KR200195102Y1 - 반도체 노광장비의 기판위치보정장치 - Google Patents
반도체 노광장비의 기판위치보정장치 Download PDFInfo
- Publication number
- KR200195102Y1 KR200195102Y1 KR2019970039471U KR19970039471U KR200195102Y1 KR 200195102 Y1 KR200195102 Y1 KR 200195102Y1 KR 2019970039471 U KR2019970039471 U KR 2019970039471U KR 19970039471 U KR19970039471 U KR 19970039471U KR 200195102 Y1 KR200195102 Y1 KR 200195102Y1
- Authority
- KR
- South Korea
- Prior art keywords
- silicon substrate
- mounting plate
- light
- transparent plastic
- plastic material
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 96
- 239000004065 semiconductor Substances 0.000 title claims abstract description 22
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 78
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 78
- 239000010703 silicon Substances 0.000 claims abstract description 78
- 239000000463 material Substances 0.000 claims abstract description 14
- 229920003023 plastic Polymers 0.000 claims abstract description 14
- 238000001514 detection method Methods 0.000 claims abstract description 12
- 239000004020 conductor Substances 0.000 claims 1
- 230000003287 optical effect Effects 0.000 abstract description 4
- 239000000919 ceramic Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (1)
- 실리콘 기판 이동로봇에 의해 실리콘기판이 장착되는 실리콘기판 장착판과, 상기 실리콘기판 장착판을 지지하는 장착판지지대와, 상기 장착판 지지대의 둘레에 설치한 레이져 반사거울을 통해 반사되어진 레이져를 이용해 장착판 지지대의 위치를 보정하는 레이져간섭계와, 상기 실리콘기판 장착판의 상부에 설치되는 노광렌즈를 포함하여 구성된 반도체 노광장비에 있어서, 상기 실리콘기판 장착판의 상면을 투명플라스틱재로 형성하고, 상기 실리콘기판 장착판의 하부에 광경로를 형성하고 상기 광경로의 단부에 광원을 설치하여, 상기 광경로를 통해 투명플라스틱재로 빛이 발산되도록 하며, 상기 노광렌즈의 일측에 상기 투명플라스틱재를 통해 발산되는 빛을 감지하여 실린콘기판의 위치를 검출하는 검출카메라를 장착한 것을 특징으로 하는 반도체 노광장비의 기판위치보정장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019970039471U KR200195102Y1 (ko) | 1997-12-22 | 1997-12-22 | 반도체 노광장비의 기판위치보정장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019970039471U KR200195102Y1 (ko) | 1997-12-22 | 1997-12-22 | 반도체 노광장비의 기판위치보정장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19990026917U KR19990026917U (ko) | 1999-07-15 |
KR200195102Y1 true KR200195102Y1 (ko) | 2000-12-01 |
Family
ID=19517815
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019970039471U KR200195102Y1 (ko) | 1997-12-22 | 1997-12-22 | 반도체 노광장비의 기판위치보정장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR200195102Y1 (ko) |
-
1997
- 1997-12-22 KR KR2019970039471U patent/KR200195102Y1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR19990026917U (ko) | 1999-07-15 |
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