KR200173811Y1 - In-line type development device for photolithography process - Google Patents
In-line type development device for photolithography process Download PDFInfo
- Publication number
- KR200173811Y1 KR200173811Y1 KR2019940032995U KR19940032995U KR200173811Y1 KR 200173811 Y1 KR200173811 Y1 KR 200173811Y1 KR 2019940032995 U KR2019940032995 U KR 2019940032995U KR 19940032995 U KR19940032995 U KR 19940032995U KR 200173811 Y1 KR200173811 Y1 KR 200173811Y1
- Authority
- KR
- South Korea
- Prior art keywords
- developer
- photolithography process
- developing
- line type
- development device
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
본 고안은 피 현상물의 현상 재현성을 향상시키고, 청정화에 기여할 목적으로;The present invention aims at improving the phenomenon reproducibility of the artifacts and contributing to the clarification;
피 현상물을 수직으로 세워 이송 로울러에 의해 이송되도록 하고, 상기 피 현상물의 일측에서 현상액을 분사할 수 있는 분사수단을 배치하여 이루어진 포토리소그라피 공정용 인 라인형 현상장치를 제공한다.It provides an in-line developing device for the photolithography process is made by placing the object to be vertically conveyed by the transfer roller, the disposition means for injecting the developer from one side of the object to be developed.
Description
제1도는 본 고안에 의한 현상장치의 사시도.1 is a perspective view of a developing apparatus according to the present invention.
제2도는 본 고안에 의하여 현상액이 분사된 상태도.2 is a state in which the developer is injected by the present invention.
제3도는 종래 현상장치의 구성도.3 is a block diagram of a conventional developing apparatus.
제4도는 종래 장치에 의하여 현상액이 분사된 상태도이다.4 is a state diagram in which a developer is injected by a conventional apparatus.
* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
2 : 피 현상물 4, 6 : 이송 로울러2: artifact 4, 6: feed roller
8 : 관로 10 : 저장탱크8: pipeline 10: storage tank
12 : 노즐 14 : 분사영역12 nozzle 14 spray area
본 고안은 포토리소그라피 공정용 인 라인형 현상장치에 관한 것으로서, 보다 상세하게는 피 현상물이 수직의 상태로 반송되면서 현상이 이루어지도록 하여 현상 재현성을 향상시키고, 청정화에 기여할 수 있도록 한 포토리소그라피 공정용 인 라인형 현상장치에 관한것이다.The present invention relates to an in-line developing device for a photolithography process, and more particularly, a photolithography process for improving development reproducibility and contributing to cleaning by allowing development to be carried out while being transported in a vertical state. It relates to an in-line developing device.
일반적으로 포토 에칭에 있어서는 먼저 재료의 전표면에 포토레지스트피막을 형성하고, 별도의 공정으로 작성한 원판을 통하여 포토레지스트를 노광한 다음 감광부분을 현상액에 용해되지 않게하고, 미감광 부분을 현상액에 의해 제거하여 포트레지스트가 필요로 하는 패턴을 얻게 된다.In general, in photoetching, a photoresist film is first formed on the entire surface of a material, the photoresist is exposed through an original plate prepared by a separate process, and then the photosensitive portion is not dissolved in the developer, and the unphotosensitive portion is developed by a developer. By removing it, the pattern required by the resist is obtained.
그리고 에칭액에 의해 포토레지스트가 없는 부분을 화학적으로 용축제거하여 필요로 하는 제품을 얻게 된다.And the etching solution is chemically removed by removing the part without photoresist, and the required product is obtained.
이러한 포토 에칭 공정에 있어서, 본 고안은 현상액을 분사하는 현상장치에 관계하는 것으로서, 종래 현상장치는 제3도에서 보인바와 같이, 제품 즉, 피 현상물(100)이 수평의 상태에서 이송 로울러(102)에 의하여 이송되도록 하고, 상기 피 현상물(100)의 상측으로 현상액을 분사할 수 있는 현상액 분사수단(104)을 설치하여 이루어진다.In such a photo-etching process, the present invention relates to a developing apparatus for injecting a developing solution, and the conventional developing apparatus as shown in FIG. 3, that is, the product, that is, the development object 100 in the horizontal state of the transport roller ( 102, and is provided by developing developer injection means 104 capable of injecting the developing solution to the upper side of the object to be developed 100.
상기에서 현상액 분사수단(104)은 형상액을 이송시키는 파이프(106)와 이 파이프(106)에 설치되어 현상액을 분사하는 노즐(108)로 이루어진다.The developer injection means 104 is composed of a pipe 106 for transferring the shape liquid and a nozzle 108 installed in the pipe 106 to inject the developer.
이에따라 상기 피 현상물(100)이 이송로울러(102)의 구동에 의하여 반송되면서 상측에서 현상액을 분사하면서 현상공정이 이루어지게 된다.Accordingly, while the developer 100 is conveyed by the driving of the transport roller 102, the developing process is performed while spraying the developer from above.
그러나 상기와 같은 현상장치로서 피 현상물(100)을 현상하게 되는 경우에는 제4도에서와 같이 노즐과 노즐간의 분사영역(110)간 현상 데드존(Dead Zone)과 현상액의 정체현상 발생으로 불균일한 현상이 이루어짐은 물론 미세한 패턴 현상에는 부적합 하다는 폐단이 있다.However, in the case where the developer 100 is developed as the developing device as described above, as shown in FIG. 4, the development of the dead zone between the nozzles and the injection zone 110 between the nozzles and the development of the developer are uneven. Not only is one phenomenon made, but there is a disadvantage that it is not suitable for a fine pattern phenomenon.
그리고 피 현상물이 수평의 상태로 이송되는 바, 각 오염물질이 피 현상물의 상면을 오염시킴으로써, 청정도를 유지할 수 없다는 폐단이 있다.And since the object to be transported in a horizontal state, each pollutant contaminates the upper surface of the object, resulting in the inability to maintain cleanliness.
따라서 본 고안은 상기와 같은 문제점을 해결하기 위하여 안출된 것으로서, 본 고안의 목적은 피 현상물이 수직의 상태로 반송되면서 현상이 이루어지도록 하여 현상 재현성을 향상시키고, 청정화에 기여할 수 있도록 한 포토리소그라피 공정용 포토리소그라피 공정용 인 라인형 현상장치를 제공하려는 것이다.Therefore, the present invention has been devised to solve the above problems, and an object of the present invention is to improve the image reproducibility by contributing to the developing object in a vertical state, thereby improving the reproducibility and contributing to the purification. It is to provide an in-line developing device for process photolithography process.
이를 실현하기 위하여 본 고안은 피 현상물을 수직으로 세워 이송로울러에 의해 이송되도록 하고, 상기 피 현상물의 일측에서 현상액을 분사할 수 있는 분사수단을 배치하여 이루어진 포토리소그라피 공정용 인 라인 현상장치를 제공한다.In order to achieve this, the present invention provides a photolithography in-line developing apparatus which is formed by vertically placing a developing object vertically and transported by a transfer roller, and disposing a means for injecting a developing solution from one side of the developing object. do.
이하, 상기의 목적을 구체적으로 실현할 수 있는 본 고안의 바람직한 실시예를 첨부한 도면에 의거하여 상세히 설명하면 다음과 같다.Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention capable of realizing the above object in detail as follows.
제1도는 본 고안에 의한 현상장치에 사시도로서, 부호 2는 피 현상물을 지칭한다.1 is a perspective view of a developing apparatus according to the present invention, and 2 denotes a developing object.
상기 피 현상물(2)은 수직의 상태에서 전후 2개의 이송 로울러(4), (6)에 의하여 이송이 이루어지도록 형성되는데, 상기에서 이송로울러(4), (6)는 피현상물(2)의 상하측 부분과 접촉되면서 이송시킬 수 있도록하여 액티브 에어리어와는 접촉이 되지 않도록 형성된다.The object (2) is formed to be transported by two forward and backward transport rollers (4) and (6) in the vertical state, wherein the transport rollers (4), (6) is the object (2) It is formed so that it can be transferred while being in contact with the upper and lower parts of the) so as not to come into contact with the active area.
그리고 상기 피 현상물(2)의 일측으로 현상액을 분사할 수 있는 분사수단이 마련되는데, 상기 분사수단은 현상액을 공급하는 관로(8)와, 상기 이송 로울러(4), (6) 사이의 피 현상물(2) 일면을 수용할 수 있는 폭을 갖도록 장방형으로 형성되어 상기 관로(8)와 연결되는 저장탱크(10)와, 상기 저장탱크(10)의 전면부에 등간격으로 다수 형성되는 노즐(12)을 포함하여 이루어진다.And the injection means for injecting the developer to one side of the object to be developed (2) is provided, the injection means is a blood pipe between the supply line for supplying the developer and the transfer roller (4), (6) The storage tank 10 is formed in a rectangular shape to have a width to accommodate one surface of the developer (2) and the nozzle is formed in a plurality at equal intervals on the front surface of the storage tank (10) It consists of 12.
또한, 상기의 분사수단은 피현상물(2)을 기준으로 상하로 움직일 수 있도록 하여 피현상물(2) 전면을 동일한 조건으로 현상할 수 있도록 하였다.In addition, the injection means is to be able to move up and down based on the object (2) to develop the entire surface of the object (2) under the same conditions.
이와같이 구성되는 현상장치에 의하면 수직의 상태로 세워진 피현상물(2)이 이송되면, 저장탱크(10)로 공급되어 있던 현상액이 다수의 노즐(12)을 통해 분사되면서 피 현상물을 현상하게 된다.According to the developing apparatus configured as described above, when the developing object 2 which is standing in the vertical state is transferred, the developing solution supplied to the storage tank 10 is sprayed through the plurality of nozzles 12 to develop the developing object. .
이때 피 현상물(2)이 수직의 상태로 이송되는 바, 현상액이 분사되는 경우에는 이의 현상액이 정체되지 않고 제2도에서와 같이 분사 영역(14)에서 하측으로 흘러내리게 됨으로써, 데드 존이 발생되지 않게 된다.At this time, the developer 2 is transferred in a vertical state. When the developer is injected, the developer does not stagnate and flows downward in the injection region 14 as shown in FIG. Will not be.
이에따라 현상액을 피 현상물(2)의 일면에 완전 도포가 이루어짐으로써, 균일한 현상으로 현상 불균일성을 완전 제거할 수 있으며, 미세 패턴 현상도 가능해 진다.Accordingly, the developer is completely applied to one surface of the object to be developed 2, whereby development unevenness can be completely eliminated by uniform development, and fine pattern development is also possible.
또한, 피 현상물(2)의 수직 반송으로 현상액이 분사되는 면의 오염물 잔류 가능성이 거의 없는 바, 청정효과를 높힐 수 있게 된다.In addition, since there is almost no possibility of remaining contaminants on the surface on which the developer is injected by vertical conveyance of the object to be developed 2, the cleaning effect can be enhanced.
이상에서와 같이 본 고안에 의하면 피 현상물의 수직 반송과 이에 현상액을 분사하여 연상작업을 실시할 수 있는 바, 현상성 향상과 청정효과를 증대시킬 수 있는 유용한 고안인것이다.As described above, according to the present invention, it is possible to carry out the vertical conveyance of the object to be developed and the associating work by spraying the developer thereon, which is a useful design that can improve the developability and the cleaning effect.
Claims (2)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019940032995U KR200173811Y1 (en) | 1994-12-06 | 1994-12-06 | In-line type development device for photolithography process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019940032995U KR200173811Y1 (en) | 1994-12-06 | 1994-12-06 | In-line type development device for photolithography process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR960025346U KR960025346U (en) | 1996-07-22 |
| KR200173811Y1 true KR200173811Y1 (en) | 2000-03-02 |
Family
ID=19400495
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR2019940032995U KR200173811Y1 (en) | 1994-12-06 | 1994-12-06 | In-line type development device for photolithography process |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR200173811Y1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100552595B1 (en) * | 2000-11-22 | 2006-02-20 | 마테 쿠오 | Board Transmitting Device for an Upright ?? Board Etching Machine |
-
1994
- 1994-12-06 KR KR2019940032995U patent/KR200173811Y1/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR960025346U (en) | 1996-07-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3597639B2 (en) | Substrate processing apparatus and substrate processing method | |
| KR20060051248A (en) | Apparatus for treating substrates and method of treating substrates | |
| KR200173811Y1 (en) | In-line type development device for photolithography process | |
| JP2000323813A (en) | Substrate treatment unit | |
| JPS6274089A (en) | Apparatus for producing printed circuit board | |
| JP3866856B2 (en) | Substrate processing equipment | |
| KR20060004308A (en) | Cleaning equipment and the method for photo mask | |
| KR20200043908A (en) | Apparatus for processing substrate with developing solution | |
| JP3995044B2 (en) | Substrate processing equipment | |
| JP2004153033A (en) | Substrate processing apparatus | |
| JP2004016997A (en) | Apparatus and method for treating substrate | |
| JPH0241632Y2 (en) | ||
| JPH09225420A (en) | Substrate treating device | |
| KR100567833B1 (en) | Apparatus for processing substrate | |
| JP3978065B2 (en) | Substrate processing apparatus and processing method | |
| KR19980060366U (en) | Air Knife Cleaning / Drying Equipment | |
| JP2506919B2 (en) | Development device | |
| JPH026446Y2 (en) | ||
| KR20050077579A (en) | Apparatus for processing substrate | |
| KR930008142B1 (en) | Apparatus for developing circuit board | |
| JPH026448Y2 (en) | ||
| JP3581483B2 (en) | Substrate processing equipment | |
| JP3447890B2 (en) | Substrate processing equipment | |
| KR20030004511A (en) | Air curtain apparatus for p/r strip system | |
| KR20080062350A (en) | Apparatus for cleaning substrate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E701 | Decision to grant or registration of patent right | ||
| REGI | Registration of establishment | ||
| FPAY | Annual fee payment |
Payment date: 20081029 Year of fee payment: 10 |
|
| EXPY | Expiration of term |