KR20050085034A - 고체 전해 컨덴서 - Google Patents
고체 전해 컨덴서 Download PDFInfo
- Publication number
- KR20050085034A KR20050085034A KR1020057008906A KR20057008906A KR20050085034A KR 20050085034 A KR20050085034 A KR 20050085034A KR 1020057008906 A KR1020057008906 A KR 1020057008906A KR 20057008906 A KR20057008906 A KR 20057008906A KR 20050085034 A KR20050085034 A KR 20050085034A
- Authority
- KR
- South Korea
- Prior art keywords
- solid electrolytic
- electrolytic capacitor
- titanium
- electrode foil
- negative electrode
- Prior art date
Links
- 239000003990 capacitor Substances 0.000 title claims abstract description 86
- 239000007787 solid Substances 0.000 title claims abstract description 47
- 239000011888 foil Substances 0.000 claims abstract description 98
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000010936 titanium Substances 0.000 claims abstract description 30
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 29
- 229920001940 conductive polymer Polymers 0.000 claims abstract description 18
- 150000004767 nitrides Chemical class 0.000 claims abstract description 16
- 239000002131 composite material Substances 0.000 claims abstract description 12
- 150000002736 metal compounds Chemical class 0.000 claims abstract description 11
- 239000007784 solid electrolyte Substances 0.000 claims abstract description 7
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 claims abstract description 4
- PMTRSEDNJGMXLN-UHFFFAOYSA-N titanium zirconium Chemical compound [Ti].[Zr] PMTRSEDNJGMXLN-UHFFFAOYSA-N 0.000 claims abstract description 3
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 23
- 238000004804 winding Methods 0.000 claims description 6
- 229920000123 polythiophene Polymers 0.000 claims description 3
- 239000003792 electrolyte Substances 0.000 claims 2
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 claims 1
- UMUXBDSQTCDPJZ-UHFFFAOYSA-N chromium titanium Chemical compound [Ti].[Cr] UMUXBDSQTCDPJZ-UHFFFAOYSA-N 0.000 abstract description 4
- 239000011248 coating agent Substances 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 39
- 229910052782 aluminium Inorganic materials 0.000 description 24
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 24
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 230000001965 increasing effect Effects 0.000 description 8
- 238000007740 vapor deposition Methods 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- 238000007733 ion plating Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- GKWLILHTTGWKLQ-UHFFFAOYSA-N 2,3-dihydrothieno[3,4-b][1,4]dioxine Chemical compound O1CCOC2=CSC=C21 GKWLILHTTGWKLQ-UHFFFAOYSA-N 0.000 description 3
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000012856 packing Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000002542 deteriorative effect Effects 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910017464 nitrogen compound Inorganic materials 0.000 description 2
- 150000002830 nitrogen compounds Chemical class 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- -1 TiN Chemical class 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 238000007737 ion beam deposition Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- WHRAZOIDGKIQEA-UHFFFAOYSA-L iron(2+);4-methylbenzenesulfonate Chemical compound [Fe+2].CC1=CC=C(S([O-])(=O)=O)C=C1.CC1=CC=C(S([O-])(=O)=O)C=C1 WHRAZOIDGKIQEA-UHFFFAOYSA-L 0.000 description 1
- LWLURCPMVVCCCR-UHFFFAOYSA-N iron;4-methylbenzenesulfonic acid Chemical compound [Fe].CC1=CC=C(S(O)(=O)=O)C=C1 LWLURCPMVVCCCR-UHFFFAOYSA-N 0.000 description 1
- 238000001182 laser chemical vapour deposition Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/228—Terminals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Abstract
Description
음극박 | Cap.(μF) | tan δ(%) | ESR(mΩ) | LC(μA) | ΔC/C(%) | |
종래예 1 | 에칭 처리된 알루미늄박 | 151.4 | 2.8 | 33.7 | 25 | -5.2 |
종래예 2 | 티탄을 증착시킨 알루미늄박 | 219.9 | 2.0 | 33.2 | 19 | -4.2 |
종래예 3 | 질화 티탄을 증착시킨 알루미늄박 | 227.3 | 1.9 | 34.0 | 30 | -3.4 |
실시예 | 티탄박 및 질화 티탄을 증착시킨알루미늄박 | 253.7 | 1.7 | 34.2 | 20 | -2.1 |
초기 | 시험 후 | ||||
Cap.(μF) | ESR(mΩ) | Cap.(μF) | ΔC/C(%) | ESR(mΩ) | |
종래예 1 | 151.4 | 33.7 | 143.5 | -5.2 | 35.6 |
종래예 2 | 219.9 | 33.2 | 210.7 | -4.2 | 35.2 |
종래예 3 | 227.3 | 34.0 | 219.6 | -3.4 | 35.9 |
실시예 | 253.7 | 34.2 | 248.4 | -2.1 | 35.7 |
Cap(μF) | ESR(mΩ) | LC(μA) | 스크래치 시험임계 하중(N) | |
종래예 | 185 | 11.8 | 27 | 60.3 |
실시예 1 | 220 | 10.7 | 0.7 | 80.3 |
실시예 2 | 221 | 10.6 | 0.8 | 82.5 |
Claims (5)
- 양극박(4) 및 음극박(5)을 세퍼레이터(6)를 개재시켜 감아서 구성된, 내부에 고체 전해질 층 또는 도전성 고분자 층이 형성된 컨덴서 소자(2)를 구비한 고체 전해 컨덴서에 있어서,음극박(5) 상에 티탄을 함유하는 복합 금속 화합물의 질화물을 포함하는 피막을 형성시키는 것을 특징으로 하는 고체 전해 컨덴서.
- 제1항에 있어서, 티탄을 함유하는 복합 금속 화합물의 질화물이 질화 알루미늄 티탄, 질화 크롬 티탄, 질화 지르코늄 티탄 또는 탄질화 티탄 중의 어느 하나인 고체 전해 컨덴서.
- 양극박(4) 및 음극박(5)을 세퍼레이터(6)를 개재시켜 감아서 구성된, 내부에 고체 전해질 층 또는 도전성 고분자 층이 형성된 컨덴서 소자(2)를 구비하며, 음극박(5) 상에 질화 티탄을 포함하는 피막을 형성시킨 고체 전해 컨덴서에 있어서,상기 음극박(5) 상의 질화 티탄 층의 내측에 티탄 층이 형성되어 있는 것을 특징으로 하는 고체 전해 컨덴서.
- 제1항에 있어서, 컨덴서 소자(2) 중의 전해질로서 폴리티오펜계 도전성 고분자를 사용하는 고체 전해 컨덴서.
- 제3항에 있어서, 컨덴서 소자(2) 중의 전해질로서 폴리티오펜계 도전성 고분자를 사용하는 고체 전해 컨덴서.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002334662 | 2002-11-19 | ||
JPJP-P-2002-00334662 | 2002-11-19 | ||
JP2003067501A JP4201623B2 (ja) | 2002-11-19 | 2003-03-13 | 固体電解コンデンサ |
JPJP-P-2003-00067501 | 2003-03-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050085034A true KR20050085034A (ko) | 2005-08-29 |
KR100987852B1 KR100987852B1 (ko) | 2010-10-13 |
Family
ID=32328318
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020057008906A KR100987852B1 (ko) | 2002-11-19 | 2003-11-17 | 고체 전해 컨덴서 |
Country Status (7)
Country | Link |
---|---|
US (2) | US7158367B2 (ko) |
JP (1) | JP4201623B2 (ko) |
KR (1) | KR100987852B1 (ko) |
AU (1) | AU2003280836A1 (ko) |
DE (1) | DE10393733B4 (ko) |
TW (1) | TWI230955B (ko) |
WO (1) | WO2004047131A1 (ko) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4201623B2 (ja) * | 2002-11-19 | 2008-12-24 | 三洋電機株式会社 | 固体電解コンデンサ |
JP2004265924A (ja) * | 2003-02-12 | 2004-09-24 | Sanyo Electric Co Ltd | 固体電解コンデンサ |
JP4716862B2 (ja) * | 2005-12-09 | 2011-07-06 | 佐賀三洋工業株式会社 | 固体電解コンデンサ |
CN100350070C (zh) * | 2005-12-15 | 2007-11-21 | 西安理工大学 | 一种微型钻头复合镀层的制备方法 |
JP2010524200A (ja) * | 2007-04-12 | 2010-07-15 | リンクロス株式会社 | バイポーラ・スーパーキャパシタとその製造方法 |
US8098479B1 (en) | 2008-09-19 | 2012-01-17 | Cornell Dubilier Marketing, Inc. | Capacitor having zinc coated common edge with welded aluminum terminal |
US8724295B2 (en) * | 2009-08-21 | 2014-05-13 | Nippon Chemi-Con Corporation | Solid electrolytic capacitor |
EP2680286B1 (en) | 2011-02-21 | 2019-06-19 | Japan Capacitor Industrial Co., Ltd. | Electrode foil, current collector, electrode, and electric energy storage element using same |
JP5995262B2 (ja) * | 2011-03-06 | 2016-09-21 | ヘレウス ドイチェラント ゲーエムベーハー ウント カンパニー カーゲー | Pedot/pssを固体電解質として含有するコンデンサにおける電気パラメータをポリグリセロールによって改善するための方法 |
JP6476420B2 (ja) | 2014-03-28 | 2019-03-06 | パナソニックIpマネジメント株式会社 | 蓄電デバイスおよびその製造方法 |
JP6878896B2 (ja) * | 2016-03-31 | 2021-06-02 | 日本ケミコン株式会社 | 電解コンデンサ及びその製造方法 |
JP6996158B2 (ja) * | 2017-08-17 | 2022-01-17 | 日本ケミコン株式会社 | コンデンサおよびその製造方法 |
US11289487B2 (en) * | 2018-02-23 | 2022-03-29 | Micron Technology, Inc. | Doped titanium nitride materials for DRAM capacitors, and related semiconductor devices, systems, and methods |
DE102022103760A1 (de) | 2022-02-17 | 2023-08-17 | Tdk Electronics Ag | Kondensator, Verfahren zur Herstellung und Verwendung |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2968800B2 (ja) | 1989-04-21 | 1999-11-02 | 株式会社神戸製鋼所 | 電解コンデンサ用電極材料の製造方法 |
JP2618281B2 (ja) | 1990-07-12 | 1997-06-11 | 日本ケミコン株式会社 | 電解コンデンサ用アルミニウム電極およびその製造方法 |
JPH0574664A (ja) | 1991-09-13 | 1993-03-26 | Elna Co Ltd | 電解コンデンサおよび電解コンデンサ用電極箔の製造方法 |
JPH065476A (ja) | 1992-06-19 | 1994-01-14 | Toyo Metaraijingu Kk | 高容量電解コンデンサ |
AU6321796A (en) | 1996-04-03 | 1997-10-22 | Zakrytoe Aktsionernoe Obschestvo "Skb "Istra" | Method and device for applying porous coatings and cathode film of an electrol ytic condenser |
TW388043B (en) * | 1997-04-15 | 2000-04-21 | Sanyo Electric Co | Solid electrolyte capacitor |
JP2000012400A (ja) * | 1998-06-19 | 2000-01-14 | Nichicon Corp | アルミニウム電解コンデンサ用電極箔 |
JP2000114108A (ja) | 1998-09-30 | 2000-04-21 | Nippon Chemicon Corp | 固体電解コンデンサとその製造方法 |
EP1137019B1 (en) * | 1998-09-30 | 2007-07-11 | Nippon Chemi-Con Corporation | Solid electrolyte capacitor and its manufacturing method |
JP4560940B2 (ja) * | 1999-11-04 | 2010-10-13 | パナソニック株式会社 | 固体電解コンデンサおよびその製造方法 |
JP2002299181A (ja) * | 2001-03-29 | 2002-10-11 | Nippon Chemicon Corp | 固体電解コンデンサ |
JP4201623B2 (ja) * | 2002-11-19 | 2008-12-24 | 三洋電機株式会社 | 固体電解コンデンサ |
-
2003
- 2003-03-13 JP JP2003067501A patent/JP4201623B2/ja not_active Expired - Lifetime
- 2003-11-17 WO PCT/JP2003/014603 patent/WO2004047131A1/ja active Application Filing
- 2003-11-17 AU AU2003280836A patent/AU2003280836A1/en not_active Abandoned
- 2003-11-17 KR KR1020057008906A patent/KR100987852B1/ko active IP Right Grant
- 2003-11-17 DE DE10393733.1T patent/DE10393733B4/de not_active Expired - Fee Related
- 2003-11-17 US US10/534,283 patent/US7158367B2/en not_active Expired - Lifetime
- 2003-11-17 TW TW092132100A patent/TWI230955B/zh not_active IP Right Cessation
-
2006
- 2006-11-14 US US11/598,712 patent/US7428139B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US20060018078A1 (en) | 2006-01-26 |
TW200416760A (en) | 2004-09-01 |
DE10393733B4 (de) | 2014-08-21 |
KR100987852B1 (ko) | 2010-10-13 |
US20070115613A1 (en) | 2007-05-24 |
WO2004047131A1 (ja) | 2004-06-03 |
AU2003280836A1 (en) | 2004-06-15 |
TWI230955B (en) | 2005-04-11 |
DE10393733T5 (de) | 2005-11-10 |
JP2004221512A (ja) | 2004-08-05 |
US7428139B2 (en) | 2008-09-23 |
JP4201623B2 (ja) | 2008-12-24 |
AU2003280836A8 (en) | 2004-06-15 |
US7158367B2 (en) | 2007-01-02 |
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