KR20020067627A - Thermosetting epoxy resin composition, its formed article and multilayer printed circuit board - Google Patents

Thermosetting epoxy resin composition, its formed article and multilayer printed circuit board Download PDF

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KR20020067627A
KR20020067627A KR1020020007082A KR20020007082A KR20020067627A KR 20020067627 A KR20020067627 A KR 20020067627A KR 1020020007082 A KR1020020007082 A KR 1020020007082A KR 20020007082 A KR20020007082 A KR 20020007082A KR 20020067627 A KR20020067627 A KR 20020067627A
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epoxy resin
resin composition
thermosetting epoxy
thermosetting
composition
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KR100776725B1 (en
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기무라노리오
와타나베야스카즈
요네다나오키
나카이고신
오타쇼코
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타이요 잉크 메뉴펙츄어링 컴퍼니, 리미티드
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1433Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1488Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing phosphorus
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62Alcohols or phenols
    • C08G59/621Phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/49Phosphorus-containing compounds
    • C08K5/51Phosphorus bound to oxygen
    • C08K5/53Phosphorus bound to oxygen bound to oxygen and to carbon only
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/63Additives non-macromolecular organic
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Chemical & Material Sciences (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Epoxy Resins (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)

Abstract

PURPOSE: To provide a thermosetting epoxy resin composition satisfying heat resistance, electrical insulating characteristic, and at the same time adhesion strength of a conductive layer on a built-up multilayer printed wiring board, and also excellent in storage stability, its molding, and a build-up multilayer printed wiring board made therefrom and capable of complying to high density. CONSTITUTION: This thermosetting epoxy resin composition contains (A) an epoxy resin having at least two epoxy groups in a molecule, (B) a curing agent having a phenolic hydroxyl group, and (C) an imidazole compound having a hydroxyl group as a curing accelerator.

Description

열경화성 에폭시수지조성물과 그 성형체 및 다층프린트배선판{THERMOSETTING EPOXY RESIN COMPOSITION, ITS FORMED ARTICLE AND MULTILAYER PRINTED CIRCUIT BOARD}Thermosetting epoxy resin composition, its molded product and multilayer printed wiring board {THERMOSETTING EPOXY RESIN COMPOSITION, ITS FORMED ARTICLE AND MULTILAYER PRINTED CIRCUIT BOARD}

본발명은, 다층 프린트 배선판제조에 있어서 층간 수지절연재료나 솔더레지스트재료로서 유용한 열경화성 에폭시수지조성물 및 그것을 지지체상에 성막한 성형체, 및 이들을 사용하여 제작한 다층 프린트 배선판에 관한다.The present invention relates to a thermosetting epoxy resin composition useful as an interlayer resin insulating material or a solder resist material in the manufacture of a multilayer printed wiring board, a molded article formed on the support, and a multilayer printed wiring board produced using the same.

특히 빌드업 다층 프린트 배선판에 있어서, 내열성이나 전기절연 특성 및 도체층의 접착강도를 동시에 만족할 수 있는 열경화성 에폭시수지조성물과 그 성형체, 및 이들을 사용하여 제작한 도체회로의 고밀도화에 대응할 수 있는 빌드업 다층 프린트 배선판에 관한 것이다.In particular, in a build-up multilayer printed wiring board, a thermosetting epoxy resin composition capable of satisfying heat resistance, electrical insulation properties, and adhesive strength of a conductor layer at the same time, a build-up multilayer capable of coping with high density of a conductor circuit manufactured using the same, and a molded article thereof. It relates to a printed wiring board.

종래부터, 전자기기용의 다층 프린트 배선판으로서는, 회로형성된 내층회로판에, 글래스등의 기재에 에폭시수지와 디시안디아미드를 함침시켜 건조하여 이루어지는 프리프레그를 소정매수 포개고, 더욱이 필요에 따라서 동박등의 금속박을 그 한쪽 또는 양쪽에 적층하여, 고온(180℃전후)에서 여러시간 진공 프레스를 행하여 제작한 구리도금 적층판이 사용되고 있다.Conventionally, as a multilayer printed wiring board for electronic devices, a predetermined number of prepregs formed by impregnating an epoxy resin and dicyandiamide on a substrate such as glass and drying the inner layer circuit board formed with a circuit are stacked on a predetermined number of sheets, and further, a metal foil such as copper foil is applied as necessary. The copper plating laminated sheet produced by laminating | stacking on one or both sides and vacuum-pressing for several hours at high temperature (180 degreeC back and front) is used.

확실히, 이러한 에폭시와 디시안디아미드로 이루어지는 열경화성 조성물을 함침하여 이루어지는 프리프레그를 사용한 구리도포의 적층판은 내열성이나 내습성, 내클랙성, 가공성등의 프린트 배선판에 필요한 요구특성을 갖고 있다.Certainly, the laminated board of copper coating using the prepreg formed by impregnating the thermosetting composition which consists of such epoxy and dicyandiamide has the required characteristic for printed wiring boards, such as heat resistance, moisture resistance, crack resistance, and workability.

그렇지만, 근래의 다층 프린트 배선판에서는, 부품의 고밀도한 설치나 고집적화, 도체회로의 고밀도화, 경박단소화 등이 요구되고 있으며, 구리도포의 적층판으로는 이러한 요구에 대응하기 어려운 것이 실정이다.However, in recent multi-layer printed wiring boards, high-density installation and high integration of components, high density of conductor circuits, light and short reduction, and the like are required, and it is difficult to meet these demands with copper-clad laminates.

이에 대하여, 최근, 도체회로층과 층간절연층을 교대로 쌓아올리는 빌드업방식의 다층 프린트 배선판이 주목을 받고 있다.On the other hand, recently, the build-up multilayer printed wiring board which piles up a conductor circuit layer and an interlayer insulation layer attracts attention.

이 빌드업다층 프린트 배선판은, 층간절연층으로서, 프리프레그를 대신하여 에폭시 수지에 경화제나 필러등을 혼합한 수지조성물을 이용한 것이며, 층간절연층 형성방법으로서는, 스크린인쇄법,롤코팅법, 수지필름에 의한 라미네이트법 등을 들 수 있다.This build-up multi-layer printed wiring board uses a resin composition obtained by mixing a curing agent, a filler, or the like with an epoxy resin in place of the prepreg as an interlayer insulating layer, and a screen printing method, a roll coating method, a resin as a method of forming the interlayer insulating layer. Lamination method by a film, etc. are mentioned.

더욱이 최근, 동박위에 미리 수지조성물을 도포하고 반경화상태(B단계화)로 한 수지가 부착된 동박을 사용하여 빌드업하는 다층프린트 배선판의 제조방법도 채용되고 있다.Furthermore, in recent years, the manufacturing method of the multilayer printed wiring board which apply | coats a resin composition on copper foil previously, and builds up using copper foil with resin made into the semi-hardened state (B-stage) is also employ | adopted.

그렇지만, 이러한 빌드업다층 프린트 배선판은, 제조공정상, 고온(180℃ 전후)에서의 진공프레스가 불가능하기 때문에, 에폭시수지와 디시안디아미드로 이루어지는 열경화성 조성물로서는 반응이 느려 사용할 수 없다.However, such a buildup multilayer printed wiring board cannot be used as a thermosetting composition composed of epoxy resin and dicyandiamide because the vacuum press at a high temperature (around 180 ° C) is impossible in the manufacturing process.

이에 대하여, 에폭시수지에 디시안디아미드와 이미다졸화합물로 이루어지는 저온속 경화성의 경화제계를 사용하는 조성물이 제안되어 있다.On the other hand, the composition which uses the low temperature hardening | curing hardener system which consists of a dicyandiamide and an imidazole compound as an epoxy resin is proposed.

그렇지만, 이러한 경화제계에서는,이미다졸화합물이나 디시안디아미드를 분해하여, 급격히 에폭시와 반응한다. 그 때문에 수지절연층표면의 조도화(粗度化)처리에 의해 형성되는 층간절연수지의 표면 조도성이 안정하지 않고, 도체층과의 박리 강도가 불안정하여 확보하기 어렵고, 내열성시험에 있어서 박리 등이 발생한다고 하는 문제점이 있었다. 또한, 이러한 저온으로 경화속도가 빠른 경화제계의 조성물은, 보존안정성이 나쁘다. 그 때문에, 필름이나 수지부착 동박등의 사용형태로 사용하는 수지조성물에서는, 1액의 보존안정성이라도 필요하게 되며 그 점에서 문제가 되고 있다.However, in such a curing agent system, the imidazole compound and the dicyandiamide are decomposed and react with the epoxy rapidly. Therefore, the surface roughness of the interlayer insulating resin formed by the roughening treatment of the surface of the resin insulating layer is not stable, the peel strength with the conductor layer is unstable and difficult to ensure. There was a problem that this occurred. Moreover, the composition of the hardening | curing agent type | system | group which has a fast hardening rate at such low temperature is bad in storage stability. Therefore, in the resin composition used by the use form, such as a film and copper foil with resin, even one storage stability is required and it becomes a problem in that point.

본 발명은,상술한 바와 같은 종래 기술이 안고 있는 문제를 해소하기 위해 이루어진 것으로, 그 주된 목적은, 다층 프린트 배선판, 특히 빌드업다층 프린트배선판에 있어서, 내열성이나 전기절연 특성 및 도체층과의 접착강도를 동시에 만족하고 더구나 보존안정성이 뛰어난 열경화성 에폭시 수지조성물과 그 성형체 및 이들을 사용하여 제작한 도체회로의 고밀도화에 대응할 수 있는 다층 프린트 배선판을 제공하는 데에 있다.SUMMARY OF THE INVENTION The present invention has been made to solve the problems of the prior art as described above, and its main object is to provide heat resistance, electrical insulation properties, and adhesion to a conductor layer in a multilayer printed wiring board, particularly a buildup multilayer printed wiring board. The present invention provides a thermosetting epoxy resin composition that satisfies strength at the same time and has excellent storage stability, a molded article thereof, and a multilayer printed wiring board capable of coping with high density of conductor circuits produced using the same.

상기 목적을 달성하기 위해서, 본발명에 따르면, (A)1분자내에 2개이상의 에폭시기를 갖는 에폭시, (B)1분자내에 2개이상의 페놀성수산기를 갖는 경화제, 및 (C)경화촉진제로서 수산기 및 방향환을 갖는 이미다졸화합물을 포함하는 것을 특징으로 하는 열경화성 에폭시수지조성물이 제공된다. 바람직하게는, 상기 경화촉진제(C)로서는, 하기 일반식(1)으로 표시되는 이미다졸화합물이 사용된다.In order to achieve the above object, according to the present invention, (A) an epoxy having two or more epoxy groups in one molecule, (B) a curing agent having two or more phenolic hydroxyl groups in one molecule, and (C) a hydroxyl group as a curing accelerator There is provided a thermosetting epoxy resin composition comprising an imidazole compound having an aromatic ring. Preferably, as said hardening accelerator (C), the imidazole compound represented by following General formula (1) is used.

(식중,R1은 CH3또는 CH2OH를 나타낸다.)Wherein R 1 represents CH 3 or CH 2 OH.

또한, 바람직한 태양에 의하면, 본발명의 수지조성물은, 상기 에폭시수지(A)가, 1분자내에 1개 이상의 에폭시기를 갖는 에폭시수지에 미리 10-{2,5-디히드록시페닐) -10H-옥사포스페난스렌=l0-옥시드를 반응시켜 이루어지는 인함유 에폭시수지를 포함하는 것이 바람직하고, 그 인함유량은 1∼5질량 % 인 것이 보다 바람직하다.Moreover, according to a preferable aspect, the resin composition of this invention is 10- (2,5-dihydroxyphenyl) -10H- in the epoxy resin which the said epoxy resin (A) has one or more epoxy groups in 1 molecule previously. It is preferable to contain the phosphorus containing epoxy resin which reacts with oxaphosphene styrene = l0-oxide, and it is more preferable that the phosphorus content is 1-5 mass%.

다른 바람직한 태양에 의하면, 본발명의 수지조성물은, 상기 경화제(B)가,10- (2,5-디히드록시페닐) -10H-옥사포스페난스렌= 10-옥시드를 포함하는 것이 바람직하다.According to another preferred aspect, in the resin composition of the present invention, the curing agent (B) preferably contains 10- (2,5-dihydroxyphenyl) -10H-oxaphosphenanthrene = 10-oxide. .

더욱 바람직한 태양에 따르면, 본발명의 수지조성물은, 평균입자직경이 5μm이하의 무기충전재 및 /또는 유기충전재를 포함하는 것이 바람직하고, 그 함유량은, 조성물의 고형분에 대하여 40질량 %이하인 것이 보다 바람직하다.According to a further preferred aspect, the resin composition of the present invention preferably contains an inorganic filler and / or an organic filler having an average particle diameter of 5 μm or less, and more preferably 40 mass% or less with respect to the solid content of the composition. Do.

이러한 열경화성 에폭시수지조성물은 1액화가 가능하고, 이 수지조성물을 사용한 본발명의 성형체는,상술한 열경화성 에폭시조성물을 지지필름상에 도포건조하고, 필름화한 것, 또는 상술한 열경화성 에폭시수지조성물을 지지동박상에 도포건조하고, 수지부착 동박으로 한 것이다.The thermosetting epoxy resin composition can be liquefied in one liquid, and the molded article of the present invention using the resin composition is obtained by coating and drying the above-mentioned thermosetting epoxy composition on a support film and film-forming, or the above-mentioned thermosetting epoxy resin composition. It applied and dried on the support copper foil, and it was set as the resin foil with resin.

또한, 본발명의 다층 프린트 배선판은, 상술한 바와 같은 열경화성 에폭시조성물 또는 성형체를 사용하여 제작한 것이다.Moreover, the multilayer printed wiring board of this invention is produced using the thermosetting epoxy composition or molded object which were mentioned above.

본발명의 열경화성 에폭시조성물은,경화제(B)로서 2개이상의 페놀성수산기를 갖는 화합물을 포함하여, 경화촉진제(C)로서 수산기 및 방향환을 갖는 이미다졸화합물을 포함하는 점에 특징이 있다. 이 수산기및 방향환을 갖는 이미다졸화합물은, 분자내에 벤젠골격을 갖기 때문에 융점이 높고 (190℃이상), 또한 염기성이 낮기 때문에 열경화성 에폭시 수지조성물의 경화반응이 급격히 진행하는 일이 없고, 내부응력의 발생을 방지할 수 있기 때문에, 특성이 양호하고 안정한 층간절연층을 형성할 수가 있다. 더욱이 수산기 및 방향환을 갖는 이미다졸화합물을 경화촉진제로 한 열경화성수지조성물의 경화물로 이루어지는 층간 절연층 표면은, 친수성이 높아져, 균일한 조도화가 단시간에 가능해져, 도체층과의 안정된 박리 강도를 확보할 수 있으며 내열성 시험에 있어서도 박리등을 초래하는 일은 없다.The thermosetting epoxy composition of the present invention is characterized by including an imidazole compound having a hydroxyl group and an aromatic ring as the curing accelerator (C), including a compound having two or more phenolic hydroxyl groups as the curing agent (B). Since the imidazole compound having a hydroxyl group and an aromatic ring has a benzene skeleton in its molecule, its melting point is high (190 DEG C or higher) and its basicity is low, so that the curing reaction of the thermosetting epoxy resin composition does not proceed rapidly, and the internal stress is not increased. Can be prevented, so that an interlayer insulating layer having good characteristics and stable can be formed. Furthermore, the surface of the interlayer insulating layer made of a cured product of a thermosetting resin composition containing a hydroxyl group and an imidazole compound having an aromatic ring as a curing accelerator has high hydrophilicity, enabling uniform roughness in a short time, and stable peel strength with the conductor layer. It can be ensured and does not cause peeling or the like even in the heat resistance test.

또한, 배선판의 제조에 있어서는, 보통, 내부 스트레스완화를 위해 아닐처리가 행하여진다. 그 때, 디시안디아미드와 이미다졸화합물로 이루어지는 저온속 경화성의 경화제계에서는, 아닐에 의한 과도경화로 밀착강도의 저하를 초래한다. 그 점, 본발명의 경화제계에 따르면, 아닐에 의한 밀착강도의 저하는 없고, 친밀성 향상에 효과가 있다.In the manufacture of wiring boards, annealing is usually performed to alleviate internal stress. In that case, in the low temperature fast-curable hardening | curing agent system which consists of a dicyandiamide and an imidazole compound, the adhesive strength falls by the excessive hardening by an anil. In this regard, according to the curing agent system of the present invention, there is no decrease in the adhesion strength due to annealing, and it is effective in improving the intimacy.

더욱이 본발명의 열경화성 에폭시 수지조성물은, 에폭시의 경화반응이 급격히 진행되는 일이 없기 때문에, 1액화가 가능해져, 보존안정성이 뛰어나며, 필름또는 수지부착동박의 형태로도, 보존중에 반응이 진행되지 않고 안정한 배선판의 제조조건을 설정할 수 있다.Furthermore, the thermosetting epoxy resin composition of the present invention does not undergo rapid curing reaction of epoxy, so that it is possible to liquefy one liquid, and excellent in storage stability, and even in the form of a film or a resin-clad copper foil, the reaction does not proceed during storage. It is possible to set the manufacturing conditions of the stable wiring board without.

이하, 본발명의 열경화성 에폭시수지조성물의 각 구성성분에 대해 자세히 설명한다.Hereinafter, each component of the thermosetting epoxy resin composition of the present invention will be described in detail.

우선, 1분자내에 2개이상의 에폭시기를 갖는 에폭시(A)로서는, 비스페놀A형 에폭시수지(예를들면,저팬에폭시 레진(주)제 에피코트828, 다이니폰잉크화학(주)제 에피크론1050), 비스페놀A형 노볼락 에폭시수지, 비스페놀F형 에폭시수지(예를들면 다이니폰잉크화학(주)제 에피크론830, 도토화성(주)제 YDF-20,-0l), 비스페놀S형 에폭시수지(예를 들면, 다이니폰잉크화학(주)제 에피크론EXA-1514), 페놀 노볼락형 에폭시수지(예를들면, 저팬에폭시 레진(주)제 에피코트152,154),크레졸 노볼락형 에폭시수지(예를 들면, 다이니폰잉크화학(주)제 에피크론N-660, N-673, N-695),비페닐형 에폭시(예를 들면, 저팬에폭시레진(주)제 에피코트YX-4000) 나프탈렌형 에폭시수지(예를 들면, 다이니폰잉크화학(주)제 HP-4032), 디시크로펜타디엔형 에폭시수지(예를 들면, 다이니폰잉크화학(주)제 HP-7200), N-글리시딜형 에폭시수지, 지환(脂環)식 에폭시수지등의 에폭시수지, 트리글리시딜 이소시아누레이트, 우레탄변성 에폭시수지, 고무변성 에폭시수지(예를 들면, 일본조달(曹達)(주)제 BF-1000,이데미쓰석유화학(주)제 Poly bd R-45EPI,도토화성(주)제YR-450,다이셀화학공업(주)제 에포리트PB-36 00,PB-4700등),상기 에폭시수지에 브롬이나 인화합물을 부가한 것 등 공지의 에폭시수지를 사용할 수 있지만, 이들로 한정되는 것이 아니며, 또한 여러 종류를 동시에 사용하여도 지장이 없다.First, as an epoxy (A) having two or more epoxy groups in one molecule, bisphenol A type epoxy resins (e.g., Epicoat 828 manufactured by Japan Epoxy Resin Co., Ltd., Epiklon 1050 manufactured by Dainippon Ink Chemical Co., Ltd.) , Bisphenol A type novolac epoxy resin, bisphenol F type epoxy resin (e.g., Epiclon 830 manufactured by Dainippon Ink Chemical Co., Ltd., YDF-20, -0l manufactured by Doto Chemical Co., Ltd.), bisphenol S type epoxy resin ( For example, Epiclon EXA-1514 manufactured by Dainippon Ink and Chemicals Co., Ltd., a phenol novolak-type epoxy resin (e.g., Epicoat 152,154 manufactured by Japan Epoxy Resin Co., Ltd.), cresol novolac-type epoxy resin (e.g. For example, Dinipon Ink Chemical Co., Ltd. Epikron N-660, N-673, N-695), Biphenyl type epoxy (for example, Epi-epoxy resin Co., Ltd. Epicoat YX-4000) Naphthalene type Epoxy resin (for example, HP-4032 by Dainippon Ink and Chemicals Co., Ltd.), dicyclopentadiene type epoxy resin (for example, Dainippon Ink and Chemicals Co., Ltd. H P-7200), epoxy resins such as N-glycidyl epoxy resins and alicyclic epoxy resins, triglycidyl isocyanurate, urethane-modified epoxy resins, rubber-modified epoxy resins (e.g., Japanese procurement) (Current) BF-1000, Poly bd R-45EPI manufactured by Idemitsu Petrochemical Co., Ltd., YR-450 manufactured by Tohwa Chemical Co., Ltd., Eporit PB-36 00, manufactured by Daicel Chemical Industries, Ltd. PB-4700 and the like) and known epoxy resins such as those obtained by adding bromine or phosphorus compounds to the epoxy resins can be used, but are not limited to these, and there are no problems in using several kinds at the same time.

1분자내에 2개이상의 페놀성수산기를 갖는 경화제(B)로서는, 페놀노볼락수지(예를 들면, 메이와화성(주)제 H-1), 크레졸 노볼락수지, 아랄킬 페놀 수지(예를 들면, 미쓰이화학(주)제 XL225), 테르펜페놀수지(예를 들면, 저팬에폭시 레진(주)제 에퓨아MP402), 나프톨변성 페놀수지(예를 들면,일본가야쿠(주)제 가야큐아NHN),디시클로펜타디엔변성 페놀 수지(예를 들면, 니폰세키유화학공업(주)제 DDP-M), 비스페놀A형 노볼락페놀수지(예를 들면, 메이와화성(주)제 BPA-D), 아미노트리아진노볼락수지(예를 들면, 다이니폰잉크화학공업(주)제 ATN 수지)등의 공지의 페놀수지나 4-히드록시스티렌의 공중합물등을 사용할 수 있겠지만, 이들로 한정하는 것은 아니다. 페놀성수산기함유 인화합물로서는 10-(2,5-디히드록시페닐) -10 H-옥사 포스페난스렌 = 10-옥시드(예를 들면, 산코(주)제 HCA-HQ)를 사용할 수 있다.As a hardening | curing agent (B) which has two or more phenolic hydroxyl groups in 1 molecule, a phenol novolak resin (for example, Maywa Chemical Co., Ltd. H-1), a cresol novolak resin, an aralkyl phenol resin (for example, , Mitsui Chemical Co., Ltd. XL225), terpene phenol resin (e.g., Epua MP402 by Japan Epoxy Resin Co., Ltd.), naphthol-modified phenolic resin (e.g., Kayakua NHN manufactured by Nippon Kayaku Co., Ltd.) , Dicyclopentadiene-modified phenol resin (e.g., DDP-M manufactured by Nippon Seki Chemical Co., Ltd.), bisphenol A novolac phenol resin (e.g., Mewa Chemical Co., Ltd. BPA-D) Although well-known phenol resins, such as an amino triazine novolak resin (For example, ATN resin by Dainippon Ink and Chemicals, Inc.), copolymers of 4-hydroxy styrene etc. can be used, it is not limited to these. As the phenolic hydroxyl group-containing phosphorus compound, 10- (2,5-dihydroxyphenyl) -10H-oxa phosphenanthrene = 10-oxide (for example, HCA-HQ manufactured by Sanco Co., Ltd.) can be used. .

이들 페놀성수산기를 갖는 경화제(B)는 수종류를 동시에 사용하여도 지장없다.The hardening | curing agent (B) which has these phenolic hydroxyl groups does not interfere even if it uses several types simultaneously.

이 경화제(B)의 사용량은, 에폭시수지(A)속의 에폭시기 l.0당량에 대하여 페놀성 수산기 함유의 수산기가 0.2∼1.3당량 범위인 것이 바람직하다. 그 이유는, 경화제가 0.2당량미만의 첨가량에서는 미반응의 에폭시기가 많고 내열성이 저하되며, 한편 1.3당량을 넘는 첨가량에서는 미반응의 수산기가 많이 잔존하며, 절연성의 저하등을 초래하기 쉽기때문에 바람직하지 못하다.As for the usage-amount of this hardening | curing agent (B), it is preferable that the hydroxyl group containing a phenolic hydroxyl group is 0.2-1.3 equivalent range with respect to the epoxy group 1.0 equivalent in epoxy resin (A). The reason for this is that the addition amount of the curing agent is less than 0.2 equivalent, because the unreacted epoxy group has a large number of unreacted epoxy groups and the heat resistance is lowered. Can not do it.

경화촉진제로서의 수산기 및 방향환을 갖는 이미다졸화합물(C)의 구체예로서는, 상기 일반식(1)으로 나타내지는 2-페닐-4,5-디히드록시메틸이미다졸(예: 시코쿠화성공업(주)제 2 PHZ), 2-페닐-4-메틸5-히드록시메틸이미다졸:(예, 시코쿠화성공업(주)제 2P4 MHZ)등을 들 수 있다.As a specific example of the imidazole compound (C) which has a hydroxyl group and an aromatic ring as a hardening accelerator, 2-phenyl-4, 5- dihydroxy methylimidazole represented by the said General formula (1) (for example, Shikoku Kogyo Co., Ltd. ( Note 2) PHZ), 2-phenyl-4-methyl5-hydroxymethylimidazole: (e.g., 2P4 MHZ manufactured by Shikoku Kagaku Kogyo Co., Ltd.) and the like.

이들의 경화촉진제는, 단독 또는 2종이상을 합쳐서 사용할 수가 있다.These hardening accelerators can be used individually or in combination of 2 or more types.

이 경화촉진제(C)의 첨가량은, 에폭시수지(A)에 대하여 0.5∼10질량%의 범위로 하는 것이 바람직하다. 이 이유는, 0.5질량%보다 적으면 에폭시수지의 경화부족이 되며, 한편, 10질량%을 넘으면 너무 경화하여 취약해지기 쉽기 때문에 바람직하지 못하다.It is preferable to make the addition amount of this hardening accelerator (C) into 0.5-10 mass% with respect to an epoxy resin (A). This reason is not preferable because less than 0.5% by mass leads to insufficient curing of the epoxy resin, while when it exceeds 10% by mass, it is too hard to be easily vulnerable.

이러한 본발명의 열경화성 에폭시조성물에는, 필요에 따라서, 평균입자직경이 5μm 이하의 무기충전재 및/또는 유기충전재를 배합할 수 있다. 그 함유량은 40 질량%이하, 보다 바람직하게는 30질량% 이하로 하는 것이 바람직하다. 이 충전재의 첨가에 의해, 레이저구멍을 뚫는 성능이 뛰어난 열경화성 에폭시수지조성물이나 그 성형체를 얻을 수 있다.The thermosetting epoxy composition of this invention can mix | blend an inorganic filler and / or an organic filler with an average particle diameter of 5 micrometers or less as needed. Its content is 40 mass% or less, More preferably, it is desirable to set it as 30 mass% or less. By adding this filler, the thermosetting epoxy resin composition excellent in the laser hole perforation performance, and its molded object can be obtained.

이 무기충전재 및/또는 유기충전재는, 평균입자직경이 5μm을 넘으면 수지절연층 표면화 조도화 형상이 안정되지 않고, 한편,함유량이 수지조성물중40질량%를 넘으면, 탄산 가스 (CO2)레이저로 형성되는 작은 직경 비아의 형상이 나빠져, 도금부착 회전성이 나쁘고, 접속신뢰성에 문제가 생기며, 또한 레이저가공속도를 떨어뜨리는 등 생산성에서도 바람직하지 못하다.The inorganic filler and / or the organic filler is not stabilized when the average particle diameter exceeds 5 μm, and the surface roughness of the resin insulating layer is not stabilized. On the other hand, when the content exceeds 40 mass% in the resin composition, the carbon dioxide (CO 2 ) laser is used. The shape of the small-diameter vias to be formed is deteriorated, so that the plating adhesion is poor, problems in connection reliability are caused, and the productivity of the laser beam is lowered.

무기충전재로서는, 예를 들면, 황산바륨, 탄산칼슘,탄산마그네슘,산화마그네슘,수산화알루미늄, 수산화마그네슘,티탄산바륨,산화규소가루,구(球)형상 실리카,무정형 실리카, 타르크,클레이,운모가루등을 사용할 수 있다. 또 유기충전재로서는, 예를 들면, 실리콘 파우더나, 나이론 파우더, 불소파우더,우레탄파우더,미리 경화한 에폭시수지의 가루체,가교 아크릴 폴리머미립자, 멜라민수지,구아나민수지, 요소수지,이들의 아미노수지를 열경화 시킨후 미세하게 분쇄한 것등을 들 수 있다.Examples of the inorganic fillers include barium sulfate, calcium carbonate, magnesium carbonate, magnesium oxide, aluminum hydroxide, magnesium hydroxide, barium titanate, silicon oxide powder, spherical silica, amorphous silica, tark, clay, and mica powder. Etc. can be used. As organic fillers, for example, silicone powder, nylon powder, fluorine powder, urethane powder, powder of precured epoxy resin, crosslinked acrylic polymer fine particles, melamine resin, guanamine resin, urea resin, and these amino resins And finely ground after thermal curing.

또, 무기 충전재 및/또는 유기충전재는, 이들로 한정되는 것이 아니라, 또한 수종류를 동시에 사용하여도 지장이 없다.In addition, an inorganic filler and / or an organic filler is not limited to these, Moreover, even if several kinds are used simultaneously, it does not interfere.

더욱 본발명의 수지조성물에서는, 필요에 따라서, 레드(Red)인이나 3산화 안티몬,오산화안티몬등의 난연조제,오르펜이나 벤톤등의 증점제,실리콘계나 불소계,고분자계의 소포제 및 /또는 레벨링제, 이미다졸계나 티아졸계, 트리아졸계,실란커플링제등의 밀착성부여제같은 첨가제를 사용할 수가 있다.Furthermore, in the resin composition of the present invention, if necessary, flame retardants such as red phosphorus, antimony trioxide, antimony pentoxide, thickeners such as orphen or benton, antifoaming agents of silicon, fluorine, polymer and / or leveling agent, Additives, such as adhesive imparting agents, such as an imidazole series, a thiazole series, a triazole series, and a silane coupling agent, can be used.

더욱이 필요에 따라서, 프탈로시아닌·블루,프탈로시아닌·그린, 아이오딘·그린,저팬 디스아조이엘로우, 산화티타늄, 카본 블랙,염료등의 공지공용의 착색제를 사용할 수 있다.Furthermore, if necessary, known common colorants such as phthalocyanine blue, phthalocyanine green, iodine green, Japan disazo yellow, titanium oxide, carbon black, and dyes can be used.

또, 이러한 첨가제에 있어서도, 고체형상의 것에 관해서는, 상술한 이유에 의해 평균입자덩어리를 5μm이하로 하는 것이 바람직하다.Moreover, also in such an additive, it is preferable to make an average particle mass 5 micrometers or less about the solid form thing for the reason mentioned above.

더욱 본발명의 수지조성물은 액상화를 위한 혹은 각종 도포공정에 맞춰 점도조정을 위한 유기용제를 사용하여 희석할 수가 있다.Further, the resin composition of the present invention can be diluted using an organic solvent for liquefaction or viscosity adjustment in accordance with various coating processes.

유기용제로서는, 공지관용의 용제, 예를들면 아세톤, 메틸에틸케톤,시클로헥사논등의 케톤류, 초산에틸, 초산부틸, 셀로솔브아세테이트, 프로필렌글리콜모노메틸에테르아세테이트, 칼비톨 아세테이트등의 초산 에스테르류, 셀로솔브, 부틸셀로솔브등의 셀로솔브류,칼비톨,부틸칼비톨등의 칼비톨류,톨루엔,크실렌등의 방향족탄화수소 외에, 디메틸 포름아미드, 디메틸아세토아미드, N-메틸피롤리돈등의 극성 용매류를 단독 또는 2종 이상 조합시켜 사용할 수 있다.Examples of the organic solvent include solvents known in the art, such as acetone, methyl ethyl ketone, ketones such as cyclohexanone, ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate, and carbitol acetate In addition to aromatic hydrocarbons, such as cellosolves such as cellosolves, butyl cellosolves, carbitols such as carbitol and butyl carbitol, toluene and xylene, dimethyl formamide, dimethylacetoamide, and N-methylpyrrolidone Polar solvents can be used individually or in combination of 2 or more types.

이어서, 본발명의 열경화성 에폭시수지조성물 또는 그 성형체를 사용한 다층 프린트 배선판에 대해 설명한다.Next, the multilayer printed wiring board using the thermosetting epoxy resin composition of this invention or its molded object is demonstrated.

(1)열경화성 에폭시조성물에 의한 층간절연층의 형성(1) formation of interlayer dielectric layers with thermosetting epoxy compositions

먼저, 본발명의 열경화성 에폭시수지조성물을, 내층도체회로를 형성한 절연기재상에 스크린인쇄, 커튼코트법,롤코트법,스프레이 코트법등 공지의 방법을 사용하여 도포하고, 건조한다. 이 때의 건조조건은 사용하는 용제에 의해 다르지만, 일반적으로 약60∼150℃에서 5∼60분의 범위에서 선택된다.First, the thermosetting epoxy resin composition of the present invention is applied and dried on an insulating substrate on which an inner conductor circuit is formed, using known methods such as screen printing, curtain coating, roll coating, and spray coating. Drying conditions at this time vary depending on the solvent used, but are generally selected in the range of 5 to 60 minutes at about 60 to 150 ° C.

이어서, 건조후, 필요에 따라서 열경화를 행하고, 층간절연층을 형성한다. 이 때의 열경화조건은 약130℃∼200℃에서 약15∼90분 범위에서 선택된다.Subsequently, after drying, thermosetting is performed as necessary to form an interlayer insulating layer. The thermosetting conditions at this time are selected in about 15 to 90 minutes at about 130 to 200 ℃.

(2)열경화성 에폭시수지조성물의 성형체에 의한 층간절연층의 형성(2) Formation of interlayer insulating layer by molded body of thermosetting epoxy resin composition

①성형체의 조제① Preparation of moldings

성형체를 구성하는 수지조성물에는, 기계적강도, 가소성을 향상시키는 성분으로서 본발명의 수지조성물을 구성하는 (A)성분이외에 페녹시수지, 폴리아크릴수지, 폴리이미드수지,폴리아미드이미드수지, 폴리시아네이트수지, 폴리에스테르수지, 폴리페닐에테르수지등을 배합할 수가 있다.The resin composition constituting the molded body includes a phenoxy resin, a polyacrylic resin, a polyimide resin, a polyamideimide resin, and a polycyanate, in addition to the component (A) constituting the resin composition of the present invention as a component that improves mechanical strength and plasticity. Resin, polyester resin, polyphenyl ether resin and the like can be blended.

이들 수지는 2종 이상을 조합시켜 사용할 수도 있다.These resin can also be used in combination of 2 or more type.

이러한 본발명의 열경화성 에폭시조성물은, 소정의 유기용제로 희석되며 필름코터등으로 지지 필름 또는 동박등의 지지금속박상에 도포하고, 건조되며, 필름형상의 성형체 또는 수지부착 동박이 제작된다.The thermosetting epoxy composition of the present invention is diluted with a predetermined organic solvent, coated on a support metal foil such as a support film or copper foil with a film coater, dried, and a film-shaped molded article or resin-clad copper foil is produced.

여기서, 지지 필름으로서는, 폴리에틸렌, 폴리프로필렌,폴리에틸렌테레프탈레이트등의 폴리에스테르, 폴리카보네이트등을 들 수 있다. 지지금속박으로서는, 동박등을 들 수 있다.Here, as a support film, polyester, such as polyethylene, a polypropylene, polyethylene terephthalate, polycarbonate, etc. are mentioned. Copper foil etc. are mentioned as support metal foil.

또, 이러한 지지체는, 각종 전처리(맛드, 코로나처리) 를 하더라도 좋으며, 지지체의 두께는 5∼100μm가 일반적이다.In addition, such a support may be subjected to various pretreatments (made, corona treatment), and the thickness of the support is generally 5 to 100 m.

또한, 이 성형체는, 보호 필름등으로 점착보호되며, 시트형상 또는 롤형상으로 보관되는 것이 바람직하다.Moreover, it is preferable that this molded object is tack-protected by a protective film etc. and stored in a sheet form or a roll form.

② 필름형상 성형체에 의한 층간절연층의 형성② Formation of Interlayer Insulation Layer by Film Shaped Molded Body

먼저, 상술한 바와 동일하게 하여 조제한 필름형상 성형체를, 내층도체회로를 형성한 절연기재상에, 가열감압하에서 라미네이트하여 맞붙인다. 더욱이 가압함으로써 기판의 평활성이 증가된다.라미네이트조건으로서는, 온도70∼150℃로, 압착압력약0.1∼20MPa가 일반적이다.First, the film-form molded product prepared in the same manner as described above is laminated on the insulating substrate on which the inner layer conductor circuit is formed and laminated under heating and reduced pressure. Further, the pressurization increases the smoothness of the substrate. As the lamination conditions, the compression pressure of about 0.1 to 20 MPa is common at a temperature of 70 to 150 ° C.

이어서, 라미네이트후, 필요에 따라서 열경화를 행하고, 층간절연층을 형성한다.Subsequently, after lamination, thermosetting is performed as necessary to form an interlayer insulating layer.

이 때의 열경화조건은 약130℃∼200℃로 약15∼90분의 범위에서 선택된다.The thermosetting conditions at this time are about 130 to 200 degreeC, and are selected in the range of about 15 to 90 minutes.

또, 수지부착 동박을 사용하는 배선판의 방법에 대해 후술한다.In addition, the method of the wiring board using the copper foil with resin is mentioned later.

(3) 빌드업배선판의 제조(3) Manufacture of build-up wiring board

우선, 상술한 바와 동일하게 하여 형성한 층간절연층의 소정위치에, 스루 홀및 바이아홀부를 드릴 또는 레이저로 구멍을 뚫고 이어서, 절연층표면을 조도화제(粗度化劑) 처리하여 미세한 요철을 형성한다. 이 때 필요에 따라서 조도화제 처리전에 접착성을 안정시키기 위하여 퍼프에 의한 물리연마를 하더라도 좋다.First, through-holes and via-holes are drilled or laser-punched at predetermined positions of the interlayer insulating layer formed in the same manner as described above, and then the surface of the insulating layer is treated with a roughening agent to remove minute irregularities. Form. At this time, if necessary, physical polishing with puff may be performed to stabilize the adhesiveness before the roughening agent treatment.

여기서, 절연층표면의 조도화방법으로서는, 절연층이 형성된 기판을 산화제등의 용액중에 침지시키거나 산화제등의 용액을 스프레이하는 등의 수단에 의해서 실시할 수 있다.Here, as a method of roughening the surface of the insulating layer, the substrate on which the insulating layer is formed can be immersed in a solution such as an oxidant, or sprayed by a solution such as an oxidant.

또한, 각종 플라즈마처리등으로 실시할 수도 있다. 또한 이들의 처리는 병용사용하여도 좋다. 또, 조도화제의 구체예로서는, 중크롬산염, 과망간산염, 오존, 과산화 수소/황산, 초산등의 산화제, N-메틸-2-피롤리돈, N, N-디메틸포름아미드, 메톡시프로판올등의 유기용제, 또한 가성소다, 가성칼리등의 알카리성 수용액, 황산, 염산등의 산성수용액을 사용할 수 있다.It may also be carried out by various plasma treatments. In addition, these treatments may be used in combination. Moreover, as a specific example of a roughening agent, organic materials, such as dichromate, permanganate, ozone, oxidizing agents, such as hydrogen peroxide / sulfuric acid, acetic acid, N-methyl- 2-pyrrolidone, N, N- dimethylformamide, methoxypropanol, Solvents, and alkaline aqueous solutions, such as caustic soda and caustic acid, and acidic aqueous solutions, such as a sulfuric acid and hydrochloric acid, can be used.

이어서, 증착, 스퍼터링, 이온플레이팅등의 건식도금, 또는 무전해·전해도금 등의 습식도금에 의해 도체층을 형성하고 패턴에칭으로 도체회로를 형성한다. 혹은 또, 도체층과는 반대패턴의 도금레지스트를 형성하고 무전해도금만으로 도체층을 형성하더라도 좋다.Subsequently, the conductor layer is formed by dry plating such as vapor deposition, sputtering, ion plating, or wet plating such as electroless plating or electroless plating, and a conductor circuit is formed by pattern etching. Alternatively, a plating resist having a pattern opposite to that of the conductor layer may be formed, and the conductor layer may be formed only by electroless plating.

이렇게하여 도체회로를 형성한 기판은, 필요에 따라서 아닐처리함으로써, 열경화성수지의 경화가 진행하고, 도체층의 박리 강도를 더욱 향상시킬수 있다.In this way, the substrate on which the conductor circuit is formed is subjected to annealing, if necessary, so that curing of the thermosetting resin proceeds and the peeling strength of the conductor layer can be further improved.

그리고 더욱이, 필요에 따라서 이들의 공정을 수회 되풀이하는 것에 의해, 소망의 다층 프린트 배선판을 얻는다.Furthermore, by repeating these processes several times as necessary, a desired multilayer printed wiring board is obtained.

(3')수지부착 동박에 의한 빌드업배선판의 제조(3 ') Production of build-up wiring boards with resin-clad copper foil

먼저,상기(2)에서 조제한 수지부착 동박을, 내층회로가 형성된 기판상에 진공프레스로 적층하여, 소정의 스루홀 및 바이아홀부를 드릴 또는 레이저로 구멍을 뚫고,스루홀 및 바이어홀내를 데스미아처리하여, 미세한 요철을 형성한다. 이 요철의 형성방법은, 상술한 층간절연층의 조도화방법과 마찬가지이다.First, the resin-clad copper foil prepared in the above (2) is laminated on the substrate on which the inner layer circuit is formed by a vacuum press, and drills or drills a predetermined through hole and a via hole with a drill or a laser, and the inside of the through hole and the via hole is desmia. Treatment to form fine unevenness. The formation method of this unevenness is the same as that of the roughening method of the interlayer insulation layer mentioned above.

이어서, 증착, 스퍼터링, 이온플레이팅등의 건식도금, 혹은 무전해·전해도금등의 습식도금에 의해 도체층을 형성하여, 패턴에칭으로 도체회로를 형성한다.Subsequently, the conductor layer is formed by dry plating such as vapor deposition, sputtering, ion plating, or wet plating such as electroless plating or electroless plating to form a conductor circuit by pattern etching.

이렇게하여 도체회로를 형성한 기판은, 필요에 따라서 아닐처리함으로써, 열경화성수지의 경화가 진행되고, 도전층의 박리 강도를 더욱 향상시킬 수 있다.In this way, the substrate on which the conductor circuit is formed is subjected to annealing, if necessary, so that curing of the thermosetting resin proceeds and the peeling strength of the conductive layer can be further improved.

그리고 더욱이 필요에 따라서 이들의 공정을 수회 되풀이하고, 더욱이 최바깥층 회로형성이 종료한 후, 열경화성 에폭시조성물로 이루어지는 솔더레지스트를, 스크린인쇄법에 의한 패턴인쇄 및 열경화에 의해, 또는 커튼코트법, 롤코트법,스프레이 코트법등에 의한 전면 인쇄 및 열경화후, 레이저에 의해 패턴을 형성함으로써 소망의 다층 프린트 배선판을 얻는다.Furthermore, if necessary, these processes are repeated several times, and after completion of the outermost layer circuit formation, the solder resist made of the thermosetting epoxy composition is subjected to pattern printing and thermosetting by screen printing, or to curtain coating, After the whole surface printing and thermosetting by the roll coat method, the spray coat method, etc., a pattern is formed by a laser and a desired multilayer printed wiring board is obtained.

[실시예]EXAMPLE

이하,실시예 및 비교예를 나타내며 본발명에 대해 구체적으로 설명하지만, 본발명이 하기실시예로 한정되는 것은 아니다.Hereinafter, although an Example and a comparative example are shown and this invention is demonstrated concretely, this invention is not limited to the following Example.

(합성예 1)Synthesis Example 1

1ℓ의 플라스크속에 10-(2,5-디히드록시 페닐)-10 H-옥사포스페난스렌=옥시드-10(산코(주)제,HCA-HQ)324g, 칼비톨아세테이트200g, DEN431(다우케미칼일본사제)525g,에피코트828 (저팬 에폭시 레진(주)제)380g, 트리페닐포스핀1g를 넣어,150℃에서 100분간 반응시켰다. 생성한 인함유 에폭시수지의 에폭시당량은 415g/eq이며, 인함유율은 2.5질량%였다.324 g of 10- (2,5-dihydroxy phenyl) -10H-oxaphosphenanthrene = oxide-10 (made by Sanko Co., Ltd., HCA-HQ), 200 g of calbitol acetate, DEN431 (Dow) in 1 L of flask 525 g of Chemical Japan Co., Ltd., 380 g of Epicoat 828 (manufactured by Japan Epoxy Resin Co., Ltd.), and 1 g of triphenylphosphine were added and allowed to react at 150 ° C for 100 minutes. The epoxy equivalent of the produced phosphorus containing epoxy resin was 415g / eq, and phosphorus content was 2.5 mass%.

이하, 이 수지를 인함유 에폭시A라 칭한다.Hereinafter, this resin is called phosphorus containing epoxy A.

(실시예1∼8 및 비교예1∼3)(Examples 1 to 8 and Comparative Examples 1 to 3)

먼저, 실시예 l∼8 및 비교예1∼3의 열경화성 에폭시조성물을, 표1에 나타낸 성분조성(질량부)으로 각 성분과 용제등을 용해기로 혼합하고, 3개의 롤밀로 균일분산시킨 후, 희석용제로 점도조정을 하여 제작했다.First, the components of the thermosetting epoxy compositions of Examples 1 to 8 and Comparative Examples 1 to 3 are mixed in a component (mass part) shown in Table 1 with a dissolving agent, and uniformly dispersed in three roll mills. It was produced by adjusting the viscosity with a diluent solvent.

이어서, 이렇게 해서 제작한 열경화성 에폭시수지조성물을, 내층회로가 형성된 FR-4내층(코어두께0.5mm, 동박두께18μm)기판상에, 스크린인쇄로 도포하고, l10℃에서 20분 건조후, 150℃ 30분 경화시켜, 층간절연층을 형성했다.Subsequently, the thermosetting epoxy resin composition thus prepared was applied onto the FR-4 inner layer (core thickness 0.5 mm, copper foil thickness 18 μm) substrate on which the inner layer circuit was formed by screen printing, and dried at l10 ° C. for 20 minutes, and then 150 ° C. It hardened | cured for 30 minutes, and the interlayer insulation layer was formed.

그리고, 층간절연층의 소정위치에 드릴 또는 레이저에 의해 구멍을 뚫어 알카리성수용액과용제의 혼합물로써 팽윤시킨 후, 알카리성 과망간산염수용액, 계속해서 환원제로써 처리하고, 조도화처리를 행하였다.Then, a hole was drilled at a predetermined position of the interlayer insulating layer with a drill or a laser to swell with a mixture of an alkaline aqueous solution and a solvent, and then treated with an alkaline permanganate aqueous solution, followed by a reducing agent, and subjected to a roughening treatment.

그 후, 무전해동도금 및 전해동도금으로써 구리두께35μm의 도체층을 형성하고, 다시 150℃에서 60분간 아닐처리를 행하여, 다층 프린트 배선판을 제작했다.Then, the conductor layer of 35 micrometers in thickness of copper was formed by electroless copper plating and electrolytic copper plating, and further annealing was performed at 150 degreeC for 60 minutes, and the multilayer printed wiring board was produced.

(실시예9 및 10)(Examples 9 and 10)

먼저 실시예9 및 10의 열경화성 에폭시수지조성물을, 표 1 에 나타낸 성분조성(질량부)으로 각 성분과 용제등을 용해기로 혼합하고 3개의 롤밀로 균일분산시킨 후, 희석용제로 점도조정을 하여 제작했다.First, the thermosetting epoxy resin compositions of Examples 9 and 10 were mixed with a dissolving agent in a component composition (mass part) shown in Table 1 by dissolving with three roll mills, and then the viscosity was adjusted with a diluting solvent. Made.

이어서, 이렇게 해서 제작한 열경화성 에폭시수지조성물을 지지 필름에 도포건조하고 필름화한 성형체를, 내층회로가 형성된FR-4내층(코아두께0.5mm, 동박두께18μm)기판상에 진공 라미네이터에 의해 양면동시에 라미네이트하고, 150℃에서 30분 경화시켜, 층간절연층을 형성했다. 이 때의 라미네이트조건은, 온도80℃, 압력1MPa, 25초간의 프레스로 했다.Subsequently, the thermosetting epoxy resin composition thus produced was applied and dried on a supporting film, and the molded product formed on the substrate was formed on both sides of a FR-4 inner layer (core thickness 0.5 mm, copper foil thickness 18 μm) by a vacuum laminator on a substrate having an inner layer circuit. It laminated and hardened at 150 degreeC for 30 minutes, and formed the interlayer insulation layer. The lamination conditions at this time were made into the press of temperature 80 degreeC, pressure 1 MPa, and 25 second.

그리고, 층간절연층의 소정위치에 드릴 또는 레이저에 의해 구멍을 뚫어, 알카리성수용액과 용제의 혼합물로써 팽윤시킨후,알카리성 과망간산염수용액, 계속해서 환원제로 처리하고, 조도화제처리를 행하였다.Then, a hole was drilled at a predetermined position of the interlayer insulating layer by a drill or a laser and swollen with a mixture of an alkaline aqueous solution and a solvent, and then treated with an alkaline permanganate aqueous solution and a reducing agent, followed by a roughening agent treatment.

그 후, 무전해동도금 및 전해동도금으로써 구리두께35μm의 도체층을 형성하고, 다시 150℃에서 60분간 아닐처리를 행하여 다층 프린트 배선판을 제작했다.Thereafter, a conductor layer having a copper thickness of 35 µm was formed by electroless copper plating and electrolytic copper plating, and annealing was further performed at 150 ° C. for 60 minutes to produce a multilayer printed wiring board.

(실시예11 및 12)(Examples 11 and 12)

먼저,실시예 l1및 l2의 열경화성 에폭시조성물은, 표 1 에 나타내는 성분조성(질량부)으로 각 성분과 용제등을 용해기로 혼합하고, 3개의 롤밀로 균일분산시킨 후, 희석용제로 점도조정을 하여 제작했다.First, in the thermosetting epoxy compositions of Examples l1 and l2, the components (mass parts) shown in Table 1 are mixed with dissolving components, solvents and the like by dissolving them, and then uniformly dispersed in three roll mills. Made by.

이어서, 이렇게 해서 제작한 열경화성 에폭시수지조성물을 지지동박상에 도포건조하여 얻어진 성형체를, 내층회로가 형성된 FR-4내층(코아두께0.5mm, 동박두께18μm)기판상의 양면에 수지층이나 기판측이 되도록 적층하고, 압력2.5 MPa,온도170℃에서 l시간의 열프레스를 하여 수지부착 동박층을 형성했다.Subsequently, the molded product obtained by applying and drying the thermosetting epoxy resin composition thus prepared on a supporting copper foil was formed on both sides of the FR-4 inner layer (core thickness 0.5 mm, copper foil thickness 18 μm) substrate having an inner layer circuit. The resin layer was laminated so as to form a resin foil layer with a heat press for 1 hour at a pressure of 2.5 MPa and a temperature of 170 ° C.

그리고, 수지부착 동박층의 소정위치에 드릴 또는 레이저에 의해 구멍을 뚫어 데스미아처리를 한 후 동도금을 하여 구리두께 35μm의 도전층을 형성하고, 다층 프린트 배선판을 제작했다.Then, a hole was drilled at a predetermined position of the resin-clad copper foil layer by a drill or a laser and subjected to desmia treatment, followed by copper plating to form a conductive layer having a copper thickness of 35 μm, thereby producing a multilayer printed wiring board.

상기와 동일하게 하여 제작한 각 실시예 및 각 비교예의 열경화성 에폭시수지 조성물 및 다층 프린트 배선판에 대하여 후술하는 내용의 평가를 했다.The below-mentioned content was evaluated about the thermosetting epoxy resin composition and multilayer printed wiring board of each Example and each comparative example produced in the same manner to the above.

그 결과를 표 2에 나타낸다.The results are shown in Table 2.

한편, 표1중의 각 화합물의 상세는 이하와 같다.In addition, the detail of each compound of Table 1 is as follows.

에피코트828, 에피코트1010:비스페놀A형 에폭시수지,저팬 에폭시 레진 (주)제Epicoat 828, Epicoat 1010: Bisphenol A epoxy resin, Japan epoxy resin Co., Ltd.

에피코트5051:브롬화 비스페놀 A형 에폭시수지,저팬에폭시레진(주)제Epicoat 5051: brominated bisphenol A epoxy resin, Japan epoxy resin Co., Ltd.

에피코트YX-4000 H:비페닐형 에폭시수지, 저팬 에폭시 레진(주)제Epicoat YX-4000H: Biphenyl type epoxy resin, Japan epoxy resin

에피코트 157S70:비스페놀A형 노볼락 에폭시수지,저팬에폭시레진(주)제Epicoat 157S70: bisphenol A novolac epoxy resin, Japan epoxy resin

에피크론l53:브롬화 비스페놀A형 에폭시수지,다이니폰잉크화학(주)제Epicron l53: brominated bisphenol A epoxy resin, manufactured by Dainippon Ink and Chemicals Co., Ltd.

에피크론N-690:크레졸노볼락형 에폭시수지, 다이니폰잉크가가쿠(주)제Epiclone N-690: Cresol novolac epoxy resin, made by Dainippon Ink & Chemicals Co., Ltd.

Poly bd R-45 EPI:말단수산기함유분자내 에폭시화물,이데미쓰석유화학 (주)제Poly bd R-45 EPI: Epoxide in end hydroxyl group-containing molecule, manufactured by Idemitsu Petrochemical Co., Ltd.

인함유수지 A:합성예1에서 조제한 것Resin-containing resin A: Prepared in Synthesis Example 1.

쇼놀BRG-556:페놀노볼락수지, 쇼와고분자(주)제Shonol BRG-556: Phenolic novolac resin, Showa Polymer Co., Ltd. product

BPA-D:비스페놀A노볼락수지,메이와가세이(주)제BPA-D: bisphenol A novolac resin, manufactured by Meiwa Kasei Co., Ltd.

HCA-HQ:10-(2, 5-디히드록시페닐)-10H-옥사포스페난스렌=10-옥시드,산코(주)제HCA-HQ: 10- (2,5-dihydroxyphenyl) -10H-oxaphosphenanthrene = 10-oxide, manufactured by Sanko Co., Ltd.

2PHZ:2-페닐-4,5-디히드록시메틸이미다졸, 시코쿠화성공업(주)제2PHZ: 2-phenyl-4,5-dihydroxymethylimidazole, the Shikoku Chemical Co., Ltd. make

2P4MZ: 2-페닐-4-메틸-5-히드록시메틸이미다졸, 시코쿠화성공업(주)제2P4MZ: 2-phenyl-4-methyl-5-hydroxymethylimidazole, the Shikoku Chemical Co., Ltd. make

2E4MZ:2-에틸-4-메틸이미다졸,시코쿠화성공업(주)제2E4MZ: 2-ethyl-4-methylimidazole, manufactured by Shikoku Chemical Industry Co., Ltd.

2MZ-A:2,4-디아미노-6-(2'-메틸이미다졸(1'))-에틸-s-트리아딘,시코쿠화성공업(주)제2MZ-A: 2,4-diamino-6- (2'-methylimidazole (1 '))-ethyl-s-triadine, manufactured by Shikoku Kagaku Kogyo Co., Ltd.

하이디라이트H-42M:수산화알루미늄, 쇼와전공(주)제Heidilite H-42M: Aluminium hydroxide, made by Showa Electric Co., Ltd.

조성(질량부)Composition (mass part) 실시예Example 비교예Comparative example 1One 22 33 44 55 66 77 88 99 1010 1111 1212 1One 22 33 (A)성분(A) ingredient 에피코트828Epicoat828 7070 7070 7070 2020 2020 7070 7070 7070 에피크론153Epicron153 3030 3030 3030 3030 3030 2020 2020 3030 3030 3030 에피코트5051Epicoat5051 3030 3030 3030 3030 에피코트1010Epicoat 1010 1515 1515 1515 1515 에피코트YX-4000HEpicoat YX-4000H 3030 3030 에피크로N-690Epicro N-690 3535 3535 3535 3535 에피코트157S70Epicoat157S70 7070 7070 7070 인함유 수지APhosphorus Resin A 100100 7070 Poly bd R-45EPIPoly bd R-45EPI 2020 2020 2020 2020 2020 2020 2020 2020 (B)성분(B) ingredient 쇼놀BRG-556Shonol BRG-556 5050 5050 5050 6060 4040 2525 2626 3838 3030 2727 2020 BPA-DBPA-D 6060 HCA-HQHCA-HQ 1010 1010 1010 (C)성분(C) component 2PHZ2PHZ 1One 1One 1One 1One 1One 1One 1One 1One 1One 1One 1One 2P4MZ2P4MZ 1One 기타성분Other Ingredients 디시안디아미드Dicyandiamide 55 55 55 2E4MZ2E4MZ 55 2MZ-A2MZ-A 55 황산바륨Barium sulfate 2020 2020 2020 2020 하이디라이트H-42MHeidi Light H-42M 3030 3030 3030

시험항목Test Items 실시예Example 비교예Comparative example 1One 22 33 44 55 66 77 88 99 1010 1111 1212 1One 22 33 형태shape 액상Liquid 액상Liquid 액상Liquid 액상Liquid 액상Liquid 액상Liquid 액상Liquid 액상Liquid 건조필름Dry film 건조필름Dry film 수지부착동박Resin Copper Foil 수지부착동박Resin Copper Foil 액상Liquid 액상Liquid 액상Liquid 1액조성물의보존안정성Preservation stability of 1 liquid composition -- -- -- -- ×× ×× 성형체의 보존안정성Storage stability of the molded body -- -- -- -- -- -- -- -- -- -- -- 반응속도Reaction speed ×× ×× ×× 경화성Curable ×× 조도화형상Roughness -- -- -- ×× ×× 아닐후의 벗겨짐Peeling off radish radish radish radish radish radish radish radish radish radish -- -- -- U U 박리 강도(N/om)Peel Strength (N / om) 1212 1313 1212 1212 1212 1212 1212 1111 1111 1111 1515 1515 -- 33 55 땜납내열성Solder Heat Resistance -- ×× ×× 전기절연특성Electrical Insulation Characteristics --

상기 표 2 중의 각 평가항목의 측정방법은 이하와 같다.The measuring method of each evaluation item of the said Table 2 is as follows.

(1) 1액 조성물의 보존안정성:(1) Storage stability of the one-component composition:

20℃에서 보관한 1액조성물을 콘플레이트형 점도계(25℃,5rpm)로 점도를 측정하여,2개월후의 점도변화가 20%이내를 O, 20%를 넘는 경우를 ×로 한다.The viscosity of the one-liquid composition stored at 20 ° C. was measured with a cone plate viscometer (25 ° C., 5 rpm), and a case where the viscosity change after 2 months was less than 20% and more than 20% was ×.

(2)성형체의 보존안정성:(2) Preservation stability of moldings:

10℃이하에서 보관한 성형체의 150℃의 열반상에서의 수지의 겔타임(JIS C2105에 준거)를 측정하고, 2개월후의 겔타임 변화가 20% 이내를○, 20%를 넘는 경우를 x로 한다.The gel time (according to JIS C2105) of resin on 150 degreeC hotbed of the molded object stored below 10 degreeC is measured, and the case where the gel time change after 2 months is less than 20% and more than 20% is x. .

(3)반응속도:(3) Reaction rate:

l 액 수지조성물시의 l50℃의 열반상에서의 수지의 겔타임(JIS C6521에 준거)를 측정했다. 판정기준은 이하의 대로이다.The gel time (based on JIS C6521) of resin in the hotbed at l50 degreeC at the time of liquid resin composition was measured. Judgment criteria are as follows.

O:3∼20분O: 3 to 20 minutes

x:3분미만 또는 20분 초과x: less than 3 minutes or more than 20 minutes

(4)경화성:(4) Curability:

150℃ 30분간 가열했을 때의 경화성으로 평가했다.It evaluated by sclerosis | hardenability when heating at 150 degreeC for 30 minutes.

판정기준은 이하와 같다.Judgment criteria are as follows.

○:표면의 끈적임 없음○: no stickiness of the surface

×:표면의 끈적임 있음X: There is stickiness of the surface

(5)조도화형상:(5) roughness:

조도화처리후의 표면외관을 현미경으로 관찰하여 평가했다.The surface appearance after the roughening treatment was evaluated by observing with a microscope.

○:조도화형상(앵커)이 형성되었다.(Circle): The roughening shape (anchor) was formed.

×:조도화형상이 형성되지 않았다.X: The roughening shape was not formed.

(6)아닐후의 박리:(6) Peeling after annealing:

150℃에서 60분간 아닐후, 수지층과 도체층간의 박리의 유무에 의해서 평가했다.After annealing at 150 ° C. for 60 minutes, evaluation was made based on the presence or absence of peeling between the resin layer and the conductor layer.

(7)박리 강도:(7) peeling strength:

각 실시예 및 각 비교예로 얻어진 다층 프린트 배선판의 동베타 필 강도측정용For measuring the beta peel strength of the multilayer printed wiring board obtained in each example and each comparative example

패턴을 1cm폭으로 벗겨, JIS C6481L에 준하여 필 강도(N/Cm)를 측정했다.The pattern was peeled off at 1 cm width, and peel strength (N / Cm) was measured according to JIS C6481L.

(8)땜납 내열성:(8) Solder Heat Resistance:

각 실시예및 각 비교예에서 얻어진 다층 프린트 배선판에, 로진계플럭스(flus)를 도포하여 260℃의 땜납조에 60초간 침지한 후 셀로판첨착테이프에 의한 필링시험을 한 후의 도막상태를 평가했다.After the rosin-type flux was apply | coated to the multilayer printed wiring board obtained by each Example and each comparative example, it immersed in the solder bath at 260 degreeC for 60 second, and the coating film state after the peeling test with a cellophane adhesion tape was evaluated.

0:필링후에 도막에 변화가 없는 것0: No change in coating after peeling

x:필링후에 박리가 생기는 것.x: Peeling after peeling.

(9)전기절연특성(9) Electrical insulation

IPC B-25 B쿠폰의 빗살형상 전극에, 인가전압 DC12V를 인가하여, 85℃,85%RH의 항온항습조에 l000시간 넣은 후, 인가전압 DC500V를 1분 인가한 후의 절연저항치를 측정했다.The applied voltage DC12V was applied to the comb-shaped electrode of IPC B-25B coupon, and it put in the constant temperature and humidity chamber of 85 degreeC and 85% RH for l000 hours, and measured the insulation resistance after applying the applied voltage DC500V for 1 minute.

O:절연저항이 l.0×108Ω 이상O: Insulation resistance l.0 × 10 8 Ω or more

x:절연저항이 1.0×108Ω 미만x: Insulation resistance is less than 1.0 × 10 8 Ω

(실시예13)(Example 13)

비스페놀 A형 에폭시수지(저팬에폭시레진(주)제;에피코트828)80.0질량부, 비페놀형 에폭시수지(저팬에폭시레진(주)제; YX-4000)20.0질량부,페놀 노볼락수지(쇼와고분자(주)제;BRG-556) 60.0질량부, 말단수산기분자내 에폭시화물(이데미쓰석유화학사(주)제; Poly bd R-45 EPI) 20.0질량부, 이미다졸화합물(시코쿠화성공업(주)제; 큐아졸2PHZ)1.0질량부, 경질탄산 칼슘10.0 질량부를 칼비톨아세테이트 40질량부에서 녹인 열경화성 에폭시수지조성물을 제작하였다.80.0 parts by mass of bisphenol A type epoxy resin (manufactured by Japan Epoxy Resin Co., Ltd .; epicoat 828), 20.0 parts by mass of biphenol type epoxy resin (manufactured by Japan Epoxy Resin Co., Ltd .; YX-4000), phenol novolac resin (Show 60.0 parts by mass of wa polymer (BG-556), 20.0 parts by mass of epoxide in terminal hydroxyl group molecule (manufactured by Idemitsu Petrochemical Co., Ltd .; Poly bd R-45 EPI), imidazole compound (Shikoku Chemical Co., Ltd.) The thermosetting epoxy resin composition which melt | dissolved 1.0 mass part of curazole 2PHZ) and 10.0 mass parts of hard calcium carbonates in 40 mass parts of carbitol acetate was produced.

이 열경화성 에폭시조성물을 내층회로가 형성된 FR-4내층(공기두께0.5mm,동박두께18μm)기판상에 스크린인쇄법으로써 도포후, 1l0℃×20분 건조하여, l50℃×30분으로 경화하고, 두께60μm의 절연수지층을 형성한 기판을 제작했다. 또한, 이 기판에 관해서는, 80℃의 팽윤액에 5분간 침지하여 수세하고, 이어서, 80℃의 조도화액에 10분간 침지하여 수세하고, 더욱이 환원액에 50℃에서 5분간 침지하여 수세함으로써, 절연수지층표면을 조도화했다. 그 후, 무전해동도금 및 전해동도금으로 구리두께35μm의 도체층을 형성하고, 다시 150℃에서 60분간 아닐처리를 하여 다층 프린트 배선판을 제작했다. 또, 평가기판에 사용하는 빗살형전극패턴이나 땜납 내열성 측정용패턴은, 에칭레지스트를 사용하여 형성했다.The thermosetting epoxy composition was applied onto the FR-4 inner layer (air thickness: 0.5 mm, copper foil thickness: 18 μm) substrate on which the inner layer circuit was formed by screen printing, and then dried at 10 ° C. × 20 minutes, and cured at l50 ° C. × 30 minutes. The board | substrate which formed the insulation resin layer of 60 micrometers in thickness was produced. In addition, this substrate is immersed in an 80 ° C swelling solution for 5 minutes and washed with water, then immersed in an 80 ° C roughening solution for 10 minutes and washed with water, and further immersed in a reducing solution at 50 ° C for 5 minutes, and washed with water. The surface of the insulating resin layer was roughened. After that, a conductor layer having a copper thickness of 35 µm was formed by electroless copper plating and electrolytic copper plating, and further subjected to annealing at 150 ° C. for 60 minutes to produce a multilayer printed wiring board. In addition, the comb-tooth shaped electrode pattern and the solder heat resistance measuring pattern used for an evaluation board | substrate were formed using the etching resist.

(실시예14)Example 14

실시예13의 열경화성 에폭시수지조성물에 있어서 경질탄산 칼슘을 제외한것 이외는, 실시예13과 동일하게 하여 다층 프린트 배선판을 제작하였다.A multilayer printed wiring board was produced in the same manner as in Example 13 except that the hard calcium carbonate was removed from the thermosetting epoxy resin composition of Example 13.

(실시예15)Example 15

비스페놀A형 에폭시수지(저팬 에폭시 레진(주)제; 에피코트828) 80.0질량부,비페놀형 에폭시수지(저팬 에폭시 레진(주)제;YX-4000)20.0질량부,페놀노볼락수지 (쇼와고분자(주)제; BRG-556) 60.0질량부,페놀성 말단수산기 분자내 에폭시화물(미쓰이석유화학사(주)제; Poly bd R-45 EPI) 20.0질량부, 이미다졸화합물(시코쿠화성공업(주)제;큐아졸2P4MZ)1.0 질량부, 경질탄산 칼슘10.0질량부를 칼비톨아세테이트 40질량부에 녹인 열경화성 에폭시수지조성물을 제작하고, 실시예13과 동일하게 하여 다층 프린트 배선판을 제작하였다.80.0 parts by mass of bisphenol A type epoxy resin (manufactured by Japan Epoxy Resin Co., Ltd .; Epicoat 828), 20.0 parts by mass of nonphenol type epoxy resin (manufactured by Japan Epoxy Resin Co., Ltd .; YX-4000), phenol novolac resin (Show 60.0 parts by mass of Wako Molecular Co., Ltd .; BRG-556), 20.0 parts by mass of phenolic terminal hydroxyl group intramolecular epoxide (manufactured by Mitsui Petrochemical Co., Ltd .; Poly bd R-45 EPI), imidazole compound (Shikoku Chemical Industry Co., Ltd. product; Curazole 2P4MZ) A thermosetting epoxy resin composition obtained by dissolving 1.0 part by mass and 10.0 parts by mass of hard calcium carbonate in 40 parts by mass of carbitol acetate was prepared.

(실시예16)Example 16

비스페놀A형 에폭시수지(저팬 에폭시 레진(주)제; 에피코트828)80.0질량부,비페놀형 에폭시수지(저팬에폭시레진)(주)제; YX-4000)20.0질량부,페놀노볼락수지(쇼와고분자(주)제; BRG-556) 40.0질량부, 페놀성수산기함유 인화합물(산코(주) ; HCA-HQ) 20.0질량부, 말단수산기분자내 에폭시화물(이데미쓰석유화학사(주)제; Poly bd R-45 EPI) 20.0질량부, 이미다졸화합물(시코쿠화성공업(주)제; 큐아졸2PHZ)1.0질량부, 경질탄산 칼슘10.0질량부를 배합하고,칼비톨아세테이트40질량부에 녹인 열경화성 에폭시수지조성물을 제작하고, 실시예13과 같은 다층 프린트 배선판을 제작했다.Bisphenol-A epoxy resin (made by Japan Epoxy Resin Co., Ltd .; Epicoat 828) 80.0 mass parts, Biphenol-type epoxy resin (Japan Epoxy Resin) Co., Ltd. make; YX-4000) 20.0 parts by mass, 40.0 parts by mass of phenol novolak resin (manufactured by Showa Polymer Co., Ltd .; BRG-556), 20.0 parts by mass of a phenolic hydroxyl group-containing phosphorus compound (Sanko Co., Ltd .; HCA-HQ) 20.0 parts by mass of epoxide in hydroxyl group molecule (manufactured by Idemitsu Petrochemical Co., Ltd .; Poly bd R-45 EPI), imidazole compound (manufactured by Shikoku Kagyo Kogyo Co., Ltd .; curazole 2PHZ) 1.0 parts by mass, hard calcium carbonate 10.0 The mass part was mix | blended, the thermosetting epoxy resin composition melt | dissolved in 40 mass parts of calbitol acetate was produced, and the multilayer printed wiring board like Example 13 was produced.

(실시예17)(Example 17)

합성예 1에서 제작한 인함유 에폭시수지 A80.0질량부, 비페놀형 에폭시수지(저팬에폭시레진)(주)제;YX-4000)20.0질량부,페놀노볼락수지(쇼와고분자(주)제; BRG-556)30.0질량부, 말단수산기분자내 에폭시화물 (이데미쓰석유화학사(주)제; Poly bd R-45 EPI)20.0질량부, 이미다졸화합물(시코쿠화성공업(주) 제:큐아졸2P4MZ) 1.0질량부, 경질탄산 칼슘10.0질량부를 칼비톨아세테이트 40질량부에 녹인 열경화성 에폭시수지조성물을 제작하고, 실시예13과 동일하게 하여 다층 프린트 배선판을 제작했다.Phosphorus-containing epoxy resin A80.0 parts by mass produced in Synthesis Example 1, non-phenol type epoxy resin (Japan Epoxy Resin Co., Ltd.); YX-4000) 20.0 parts by mass, phenol novolac resin (Showa Polymer Co., Ltd.) BRG-556) 30.0 parts by mass, epoxide in terminal hydroxyl group molecule (manufactured by Idemitsu Petrochemical Co., Ltd .; Poly bd R-45 EPI) 20.0 parts by mass, imidazole compound (Shikoku Chemical Co., Ltd.) A thermosetting epoxy resin composition in which 1.0 part by mass of azole 2P4MZ) and 10.0 parts by mass of hard calcium carbonate were dissolved in 40 parts by mass of carbitol acetate were prepared, and a multilayer printed wiring board was prepared in the same manner as in Example 13.

(실시예18)(Example 18)

비스페놀 A형 페녹시수지(도토화성(주)제; YP-50)30.0질량부, 페놀노볼락형 에폭시수지(저팬에폭시레진)(주)제; 에피코트152)30.0질량부,비페놀형 에폭시수지(저팬 에폭시 레진 (주)제; YX-4000)30.0질량부, 페놀노볼락수지 (쇼와고분자(주)제; BRG-556)35.0질량부, 이미다졸화합물(시코쿠화성공업(주)제;큐아졸2PHZ)10.0질량부, 경질탄산 칼슘10.0 질량부를, 프로필렌 글리콜모노메틸 에테르 아세테이트에 녹인 열경화성 에폭시수지조성물을 제작했다.Bisphenol A-type phenoxy resin (made by Doto Chemical Co., Ltd .; YP-50) 30.0 mass parts, Phenol novolak-type epoxy resin (Japan epoxy resin) Co., Ltd. agent; Epicoat 152) 30.0 parts by mass, nonphenol-type epoxy resin (manufactured by Japan Epoxy Resin Co., Ltd .; YX-4000), 30.0 parts by mass, phenol novolac resin (Showa Polymer Co., Ltd .; BRG-556) 35.0 parts by mass A thermosetting epoxy resin composition was prepared by dissolving 10.0 parts by mass of an imidazole compound (manufactured by Shikoku Chemical Co., Ltd .; Cuazole 2PHZ) and 10.0 parts by mass of hard calcium carbonate in propylene glycol monomethyl ether acetate.

이 열경화성 에폭시조성물을 두께38μm의 폴리에틸렌테레프탈레이트필름상에, 건조후 두께가 60μm이 되도록 도포하여, 110℃∼150℃에서 잔여용제량이 2질량 % 이하가 되는 접착필름을 얻었다. 얻어진 접착 필름을, 내층회로가 형성된 FR-4내층(코아두께0.5 mm, 동박두께 l 8μm)기판상에 진공 라미네이터로 70℃로 라미네이트하고, 실시예13과 같은 조건으로, 열경화하고 조도화한 후, 무전해동도금 및 전해동도금으로써 구리두께 35μm의 도체층을 형성하고, 다시 150℃에서 60분 아닐처리를 행하고, 다층 프린트 배선판을 제작하였다.This thermosetting epoxy composition was applied onto a polyethylene terephthalate film having a thickness of 38 µm so as to have a thickness of 60 µm after drying, thereby obtaining an adhesive film having a residual amount of 2 mass% or less at 110 ° C to 150 ° C. The obtained adhesive film was laminated at 70 ° C. with a vacuum laminator on a FR-4 inner layer (core thickness 0.5 mm, copper foil thickness 8 μm) substrate on which an inner layer circuit was formed, and thermally cured and roughened under the same conditions as in Example 13. Thereafter, a conductor layer having a copper thickness of 35 µm was formed by electroless copper plating and electrolytic copper plating, and further subjected to annealing at 150 ° C. for 60 minutes to prepare a multilayer printed wiring board.

또, 평가기판에 사용하는 빗살형 전극패턴이나 땜납 내열성측정용 패턴은, 에칭레지스트를 사용하여 형성했다.In addition, the comb-tooth shaped electrode pattern and the solder heat resistance measurement pattern used for an evaluation board | substrate were formed using the etching resist.

(실시예19)Example 19

실시예18의 열경화성 에폭시수지조성물을, 두께18μm의 동박 조도화 면에 건조후 두께80μm가 되도록 도포하고, 130℃∼150℃로 건조하여, 수지부착 동박을 제작했다.The thermosetting epoxy resin composition of Example 18 was applied to a copper foil roughened surface having a thickness of 18 μm so as to have a thickness of 80 μm, and dried at 130 ° C. to 150 ° C. to prepare a copper foil with a resin.

이 수지부착 동박을 내층회로가 형성된 FR-4내층 (코아두께0,5mm, 동박두께18μm)기판상에 진공프레스로 170℃에서 1시간 열프레스하여, 수지부착 동박층을 형성했다. 더욱이 전해도금을 행하고 구리두께 35μm의 도체층을 형성하고 다층 프린트 배선판을 제작했다.The resin-clad copper foil was heat-pressed at 170 ° C. for 1 hour by vacuum press on a FR-4 inner layer (core thickness 0.5 mm, copper foil thickness 18 μm) on which an inner layer circuit was formed, thereby forming a resin-clad copper foil layer. Furthermore, electroplating was carried out, the conductor layer of 35 micrometers in copper thickness was formed, and the multilayer printed wiring board was produced.

또,평가기판에 사용하는 빗살형전극패턴이나 땜납 내열성측정용패턴을 에칭레지스트를 사용하여 형성했다.Moreover, the comb-tooth shaped electrode pattern and the solder heat resistance measuring pattern used for an evaluation board | substrate were formed using the etching resist.

(비교예4)(Comparative Example 4)

실시예13의 열경화성 에폭시조성물에 있어서 이미다졸화합물을 큐아졸2E4MZ (시코쿠화성공업(주)제)로 바꾼 이외는, 실시예13과 동일하게 하여 기판을 제작했다.In the thermosetting epoxy composition of Example 13, a substrate was produced in the same manner as in Example 13, except that the imidazole compound was changed to Qazole 2E4MZ (manufactured by Shikoku Chemical Industry Co., Ltd.).

(비교예5)(Comparative Example 5)

실시예13의 열경화성 에폭시수지조성물에 있어서 이미다졸화합물을 큐아졸C11Z(시코쿠화성공업(주)제)로 바꾼 이외는, 실시예13과 마찬가지로 하여 기판을 제작했다.In the thermosetting epoxy resin composition of Example 13, a substrate was produced in the same manner as in Example 13, except that the imidazole compound was changed to Qazole C 11 Z (manufactured by Shikoku Chemical Industry Co., Ltd.).

(비교예6)(Comparative Example 6)

실시예13의 열경화성 에폭시수지조성물에 있어서 이미다졸화합물을 큐아졸2MHZ (시코쿠화성공업(주)제)로 바꾼것 이외는, 실시예 l3과 동일하게 하여 기판을 제작했다.In the thermosetting epoxy resin composition of Example 13, a substrate was produced in the same manner as in Example l3, except that the imidazole compound was changed to Cazole 2MHZ (manufactured by Shikoku Chemical Industry Co., Ltd.).

(비교예7)(Comparative Example 7)

실시예17의 열경화성 에폭시조성물에 있어서 이미다졸화합물을 큐아졸2E4MZ(시코쿠화성공업(주)제)로 바꾼것 이외는, 실시예16과 동일하게 하여 기판을 제작했다.In the thermosetting epoxy composition of Example 17, a substrate was prepared in the same manner as in Example 16, except that the imidazole compound was changed to Curezol 2E4MZ (manufactured by Shikoku Chemical Industry Co., Ltd.).

상기 실시예13∼19 및 비교예4∼7에서 조제한 열경화성 에폭시수지조성물 및 성형체에 대해, 보존안정성, 반응속도 및 조도화형상에 대해 측정했다.The thermosetting epoxy resin composition and the molded product prepared in Examples 13 to 19 and Comparative Examples 4 to 7 were measured for storage stability, reaction rate and roughness shape.

또한, 상기 실시예13∼l9 및 비교예4∼7로 제작한 기판을 사용하고 구리도금층을 형성한 평가기판을 사용하여, 상기와 같은 방법으로 박리 강도, 땜납내열성, 전기절연특성에 대해 측정했다. 얻어진 결과를 표 3 에 나타낸다.In addition, the peeling strength, the solder heat resistance, and the electrical insulation characteristics were measured in the same manner as above using an evaluation substrate having the copper plating layer formed using the substrates prepared in Examples 13 to 9 and Comparative Examples 4 to 7. . The obtained results are shown in Table 3.

시험항목Test Items 실 시 예Example 비 교 예Comparative Example 1313 1414 1515 1616 1717 1818 1919 44 55 66 77 형태shape 액상Liquid 액상Liquid 액상Liquid 액상Liquid 액상Liquid 건조필름Dry film 수지부착동박Resin Copper Foil 액상Liquid 액상Liquid 액상Liquid 건조필름Dry film 1액조성물의 보존안정성Storage stability of 1 liquid composition -- -- ×× ×× ×× -- 성형체의 보존안전성Preservation safety of the molded body -- -- -- -- -- -- -- -- ×× 반응속도Reaction speed ×× ×× ×× ×× 조도화 형상Roughness geometry ×× ×× ×× ×× 박리 강도(N/cm)Peel Strength (N / cm) 1313 1212 1010 1212 1111 1212 1414 33 44 99 33 땜납 내열성Solder heat resistance ×× ×× ×× ×× 전기절연특성Electrical Insulation Characteristics ×× ×× ×× ××

이상 설명한 바와 같이, 본발명에 따르면 다층 프린트 배선판 특히 빌드업다층 프린트 배선판에 있어서, 내열성이나 전기절연특성 및 도체층의 접착강도를 동시에 만족하며, 더구나 보존안정성이 뛰어난 열경화성 에폭시수지조성물과 그 성형체 및 이들을 사용하여 제작한 도체회로의 고밀도화에 대응할 수 있는 빌드업다층 프린트 배선판을 제공할 수가 있다.As described above, according to the present invention, a thermosetting epoxy resin composition, molded article thereof, and the like, which satisfy both heat resistance, electrical insulation properties, and adhesive strength of a conductor layer, in a multilayer printed wiring board, in particular, a build-up multilayer printed wiring board. It is possible to provide a buildup multi-layer printed wiring board which can cope with the increase in the density of the conductor circuit produced using these.

Claims (13)

(A) l분자내에 2개이상의 에폭시기를 갖는 에폭시수지, (B)1분자내에 2개이상의 페놀성수산기를 갖는 경화제, 및 (C)경화촉진제로서 수산기 및 방향환을 갖는 이미다졸화합물을 포함하는 것을 특징으로 하는 열경화성 에폭시수지 조성물.(A) an epoxy resin having two or more epoxy groups in one molecule, (B) a curing agent having two or more phenolic hydroxyl groups in one molecule, and (C) a curing accelerator comprising an imidazole compound having a hydroxyl group and an aromatic ring Thermosetting epoxy resin composition characterized in. 제 1 항에 있어서,The method of claim 1, 상기 경화촉진제(C)는, 하기 일반식(1)으로 나타내는 이미다졸화합물인 것을 특징으로 하는 열경화성 에폭시수지 조성물.The said curing accelerator (C) is an imidazole compound represented by the following general formula (1), The thermosetting epoxy resin composition characterized by the above-mentioned. (식중, R1는 CH3또는 CH2OH를 나타낸다.)Wherein R 1 represents CH 3 or CH 2 OH. 제 1 항에 있어서,The method of claim 1, 상기 경화촉진제(C)는, 융점190℃이상의 이미다졸화합물인 것을 특징으로 하는 열경화성 에폭시수지 조성물.The curing accelerator (C) is a thermosetting epoxy resin composition, characterized in that the imidazole compound having a melting point of 190 ℃ or more. 제 1 항에 있어서,The method of claim 1, 상기 에폭시수지(A)는, 1분자내에 1개 이상의 에폭시기를 갖는 에폭시수지에 미리 10-(2,5-디히드록시페닐)-10H-옥사포스페난스렌=10-옥시드를 반응시켜 이루어지는 인함유 에폭시수지를 포함하는 것을 특징으로 하는 열경화성 에폭시수지 조성물.The epoxy resin (A) is obtained by reacting 10- (2,5-dihydroxyphenyl) -10H-oxaphosphenanthrene = 10-oxide with an epoxy resin having one or more epoxy groups in one molecule in advance. A thermosetting epoxy resin composition comprising an oil epoxy resin. 제 4 항에 있어서,The method of claim 4, wherein 상기 인함유 에폭시수지는, 인함유량이 1∼5질량%인 것을 특징으로 하는 열경화성 에폭시수지 조성물.The phosphorus-containing epoxy resin is phosphorus content of 1 to 5% by mass, the thermosetting epoxy resin composition. 제 1 항에 있어서,The method of claim 1, 상기 경화제(B)는,10-(2,5-디히드록시페닐)-10H-옥사포스페난스렌=10-옥시드를 포함하는 것을 특징으로 하는 열경화성 에폭시수지 조성물.The said hardening | curing agent (B) is a thermosetting epoxy resin composition characterized by including 10- (2,5-dihydroxyphenyl) -10H-oxaphosphenanthrene = 10-oxide. 제 1 항에 있어서,The method of claim 1, 더욱이 (D)평균입자직경이 5μm 이하의 무기충전재 및/ 또는 유기충전재를 포함하는 것을 특징으로 하는 열경화성 에폭시수지 조성물.Furthermore, (D) a thermosetting epoxy resin composition comprising an inorganic filler and / or an organic filler having an average particle diameter of 5 μm or less. 제 7 항에 있어서,The method of claim 7, wherein 상기 무기충전재 및 / 또는 유기충전제의 함유량이, 조성물의 고형분에 대하여 40질량% 이하인 것을 특징으로 하는 열경화성 에폭시수지 조성물.The thermosetting epoxy resin composition, wherein the content of the inorganic filler and / or the organic filler is 40% by mass or less based on the solid content of the composition. 제 1 항에 있어서,The method of claim 1, 열경화성 에폭시수지조성물이 1액화한 것을 특징으로 하는 열경화성 에폭시수지 조성물.A thermosetting epoxy resin composition, characterized in that the thermosetting epoxy resin composition is liquefied. 제 1 항 내지 9 항 중 어느 한 항에 기재된 열경화성 에폭시조성물을 지지필름상에 도포건조하고, 필름화하여 이루어지는 성형체.The molded object formed by apply | coating drying the thermosetting epoxy composition of any one of Claims 1-9 on a support film, and forming into a film. 제 1 항 내지 9항 중 어느 한 항에 기재된 열경화성 에폭시조성물을 지지동박상에 도포건조하고, 수지부착 동박으로서 이루어지는 성형체.The molded object which consists of a resin foil copper foil which apply | coats and drys the thermosetting epoxy composition of any one of Claims 1-9 on a support copper foil. 제 1 항 내지 9항 중 어느 한 항에 기재된 열경화성 에폭시조성물을 사용하여 제작한 다층 프린트 배선판.The multilayer printed wiring board produced using the thermosetting epoxy composition of any one of Claims 1-9. 제 10 항 또는 1항 에 기재된 성형체를 사용하여 제작한 다층 프린트 배선판.The multilayer printed wiring board produced using the molded object of Claim 10 or 1.
KR1020020007082A 2001-02-16 2002-02-07 Thermosetting epoxy resin composition, its formed article and multilayer printed circuit board KR100776725B1 (en)

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