KR20010029808A - Film forming method and film forming system - Google Patents

Abstract

PURPOSE: A film forming method and film forming system is provided to simplify the process of forming two-layer structure of insulation film and hard mask layer without using a CVD device. CONSTITUTION: A film forming method comprises the steps of forming a first coating film by providing a first coating liquid onto a substrate; and a second step of forming a second coating film by providing a second coating liquid onto the first coating film, wherein at least one of first and second coating films is an inorganic film. A film forming system comprises a cassette station for delivering/supplying wafers in cassette units from/to the film forming system; a first treatment station having a plurality of treatment units for performing predetermined treatments during an insulation film forming process; an interface unit arranged to be adjacent to the first treatment station, and which conveys wafers; and a second treatment station having a heat treatment furnace performing a heat treatment in a batch manner.

Description

Film Forming Method and Film Forming System {FILM FORMING METHOD AND FILM FORMING SYSTEM}

The present invention relates to a film forming method and a film forming system for forming a coating film made of an insulating film on a substrate such as an LCD substrate or a semiconductor wafer, for example.

For example, in the manufacturing process of a semiconductor device (hereinafter referred to as "wafer"), forming an insulating film on the wafer surface by an insulating film system is performed. In forming the insulating film in this insulating film forming system, the wafer is transferred from the carrier station to the processing unit, and a predetermined coating liquid for forming the insulating film in the coating apparatus provided in the processing unit is applied onto the wafer. Subsequently, this wafer is conveyed to a heat processing apparatus, and the process which evaporates the solvent in a coating liquid is performed. Thereafter, the wafers are put together in a predetermined number of sheets, and collectively placed in a heat treatment furnace. Therein, the wafer is cured in a heat treatment furnace, and an insulating film such as SOG is formed on the wafer surface.

In recent years, the treatment in a low oxygen atmosphere becomes more preferable until the coating liquid reacts more sensitively (delicate) to oxygen with the improvement of the wafer material until it is cured in the heat treatment furnace. come. However, in the above-described insulating film forming system, since the wafer is exposed to the atmosphere in the heat treatment apparatus for evaporating the solvent in the coating liquid or from the heat treatment apparatus to the heat treatment furnace, the coating film on the wafer is oxygen in the air. Reacts with each other, resulting in a poor insulation or the like on the wafer.

In addition, a predetermined groove is formed in the formed insulating film in advance, a conductive wiring material is filled in the groove, and a wiring machine is formed by removing the wiring material deposited outside the groove by CMP (chemical mechanical polishing) technique or the like. There is a technology called Damascene. As one of the large machine methods, a wiring technique called a dual damascene method is a technique of simultaneously forming both a connection hole and a wiring tool previously formed in an interlayer insulating film with a wiring material to form a connection plug and a wiring at the same time.

When manufacturing a semiconductor device using the dual damascene method, it is a technique which uses the laminated film of an inorganic insulating film and an organic low dielectric constant film as an interlayer insulation film of a wiring pipe for the purpose of speeding up a semiconductor device. The inorganic insulating film used for such an interlayer insulating film is generally formed by the plasma CVD method, and the organic insulating film is formed by spin coating.

However, when the inorganic insulating film is formed by the CVD method and the organic insulating film is formed by the spin coating, there is a problem in that the device cost is increased by requiring a device having a completely different structure as the coating device by the CVD device and the spin coating.

An object of this invention is to form a coating film on a board | substrate in an insulating film formation process, and to suppress reaction of the coating film and oxygen of a wafer surface until it hardens.

Moreover, an object of this invention is to provide the film-forming method and film formation system with low apparatus cost in the film-forming method which forms a multilayer film containing an inorganic insulating film.

In order to achieve the above object, a first aspect of the present invention provides a film forming method comprising: supplying a first coating liquid onto a substrate to form a first coating film; and supplying a second coating liquid onto the first coating film To form a second coating film, wherein at least one of the first coating film and the second coating film is an inorganic film.

According to a second aspect of the present invention, in the film forming method, a step of forming an organic insulating film by applying an organic insulating film material on a substrate by spin coating, and applying an inorganic insulating film material by spin coating on the applied organic insulating film material Forming an inorganic insulating film; patterning the organic insulating film and the inorganic insulating film using a photolithography method to form recesses; and embedding a conductive material in the recesses to form a conductive layer. It has a process of forming.

According to a third aspect of the present invention, there is provided a method of forming a first organic insulating film by spin coating an organic insulating film material on a substrate, and applying an inorganic insulating film material to a spin coat on the applied organic insulating film material. Forming a second inorganic insulating film by applying a spin coating; forming a third organic insulating film by spin coating an organic insulating film material on the substrate; and applying an inorganic insulating film material to a spin coating on the applied organic insulating film material. By coating to form a fourth inorganic insulating film, patterning the third organic insulating film and the fourth inorganic insulating film using a photolithography method, and forming a first concave portion, the first organic insulating film and the Forming a second recessed portion by patterning a second inorganic insulating film using a photolithography method, the first recessed portion and Burying a conductive material in the group the second recess, a step of forming a conductive layer.

A fourth aspect of the present invention is a film forming system having a first coating device for coating a first insulating film material on a substrate and a second coating device for applying a second insulating film material on the first coating film. The first insulating film material or the second insulating film material is an inorganic insulating film material.

According to a fifth aspect of the present invention, in a film forming system, a coating device for supplying a coating liquid to a substrate to form a coating film, a first heating device for evaporating a solvent component from the applied coating liquid, and A second heating device for heat-treating the substrate from which the solvent component has been evaporated in a first heating device, and a transfer unit for transferring the substrate between the first heating device and the second heating device, and processing of the first heating device. The room can be set to a lower oxygen atmosphere than the atmosphere.

According to a seventh aspect of the present invention, in a film forming system, a coating device for supplying a coating liquid to a substrate to form a coating film, a first heating device for evaporating a solvent component from the applied coating liquid, and the heating And a second heating device for heat-treating the substrate on which the solvent component has been evaporated in the device, and a transfer part for transferring the substrate between the first heating device and the second heating device, wherein the second heating device and the delivery device The area | region arrange | positioned and the process chamber of the said 1st heating apparatus can be set to a low oxygen atmosphere rather than the atmosphere.

According to the present invention, for example, an insulating film and a hard mask layer are formed by applying a coating liquid to both of them, so that the step of forming a two-layer structure of the insulating film and the hard mask layer without interposing a CVD apparatus is performed. It is possible to simplify.

In addition, in order to form a two-layer structure of an insulating film and a hard mast layer continuously in one apparatus having a first coating unit for applying a coating liquid for an insulating film and a second coating unit for applying a coating liquid for a hard mask. Therefore, it is not necessary to convey the substrate to another apparatus, and this film forming process can be remarkably simplified, and the insulating film and the hard mask layer can be formed very quickly.

According to the present invention, for example, the processing chamber of the first heating apparatus can be set to a low oxygen atmosphere, so that the processing chamber can be set to a low oxygen atmosphere as needed. Therefore, the substrate carried in the processing chamber can be heat-treated in a low oxygen atmosphere. As a result, in the coating apparatus, the coating film applied on the substrate is prevented from reacting with oxygen and being oxidized.

According to the present invention, in the case of forming a wiring or a connection plug in a laminated film of an organic insulating film and an inorganic insulating film through a dual damascene process, for example, the organic insulating film and the inorganic insulating film are manufactured by using a spin coat together. An apparatus such as a CVD apparatus becomes unnecessary, and the manufacturing apparatus cost can be greatly reduced. In addition, it is possible to form an insulating film having good low dielectric constant and good adhesion between the organic insulating film and the inorganic insulating film.

1 is a plan view of a film forming system according to a first embodiment.

FIG. 2 is a side view of the film forming system of FIG. 1.

3 is another side view of the film forming system of FIG. 1.

4 is a principal part perspective view showing a state in which the interface portion and the second processing station are covered with a panel in the film forming system according to the first embodiment.

5 is a cross-sectional view of a low oxygen high temperature heat treatment apparatus in the film forming system according to the first embodiment.

6 is a perspective view schematically showing a heat treatment furnace in the film forming system according to the first embodiment.

7 is a cross-sectional view showing a coating device mounted on the film forming system according to the first embodiment.

FIG. 8 is a diagram showing a groove wiring and a plug forming step by a dual damascene method to which the film forming method according to the first embodiment is applied.

9 is a flowchart illustrating a comparison between a conventional method and the method according to the first embodiment.

10 is a plan view of the film formation system according to the second embodiment.

FIG. 11 is a side view showing a film forming system according to a second embodiment. FIG.

FIG. 12 is a side view showing two processing unit groups and a conveying mechanism formed by stacking a plurality of processing units in multiple stages mounted in the film formation according to the second embodiment.

It is a longitudinal cross-sectional view which shows the hardening process part of the film formation system which concerns on 2nd Embodiment.

14 is a plan view of a film forming system according to a third embodiment.

FIG. 15 is a side view of the film forming system shown in FIG. 14.

FIG. 16 is still another side view of the film forming system shown in FIG. 14.

FIG. 17 is a perspective view of a conveying apparatus in the film forming system shown in FIG. 14.

FIG. 18 is a diagram (1) showing the steps of manufacturing the semiconductor device according to the third embodiment.

FIG. 19 is a diagram (2) showing the steps of manufacturing the semiconductor device according to the third embodiment.

20 shows a processing flow in manufacturing a semiconductor element according to the third embodiment.

FIG. 21 is a plan view of a low oxygen cure cooling (DCC) of the film forming system shown in FIG. 14.

FIG. 22 is a cross-sectional view of FIG. 21.

<Explanation of symbols for main parts of drawing>

401: insulating film forming system 420: heat treatment furnace

449: heat treatment device 450: panel

456,472: Opening and closing shutter W: Wafer

The film formation system as 1st Embodiment of this invention is demonstrated.

1 is a plan view of a film forming system 401 for forming an insulating film as a film on the wafer W, FIG. 2 is a side view of the film forming system 401, and FIG. 3 is another view of the film forming system 401. Side view.

As shown in FIG. 1, the film forming system 401 is, for example, carrying out and carrying out 25 wafers W from the outside in cassette units with respect to the film forming system 401, or with respect to the cassette C with a wafer ( A cassette station 402 for carrying out and carrying out W), a first processing station 403 formed by multiple stages of various processing apparatuses for performing a predetermined process in a single sheet during the insulating film forming step, and the first processing station ( A second processing station having an interface portion 404, which is prepared adjacent to 403, for transferring the wafer W, etc., and a heat treatment furnace 420 that performs heat treatment in a batch manner as a second heating device. It has the structure which connected 405 integrally.

In the cassette station 402, the plurality of cassettes C are placed in one row in the X direction (up and down direction in FIG. 1) at a predetermined position on the cassette placing table 406 serving as the placing unit. Then, a wafer carrier 407 which can be transferred to the cassette array direction (X direction) and the wafer array direction (Z direction: vertical direction) of the wafer W accommodated in the cassette C is transferred to the transfer path 408. Therefore, it is designed to move freely and is selectively accessible to each cassette (C).

The wafer carrier 407 is also accessible to the delivery unit 442 belonging to the third processing apparatus group G3 on the first processing station 403 side as described later.

In the first processing station 403, the main transport device 413 is designed in the center thereof, and various processing devices are arranged in multiple stages around the main transport device 413 to form a processing device group. In the film forming system 401, four processing device groups G1, G2, G3, and G4 are arranged, and the first and second processing device groups G1 and G2 are the film forming system 401. The third processing apparatus group G3 is disposed adjacent to the cassette station 402, and the fourth processing apparatus group G4 is disposed adjacent to the interface unit 404. Furthermore, as an option, the 5th processing apparatus group G5 shown by the broken line can be arrange | positioned separately on the back side.

In the first processing apparatus group G1, as shown in FIG. 2, a spinner type processing apparatus, for example, a coating apparatus for coating and treating a coating liquid for forming an insulating film on a wafer W (COT). 415 and 416 are arranged in two stages. In the second processing apparatus group G2, a coating apparatus (COT) 417 and a coating apparatus (DSE) 418 for an exchange chemical liquid for changing a solvent in the coating liquid into another solvent are stacked in two stages.

In the third processing apparatus group G3, as shown in FIG. 3, between the two engine processing apparatuses (DAC) 440 and 441 and the cassette station 402 which gel-process the wafer W. As shown in FIG. Delivery units TRS and 442 for receiving the wafer W, a cooling device COL 443 for cooling, and a low-oxygen high temperature heat treatment device OHP 444 for heating the wafer W, etc. It is laminated | stacked in 5 steps in order from the bottom, for example.

In the fourth processing apparatus group G4, for example, a transfer unit (TRS) 446 that receives the wafer W between the cooling unit (COL) 445 and the interface unit 4, and the low temperature heating process. An apparatus (LHP) 447, two low oxygen high temperature heating (OHPs) 448, 449 which evaporate solvent components in a coating liquid applied to the surface of the wafer W as the first heating apparatus, etc. It is laminated in five steps.

Next, the interface part 404 is designed with a wafer carrier 450 and a mounting part 451 for placing the wafers W before and after the heat treatment in the heat treatment furnace 420. The wafer carrier 450 is configured to be freed from movement in the X direction (up and down direction in FIG. 1), Z direction (vertical direction) and rotation in the θ direction (rotation direction around the Z axis). It is comprised so that the transmission part 446 and the mounting part 451 which belong to the processing apparatus group G4 are accessible.

In addition, the second processing station 405 is designed adjacent to the interface unit 404, and the wafer W is transferred from the heat treatment furnace 420 and the placement unit 451 of the interface unit 404 to the heat treatment furnace 420. ) Has a carrier 452 for conveying. That is, the carrier body 452 is comprised so that the movement of X direction (up-down direction of FIG. 1), Z direction (vertical direction), and rotation of (theta) direction (rotation direction centering on a Z axis) can be made free.

4, the area | region in which the interface part 404 and the 2nd processing station 405 are arrange | positioned is covered with the panel 455 as a trimming plate, and forms space T. As shown in FIG. The panel 455 is designed with a carrying in and out port 460 for carrying in and carrying out the wafer W from the transfer unit 446 of the first processing station 403. The carrying in and out ports 460 have this carrying in and out ports. The shutter 456 which opens and closes the opening and closing 460 is provided facing the transmission part 446 of the 3rd processing apparatus group G3. In addition, the panel 455 is designed with a supply port 457 for supplying a gas for setting the space T to a low oxygen atmosphere. As shown in FIG. 2, the gas is supplied from a gas supply source 458. do. Moreover, as shown in FIG. 3, the gas exhaust port 459 is provided in the suitable place of the 2nd processing station 405. As shown in FIG.

Here, the structure of the above-mentioned low oxygen high temperature heat processing apparatus (OHP) 449 which evaporates the solvent component in the coating liquid of the wafer W is demonstrated using FIG.

As shown in FIG. 5, the low oxygen high temperature heat treatment apparatus (OHP) 449 is covered by a casing 470 to form a processing chamber S. As shown in FIG. A side of the casing 470 has a carry-in and out port 485 for carrying in and carrying out the wafer W, and a shutter 472 for opening and closing the carry-in and exit 485 is provided at the carry-in and out port 485. . In addition, the lower surface of the casing 470 is provided with a supply port 473 for supplying nitrogen gas, for example, and the nitrogen gas is a gas supply source.

It is configured to be supplied from the supply port 473 via the supply path 475 from 474. On the upper surface of the casing 470, an exhaust port 476 for exhausting the nitrogen gas or the like is provided. Therefore, the nitrogen gas of the gas supply tank 474 is supplied from the supply port 473 into the process chamber S, and the inside of the process chamber S can be made into the low oxygen atmosphere, and furthermore, the nitrogen gas and the wafer W are carried out. It is possible to exhaust impurities generated from the exhaust port 476.

In the casing 470, a thick disk-shaped mounting table 477 for heating the wafer W is provided. The mounting table 477 is equipped with a heater 478 that serves as a heat source when heating, and the heater 478 generates heat by electric power supplied from a power source 479 provided outside the casing 470. The wafer W on the mounting table 477 is heated.

In addition, when the wafer W is brought into and taken out of the low oxygen high temperature heat treatment apparatus (OHP) 449, a lifting hole 480 for supporting and lifting the wafer W is provided in the mounting table 477. It penetrates 481, and is settled on the mounting base 477 freely. That is, the lifting pin 480 is lifted by the drive mechanism 482. Furthermore, when placing the wafer W on the mounting table 477, three proximity pins 483 supporting the wafer W are provided on the mounting table 477.

Next, a heat treatment furnace as a second heating device for forming an insulating film on the wafer

The configuration of 420 will be described. As shown in FIG. 6, the heat treatment furnace 420 is mainly a wafer.

A vertical furnace 510 for actually heating (W) and a ladder boat 490 for collectively mounting the plurality of wafers W in the vertical furnace 510 at once.

First, the ladder boat 490 has a circular ceiling plate 491 and a bottom plate 492 which are arranged to face up and down as shown in Fig. 6, such a ceiling plate 491 and the bottom plate.

Four pillars 493, 494, 495, and 496 are provided between the 492. The wafer W is conveyed from the mounting portion 451 of the interface portion 404 by the carrier 452, and the peripheral edge of the wafer W is formed in the groove portion 497 formed on the surfaces of the respective pillars 493, 494, 495, and 496. It is comprised so that the part may be mounted in the ladder boat 490 by accommodating.

In addition, the ladder boat 490 is freely attached to and detached from the quartz insulator 499 having a flange portion 498 made of stainless steel via the support member 500, and furthermore, the insulator 499. Is placed on a boat elevator 501 which is free to move up and down. As a result of the rise of the boat elevator 501, the wafer W is placed together with the ladder boat 490 in the reaction vessel 512 described later in the vertical furnace 510. It is supposed to be loaded.

On the other hand, the vertical furnace 510 for forming a predetermined insulating film is disposed in the vertical direction above the ladder boat 490. The casing 511 of this vertical furnace 510 has a substantially cylindrical shape with an upper surface open, and has a reaction vessel 512 inside which the wafer W is actually heated. On the outer periphery of the reaction vessel 512, a heating element (not shown) is disposed. Further, for example, nitrogen gas, which is a processing gas for forming an insulating film, is introduced into the reaction vessel 512 by the processing gas introduction pipe 525, and after the treatment, an exhaust pipe 526 provided below the reaction vessel 512. Is exhausted to outside.

Next, the structure of the coating apparatus (COT) 415-417 for apply | coating the coating liquid for insulating films on the wafer W is demonstrated using FIG.

The coating device (COT) 415 is a coating device for applying a coating liquid for an organic low dielectric constant film on the wafer W, the fixing cup 582 whose upper surface is opened and closed by a lid 581, and the fixed cup 582. The rotary shaft 584 which is fed from the bottom surface of the cup 582 and which can be lifted and lowered by the driving unit 583, the chuck 585, which is a wafer holding unit provided on the upper end of the rotary shaft 584, and the lid 581. It is provided in combination and is provided with the coating liquid nozzle 586 for supplying a coating liquid to the center part of the wafer W. As shown in FIG. The fixed cup 582 is connected with a solvent vapor supply pipe 588 for supplying a solvent used as a coating liquid, for example, vapor of ethylene recall, and a drain pipe 589 and an exhaust pipe 590. It is. That is, the coating liquid and the solvent used in this unit are supplied from the above-mentioned chemical chamber (not shown) provided in the coating processing part 521. Chemical chambers contain chemicals other than those that adversely affect treatments such as ammonia and HMDS.

That is, in order to form an organic insulating film by SOD, there are a sol-gel method, a silk method, a speed film method, a fox method, etc. In the case of forming the insulating film by the sol-gel method, a coating liquid obtained by dispersing a tetraethylorhtosilicate (TEOS) clad in an organic solvent is applied to the surface of the wafer to gel the coating film, and then the solvent in the coating film is changed to another solvent. Substituted and dried after that, an insulating film is obtained. In the case of forming the organic insulating film by the silk method, the speed film method, and the Fox method, the coating liquid is applied to the cooled wafer, and the coating liquid is cured by heat treatment to obtain an insulating film.

The coating device 416 is used to apply an Adhesion promoter required when the silk method and the speed film method are employed, and basically have the same structure as the coating device 415.

The coating device 417 is for applying a coating liquid for an inorganic insulating film for a hard mask made of SiO ₂ , for example, on an organic low dielectric constant film by SOG (Spin On Glass), and basically the coating device 415. Has the same structure as In SOG, for example, a processing solvent (SOG solution) obtained by mixing a siranol compound such as Si (OH) ₄ and a solvent such as ethyl alcohol is applied onto the wafer W, and then subjected to a heat treatment to evaporate the solvent. To proceed with the polymerization reaction of the siranol compound to form a SiO ₂ film.

The coating device (DSE) 418 of the chemical liquid for exchange is used when the coating liquid applied by the coating device (COT) 415 forms a type of organic insulating film by the sol-gel method, and the wafer W The spin chuck which rotates by holding it horizontally and the cup which is installed so as to surround the wafer W on this chuck, the water in the coating liquid after the aging treatment for gelation is first replaced by ethanol or the like. The solvent in the film is replaced by heptane or the like.

Next, referring to FIG. 8 for the procedure of forming an interlayer insulating film and a hard mask layer using the film forming system 401 comprised as mentioned above, and forming a groove wiring and a plug by the dual damascene method. Explain.

First, the lower layer wiring 702 is formed on the wafer W, and then the organic low dielectric constant film 703 is formed as the first interlayer insulating film as the lower layer wiring 702 is covered on the wafer W ( 8A, a hard mask layer 704 made of a silicon oxide (SiO ₂ ) film is formed on the organic low dielectric constant film 703 (FIG. 8B).

The organic low dielectric constant film 703 and the hard mask layer 704 are formed by the above insulating film forming system as follows.

First, in the formation of the organic low dielectric constant film 703, when the coating liquid for organic low dielectric constant films is based on the silk method and the speed film method, the wafer W taken out from the cassette in the cassette station 402 is transferred. It is conveyed to the part 442 (TRS). Delivery

(442) A cooling device in which temperature management is performed by the main transport device 413 from (TRS).

(COL) 443 is returned. After the wafer W is controlled to a predetermined temperature in the cooling device (COL) 443, an advance promoter is applied by the coating device (COT) 416 before the coating liquid for the organic low dielectric constant film. Thereafter, the wafer W is baked with a low temperature heat treatment apparatus (LHP) 447 for low temperature, cooled in a cooling apparatus (COL) 445, and then coated with an organic low dielectric constant film in a coating apparatus (COT) 415. The liquid is applied onto the wafer W. Thereafter, baking treatment is performed in a low temperature heat treatment apparatus (LHP) 447 for low temperature and a low oxygen high temperature heat treatment apparatus (OHP) 449 for high temperature. In the Fox method, a cooling device (COL) 443, a coating device (COT) 415, a low temperature heat treatment apparatus (LHP) 447, a low oxygen high temperature heat treatment apparatus (OHP)

Processing in order of 449 is completed until baking. In the sol-gel method, a cooling device (COL)

443, coating apparatus (DOT) 415, aging treatment apparatus (DAC) 441, coating apparatus for exchange chemicals (DSE) 418, low temperature heat treatment apparatus (LHP) 447, low oxygen high temperature heat treatment Device (OHP)

Processing in order of 449 is completed until baking. In this way, as shown in Fig. 8A, an organic low dielectric constant film 703 is formed on the semiconductor wafer W on which the wiring 702 is formed.

Next, after cooling the wafer W to a predetermined temperature in either cooling device COL, the organic low dielectric constant film 703 formed on the wafer W by the coating device (COT) 417. As a coating liquid for hard mask layer formation, "Nanoglass" made from Applied Signals, Inc. is coated on the surface. And the wafer W to which the coating liquid was apply | coated is immediately conveyed to the aging apparatus (DAC) 440, and is gelatinized. Thereafter, a process of replacing the solvent in the insulating film, which is conveyed to the chemical liquid applying device (DSE) 418 for application on the apere W, is performed. The wafer W is then conveyed to a low oxygen high temperature heat treatment apparatus (OHP) 449 to evaporate the solvent.

Here, the operation of the low oxygen high temperature heat treatment apparatus (OHP) 449 will be described in detail.

First, the wafer W having completed the pretreatment process is carried into the low oxygen high temperature heat treatment apparatus (OHP) 449 from the inlet / outlet 485 by the main transport apparatus 413. Lifting pin

480 rises through the through-hole 481 by the drive mechanism 482, and waits at the predetermined position above the mounting base 477. And the main conveying apparatus 413 which loaded the wafer W stops when it comes to the upper side of the mounting base 477, and descends, and transfers the wafer W to the lifting pin 480 after that. The main transport apparatus 413 which transferred the wafer W immediately retracts from the process chamber S, and the opening / closing shutter 472 is closed. Further, as a trigger that the wafer W is supported on the lifting pins 480, nitrogen gas in the gas supply source 474 passes from the supply port 473 to the processing chamber S via the supply path 475. It is supplied in. Then, nitrogen gas is supplied for a predetermined time while the wafer W is supported by the lifting pins 480 above the mounting table 477, so that the atmosphere in the processing chamber S is replaced with a low oxygen atmosphere.

Lifting pins supporting the wafers W after the processing chamber S is in a low oxygen atmosphere.

480 is lowered by the drive mechanism 482 so that the wafer W is placed on the proximity pin 483 on the mounting table 477. There, the wafer W is heat-processed for a predetermined time by the mounting base 477 heated beforehand by the heater 478 to predetermined temperature, for example, 300 degreeC.

After the heat treatment is finished, the wafer W is lifted by the drive mechanism 482.

It is supported by 480 and rises again. Then, the lift pin 480 stops at the elevated position above the mounting table 477, and the wafer W is transferred to the main transport device 413 that enters the casing 470 from the loading and unloading port 485. Lose. Main transport device that accepts the wafer W

413 is evacuated from inside the casing 470 and the opening / closing shutter 472 is closed again.

The wafer W carried out from the low oxygen high temperature heat treatment apparatus (OHP) 449 is conveyed to the cooling apparatus 445 and cooled. After that, it is conveyed to the delivery part 446 (TRS), and waits until the wafer carrier 450 of the interface part 404 accesses.

Next, the wafer carrier 450 of the interface unit 404 receives the wafer W of the transfer unit 446 through the carry-in / out port 460 provided in the panel 455 as the trimming plate. At this time, the atmosphere of the space T formed by the panel 455 is in a low oxygen atmosphere by nitrogen gas which is an inert gas supplied from the gas supply source 458. Moreover, even if the open / close shutter 456 is opened, the static pressure is always kept against the outside air so that the outside air does not enter. After that, the wafer carrier 450 that receives the wafer W carries the wafer W to the mounting unit 451 in the interface unit 404, and arranges the plurality of sheets in a plurality.

The carrier 452 of the second processing station receives the wafer W of the placing unit 451, conveys it to the heat treatment furnace 420, and mounts it on the ladder boat 490 in the heat treatment furnace 420.

Next, the operation of the heat treatment furnace 420 will be described in detail. First, the temperature in the reaction vessel 512 is heated to, for example, about 420 ° C. by a heating body not shown in the drawing, and the treatment gas introduction pipe Reaction vessel by introducing nitrogen gas from 525

(512) The atmosphere is placed inside a nitrogen gas atmosphere. Subsequently, the ladder boat is carried by the carrier body 452.

After mounting the wafer W on the 490, the boat elevator 501 is raised to the ladder boat to a position where the flange portion 498 of the insulating container 499 comes into close contact with the flange (not shown) of the lower end of the reaction vessel 512. 490 is raised to load the wafer into the reaction vessel 512.

Subsequently, the reaction vessel 512 is heated to a predetermined processing temperature, for example, 420 ° C., nitrogen gas is introduced into the reaction vessel 512 from the processing gas introduction pipe 525, and exhausted from the exhaust pipe 526. If the inside of the reaction vessel 512 is, for example, maintained at atmospheric pressure and subjected to heat treatment for a predetermined time, a hard mask layer 704 having a predetermined thickness is formed. By performing the curing treatment in this way, as shown in FIG. 8B, the organic low dielectric constant film 703 and the hard mask layer 704 are collectively cured (cure) and formed on the wafer W. As shown in FIG. That is, the organic low dielectric constant film by the sol-gel method

In the case where 703 is formed, curing is completed by a baking treatment, and furthermore, curing is not necessary, so that the curing treatment in the heat treatment furnace 420 is a treatment for the hard mask layer 704. .

After forming the hard mask layer 704 in this manner, a resist film 705 is formed on the hard mask layer 704 (FIG. 8C), and then the resist film 705 is formed by photolithography. By exposing and developing a predetermined pattern, and patterning the hard mask layer 704 by etching as a mask to form a lower layer in a region where connection between the lower layer wiring 702 and the later formed home wiring is performed. An opening 706 having a width smaller than the width of the wiring 702 is provided (Fig. 8 (d)).

After the resist film 705 is removed, an organic low dielectric constant film 707 is formed on the hard mask layer 704 and the opening 706 as a second interlayer insulating film (Fig. 8 (e)), and the organic low dielectric constant film On 707, for example, a hard mask layer 708 made of a SiO ₂ film is formed (FIG. 8 (f)).

These organic low dielectric constant films 707 and hard mask layers 708 are formed by the film forming system in the same procedure as the organic low dielectric constant films 703 and hard mask layers 704 described above.

After forming the hard mask layer 708 in this manner, a photoresist film 709 is formed on the hard mask layer 708 (Fig. 8 (g)), and the photoresist film 709 is formed by photolithography. The film is exposed and developed to form a predetermined pattern. Using this as a mask, the hard mask layer 708 is etched to form an opening 710 in the hard mask layer 708 (Fig. 8 (h)).

The organic low dielectric constant films 703 and 707 are etched using the hard mask layer 708 patterned as above as an etching mask and using the hard mask layer 704 as an etching stopper film (Fig. 8 (i)). As a result, groove portions 711 and 712 are formed in each of the organic low dielectric constant films 703 and 707.

After forming a barrier metal layer (not shown) on the inner walls of the grooves 711 and 712, the conductive material is buried in these grooves by CVD or the like and subjected to polishing by the DMP method to selectively select only the conductive material in the grooves. The conductive portion having the plug 713 and the grooved wiring 714 is completed, leaving it as shown in Fig. 8 (j).

The outline of this processing flow will be described with reference to Fig. 9 while comparing with the conventional one.

Conventionally, as shown in (a), an organic low dielectric constant film Lowk1 is formed as a first interlayer insulating film by a coating technique, and then the first hard mask layer (hard mask 1) is formed in a CVD apparatus. After forming, after photolithography and etching, an organic low dielectric constant film Lowk2 is formed as a second interlayer insulating film by SOD technology, and a second hard mask layer (hard mask 2) is formed in a CVD apparatus for photolithography and Etching is performed. In contrast, in the present embodiment, the organic low dielectric constant film Lowk1 and the first hard mask layer (hard mask 1) as the first interlayer insulating film are collectively formed by a coating technique, and applied thereafter after photolithography and etching. By the technique, the organic low dielectric constant film Lowk2 and the second hard mask layer (hard mask 2) as the second interlayer insulating film are collectively formed to perform photolithography and etching.

As described above, in the present embodiment, unlike the conventional method, since both the organic low dielectric constant film and the hard mask layer as the interlayer insulating film are formed by applying the coating liquid, the organic low dielectric constant film and the hard mask layer are not interposed. Since it is possible to collectively form a two-layer structure, it is possible to simplify these formation processes. In addition, since these two-layer structures are continuously formed by one of the above-described film forming apparatuses, it is possible to remarkably simplify such a film forming process without the need to convey the wafer to another apparatus, thereby greatly reducing the organic low dielectric constant film and the hard mask layer. It is possible to form a film quickly.

In addition, according to the above-described embodiment, in the low oxygen high temperature heat treatment apparatus 449 for evaporating the solvent in the coating film, a predetermined heat treatment is performed after replacing the inside of the processing chamber S with nitrogen gas to become a sufficiently low oxygen atmosphere. Since the coating film on the wafer W reacts with oxygen, the oxidation can be prevented. In addition, the area of the interface unit 404 and the second processing station 405 is separated from the other area by the panel 455, and the space T is formed, and the space T is nitrogen which is an inert gas. Since the gas is in a low oxygen atmosphere, it is possible to prevent the coating film on the wafer W conveyed in the space T from reacting with oxygen and oxidizing. As a result, the coating film on the wafer W can be suppressed from being oxidized from the heat treatment furnace 420 to the heat treatment, and the treatment in the heat treatment furnace 420 is performed properly, resulting in poor insulation or the like. This decreases and improves the ratio of products to raw materials.

In addition, since the shutter 456 is provided in the panel 455 to open and close freely, and the opening and closing shutter 456 is closed except at the time of carrying in and taking out the wafer W, the fluctuation of the oxygen concentration in the space T is suppressed. It is done. In addition, it is possible to reduce the amount of gas necessary for maintaining in a low oxygen atmosphere, which is economical.

In the above-mentioned embodiment, in the low oxygen high temperature heating apparatus 449 which evaporates the solvent component of a coating film, in order to make it into a low oxygen atmosphere, nitrogen gas as an inert gas is supplied and exhausted from the upper part of the casing 470, but exhaust means which reduces pressure is carried out. The inside of the low oxygen high temperature heating apparatus 449 may be made into the low oxygen atmosphere as a reduced pressure state using the vacuum pump as a vacuum. That is, in this case, the casing 470 is comprised so that airtightness can be maintained.

Next, the film formation system of another structure is demonstrated as 2nd Embodiment. In the second embodiment, a processing station in which various processing apparatuses such as a coating apparatus for performing a predetermined process is arranged in an insulating film forming step, a processing station in which a heat treatment furnace is arranged, and transfer of the wafer W between these processing stations is performed. Losing is different from the first embodiment in that the positional relationship of the interface unit or the like is different.

FIG. 10 is a plan view showing a film forming system according to the second embodiment, FIG. 11 is a side view of the film forming system shown in FIG. 10, and FIG. 12 shows two groups of processing apparatuses mounted in the film forming system shown in FIG. 10. It is a side view showing.

This film forming system comprises a coating processing unit 621 as a processing station, a side cabinet (chemical liquid unit) 622, and a semiconductor wafer (hereinafter simply referred to as a wafer) in which various processing apparatuses for performing a predetermined process are arranged in an insulating film forming step. (B) a cassette station (CSB) 623 for carrying in and out of the wafer W, and a coating liquid to be disposed on a plurality of wafers W after application. And a hardening treatment unit 624 in which a heat treatment furnace for hardening treatment is arranged, and an interface unit 625 for transferring the wafer W between the coating treatment unit 621 and the hardening treatment unit 624.

As shown in FIGS. 10 and 11, the coating treatment unit 621 has a wafer transfer mechanism 631 almost in the center, and all processing apparatuses are arranged around the wafer transfer mechanism 631. Immediately in front of the coating unit 621, two processing unit groups 632 and 633 are provided which are stacked with two stages of processing units, and the processing unit group 632 is an application device for applying a chemical solution for exchange in order from above. DSE) 634 and a first coating device (COT) 635. Moreover, the processing apparatus group 633 has the 2nd coating apparatus (COT) 636 and the 3rd coating apparatus (COT) 637. FIG. That is, a chemical chamber (not shown) incorporating a medicine or the like is provided in the coating processing unit 621.

On both sides of the wafer transfer mechanism 631, processing apparatus groups 638 and 639, which are formed by stacking a plurality of processing apparatuses in multiple stages, are provided. The processing apparatus group 638 on the left side is a low temperature low temperature heating processing apparatus (LHP) 640 and two low oxygen cure cooling processing apparatuses (DCC) (Dielectric Oxygen Density Controlled) in order from the upper side as shown in FIG. Cure and Cooling-off) processing unit 641 and two aging units (DACs) 642 are stacked and configured. In addition, the processing unit group 639 on the right side has two low-temperature, low-temperature, high-temperature heating apparatuses (OHP) 643 for low temperature, a low-temperature, low-temperature heating apparatus (LHP) 644, and two cooling units in order from the upper side thereof. A device (COL) 645 is stacked and configured.

The first coating device (COT) 635 is for applying a coating liquid for an organic low dielectric constant film to be used as an interlayer insulating film on the wafer W. The coating device (COT) of the first embodiment described above ( 415).

The second coating device (COT) 636 is used for application of the advice promoter required when the silk method and the speed film method are employed, and basically the same as the first coating device (COT) 635. It has a structure.

The third coating device (COT) 637 is for applying a coating liquid for a hard mask made of SiO ₂ , for example, on an organic low dielectric constant film by SOG (Spin On Glass), which is basically also It has the same structure as the first coating device (COT) 635. In SOG, for example, a treatment solution (SOG solution) containing a mixture of a silanol compound such as Si (OH) ₄ and a solvent such as ethyl alcohol is applied onto the wafer W, and then subjected to a heat treatment to evaporate the solvent. The polymerization reaction of the knol compound is carried out to form a SiO ₂ film.

The coating device (COT) 634 of the chemical liquid for exchange is used in the case where the coating liquid applied by the first coating apparatus (SCT) 635 forms the organic low dielectric constant film by the sol-gel method. And a spin chuck for holding and rotating the wafer W horizontally, and a cup designed to surround the wafer W on the chuck. The moisture in the coating film after the aging treatment for gelation described below is first made of ethanol or the like. It replaces and the solvent in a coating film is substituted by heptane etc.

An aging processing apparatus (DAT) 642 belonging to the processing unit group 638 has a heating plate incorporating a heater in a sealed processing chamber. The ammonia is vaporized by a bubbler 665 or the like in the side cabinet 622 to be supplied into the process chamber, and exhaust is trapped by the dren tank 668 in the side cabinet 622. This aging apparatus (DAC) is for gelling a coating film by condensation polymerization and hydrolysis of TEOS (tetraethylorthsilicate) when an organic low dielectric constant film is formed by a sol-gel method.

The high temperature low oxygen high temperature heat treatment apparatus (OHP) and the low temperature low temperature heat treatment apparatus (LHP) belonging to the processing unit groups 638 and 639 are placed on or close to the wafer W on a hot plate set at a predetermined temperature to apply a coating liquid. Is a device for baking the wafer W after coating. The cooling device COL is a unit for cooling the wafer W by placing or approaching the wafer W after baking on the cooling device set to a predetermined temperature. Furthermore, the transfer section (TRS) 646 has a wafer mounting base and is a unit for transferring wafers to and from the cassette station (CSB) 623. That is, the transmission part TRS 646 can also have the function of a cooling apparatus by controlling a mounting stand to predetermined temperature.

The low-oxygen cure / cooling apparatus 641 belonging to the processing apparatus group 638 heats and cools the wafer W on which the coating film is formed, in a low-oxygen concentration atmosphere, in order to cure (cure) the coating film. It is an apparatus, it is used in the case of forming a coating film in the case of forming an organic layer insulating film by the silk method, the speed film method, or the Fox method, and it is not necessary to use when forming a coating film by the sol-gel method. This low-oxygen cure-cooling apparatus 641 is used when the curing temperature is relatively low, and when the curing temperature is 470 占 폚 or more, a vertical heat treatment furnace 678 of the curing treatment unit 624 is used.

As shown in Fig. 11, the wafer transfer mechanism 631 extends in the vertical direction and has a cylindrical support having vertical walls 651a and 651b and side openings 651c therebetween.

651 and a wafer carrier 652 provided freely in the vertical direction (Z direction) along the cylindrical support 651. The cylindrical support 651 is a motor

It is rotatable by the rotation driving force of 653, and accompanying it, the wafer carrier 652 is also integrally rotated. Wafer carrier 652 is the carrier carrier invitation

654 and three tweezers 655, 656 and 657 that are movable back and forth along the carrier base 654, which tweezers 655, 656 and 657 are side openings of the cylindrical support 651.

It has a size that can pass 651c. These tweezers (655, 656, 657) are based on the carrier

The motor and the belt mechanism built in 654 make it possible to move forward and backward independently of each other. The wafer carrier 652 is moved up and down by driving the belt 659 by the motor 658. That is, reference numeral 660 denotes a driving pulley and 661 denotes a driven pulley.

The side cabinet 622 is provided separately from the coating treatment unit 621 adjacent to the coating treatment unit 621, and is provided with a bubbler 665 for supplying a chemical liquid to the upper end thereof, and a gas-liquid mixture flow by gas-liquid separation. It has a mist trap (666) for discharging, and has a HMDS tank (667a) or an ammonia tank (667b) at the lower end thereof, and a drain tank (668) for discharging drainage liquid.

Aging processing apparatus (DAC) because the side cabinet 662 is configured in this way

When ammonia is supplied to the 642, the ammonia is filled in the bubbler 665 from the ammonia tank 667b, and the ammonia is bubbled by the bubbler 665 to vaporize, and the aging unit (DAC) 642 Is supplied. In addition, when HMDS is supplied to the coating apparatus (COT) 634 of an exchange chemical | medical solution, HMDS is supplied directly from the tank 667a of HMDS.

In addition, the exhaust from the aging unit (DAC) 642 is trapped by the drain tank 668 in the side cabinet 622. Moreover, the application device of the coating liquid for exchange (COT)

The exhaust gas mixed with the liquid from 634 is gas-liquid separated by the mist trap 666 in the cabinet 622, and the drainage is discharged to the drain tank 668.

In this way, an aging treatment apparatus (DAC) 642 and an exchange chemical application apparatus (DSE) that require ammonia and HMDS supplied from the side cabinet 622, respectively.

Since 634 is provided adjacent to the side cabinet 622, it is possible to shorten the chemical liquid supply system.

In the interface unit 625, a positioning mechanism 672 for receiving and positioning a wafer W conveyed from the coating unit 621 in a box 671 that is almost sealed, and the wafer from the positioning mechanism 672. An import / export mechanism 673 that receives (W) and loads and unloads the wafer boat 674 is provided. In the interface unit 625, a plurality of wafer boats 674 (three in the drawing) and a boat liner 676 on which one dummy wafer boat 675 is mounted are freely arranged in the Y direction. The interface 625 is set in a low oxygen atmosphere.

The hardening treatment part 624 is connected to the interface part 625 via the opening window 677, and is arrange | positioned in the hardening treatment part 624 below the longitudinal heat processing furnace 678, and this heat treatment furnace 678. Loading and unloading the wafer boat 674 from the boat liner 676 of the interface unit 625 to the boat elevator 679 for lifting and bringing the wafer boat 674 into the heat treatment furnace 678. The conveyance mechanism 680 for carrying out is arrange | positioned.

In the hardening process part 624, as shown in FIG. 13, the heat processing furnace 678 accommodates the quartz material process tube 691 which has an inverted U shape in cross section, and has a heater (circumference | surroundings of this process tube 691). 692 is surrounded. A manifold 693 is connected to the lower end of the opening of the process tube 691, and an introduction tube (not shown) for introducing a predetermined process gas into the process tube 691 is provided in the manifold 693. And an exhaust pipe (not shown) for exhausting the gas after the treatment are respectively connected. Moreover, the boat elevator 679 is provided with the object 694 which abuts the manifold 693, and keeps the inside of the process tube 691 sealed, and the insulation container 695 is mounted on the upper part of the object 694. It is.

Also in the present embodiment, like the first embodiment described above, the interlayer insulating layer and the hard mask layer are formed using the film forming system configured as described above, and the home wiring and the plug are connected by the dual damascene method. It is possible to form.

Next, the film formation system of another structure is demonstrated as 3rd Embodiment. The third embodiment has a structure in which the coating device for applying the resist film formed in the photolithography step is added to the insulating film forming system described above. A description with reference to the drawings is as follows.

14 to 16 are views showing the appearance of a film forming system used when forming the insulating film of the semiconductor element described above, and Fig. 14 shows a plan view, and Figs. 15 and 16 show a side view, respectively.

The film forming system 1 is, for example, a cassette for carrying in and carrying out 25 wafers W from the outside in a cassette unit with respect to the film forming system 1 or for carrying in and carrying out the wafer W from the cassette C. A station 2, a processing station 3 formed by arranging various types of sheet-like processing apparatuses that perform a predetermined process on the wafer W in the film forming process, and the processing station 3 provided adjacent to the processing station 3 It has the structure which integrally connected the interface part 5 for delivering the wafer W between the exposure apparatus 4 and it.

In the cassette station 2, at the position of the positioning projection 10a on the cassette placing table 10, a plurality of cassettes C move the entrance and exit of the wafer W toward the processing station 3 side in the X direction (see FIG. 1). Freely placed in a line along the vertical direction). Then, the wafer carrier 11 which is movable in the arrangement direction (X direction) of the cassette C and the arrangement direction (Z direction; vertical direction) of the wafer W accommodated in the cassette C is the transfer path 12. It is possible to move freely along) and to selectively access each cassette (C).

The wafer carrier 11 is freely rotated in the θ direction, and includes the wafer carrier 11 belonging to the multi-stage device part of the first processing device group 70 described later and the first carrier 50 described later. ) Between the wafer carrier 11 belonging to the extension apparatus (EXT) 74 or the fourth processor group 90 and the second carrier 60 described later. It is configured to be accessible to an extension device (EXT) 93 for delivery.

In the processing station 3, the first coating device group 20 including the insulating film coating device, the resist coating device, and the exchange coating device on the front side is formed, and the second coating device group 30 including the developing treatment device is provided on the back side. Each is arranged.

As shown in Figs. 15 and 16, the first coating device group 20 is formed by stacking resist coating devices 22 and 24, and further comprising an organic insulating film coating device 23 and an inorganic insulating film coating device 21. The coating device 25 of an exchange chemical liquid is comprised so that each may overlap. In the resist coating apparatuses 22 and 24, the wafer W is placed on the spin chuck in the cup CP, and the resist liquid is applied by spin coating, and a resist coating apparatus is applied to the wafer W. As shown in FIG. In the organic insulating film coating apparatus 23, the wafer W is placed on the spin chuck in the cup CP, and the organic insulating film material, here, SILK is applied by spin coating to apply the organic insulating film to the wafer W. The process is performed. In the inorganic insulating film coating apparatus 21, the wafer W is placed on a spin chuck in a cup CP, and an inorganic insulating film material, here Nanoglass (manufactured by Aplied Signal), is coated by spin coating, and the wafer W is applied. The inorganic insulating film coating process is performed. In the application device 25 for an exchange chemical liquid, the wafer W is placed on a spin chuck in a cup CP, an exchange chemical liquid such as HMDS and heptane is supplied onto the wafer W by spin coating, and the wafer The solvent in the inorganic insulating film coated on (W) is subjected to a treatment which can be replaced with another solvent before the drying step.

As shown in Figs. 15 and 16, the second coating device group 30 is configured such that the developing apparatuses 33 and 31 and the developing processing units 34 and 32 respectively overlap. In the developing apparatuses 31 to 34, the wafer W is placed on the spin chuck in the cup CP, the developer is supplied, and the developing process is performed on the wafer W.

The processing station 3 is provided with a supply port 157 for supplying gas in order to make the space in the processing station low oxygen atmosphere, and the gas is supplied by the gas supply source 158. In addition, a gas exhaust port 159 is provided. Therefore, nitrogen gas from the gas supply source 158 is supplied from the supply port 157 into the processing station 3 to make the inside of the processing station 3 a low oxygen atmosphere, and further exhausts the nitrogen gas from the exhaust port 159. It is possible.

The above-described resist coating device, organic insulating film coating device, inorganic insulating film coating device, exchange chemical coating device, and developing device have the same spinner type processing device structure. That is, in each of these apparatuses, a ring-shaped cup CP is arranged at the center of the bottom of the apparatus, and a spin chuck is arranged inside the apparatus. The spin chuck is in a state where the wafer W is fixed and held by vacuum suction, and is configured to rotate by the rotational driving force of the drive motor. The drive motor is arranged to be capable of lifting and lowering by the omitted cylinder, whereby the spin chuck can be lifted and lowered. Furthermore, each device includes a solution (resist liquid in a resist coating device, an organic insulating film material in an organic insulating film coating device, an inorganic insulating film material in an inorganic insulating film coating device, an inorganic insulating film material in an inorganic insulating film coating device, and an exchange in an application device for an exchange chemical solution). In the chemical liquid and the developing apparatus, a solution supply nozzle for supplying the developer) is provided. This solution supply nozzle is conveyed from the nozzle standby part arrange | positioned outside the cup CP to the predetermined | prescribed solution liquid discharge position set above the spin chuck.

In the center of the processing station 3, the transfer table 40 on which the wafer W is placed is provided.

The first coating device group 20 and the second coating device group 30 face each other with the transfer table 40 interposed therebetween, and between the first coating device group 20 and the delivery table 40. The first conveying apparatus 50 is equipped with the 2nd conveying apparatus 60 between the 2nd coating apparatus group 30 and the delivery stand 40, respectively.

The 1st conveyance apparatus 50 and the 2nd conveyance apparatus 60 have basically the same structure, and if the structure of the 1st conveyance apparatus 50 is demonstrated based on FIG. 17, the 1st conveyance apparatus 50 will Wafer conveyance means 54 is provided in the up-down direction (Z direction) in the inside of the cylindrical support body 53 which consists of integral wall parts 51 and 52 which mutually connect and oppose at the upper end and the lower end. The cylindrical support body 53 is connected to the rotating shaft of the motor 55, and the wafer conveying means is centered on the rotating shaft by the rotating driving force of the motor 55.

Rotate integrally with 54. Therefore, the wafer conveyance means 54 is free to rotate in the (theta) direction.

On the conveyance base 56 of the wafer conveying means 54, a plurality of, for example, two tweezers 57, 58 serving as holding members for holding the wafer W are provided up and down. Each tweezers 57 and 58 have basically the same configuration, and have a free form and size through the side openings between both wall portions 51 and 52 of the cylindrical support 53. In addition, each tweezers 57 and 58 are free to move in the front-back direction by a motor (not shown) incorporated in the carrier base 56. In other words, the second conveying apparatus 60 is provided with tweezers 67 and 68 having the same function and configuration as the tweezers 57 and 58.

On both sides of the first conveying apparatus 50, a first processing apparatus group 70 formed of various apparatuses stacked in multiple stages in the vicinity of the first coating apparatus group 20 and a second processing apparatus group 80 composed of a cooling system processing apparatus. These are arranged, respectively. On both sides of the second conveying apparatus 60, the fourth processing apparatus group 90 and the third processing apparatus group 100 which consist of various heating system processing apparatuses are arrange | positioned in the vicinity of the 2nd coating apparatus group 30, respectively. .

The first processing unit group 70 and the fourth processing unit group 90 are arranged on the cassette station 2 side, and the second processing unit group 80 and the third processing unit group 100 are interface units ( It is arranged on the 5) side.

Here, the structure of the 1st processing apparatus group 70 and the 4th processing apparatus group 90 is demonstrated based on FIG. 2 which looked at the processing station 3 from the cassette station 2 side.

The first processing apparatus group 70 includes a low oxygen high temperature heating apparatus (OHP) 72, 75, an alignment apparatus (ALIM) 73 for aligning the position of the wafer W, and an extension apparatus for waiting the wafer W. The (EXT) 74, the aging processing unit (DAC) 76, the low temperature heating processing unit (LHP) 77, and the low oxygen cure cooling unit (DCC) 78 are stacked in order from the bottom. In the aging processing apparatus (DAC), a processing gas (NH ₃ + H ₂ O) mixed with ammonia gas and water vapor is introduced into an encapsulating processing chamber to age the wafer W, and the insulating film material on the wafer W is applied. Wet Gel.

The fourth processing apparatus group 90 includes an alignment apparatus (ALIM) 92, an extension apparatus (EXT) 93, and a prebaking apparatus (PREBAKE) 94,95 which heat-treats the wafer W after applying the resist. ) And post-baking apparatus (POBAKE) 96, 97, 98 for heating the wafer W after the development treatment are stacked in order from the bottom.

Next, the structure of the 2nd processing apparatus group 80 and the 3rd processing apparatus group 100 is demonstrated based on FIG. 16 which saw the processing station 3 from the interface part 5 side.

The second processing apparatus group 80 includes a cooling device (COL) 81, 82, an alignment device (ALIM) 83, an extension device (EXT) 84, and a cooling device (COL) 85, 86, 87,88 are laminated in order from the bottom.

The third processing apparatus group 100 includes a prebaking apparatus (PREBAKE) 101, 102, post exposure baking apparatus (PEB) 103, 104 which heat-processes the wafer W after exposure processing, and a postbaking apparatus (POBAKE) ( 105, 106 and 107 are stacked in order from the bottom.

The interface unit 5 accesses the extension device (EXT) 84 belonging to the second processing device group 80 and the post exposure baking devices (PEBs) 103 and 104 belonging to the third processing device group 100. Possible wafer carriers 110 are provided.

The wafer carrier 110 is free to move in the X direction along the rail 111 and to move up and down in the Z direction (vertical direction in FIG. 14), and to rotate in the θ direction. The wafer W is transported to the exposure apparatus 4 and the peripheral exposure apparatus 112.

21 is a plan view of the low oxygen cure cooling apparatus (DCC) described above, and FIG. 22 is a cross-sectional view thereof.

The low-oxygen cure-cooling apparatus (DCC) has a heat treatment chamber 341 and a cooling treatment chamber 342 provided adjacent thereto. The heat treatment chamber 341 has a set temperature of 200 to 470 占 폚. It has a hot plate 343 possible. The low oxygen cure / cooling device (DCC) includes a first gate shutter 344 that opens and closes when the wafer W is transferred between the main wafer transfer mechanism 22, the heat treatment chamber 341, and the cooling treatment chamber 342. And a second gate shutter 345 for opening and closing between the ring shutter 345 and a ring shutter 346 which is elevated together with the second gate shutter 345 while surrounding the wafer W around the hot plate 343. have. In addition, three support pins 347 for mounting and lifting the wafer W are provided on the hot plate 343 so that the lifting and lowering is free. That is, a shielding screen may be provided between the hot plate 343 and the ring shutter 346.

Under the heat treatment chamber 341, an elevating mechanism 348 for elevating the three support pins 347, and an elevating mechanism 349 for elevating the ring shutter 346 together with the second gate shutter 345. ) And an elevating mechanism 350 for elevating and opening and closing the first gate shutter 344 are provided.

The heat treatment chamber 341 is configured such that an inert gas such as N 2 is supplied therein from a supply source (not shown), and the inside thereof is exhausted via the exhaust pipe 351. By evacuating while supplying the inert gas, the inside of the heat treatment chamber 341 is maintained at a low oxygen concentration (for example, 50 ppm or less).

The heat treatment chamber 341 and the cooling treatment chamber 342 communicate with each other via the communication port 352. A cooling plate 353 for mounting and cooling the wafer W is moved along the guide plate 354. The movement from the 355 to the horizontal direction is configured freely. As a result, the cooling plate 352 can enter the heat treatment chamber 341 via the communication port 352 and support the wafer W after being heated by the hot plate 343 in the heat treatment chamber 341. It takes in from the fin 347, carries it in into the cooling process chamber 342, and after cooling of the wafer W, the wafer W is returned to the support pin 347.

Further, the cooling processing chamber 342 is configured to supply an inert gas such as N 2 through the supply pipe 356, and to exhaust the inside of the cooling processing chamber 357 through the exhaust pipe 357. As a result, the inside of the cooling chamber 342, like the heating chamber 341, is maintained at a low oxygen concentration (for example, 50 ppm or less).

The low oxygen high temperature heat treatment apparatus (OHP) 72, 75 has the same structure as the low oxygen high temperature heat treatment apparatus (OHP) 449 of 1st Embodiment. The low temperature heat treatment apparatus (LHP) 77 has the same structure as the low oxygen high temperature heat treatment apparatus (OHP), and differs only in the set temperature from the wafer W. FIG.

Next, FIGS. 18 to 20 are described with reference to the procedure for manufacturing a semiconductor device having the structure shown in FIG. 20 (e) manufactured by a dual damascene process using the film forming system 1 configured as described above. Explain while referring. 18 and 19 are diagrams illustrating a manufacturing process of a semiconductor device manufactured through a dual damascene process, and FIG. 20 is a process in manufacturing a semiconductor device including a processing flow in the film forming system described above. The flow is shown.

First, the structure of the semiconductor element to be manufactured for the first time will be described.

As shown in FIG. 20E, in the semiconductor device 200, a lower layer wiring 201 is disposed on a semiconductor wafer W (hereinafter referred to as a wafer W), and an organic insulating film is formed on the lower layer wiring 201.

An interlayer insulating film made of a laminated film of 202a, an inorganic insulating film 203a, an organic insulating film 204a, and an inorganic insulating film 205a is formed. As the conductive material, the interlayer insulating film is formed of, for example, a wiring 207b made of copper and a connection plug 207a made of copper for connecting the lower layer wiring 201 and the wiring 207b. Further, for example, titanium nitride is formed between the interlayer insulating film, the wiring 207b, and the connection plug 207a to protect the sidewalls from diffusing into the interlayer insulating film.

As the organic insulating films 202a and 204a, an organic insulating film having a low dielectric constant of 3 or less can be used. For example, PAE-2 (manufactured by Shumacher), HSG-R7 (manufactured by Hitachi Chemical), FLARE ( Organic polymers such as Aplied Signal Co., Ltd., BCB (Dow Chemical Co., Ltd.), SILK (Dow Chemical Co., Ltd.), Speed Film (manufactured by WL Gore Co., Ltd.) can be used. In this embodiment, SILK (made by Dow Chemical) was used. In this embodiment, the inorganic insulating film 203a includes a silicon nitride film and an inorganic insulating film.

A oxy oxide film was used for 205a, but is not limited to these materials. For example, an inorganic SOG film may be used. As the inorganic insulating film 205a, the strength may be satisfied with respect to the CMP process in the dual damascene process. By using the organic insulating film as the interlayer insulating film, it is possible to realize the low dielectric constant characteristic of the interlayer insulating film, and to reduce the capacitance generated between the lower layer wiring 201 and the wiring 207b. Furthermore, by using an inorganic insulating film as the interlayer insulating film, it is possible to enhance mechanical strength and heat resistance.

Next, the manufacturing method of the semiconductor element using the film formation system mentioned above is demonstrated.

First, as shown in Fig. 18A, the wafer W on which the lower layer wiring 201 is formed is prepared, and the wafer W is accommodated in the cassette C placed on the cassette mounting table 10. FIG. do. In the cassette mounting table, the wafer W before processing is extended from the wafer cassette CR via the wafer carrier 11 to the extension device EXT of the first processing device group 70 on the processing station 3 side ( It is returned within 74). In the processing station 3, the nitrogen gas of the gas supply source 158 is supplied from the supply port 157 to provide a low oxygen atmosphere. The wafer W is transported between various devices to be described later in a low oxygen atmosphere. As a result, it is possible to prevent the coating film coated on the wafer W from being intentionally reacted with oxygen and oxidized.

The wafer W conveyed to the delivery table in the extension device EXT 74 is, for example, the cooling device COL of the second processing device group 80 via the first transport device 50 ( 81). In the cooling device COL, for example, the wafer W is cooled to around 23 ° C (S1).

The wafer W cooled by the cooling device COL is conveyed to the organic insulating film coating device COT 23 of the first coating device group 20 via the first conveying device 50. In the organic insulating film coating apparatus (COT) 23, for example, an organic insulating film material having a thickness of about 200 nm to 500 nm, more preferably about 300 nm is applied onto the wafer W by spin coating ( S2). As a result, as shown in FIG. 18B, the lower layer wiring on the wafer W

An organic insulating film 201 is formed by covering 201. Here, SILK was used as the organic insulating film material.

The wafer W on which the organic insulating film material is applied in the organic insulating film coating apparatus (COT) 23 is passed through the first conveying apparatus 50, and the low temperature heat treatment apparatus (LHP) of the first processing apparatus group 70 is provided.

It is returned to 77. In the low oxygen atmosphere in the low temperature heat treatment apparatus (LHP) 77, for example, the wafer W is subjected to low temperature heat treatment for about 60 seconds around 150 ° C (S3).

The wafer W subjected to low temperature heat treatment by the low temperature heat treatment apparatus (LHP) 77 is conveyed to the low oxygen high temperature heat treatment apparatus (OHP) 75 of the first processing apparatus group 70 via the first conveyance apparatus 50. It is done. In the low oxygen atmosphere in the low oxygen high temperature heat treatment apparatus (OHP) 75, for example, the wafer W is subjected to high temperature heat treatment for about 60 seconds before and after 200 ° C. Moreover, the wafer W subjected to high temperature heating in the low oxygen high temperature heating apparatus (JOHP) 75 is another low oxygen high temperature heating apparatus (OHP) 72 set to a higher temperature via the first conveying apparatus 50. Is returned. In the low oxygen atmosphere in the low oxygen high temperature heat treatment apparatus (OHP) 72, for example, in a 100 ppm oxygen atmosphere, the wafer W is subjected to high temperature heat treatment for about 60 seconds before and after 350 ° C (S4).

The wafer W subjected to the high temperature heat treatment in the low oxygen high temperature heat treatment apparatus (OHP) 72 is subjected to the low oxygen cure / cooling treatment apparatus (DCC) of the first processing apparatus group 70 via the first conveying apparatus 50. 76). In the low oxygen atmosphere in the low oxygen cure / cooling apparatus (DCC) 76, the wafer W is subjected to high temperature heat treatment for about 60 seconds before and after 450 ° C., and then cooled around 23 ° C. (S5).

The wafer W processed by the low oxygen cure cooling device (DCC) 76 is, for example, a cooling device (COL) 82 of the second processing device group via the first conveying device 50. Is returned. In the cooling device (COL) 82, the wafer W is cooled to around 23 ° C.

(S6).

The wafer W cooled by the cooling device (COL) 82 is transferred to the inorganic insulating film coating device (COT) 21 of the first coating device group 20 via the first conveying device 50. It is done. In the inorganic insulating film coating apparatus (COT) 21, for example, an inorganic insulating film material having a thickness of about 300 nm to 1100 nm, more preferably about 700 nm is coated on the wafer W (S7). As a result, as shown in FIG. 18C, an inorganic insulating film 203 is formed on the organic insulating film 202. Nanoglass was used here as the inorganic insulating film material.

The wafer W coated with the inorganic insulating film material on the inorganic insulating film coating device (COT) 21 is transferred to the aging processing apparatus (DAC) 76 of the first processing apparatus group via the first conveying apparatus 50. It is done. In the aging apparatus (DAC) 76, a (NH ₃ + H ₂ O) gas is introduced into the processing chamber to age the wafer W, and the inorganic insulating film material on the wafer W is gelled. (S8).

The wafer W that has been aged by the aging apparatus (DAC) 76 is a chemical liquid coating apparatus (DSE) for exchange in the first coating apparatus group 20 via the first conveying apparatus 50 (25). Is returned. In the chemical liquid applying apparatus (DSE) 25 for an exchange, the chemical liquid for an exchange is supplied on the wafer W, and the process of replacing the solvent in the insulating film apply | coated on the wafer with another solvent is performed (S9).

The wafer W subjected to the substitution treatment in the chemical liquid coating apparatus (DES) 25 for exchange is a low-temperature heating apparatus of the first processing apparatus group via the first conveying apparatus 50.

(LHP) 77 is conveyed. In the low oxygen atmosphere in the low temperature heat treatment apparatus (LHP) 77, the wafer W is subjected to low temperature heat treatment, for example, at about 175 ° C for about 60 seconds (S10).

The wafer W subjected to low temperature heat treatment in the low temperature heat treatment apparatus (LHP) 77 is conveyed to the low oxygen high temperature heat treatment apparatus (OHP) 75 via the first transfer apparatus 50. In the low oxygen atmosphere in the low oxygen high temperature heat treatment apparatus (OHP) 75, for example, the wafer W is subjected to high temperature heat treatment for about 60 seconds before and after 310 ° C. (S11). In the low temperature heat treatment apparatus (LHP) 77 and the low oxygen high temperature heat treatment apparatus (OHP) 75, the solvent is evaporated by heat treatment.

The wafer W subjected to the high temperature heat treatment in the low oxygen high temperature heat treatment apparatus (OHP) 75 is conveyed to the low oxygen cure cooling apparatus (DCC) 78 via the first conveying apparatus 50. In the low oxygen atmosphere in the low oxygen cure cooling apparatus (DCC) 78, for example, the wafer W is subjected to high temperature heat treatment for about 60 seconds before and after 450 占 폚, and then cooled around 23 占 폚 (S12).

The wafer W processed by the low oxygen cure / cooling device (DCC) 78 is, for example, a cooling device (COL) of the second processing device group 80 via the first conveying device 50. Returned to (85). In the cooling device (COL) 85, for example, the wafer W is cooled to around 23 ° C (S13).

The wafer W cooled by the cooling device (COL) 85 is transferred to the organic insulating film coating device (COT) 23 of the first coating device group 20 via the first conveying device 50. It is done. In the organic insulating film coating apparatus (COT) 23, for example, on the wafer W, an organic insulating film material having a thickness of about 200 nm to 500 nm and more preferably about 300 nm is coated by spin coating (S14). As a result, an organic insulating film 204 is formed on the inorganic insulating film 203, as shown in Fig. 18 (d). Here, SILK was used as the organic insulating film material.

The wafer W on which the organic insulating film material is applied in the organic insulating film coating apparatus (COT) 23 is passed through the first conveying apparatus 50, and the low temperature heat treatment apparatus (LHP) of the first processing apparatus group 70 (77). Is returned. In the low oxygen atmosphere in the low temperature heat treatment apparatus (LHP) 77, for example, the wafer W is subjected to low temperature heat treatment at about 150 ° C. for about 60 seconds (S15).

The wafer W subjected to low temperature heat treatment in the low temperature heat treatment apparatus (LHP) 77 is transferred to the low oxygen high temperature heat treatment apparatus (OHP) 75 of the first processing apparatus group 70 via the first conveying apparatus 50. Is returned. In the low oxygen atmosphere in the low oxygen high temperature heat treatment apparatus (OHP) 75, for example, the wafer W is subjected to high temperature heat treatment for about 60 seconds at about 200 ° C.

Furthermore, the wafer W subjected to the high temperature heating in the low oxygen high temperature heat treatment apparatus (OHP) 75 is set to another high temperature via the first conveying apparatus 50. Is returned. In the low oxygen atmosphere in the low oxygen high temperature heat treatment apparatus (OHP) 72, the wafer W is subjected to high temperature heat treatment for about 60 seconds at about 350 ° C (S16).

The wafer W subjected to the high temperature heat treatment in the low oxygen high temperature heat treatment apparatus (OHP) 72 is the low oxygen cure / cooling apparatus (DCC) of the first processing apparatus group 70 via the first conveying apparatus 50. 76). In the low oxygen atmosphere in the low oxygen cure cooling apparatus (DCC) 76, the wafer W is subjected to high temperature heat treatment for about 60 seconds at about 450 ° C, and then cooled at about 23 ° C (S17).

The wafer W processed by the low oxygen cure cooling device (DCC) is conveyed to, for example, a cooling device (COL) 82 of the second processing device group via the first transport device 50. . In the cooling device (COL) 82, the wafer W is cooled to about 23 ° C. (S18).

The wafer W cooled by the cooling device COL is conveyed to the inorganic insulating film coating device (COT) 21 of the first coating device group 20 via the first conveying device 50. In the inorganic insulating film coating apparatus (COT) 21, for example, an inorganic insulating film material having a thickness of about 300 nm to 1100 nm, and more preferably about 700 nm is coated on the wafer W (S19). As a result, as shown in Fig. 18E, an inorganic insulating film 205 is formed on the organic insulating film 204, and an organic insulating film and an inorganic insulating film are stacked on the lower layer wiring 201 of the wafer W. An interlayer insulating film is formed. Nanoglass was used here as the inorganic insulating film material.

The wafer W on which the inorganic insulating film material is applied by the inorganic insulating film coating device (COT) 21 is transferred to the aging processing device (DAC) 76 of the first processing device group via the first conveying device 50. It is done. In the aging apparatus (DAC) 76, the wafer W is aged by introducing (NH ₃ + H ₂ O) gas into the processing chamber to gel the inorganic insulating material of the wafer W. (S20).

The wafer W that has been aged by the aging apparatus (DAC) 76 is a chemical liquid coating apparatus (DSE) for exchange of the first coating apparatus 20 via the first conveying apparatus 50.

It is returned to (25). In the chemical liquid applying apparatus 25 for an exchange, the chemical liquid for an exchange is supplied on the wafer W, and the process of replacing the solvent in the insulating film apply | coated on the wafer with another solvent is performed (S21).

The wafer W subjected to the substitution treatment in the chemical liquid coating apparatus (DSE) 25 for exchange is transferred to the low temperature heat treatment apparatus (LHP) 77 of the first processing apparatus group via the first conveying apparatus 50. Is returned. In the low oxygen atmosphere in the low temperature heat treatment apparatus (LHP) 77, the wafer W is subjected to low temperature heat treatment, for example, at about 175 ° C for about 60 seconds (S22).

The wafer W subjected to low temperature heating in the low temperature heat treatment apparatus (LHP) 77 is conveyed to the low oxygen high temperature heat treatment apparatus (OHP) 75 via the first conveying apparatus 50. Then, in the low oxygen atmosphere in the low oxygen high temperature heat treatment apparatus (OHP) 75, the wafer 9 is subjected to high temperature heat treatment at about 310 ° C. for about 60 seconds (S23).

The wafer W subjected to the high temperature heat treatment in the low oxygen high temperature heat treatment apparatus (OHP) 75 is conveyed to the low oxygen cure / cooling apparatus (DCC) 78 via the first conveying apparatus 50. In the low oxygen atmosphere in the low oxygen cure / cooling apparatus (DCC) 78, for example, the wafer W is heated at about 450 ° C for about 60 seconds, and then cooled at about 23 ° C (S24).

The wafer W processed by the low oxygen cure / cooling apparatus (DCC) 78 is, for example, cooled to the second processing apparatus group 80 via the first conveying apparatus 50 (COL) ( 85). In the cooling device (COL) 85, for example, the wafer W is cooled to about 23 ° C (S25).

The wafer W cooled by the cooling device (COL) 85 is transferred to the resist coating device (COT) 22 of the first coating device group 20 via the first conveying device 50. Lose. Then, a resist film is formed in the resist coating apparatus (COT) 22 (S26). As the resist film, for example, an acetal resist can be used.

The wafer W on which the resist film is formed is then conveyed to the delivery table 40 in a state of being held in the pinset 57 on the upper side of the first conveying apparatus 50.

The wafer W conveyed to the transfer table 40 is held in the tweezers 68 of the second conveying apparatus 60, and this time, for example, the prebaking processing apparatus PREBAKE of the third processing apparatus group 100. It carries in into (101), and predetermined | prescribed heat processing is performed (S27).

The wafer W after the end of the associated heat treatment is conveyed to the cooling apparatus (COL) 86 of the second processing apparatus group 80 in the state of being held in the tweezers 68 of the second conveying apparatus, whereby the cooling treatment is performed. (S28). The wafer W after the cooling process is completed in the cooling device (COL) 86 is then carried into the extension device (EXT) 84 of the second processing device group 80 and waits there.

Next, the wafer W is carried into the extension apparatus EXT 84 by the carrier body 110, and is conveyed to the peripheral exposure apparatus 112. In the peripheral exposure apparatus 112, an unnecessary resist film of the peripheral portion is removed (S29). Then, the wafer W is conveyed to the exposure apparatus 4, and predetermined | prescribed exposure process is performed (S30).

The wafer W whose pattern has been exposed in the exposure apparatus 4 is transferred from the wafer carrier 110 to the second heat treatment apparatus group 100, carried in the post exposure baking apparatus (PEB) 103, and heated. Is performed (S31).

Next, the wafer W is held in the tweezers 68 of the second conveying apparatus 60 and carried into the cooling apparatus (COL) 87 of the second processing apparatus group 80 to be subjected to cooling treatment (S32). ).

The wafer W after the predetermined cooling process is completed in the cooling device (COL) 87 is held in the tweezers 58 of the first transfer device 50 and is transferred to the transfer table 40. Thereafter, the wafer W is carried from the transfer table 40 to the development processing apparatus (DEV) 31 of the second coating device group in the state held in the tweezers 68 to perform a predetermined development process. It is lost (S33). For this reason, the resist pattern of a predetermined shape is formed. As the developing solution, TMAH (tetramethyl ammonium hydrookiside) was used.

In the state where the related development process is completed, the wafer W is held in the tweezers 67 of the second transfer device 60, for example, the post-baking device POBAKE of the third processing device group 100.

It carries in to 105 and heat processing after a developing process is performed (S34).

In the post-baking apparatus (POBAKE) 105, the wafer W after heat processing is conveyed to the delivery stand 40 in the state hold | maintained by the tweezers 67 of the 2nd conveying apparatus 60. As shown in FIG.

The wafer W conveyed to the delivery table 40 is then held by the tweezers 58 of the first conveying apparatus 50, for example, the cooling apparatus COL 88 of the second processing apparatus group 80. Is returned. In this cooling device (COL) 88, the wafer W is actively cooled to a predetermined temperature (S35).

Thereafter, the wafer W cooled by the cooling device (COL) 88 is carried into the extension device 74, for example, of the first processing device group 70 via the first transport device 50. And wait there. And it is conveyed to the wafer carrier 11 from the extension apparatus 74, and is accommodated in the cassette C on the cassette mounting stand 10. As shown in FIG.

Thereafter, the wafer W is etched from the organic insulating film 204 and the inorganic insulating film 205 by a dry etching process using a resist pattern as a mask by an etching apparatus (not shown). For this reason, it is possible to form the organic insulating film pattern 204a and the inorganic insulating film pattern 205a in which the recessed part 210 corresponded to wiring was formed. Here, for example, etching was performed using CF ₄ gas (S36). After the etching treatment, the resist pattern is peeled off.

The wafer W subjected to the etching treatment and resist pattern peeling is again stored in the cassette C on the cassette placing table 10. The wafer W accommodated is a wafer carrier

It conveys to the extension apparatus EXT 74 of the 1st processing apparatus group 70 via (11).

The wafer W conveyed to the transfer table in the extension apparatus (EXT) 74 is conveyed into the cooling apparatus (COL) 85 of the second processing apparatus group 80 via the first conveying apparatus 50. It is done. In the cooling device COL, for example, the wafer W is cooled to about 23 ° C (S37).

The wafer W cooled by the cooling device (COL) 85 is conveyed to the resist coating device (COT) 24 of the first coating device group 20 via the first conveying path 50. . In the resist coating device (COT) 24, a resist film is formed (S28). As the resist film, it is possible to use an acetal resist.

The wafer W on which the resist film is formed is then conveyed to the transfer table 40 in the state held by the tweezers 57 on the upper side of the first conveying apparatus 50.

The wafer W conveyed to the transfer table 40 is held in the tweezers 68 of the second conveying apparatus 60, and this time, the prebaking processing apparatus PREBAKE 102 of the third processing apparatus group 100 is provided. ), And a predetermined heat treatment is performed (S39).

The wafer W after the completion of the related heat treatment is conveyed to the cooling apparatus (COL) 86 of the second processing apparatus group 80 in the state of being held by the tweezers 68 of the second conveying apparatus, and the cooling treatment is performed. (S40). The wafer W after the cooling process is completed in the cooling device COL 86 is then carried into the extension device EXT 84 of the second processing device group 80 and waits there.

Next, the wafer W is carried out from the extension apparatus EXT 84 by the wafer carrier 110, and is conveyed to the peripheral exposure apparatus 112. In the peripheral exposure apparatus 112, the unnecessary resist film in the peripheral portion is removed (S41). Then, the wafer W is conveyed to the exposure apparatus 4, and predetermined | prescribed exposure process is performed (S42).

The wafer W whose pattern has been exposed by the exposure apparatus 4 is transferred from the wafer carrier 110 to the second heat treatment apparatus group 100, carried in the post exposure baking apparatus (PEB) 104, and heated. Is performed (S43).

Next, the wafer W is held in the tweezers 68 of the second conveying apparatus 60 and carried into the cooling apparatus (COL) 87 of the second processing apparatus group 80 to be subjected to cooling treatment (S32). ).

The wafer W in which the predetermined cooling process is completed in this cooling device (COL) 87 is held in the tweezers 58 of the first transfer device 50 and transferred to the transfer table 40. Thereafter, the wafer W is brought into the second coating device group, for example, the developing device (DEV) 33, from the transfer table 40 in the state of being held in the tweezers 68 to perform a predetermined development process. It is lost (S45). For this reason, the resist pattern of a predetermined shape is formed. Here, TMAH was used as the developing solution.

The wafer W on which the related development process is completed is, for example, a post-baking apparatus (POBAKE) 106 of the third processing apparatus group 100 in a state of being held in the tweezers 67 of the second conveying apparatus 60. It carries in, and heat-processing after image development is performed (S46).

In the post-baking apparatus (POBAKE) 106, the wafer W after the heat treatment is finished is conveyed to the transfer table 40 in the state of being preserved in the tweezers 67 of the second conveying apparatus 60.

The wafer W conveyed to the delivery table 40 is then held by the tweezers 58 of the first conveying apparatus 50 and conveyed to the cooling apparatus COL 88 of the second processing apparatus group 80. It is done. In this cooling device (COL) 88, the wafer W is actively cooled to a predetermined temperature (S47).

Thereafter, the wafer W cooled by the cooling device (COL) 88 is carried into the extension device 74 of the first processing device group 70 via the first transfer device 50 and is there. Wait at And it is conveyed to the wafer carrier 11 from the extension apparatus 74, and is accommodated in the cassette C on the cassette mounting stand 10. As shown in FIG.

Thereafter, the wafer W is etched by the organic insulating film 202 and the inorganic insulating film 203 by a dry etching process using a resist pattern as a mask by an etching apparatus (not shown) as shown in Fig. 19B. It is possible to form the organic insulating film pattern 202a and the inorganic insulating film pattern 203a on which the recesses 211 corresponding to the connection plugs are formed.

Here, the etching process was performed using CF4 gas, for example (S48).

Subsequently, as shown in FIG. 19 (c), the plasma (CVD) apparatus (not shown) diffuses and spreads on the inner side walls of the recess 210 corresponding to the wiring and the recess 211 corresponding to the connection plug. Titanium nitride (TiN) for sidewall protection is formed for prevention. As the sidewall protection film, it is possible to use Ti, TiW, Ta, Tan, WSiN and the like in addition to TiN.

Next, as shown in Fig. 19D, copper 207 is provided inside the recess 210 corresponding to the wiring and the recess 211 corresponding to the connection plug, for example, using electrolytic plating. Put it in. Thereafter, the copper of the surface portion of the inorganic insulating film 205a or less below the recessed portion is polished by the CMP apparatus, leaving copper only in the groove to form the wiring 207b and the connecting plug 207a. As a result, the semiconductor element 200 is formed.

As described above, in the film forming system 1 of the present embodiment, both the organic insulating film and the inorganic insulating film are formed by spin coating, so that each film forming process can be performed in the same film forming system 1. Furthermore, in the manufacture of semiconductor devices subjected to the dual damascene process, in addition to the formation of an interlayer insulating film composed of an organic insulating film and an inorganic insulating film, a resist coating process is also formed by spin coating, so that each processing is performed in the same film forming system 1. It is possible to do in For this reason, it is possible to greatly reduce the manufacturing apparatus cost used for manufacture of the semiconductor element which passed the dual-machine process, without newly installing a CVD apparatus etc. for forming an inorganic insulating film.

In the above-described embodiment, in the low temperature heat treatment apparatus (LHP) and the low oxygen high temperature heat treatment apparatus (OHP) for evaporating the solvent in the coating film at the time of forming the inorganic insulating film, the heat treatment is performed in a low oxygen atmosphere so that the wafer W The coated film on the) phase can be prevented from reacting with oxygen and oxidizing. In addition, since it is stored in a low oxygen atmosphere in the processing station 3, the coating film is oxidized during the transfer between the devices from the heat treatment for evaporating the solvent to the heat treatment in the low oxygen cure / cooling apparatus (DCC). What is done is suppressed. As a result, the heat treatment in the low oxygen cure cooling apparatus (DCC) is appropriately performed to reduce insulation defects and the like, thereby improving the ratio.

In addition to the above-described configuration, in the developer coating step, the developer may be supplied by spin coating.

In addition, although the dual embodiment machine method was demonstrated as an example in the above-mentioned embodiment, it cannot be overemphasized that it is applicable also to the single substitute machine method.

For example, the substrate to be processed is not limited to the semiconductor wafer but may be another one such as an LCD substrate.

As described above, according to the present invention, it is possible to simplify the process when forming a two-layer structure of an insulating film and a hard mask layer without interposing a CVD apparatus.

In addition, it is possible to remarkably simplify these film forming processes without having to transport the substrate to another apparatus, and it is possible to form an insulating film and a hard mask layer very quickly.

According to this invention, it is possible to make the said process chamber into a low oxygen atmosphere as needed. Therefore, the substrate carried in the processing chamber can be heat-treated in a low oxygen atmosphere. As a result, the coating film applied to the substrate in the coating apparatus is prevented from reacting with oxygen and oxidizing.

According to the present invention, an apparatus called a CVD apparatus is unnecessary, and the manufacturing apparatus cost can be greatly reduced. In addition, it is possible to form an insulating film having good low dielectric constant and good adhesion between the organic insulating film and the inorganic insulating film.

Claims (30)

In the film forming method, Supplying a first coating liquid on a substrate to form a first coating film, and It has a process of supplying a 2nd coating liquid on a 1st coating film, and forming a 2nd coating film, At least one of the said 1st coating film and a 2nd coating film is an inorganic film, The film-forming method characterized by the above-mentioned. The method according to claim 1, wherein the first coating film is an organic film, and the second coating film is an inorganic film. 3. The film forming method according to claim 2, wherein the first coating film is a low dielectric constant film. The film forming method according to claim 1, wherein the first coating film and the second coating film are formed by a spin coating method. The film forming method according to claim 1, further comprising a step of curing the first coating film and the second coating film after forming the first coating film and the second coating film. The film forming method according to claim 1, wherein the first coating film is formed under a low oxygen atmosphere. The film forming method according to claim 1, wherein the second coating film is formed under a low oxygen atmosphere. Spin coating the organic insulating film material on the substrate to form an organic insulating film; Forming an inorganic insulating film by applying an inorganic insulating film material by spin coating on the applied organic insulating film material; Forming a recess by patterning the organic insulating film and the inorganic insulating film using a photolithography method; And a step of forming a conductive layer by inserting a conductive material into the concave portion. The method of claim 8, wherein the photolithography method, Forming a resist film on the inorganic insulating film by spin coating; Exposing the resist film to light; Developing a developer by coating the developer on the exposed resist film to form a resist pattern; And a step of forming the recess by etching the organic insulating film and the inorganic insulating film using a resist pattern as a mask. Forming a first organic insulating film obtained by spin coating an organic insulating film material on a substrate; Forming a second inorganic insulating film by spin coating an inorganic insulating film material on the applied organic insulating film material; Spin coating the organic insulating film material on the substrate to form a third organic insulating film; Applying an inorganic insulating film material on the applied organic insulating film material by spin coating to form a fourth inorganic insulating film; Forming a first concave by patterning the third organic insulating film and the fourth inorganic insulating film using a photolithography method; Forming a second concave by patterning the first organic insulating film and the second inorganic insulating film using a photolithography method; And forming a conductive layer by inserting a conductive material into the first concave portion and the second concave portion. The photolithography method according to claim 10, wherein the photolithography method for forming the first recessed portion is Forming a resist film on the fourth inorganic insulating film by spin coating; Exposing the resist film; Developing by applying a developer onto the exposed resist film to form a first resist pattern; Using a first resist pattern as a mask to check the third organic insulating film and the fourth inorganic insulating film to form a first concave portion, The photolithography method for forming the second recessed portion includes the steps of forming a resist film on the second inorganic insulating film by spin coating; Exposing the resist film; Developing by applying a developer by spin coating on the exposed resist film to form a second resist pattern; And forming the second recessed portion by checking the first organic insulating film and the second inorganic insulating film using the second resist pattern as a mask. 9. The film forming method according to claim 8, wherein a conductive layer is formed on the substrate. The method of claim 12, wherein the substrate is a semiconductor substrate. In a film forming system, A first coating device for coating the first insulating film material on the substrate; A second coating device for coating a second insulating film material on the first coating film, And the first insulating film material or the second insulating film material is an inorganic insulating film material. 15. The film forming system according to claim 14, wherein the first insulating film material and the second insulating film material are applied by spin coating. 15. The apparatus of claim 14, further comprising: a heat treatment apparatus for performing heat treatment on the substrate on which the first insulating film material is applied; And a heat treatment apparatus for applying heat treatment to the substrate on which the second insulating film material is applied. The film forming system according to claim 14, further comprising a third coating device for applying a resist material on the applied second insulating film material. 18. The film forming system according to claim 17, wherein the resist material is applied by spin coating. 18. The film forming system according to claim 17, further comprising a fourth coating device for applying the developer onto the exposed resist material after the resist material has been exposed. In a film forming system, A coating apparatus for supplying a coating liquid to the substrate to form a coating film; A first heating device for evaporating the solvent component from the applied coating liquid, A second heating device for heat-treating the substrate on which the solvent component is evaporated in the first heating device; It has a transfer unit for transferring the substrate between the first heating device and the second heating device, A film forming system, wherein the processing chamber of the first heating apparatus can be set to a lower oxygen atmosphere than the atmosphere. 21. The film forming system according to claim 20, wherein the coating liquid is applied by spin coating. The gas heater of claim 20, wherein the first heating device comprises: gas supply means for supplying gas to the room; And an exhaust means for exhausting the atmosphere in the processing chamber. The said processing chamber of the said 1st heating apparatus is comprised so that airtightness maintenance is possible, And said first heating device has exhaust means for depressurizing the inside of said processing chamber. In a film forming system, A coating apparatus for supplying a coating liquid to the substrate to form a coating film; A first heating device for evaporating the solvent component with the applied coating liquid, A second heating device for heat-treating the substrate on which the solvent component is evaporated in the heating device; A transfer part for transferring the substrate between the first heater and the second heater, The area | region in which the said 2nd heating apparatus and the said transmission part are arrange | positioned can be set in the oxygen atmosphere lower than air | atmosphere. The method of claim 24, wherein the area, the atmosphere is blocked by the trimmer plate and the other area, And gas supply means for supplying gas into the region, and exhaust means for exhausting the atmosphere in the region. 26. The method according to claim 25, wherein the trimming plate has a carry-out port for carrying in and carrying out the substrate in the region, The inlet and outlet is a film forming system, characterized in that the opening and closing free. In a film forming system, A coating device for supplying a coating liquid to the substrate to form a coating film; A first heating device for evaporating the solvent component from the applied coating liquid, A second heating device for heat-treating the substrate on which the solvent component is evaporated in the heating device; A transfer part for transferring a substrate between the first heating device and the second heating device, The area | region where the said 2nd heating apparatus and the said transmission part are arrange | positioned, and the inside of the process chamber of a said 1st heating apparatus can be set to a lower oxygen atmosphere than air | atmosphere. 28. The apparatus of claim 27, wherein the first heating device has gas supply means for supplying gas into the processing chamber, and exhaust means for exhausting the atmosphere in the processing chamber, The area is cut off from the atmosphere by a trimming plate from other areas, And a gas supply means for supplying a gas into the region, and an exhaust means for exhausting the atmosphere in the region. The process chamber according to claim 27, wherein the processing chamber of the first heating apparatus is configured to maintain airtightness, The first heating device has exhaust means for reducing the pressure inside the processing chamber, The area is cut off from the other areas by the trimming plate, And a gas supply means for supplying gas into the region, and an exhaust means for exhausting the atmosphere in the region. 29. The method according to claim 28, wherein the trimming plate has a carry-out port for carrying in and carrying out the substrate in the region, The inlet / outlet is a film forming system, characterized in that the opening and closing free.