KR20030080687A - Showerhead used in CVD apparatus - Google Patents

Abstract

PURPOSE: A shower head of a CVD(Chemical Vapor Deposition) apparatus is provided to be capable of uniformly jetting predetermined gas and increasing the effective surface area for a gas jetting process by improving the structure of the shower head. CONSTITUTION: A shower head of a CVD apparatus is provided with a body part having a plurality of jetting holes(h1,h2) and a gas supply pipe connected to the body part for supplying gas into the body part. At this time, the first inlet port(A) of the first jetting hole(h1) is larger than the first outlet port(A') of the first jetting hole and the second inlet port(A) of the second jetting hole(h2) is smaller than the second outlet port(A') of the second jetting hole, wherein the second jetting holes are regularly located between the first jetting holes.

Description

Showerhead used in CVD apparatus

The present invention relates to a showerhead of a CVD apparatus, and more particularly to a showerhead capable of uniformly injecting gas into the reaction chamber.

Recently, as the substrate becomes larger, it becomes very difficult to uniformly process the entire substrate. A typical way to overcome this is to use a showerhead for gas injection into the reaction chamber. When the showerhead is used, a uniform CVD process can be performed since the gas is uniformly distributed in a large space.

1A and 1B are diagrams for explaining a CVD apparatus having a showerhead. 1A and 1B, the side wall of the reaction chamber 10 is provided with a slot valve 60 for determining the opening and closing of the substrate transfer path, and the substrate transferred from the outside when the slot valve 60 is opened. 50 is seated on the substrate support 40. The substrate support 40 may be moved up and down by the support transfer means 45. A heater (not shown) for heating the substrate 50 is installed in the substrate support 40.

Gas supply into the reaction chamber 10 is made through the shower head 70. The shower head 70 includes a body 70a having an empty interior and a gas supply pipe 70b connected thereto. The gas injected into the body 70a through the gas supply pipe 70b is formed in the body 70a. It is injected into the upper space of the substrate 50 through a plurality of injection holes (h) formed through the flat bottom surface 75 is discharged to the outside through the gas discharge pipe (80). The showerhead 70 is connected to an RF power source so as to simultaneously serve as a plasma electrode and the susceptor 40 is grounded.

2A and 2B are schematic diagrams for explaining a conventional showerhead, and in particular an enlarged view of the bottom surface 75 of the showerhead. Referring to FIG. 2A, the injection hole h has a larger funnel shape than the inlet A ′ contacting the inside of the body 70a and the outlet A contacting the outside of the body 70a. That is, the gas is injected into the upper space of the substrate 50 by decreasing the speed through the injection hole (h).

Since the outlet A is larger than the inlet A 'of the injection hole, the body bottom surface 75 has a larger effective area than the portion B' which contacts the inside of the body 70a and the part B which contacts the outside. . Therefore, when the temperature of the shower head 70 rises due to a heater, RF power, or the like built in the substrate support 40, the body bottom surface 75 is bent as shown in FIG. 2B.

As described above, in the conventional shower head, since the inlet and outlet cross-sectional areas of the injection hole h are different from each other, thermal deformation occurs on the bottom surface of the body 75. When the heat deformation occurs, thermal stress builds up in the shower head 70 itself, and the distance between the shower head 70 and the substrate 50 becomes inconsistent and uniform to the entire surface of the substrate 50. The process will not take place.

In addition, since the outlet A is larger than the inlet A 'of the injection hole, the feed gas may be sparsely located at a location where the injection flow rate is lowered and far from the injection hole h. In addition, since the outlet A of the injection hole is large, there is a limit in forming the injection holes h closely and closely, so that it is difficult to increase the effective area of gas injection and there are many non-porous residual bulk parts. The shower head 70 is heavy.

Therefore, the technical problem to be achieved by the present invention is to provide a shower head that can solve the above-mentioned problems by differently than the conventional injection hole of the shower head.

1A and 1B are views for explaining a CVD apparatus having a showerhead;

2A and 2B are schematic diagrams for explaining a conventional showerhead;

3A and 3B are views for explaining a showerhead according to a first embodiment of the present invention;

4 is a view for explaining a showerhead according to a second embodiment of the present invention.

Explanation of symbols on the main parts of the drawings

10: reaction chamber

40: substrate support

45: support transfer means

50: substrate

60: slot valve

70: shower head

70a: body

70b: gas supply pipe

75: flat bottom

80: gas discharge pipe

h: injection hole

h1: first injection hole

h2: second injection hole

S: Euro

The showerhead of the CVD apparatus according to an embodiment of the present invention for achieving the technical problem, the body is empty and the bottom is made of a flat plate shape, the bottom surface is formed with a plurality of injection holes through the body, and the body And a gas supply pipe installed to be connected to the body to supply gas to the inside, wherein the injection hole includes a plurality of first injection holes having a larger outlet contacting the outside of the body than an inlet contacting the inside of the body; And a plurality of second injection holes having a smaller outlet contacting the outside of the body than an inlet contacting the inside of the body, wherein the second injection holes are uniformly distributed between the uniformly distributed first injection holes. Characterized in that.

Here, the first injection hole is arranged to be located at each vertex of the square arranged in the same direction, the second injection hole is also preferably located in the center of the square formed by the first injection hole.

The showerhead of the CVD apparatus according to another embodiment of the present invention for achieving the technical problem, the body is empty and the bottom is made of a flat plate shape, the bottom surface is formed with a plurality of injection holes through the body, and the body And a gas supply pipe installed to be connected to the body to supply gas therein, wherein the injection hole has an inlet contacting the inside of the body and an outlet contacting the outside of the body with the same size, and between the inlet and the outlet. It is characterized in that there are flow paths of smaller diameter than the inlet and outlet.

Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention will be described in detail. In the drawings, the same reference numerals as in the prior art denote components that perform the same function, and a repetitive description thereof will be omitted.

Example 1

3A and 3B are diagrams for describing a showerhead according to a first embodiment of the present invention.

3A and 3B, unlike the related art, the injection hole h has a funnel-shaped first injection hole having a larger outlet A contacting the outside than an inlet A 'contacting the inside of the body 70a. h1) and the outlet A contacting the outside than the inlet A 'in contact with the interior of the body 70a are made of two types of second funnel-shaped h2 having a funnel shape. The second injection holes h2 are arranged to be uniformly distributed between the uniformly distributed first injection holes h1. In particular, the first injection holes h1 are arranged in the same direction. It is arranged to be located at the vertex, it is preferable that the second injection hole (h2) is located one by one in the center of the square so that the second injection hole (h2) is also arranged to be located at the vertex of the square (T ').

According to the present invention, since the body bottom surface 75 has the same effective area as the portion B 'contacting the inside of the body 70a and the portion B contacting the outside, the body 70a bends as conventionally, even when the body 70a is thermally expanded. Does not occur (FIG. 3B).

In addition, half of the feed gas is injected into the upper space of the substrate 50 by decreasing the flow rate while passing through the first injection hole h1 having a larger flow path diameter, while the other half has a second injection hole h2 having a smaller flow path diameter. Since the flow velocity is increased and injected through the gas, the gas is uniformly distributed not only near the body bottom 75 but also in the far part.

In addition, since more injection holes h can be formed in the same area as compared with the related art, the effective area of the gas injection can be made larger, and the weight of the shower head 70 itself can be made lighter.

Example 2

Figure 4 is a view for explaining a showerhead according to a second embodiment of the present invention. Referring to Figure 4, the injection hole (h) is in contact with the inlet (A ') in contact with the inside of the body 70a and the outside. The outlet A has the same size and there is a flow path s of smaller diameter than the inlet and outlet between the inlet A 'and the outlet A. According to this embodiment, the effective area of the gas injection cannot be made larger than in the prior art, but heat deformation of the shower head can be prevented, and the effect of weight reduction of the shower head can be obtained.

As described above, according to the present invention, even when the body 70a thermally expands because the portion B 'of the body bottom 75 which is in contact with the inside of the body 70a and the portion B which is in contact with the outside have the same effective area. There is no problem of bending. Thus, deposition of a uniform film with respect to the entire substrate area is possible. In addition, since the first injection holes h1 and the second injection holes are alternately positioned, the gas is uniformly distributed not only in the portion close to the body bottom 75 but also in the distant portion. In addition, since more injection holes h can be formed in the same area as compared with the related art, the effective area of the gas injection can be made larger, and the weight of the shower head 70 itself can be made lighter.

The present invention is not limited to the above embodiments, and it is apparent that many modifications are possible by those skilled in the art within the technical spirit of the present invention.

Claims (4)

The CVD apparatus includes a body having an empty inside and a bottom surface having a flat plate shape, the body having a plurality of injection holes penetrated therethrough, and a gas supply pipe installed to be connected to the body to supply gas into the body. In the shower head of The injection hole may have a plurality of first injection holes having a larger outlet contacting the outside of the body than an inlet contacting the inside of the body, and a smaller outlet outlet contacting the outside of the body than the inlet contacting the inside of the body. And a plurality of second injection holes of the shower head of the CVD apparatus, wherein the second injection holes are uniformly distributed between the uniformly distributed first injection holes. The CVD apparatus according to claim 1, wherein the first injection holes are arranged to be located at each vertex of the squares arranged in the same direction, and the second injection holes are also located at the center of the square formed by the first injection holes. Showerhead. 2. The showerhead of a CVD apparatus according to claim 1, wherein the first injection hole and the second injection hole have a funnel shape. The CVD apparatus includes a body having an empty inside and a bottom surface having a flat plate shape, the body having a plurality of injection holes penetrated therethrough, and a gas supply pipe installed to be connected to the body to supply gas into the body. In the shower head of The injection hole has a shower head of the CVD apparatus, characterized in that the inlet contacting the inside of the body and the outlet contacting the outside of the body has the same size and there is a flow path having a diameter smaller than the inlet and outlet between the inlet and the outlet .