KR100449687B1 - inflow-port assembly for chamber - Google Patents

Abstract

The present invention has a plurality of through holes of a batch type biased to the edge of a bottom surface, and the other end of the wafer is connected to one end of a wafer seated therein and one selected from the holes of the batch type. It is installed on the outer wall of the bottom of the chamber (injector) located in the upper side of the chamber, the interface (interface) to flow the gaseous material supplied from the outside through the plurality of holes selected from the plurality of holes (interface) An inflow-port assembly comprising: an inflow-port block detachably coupled to an outer wall of a bottom surface of the chamber to cover a plurality of through holes of the batch type; It is further improved by providing an inlet port assembly including a plurality of inlet pipes protruding to the lower portion of the inlet port block through the inlet port block so that a part of the end is respectively introduced into a plurality of selected holes of the plurality of holes. It enables the semiconductor manufacturing process.

Description

Inflow-port assembly for chamber

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor manufacturing apparatus, and more particularly, to an inflow port assembly for interfacing a gas material supplied from the outside into an interior of a chamber.

In recent years, with the development of science, the field of new materials, which enables the development and processing of new materials, has been rapidly developed, and the development results of these materials are driving the development of the semiconductor industry.

A semiconductor device is a large scale integration (LSI) implemented through a process of depositing and patterning a plurality of thin films on the upper surface of a wafer, which is a substrate. Processes such as patterning are usually performed in a chamber type process module.

At this time, the chamber-type process module has a shape that is variously modified according to the desired process, but, for example, a chamber-type process module including a chamber in which a dome-shaped cover is installed. 1 is shown.

This is a chamber 20 which is a sealed reaction vessel in which a direct processing process such as depositing or patterning a thin film on the upper surface of the wafer 1 seated therein is performed, and a process implemented in the chamber 20. And a source and a reactant storage device (50) for storing the gaseous material required for.

At this time, the chamber 20 is a dome-shaped upper cover 22 made of a material such as quartz, and the lower base 24 at the bottom thereof are coupled to define a space separated from the outside. The lower base 24a of the lower chamber 24 of the chamber 20 has a chuck 30 penetrated therein so that the wafer 1 can be seated on the upper surface of the chamber 20, and the pressure is discharged by discharging the gas inside the chamber 20. It includes a discharge pipe 26 for adjusting the pump (P) attached to the end.

In addition, in the source and reactant storage device 50, a plurality of supply pipes 52a and 52b are branched and connected to the bottom surface 24a of the lower base 24 of the chamber 20. First, the wafer is disposed on the upper surface of the chuck 30. When (1) is seated and the chamber 20 is sealed, the internal pressure is then controlled through a pump P installed at the end of the discharge pipe 26, and then branched from the source and reactant storage device 50. Sources and reactants are introduced into the chamber 20 through the plurality of flow paths 52a and 52b, thereby depositing or patterning a thin film on the wafer 1 by their chemical reaction.

In this case, the specific gaseous materials selected from the above-described sources and reactants are usually diffused and sprayed on the wafer 1 in the chamber 20 to more easily induce a chemical reaction generated in the chamber 20. One or more injectors 60 are generally installed, and as shown in FIG. 2, a plurality of inflow-port assemblies are provided on the outer wall 24a of the bottom surface 24a of the lower base 24 of the chamber 20. 70 and 90 are installed to interface sources and reactants introduced through the aforementioned plurality of supply pipes 52a and 52b into the injector 60 or directly into the chamber 20.

That is, as shown in FIG. 2, which is a perspective view showing the bottom surface 24a of the lower base 24 constituting the general chamber 20, the above-described chuck (FIG. 1) is located at the center of the bottom surface 24a of the lower base 24 of the chamber. A perforated chuck hole 32 in which the 30 of 1 can be installed is formed, and a plurality of inlet port assemblies 70 and 90, which are biased by the edge of the bottom surface 24a, is laid around the chuck hole 32. It is common to be.

In this case, three or more of the above-described inlet port assembly may be provided, but the structure and function are the same, so only two are shown in the drawings, and only one inlet port assembly is provided for convenience of the following description. As described, this applies equally to other inlet port assemblies.

At this time, each of the inlet port assembly (70, 90) includes a plurality of inlet pipe passing through the bottom surface (24a) of the lower base 24, showing a partial cross section taken along the line III-III of FIG. Referring to FIG. 3, the first and second inlet pipes 72 and 74 shown are fixedly installed by welding or the like so as to penetrate the bottom surface 24a of the lower base 24, respectively, from a source and a reactant supply device. A plurality of branched supply pipes 52a and 52b of FIG. 1 are connected to each other.

In this case, in particular, the first inlet pipe 72 has an inlet 72a protruding into the chamber, and the injector 60 is fitted therein to supply the source and the reactant to the injector 60.

However, such a general inlet port assembly composed of a plurality of inlet tubes exhibits some problems in the actual process, which is fixedly installed by welding or the like so that a plurality of inlet tubes constituting the inlet port assembly penetrate the bottom of the chamber, respectively. Therefore, if the number and type of gaseous materials supplied into the chamber is different, it is difficult to properly respond to this.

That is, each inlet pipe is fixedly installed at the bottom of the chamber by welding or the like so that easy replacement and increase or decrease of the number of the inlet pipes are impossible. In case of more than, the number of other chambers with more inlet pipes should be replaced.

Also, in recent years, in the thin film deposited on the upper surface of the wafer and its patterning method, a plurality of gaseous materials having different chemical properties are simultaneously introduced into one injector to spray these mixed gases onto the wafer in order to realize an improved effect. This development has been in use, the general inlet port assembly described above has a design limitation so that only one kind of gaseous material can be supplied to the injector through a single inlet pipe, there is a problem that easy application is difficult.

The present invention has been made to solve the above problems, it is possible to effectively respond to the increase and decrease of the type and number of sources and reactants introduced into the chamber, and also the sources and reactions introduced through a plurality of supply pipes The object is to provide a more improved inlet port assembly that is capable of simultaneously introducing material into the injector.

1 is a schematic structural diagram showing a general chamber type process module

Figure 2 is a perspective view showing the bottom of the chamber in which the general inlet port assembly is installed

3 is a partial cross-sectional view taken along the line III-III of FIG.

Figure 4 is a perspective view showing the bottom of the chamber is installed inlet port assembly according to the present invention

Figure 5a is a partial cross-sectional view taken along the line V-V of Figure 4 to explain the inlet port assembly according to the present invention;

Figure 5b is a partial cross-sectional view showing a second embodiment of the inlet port assembly according to the present invention;

Figure 5c is a partial cross-sectional view showing a third embodiment of the inlet port assembly according to the present invention;

<Description of the symbols for the main parts of the drawings>

124a: Lower base bottom

140a, 140b, 140c: first, second, third holes

160: injector

170a: Inlet port assembly

172a, 174a: first and second inlet pipes

172a-1, 174a-1: first and second inlet

180a: Inlet port block

182: O-ring

184a, 184b: first and second screws

200: heater

In order to achieve the above object, the present invention has a plurality of through holes of a batch type biased to an edge of a bottom surface, and includes a wafer seated therein and a selected one of the holes of the batch type. The other end is installed on the outer wall of the bottom surface of the chamber in which the injector located above the wafer is embedded, and the gas material supplied from the outside is supplied through a plurality of holes selected from the plurality of holes. An inflow-port assembly for interfacing into the chamber, the inflow-port assembly being detachably coupled to the bottom outer wall of the chamber to cover the plurality of through holes of the batch type. -portblock); It provides an inlet port assembly including a plurality of inlet pipes protruding to the lower portion of the inlet port block through the inlet port block so that a portion of the end is respectively introduced into a plurality of selected holes of the plurality of holes.

In this case, the heater further includes a circular O-ring interposed between the heater and the inlet port block and an outer wall of the bottom surface of the chamber, wherein the inlet port block penetrates the chamber. The bottom surface is fixed through a plurality of bolts inserted into the outer wall.

In particular, the selected one of the plurality of inlet pipes, characterized in that it is introduced into the chamber is connected to one end of the injector, and in the inlet port block, the inlet pipe connected to one end of the injector, and It characterized in that it further comprises a sub inlet passage for connecting a plurality of selected inlet pipe of the inlet pipes to each other.

DETAILED DESCRIPTION Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

The inlet port assembly according to the present invention includes an inflow-port block coupled to the outer wall of the bottom of the chamber and a plurality of inlet pipes penetrating the inlet port block and protruding to the bottom thereof. The assemblies are each detachably coupled to the bottom of the chamber, and are easily replaceable according to the purpose.

That is, FIG. 4 is a perspective view illustrating the bottom surface 124a of the lower base 124 of the chamber in which the first and second inlet port assemblies 170 and 190 are installed, respectively, according to the present invention. In addition to the inlet port assemblies 170 and 190 as well as the general case described above, three or more inlet port assemblies according to the embodiments of the present invention to be described later may be provided according to the purpose. For convenience of description, only two are shown in the drawings, and in this case, the first inlet port assembly 170 is coupled to the bottom wall of the bottom of the chamber, and the second inlet port assembly 190 shown in dotted line is an exploded perspective view. It is shown.

First, in order for the first and second inlet port assemblies 170 and 190 according to the present invention to be coupled to the bottom surface 124a of the bottom base 124, respectively, the bottom surface 124a of the bottom base 124 may be arranged in a batch type. Since a plurality of holes 140 are required to be installed therethrough, the number of the holes 140 is preferably equal to or greater than the type of source and gaseous material introduced into the chamber.

In other words, the inlet port assembly 170 or 190 according to the present invention is characterized in that it has a different number of inlet pipes to be replaced and used according to the purpose, if there are many kinds of gas introduced into the chamber In order for the inlet port assembly according to the present invention having a large number of inlet pipes to be coupled, the bottom surface 124a of the lower base 124 is preferably provided with as many holes as possible. It will be possible by installing a plurality of holes through the placement type.

As described above, the outer wall of the bottom surface 124a of the lower base 124 having the plurality of holes 140 installed through the arrangement type is formed in a disc shape so as to cover the holes 140 formed in the arrangement type. The inlet port blocks 180a, 180b, 180c and the inlet port blocks 180a, 180b, 180c penetrating through the bottom surface 124a of the lower base 124 is inserted into the outer wall, the inlet port blocks 180a, Inlet port assemblies 170a, 170b, 170c according to the present invention comprising a plurality of inlet tubes 172a, 174a, 172b, 174b, 176b, 172c, 174c, 176c, 178c protruding downward from 180b, 180c) In this case, the inlet port assemblies 170a, 170b, and 170c according to the present invention can be divided into several types according to their purpose, so that they will be described by dividing them into respective embodiments (see FIGS. 5A to 5C). )

First embodiment

5A is a partial cross-sectional view of the inlet port assembly 170a according to the first embodiment of the present invention showing a cross section taken along the line VV of FIG. 4, which is the bottom surface 124a of the lower base 124 as described above. A disk-shaped inlet port block 180a coupled to the outer wall of the bottom surface 124a so as to cover a plurality of holes (140 in FIG. 4) which are penetrated in the arrangement type on the outer wall, respectively, and the inlet port block 180a It includes a plurality of inlet pipes (172a, 174a) penetrating through the bottom) protruding to the bottom.

In particular, the inlet port assembly 170a according to the first embodiment of the present invention is less than the number of the first to third (140a, 140b, 140c) of the plurality of holes formed in the arrangement type on the bottom surface 124a of the lower base This is for interfacing the gaseous material to the inside of the chamber, and the second hole 140b through which no gaseous material is introduced is blocked from the outside by the inlet port block 180a, except for the first and third holes 140a. Only 140c is connected to the first and second inlet pipes 172a and 174a, respectively, so that the source and the gaseous material can be supplied only through the selected hole.

In this case, each of the inlet pipes 172a and 174a constituting the inlet port assembly 170a according to the present invention is formed on the bottom surface 124a of the lower base 124 to which the inlet port block 180a is in close contact with each inlet. The first and third holes 140a and 140c corresponding to the pipes 172a and 174a have inlets 172a-1 and 174a-1, which have a predetermined length introduced into the first and third holes 140a and 140c to prevent mixing of different gaseous substances. It is for.

That is, when the inlets 172a-1 and 174a-1 are not provided, the second hole 140b in which no gaseous material is introduced and the first and third holes 140a in which different kinds of gaseous materials are introduced In order to prevent this, since gaseous materials may be mixed between the and the second inlets, the first inlet pipe 172a corresponding to the first hole 140a connected to the dual injector 160 may have a longer inlet than other inlet pipes. It is characterized in that the injector 160 is configured to be fitted to the tube by extending and protruding into the chamber with (172a-1).

Second embodiment

As shown in FIG. 5B, the inlet port assembly according to the second embodiment of the present invention is connected to all of the holes 140a, 140b, and 140c of the arrangement type passing through the bottom surface 124a of the lower base, respectively. To third inlet pipes 172b, 174b, and 176b. Compared to FIG. 5A, which is the first embodiment of the present invention, the first to third holes 140a, 140b, and 140c formed in the bottom surface 124a are provided. The first to third inlet pipes 172b, 174b, and 176b of the same number are provided to correspond to the inlet pipes in the respective holes.

At this time, each of the first to third inlet pipes 172b, 174b, and 176b constituting the inlet port assembly 172b according to the present invention is formed on the bottom surface 124a to which the inlet port block 180b is in close contact with each other. Having the inlets 172b-1, 174b-1, and 176b-1, which have a predetermined length, are introduced into the first to third holes 140a, 140b, and 140c corresponding to the inflow pipes 172b, 174b, and 176b. Same as the example, the purpose thereof is also the same to prevent the mixing of gaseous substances.

In particular, the first inlet pipe 172b corresponding to the first hole 140a connected to the dual injector 160 has an inlet 172b-1 longer than the other inlet pipes so that the injector 160 is installed inside the chamber. You can see that it is connected to.

Third embodiment

Figure 5c shows a cross section of the inlet port assembly 170c according to a third embodiment of the present invention, which makes it possible to mix two or more gaseous materials into one injector 160, As shown in the drawing, the sub inflow passages 188 connecting the first and second inflow pipes 172c and 174c different from each other are installed in the inflow port block 180c, thereby providing the first and second inflow pipes 172c and 174c, respectively. The mixed gaseous material introduced through) is supplied to one injector 160.

Inlet port assembly (170a, 170b, 170c) according to the present invention described above in common, a circular o-ring interposed between the inlet port block (180a, 180b, 180c) and the outer wall of the bottom surface (124a) of the lower base ( 182, which is in close contact with the outer wall of the bottom surface 124a of the lower base and the respective inlet port blocks 180a, 180b, and 180c without play, so that the air contaminated from the outside is introduced into the chamber or the interior of the chamber. This is to avoid damaging the vacuum formed in the.

In addition, each inlet port assembly (170a, 170b, 170c) according to the present invention, through the inlet port block (180a, 180b, 180c) through a plurality of bolts (184a, 184b) is inserted into the bottom surface of the chamber In this case, the swatch can be easily detachable.

In particular, in order to more easily induce a chemical reaction between the gaseous material flowing through the inlet port assembly (170a, 170b, 170c) according to each embodiment of the present invention, as shown in each of the inlet port block (180a, 180b, The heater 200 may be embedded inside the 180c.

The present invention is a chamber for processing a wafer seated therein through a chemical reaction between gaseous substances introduced from the outside, the substitution is easily applied according to the type and number of gaseous substances introduced into the chamber. Provide possible inlet port assemblies. Unlike the general case, by replacing only the inlet port assembly without replacing the entire chamber has the advantage that the process can be carried out more easily.

In particular, the inlet port assembly according to the present invention has the advantage that it is possible to inject different kinds of gaseous material into one injector, and in particular, a pre-treatment for heating the gaseous material introduced into the chamber by embedding heat therein. Enable the process.

Claims (6)

It has a plurality of through holes of the batch type, which is biased to the edge of the bottom surface, and the other end is connected to the top of the wafer with one end connected to a wafer seated therein and a selected one of the holes of the batch type. Inlet is located on the bottom outer wall of the chamber (chamber) in which the injector is located, the inlet to interface the gaseous material supplied from the outside into the chamber through a plurality of holes selected from the plurality of holes As an inflow-port assembly, An inflow-port block detachably coupled to an outer wall of the bottom surface of the chamber to cover the plurality of through holes of the batch type; A plurality of inflow pipes protruding to a lower portion of the inflow port block through the inflow port block so that a part of the end thereof is respectively introduced into a plurality of holes selected from the plurality of holes Inlet port assembly including The method according to claim 1, Heater embedded in the inlet port block Inlet port assembly further comprising The method according to claim 1, Circular o-ring interposed between the inlet port block and the bottom outer wall of the chamber Inlet port assembly further comprising The method according to claim 1, The inlet port block penetrates the inlet port assembly fixed through a plurality of bolts inserted into an outer wall of the bottom surface of the chamber. The method according to claim 1, The selected one of the plurality of inlet pipes, the inlet port assembly is introduced into the chamber and connected to one end of the injector The method according to claim 5, In the inlet port block, Sub inflow passage for connecting the inlet pipe connected to one end of the injector and a plurality of inlet pipes selected from other inlet pipes to each other Inlet port assembly further comprising