KR20010073407A - bulk specialty gas supply system - Google Patents

bulk specialty gas supply system Download PDF

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Publication number
KR20010073407A
KR20010073407A KR1020000001770A KR20000001770A KR20010073407A KR 20010073407 A KR20010073407 A KR 20010073407A KR 1020000001770 A KR1020000001770 A KR 1020000001770A KR 20000001770 A KR20000001770 A KR 20000001770A KR 20010073407 A KR20010073407 A KR 20010073407A
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KR
South Korea
Prior art keywords
line
supply line
gas
main supply
gas supply
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KR1020000001770A
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Korean (ko)
Inventor
이종덕
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김재욱
한양기공 주식회사
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Priority to KR1020000001770A priority Critical patent/KR20010073407A/en
Publication of KR20010073407A publication Critical patent/KR20010073407A/en

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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16BDEVICES FOR FASTENING OR SECURING CONSTRUCTIONAL ELEMENTS OR MACHINE PARTS TOGETHER, e.g. NAILS, BOLTS, CIRCLIPS, CLAMPS, CLIPS OR WEDGES; JOINTS OR JOINTING
    • F16B15/00Nails; Staples
    • F16B15/06Nails; Staples with barbs, e.g. for metal parts; Drive screws
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16BDEVICES FOR FASTENING OR SECURING CONSTRUCTIONAL ELEMENTS OR MACHINE PARTS TOGETHER, e.g. NAILS, BOLTS, CIRCLIPS, CLAMPS, CLIPS OR WEDGES; JOINTS OR JOINTING
    • F16B15/00Nails; Staples
    • F16B15/08Nails; Staples formed in integral series but easily separable

Abstract

PURPOSE: A gas supply line for manufacturing a semiconductor is provided to prevent the gas supply from discontinuing by continuously flowing the gas through an auxiliary line in an emergency situation. CONSTITUTION: A regulator(6) and a plurality of valves(7) are arranged on two main supply lines(2, 2). Each connection tube(21) is arranged between the main supply lines(2, 2), and a backup line(4) is arranged to connect with the main supply line(2). Each bypass line(5, 5) is arranged on the way to each main supply line(2, 2). When gas is supplied through a gas supply cylinder(1) in the state that the main supply line(2), the backup line(4) and the bypass line(5) are connected each other, the gas passes through the main supply line(2). When an air valve arranged on the main supply line(2) is closed by trouble, the gas passed through the backup line(4) or the bypass line(5).

Description

반도체 제조용 가스 공급라인{bulk specialty gas supply system}Bulk specialty gas supply system

본 발명은 반도체 제조용 가스공급라인에 관한 것으로,더욱상세하게는 반도체 제조를 위해 가스공급실린더로부터 필터를 거쳐 공급되는 각종가스가 공급도중에 콘트롤러의 이상작동으로 메인공급라인의 에어밸브가 닫히게 되는 경우, 공급되던 가스가 자동으로 바이패스 라인 또는 백업라인등의 보조공급라인을 통해 거쳐 계속적으로 공급되도록 함으로써 가스 공급 중단에 따른 반도체 제조 공정에 차질을 주는 것을 미연에 방지 할 수 있을 뿐만 아니라 가스폭발등 불의의 사고 발생을 미연에 방지 할수 있도록 한 것이다.The present invention relates to a gas supply line for semiconductor manufacturing, and more particularly, in the case in which the air valve of the main supply line is closed due to abnormal operation of the controller during the supply of various gases supplied from the gas supply cylinder through the filter for semiconductor manufacturing, By continuously supplying the supplied gas through an auxiliary supply line such as a bypass line or a backup line, it is possible not only to prevent the disruption of the semiconductor manufacturing process due to the gas supply interruption, but also to prevent the gas explosion. It is to prevent accidents in advance.

일반적으로 반도체 제조를 위해 각종 가스가 공급,사용되고 있는것인바,이들 가스들은 일정용적크기를 갖는 가스공급실린더내에 고압으로 충전되어 안전하게 유지 관리 되는 상태에서 가스공급라인을 통해 프로세스 챔버로 공급되게되어 반도체제조를 위해 사용되고 있다.Generally, various gases are supplied and used for semiconductor manufacturing. These gases are supplied to a process chamber through a gas supply line while being safely maintained at a high pressure in a gas supply cylinder having a predetermined volume. It is being used for

그러나 이와 같이 가스를 공급하기 위한 종래의 가스 공급 라인(판넬)은 라인 도중에 콘트롤러와 연동 작동되는 다수의 에어 밸브가 설치되어 설정된 압력 범위 이내에서 반도체제조용 가스가 안전하게 지속적으로 공급되는 과정에서 콘트롤러의 이상 작동이나 또는 고장등의 요인으로 인해 공급라인에 설치된 임의 에어 밸브가 닫히게 되는 경우, 가스공급라인이 직결로 단선화 되어 있는 종래 가스공급라인의 구성 특성상 빠른 시간내에 닫힌 에어밸브를 수동으로 열어 가스의 원할한 공급이 지속적으로 이루어지도록 하여 반도체제조공정에 지장을 초래하지 않도록 하여야 할뿐만 아니라, 가스공급 상황대처가 늦어지게 되는 경우 심하면, 라인의 폭발 사고로까지 야기될 위험이 있는것이어서,작업자는 항상 가스공급라인에 대한 지속적인 주의,관찰이 요구되고 있는 실정으로 이또한 그만큼 장비와 인력의 소모가 요구되는 비경제적인 문제가 있는것이었다.However, in the conventional gas supply line (panel) for supplying gas as described above, a plurality of air valves interlocked with the controller are installed in the middle of the line so that the abnormality of the controller in the process of safely and continuously supplying the gas for semiconductor manufacturing within the set pressure range. If any air valve installed in the supply line is closed due to operation or failure, the air supply will be manually opened by closing the closed air valve within a short time due to the configuration of the conventional gas supply line. In addition to ensuring that the supply is consistent and not disruptive to the semiconductor manufacturing process, there is a risk that if the gas supply situation is delayed, there is a risk of causing an explosion of the line. Continuous attention to gas supply line One yitto a situation that is required so that was a non-economic issues that consumption of equipment and personnel requirements.

따라서 본 발명의 목적은 상기와 같이 단일직렬공급라인으로 되어 공급라인에 설치된 에어밸브의 예기치 않은 작동 불능상황에 그때그때 신속하게 대응해야만 하는 종래 반도체 제조용 가스 공급라인이 지닌 제반 문제점을 해결하기 위하여, 가스공급실린더로부터 프로세스 챔버로 반도체 제조용 가스를 공급하는 공급라인을, 메인공급라인과는 별도로 복수의 보조공급라인을 병렬화 하여 상기 메인공급라인과 서로 연통 상태가 유지 되도록 구성하여, 평상시에는 메인공급라인을 통해 설정된 압력으로 가스가 순조롭게 공급 되도록 하되, 콘트롤러의 이상이나 고장등으로 임의 에어밸브가 닫히는 비상상황발생시에는, 메인공급라인으로 공급되던 가스가 메인공급라인과 연통상태인 보조공급라인을 통해 자동으로 우회공급되도록 함으로써 항상 지속적인 가스 공급이 가능하도록 하는것에 의해 원할하고 안정적으로 반도체를 제조할 수 있을 뿐만 아니라 가스의 원할한 공급이 중단되는데 따른 폭발의 위험도 미연에 방지 할 수 있는 반도체 제조용 가스 공급라인을 제공함에 있다.Accordingly, an object of the present invention is to solve the problems of the conventional semiconductor manufacturing gas supply line, which must be quickly responded to the unexpected inoperability of the air valve installed in the supply line as a single series supply line as described above. The supply line for supplying the semiconductor manufacturing gas from the gas supply cylinder to the process chamber is configured to maintain a state of communication with the main supply line by parallelizing a plurality of auxiliary supply lines apart from the main supply line. The gas is supplied smoothly at the set pressure, but in case of an emergency situation in which any air valve is closed due to an abnormality or failure of the controller, the gas supplied to the main supply line is automatically supplied through the auxiliary supply line communicating with the main supply line. Always ensures that Of only the gas supply can produce a semiconductor with desired by haneungeot and stable to allow it, not the semiconductor manufacturing gas supply line to avoid the risk of explosion of the non-drawn in accordance with this there is a supply of the desired gas stopped to provide.

도 1은 본 발명에 의한 가스 공급 라인의 계통도1 is a system diagram of a gas supply line according to the present invention.

※ 도면의 주요부분에 대한 부호의 설명※ Explanation of code for main part of drawing

1 : 가스공급실린더 2 : 메인공급라인1: gas supply cylinder 2: main supply line

3 : 프로세스챔버 4 : 백업라인3: process chamber 4: backup line

5 : 바이패스라인 21 : 연결관5: bypass line 21: connector

상기한 목적을 달성하기 위하여 본 발명에 의한 반도체 제조용 가스공급 라인은,가스공급실린더(1)로부터 도중에 레귤레이터(6) 및 다수의 밸브(7)가 설치된 메인공급라인(2)(2)을 거쳐 프로세스챔버(3)로 소정 압력으로 반도체제조용 가스가 공급되도록 하는 반도체 제조용 가스공급라인(A)을 구성함에 있어서, 상기 메인공급라인(2)(2)사이에는 각각 연결관(21)을 개재하여 메인공급라인(2)과 연통되게 백업라인(4)을 설치함과 동시에 상기 각 메인공급라인(2)(2)도중에는 각각 바이패스라인(5)(5)을 설치하여서 되는 것을 특징으로 한다.In order to achieve the above object, a gas supply line for manufacturing a semiconductor according to the present invention is provided via a main supply line (2) (2) provided with a regulator (6) and a plurality of valves (7) on the way from a gas supply cylinder (1). In constructing a gas supply line (A) for semiconductor manufacturing, which supplies a gas for semiconductor production at a predetermined pressure to the process chamber (3), between the main supply lines (2) (2) via a connecting pipe (21), respectively. The backup line 4 is installed in communication with the main supply line 2, and at the same time, the bypass lines 5 and 5 are respectively installed in the main supply lines 2 and 2, respectively.

이하 본 발명이 속하는 기술분야에서 통상의 지식을 가진 자가 본 발명을 용이하게 실시할 수 있을 정도로 본 발명의 바람직한 실시예를 첨부된 도면을 참조하여 상세하게 설명하면 다음과 같다.Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings such that those skilled in the art may easily implement the present invention.

도 1은 본 발명에 의한 반도체 제조용 가스공급라인의 구성을 나타내는 계통도로서, 그 구성은 레귤레이터(6)와 다수의 밸브(7)가 설치된 양 메인공급라인(2)(2) 사이에 연결관(21)을 개재하여 백업라인(4)을 서로 연통 상태로 설치하고,또한 상기 각 메인공급라인(2)(2)에는 그 도중에 각각 바이패스 라인(5)(5)을 설치하는 구성으로 되어 있다.1 is a system diagram showing the configuration of a gas supply line for semiconductor manufacturing according to the present invention, the configuration of which is connected between the regulator (6) and both main supply line (2) (2) installed a plurality of valves ( The backup line 4 is provided in communication with each other via 21, and each of the main supply lines 2 and 2 is provided with bypass lines 5 and 5 in the middle thereof. .

반도체의 제조를 위해 본 발명의 가스공급라인(A)을 이루는 메인공급라인(2)(2)의 일단에 소정의 용적크기를 갖는 가스공급실린더(1)를 각각 연결설치 한 상태에서 공급라인전체, 즉 메인공급라인(2)과 백업라인(4) 및 바이패스라인(5)을 서로 연통상태로 유지되게 한 상태에서 가스공급실린더(1)를 열어 가스가 공급되게 하면, 공급되는 가스는 일차적으로 메인공급라인(2)(2)을 통해 흘러프로세스챔버(3)로 순조롭게 공급되어 반도체제조를 위한 가스로서 공급되게 된다.The entire supply line in a state in which gas supply cylinders 1 having predetermined volume sizes are connected to one end of the main supply lines 2 and 2 constituting the gas supply line A of the present invention for manufacturing a semiconductor. That is, when the gas supply cylinder 1 is opened while the main supply line 2 and the backup line 4 and the bypass line 5 are kept in communication with each other, the gas supplied is primarily This flows through the main supply line (2) (2) and is smoothly supplied to the process chamber (3) is supplied as a gas for the semiconductor manufacturing.

이때 메인공급라인(2)(2) 요소요소에 설치된 에어밸브를 구동하는 콘트롤러가 이상이나 고장을 일으켜 작동중이던 에어밸브가 닫히게 되는 경우, 메인공급라인 (2)(2)내부를 흐르던 가스는 이 메인공급라인(2)(2)과 연결관(21)에 의해 연통상태로 연결설치된 백업라인(4)이나 또는 조건에 따라 각 메인공급라인(2)(2) 도중에 설치된 바이패스라인(5)을 통해 그 흐름을 지속하게 되어 어떤 상황에서도 가스공급라인이 막혀 가스의 공급이 중단되는 일 없이 프로세스챔버(3)에대한 원할한 가스 공급이 이루어지게 되므로 가스공급중단에 따른 반도체 제조 공정에 영향을 미치는 일은 전혀 발생하지 않게 되어 양질의 반도체를 생산할 수 있게 된다.At this time, when the controller which drives the air valve installed in the element element of the main supply line (2) (2) fails or malfunctions and the air valve being operated is closed, the gas flowing inside the main supply line (2) (2) Backup line (4) connected in communication with main supply line (2) (2) and connecting pipe (21) or bypass line (5) installed in the middle of each main supply line (2) (2) depending on the conditions The flow is continued through the gas supply line so that the gas supply line can be smoothly supplied to the process chamber 3 without any interruption of the gas supply line, thereby affecting the semiconductor manufacturing process due to the gas supply interruption. The impact does not occur at all, allowing the production of quality semiconductors.

이와 같이 콘트롤러의 작동이상으로 임의 에어밸브가 닫힌 상태에서도 가스실린더로부터 공급되는 가스는 보조공급라인인 백업라인(4)이나 바이패스라인(5)을 통해 반도체 제조해 지속적으로 공급되게될 뿐만아니라 가스공급을 중단하지 않고서도 작동 이상을 일으킨 콘트롤러나 에어밸브등의 부품을 교체,수리 할수 있게 되므로 가스 공급라인에 대한 전체적인 가동중지 없이 부분적인 부품 교체수리도 가능하게 되어 보다 효율적인 반도체 제조가 가능하게 된다.In this way, even when the air valve is closed due to the abnormal operation of the controller, the gas supplied from the gas cylinder is not only supplied by the semiconductor through the backup line 4 or the bypass line 5, which is an auxiliary supply line, but also continuously supplied. It is possible to replace and repair parts such as controllers or air valves that have caused abnormal operation without stopping supply, thus enabling partial parts replacement and repair without stopping the gas supply line. .

이상에서와 같이 본 발명은 비록 상기실시예에 한하여 설명하였지만 반드시 여기에만 한정되는 것은 아니며 본 발명의 범주와 사상을 벗어나지 않는 범위내에서 다양한 변형실시가 가능함은 물론이다.As described above, although the present invention has been described with reference to the above embodiments, it is not necessarily limited thereto, and various modifications may be made without departing from the scope and spirit of the present invention.

이상의 설명에서 분명히 알 수 있듯이, 본 발명의 반도체 제조용 가스 공급라인에 의하면, 반도체 제조를 위해 메인공급라인을 통해 공급되는 각종가스의 공급이 콘트롤러의 작동이상이나 기타 사유에 의해 에어밸브가 닫히게 되는 비상상황 발생시에도 메인공급라인으로 공급되던 가스가 상황에 따라 메인공급라인과 연통상태로 설치되는 보조라인, 즉 백업라인과 바이패스 라인중 임의 보조라인을 통해 막힘없이 계속적으로 흐를 수 있도록 함으로써 반도체 제조를 위한 가스공급이 어떠한 상황에서도 중단되는 일 없이 지속적으로 공급되도록 하여 반도체의 생산성을 높일 수 있게 되는 동시에 가스공급라인의 유지보수도 용이하게 되는등의 유용한 효과를 제공한다.As apparent from the above description, according to the gas supply line for semiconductor manufacturing of the present invention, the supply of various gases supplied through the main supply line for semiconductor manufacturing causes the air valve to be closed due to abnormal operation of the controller or other reasons. Even in the event of a situation, semiconductor manufacturing can be performed by allowing the gas supplied to the main supply line to flow continuously without any block through the auxiliary line installed in communication with the main supply line, that is, the backup line and the bypass line. The gas supply for this purpose is to be supplied continuously without interruption in any situation, thereby increasing the productivity of the semiconductor and at the same time providing a useful effect such as easy maintenance of the gas supply line.

Claims (1)

가스공급실린더(1)로 부터 도중에 레귤레이터(6) 및 다수의 밸브(7)가 설치된 메인공급라인(2)(2)을 거쳐 프로세스챔버(3)로 소정압력으로 가스가 공급되도록 하는 반도체 제조용 가스공급라인(A)을 구성함에 있어서, 상기 메인공급라인(2)(2)사이에는 각각 연결관(21)을 개재하여 메인공급라인(2)과 연통되게 백업라인(4)을 설치함과 동시에 상기 각 메인공급라인(2)(2) 도중에는 각각 바이패스라인(5)(5)을 설치하여서 되는 것을 특징으로 하는 반도체 제조용 가스공급라인.A gas for semiconductor manufacturing which allows gas to be supplied at a predetermined pressure from the gas supply cylinder 1 to the process chamber 3 via a main supply line 2 and 2 in which a regulator 6 and a plurality of valves 7 are installed. In constructing the supply line (A), between the main supply line (2) and (2), while installing the backup line (4) in communication with the main supply line (2) via a connecting pipe (21) at the same time A gas supply line for semiconductor manufacturing, characterized in that each of the main supply line (2) (2) is provided with a bypass line (5) (5) respectively.
KR1020000001770A 2000-01-14 2000-01-14 bulk specialty gas supply system KR20010073407A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100478012B1 (en) * 2002-05-02 2005-03-22 주성엔지니어링(주) Gas providing system of ALD process module
KR101145852B1 (en) * 2005-11-02 2012-05-17 주식회사 케이씨텍 Gas supplying device for manufacturing electronic material and method thereof
KR101275890B1 (en) * 2006-09-18 2013-06-14 엘지디스플레이 주식회사 Apparatus for providing a divided gas
KR101997214B1 (en) * 2018-04-30 2019-10-01 주식회사 디오하베스트 The hot air supply system comprising heating jacket for heating gas cylinder using hot air

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JPH06333792A (en) * 1993-05-19 1994-12-02 Tokyo Electron Ltd Atmosphere opening method of vacuum chamber and its device
KR970025779U (en) * 1995-11-23 1997-06-20 Semiconductor manufacturing device with constant gas supply system
KR970072056A (en) * 1996-04-26 1997-11-07 김광호 Gas supply processing device for semiconductor device manufacturing
KR19980022570A (en) * 1996-09-23 1998-07-06 김광호 Gas supply device of semiconductor diffusion equipment
KR19980027353A (en) * 1996-10-15 1998-07-15 김광호 Gas supply device for semiconductor manufacturing

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06333792A (en) * 1993-05-19 1994-12-02 Tokyo Electron Ltd Atmosphere opening method of vacuum chamber and its device
KR970025779U (en) * 1995-11-23 1997-06-20 Semiconductor manufacturing device with constant gas supply system
KR970072056A (en) * 1996-04-26 1997-11-07 김광호 Gas supply processing device for semiconductor device manufacturing
KR19980022570A (en) * 1996-09-23 1998-07-06 김광호 Gas supply device of semiconductor diffusion equipment
KR19980027353A (en) * 1996-10-15 1998-07-15 김광호 Gas supply device for semiconductor manufacturing

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100478012B1 (en) * 2002-05-02 2005-03-22 주성엔지니어링(주) Gas providing system of ALD process module
KR101145852B1 (en) * 2005-11-02 2012-05-17 주식회사 케이씨텍 Gas supplying device for manufacturing electronic material and method thereof
KR101275890B1 (en) * 2006-09-18 2013-06-14 엘지디스플레이 주식회사 Apparatus for providing a divided gas
KR101997214B1 (en) * 2018-04-30 2019-10-01 주식회사 디오하베스트 The hot air supply system comprising heating jacket for heating gas cylinder using hot air

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