KR20000076338A - 글로우 플라즈마 방전 장치 - Google Patents
글로우 플라즈마 방전 장치 Download PDFInfo
- Publication number
- KR20000076338A KR20000076338A KR1019997008439A KR19997008439A KR20000076338A KR 20000076338 A KR20000076338 A KR 20000076338A KR 1019997008439 A KR1019997008439 A KR 1019997008439A KR 19997008439 A KR19997008439 A KR 19997008439A KR 20000076338 A KR20000076338 A KR 20000076338A
- Authority
- KR
- South Korea
- Prior art keywords
- dielectric
- electrodes
- glow
- porous dielectric
- porous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 230000007704 transition Effects 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 25
- 230000005684 electric field Effects 0.000 claims description 13
- 230000000087 stabilizing effect Effects 0.000 claims description 11
- 239000003989 dielectric material Substances 0.000 claims description 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims 2
- 210000002381 plasma Anatomy 0.000 description 37
- 239000000463 material Substances 0.000 description 11
- 239000007789 gas Substances 0.000 description 10
- 239000011148 porous material Substances 0.000 description 8
- 230000002401 inhibitory effect Effects 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 238000010891 electric arc Methods 0.000 description 6
- 238000002485 combustion reaction Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000001307 helium Substances 0.000 description 4
- 229910052734 helium Inorganic materials 0.000 description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 230000006641 stabilisation Effects 0.000 description 4
- 238000011105 stabilization Methods 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000012300 argon atmosphere Substances 0.000 description 3
- 239000000446 fuel Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000000608 laser ablation Methods 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
- H01J37/32036—AC powered
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32559—Protection means, e.g. coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/4697—Generating plasma using glow discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/0203—Protection arrangements
- H01J2237/0206—Extinguishing, preventing or controlling unwanted discharges
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Power Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US8/820,013 | 1997-03-18 | ||
| US08/820,013 US5872426A (en) | 1997-03-18 | 1997-03-18 | Glow plasma discharge device having electrode covered with perforated dielectric |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20000076338A true KR20000076338A (ko) | 2000-12-26 |
Family
ID=25229669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019997008439A Abandoned KR20000076338A (ko) | 1997-03-18 | 1998-03-17 | 글로우 플라즈마 방전 장치 |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US5872426A (enExample) |
| EP (1) | EP1012863B1 (enExample) |
| JP (1) | JP2001527689A (enExample) |
| KR (1) | KR20000076338A (enExample) |
| AT (1) | ATE229227T1 (enExample) |
| AU (1) | AU720025B2 (enExample) |
| CA (1) | CA2284242C (enExample) |
| DE (1) | DE69809943T2 (enExample) |
| WO (1) | WO1998042002A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100530765B1 (ko) * | 2002-10-04 | 2005-11-23 | 이규왕 | 나노 다공성 유전체를 이용한 플라즈마 발생장치 |
Families Citing this family (74)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6198762B1 (en) * | 1996-09-26 | 2001-03-06 | Yuri Krasnov | Supersonic and subsonic laser with RF discharge excitation |
| US6636545B2 (en) * | 1996-09-26 | 2003-10-21 | Alexander V. Krasnov | Supersonic and subsonic laser with radio frequency excitation |
| US6879103B1 (en) * | 1997-03-18 | 2005-04-12 | The Trustees Of The Stevens Institute Of Technology | Glow plasma discharge device |
| US6900592B2 (en) * | 1997-03-18 | 2005-05-31 | The Trustees Of The Stevens Institute Of Technology | Method and apparatus for stabilizing of the glow plasma discharges |
| US6147452A (en) * | 1997-03-18 | 2000-11-14 | The Trustees Of The Stevens Institute Of Technology | AC glow plasma discharge device having an electrode covered with apertured dielectric |
| US6461870B2 (en) * | 1998-05-06 | 2002-10-08 | Isotechnika Inc. | 13C glucose breath test for the diagnosis of diabetic indications and monitoring glycemic control |
| US6309610B1 (en) * | 1998-05-27 | 2001-10-30 | Science Applications International Corporation | Non-thermal plasma apparatus utilizing dielectrically-coated electrodes for treating effluent gas |
| US6255777B1 (en) | 1998-07-01 | 2001-07-03 | Plasmion Corporation | Capillary electrode discharge plasma display panel device and method of fabricating the same |
| JP2002531695A (ja) * | 1998-12-01 | 2002-09-24 | エス ケー コーポレーション | 薄膜製造装置 |
| US6455014B1 (en) * | 1999-05-14 | 2002-09-24 | Mesosystems Technology, Inc. | Decontamination of fluids or objects contaminated with chemical or biological agents using a distributed plasma reactor |
| US6433480B1 (en) * | 1999-05-28 | 2002-08-13 | Old Dominion University | Direct current high-pressure glow discharges |
| US20020092616A1 (en) * | 1999-06-23 | 2002-07-18 | Seong I. Kim | Apparatus for plasma treatment using capillary electrode discharge plasma shower |
| US7029636B2 (en) * | 1999-12-15 | 2006-04-18 | Plasmasol Corporation | Electrode discharge, non-thermal plasma device (reactor) for the pre-treatment of combustion air |
| US6955794B2 (en) * | 1999-12-15 | 2005-10-18 | Plasmasol Corporation | Slot discharge non-thermal plasma apparatus and process for promoting chemical reaction |
| BR0016773A (pt) | 1999-12-15 | 2002-09-03 | Stevens Inst Technology | Aparelho de plasma não térmico de descarga capilar em eletrodo segmentado e processo para promover reações quìmicas. |
| US6923890B2 (en) | 1999-12-15 | 2005-08-02 | Plasmasol Corporation | Chemical processing using non-thermal discharge plasma |
| US7094322B1 (en) | 1999-12-15 | 2006-08-22 | Plasmasol Corporation Wall Township | Use of self-sustained atmospheric pressure plasma for the scattering and absorption of electromagnetic radiation |
| US7192553B2 (en) * | 1999-12-15 | 2007-03-20 | Plasmasol Corporation | In situ sterilization and decontamination system using a non-thermal plasma discharge |
| US6724608B2 (en) * | 2000-01-14 | 2004-04-20 | Paul Hensley | Method for plasma charging a probe |
| KR20000024528A (ko) * | 2000-02-18 | 2000-05-06 | 강정구 | Rf를 이용한 대기압 상온 플라즈마 토치 |
| KR100367132B1 (ko) * | 2000-04-27 | 2003-01-09 | 준 최 | 무전극 방전 장치 |
| US6548957B1 (en) * | 2000-05-15 | 2003-04-15 | Plasmion Displays Llc | Plasma display panel device having reduced turn-on voltage and increased UV-emission and method of manufacturing the same |
| AU2001296568A1 (en) * | 2000-10-04 | 2002-04-15 | Plasmion Displays, Llc | Method of fabricating plasma display panel using laser process |
| US6432280B1 (en) * | 2000-10-23 | 2002-08-13 | Pioneer Industrial Technologies, Inc. | Pollution control device |
| KR100430345B1 (ko) * | 2000-11-28 | 2004-05-04 | (주)에스이 플라즈마 | 대기압에서 저온 플라즈마를 발생시키는 장치 |
| KR100464902B1 (ko) * | 2001-02-12 | 2005-01-05 | (주)에스이 플라즈마 | 대기압에서 저온 플라즈마를 발생시키는 장치 |
| DE10108717C1 (de) * | 2001-02-23 | 2002-07-11 | Bosch Gmbh Robert | Vorrichtung und Verfahren zur Entladung von dielektrischen Oberflächen |
| US20020122896A1 (en) * | 2001-03-02 | 2002-09-05 | Skion Corporation | Capillary discharge plasma apparatus and method for surface treatment using the same |
| US20020139659A1 (en) * | 2001-04-03 | 2002-10-03 | Skion Corporation | Method and apparatus for sterilization of fluids using a continuous capillary discharge atmospheric pressure plasma shower |
| US20020148816A1 (en) * | 2001-04-17 | 2002-10-17 | Jung Chang Bo | Method and apparatus for fabricating printed circuit board using atmospheric pressure capillary discharge plasma shower |
| US20020187066A1 (en) * | 2001-06-07 | 2002-12-12 | Skion Corporation | Apparatus and method using capillary discharge plasma shower for sterilizing and disinfecting articles |
| AU2002354775A1 (en) * | 2001-07-02 | 2003-01-21 | Plasmasol Corporation | A novel electrode for use with atmospheric pressure plasma emitter apparatus and method for using the same |
| US20030015505A1 (en) * | 2001-07-19 | 2003-01-23 | Skion Corporation | Apparatus and method for sterilization of articles using capillary discharge atmospheric plasma |
| US20030104141A1 (en) * | 2001-08-27 | 2003-06-05 | Amato-Wierda Carmela C. | Dielectric barrier discharge process for depositing silicon nitride film on substrates |
| US20040050684A1 (en) * | 2001-11-02 | 2004-03-18 | Plasmasol Corporation | System and method for injection of an organic based reagent into weakly ionized gas to generate chemically active species |
| US20030106788A1 (en) * | 2001-11-02 | 2003-06-12 | Sergei Babko-Malyi | Non-thermal plasma slit discharge apparatus |
| US6841201B2 (en) * | 2001-12-21 | 2005-01-11 | The Procter & Gamble Company | Apparatus and method for treating a workpiece using plasma generated from microwave radiation |
| US6821379B2 (en) * | 2001-12-21 | 2004-11-23 | The Procter & Gamble Company | Portable apparatus and method for treating a workpiece |
| DE10203543B4 (de) * | 2002-01-29 | 2008-04-30 | Je Plasmaconsult Gmbh | Vorrichtung zur Erzeugung eines APG-Plasmas |
| US6919551B2 (en) * | 2002-08-29 | 2005-07-19 | Micron Technology Inc. | Differential column readout scheme for CMOS APS pixels |
| US20040073221A1 (en) * | 2002-10-11 | 2004-04-15 | Spineco, Inc., A Corporation Of Ohio | Electro-stimulation and medical delivery device |
| US7615070B2 (en) * | 2002-10-11 | 2009-11-10 | Spineco, Inc. | Electro-stimulation and medical delivery device |
| RU2237391C1 (ru) * | 2003-03-17 | 2004-09-27 | Камский государственный политехнический институт | Способ получения тлеющего разряда между жидким электролитным катодом и твердотельным анодом и устройство для его осуществления |
| ATE530242T1 (de) * | 2003-07-18 | 2011-11-15 | David Richard Hallam | Luftbehandlungsvorrichtung |
| EP1507281B1 (en) * | 2003-08-14 | 2007-05-16 | Fuji Film Manufacturing Europe B.V. | Arrangement, method and electrode for generating a plasma |
| US8070785B2 (en) | 2003-09-16 | 2011-12-06 | Spineco, Inc. | Bone anchor prosthesis and system |
| US20050205410A1 (en) * | 2004-01-22 | 2005-09-22 | Plasmasol Corporation | Capillary-in-ring electrode gas discharge generator for producing a weakly ionized gas and method for using the same |
| US20050196315A1 (en) * | 2004-01-22 | 2005-09-08 | Plasmasol Corporation | Modular sterilization system |
| JP4630874B2 (ja) * | 2004-01-30 | 2011-02-09 | チャンジョ エンジニアリング シーオー エルティディ | 大気圧大面積グロープラズマ発生装置 |
| RU2258329C1 (ru) * | 2004-05-06 | 2005-08-10 | Камский государственный политехнический институт | Электродный узел |
| US7572998B2 (en) * | 2004-05-28 | 2009-08-11 | Mohamed Abdel-Aleam H | Method and device for creating a micro plasma jet |
| US8502108B2 (en) * | 2004-05-28 | 2013-08-06 | Old Dominion University Research Foundation | Method and device for creating a micro plasma jet |
| US8471171B2 (en) * | 2004-05-28 | 2013-06-25 | Robert O. Price | Cold air atmospheric pressure micro plasma jet application method and device |
| EP1799134A4 (en) * | 2004-09-14 | 2011-03-09 | Spineco Inc | IMPLANT DEVICE |
| DE102004045804B4 (de) * | 2004-09-22 | 2006-07-27 | Roche Diagnostics Gmbh | Handgerät zum Entnehmen von Blut oder anderen Körperflüssigkeiten |
| US20070048176A1 (en) * | 2005-08-31 | 2007-03-01 | Plasmasol Corporation | Sterilizing and recharging apparatus for batteries, battery packs and battery powered devices |
| US20070104610A1 (en) * | 2005-11-01 | 2007-05-10 | Houston Edward J | Plasma sterilization system having improved plasma generator |
| US9681529B1 (en) * | 2006-01-06 | 2017-06-13 | The United States Of America As Represented By The Secretary Of The Air Force | Microwave adapting plasma torch module |
| US20100254868A1 (en) * | 2007-06-22 | 2010-10-07 | Carrier Corporation | Purification of a fluid using ozone with an adsorbent and/or a particle filter |
| EP2164609B1 (en) * | 2007-06-22 | 2018-08-29 | Carrier Corporation | A method and system for using an ozone generating device for air purification |
| RU2390108C2 (ru) * | 2007-12-03 | 2010-05-20 | Государственное образовательное учреждение высшего профессионального образования "Камская государственная инженерно-экономическая академия" | Способ зажигания тлеющего разряда между жидким электролитом и твердотельным электродом |
| RU2340978C1 (ru) * | 2007-12-06 | 2008-12-10 | Государственное образовательное учреждение высшего профессионального образования "Камская государственная инженерно-экономическая академия" | Электродный узел |
| CN102017056B (zh) * | 2008-05-02 | 2013-11-20 | 东电电子太阳能股份公司 | 用于衬底的等离子体处理的等离子体处理设备和方法 |
| US20090297409A1 (en) * | 2008-05-30 | 2009-12-03 | Buchanan Walter R | Discharge plasma reactor |
| US9120073B2 (en) * | 2009-06-05 | 2015-09-01 | Eon Labs, Llc | Distributed dielectric barrier discharge reactor |
| US12296313B2 (en) | 2015-10-01 | 2025-05-13 | Milton Roy, Llc | System and method for formulating medical treatment effluents |
| EP3356026B1 (en) | 2015-10-01 | 2022-11-09 | Milton Roy, LLC | Plasma reactor for liquid and gas |
| US11452982B2 (en) | 2015-10-01 | 2022-09-27 | Milton Roy, Llc | Reactor for liquid and gas and method of use |
| US10882021B2 (en) | 2015-10-01 | 2021-01-05 | Ion Inject Technology Llc | Plasma reactor for liquid and gas and method of use |
| US10187968B2 (en) | 2015-10-08 | 2019-01-22 | Ion Inject Technology Llc | Quasi-resonant plasma voltage generator |
| US10046300B2 (en) | 2015-12-09 | 2018-08-14 | Ion Inject Technology Llc | Membrane plasma reactor |
| US11095088B1 (en) | 2018-02-21 | 2021-08-17 | Zoyka Llc | Multi-pass coaxial molecular gas laser |
| CN112087857A (zh) * | 2019-06-12 | 2020-12-15 | 中国石油化工股份有限公司 | 电晕放电等离子体发生装置 |
| CN114205983B (zh) * | 2021-11-09 | 2024-05-14 | 中国人民解放军军事科学院国防工程研究院工程防护研究所 | 一种诊断等离子体电子密度的测量系统和方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3821588A (en) * | 1973-03-08 | 1974-06-28 | Burroughs Corp | Display panel having flat side edges to permit butting together plural panels |
| US3914642A (en) * | 1973-05-17 | 1975-10-21 | Northern Electric Co | Electrical luminescent display devices |
| GB1544172A (en) * | 1976-03-03 | 1979-04-11 | Int Plasma Corp | Gas plasma reactor and process |
| US4698551A (en) * | 1986-03-20 | 1987-10-06 | Laser Corporation Of America | Discharge electrode for a gas discharge device |
| JPH02101740A (ja) * | 1988-10-11 | 1990-04-13 | Anelva Corp | プラズマエッチング装置 |
| IT1246682B (it) * | 1991-03-04 | 1994-11-24 | Proel Tecnologie Spa | Dispositivo a catodo cavo non riscaldato per la generazione dinamica di plasma |
| US5248371A (en) * | 1992-08-13 | 1993-09-28 | General Signal Corporation | Hollow-anode glow discharge apparatus |
| DE4315075A1 (de) * | 1993-02-17 | 1994-11-10 | Fraunhofer Ges Forschung | Anordnung zur Plasmaerzeugung |
| US5414324A (en) * | 1993-05-28 | 1995-05-09 | The University Of Tennessee Research Corporation | One atmosphere, uniform glow discharge plasma |
| US5387842A (en) * | 1993-05-28 | 1995-02-07 | The University Of Tennessee Research Corp. | Steady-state, glow discharge plasma |
| AU679237B2 (en) * | 1993-05-28 | 1997-06-26 | University Of Tennessee Research Corporation, The | Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure |
| JPH08250488A (ja) * | 1995-01-13 | 1996-09-27 | Seiko Epson Corp | プラズマ処理装置及びその方法 |
-
1997
- 1997-03-18 US US08/820,013 patent/US5872426A/en not_active Expired - Lifetime
-
1998
- 1998-03-17 EP EP98910447A patent/EP1012863B1/en not_active Expired - Lifetime
- 1998-03-17 CA CA002284242A patent/CA2284242C/en not_active Expired - Fee Related
- 1998-03-17 KR KR1019997008439A patent/KR20000076338A/ko not_active Abandoned
- 1998-03-17 WO PCT/US1998/005174 patent/WO1998042002A1/en not_active Ceased
- 1998-03-17 AU AU64688/98A patent/AU720025B2/en not_active Ceased
- 1998-03-17 DE DE69809943T patent/DE69809943T2/de not_active Expired - Fee Related
- 1998-03-17 AT AT98910447T patent/ATE229227T1/de not_active IP Right Cessation
- 1998-03-17 JP JP54070498A patent/JP2001527689A/ja not_active Ceased
-
1999
- 1999-02-12 US US09/249,405 patent/US6005349A/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100530765B1 (ko) * | 2002-10-04 | 2005-11-23 | 이규왕 | 나노 다공성 유전체를 이용한 플라즈마 발생장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1012863A4 (en) | 2000-11-15 |
| WO1998042002A1 (en) | 1998-09-24 |
| US6005349A (en) | 1999-12-21 |
| CA2284242C (en) | 2006-12-12 |
| ATE229227T1 (de) | 2002-12-15 |
| JP2001527689A (ja) | 2001-12-25 |
| US5872426A (en) | 1999-02-16 |
| AU720025B2 (en) | 2000-05-18 |
| EP1012863B1 (en) | 2002-12-04 |
| AU6468898A (en) | 1998-10-12 |
| DE69809943D1 (de) | 2003-01-16 |
| HK1029222A1 (en) | 2001-03-23 |
| CA2284242A1 (en) | 1998-09-24 |
| DE69809943T2 (de) | 2003-07-17 |
| EP1012863A1 (en) | 2000-06-28 |
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