KR20000050282A - System for inspecting wafer stage - Google Patents

System for inspecting wafer stage Download PDF

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Publication number
KR20000050282A
KR20000050282A KR1019990000014A KR19990000014A KR20000050282A KR 20000050282 A KR20000050282 A KR 20000050282A KR 1019990000014 A KR1019990000014 A KR 1019990000014A KR 19990000014 A KR19990000014 A KR 19990000014A KR 20000050282 A KR20000050282 A KR 20000050282A
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KR
South Korea
Prior art keywords
wafer stage
scanner
wafer
processor
inspection system
Prior art date
Application number
KR1019990000014A
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Korean (ko)
Inventor
김영근
Original Assignee
윤종용
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 윤종용, 삼성전자 주식회사 filed Critical 윤종용
Priority to KR1019990000014A priority Critical patent/KR20000050282A/en
Publication of KR20000050282A publication Critical patent/KR20000050282A/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE: A testing system of a wafer stage is provided to prevent a defect of a wafer by testing the wafer stage in advance. CONSTITUTION: A testing system of a wafer stage comprises: a scanner; and a processor. The scanner irradiates beam to a surface of the wafer stage according as the wafer stage moves, being isolated from the upper surface of the wafer stage. The processor reads information from the scanner, and decides whether an impurity particle on the surface of the wafer stage exists.

Description

웨이퍼 스테이지의 검사 시스템 {System for inspecting wafer stage}System for inspecting wafer stage

본 발명은 웨이퍼 스테이지의 검사 시스템에 관한 것이다.The present invention relates to an inspection system of a wafer stage.

종래에는 웨이퍼 스테이지상에서 웨이퍼들을 처리한 후에 웨이퍼 스테이지의 표면을 검사하였다. 그러나 이 경우에는 웨이퍼 스테이지 표면의 불순물 입자를 검출하더라도, 이미 웨이퍼들의 불량이 발생된 상태이다.The surface of the wafer stage was conventionally inspected after processing the wafers on the wafer stage. In this case, however, even when the impurity particles on the surface of the wafer stage are detected, defects of the wafers have already occurred.

본 발명이 이루고자 하는 기술적 과제는 사전에 웨이퍼 스테이지를 검사하여 웨이퍼의 불량을 방지하는 웨이퍼 스테이지의 검사 시스템을 제공하는 것이다.The technical problem to be achieved by the present invention is to provide an inspection system for a wafer stage that inspects the wafer stage in advance to prevent wafer defects.

도 1은 본 발명에 따른 검사 시스템을 나타내 보인 블록도이다.1 is a block diagram showing an inspection system according to the present invention.

상기 기술적 과제를 달성하기 위하여, 본 발명에 따른 웨이퍼 스테이지의 검사 시스템은, 웨이퍼 스테이지의 상부에서 일정 간격으로 이격되어 설치되어서 상기 웨이퍼 스테이지가 이동함에 따라 상기 웨이퍼 스테이지의 표면으로 빔을 조사하는 스캐너; 및 상기 스캐너로부터의 정보를 판독하여 상기 웨이퍼 스테이지의 표면상의 불순물 입자의 유무를 판단하는 프로세서를 포함하는 것을 특징으로 한다.In order to achieve the above technical problem, the inspection system of the wafer stage according to the present invention, the scanner is provided spaced apart at regular intervals from the top of the wafer stage to irradiate a beam to the surface of the wafer stage as the wafer stage moves; And a processor that reads information from the scanner to determine the presence or absence of impurity particles on the surface of the wafer stage.

이하, 첨부 도면을 참조하여 본 발명의 바람직한 실시예를 상세히 설명한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

도 1을 참조하면, 본 발명에 따른 웨이퍼 스테이지의 검사 시스템(200)은 스캐너(210), 프로세서(220) 및 경고 표시부(230)를 포함하여 구성된다. 상기 스캐너(210)는 일종의 센서로서, 웨이퍼 스테이지(100)의 상부에서 일정 간격으로 이격되도록 설치된다. 그리고 웨이퍼 스테이지(100)가 이동함에 따라 웨이퍼 스테이지(100)의 표면으로 빔(도면에서 점선 화살표로 표시)을 조사하여 웨이퍼 스테이지(100)의 전 표면을 스캐닝한다. 스캐너(210)의 스캐닝 동작은 웨이퍼 스테이지(100)상에 웨이퍼(미도시)가 안착되기 이전에 이루어진다. 상기 프로세서(220)는 스캐너(210)로부터의 스캐닝 정보를 입력받고, 입력된 스캐닝 정보를 판독하여 웨이퍼 스테이지(100)의 표면상의 불순물 입자의 유무를 판단한다. 프로세서(220)에서 스캐닝 정보를 판독한 결과, 웨이퍼 스테이지(100)의 표면에 불순물 입자가 있는 경우에는 경고 표시 신호를 출력시킨다. 상기 경고 표시부(230)는 프로세서(220)로부터의 경고 표시 신호가 발생된 경우에만 동작하여 경고음 등을 발생시킨다.Referring to FIG. 1, an inspection system 200 of a wafer stage according to the present invention includes a scanner 210, a processor 220, and a warning display 230. The scanner 210 is a kind of sensor, and is installed to be spaced apart at a predetermined interval from the top of the wafer stage 100. As the wafer stage 100 moves, the entire surface of the wafer stage 100 is scanned by irradiating a beam (indicated by a dotted arrow in the drawing) to the surface of the wafer stage 100. The scanning operation of the scanner 210 is performed before the wafer (not shown) is seated on the wafer stage 100. The processor 220 receives scanning information from the scanner 210, reads the input scanning information, and determines whether impurities are present on the surface of the wafer stage 100. As a result of reading the scanning information by the processor 220, when there is impurity particles on the surface of the wafer stage 100, a warning display signal is output. The warning display unit 230 operates only when a warning display signal from the processor 220 is generated to generate a warning sound or the like.

이상의 설명에서와 같이, 본 발명에 따른 웨이퍼 스테이지의 검사 시스템 및 검사 방법에 의하면, 웨이퍼가 웨이퍼 스테이지상에 안착되기 전에 웨이퍼 스테이지의 표면상의 불순물 입자 유무를 검사함으로써 사전에 웨이퍼의 불량을 방지할 수 있는 이점이 있다.As described above, according to the inspection system and inspection method of the wafer stage according to the present invention, the defect of the wafer can be prevented in advance by inspecting the presence of impurity particles on the surface of the wafer stage before the wafer is seated on the wafer stage. There is an advantage to that.

Claims (1)

반도체 제조 장비내에서 웨이퍼가 안착되는 웨이퍼 스테이지를 검사하기 위한 검사 시스템에 있어서,An inspection system for inspecting a wafer stage on which a wafer is seated in a semiconductor manufacturing equipment, 상기 웨이퍼 스테이지의 상부에서 일정 간격으로 이격되어 설치되어서 상기 웨이퍼 스테이지가 이동함에 따라 상기 웨이퍼 스테이지의 표면으로 빔을 조사하는 스캐너; 및A scanner spaced apart at regular intervals from an upper portion of the wafer stage to irradiate a beam to a surface of the wafer stage as the wafer stage moves; And 상기 스캐너로부터의 정보를 판독하여 상기 웨이퍼 스테이지의 표면상의 불순물 입자의 유무를 판단하는 프로세서를 포함하는 것을 특징으로 하는 웨이퍼 스테이지의 검사 시스템.And a processor for reading information from the scanner to determine the presence or absence of impurity particles on the surface of the wafer stage.
KR1019990000014A 1999-01-02 1999-01-02 System for inspecting wafer stage KR20000050282A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019990000014A KR20000050282A (en) 1999-01-02 1999-01-02 System for inspecting wafer stage

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KR1019990000014A KR20000050282A (en) 1999-01-02 1999-01-02 System for inspecting wafer stage

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KR20000050282A true KR20000050282A (en) 2000-08-05

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112666311A (en) * 2020-12-08 2021-04-16 上海华力集成电路制造有限公司 Automatic monitoring system and method for defect scanning machine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112666311A (en) * 2020-12-08 2021-04-16 上海华力集成电路制造有限公司 Automatic monitoring system and method for defect scanning machine

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