KR20010069918A - 도금장치 - Google Patents
도금장치 Download PDFInfo
- Publication number
- KR20010069918A KR20010069918A KR1020010027350A KR20010027350A KR20010069918A KR 20010069918 A KR20010069918 A KR 20010069918A KR 1020010027350 A KR1020010027350 A KR 1020010027350A KR 20010027350 A KR20010027350 A KR 20010027350A KR 20010069918 A KR20010069918 A KR 20010069918A
- Authority
- KR
- South Korea
- Prior art keywords
- plating
- anode
- membrane
- present
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000007747 plating Methods 0.000 title claims abstract description 57
- 239000012528 membrane Substances 0.000 claims abstract description 15
- 239000007788 liquid Substances 0.000 claims abstract description 12
- 239000006259 organic additive Substances 0.000 claims abstract description 12
- 239000002184 metal Substances 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 5
- 238000005498 polishing Methods 0.000 claims abstract description 3
- 239000000126 substance Substances 0.000 abstract description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 150000001450 anions Chemical class 0.000 description 2
- 238000005282 brightening Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920000557 Nafion® Polymers 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/002—Cell separation, e.g. membranes, diaphragms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
Claims (1)
- 도금액이 담기는 도금탱크(10)와, 피도금물을 음극(30)으로 하고 도금액에 불용인 금속을 양극(20)으로 하여 도금액에 전류를 통전시키는 전류장치(50)를 포함하여 이루어지는 도금장치에 있어서, 상기 양극(20)의 둘레부에는 도금시 양극에서 발생되는 O2가 도금액에 혼합된 광택제 등의 유기첨가제와 접촉하는 것을 방지하는 멤브레인(40)이 구비된 것을 특징으로 하는 도금장치
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020010027350A KR20010069918A (ko) | 2001-05-18 | 2001-05-18 | 도금장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020010027350A KR20010069918A (ko) | 2001-05-18 | 2001-05-18 | 도금장치 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20010069918A true KR20010069918A (ko) | 2001-07-25 |
Family
ID=19709651
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020010027350A Ceased KR20010069918A (ko) | 2001-05-18 | 2001-05-18 | 도금장치 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR20010069918A (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20190083041A (ko) | 2018-01-03 | 2019-07-11 | 주식회사 한경티엔씨 | Pcb 전해 동도금용 금속산화물 양극의 제조방법 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5893893A (ja) * | 1981-11-30 | 1983-06-03 | Tokuyama Soda Co Ltd | 連続メツキ装置 |
| JPS58177487A (ja) * | 1982-04-08 | 1983-10-18 | Sumitomo Metal Ind Ltd | 隔膜電解メツキ方法および装置 |
| JP2001073178A (ja) * | 1999-09-07 | 2001-03-21 | Shinko Pantec Co Ltd | 電極膜接合体及びその製造方法 |
-
2001
- 2001-05-18 KR KR1020010027350A patent/KR20010069918A/ko not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5893893A (ja) * | 1981-11-30 | 1983-06-03 | Tokuyama Soda Co Ltd | 連続メツキ装置 |
| JPS58177487A (ja) * | 1982-04-08 | 1983-10-18 | Sumitomo Metal Ind Ltd | 隔膜電解メツキ方法および装置 |
| JP2001073178A (ja) * | 1999-09-07 | 2001-03-21 | Shinko Pantec Co Ltd | 電極膜接合体及びその製造方法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20190083041A (ko) | 2018-01-03 | 2019-07-11 | 주식회사 한경티엔씨 | Pcb 전해 동도금용 금속산화물 양극의 제조방법 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20010518 |
|
| PA0201 | Request for examination | ||
| PG1501 | Laying open of application | ||
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20030529 Patent event code: PE09021S01D |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20030818 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20030529 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |