KR20050024969A - 세정력과 폴리이미드면 접착력을 지닌 브라운 옥사이드전처리제 조성물 및 브라운 옥사이드 공정을 통한폴리이미드면 접착력 향상 방법 - Google Patents
세정력과 폴리이미드면 접착력을 지닌 브라운 옥사이드전처리제 조성물 및 브라운 옥사이드 공정을 통한폴리이미드면 접착력 향상 방법 Download PDFInfo
- Publication number
- KR20050024969A KR20050024969A KR1020030062235A KR20030062235A KR20050024969A KR 20050024969 A KR20050024969 A KR 20050024969A KR 1020030062235 A KR1020030062235 A KR 1020030062235A KR 20030062235 A KR20030062235 A KR 20030062235A KR 20050024969 A KR20050024969 A KR 20050024969A
- Authority
- KR
- South Korea
- Prior art keywords
- brown oxide
- adhesion
- polyimide
- polyimide surface
- hydroxide
- Prior art date
Links
- 229920001721 polyimide Polymers 0.000 title claims abstract description 97
- 239000004642 Polyimide Substances 0.000 title claims abstract description 93
- 239000000203 mixture Substances 0.000 title claims abstract description 93
- 238000000034 method Methods 0.000 title claims abstract description 83
- 230000008569 process Effects 0.000 title claims abstract description 54
- 238000004140 cleaning Methods 0.000 title claims abstract description 43
- 239000000853 adhesive Substances 0.000 title description 25
- 230000001070 adhesive effect Effects 0.000 title description 25
- -1 Hydroxide compound Chemical class 0.000 claims abstract description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 17
- 150000001412 amines Chemical class 0.000 claims abstract description 15
- 239000002518 antifoaming agent Substances 0.000 claims abstract description 11
- 239000003112 inhibitor Substances 0.000 claims abstract description 11
- 239000000654 additive Substances 0.000 claims abstract description 7
- 230000000996 additive effect Effects 0.000 claims abstract description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 21
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 15
- 238000005406 washing Methods 0.000 claims description 12
- 230000008021 deposition Effects 0.000 claims description 11
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 10
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 9
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical group CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 8
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 6
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 6
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 5
- 239000000194 fatty acid Substances 0.000 claims description 5
- 229930195729 fatty acid Natural products 0.000 claims description 5
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 claims description 4
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 4
- 239000000908 ammonium hydroxide Substances 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 4
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 claims description 4
- 239000000176 sodium gluconate Substances 0.000 claims description 4
- 235000012207 sodium gluconate Nutrition 0.000 claims description 4
- 229940005574 sodium gluconate Drugs 0.000 claims description 4
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 claims description 4
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 claims description 4
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 claims description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 3
- 229920005682 EO-PO block copolymer Polymers 0.000 claims description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 3
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 claims description 3
- 229910001863 barium hydroxide Inorganic materials 0.000 claims description 3
- MVYYDFCVPLFOKV-UHFFFAOYSA-M barium monohydroxide Chemical compound [Ba]O MVYYDFCVPLFOKV-UHFFFAOYSA-M 0.000 claims description 3
- 229940113088 dimethylacetamide Drugs 0.000 claims description 3
- 150000002191 fatty alcohols Chemical class 0.000 claims description 3
- PZYDAVFRVJXFHS-UHFFFAOYSA-N n-cyclohexyl-2-pyrrolidone Chemical compound O=C1CCCN1C1CCCCC1 PZYDAVFRVJXFHS-UHFFFAOYSA-N 0.000 claims description 3
- BOWVQLFMWHZBEF-KTKRTIGZSA-N oleoyl ethanolamide Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)NCCO BOWVQLFMWHZBEF-KTKRTIGZSA-N 0.000 claims description 3
- 239000010695 polyglycol Substances 0.000 claims description 3
- 229920000151 polyglycol Polymers 0.000 claims description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 3
- BSIUFWMDOOFBSP-UHFFFAOYSA-N 2-azanylethanol Chemical compound NCCO.NCCO BSIUFWMDOOFBSP-UHFFFAOYSA-N 0.000 claims description 2
- 238000007598 dipping method Methods 0.000 claims description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 2
- 239000002244 precipitate Substances 0.000 claims 2
- 229910021653 sulphate ion Inorganic materials 0.000 claims 2
- 229910019142 PO4 Inorganic materials 0.000 claims 1
- 239000010452 phosphate Substances 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 38
- 229910052802 copper Inorganic materials 0.000 abstract description 38
- 239000010949 copper Substances 0.000 abstract description 38
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- 230000002950 deficient Effects 0.000 abstract description 4
- 239000000126 substance Substances 0.000 description 25
- 238000006243 chemical reaction Methods 0.000 description 19
- 230000035939 shock Effects 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 10
- 229920000742 Cotton Polymers 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 230000009471 action Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 238000007739 conversion coating Methods 0.000 description 4
- 239000007822 coupling agent Substances 0.000 description 4
- 238000005137 deposition process Methods 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 239000013049 sediment Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 150000004679 hydroxides Chemical class 0.000 description 2
- LSHROXHEILXKHM-UHFFFAOYSA-N n'-[2-[2-[2-(2-aminoethylamino)ethylamino]ethylamino]ethyl]ethane-1,2-diamine Chemical compound NCCNCCNCCNCCNCCN LSHROXHEILXKHM-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000012356 Product development Methods 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- YAMHXTCMCPHKLN-UHFFFAOYSA-N imidazolidin-2-one Chemical compound O=C1NCCN1 YAMHXTCMCPHKLN-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000005001 laminate film Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/4864—Cleaning, e.g. removing of solder
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/06—Hydroxides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
- H05K3/385—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by conversion of the surface of the metal, e.g. by oxidation, whether or not followed by reaction or removal of the converted layer
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/16—Metals
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0315—Oxidising metal
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Computer Hardware Design (AREA)
- Inorganic Chemistry (AREA)
- Power Engineering (AREA)
- Health & Medical Sciences (AREA)
- Emergency Medicine (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Detergent Compositions (AREA)
Abstract
Description
성분 | 조성율 |
모노에탄올아민 | 10 g/ℓ |
트리에탄올아민 | 5 g/ℓ |
테트라메틸암모늄하이드록사이드 | 200 g/ℓ |
글루콘산 소다 | 4 g/ℓ |
물 | 잔여량 |
성분 | 조성율 |
황산(98%) | 92 g/ℓ |
인산(70%) | 14 g/ℓ |
구연산 | 18 g/ℓ |
과산화수소(35%) | 45 g/ℓ |
2-이미다졸리디논 | 60 g/ℓ |
1H 벤조트리아졸 | 50 g/ℓ |
소듐실리케이트 | 5 g/ℓ |
피로갈롤 | 15 g/ℓ |
2-피롤리돈 | 0.05 g/ℓ |
DPTA-5Na | 2 g/ℓ |
물 | 잔여량 |
성분 | 조성율 |
모노에탄올아민 | 10 g/ℓ |
트리에탄올아민 | 5 g/ℓ |
N-메틸-2-피롤리돈 | 0.04 g/ℓ |
구연산 소다 | 3 g/ℓ |
물 | 잔여량 |
실시예 1 | 실시예 2 | 실시예 3 | 실시예 4 | ||
구리면 외관 | 어두운 갈색 | 어두운 갈색 | 어두운 갈색 | 어두운 갈색 | |
폴리이미드면 외관 | 색농도 증가 | 색농도 증가 | 색농도 증가 | 색농도 증가 | |
구리면 접착강도 | 0.68kgf/cm2 | 0.62kgf/cm2 | 0.58kgf/cm2 | 0.64kgf/cm2 | |
폴리이미드면 접착강도 | >1.25kgf/cm2 | >1.25kgf/cm2 | >1.25kgf/cm2 | >1.25kgf/cm2 | |
열충격구리면 | 라미네이트들뜸 | 없음 | 없음 | 없음 | 없음 |
라미네이트손상 | 없음 | 없음 | 없음 | 없음 | |
열충격폴리이미드면 | 라미네이트 들뜸 | 없음 | 없음 | 없음 | 없음 |
라미네이트손상 | 없음 | 없음 | 없음 | 없음 |
실시예 5 | 실시예 6 | 실시예 7 | 실시예 8 | ||
구리면 외관 | 어두운 갈색 | 어두운 갈색 | 어두운 갈색 | 어두운 갈색 | |
폴리이미드면 외관 | 색농도 증가 | 색농도 증가 | 색농도 증가 | 색농도증가 | |
구리면 접착강도 | 0.59kgf/cm2 | 0.56kgf/cm2 | 0.65kgf/cm2 | 0.59kgf/cm2 | |
폴리이미드면 접착강도 | >1.25kgf/cm2 | >1.25kgf/cm2 | >1.25kgf/cm2 | >1.25kgf/cm2 | |
열충격구리면 | 라미네이트들뜸 | 없음 | 없음 | 없음 | 없음 |
라미네이트손상 | 없음 | 없음 | 없음 | 없음 | |
열충격폴리이미드면 | 라미네이트 들뜸 | 없음 | 없음 | 없음 | 없음 |
라미네이트손상 | 없음 | 없음 | 없음 | 없음 |
실시예 9 | 비교예 | ||
구리면 외관 | 어두운 갈색 | 어두운 갈색 | |
폴리이미드면 외관 | 색농도 증가 | 변화없음 | |
구리면 접착강도 | 0.57kgf/cm2 | 0.69kgf/cm2 | |
폴리이미드면 접착강도 | >1.25kgf/cm2 | 0.32kgf/cm2 | |
열충격구리면 | 라미네이트 들뜸 | 없음 | 없음 |
라미네이트 손상 | 없음 | 없음 | |
열충격폴리이미드면 | 라미네이트 들뜸 | 없음 | 있음 |
라미네이트 손상 | 없음 | 있음 |
Claims (15)
- 아민류 5 내지 15 g/L;하이드록사이드 화합물 190 내지 210 g/L;세정 보조제 3 내지 6 g/L, 소포제 0.1 내지 5 g/L 및 침전물 방지제 1 내지 10 g/L 중 적어도 하나를 함유하는 첨가제; 및밸런스 성분으로서의 물;을 포함하는 것을 특징으로 하는 세정력과 폴리이미드면 접착력을 지닌 브라운 옥사이드 전처리제 조성물.
- 제 1항에 있어서,상기 아민류는 모노에탄올아민(monoethanolamine, MEA), 디에탄올아민(diethanolamine, DEA), 트리에탄올아민(triethanolamine, TEA), 2-아미노에탄올(2-aminoethanol), N,N-비스-2-하이드록시프로필에탄올아민(N,N-bis-2-hydroxypropylethanolamine), N-올레일에탄올아민(N-oleoylethanolamine) 및 이의 혼합물로 이루어진 그룹으로부터 선택되는 것을 특징으로 하는 세정력과 폴리이미드면 접착력을 지닌 브라운 옥사이드 전처리제 조성물.
- 제 1항에 있어서,하이드록사이드 화합물은 수산화나트륨(NaOH), 수산화칼륨(KOH), 수산화바륨(BaOH), 암모늄하이드록사이드, 테트라메틸암모늄하이드록사이드, 테트라에틸암모늄하이드록사이드, 테트라프로필암모늄하이드록사이드 및 이의 혼합물로 이루어진 그룹으로부터 선택되는 것을 특징으로 하는 세정력과 폴리이미드면 접착력을 지닌 브라운 옥사이드 전처리제 조성물.
- 제 1항에 있어서,상기 세정 보조제는 글루콘산 소다, 폴리글리콜(polyglycol), 에톡시지방산 알콜(ethoxylated fattyalcohol), 폴리에톡시모노알카놀아미드(polyethoxylated monoalkanolamide), 에톡시프로폭시글리콜(EO/PO block copolymer) 및 이의 혼합물로 이루어진 그룹으로부터 선택된 적어도 하나인 것을 특징으로 하는 세정력과 폴리이미드면 접착력을 지닌 브라운 옥사이드 전처리제 조성물.
- 제 1항에 있어서,상기 소포제는 알킬포스페이트(alkylphosphate) 또는 지방산 설페이트(fatty acid sulphate)인 것을 특징으로 하는 세정력과 폴리이미드면 접착력을 지닌 브라운 옥사이드 전처리제 조성물.
- 제 1항에 있어서,상기 침전물 방지제는 N-메틸-2-피롤리돈, N-시클로헥실-2-피롤리돈, 2-피롤리돈, 디메틸 포름아미드, 디메틸 아세트아미드, 테트라하이드로 퓨란, 아세토 니트릴, 디옥산, 알콜 및 이의 혼합물로 이루어진 그룹으로부터 선택되는 것을 특징으로 하는 세정력과 폴리이미드면 접착력을 지닌 브라운 옥사이드 전처리제 조성물.
- a) 세정력과 폴리이미드 계면 접착력을 지닌 브라운 옥사이드 전처리제 조성물로 인쇄회로기판을 처리하는 단계;b) 인쇄회로기판을 수세하는 단계;c) 인쇄회로기판을 예비-침적(Pre-Dip)하는 단계;d) 인쇄회로기판을 화성 피막 처리하는 단계;e) 인쇄회로기판을 수세하는 단계; 및f) 인쇄회로기판을 건조하는 단계;를 포함하는 것을 특징으로 하는 브라운 옥사이드 공정을 통한 폴리이미드면의 접착력 향상 방법.
- 제 7항에 있어서,상기 예비-침적 단계 후에 수세 단계를 더 포함하는 것을 특징으로 하는 브라운 옥사이드 공정을 통한 폴리이미드면의 접착력 향상 방법.
- 제 7항에 있어서,상기 세정력과 폴리이미드 계면 접착력을 지닌 브라운 옥사이드 전처리제 조성물의 인쇄회로기판에 대한 처리는 30 내지 90 ℃에서 10초 내지 10분간 수행되는 것을 특징으로 하는 브라운 옥사이드 공정을 통한 폴리이미드면의 접착력 향상 방법.
- 제 7항에 있어서,상기 a) 단계에서 사용되는 상기 세정력과 폴리이미드 계면 접착력을 지닌 브라운 옥사이드 전처리제 조성물은,아민류 5 내지 15 g/L;하이드록사이드 화합물 190 내지 210 g/L;세정 보조제 3 내지 6 g/L, 소포제 0.1 내지 5 g/L 및 침전물 방지제 1 내지 10 g/L 중 적어도 하나를 함유하는 첨가제; 및밸런스 성분으로서의 물;을 포함하는 것을 특징으로 하는 브라운 옥사이드 공정을 통한 폴리이미드면의 접착력 향상 방법.
- 제 10항에 있어서,아민류는 모노에탄올아민(monoethanolamine, MEA), 디에탄올아민(diethanolamine, DEA), 트리에탄올아민(triethanolamine, TEA), 2-아미노에탄올(2-aminoethanol), N,N-비스-2-하이드록시프로필에탄올아민 (N,N-bis-2-hydroxypropylethanolamine), N-올레일에탄올아민 (N-oleoylethanolamine) 및 이의 혼합물로 이루어진 그룹으로부터 선택되는 것을 특징으로 하는 브라운 옥사이드 공정을 통한 폴리이미드면의 접착력 향상 방법.
- 제 10항에 있어서,하이드록사이드 화합물은 수산화나트륨(NaOH), 수산화칼륨(KOH), 수산화바륨(BaOH), 암모늄하이드록사이드, 테트라메틸암모늄하이드록사이드, 테트라에틸암모늄하이드록사이드, 테트라프로필암모늄하이드록사이드 및 이의 혼합물로 이루어진 그룹으로부터 선택되는 것을 특징으로 하는 브라운 옥사이드 공정을 통한 폴리이미드면의 접착력 향상 방법.
- 제 10항에 있어서,상기 세정 보조제는 글루콘산 소다, 폴리글리콜(polyglycol), 에톡시지방산알콜(ethoxylated fattyalcohol), 폴리에톡시모노알카놀아미드(polyethoxylated monoalkanolamide), 에톡시프로폭시글리콜(EO/PO block copolymer) 및 이의 혼합물로 이루어진 그룹으로부터 선택된 적어도 하나인 것을 특징으로 하는 브라운 옥사이드 공정을 통한 폴리이미드면의 접착력 향상 방법.
- 제 10항에 있어서,상기 소포제는 알킬포스페이트(alkylphosphate) 또는 지방산 설페이트(fatty acid sulphate)인 것을 특징으로 하는 브라운 옥사이드 공정을 통한 폴리이미드면의 접착력 향상 방법.
- 제 10항에 있어서,상기 침전물 방지제는 N-메틸-2-피롤리돈, N-시클로헥실-2-피롤리돈, 2-피롤리돈, 디메틸포름아미드, 디메틸 아세트아미드, 테트라하이드로 퓨란, 아세토 니트릴, 디옥산, 알콜 및 이의 혼합물로 이루어진 그룹으로부터 선택되는 것을 특징으로 하는 브라운 옥사이드 공정을 통한 폴리이미드면의 접착력 향상 방법.
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KR1020030062235A KR100651366B1 (ko) | 2003-09-05 | 2003-09-05 | 세정력과 폴리이미드면 접착력을 지닌 브라운 옥사이드전처리제 조성물 및 브라운 옥사이드 공정을 통한폴리이미드면 접착력 향상 방법 |
CN200310120611A CN100575401C (zh) | 2003-09-05 | 2003-12-15 | 棕色氧化物预处理组合物及改进聚酰亚胺表面粘合性的方法 |
JP2004002248A JP4139781B2 (ja) | 2003-09-05 | 2004-01-07 | ブラウンオキサイド前処理剤組成物及びブラウンオキサイド工程によるポリイミド面の接着力向上方法 |
US10/758,320 US7084098B2 (en) | 2003-09-05 | 2004-01-15 | Brown oxide pretreatment composition for cleaning copper surface and improving adhesion of polyimide surface, and method for improving adhesion of polyimide surface by applying the same to brown oxide process |
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CN113980753A (zh) * | 2021-10-26 | 2022-01-28 | 江西超洋科技有限公司 | 一种新型膨松剂及其制备方法 |
KR20230130845A (ko) | 2022-03-04 | 2023-09-12 | 대덕전자 주식회사 | 회로기판 제조방법 |
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CN102168266B (zh) * | 2011-03-21 | 2013-01-23 | 东莞市富默克化工有限公司 | 一种适用于高温、无卤板材的电路板棕化液 |
CN102523692B (zh) * | 2011-12-30 | 2014-04-16 | 深圳崇达多层线路板有限公司 | 一种阶梯电路板制作工艺 |
CN110093600A (zh) * | 2018-05-29 | 2019-08-06 | 苏州铱诺化学材料有限公司 | 一种pcb棕化液及其制备方法 |
CN115477847B (zh) * | 2022-07-14 | 2023-08-11 | 上海优创化学品有限公司 | 一种组合物及其制备方法与应用 |
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FR1582144A (ko) * | 1968-06-24 | 1969-09-26 | ||
BE793854A (fr) * | 1972-01-10 | 1973-07-10 | American Home Prod | Compositions de nettoyage |
US4000082A (en) * | 1975-10-02 | 1976-12-28 | Basf Wyandotte Corporation | Defoaming compositions based on lithium salts |
US4276186A (en) * | 1979-06-26 | 1981-06-30 | International Business Machines Corporation | Cleaning composition and use thereof |
US4769170A (en) * | 1985-05-22 | 1988-09-06 | Mitsubishi Yuka Fine Chemicals Co., Ltd. | Washing solution for printing ink |
US4861518A (en) * | 1988-08-01 | 1989-08-29 | Ecolab Inc. | Non-filming high performance solid floor cleaner |
DE19507532C2 (de) * | 1995-03-03 | 2000-01-05 | Henkel Ecolab Gmbh & Co Ohg | Pastenförmiges Reinigungsmittel |
US5691288A (en) * | 1996-03-29 | 1997-11-25 | Bayer Corporation | Finisher-preserver-cleaner composition for lithographic printing plates |
US5977041A (en) * | 1997-09-23 | 1999-11-02 | Olin Microelectronic Chemicals | Aqueous rinsing composition |
US6309471B1 (en) * | 2000-04-14 | 2001-10-30 | Ecolab, Inc. | Rapid removal of iodine stains |
US6984269B2 (en) * | 2000-05-24 | 2006-01-10 | Imperial Chemical Industries Plc | Cleaning surfaces |
US6627587B2 (en) * | 2001-04-19 | 2003-09-30 | Esc Inc. | Cleaning compositions |
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Cited By (3)
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CN113980753A (zh) * | 2021-10-26 | 2022-01-28 | 江西超洋科技有限公司 | 一种新型膨松剂及其制备方法 |
CN113980753B (zh) * | 2021-10-26 | 2024-02-13 | 江西超洋科技有限公司 | 一种可用于高速板料和普通板料的膨松剂及其制备方法 |
KR20230130845A (ko) | 2022-03-04 | 2023-09-12 | 대덕전자 주식회사 | 회로기판 제조방법 |
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JP4139781B2 (ja) | 2008-08-27 |
US20050054548A1 (en) | 2005-03-10 |
KR100651366B1 (ko) | 2006-11-28 |
CN100575401C (zh) | 2009-12-30 |
CN1590438A (zh) | 2005-03-09 |
US7084098B2 (en) | 2006-08-01 |
JP2005082807A (ja) | 2005-03-31 |
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