KR101275890B1 - Apparatus for providing a divided gas - Google Patents

Abstract

The present invention relates to a gas distribution supply apparatus for distributing and supplying gas to various process chambers, and an object of the present invention is to supply gas to each process chamber separately from a main supply line for supplying gas to each process chamber. By providing a back-up supply line, it is to provide a gas distribution supply device that can be prepared in case of a problem in the main supply line. To this end, the gas distribution supply apparatus according to the present invention includes a gas supply unit for supplying or blocking the process gas flowing out of the gas cylinder by the main inlet valve; A switching valve unit for switching and supplying the process gas supplied from the gas supply part to different paths; A main supply unit for distributing and supplying the process gas supplied from the switching valve unit to each process chamber; And a backup supply part branched from the switching valve part to be connected to the process chamber in order to divert and supply the process gas to each process chamber when an abnormality occurs in the main supply part.

Description

Gas distribution supply unit {APPARATUS FOR PROVIDING A DIVIDED GAS}

1 is a configuration diagram of an embodiment of a general gas supply system.

Figure 2 is a configuration diagram of one embodiment of a conventional gas distribution supply device.

Figure 3 is a configuration diagram of one embodiment of a gas distribution supply apparatus according to the first embodiment of the present invention.

Figure 4 is a configuration diagram of one embodiment of a gas distribution supply apparatus according to a second embodiment of the present invention.

<Explanation of symbols for main parts of the drawings>

110: main supply section 111: main supply line

112: main distributed supply line 120: backup supply unit

121: backup supply line 122: backup distributed supply line

130: switching valve unit 131: first switching valve

132: second switching valve 40, 140: purge gas supply line

The present invention relates to an apparatus for supplying gas to various chambers, and more particularly, to a gas distribution supply apparatus for distributing and supplying gas to various process chambers.

In general, a process chamber for manufacturing an electronic material such as a semiconductor device or a liquid crystal panel of a liquid crystal display (LCD) requires supply of a process gas.

That is, a semiconductor device or a liquid crystal panel is manufactured through various processes in which various kinds of thin films (for example, an oxide film, a nitride film, an insulating film, a metal film, etc.) are sequentially stacked and patterned on a wafer or a substrate. Alternatively, a process chamber for forming an arbitrary thin film on the substrate or patterning the formed thin film, for example, a deposition chamber, an etching equipment, etc., is essentially required.

On the other hand, such process chambers require a variety of process gases when forming, patterning, etc. of the thin film, the process gases used are usually distributed from a gas distribution supply device prepared in the manufacturing plant, The gas distribution supply device is generally configured in a cabinet form and installed inside the manufacturing plant.

1 is a configuration diagram of an embodiment of a general gas supply system.

That is, FIG. 1 illustrates a gas supply system for supplying gas to process chambers 50 inside a manufacturing plant through a cabinet 70 in which a gas distribution supply device is disposed. At this time, the gas distribution supply apparatus installed in the cabinet 70 is provided with a gas cylinder which is a cylindrical container for putting compressed high-pressure gas or liquefied gas, the gas supply pipe 80 is installed outside the manufacturing plant gas Gas injected through the gas supply pipe 80 from a tank vehicle or the like is supplied to each process chamber by the gas distribution supply device in a state stored in the gas cylinder. To this end, a plurality of supply lines are branched to the gas distribution supply device according to the number of process chambers.

2 is a configuration diagram of an embodiment of a conventional gas distribution supply device. As shown in the drawing, a conventional gas distribution supply device is installed on a supply line to control a process gas supplied from a gas cylinder 61. An air valve 71, a main process valve 13 for intermitting the process gas supplied to each process chamber, a regulator 15 for regulating the pressure of the process gas, and each process chamber 50. And manometers 72 and 14 for measuring the gas pressure of the supplied process gas.

At this time, the gas distribution supply apparatus is installed and managed inside the facility in the form of a cabinet 70 as described above.

However, in the conventional gas supply device having the above configuration, if a problem occurs in any one of the components of the automatic valve 71, the main process valve 13, the regulator 15, and the pressure gauges 72 and 14, Since the entire gas supply has to be stopped, there is a problem in that an interruption in the electronic material manufacturing process causes a huge time and economic loss.

Accordingly, an object of the present invention for solving the above problems is provided with a back-up supply line capable of supplying gas to each process chamber separately from the main supply line for supplying gas to each process chamber. By doing so, it is to provide a gas distribution supply apparatus that can be prepared in case of a problem in the main supply line.

In order to achieve the above object, the gas distribution supply apparatus according to the present invention, the gas supply for supplying or blocking the process gas flowing out of the gas cylinder by the main inlet valve; A switching valve unit for switching and supplying the process gas supplied from the gas supply part to different paths; A main supply unit for distributing and supplying the process gas supplied from the switching valve unit to each process chamber; And a backup supply part branched from the switching valve part to be connected to the process chamber in order to divert and supply the process gas to each process chamber when an abnormality occurs in the main supply part.

The backup supply unit may be branched from the switching valve unit and connected between the process chamber and the main supply unit.

The main supply unit may include a main supply line connected to the switching valve unit; A main dispersion supply line branched from the main supply line and connected to each process chamber, wherein each of the main dispersion supply lines includes a main process valve (MV2) for controlling the inflow of process gas into the main dispersion supply line; )Wow; A regulator for regulating the pressure of the process gas supplied through the main process valve; And a second pressure gauge (M2) for measuring the pressure of the process gas controlled by the regulator.

The backup supply unit may be branched from the switching valve unit and connected to the main dispersion supply line between the main process valve and the regulator.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

3 is a configuration diagram of a gas distribution supply apparatus according to a first embodiment of the present invention, and shows a gas distribution supply apparatus including a back-up supply line.

That is, the gas distribution supply apparatus according to the first embodiment of the present invention, the gas supply unit 160 for supplying or blocking the process gas flowing out of the gas cylinder 161 by the main inlet valve 162, and the gas A switching valve unit 130 for switching and supplying the process gas supplied from the supply unit in a different path, a main supply unit 110 for distributing and supplying the process gas supplied from the switching valve unit to each process chamber, and The backup supply unit 120 is branched from the switching valve unit and connected to the process chamber in order to bypass and supply the process gas to each process chamber 50 when the main supply unit is abnormal. At this time, the main supply line 111 connected from the switching valve unit 130 to the main supply unit 110 and an automatic valve (171) for controlling the process gas supplied through the switching valve unit; A first manometer 172 for measuring the gas pressure of the process gas supplied to the main supply unit 110 may be provided. Meanwhile, the gas distribution supply device including the gas supply unit 160, the switching valve unit 130, the main supply unit 110, and the backup supply unit 120 is installed in a facility such as a cabinet, and within the cabinet. The detector (not shown) for detecting the occurrence of a problem such as gas leakage may be installed.

The process chamber 50 is a device for performing a process on a wafer or a substrate, and the main supply part to the main supply part 110 of the gas distribution supply device having the above configuration has a large number of the process chambers 50. The main dispersion supply line 112 branching from the line 111 is provided. In addition, the backup supply unit 120 is provided with a backup distributed supply line 122 which is branched from the backup supply line 121 to each of the main distributed supply lines 112. In this case, the backup distributed supply line 122 is connected to the main distributed supply line 112 between the main supply unit 110 and the process chamber 50.

The gas supply unit 160 is provided with a gas cylinder 161, the main inlet valve (MV1) 162 for supplying or blocking the process gas flowing into the switching valve unit 130 is provided.

The switching valve unit 130 is for performing a function of switching the gas supply to the main supply line 111 of the main supply unit 110 or the backup supply line 121 of the backup supply unit 120, the switching valve The unit 130 may include a first switching valve 131 for controlling the inflow of process gas into the main supply line 111 and a second switching valve 132 for controlling the inflow of process gas into the backup supply line 121. It is configured to include. That is, in the normal state, in order to receive the process gas from the gas supply unit 160 and supply the process gas to the main supply unit 110 through the main supply line 111, the first switching valve 131 is open and 2 switching valve 132 is shut off, if the abnormality occurs in the main supply unit 110 receives the process gas from the gas supply unit 160 through the backup supply line 121 through the backup supply line 121 In order to supply to the first, the first selector valve 131 is blocked and the second selector valve 132 is open.

The main supply unit 110 is for distributing and supplying the process gas supplied from the switching valve unit 130 through the automatic valve (AV) 171 to each process chamber 50, and the switching valve unit 130 and It comprises a main supply line 111 connected to the automatic valve (AV) 171 and the main dispersion supply line 112 branched from the main supply line 111 and connected to each process chamber 50. It is. In this case, each of the main dispersion supply lines 112 may be provided with a main process valve (MV2) 113 for selectively controlling the process gas supplied to each process chamber. In addition, the main dispersion supply line 112 may be provided with a second pressure gauge (M2) 114 to measure the pressure of the process gas supplied to the main dispersion supply line 112, the second pressure gauge ( The backup distributed supply line 122 is connected between the M2) 114 and the process chamber 50.

The backup supply unit 120 is for supplying the process gas to each process chamber 50 by bypassing the main supply unit 110 when a problem occurs on the main supply unit 110, and the backup supply line 121 as described above. And a backup distributed supply line 122 branched therefrom, wherein the backup distributed supply line 122 is connected to the main distributed supply line 112 between the main supply unit 110 and the process chamber 50. It is. In this case, a backup process valve (MV3) 123 may be installed in the backup dispersion supply line 122 to selectively control the inflow of process gas.

Meanwhile, as described above, a first pressure gauge (M1) 172 may be provided between the automatic valve (AV) 171 and the main dispersion supply line 112 of the main supply line 111. The pressure gauge M1 172 measures the gas pressure of the process gas on the main supply line 111. For example, the operator checks the first pressure gauge (M1) 172 to determine whether the gas pressure is abnormal because the normal process gas is not supplied to the main supply line 111 when a failure occurs in the automatic valve (AV) 171. You can check it.

In addition, the main dispersion supply line 112 is provided with a regulator (REG) 115 and the second pressure gauge (M2) sequentially installed between the main process valve (MV2) 113 and each process chamber 50 ( 114 may be provided. Therefore, the process gas passing through each main dispersion supply line 112 is pressure-controlled by each regulator (REG) 115 and is supplied to each process chamber 50, by the second pressure gauge (M2) 114 The gas pressure of the process gas is measured and then supplied to each process chamber 50.

That is, each of the second pressure gauges M2 114 performs a function of measuring the gas pressure of the process gas on each main dispersion supply line 112. For example, when a failure occurs in each of the main process valve (MV2) 113 or the regulator (REG) 115, the operator does not have a normal process gas supply to each main dispersion supply line 112, so that the second pressure gauge ( M2) 114 can be checked for abnormal gas pressure.

Therefore, when the detector detects an abnormality in the detector (not shown) or the first pressure gauge (M1) 172 or the second pressure gauge (M2) 114, the operator supplies the process gas supplied to each main dispersion supply line 112. Blocking, the backup gas supply unit 120 may convert the supply gas.

On the other hand, purge gas supply line 140 is connected to each main dispersion supply line 112 between the main process valve (MV2) 113 and the regulator (REG) 115, the supply of the process gas is cut off Purge gas is supplied along the purge gas supply line 140. Here, the purge refers to the neutralization treatment of the contents of the equipment, vessels or pipes with a gas that does not cause chemical or physical reactions, and is also referred to as deactivation, and the gas used at this time is referred to as purge gas. As a purge gas, inert gas and chemically stable nitrogen are usually used. That is, when the operation of the main dispersion supply line 112 is stopped due to the maintenance of the main supply unit 110, the purge gas supply line 140 stabilizes the flammable or toxic gas contained therein. It serves to supply purge gas so that it can be neutralized with gas. On the other hand, a check valve (CV) 142 may be provided on the input side of the purge process valve (MV4) 141 on each purge gas supply line 140 connected to each main dispersion supply line 112.

Hereinafter, an operation method of the gas distribution supply apparatus according to the present invention including the configuration as described above is described.

That is, the present invention is to supply a process gas to each process chamber 50 by bypassing the main supply line 111 when a problem occurs in the components installed in the main supply unit 110. The detector (not shown), the first pressure gauge (M1) 172, the second pressure gauge (M2) 114, or the automatic valve (AV) 171 while the process gas is being supplied through the main supply 110. When an abnormality is detected in any one of the above, the first switching valve 131 that is open is shut off and the second switching valve 132 that is shut off is opened to back up the process gas flowing from the gas supply unit 160. Switch to the supply unit 120 to supply to the chamber.

At this time, the process gas introduced from the gas supply unit 160 partially passes through each of the main dispersion supply lines 112 of the main supply unit 110, but bypasses the components installed on the main supply unit 110. By being distributedly supplied to 50, the process gas can be safely supplied to each process chamber 50 even when an abnormality occurs in the main supply unit 110. In addition, since the purge gas is supplied to the main dispersion supply line 112 through the purge gas supply line 140 as described above, the purge operation is performed first before replacing the component that is determined to have an abnormality. An accident due to the gas remaining on the main dispersion supply line 112 can be prevented.

As an example, when it is determined that any one of the main process valve (MV2) 113 has a failure, the corresponding main process valve (MV2) 113 should be replaced, if the above problem occurs Since the first switching valve 131 is blocked and the second switching valve 132 is opened, the process gas may be supplied to each process chamber 50 through the backup supply unit 120.

At this time, the process chamber 50, which is connected to the main process valve 113, which is determined to have a failure, also receives a process gas through the backup supply unit 120, but the process does not need to be stopped. The process may be stopped for a short time to perform the following operation for gas supply.

That is, the backup dispersion supply line 122 connected with the main dispersion supply line 112 having the problem at a time when the process is stopped in the process chamber 50 connected to the main dispersion supply line 112 having the problem. The backup process valve (MV3) 123 on the () is shut off and the purge process valve (MV4) 141 is opened, at which time purge gas is injected into the main dispersion supply line 112 and the main supply line 111 to remain. It will neutralize the process gas. In addition, at the same time as the above operation to reduce the process chamber 50 in a vacuum state to exhaust all the gas in the line to complete the purge operation, the problem valve can be replaced. On the other hand, even during the replacement operation as described above, the process gas can be continuously supplied to each process chamber 50, except for the process chamber 50 through the backup supply unit 120.

4 is a configuration diagram of a gas distribution supply apparatus according to a second embodiment of the present invention, and shows another example of a gas distribution supply apparatus including a back-up supply line. Here, the same reference numerals as in the drawing shown in Figure 3 denotes a member having the same function as a detailed description thereof will be omitted.

As shown in FIG. 4, the gas distribution supply device according to the second embodiment of the present invention has the same basic configuration as that of the gas distribution supply device according to the first embodiment of the present invention shown in FIG. 3. There is a difference that the backup distributed supply line 122 is connected between the main process valve (MV2) 113 and the regulator (REG) 115 on the main distributed supply line 112.

That is, the gas distribution supply apparatus according to the second embodiment of the present invention is provided with a main dispersion supply line 112 branched from the main supply line 111 and connected to the process chamber 50. Line 112 is provided with a main process valve (MV2) 113, a regulator 115 and a second pressure gauge 114 in sequence from the branch point with the main supply line 111, the backup distributed supply line Reference numeral 122 is connected between the main process valve 113 and the regulator 115.

According to the above configuration, in the gas distribution supply apparatus according to the second embodiment of the present invention, the process gas flowing into each main distribution supply line 112 through the backup supply unit 120 is regulated by each regulator (REG) 115. Since it passes through, it can be pressure-controlled and supplied to each process chamber 50, and pass through the second pressure gauge 114, so that the user is supplied to the process chamber 50 through the backup supply unit 120 The pressure can be checked.

On the other hand, the valves 171, 123, 113, 141, 132, 131 may be attached to the gas leak detection sensor not shown, the signal detected from the gas leak detection sensor is transmitted to the monitoring device not shown Can be detected by the user. In addition, the valves 171, 123, 113, 141, 132, and 131 may be configured to be driven by the monitoring device. Thus, when a gas leak signal is detected from the gas leak detection sensor, the valves may be The monitoring device may be opened or closed remotely or automatically.

In addition, since the regulator 115 and the pressure gauges 114 and 172 are also connected to the monitoring device, the corresponding information may be detected through the monitoring device. In addition, the regulator 115, the pressure gauge (114, 172) and the place where the abnormal information can be detected may be provided with a gas leak detection sensor or abnormal operation detection sensor, the information detected from the detection sensors When the abnormality is generated by the information can be monitored by the monitoring device, the valves 171, 123, 113, 141, 132, 131 by the monitoring device is opened and closed, the backup supply unit 120 may be driven.

As described above, the gas distribution supply apparatus according to the present invention can smoothly supply process gas to each process chamber by bypassing the main supply line of the main supply part even if a problem occurs in some components on the main supply part which mainly supplies gas. As a result, there is an excellent effect that the productivity can be improved by continuously maintaining the electronic material manufacturing process.

That is, the present invention has an excellent effect that the gas can be continuously supplied even when a problem occurs in any one component of the gas distribution supply device.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention. Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification, but should be defined by the claims.

Claims (11)

A gas supply unit for supplying or blocking the process gas flowing out of the gas cylinder by the main inlet valve; A switching valve unit for switching and supplying the process gas supplied from the gas supply part to different paths; A main supply unit for distributing and supplying the process gas supplied from the switching valve unit to each process chamber; A backup supply part which is branched from the switching valve part and connected to the process chamber in order to divert and supply the process gas to each process chamber when an abnormality occurs in the main supply part; And a monitoring device for controlling an opening and closing operation of at least one of the valves included in the switching valve part, the main supply part, and the backup supply part. The method of claim 1, The backup supply unit, The gas distribution supply device branched from the switch valve part, and connected between the process chamber and the main supply part. The method of claim 1, The main supply unit, A main supply line connected to the switching valve unit; A main dispersion supply line branched from the main supply line and connected to each process chamber, Each of the main distributed supply lines, A main process valve (MV2) for controlling the inflow of process gas into the main dispersion supply line; A regulator for regulating the pressure of the process gas supplied through the main process valve; And And a second pressure gauge (M2) for measuring the pressure of the process gas controlled by the regulator. The method of claim 3, wherein The backup supply unit, Branched from the switch valve portion, the gas distribution supply device, characterized in that connected to the main dispersion supply line between the main process valve and the regulator. The method of claim 1, The switching valve unit, A first switching valve for controlling a flow of process gas into the main supply unit; And And a second switching valve for controlling the inflow of the process gas into the backup supply unit. The method of claim 1, Backup supply unit, A backup supply line connected to the switching valve unit; A backup distributed supply line branched from the backup supply line and connected to each process chamber; And And a backup process valve formed in the backup dispersion supply line to selectively control the inflow of the supply gas. The method of claim 6, The main supply unit includes a main supply line connected to the switching valve unit and main dispersion supply lines branched from the main supply line and connected to each process chamber. Each of the main dispersion supply lines may include: a main process valve (MV2) for controlling a flow of process gas into the main dispersion supply line; And a regulator (REG) for adjusting the pressure of the process gas supplied through the main process valve and a second pressure gauge (M2) for measuring the pressure of the process gas regulated by the regulator. The method of claim 7, wherein The backup distributed supply line, The gas distribution supply device branched from the backup supply line, and connected to the main dispersion supply line between the process chamber and the main supply unit. The method of claim 7, wherein The backup distributed supply line, And a branch from the backup supply line and connected to the main dispersion supply line between the main process valve and the regulator. delete The method of claim 1, At least one of the switching valve unit, the main supply unit, and the backup supply unit is attached with a gas leak detection sensor for detecting a gas leak, the information detected by the gas leak detection sensor is monitored by the monitoring device Gas distribution supply apparatus.

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