KR19990054298A - Manufacturing Method of Plasma Display Panel - Google Patents

Abstract

The present invention relates to a plasma display panel, and more particularly, to a method of manufacturing a plasma display panel that can prevent damage to a transparent electrode. According to the present invention, first, a photosensitive film having a predetermined thickness is coated on a front substrate on which transparent electrodes are formed, and then exposed and developed to form a first photosensitive film pattern exposing only a transparent electrode portion on which a bus electrode is to be formed. Then, in a state where a metal laminate film is formed on the first photosensitive film pattern and the exposed transparent electrode, a photosensitive film having a predetermined thickness is again applied on the metal laminate film, and the metal laminate film of the predetermined area of the bus electrode is exposed and developed. A second photosensitive film pattern covering the portion is formed. Then, after performing a wet etching process using the second photoresist pattern as an etching mask to form a bus electrode on one side of the transparent electrode, the second photoresist pattern and the first photoresist pattern are removed with an alkaline solution.

Description

Manufacturing Method of Plasma Display Panel

The present invention relates to a plasma display panel, and more particularly, to a method of manufacturing a plasma display panel that can prevent damage to a transparent electrode.

Plasma Display Panel (PDP), which is one of the flat panel display devices, consists of an array of discharge cells that can be discharged independently, and discharges each discharge cell independently according to an electrical signal applied from the outside. The desired video signal is reproduced.

Since the overall thickness of the PDP can be less than 1 cm, the thickness and weight of the PDP can be remarkably reduced compared to the CRT display device using an electron gun. In addition, the narrow viewing angle of the liquid crystal display can be improved. Has

In addition, the PDP has a structure in which two light-transmitting substrates each having electrodes are bonded to each other. Barriers that interpose therebetween to define independent discharge spaces and suppress crosstalk between pixels are also provided. By constructing a wider space between the ribs, there is an advantage that a large display device can be easily manufactured.

1 is a cross-sectional view illustrating an AC PDP according to the related art, which defines an address electrode 2 to which data is transmitted and an independent discharge space, and prevents crosstalk between adjacent discharge cells. The back substrate 1 having the partitions 4 formed thereon and the front substrate 6 having the plurality of discharge holding electrodes 7 formed thereon for discharging are bonded together, and the discharges are limited by the partitions 4. A discharge gas 10 such as argon (Ar), neon (Ne), or xenon (Xe) is injected into the cell.

In the above, a plurality of address electrodes 12 are formed in a stripe shape parallel to each other, and they are covered by the first dielectric layer 3, and partition walls 4 are formed between the adjacent address electrodes 2. Each of the first dielectric layers 3 is formed in a stripe shape. On the partition face and the first dielectric 3, phosphors 5 emitting red, blue and green colors are repeatedly applied to each discharge cell.

In addition, as shown, the discharge sustaining electrode 7 formed on the front substrate 6 is a laminated film of chromium / copper chromium formed on one side thereof and a transparent electrode 7a such as indium tin oxide (ITO). The discharge sustain electrodes 7 are covered by the second dielectric layer 8, and a protective layer 9 having a high secondary electron emission coefficient such as MgO is formed thereon. Is formed.

However, in the conventional AC-type PDP as described above, the bus electrode is usually formed by etching the laminated film through a wet etching process in a state where a laminated film of chromium / copper / chrome is formed on the front substrate on which the transparent electrode is formed. In this case, the transparent electrode is damaged by the etchant during the wet etching of the chromium / copper / chromium layered film, thereby degrading display characteristics and manufacturing yield.

In addition, since the wet etching process is not used, the width of the bus electrodes cannot be uniformly patterned, thereby making it difficult to achieve high resolution.

Accordingly, an object of the present invention is to provide a method for forming a bus electrode of a plasma display panel which can prevent damage to a transparent electrode and attain a high definition of a bus electrode. .

1 is a cross-sectional view for explaining a conventional AC plasma display panel.

2A to 2D are a series of cross-sectional views for explaining a method of manufacturing a plasma display panel according to an embodiment of the present invention.

(Explanation of symbols for the main parts of the drawing)

11 front substrate 12 transparent electrode

14 first photosensitive film pattern 16 metal laminated film

17 bus electrode 18 second photosensitive film pattern

In order to achieve the above object, the present invention, first, by applying a photosensitive film having a predetermined thickness on the front substrate on which the transparent electrodes are formed, and then exposing and developing the first photosensitive film to expose the transparent electrode portion to form the bus electrode Form a pattern.

Then, in a state in which a chromium / copper / chrome laminated film is formed on the first photosensitive film pattern and the exposed transparent electrode, a photosensitive film having a predetermined thickness is again applied on the laminated film of chrome / copper / chrome, and the exposure and The second photosensitive film pattern is formed on the bus electrode predetermined region.

Then, the exposed portion of the chromium / copper / chromium layer is removed by a wet etching process using the second photoresist pattern as an etching mask to form a bus electrode, and then the second photoresist pattern and the first photoresist pattern are replaced by an alkaline solution. Peel off.

According to the present invention, it is possible to prevent the transparent electrode from being damaged by depositing and patterning a metal film for forming the bus electrode in the state where the photosensitive film pattern for protecting the transparent electrode is formed.

Hereinafter, with reference to the accompanying drawings will be described in detail a preferred embodiment of the present invention.

2A to 2D are a series of cross-sectional views for explaining a method of manufacturing a PDP according to an embodiment of the present invention.

Referring to FIG. 2A, a photoresist having a predetermined thickness is coated on a front substrate 11 on which transparent electrodes 12 such as ITO are formed, and the photoresist is exposed and developed by a conventional method, that is, a predetermined portion of the transparent electrode, namely, The first photosensitive film pattern 14 exposing the transparent electrode portion of the bus electrode predetermined region is formed.

Referring to FIG. 2B, a metal of chromium / copper / chrome or titanium / aluminum / titanium tungsten may be sputtered, E-Beam or plating on the first photoresist pattern 14 and the exposed transparent electrode 12. The laminated film 16 is formed.

Referring to FIG. 2C, a photoresist having a predetermined thickness is again applied on the metal laminate 16, and the photoresist is exposed and developed to form a second photoresist pattern 18 on a predetermined portion of the bus electrode.

Referring to FIG. 2D, after performing a wet etching process using the second photoresist pattern 18 as an etching mask, the metal laminate 16 is etched until the first photoresist pattern 14 is exposed, and then the second and second photoresist patterns 18 are exposed. The first photosensitive film patterns 18 and 14 are peeled off using an alkaline solution to form a bus electrode 17 having a smaller width on the transparent electrode 12.

In this case, the first photoresist layer pattern 14 serves as a buffer to prevent the transparent electrode 12 from being damaged by the etchant, thereby preventing damage to the transparent electrode 12 due to wet etching. . In addition, since the width of the bus electrode 17 is limited by the first photosensitive film pattern 14, the bus electrode 17 may be formed to have a constant width.

As described above, in the PDP manufacturing method of the present invention, the photoresist pattern and the exposure are formed in a state in which a photoresist pattern is formed on the front substrate on which the transparent electrode is formed to prevent damage to the transparent electrode by the etching process. By forming a bus electrode by depositing and patterning a metal film on the transparent electrode, the damage of the transparent electrode due to the etchant during the patterning of the bus electrode using wet etching can be prevented, and the width of the bus electrode can be reduced by the photoresist pattern. By limiting, a bus electrode having a predetermined width can be formed, whereby the display characteristics of the PDP can be improved, and the productivity can be improved.

Meanwhile, although specific embodiments of the present invention have been described and illustrated, modifications and variations can be made by those skilled in the art. Accordingly, the following claims are to be understood as including all modifications and variations as long as they fall within the true spirit and scope of the present invention.

Claims (3)

Coating a photoresist film having a predetermined thickness on the entire surface of the front substrate on which the transparent electrodes are formed, and exposing and developing the photoresist pattern to form a first photoresist pattern that exposes a portion of the transparent electrode on which the bus electrode is to be formed; Forming a metal laminate on the first photoresist pattern and the exposed transparent electrode; Applying a photoresist film having a predetermined thickness again on the metal laminate film, and exposing and developing the photoresist film to form a second photoresist pattern covering a portion of the metal laminate film on which a bus electrode is to be formed; Performing a wet etching process using the second photoresist pattern as an etching mask to remove the exposed metal laminate part; And removing the second and first photoresist patterns with an alkaline solution. The method of manufacturing a plasma display panel according to claim 1, wherein the metal lamination film is a lamination film of chromium / copper / chrome. The method of manufacturing a plasma display panel according to claim 1, wherein the metal lamination film is a lamination film of titanium / aluminum / titanium tungsten.