KR20010048261A - Gas Mixer for Chemical Vapor Deposit Apparatus - Google Patents

Abstract

PURPOSE: An apparatus for mixing gas in a chemical vapor deposition equipment is provided to uniformly mixing vapor and gas by installing a gas distributor on the outside of which a plurality of holes are formed. CONSTITUTION: The apparatus for mixing gas in a chemical vapor deposition equipment comprises a body part (11) installed inside the CVD (chemical vapor deposition) equipment; a plurality of vapor inlets formed inside the body part; a mixed gas exhaust nozzle (17) formed on the body part; and a gas distributor (A) installed inside the body part, wherein a plurality of holes (18) are formed on the outside of its body of the gas distributor with spaced apart from in a certain distance.

Description

Gas Mixer for Chemical Vapor Deposition Equipment {Gas Mixer for Chemical Vapor Deposit Apparatus}

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a gas mixing device of a chemical vapor deposition (hereinafter, referred to as CVD) equipment, which is a semiconductor manufacturing equipment, and in particular, a gas that uniformly mixes a reactive gas and a compound gas by installing a gas distributor. To a mixing device.

CVD equipment is a chemical reaction on a semiconductor substrate to form a thin film of a desired material, a reaction gas and a compound gas, that is, a gas of one or more compounds of the elements constituting the thin film material to be formed by mixing A gas mixing device is a device for mixing a gas and a compound gas into a chamber by supplying the substrate into a chamber in which the mixed gas causes a chemical reaction to form a thin film of a desired material on the substrate.

Among various kinds of thin film materials obtained by CVD equipment, the equipment which obtains metal thin films such as metal film and conductive oxide film is called metal-organic CVD (MOCVD). Abbreviated) equipment, which also uses a gas mixing device.

Hereinafter, a conventional gas mixing apparatus will be described taking as an example a gas mixing apparatus used in the MOCVD apparatus among the gas mixing apparatuses in the CVD equipment.

1 is a schematic structural diagram showing a state in which gases are mixed in a gas mixing apparatus according to the prior art, and arrows in the drawings indicate gas or gas flow.

When the vaporized Metal Organic source (hereinafter abbreviated as MO) source is fed to the first inlet 5 formed above the gas mixing device body, it descends along the first gas line 2 and the reaction gas is formed on the right side of the gas mixing device. It is supplied to the second inlet 6 and is separated into the second and third gas lines 3 and 4 and then flows to meet and mix in the gas mixing section 8 and then into the reaction chamber.

At this time, the thin film is uniformly formed on the wafer only when the mixed gas to be supplied into the chamber is evenly mixed with the reactant gas and the vaporized MO source.

However, in the conventional apparatus, since the length of the reaction gas flows to the gas mixing part has two different lengths, the flow forms are different from each other, and the turbulent flow is formed in the process of being separated and then merged again in the gas mixing part. Since the flow rate of the gas continues to change, it is not possible to supply a mixed gas uniformly combined with the vaporized MO source to the reaction chamber.

Therefore, the thin film formed on the wafer has a problem that the uniformity is not guaranteed due to the change in the flow rate of the reaction gas in the mixed gas, and because the path of the reaction gas flows long, the thin film is stuck to the side wall of the line and has a problem of generating particles later. .

Accordingly, the present invention has been proposed to solve the above-mentioned problems of the prior art, and provides a gas mixing device in a CVD apparatus in which a gas distributor having a plurality of holes formed on the outside thereof can be uniformly mixed with each other. For that purpose.

The present invention for achieving the above object is a body portion installed in the CVD equipment, a plurality of gas inlet formed in the body portion, the mixed gas outlet formed in the body portion, a plurality of holes at regular intervals outside the body itself It is formed and is characterized by including a gas distributor installed in the body portion.

In addition, the body portion is formed by a cover having a first groove portion, which is in contact with the top and bottom of the body portion, the cover having the second groove portion formed therein, a fastening means for fastening the body portion and the cover, and the body portion and the groove portion of the cover. It further comprises a sealing means inserted into the space to be formed, the plurality of holes are formed in a diagonal arrangement.

The gas distributor has a cylindrical shape with an open top and bottom, so that there is a small space between the wall of the body and the upper opening is connected to the first inlet through which the compound gas is introduced, and the lower opening is connected to the mixed gas outlet connected to the reaction chamber. The second inlets through which the plurality of holes and the reaction gas are introduced are connected to each other with a microcavity interposed therebetween so that the reaction gas flowing along the microcavity can be introduced into the hole.

In addition, this gas distributor can be installed and used in MOCVD equipment.

1 is a schematic structural diagram showing a state where gases are mixed in a gas mixing apparatus according to the related art

2a is a plan view of a gas mixing device according to the present invention

FIG. 2B is a longitudinal sectional view of the II ′ line of FIG. 2A

FIG. 2C is a perspective view of a gas distributor which is part A of FIG. 2B

<Description of Signs of Major Parts of Drawings>

11: Body part 12: cover 13: sealing ring

14: screw 15: the first inlet (or vaporized MO gas inlet)

16: second inlet (or reaction gas inlet) 17: mixed gas outlet

18: hole A: gas distributor

Hereinafter, specific embodiments of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 2A is a plan view of the gas mixing apparatus according to the present invention, FIG. 2B is a longitudinal sectional view of the line II ′ of FIG. 2A, and FIG. 2C is a perspective view of the gas distributor which is part A of FIG. 2B.

The present invention is installed above the reaction chamber serves to mix the vaporized MO source and the reaction gas to supply the mixed gas into the reaction chamber.

The configuration is as follows.

The body portion 11 having a hexahedron shape has three centers of straight lines penetrated in a straight line to form a vaporized MO source inlet 15 at an upper side thereof, and a mixed gas in which a mixed gas moves to a reaction chamber (not shown). A jet port 17 is formed, and a reaction gas inlet 16 is formed at a side thereof, and a first recess 23 having a semicircular cross section is formed around the upper vaporized MO source inlet 15. .

The upper and lower surfaces of the body portion 11 are covered with a cover 12. The cover has a semicircular cross section having the same shape as the groove portion of the body portion at the point where the first groove portion 23-2 and the cover contact the body portion. 2 concave portion 23-2 is formed to form a ring-shaped space when the cover and the body portion eventually contact.

The sealing ring 13 is inserted into this space, and the cover 12 and the body portion 11 are tightened with screws 14 to seal the inside of the body portion from the outside.

In addition, a cylindrical gas distributor A, which is opened up and down, is installed in the upper and lower through spaces of the body part, and is fitted with the wall surface of the body part, leaving only a slight microcavity 19 enough for gas to flow. . Since the gas distributor A is open at the upper and lower sides, the upper side is connected to the vaporized MO source inlet 15 and the lower side is respectively connected to the mixed gas outlet 17, and a plurality of holes 18 are formed at regular intervals around the body. The gas flowing from the reaction gas inlet 16 and along the microcavity formed between the body wall surface can be introduced into the gas distributor through the hole 14.

In this embodiment, the arrangement of the holes formed in the gas distributor is in the form of diagonal lines at regular intervals, but any arrangement may be used as long as the arrangement allows the reaction gas to flow into the gas distributor.

The operation of the present invention will be described below.

The vaporized MO source enters the gas distributor A directly through the vaporized MO source inlet 15 above the gas mixing device and the reactant gas enters the reaction gas inlet 16 on the right side of the gas mixing device, but at the gas distributor sidewall. They do not hit the gas distributor immediately.

Accordingly, the reactant gas that strikes the gas distributor sidewall flows along the microcavity 19 between the gas distributor and the body portion formed on the sidewall, and is distributed throughout the outer wall of the gas distributor, and some of the holes are evenly distributed in the gas distributor. 18), the reaction gas is introduced into the gas distributor in an even distribution.

As described above, the present invention installs a gas distributor in which a plurality of holes are uniformly formed at predetermined intervals so that the reaction gas is dispersed through each hole and introduced into the mixing device, even if the flow rate of the reaction gas is different, the gas mixing device flows into the gas mixing device. Since the flow form becomes constant, the reaction gas and the compound gas are uniformly mixed in the gas mixing device and supplied to the reaction chamber to form a uniform thin film on the wafer, and the length of the reaction gas inlet path is shortened, and thus the possibility of particle generation. It has a reducing effect.

Claims (4)

A body portion installed in the CVD equipment, A plurality of gas inlets formed in the body portion, A mixed gas outlet formed in the body portion; Gas mixing device in the CVD equipment, characterized in that it comprises a gas distributor which is formed in the body portion a plurality of holes at regular intervals outside the body. The method according to claim 1, The body portion is formed with a first groove, A cover in contact with the upper and lower parts of the body part and having a second recess portion; Fastening means for fastening the body portion and the cover; It further comprises a sealing means inserted into the space generated by the groove portion of the body portion and the cover, And said plurality of holes are formed in a diagonal arrangement. The method according to claim 1, The gas distributor has a cylindrical shape having an upper and lower opening, and has a fine space between the body part and the wall of the body, and the upper opening has a first inlet through which compound gas is introduced, and the lower opening has a mixed gas outlet connected to the reaction chamber. Installed to connect with And the second inlet through which the plurality of holes and the reactive gas are introduced are connected with the microcavity interposed therebetween so that the reaction gas flowing along the microcavity is introduced into the hole. The method according to claim 1, And the gas distributor is installed in the MOCVD equipment.