い換えると、塗布針24と容器21の上下動を1つの駆動部(ここで示した例ではエアシリンダ34)で行なうので、機構を簡略化できる。また、駆動部を1つだけ制御すれば良く、制御も簡単である。   Further, since the arms 26 and 28 are moved up and down, in other words, the applicator needle 24 and the container 21 are moved up and down by a single drive unit (in the example shown here, the air cylinder 34), the mechanism can be simplified. Further, only one drive unit needs to be controlled, and the control is simple.

なお、この実施の形態では、駆動部としてエアシリンダ34を用いたが、たとえば、単動式の押出しタイプを用いれば、エアシリンダ34を駆動するエアが遮断されたり、エアシリンダ34の制御信号が途切れても、塗布針24の先端部24aが修正液22中に浸漬した状態を保持可能であり、塗布針24が突出することはなく、安全側に機能する。   In this embodiment, the air cylinder 34 is used as the drive unit. However, for example, if a single-acting extrusion type is used, the air that drives the air cylinder 34 is shut off, or a control signal for the air cylinder 34 is received. Even if it is interrupted, it is possible to keep the tip 24a of the application needle 24 immersed in the correction liquid 22, and the application needle 24 does not protrude and functions on the safe side.

また、この実施の形態では、修正液22を入れた容器21を上下動させる機構を設けたため、待機位置では、容器21を上方に保持できるようになり、塗布ユニット20全体を基板41に近接させても、容器21と基板41との距離を十分開けることができる。このため、待機時に容器21から修正液22の漏れが仮にあっても漏れ落ちた修正液22によって基板41が汚染されないように、図5(A)に示すように、基板40と容器41との間に遮蔽板36を設けることも可能となる。   In this embodiment, since the mechanism for moving the container 21 containing the correction liquid 22 up and down is provided, the container 21 can be held upward at the standby position, and the entire coating unit 20 is brought close to the substrate 41. However, the distance between the container 21 and the substrate 41 can be sufficiently increased. For this reason, as shown in FIG. 5 (A), the substrate 41 and the container 41 are not contaminated by the correction liquid 22 that has leaked from the container 21 even if the correction liquid 22 leaks from the container 21 during standby. It is also possible to provide a shielding plate 36 therebetween.

遮蔽板36は、図示しない副XYZステージの副Zステージに固定されており、塗布ユニット20と同じように、副Zステージにより上下動される。塗布時には、まず図5(B)に示すように、塗布ユニット20の塗布針24を、副XYステージにより対物レンズ40の直下にある欠陥部41aの上方に移動させる。このとき、遮蔽板36はX軸方向には移動しなので、容器21の下方に遮蔽板36は無く、塗布が可能となる。   The shielding plate 36 is fixed to a sub Z stage of a sub XYZ stage (not shown), and is moved up and down by the sub Z stage in the same manner as the coating unit 20. At the time of application, first, as shown in FIG. 5B, the application needle 24 of the application unit 20 is moved above the defective portion 41a directly below the objective lens 40 by the sub XY stage. At this time, since the shielding plate 36 moves in the X-axis direction, there is no shielding plate 36 below the container 21 and application is possible.

次に図5(C)に示すように、エアシリンダ34の出力軸34aを下降させて容器21を下方に移動させ、さらに塗布針24の先端24aを容器21から突出した状態にしてから、副Z軸ステージにより塗布ユニット20を下降させて、欠陥部41aに修正液22を塗布する。このとき、容器21は、エアシリンダ34の出力軸34aが下方に突出するのに伴って、遮蔽板36よりも下方に移動するので、塗布時には基板41と遮蔽板36とが干渉することはない。   Next, as shown in FIG. 5C, the output shaft 34a of the air cylinder 34 is lowered to move the container 21 downward, and the tip 24a of the application needle 24 protrudes from the container 21. The application unit 20 is lowered by the Z-axis stage, and the correction liquid 22 is applied to the defective portion 41a. At this time, since the container 21 moves below the shielding plate 36 as the output shaft 34a of the air cylinder 34 protrudes downward, the substrate 41 and the shielding plate 36 do not interfere with each other during application. .

なお、基板41がカラーフィルタ基板の場合、修正する色、R(赤)、G(緑)、B(青)、BM(ブラックマトリックスの黒)、場合によってはOC(オーバーコート)ごとに塗布ユニット20を設けて複数の塗布ユニット20を配置し、修正する色に合わせて、塗布ユニット20を選択して修正を行なうことも可能である。この場合、修正する色に合わせて修正が行われるため、塗布針24の洗浄は不要である。   When the substrate 41 is a color filter substrate, a coating unit is provided for each color to be corrected, R (red), G (green), B (blue), BM (black of the black matrix), and in some cases OC (overcoat). It is also possible to arrange a plurality of application units 20 with 20 and select the application unit 20 in accordance with the color to be corrected, and perform correction. In this case, since the correction is performed according to the color to be corrected, it is not necessary to clean the application needle 24.

今回開示された実施の形態はすべての点で例示であって制限的なものではないと考えられるべきである。本発明の範囲は上記した説明ではなくて特許請求の範囲によって示され、特許請求の範囲と均等の意味および範囲内でのすべての変更が含まれることが意図される。   The embodiment disclosed this time should be considered as illustrative in all points and not restrictive. The scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

この発明の一実施の形態によるパターン修正装置の全体構成を示す図である。It is a figure which shows the whole structure of the pattern correction apparatus by one Embodiment of this invention. 図1に示した塗布機構部に含まれる塗布ユニットの構成を示す断面図である。It is sectional drawing which shows the structure of the application | coating unit contained in the application | coating mechanism part shown in FIG. 図2に示した塗布ユニットの待機状態を示す断面図である。It is sectional drawing which shows the standby state of the coating unit shown in FIG. 図2に示した塗布ユニットの塗布動作を示す断面図である。It is sectional drawing which shows the application | coating operation | movement of the application | coating unit shown in FIG. 実施の形態の変更例を示す図である。It is a figure which shows the example of a change of embodiment.

符号の説明Explanation of symbols

1 パターン修正装置、2 観察光学系、3 モニタ、4 カット用レーザ部、5 塗布機構部、6 基板加熱部、7 画像処理部、8 ホストコンピュータ、9 制御用コンピュータ、10 XYステージ、11 チャック部、12 Zステージ、20 塗布ユニット、21 容器、21a 第1の孔、22 修正液、23 蓋、23a 第2の孔、24 塗布針、24a 先端部、25 塗布針固定板、26 アーム、26a 先端部、26b 切り欠き部、27 ピン、28 アーム、28a 先端部、28b 突き当て部、28c 切り欠き孔、29,30 直動案内部材、31,32 ストッパ、33 支持台、34 エアシリンダ、34a 出力軸、35 駆動板、35a ピン、36 遮蔽板、40 対物レンズ、41 基板、41a 欠陥部。   DESCRIPTION OF SYMBOLS 1 Pattern correction apparatus 2 Observation optical system 3 Monitor 4 Cutting laser part 5 Coating mechanism part 6 Substrate heating part 7 Image processing part 8 Host computer 9 Control computer 10 XY stage 11 Chuck part , 12 Z stage, 20 coating unit, 21 container, 21a first hole, 22 correction fluid, 23 lid, 23a second hole, 24 coating needle, 24a tip, 25 coating needle fixing plate, 26 arm, 26a tip Part, 26b notch part, 27 pin, 28 arm, 28a tip part, 28b abutting part, 28c notch hole, 29, 30 linear motion guide member, 31, 32 stopper, 33 support base, 34 air cylinder, 34a output Shaft, 35 Drive plate, 35a pin, 36 Shield plate, 40 Objective lens, 41 Substrate, 41a Defective part.

Claims (8)

基板上に形成された微細パターンの欠陥部を修正するパターン修正装置の塗布ユニットであって、
その底に貫通孔が開口され、修正液が注入された容器と、
前記貫通孔と略同じ径を有し、前記欠陥部に前記修正液を塗布するための塗布針と、
前記容器および前記塗布針を上下動可能に支持する第1の直動案内部材と、
前記容器および前記塗布針を相対的に上下動可能に支持する第2の直動案内部材と、
前記容器および前記塗布針を上下動させるとともに、前記容器および前記塗布針を相対的に上下動させ、前記貫通孔から前記塗布針の先端部を突出させて前記先端部に前記修正液を付着させる駆動部とを備え
前記駆動部の駆動軸は1本のみである、塗布ユニット。
A coating unit of a pattern correcting device for correcting a defective portion of a fine pattern formed on a substrate,
A through hole is opened at the bottom of the container, and a correction liquid is injected therein;
An applicator needle having substantially the same diameter as the through hole, and applying the correction liquid to the defect portion;
A first linear motion guide member that supports the container and the application needle so as to be movable up and down;
A second linear guide member that supports the container and the application needle so as to be relatively movable up and down;
The container and the application needle are moved up and down, and the container and the application needle are relatively moved up and down, and the tip of the application needle is protruded from the through-hole to attach the correction liquid to the tip. A drive unit ,
A driving shaft of the driving unit Ru der only one coating unit.
前記駆動部は、前記容器および前記塗布針を下降させた後に前記塗布針のみを下降させて、前記貫通孔から前記塗布針の先端部を突出させる、請求項1に記載の塗布ユニット。 2. The application unit according to claim 1, wherein the drive unit lowers only the application needle after lowering the container and the application needle, and causes the tip of the application needle to protrude from the through hole. さらに、支持台と、
その先端部に前記塗布針が設けられ、その基端部が前記第1の直動案内部材を介して前記支持台に結合され、前記支持台に対して上下動可能に設けられた第1のアームと、
その先端部に前記容器が設けられ、その基端部が前記第2の直動案内部材を介して前記第1のアームに結合され、前記第1のアームに対して相対的に上下動可能に設けられた第2のアームと、
前記第1のアームに対する前記第2のアームの上下方向の相対移動量を、前記第1のアームの上下移動量よりも少ない範囲に限定する移動範囲限定機構とを備え、
前記駆動部は、前記第1のアームの基端部のみを上下動させて、前記容器および前記塗布針を上下動させるとともに、前記容器および前記塗布針を相対的に上下動させる、請求項1または請求項に記載の塗布ユニット。
Furthermore, a support base,
The application needle is provided at the distal end portion, and the base end portion is coupled to the support base via the first linear motion guide member, and is provided to be movable up and down relative to the support base. Arm,
The container is provided at the distal end portion, and the base end portion is coupled to the first arm via the second linear motion guide member, and can move up and down relatively with respect to the first arm. A second arm provided;
A movement range limiting mechanism that limits the vertical relative movement amount of the second arm with respect to the first arm to a range smaller than the vertical movement amount of the first arm;
2. The drive unit moves up and down only the base end of the first arm to move the container and the application needle up and down, and relatively moves the container and the application needle up and down. Or the coating unit of Claim 2 .
前記第1および第2のアームは前記支持台の一方側に配置され、
前記駆動部は前記支持台の他方側に配置され、
前記容器は前記駆動部よりも低い位置に設けられている、請求項に記載の塗布ユニット。
The first and second arms are disposed on one side of the support;
The drive unit is disposed on the other side of the support;
The coating unit according to claim 3 , wherein the container is provided at a position lower than the driving unit.
請求項1から請求項までのいずれかに記載の塗布ユニットを備える、パターン修正装置。 Comprising a coating unit according to any of claims 1 to 4, pattern correction device. さらに、前記塗布ユニットが待機状態にあるとき前記容器の底の下方に配置され、前記貫通孔から漏れた前記修正液を受ける遮蔽板を備える、請求項に記載のパターン修正装置。 The pattern correction device according to claim 5 , further comprising a shielding plate that is disposed below the bottom of the container and receives the correction liquid leaked from the through hole when the coating unit is in a standby state. さらに、塗布動作時に前記塗布ユニットを水平方向に移動させて前記容器を前記遮蔽板から離間させる移動手段を備え、
前記駆動部は、前記遮蔽板から離間された前記容器の底を前記遮蔽板よりも低い位置まで下降させる、請求項に記載のパターン修正装置。
Furthermore, the moving unit for moving the coating unit in the horizontal direction during the coating operation to separate the container from the shielding plate,
The pattern correction apparatus according to claim 6 , wherein the driving unit lowers the bottom of the container spaced apart from the shielding plate to a position lower than the shielding plate.
互いに異なる種類の修正液が注入された複数の塗布ユニットを備え、
前記複数の塗布ユニットのうちの前記欠陥部の種類に応じて選択された塗布ユニットの修正液を前記欠陥部に塗布する、請求項から請求項までのいずれかに記載のパターン修正装置。
A plurality of application units into which different types of correction fluids are injected,
Applying a correction fluid of the application unit, which is selected according to the type of the defect portion of the plurality of coating units on the defective portion, the pattern adjustment device according to any one of claims 5 to claim 7.
JP2006094527A 2006-03-30 2006-03-30 Pattern correction device and application unit thereof Expired - Fee Related JP4802027B2 (en)

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KR20070028605A KR101280643B1 (en) 2006-03-30 2007-03-23 Pattern amendment device and application unit thereof
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