KR20010098526A - Scanning exposure method and scanning type exposure apparatus - Google Patents

Abstract

Even if a part of exposure area is overlapped and exposed, it does not reduce the quality of a device and also contributes to the prevention of the throughput reduction of an exposure process.

The mask and the substrate are synchronously moved to expose the pattern of the mask on the substrate through the projection optical system. When overlapping and exposing a part of the exposure areas 34c and 34d of the substrate projected and exposed by the projection optical system, the image forming surface of the pattern of the substrate and the mask is relatively displaced over a predetermined range in a direction substantially perpendicular to the substrate.

Description

Scanning exposure method and scanning exposure apparatus {SCANNING EXPOSURE METHOD AND SCANNING TYPE EXPOSURE APPARATUS}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a scanning exposure method and a scanning exposure apparatus for exposing a pattern formed on a mask to a substrate by synchronously activating a mask and a substrate in a predetermined direction, and particularly suitable for use when partially exposing an exposure area of a substrate. A scanning exposure method and a scanning exposure apparatus.

In recent years, as a display element such as a personal computer or a TV, a liquid crystal display panel that enables thinning has been widely used. This type of liquid crystal display panel is manufactured by patterning a transparent thin film electrode into a desired shape on a rectangular photosensitive substrate, for example, a glass substrate, by a photolithography method. As the photolithography apparatus, an exposure apparatus for exposing a pattern formed on a mask (reticle) to a photoresist layer on a glass substrate through a projection optical system is used.

The liquid crystal display panel has undergone a large area in viewability of the screen. As an exposure apparatus that responds to this request, for example, as disclosed in Japanese Patent Laid-Open No. Hei 7-57986, a plurality of projection optical systems for projecting a pattern of a mask on a substrate in an upright image may be provided. In combination, the mask and the glass substrate are synchronously moved in a predetermined direction to scan the projection optical system, so that the glass substrate is formed into a pattern such as an LCD (Liquid Crystal Dispaly) or the like having a large exposure area in a direction orthogonal to the synchronous movement direction. A scanning type exposure apparatus which sequentially transfers to an exposure area of an image is devised.

At this time, even if the projection area is large, as the projection optical system which does not enlarge the apparatus and obtains good imaging characteristics, the exposure area adjacent to the plurality of projection optical systems is displaced by a predetermined amount in the scanning direction, It is used that the ends are arranged so as to partially overlap in the direction orthogonal to the scanning direction. In this case, the field stops of each projection optical system are set so that the sum of the aperture widths of the field stops in the scanning direction is always the same, for example, in a trapezoid shape. Therefore, the above-described scanning type exposure apparatus has the advantage that the connecting portions of adjacent projection optical systems are overlapped and the optical aberration and exposure illuminance of the projection optical system change smoothly.

However, the following problems exist in the conventional scanning exposure method and the scanning exposure apparatus as described above.

The plurality of projection optical systems are calibrated so that the imaging positions coincide with the exposure surface on the glass substrate, such as adjustment errors in each projection optical system, distortion or flatness of the glass substrate itself, and variations in the thickness of the photoresist layer applied to the glass substrate. Due to this, the imaging position with respect to the exposure surface may shift between a plurality of projection optical systems. In this case, a difference occurs in the amount of exposure energy applied between the projection areas corresponding to the plurality of projection optical systems. As a result, color spots are generated at the connection portions exposed by the adjacent projection optical system, and there is a problem that the quality of the manufactured device is degraded.

This problem is not limited to the use of an exposure apparatus having a plurality of projection optical systems, and the first scanning exposure is performed by synchronously moving the mask and the glass substrate using the projection optical system having a single illumination area. Thereafter, the mask and the glass substrate are moved stepwise by the distance of the length of the illumination region in the direction orthogonal to the synchronous movement, and the second scanning exposure is performed by synchronously moving the mask and the glass substrate once again. Even when the plurality of divided patterns are connected to each other in a state where a plurality of divided patterns are overlapped with each other by repeating the second scanning exposure process once or several times, the position of the imaging surface is shifted during the first scanning exposure and the second scanning exposure. There was a possibility that the color spots occurred the same.

On the other hand, as a method of solving the above problem, a plurality of scanning exposures are performed by changing the focus position of the glass substrate. In this method, for example, the first scanning exposure is performed with the exposure surface of the glass substrate lowered by a predetermined amount in the optical axis direction with respect to the position of the imaging surface of the projection optical system, and then the exposure surface of the glass substrate with respect to the imaging position thereafter. Is subjected to the second scanning exposure while the predetermined amount is raised in the optical axis direction to overlap the pattern on the glass substrate. According to this method, since the depth of focus can be improved and the difference in the amount of exposure energy between the plurality of exposure areas can be reduced, color spots can be suppressed.

In this method, however, it is necessary to perform a plurality of scanning exposures in a state in which the focus position of the glass substrate is changed, so that there is a problem that the exposure time is increased by that amount and the throughput of the exposure process is reduced.

SUMMARY OF THE INVENTION The present invention has been made in consideration of the above-described matters, and provides a scanning exposure method and a scanning exposure apparatus that contribute to the prevention of lowering the quality of the device even when overlapping a part of the exposure area and deteriorating the throughput of the exposure step. It aims to do it.

Brief Description of Drawings [Fig. 1] Fig. 1 is a diagram showing an embodiment of the present invention and is an external perspective view showing a schematic configuration of a scanning exposure apparatus.

2 is a schematic configuration diagram of the scanning exposure apparatus.

Fig. 3 is a diagram showing an embodiment of the present invention and is a plan view of the projection area set in the projection system module.

4 is a relationship between time and relative position of the glass substrate in the optical axis direction.

5 is a diagram showing an embodiment of the present invention, which is a plan view of a projection area and a glass substrate of the projection system module.

Fig. 6 is a relational diagram showing the relative displacement of the glass substrate by one stroke while passing through the projection area.

7 is a relation between time and position at which the glass substrate is displaced relative to the optical axis direction.

Fig. 8 is a relational diagram showing that the glass substrate performs relative displacement of two strokes while passing through the projection area.

9 is a plan view showing a second embodiment of the present invention, showing a relationship between a glass substrate having a first exposure area and a second exposure area and a projection area of the projection system module.

Fig. 10 is a diagram showing a second embodiment of the present invention, which is a relational diagram showing that the glass substrate performs one-stroke relative displacement while passing through the projection area.

Fig. 11 is a diagram showing another embodiment of the present invention, and is a plan view showing a relationship between a glass substrate having a first exposure area and a second exposure area and a single projection area.

12 is a flowchart illustrating an example of a manufacturing process of a liquid crystal display device.

Fig. 13 is a schematic configuration diagram showing an example of a projection optical system in which a Dyson optical system is combined.

* Explanation of symbols for main parts of the drawings

L: Pitch M: Mask (Reticle)

P: Glass substrate (substrate) 1: Scanning exposure apparatus

3: projection optical system 17: control device (displacement adjusting device)

23: first projection optical group 24: second projection optical group

33: non-overlapping area 36a ~ 36d, 53: overlapping area

51: first exposure area 52: second exposure area

In order to achieve the said objective, this invention employ | adopts the following structures corresponding to FIGS. 1-11 which show embodiment.

The scanning exposure method of the present invention synchronously moves the mask M and the substrate P to expose the pattern of the mask M on the substrate P through the projection optical systems 3, 3a to 3e. WHEREIN: When the exposure part of the exposure area | region of the board | substrate P projected and exposed by the projection optical system 3, 3a-3e overlaps and exposes, the imaging surface of the pattern of the board | substrate P and the mask M is made into the board | substrate P And relatively displaced over a predetermined range in a direction substantially perpendicular to the?

Further, the scanning exposure apparatus of the present invention exposes the pattern of the mask M on the substrate P through the projection optical systems 3, 3a to 3e by synchronously moving the mask M and the substrate P. FIG. In the exposure apparatus 1, when a part of the exposure area projected by the projection optical systems 3, 3a to 3e is overlapped and overexposed, an image forming surface of the pattern of the substrate P and the mask M is used as the substrate P. And a displacement adjusting device 17 which is relatively displaced over a predetermined range in a direction substantially perpendicular to the "

Therefore, in the scanning exposure method and the scanning exposure apparatus of the present invention, the image forming position of the pattern of the mask M and the substrate P are located in a predetermined range in a direction substantially perpendicular to the substrate P centering on the position of the image forming surface. Since the relative exposure at a predetermined period over time lengthens the exposure time at the end of the displacement, the distribution of the exposure energy amount at the focus position becomes a large value at the end of the displacement so that the depth of focus is substantially the same as when overlapping exposure is achieved. Deepens. For this reason, even when partially exposing the exposure area, the difference in the amount of exposure energy at the connecting portion is reduced, and color staining can be suppressed. In addition, since the imaging position of the pattern of the mask M and the relative displacement of the substrate P are executed during one exposure operation, the throughput decrease in the exposure step can be prevented.

Hereinafter, a first embodiment of the scanning exposure method and the scanning exposure apparatus of the present invention will be described with reference to FIGS. Here, an example in which the circuit pattern of the liquid crystal display device formed in the mask is transferred onto the glass substrate using a rectangular glass substrate used for manufacturing the liquid crystal display panel as the substrate will be described. In addition, it demonstrates here using the example where a projection optical system consists of five projection system modules.

1 is a perspective view showing a schematic configuration of a scanning exposure apparatus 1 according to the present invention. The scanning exposure apparatus 1 includes a glass stage and a mask stage 4 holding a projection optical system 3 composed of an illumination optical system 2 and a plurality of projection system modules 3a to 3e, and a mask (reticle) M. The board | substrate stage 5 holding (substrate) P is comprised mainly. In addition, the mask M and the glass substrate P are arrange | positioned along the XY plane, and let the scanning direction (synchronization movement direction) of a XY plane be the X direction and the non-scan direction which is orthogonal to an X direction to a Y direction. In addition, the chief ray orthogonal to the XY plane and passing through the center of the trapezoidal shape projected onto the glass substrate P with the projection optical system 3 is called an optical axis, and the optical axis direction substantially perpendicular to the glass substrate P is Z. It explains in the direction.

As shown in FIG. 2, the illumination optical system 2 illuminates the light beam (exposure light) emitted from the light source 6, such as an ultrahigh pressure mercury lamp, on the mask M. As shown in FIG. In addition, the illumination optical system 2 includes illumination system modules 10a to 10e provided corresponding to each of the dichroic mirror 7, the wavelength selection filter 8, the light guide 9 and the projection system modules 3a to 3e ( However, in FIG. 2, only the thing corresponding to illumination optical system 10a is shown for convenience).

The light beam emitted from the light source 6 is incident on the dichroic mirror 7 after being condensed by the elliptical mirror 6a. The dichroic mirror 7 reflects the light flux of the wavelength necessary for exposure and transmits the light flux of the other wavelength. The light beam reflected by the dichroic mirror 7 enters the wavelength selective filter 8, and the wavelength suitable for the projection optical system 3 to perform exposure (typically at least one band of g, h, and i lines) Becomes a light beam of light, and enters the light guide 9. The light guide 9 branches the incident light beams into five pieces and enters the illumination system modules 10a to 10e through the reflection mirrors 11.

Each illumination system module 10a-10e is comprised from the illumination shutter 12, the relay lens 13, the fly-eye lens 14, and the condenser lens 15 in outline. In addition, in this embodiment, the illumination system modules 10b-10e of the structure similar to this illumination system module 10a are arrange | positioned at regular intervals in a X direction and a Y direction. The luminous flux from each of the illumination system modules 10a to 10e is configured such that the mask M illuminates another illumination region.

The illumination shutter 12 is disposed freely in the rear of the light guide 9 with respect to the optical path of the light beam. The illumination shutter 12 shields the luminous flux reaching the mask M and the glass substrate P in this optical path when the optical path is shielded, and releases the light shielding at the luminous flux when the optical path is opened to release the mask M ) And the luminous flux to the glass substrate (P). The illumination shutter 12 is also provided with a shutter driver 16 for moving the illumination shutter 12 back and forth with respect to the optical path. The shutter driver 16 is controlled by the controller 17 to drive the shutter.

On the other hand, the light quantity adjusting mechanism 18 is attached to each illumination system module 10a-10e. The light amount adjusting mechanism 18 adjusts the exposure amount for each light path by setting the illuminance of the light beam for each light path. The light amount adjusting mechanism 18 is composed of a half mirror 19, a detector 20, a filter 21, and a filter driver 22. The half mirror 19 is arranged in the optical path between the filter 21 and the relay lens 13 to inject a part of the light beam passing through the filter 21 into the detector 20. The detector 20 detects the illuminance of the incident light beam and outputs the detected illuminance signal to the control device 17.

The filter 21 is patterned in the shape of a foot with Cr or the like on a glass plate, and is formed so that the transmittance gradually changes linearly in a certain range along the Y direction, and the illumination shutter 12 and the half in each optical path It is arrange | positioned between the mirrors 19. These half mirrors 19, the detectors 20, and the filters 21 are provided for each of the plurality of optical paths. The filter driver 22 moves the filter 21 along the Y direction based on the instruction of the controller 17.

Therefore, based on the illuminance of the luminous flux detected by the detector 20, the controller 17 controls the filter driver 22 so that the amount of light for each optical path is such that the illuminance on the glass substrate P for each optical path becomes a predetermined value. Can be adjusted.

The light beam passing through the light amount adjusting mechanism 18 reaches the fly's eye lens 14 through the relay lens 13. A secondary light source is formed on the exit surface side of the fly's eye lens 14, and the illumination region of the mask M can be irradiated with uniform illuminance through the condenser lens 15.

The light beams passing through the mask M are incident on the projection system modules 3a to 3e, respectively. The pattern of the mask M in the illumination region has a predetermined imaging characteristic and is transferred onto the glass substrate P to which the resist is applied. Each projection system module 3a-3e forms the image shift mechanism which shifts the pattern image of the mask M to an X direction or a Y direction, and forms the intermediate image of the pattern of the mask M. It consists of a refraction type optical system, a field stop for setting the trapezoidal projection area on the glass substrate P, and a magnification adjusting mechanism (not shown) for changing the magnification of the pattern image of the mask M. .

3 is a plan view of the projection areas 34a to 34e on the glass substrate P projected by the projection system modules 3a to 3e. As shown in this figure, each projection area | region 34a-34e shows the trapezoid shape of the width | variety (L0) of the X direction, and is projected area | region 34a, 34c, 34e arrange | positioned apart from the pitch L in the X direction. And grouped into the first projection optical group 23 composed of the first projection optical group 23 and the second projection optical group 24 composed of the projection regions 34b, 34d, and the projection regions 34a, 34c, 34e and the projection regions 34b, 34d. ) Are arranged to face the short sides.

In addition, the projection areas 34a to 34e are arranged in parallel so that the ends (35a and 35b, 35c and 35d, 35e and 35f, 35g and 35h) of adjacent projection areas are overlapped in the Y direction, as indicated by the double-dotted line. It is set so that the sum total of the width of an X direction may become substantially equal. That is, each projection area 34a to 34e is projected onto the non-overlapping area 33 exposed without overlapping with the end portions 35a to 35k projected on the overlapping areas 36a to 36d overlapped and exposed on the glass substrate P. The center portions 41a to 41e are provided, and when the scanning exposure is performed in the X direction, the sum of the exposure amounts of the overlap regions and the exposure amounts of the non-overlapping regions are made equal.

Thus, by providing the overlapping areas 36a to 36d in which the projection areas 34a to 34e overlap on the glass substrate P, the change in the optical aberration and the illuminance change in the overlapping areas 36a to 36d can be smoothed. It is supposed to be. Moreover, although the shape of the projection area | regions 34a-34e of this embodiment is large, it may be a hexagon, a rhombus, a parallelogram, etc.

The mask stage 4 holds the mask M, and has a long stroke in the X direction for performing one-dimensional scanning exposure and a stroke of a few millimeters in the Y direction orthogonal to the scanning direction. As shown in FIG. 2, the mask stage drive part 37 which drives the mask stage 4 to an X direction and a Y direction is provided. This mask stage drive unit 37 is controlled by the controller 17.

As shown in FIG. 1, the moving mirrors 38a and 38b are provided in the direction orthogonal to the step | circumference on the mask stage 4, respectively. The laser interferometer 39a is disposed opposite to the moving mirror 38a. Moreover, the laser interferometer 39b is arrange | positioned facing the moving mirror 38b. These laser interferometers 39a and 39b respectively emit laser light to the moving mirrors 38a and 38b to measure the distance between the moving mirrors 38a and 38b, thereby measuring the distance between the X and Y directions of the mask stage 4. The position, that is, the position of the mask M can be detected with high resolution and with high accuracy. The detection results of the laser interferometers 39a and 39b are not shown in FIG. 1, but are output to the control device 17.

The substrate stage 5 holds and moves the glass substrate P. The substrate stage 5 moves in a long stroke in the X direction to perform one-dimensional scanning exposure in the same manner as the mask stage 4, and in a Y direction perpendicular to the scanning direction. Has a long stroke. In addition, the substrate stage 5 is provided with a substrate stage driver 40 for driving the substrate stage 5 in the X direction and the Y direction (see FIG. 2). The substrate stage driver 40 is controlled by the controller 17. In addition, the substrate stage 5 is free to move in the Z direction under the control of the substrate stage driver 40. The substrate stage 5 is provided with measuring means (not shown) for measuring the position in the Z direction of the pattern surface of the mask M and the exposure surface of the glass substrate P. The measurement result by the measuring means is It is output to the control apparatus 17 as a displacement adjusting apparatus. In practice, the movement in the Z direction in the substrate stage 5 is performed by a holder supported by the substrate stage 5 to hold the glass substrate P. Here, for convenience, the Z stage is moved by the substrate stage 5. It demonstrates as a movement to to be performed. In addition, although not shown in figure, the movement of the board | substrate stage 5 in the Z direction makes it drive by installing the actuator or wedge-shaped cam which drive the support point which supports the board | substrate stage to Z direction, for example. As the actuator, a motor, a piezo element or an electromagnet may be used.

Moreover, the moving mirrors 42a and 42b are provided in the direction orthogonal to the step | circle of the board | substrate stage 5, respectively. The laser interferometer 43a is arrange | positioned facing the moving mirror 42a. Moreover, the laser interferometer 43b is arrange | positioned facing the moving mirror 42b. These laser interferometers 43a and 43b respectively emit laser light to the moving mirrors 42a and 42b to measure the distance between the moving mirrors 42a and 42b, thereby measuring the distance between the X and Y directions of the substrate stage 5. The position, that is, the position of the glass substrate P, can be detected with high resolution and with high accuracy. The detection results of the laser interferometers 43a and 43b are not shown in FIG. 1, but are output to the control device 17.

Above the mask M, alignment systems 49a and 49b for detecting a mask alignment mark (not shown) formed on the mask M and a substrate alignment mark (not shown) formed on the glass substrate P are provided. have. The alignment systems 49a and 49b irradiate the detection light to the mask alignment mark, and receive the reflected light of the mask alignment mark and the reflected light of the mask alignment mark and the substrate alignment mark obtained through the external projection system module 3a or 3e. The position shift amount between the mask M and the glass substrate P is measured. 2, the measurement result of the alignment systems 49a and 49b is output to the control apparatus 17. As shown in FIG. Also, the alignment systems 49a and 49b have a drive mechanism (not shown) that moves in the X direction, and is configured to be evacuated from the illumination region during scanning exposure.

The controller 17 monitors the position in the XY plane of the mask stage 4 from the outputs of the laser interferometers 39a and 39b, and moves the mask stage 4 to the desired position by controlling the mask stage driver 37. At the same time, the position in the XY plane of the substrate stage 5 is monitored from the output of the laser interferometers 43a and 43b, and the substrate stage 5 is controlled to move the substrate stage 5 to a desired position. In other words, the control device 17 controls the two drive parts 37 and 40 while monitoring the positions of the mask stage 4 and the substrate stage 5 to control the mask M and the glass plate P to the projection system modules 3a to. 3e) is synchronously moved in the X direction at an arbitrary scanning speed (synchronized movement speed).

Further, the controller 17 controls the substrate stage driver 40 based on the position of the exposed surface of the glass substrate P measured by the measuring means, thereby controlling the exposed surface of the substrate stage 5 by the projection system module 3a. It is configured to displace at a predetermined period with respect to the position of the imaging surface of ~ 3e).

The procedure of scanning exposure of the LCD pattern on the glass substrate P by the scanning exposure apparatus 1 having the above-described configuration will be described. In addition, below, the movement of the mask stage 4 and the board | substrate stage 5, and the drive of the illumination shutter 12 in each illumination system module 10a-10e are performed by the mask stage drive part 37 and the board | substrate stage drive part 40. And the shutter drive unit 16, and each drive is performed based on the control of the control unit 17 controlling the respective drive units 37, 40, 16.

First, before performing the exposure process, test exposure or the like is performed in advance, so that the focus position (best focus position) when the exposure surface of the glass substrate for measurement is at the position of the image plane of the projection system modules 3a to 3e (Z0) ) Is measured.

Subsequently, the mask alignment mark and the substrate alignment mark are measured by the alignment systems 49a and 49b to obtain the positional displacement amounts of the mask M and the glass substrate P. From this result, the mask stage 4 or the substrate stage 5 ) To finely adjust the position, and calculate the relative shift, rotation, and scaling correction amount for each projection system module 3a to 3e with respect to the mask M and the glass substrate P. The image shift mechanism, the magnification adjusting mechanism, and the reflective refractive optical system of the projection system modules 3a to 3e are corrected.

Subsequently, the mask stage 4 and the substrate stage 5 are driven to move the mask M and the glass substrate P to the scanning start position. Then, the mask M and the glass substrate P are synchronously moved in the same direction, for example, the -X direction, at the same speed V with respect to the projection system modules 3a to 3e. In addition, the substrate stage 5 is moved to the projection system module 3a while measuring the position of the exposure surface of the glass substrate P by the measuring means in synchronization with the synchronous movement of the mask M and the glass substrate P in the -X direction. 3e) is relatively and continuously displaced in a period Tn between (Z0 + b) and (Z0-b) along the Z direction with respect to the position of the image plane. In addition, (Z0 + b) and (Z0-b) are set at positions within the depth of focus of the glass substrate P. FIG.

This period Tn indicates that the glass substrate P is displaced n strokes in the Z direction while an arbitrary position on the glass substrate P passes through the projection area of the width L0 (n is an integer of 1 or more). . In other words, the period Tn at which the glass substrate P is displaced relative to the Z direction is set at 1 / n of the time when any position on the glass substrate P passes through the projection area of the width L0.

Here, the time T0 at which an arbitrary position on the glass substrate P passes through the projection area of the width L0 is expressed by the following equation.

T0 = L0 / V --- (1)

Therefore, the period Tn at which the glass substrate P is displaced along the Z direction during the time T0 is expressed by the following equation.

Tn = (1 / n) × T0

= (1 / n) × (L0 / V) --- (2)

In addition, the pitch L which is an arrangement | positioning interval of the 1st projection optical group 23 and the 2nd projection optical group 24 is set to the value shown by following Formula when m is an integer greater than or equal to 1.

L = m × Tn × V

= m × (L0 / n) --- (3)

As can be seen from equation (3), the pitch L is set to an integer multiple of the distance that the mask M and the glass substrate P move synchronously between the periods Tn. That is, the relative displacement of the period Tn of the glass substrate P when passing through the projection area of the first projection optical group 23 and the glass substrate when passing through the projection area of the second projection optical group 24 ( The relative displacement of the period Tn of P) coincides with the phase.

Hereinafter, it demonstrates in detail, giving a specific example.

<n = 1 and period Tn = T0>

Here, the period Tn for displacing the substrate stage 5, that is, the glass substrate P in the Z direction, coincides with the time T0 of the equation (1). That is, Tn = T1 = T0, and as shown in Fig. 4 while the arbitrary position on the glass substrate P passes through the projection areas 34a to 34e of the width LO, the glass substrate P is directed in the Z direction. Displace by 1 stroke (n = 1).

Here, it is located at the point 61a on the glass substrate P located in the non-overlapping region 33 of the exposure region and the overlapping region 36c, and the end portion 35e of the projection region 34c and the projection region 34d are located. Consider the point 61b on the glass substrate P which is exposed in duplicate at both ends 35f (see Fig. 5).

As shown in FIG. 6 at the time of scanning exposure, the points 61a and 61b form the imaging surface of the projection system modules 3a-3e between the focus positions Z + b and Zb on the basis of the best focus position Z0. Relative displacement along the Z direction with the period T1 with respect to the position of. At this time, the point 61a is exposed by the exposure time of the time T1 by the center part 41c of the projection area | region 34c.

On the other hand, the point 61b is exposed in time (Ta) by the end 35e of the projection area 34c, and is exposed in time (Tb) by the end 35f of the illumination area 34d. Since Ta + Tb = T1, the point 61b is exposed to the same exposure time as the point 61a. In addition, since the position of the relative displacement in arbitrary positions on the glass substrate P when passing through the projection area | regions 34c and 34d is coincident, the point 61b is exposed by the edge part 35e, 35f. The entire stroke relative to the displacement along the Z direction during operation becomes one stroke in line with the previous stroke relative to the displacement along the Z direction while the point 61a is exposed by the center portion 41c. For this reason, similarly to the point 61a, the exposure point 61b has a long exposure time at the focus positions Z0 + b and Z0-b, which are the ends of the relative displacement, as in the point 61a, and the exposure energy amount is increased. The depth of field can be substantially deep.

<n = 2 and period T2 = T0 / 2>

Here, the period Tn for displacing the substrate stage 5, that is, the glass substrate P in the Z direction, coincides with the time T0 / 2 of the formula (1). That is, at time T0 when Tn = T2 = (T0 / 2) and any position on the glass substrate P passes through the projection areas 34a to 34e of the width L0, as shown in FIG. The substrate P is displaced two strokes (n = 2) in the Z direction.

At this time, the points 61a and 61b are projected by the projection system modules 3a to 3e between the focus positions Z + b and Zb on the basis of the best focus position Z0 as shown in Fig. 8 during scanning exposure. The relative displacement along the Z direction with the period T2 with respect to the position of the image forming surface of is, and the point 61a is exposed by the exposure time of the time T0 by the non-overlapping area 41c of the projection area | region 34c.

On the other hand, the point 61b is exposed to Ta time by the end 35e of the projection area 34c and is exposed to Tb time by the end 35f of the projection area 34d. Since Ta + Tb = T0, the point 61b is exposed in the same exposure time as the point 61a. In addition, since the phases of the relative displacements of arbitrary positions on the glass substrate P when passing through the projection areas 34c and 34d coincide with each other, the points 61b are defined by the ends 35e and 35f. The whole stroke relative to the displacement along the Z direction during exposure becomes two strokes in line with the previous stroke relative to the displacement along the Z direction while the point 61a is exposed by the central portion 41c. For this reason, similarly to the point 61a, the exposure point 61b has a long exposure time at the focus positions Z0 + b and Z0-b, which are the ends of the relative displacement, as in the point 61a, and the exposure energy amount is increased. The depth of field can be substantially deep.

In the scanning exposure method and the scanning exposure apparatus of this embodiment, even when a part of the projection areas 34a to 34e are overlapped and exposed, the position of the image plane of the projection system modules 3a to 3e and the glass substrate are relative to each other along the optical axis direction. Because of the displacement, the depth of focus is increased in both the exposure areas on the glass substrate P exposed by the non-overlapping area or the overlapping area, so that the difference in exposure energy amount between the plurality of exposure areas, or between the overlapping and non-overlapping areas can be reduced. In addition, it is possible to prevent deterioration of the device by suppressing the generation of color stains. In the present embodiment, since the glass substrate P is continuously displaced at a predetermined cycle without performing a plurality of scanning exposures, the depth of focus is deepened. Therefore, the exposure time does not become longer than necessary and the throughput of the exposure process is reduced. It can prevent it beforehand.

In addition, in the scanning exposure method and the scanning exposure apparatus of the present embodiment, since the entire stroke of the relative displacement between the point 61a exposed in the non-overlapping area and the point 61b exposed in the overlapping area coincides with each other, exposure is performed between the respective areas. Even when a plurality of projection system modules 3a to 3e in which the projection area partially overlaps is used because the difference in the amount of energy disappears, color spots caused by the difference in the amount of exposure energy between the modules can be excluded, thereby improving device quality. Can contribute.

In addition, in this embodiment, since the glass substrate P is displaced in the Z direction an integer number of times while an arbitrary position on the glass substrate P passes through the projection area of width L0, the distribution of the exposure energy amount is the best. It is symmetrical in the Z direction with respect to the focus position Z0, whereby a focus depth without bias can be obtained.

In the above embodiment, since the position of the image forming surface and the glass substrate P are relatively displaced along the Z direction by moving the substrate stage 5 having the focus position adjusting function in the Z direction, the elevating mechanism or the like is separated. There is no need to install it, and the device can be made smaller and lower in price.

In addition, in the said 1st Embodiment, it demonstrated as a structure which glass substrate P displaces n strokes in a Z direction, while arbitrary positions on glass substrate P pass through the projection area | region of width L0. It is not necessary to satisfy, and the period Tn of the relative pitch of the arrangement pitch L and the glass substrate P of the first projection optical group 23 and the second projection optical group 24 satisfies Equation (3). The phases of the relative displacement of the glass substrate P when passing through the projection area of the first projection optical group 23 and the relative displacement of the glass substrate P when passing through the second projection optical group 24 are As a result, the entire stroke of the relative displacement of the point located in the non-overlapping area and the point located in the overlapping area can be matched. At this time, it is preferable that any position on the glass substrate P passes through at least 70% or more of one cycle of relative displacement.

9 to 11 are diagrams showing a second embodiment of the scanning exposure method and the scanning exposure apparatus of the present invention. In these figures, the same elements as those of the components of the first embodiment shown in FIGS. 1 to 8 are denoted by the same reference numerals and the description thereof will be omitted. The difference between the second embodiment and the first embodiment is that the first pattern is exposed to the glass substrate P by the first exposure, and then partially overlapped with the first pattern by the second exposure to expose the second pattern.

As shown in Fig. 9, the LCD pattern LP exposed on the glass substrate P has a first pattern exposed to the first exposure area 51 by the first exposure and a second exposure area by the second exposure. It consists of the 2nd pattern exposed to 52, and the 1st exposure area | region 51 and the 2nd exposure area | region 52 overlap in the overlapping area | region 53. As shown in FIG. Each of the exposure areas 51 and 52 moves the mask stage 4 in the Y direction to move the illumination area with respect to the mask M, and simultaneously moves the substrate stage 5 to the projection areas 34a to 34e. It is set by moving the position of the glass substrate P with respect to.

When exposing the LCD pattern LP, first, the first pattern is exposed to the first exposure area 51 in the same order as in the first embodiment. In addition, here, Tn = T1 = T0, and while the arbitrary position on the glass substrate P passes through the projection area | regions 34a-34e of the width | variety L0, 1 stroke (n == stroke of the glass substrate P to Z direction) 1) It is to be displaced.

At this time, the overlapping region 53 on the glass substrate P is projected and exposed at the end 35k of the projection region 34e. In addition, as shown in FIG. 10, the point K (in FIG. 10 shows the movement trace of this point) in the overlap area 53 is -X side edge part of the projection area | region 34e (in FIG. When the left end) is reached, the scanning exposure proceeds from the best focus position Z0 as a starting point, and the stroke toward the focus position Z + b is followed.

On the other hand, as shown in FIG. 9, when exposing a 2nd pattern to the 2nd exposure area | region 52, the overlapping area | region 53 on the glass substrate P is projected and exposed at the edge part 35j of the projection area | region 34a. At this time, when the point K reaches the -X side end portion of the projection area 34a, the scanning exposure proceeds from the best focus position Z0 as a starting point, so as to follow the stroke toward the focus position Zb. That is, the glass substrate P is displaced along the Z direction so that the relative displacement during the second exposure of the glass substrate P becomes inversely related to the relative displacement during the first exposure.

For this reason, the point K is exposed by Ta time by the edge part 35k of the projection area | region 34e, and is exposed by Tb time by the edge part 35j of the projection area | region 34a. Since Ta + Tb = T1, the point K is exposed with the same exposure time as another point located in the non-overlapping region. In addition, while the point K is exposed by the end portions 35k and 35j, the forward stroke relative to the displacement along the Z direction becomes one stroke equal to the previous stroke relative to the other displacement positioned at the non-overlapping area.

In addition, in order to match the previous stroke in which any point located in the overlapping area 53 is relatively displaced by the first exposure and the second exposure to the previous stroke in which another point located in the non-overlapping area is relative displacement is not limited to the above-described form. Instead, the relative displacement at the start or end of the exposure in the first exposure area 51 may substantially match at least one of the relative displacement at the start or the end of the exposure in the second exposure area.

In the scanning exposure method and the scanning exposure apparatus of the present embodiment, the same effects as those in the first embodiment can be obtained. In addition, the exposure area is formed by a so-called step-and-scan method in which the second exposure is carried out after the first exposure is terminated. In the case of overlapping exposure, the depth of focus is deepened in both of the exposure areas on the glass substrate P exposed by the non-overlapping area or the overlapping area to suppress the occurrence of color spots, and the exposure time is not longer than necessary. The drop in throughput of the exposure step can be prevented beforehand.

In addition, in the said 2nd Embodiment, although the 1st exposure and the 2nd exposure were implemented using the projection science system 3 which consists of projection system modules 3a-3e, it is not limited to this, For example, in FIG. As shown, a projection optical system having a single trapezoidal projection area 34f may be used. In this case, arbitrary points located in the overlapping region 53 on the glass substrate P are projected and exposed at the end portions 35m and 35n of the projection region 34f, respectively. The glass substrate during the first and second exposure is exposed. The relative displacement of (P) may be performed in the same manner as in the second embodiment.

In other words, when the shape of the projection area in the overlapping area and the shape of the projection area in the second exposure are linearly symmetric about an axis parallel to the scanning direction, the same operation as in the second embodiment is performed. If not, it may be carried out similarly to the first embodiment. In this way, the displacements during the first exposure and the second exposure are set in the in-phase or anti-phase relationship according to the shape of the projection area for exposing the overlapped area.

Moreover, in the said embodiment, although the glass substrate P was displaced to the sine wave shape through the board | substrate stage 5, it is not limited to this, For example, it is good also as a structure which displaces to step shape. In addition, when displacing the glass substrate P along the Z direction, the piezoelectric element may be lifted in the Z direction without using the focus position adjusting function.

In the above embodiment, the substrate stage 5 is moved in the Z direction with respect to the imaging position of the projection system modules 3a to 3e. However, the present invention is not limited thereto. For example, the Z stage of the substrate stage 5 is not limited thereto. A lifting mechanism which fixes the position and moves the mask stage 4 in the Z direction may be provided, and the mask M may be relatively displaced along the Z direction through the mask stage 4 during scanning exposure. Also in this case, the same action and effect as when relative displacement of the glass substrate P is obtained.

In addition to the method of displacing the glass substrate P or the mask M, the projection system modules 3a to 3e may be used as a method of relative displacement of the pattern position of the mask M and the glass substrate P along the Z direction. (Ie, the projection optical system) may be displaced. This can be realized by displacing the distance between the plurality of optical lenses provided in the projection system modules 3a to 3e at a predetermined period, for example, with a piezo element or the like.

Thus, when displacing the imaging positions of the projection system modules 3a to 3e for each module, at the end of the projection area of the first projection optical group 23 and the end of the projection area of the second projection optical group 24. If the forward stroke of the relative displacement through which the point (arbitrary position) on the exposed glass substrate P is exposed coincides with the forward stroke of the relative displacement through which the point exposed at the center of the projection area of each projection optical group 23 and 24 is subjected to The arrangement pitch L of the glory group 23, 24 does not necessarily satisfy the above expression (3). 4, 6 to 8, and 10, the relative displacement stroke is shown as a sin waveform, which is defined as a triangular wave-shaped trapezoidal displacement stroke that is substantially linearly displaced between z0 + b and z0-b. The relative displacement may be performed at periodic intervals.

As the substrate of the present embodiment, not only the glass substrate P for a liquid crystal display device, but also a semiconductor wafer for semiconductor devices, a ceramic wafer for thin film magnetic heads, or an original plate of a mask or reticle used in an exposure apparatus (synthetic quartz, silicon wafer) ) Is applied.

As the projection optical system 3, a projection optical system as shown in FIG. 13 can be used. FIG. 13 shows an example of a projection optical system having a structure in which two sets of modified Dyson optical systems are combined as the projection optical systems 3a to 3e shown in FIG. 1. Moreover, since each projection optical system 3a-3e has the same structure, each shows the structure of one projection optical system as a representative, and it demonstrates below.

This projection optical system has a first partial optical system 61 to 64, a field stop 65 and a second partial optical system 66 to 69, and these first and second partial optical systems are modified Dyson optical systems, respectively. It is.

The first partial optical system has a flat convex lens component 62 facing the mask and a convex face facing the opposite side of the right prism 61 and a menisc facing the flat convex lens component 62 side. It has a rectangular prism 64 disposed below the meniscus lens component 63 and the rectangular prism 61.

Light from the illumination optical system that has passed through the mask M is deflected by 90 ° by the rectangular prism 61 and is incident on the planar lens component 62. Light passing through the planar lens component 62 is refracted at the bonding surface 62a and reaches the reflecting surface 63a. The light reflected at the reflecting surface 63a reaches a rectangular prism 64 which is refracted at the bonding surface 62a and bonded to the flat convex lens component 62. This light is deflected by 90 degrees by the rectangular prism 64 to form the primary image of the mask M on the exit surface side of the rectangular prism 64. Here, in the primary image of the mask M formed by the first partial optical systems 61 to 64, the horizontal magnification in the X direction (optical axis direction) is positive, and the horizontal magnification in the Y direction is negative. It is equal compensation.

Light from the primary image forms a secondary image of the mask M on the glass substrate P through the second partial optical systems 66 to 69. In addition, since the structure of the 2nd partial optical system has the same structure as the 1st partial optical systems 61-64, description is abbreviate | omitted. Like the first partial optical system, the second partial optical systems 66 to 69 form an equal magnification of the horizontal magnification such that the X direction is positive and the Y direction is negative. Therefore, the secondary phase formed on the glass substrate P becomes an upright image of the equal multiple of the mask M. FIG. In addition, although detailed description is abbreviate | omitted, the projection optical system (1st and 2nd partial optical system) is a bilateral telecentric optical system. Further, the field stop 65 disposed at the primary position formed by the first partial optical systems 61 to 64 has a trapezoidal opening, for example. By this field stop 65, each exposure area on glass substrate P is defined in trapezoidal shape.

Even in the case of using the Dyson-type optical system in this manner, when the main beam passing through the center of the trapezoidal field of view projected on the glass substrate P is an optical axis, the glass substrate (in the Z direction becomes substantially perpendicular to the glass substrate P). By displacing P) at a predetermined cycle over a predetermined range, the image forming surface of the pattern of the mask M and the glass substrate P are relatively displaced in the optical axis direction.

The type of the scanning exposure apparatus 1 is not limited to an exposure apparatus for manufacturing a liquid crystal display device that exposes a liquid crystal display device pattern on a glass substrate P, and an exposure apparatus or thin film for semiconductor device manufacturing that exposes a semiconductor device pattern on a wafer. The present invention can also be widely applied to an exposure apparatus for manufacturing a magnetic head, an imaging device (CCD), a reticle, or the like.

In addition, as the light source 6, a bright line (g line (436 nm), h line (404.7 nm), i line (365 nm) generated in an ultra-high pressure mercury lamp, KrF excimer laser (248 nm), ArF excimer laser (193 nm) ), F2 laser (157 nm) can be used.

The magnification of the projection system modules 3a to 3e may be any of a reduction system and an expansion system as well as an equal magnification system. As projection system modules 3a to 3e, when using ultraviolet rays such as excimer lasers, materials that transmit ultraviolet rays such as quartz or fluorite are used as the base material, and when F2 lasers or X-rays are used, reflections are used. An optical system of the refractometer or the refractometer (the mask M also uses a reflective type) may be used. Moreover, it is applicable also to the proximity exposure apparatus which exposes the pattern of the mask M by making the mask M and glass substrate P adjoin without using projection system modules 3a-3e.

When a linear motor (see USP 5,623,853 or USP 5,528,118) is used for the substrate stage 5 or the mask stage 4, either an air floating type using an air bearing and a magnetic floating type using a Lorentz force or a reactance force may be used. . In addition, each stage 4 and 5 may be a type which moves along a guide, or may be a guideless type which does not provide a guide.

As the driving mechanisms 37 and 40 of the stages 4 and 5, the magnet unit (permanent magnet) in which magnets are arranged in two dimensions and the armature unit in which coils are arranged in two dimensions are opposed to each other. The flat motor which drives the stages 4 and 5 may be used. In this case, one of the magnet unit and the armature unit may be connected to the stages 4 and 5, and the other of the magnet unit and the armature unit may be provided on the moving surface side (base) of each stage 4 and 5.

As described in JP-A-8-166475 (USP 5,528,118), the reaction force generated by the movement of the substrate stage 5 is mechanically floored so as not to be transmitted to the projection optical system 3. You may escape to (Earth). The present invention is also applicable to an exposure apparatus having such a structure.

As described in JP-A-8-330224 (US S / N 08 / 416,558), the reaction force generated by the movement of the mask stage 4 is not transmitted to the projection optical system 3. May be used to mechanically escape the floor (ground). The present invention is also applicable to an exposure apparatus having such a structure.

As described above, the scanning type exposure apparatus 1, which is the substrate processing apparatus of the present embodiment, maintains a predetermined mechanical precision, electrical precision, and optical precision in various subsystems including each component mentioned in the claims of the present application. To be assembled. In order to secure these various accuracy, before and after this assembly, adjustment for achieving optical precision for various optical systems, adjustment for achieving mechanical precision for various mechanical systems, and electrical precision for various electric systems are performed. Adjustment is made. The assembly process from the various subsystems to the exposure apparatus includes mechanical connections of various subsystems, wiring connections of electric circuits, piping connections of pneumatic circuits, and the like. It is natural that each subsystem has an assembly process before the assembly process from these various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is made to ensure various accuracy as the whole exposure apparatus. In addition, it is preferable that manufacture of an exposure apparatus is performed in the clean room where temperature, a clean degree, etc. were managed.

As shown in FIG. 12, a device such as a liquid crystal display device or a semiconductor device includes a step 201 of performing a function and performance design of a liquid crystal display device and the like, and a step of manufacturing a mask M (reticle) based on this design step ( 202, the glass substrate P of quartz or the like (step 203) of manufacturing a wafer from a silicon material, and the pattern of the mask M by the scanning type exposure apparatus 1 of the above-described embodiment. ) (Or wafer), assembling a liquid crystal display device, etc. (in the case of a wafer, including a dicing step, a bonding step, and a package step) 205, an inspection step 206, and the like. Manufactured through.

As described above, in the scanning exposure method according to claim 1, when a part of the exposure area of the substrate is overlapped and exposed, the image forming surface of the pattern of the substrate and the mask is relatively over a predetermined range in a direction substantially perpendicular to the substrate. In order to displace it.

As a result, the depth of focus on the substrate is increased by this scanning exposure method, and the difference in the amount of exposure energy between a plurality of exposure areas, overlapping areas, and non-overlapping areas can be reduced. Can be prevented, and the effect of lowering the throughput of the exposure step can be prevented.

The scanning exposure method according to claim 2 has a sequence of displacing at least one position of the mask and the substrate in a direction substantially perpendicular to the substrate when relatively shifting.

Therefore, in this scanning exposure method, since the imaging position of the pattern and the substrate are relatively displaced along the optical axis direction, the depth of focus is increased and the difference in the amount of exposure energy on the substrate can be reduced to suppress the generation of color spots. Obtained.

The scanning exposure method according to claim 3 is arranged in the order in which the relatively displacing operation is performed by the first exposure and the second exposure, which form overlapping exposure.

As a result, in this scanning exposure method, the depth of focus on the substrate is increased even when the exposure area is overlapped and exposed by a so-called step-and-scan method in which a plurality of scanning exposures are performed on the substrate, and generation of color spots can be suppressed. Exposure time does not become longer than necessary, and the fall of the throughput of an exposure process can be prevented beforehand.

The scanning exposure method according to claim 4 is a sequence in which a relatively displacing operation is performed in a continuous change and at a predetermined period.

As a result, the scanning exposure method does not lengthen the exposure time more than necessary, and the effect that the throughput decrease in the exposure step can be prevented in advance.

The scanning exposure method according to claim 5 is arranged in such a manner as to match the previous stroke in which the relative position at an arbitrary position of the overlapping region is displaced and the previous stroke in which the relative position at an arbitrary position of the non-redundant region is displaced. .

As a result, the scanning exposure method eliminates the difference in the amount of exposure energy between the respective areas, and even when a plurality of projection optical systems are used in which the projection areas are partially overlapped, color spots caused by the difference in the amount of exposure energy between the respective projection optical systems can be eliminated. As a result, it is possible to contribute to the improvement of device quality.

In the scanning exposure method according to claim 6, the period of the displacement during the first exposure and the period of the displacement during the second exposure at an arbitrary position of the overlapping region is in the order of in-phase or anti-phase relationship. .

As a result, the scanning exposure method eliminates the difference in the amount of exposure energy between the overlapping region and the non-overlapping region even when the exposure region is overlapped and exposed by a so-called step-and-scan method in which a plurality of scanning exposures are performed on the substrate. The color stain due to the difference can be eliminated, and the effect of contributing to the improvement of device quality is obtained.

The scanning exposure method according to claim 7, wherein the relative displacement at the start or end of exposure in the first exposure area at an arbitrary position of the overlapping area is determined at the beginning or the end of the exposure in the second exposure area. The order is substantially coincident with at least one of the relative displacements.

As a result, the scanning exposure method eliminates the difference in the amount of exposure energy between the overlapping and non-overlapping areas of the first exposure area and the second exposure area, thereby eliminating color spots caused by the difference in the exposure energy amount. The effect of contributing to the improvement of quality is obtained.

The scanning exposure apparatus according to claim 8, when the overlapping part of the exposure area that is projected and exposed in the projection optical system is overlapped with each other, the displacement adjusting device sets the image forming surface of the pattern of the substrate and the mask in a direction substantially perpendicular to the substrate. It is configured to displace relatively over the range of.

As a result, the depth of focus on the substrate is increased by this scanning exposure method, so that the difference in the amount of exposure energy between a plurality of exposure areas, overlapping areas, and non-overlapping areas can be reduced. Can be prevented, and the effect of lowering the throughput of the exposure step can be prevented.

The scanning exposure apparatus according to claim 9 has a configuration in which the displacement adjusting device sets a period of relative displacement based on a predetermined pitch of the first projection optical group and the second projection optical group.

As a result, in this scanning exposure method, the entire stroke of the relative displacement of the point exposed in the overlapped and non-overlapping areas of the first projection optical group and the second projection optical group is identical, and the difference in the amount of exposure energy is lost between the respective areas. Even when a plurality of projection optical systems are used in which regions are partially overlapped, color spots caused by the difference in the amount of exposure energy between the respective projection optical systems can be eliminated, and the effect of improving the quality of the device can be obtained.

The scanning exposure apparatus according to claim 10 sets the period of relative displacement so that the relationship between the distance that the substrate moves synchronously between a predetermined pitch and a predetermined period is m times (m is an integer of 1 or more). It becomes the structure to say.

As a result, in this scanning exposure apparatus, the relative displacement of the substrate in the projection area of the first projection optical group and the projection area of the second projection optical group becomes in phase, and the relative displacement of the point exposed in the overlapping area and the non-overlapping area. The effect of matching the entire stroke of is obtained.

Claims (12)

A scanning exposure method in which a mask and a substrate are synchronously moved to expose a pattern of the mask on the substrate through a projection optical system, wherein the part of the exposure area of the substrate projected and exposed by the projection optical system is overlapped and exposed. And the imaging surface of the pattern of the substrate and the mask is relatively displaced over a predetermined range in a direction substantially perpendicular to the substrate. The method of claim 1, And said at least one position of said mask and said substrate is displaced in a direction substantially perpendicular to said substrate when said relatively displacing. The method according to claim 1 or 2, And said relatively displacing operation is performed by a first exposure and a second exposure forming said overlapping exposure. The method according to claim 1 or 2, And said relatively displacing operation is performed continuously and at predetermined intervals. The method of claim 2, And said relatively displacing operation is performed continuously and at predetermined intervals. The method of claim 1, The exposure area of the substrate has a overlapping area overlappingly exposed on the substrate and a non-overlapping area exposed without being overlapped on the substrate, and the total stroke at which the relative position at any position of the overlapping area is displaced and the ratio The scanning exposure method according to claim 1, wherein the entire stroke at which the relative position at any position of the overlapping region is displaced coincides. The method of claim 5, The exposure area of the substrate has a overlapping area overlappingly exposed on the substrate and a non-overlapping area exposed without being overlapped on the substrate, and the total stroke at which the relative position at any position of the overlapping area is displaced and the ratio The scanning exposure method according to claim 1, wherein the entire stroke at which the relative position at any position of the overlapping region is displaced coincides. The method according to claim 1 or 7, The overlapped overlapping region is exposed by the first exposure and the second exposure, and the period of the displacement during the first exposure and the displacement during the second exposure at any position of the overlapping region is Scanning exposure method characterized by the relationship between in-phase or inverse phase. The method according to claim 1 or 7, The overlapped overlapping region is overlapped in the first exposure region and the second exposure region, and the relative displacement at the start of the exposure or at the end of the exposure at any position of the overlap region is A scanning exposure method, characterized in that substantially coincides with at least one of the relative displacements at the start or end of exposure in the second exposure area. A scanning exposure apparatus for synchronously moving a mask and a substrate to expose a pattern of the mask on the substrate through a projection optical system. A displacement adjusting device which relatively displaces an image forming surface of the pattern of the substrate and the mask over a predetermined range in a direction substantially perpendicular to the substrate when overlapping a part of the exposure area projected and exposed by the projection optical system; Scanning exposure apparatus characterized in that it comprises. The method of claim 10, The projection optical system includes a first projection optical group and a second projection optical group which are located at a predetermined pitch away from each other in the movement direction and are arranged such that respective projection regions overlap each other, and the displacement adjusting device includes the first projection optical group. And a period of the relative displacement based on the predetermined pitch of the second projection optical group. The method of claim 11, The displacement adjusting device sets the period of the relative displacement such that the relationship between the predetermined distance and the distance between the substrates moving in the synchronous movement is m times (m is an integer of 1 or more). A scanning exposure apparatus characterized by the above-mentioned.