KR19990044836A - 선택된 측정위치에서 물체를 측정하기 위한 장치 및 방법 - Google Patents

선택된 측정위치에서 물체를 측정하기 위한 장치 및 방법 Download PDF

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Publication number
KR19990044836A
KR19990044836A KR1019980041536A KR19980041536A KR19990044836A KR 19990044836 A KR19990044836 A KR 19990044836A KR 1019980041536 A KR1019980041536 A KR 1019980041536A KR 19980041536 A KR19980041536 A KR 19980041536A KR 19990044836 A KR19990044836 A KR 19990044836A
Authority
KR
South Korea
Prior art keywords
measuring
measurement
illumination
different
camera
Prior art date
Application number
KR1019980041536A
Other languages
English (en)
Korean (ko)
Inventor
그라프 미카엘
바크하우스 구노
알브레츠 디에터
크라췌 노라
플레밍 군터
월터 데트레프
리쯔바 프랭크
스테이너 헤럴드
Original Assignee
볼케르 오움케
제노프티크 악티엔게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 볼케르 오움케, 제노프티크 악티엔게젤샤프트 filed Critical 볼케르 오움케
Publication of KR19990044836A publication Critical patent/KR19990044836A/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
KR1019980041536A 1997-11-27 1998-10-02 선택된 측정위치에서 물체를 측정하기 위한 장치 및 방법 KR19990044836A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE1997152509 DE19752509C2 (de) 1997-11-27 1997-11-27 Einrichtung und Verfahren zur Vermessung von Objekten an ausgewälten Meßpositionen
DE19752509.1 1997-11-27

Publications (1)

Publication Number Publication Date
KR19990044836A true KR19990044836A (ko) 1999-06-25

Family

ID=7849940

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019980041536A KR19990044836A (ko) 1997-11-27 1998-10-02 선택된 측정위치에서 물체를 측정하기 위한 장치 및 방법

Country Status (4)

Country Link
KR (1) KR19990044836A (de)
DE (1) DE19752509C2 (de)
SG (1) SG72866A1 (de)
TW (1) TW365647B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4469462B2 (ja) * 2000-05-25 2010-05-26 株式会社ニコン キャリア形状測定機
JP5079028B2 (ja) * 2010-02-01 2012-11-21 株式会社ニコン キャリア形状測定機
DE102011117273A1 (de) * 2011-10-31 2013-05-02 Torsten Matthias Automatische Strukturbestimmung
DE102012207725A1 (de) 2012-05-09 2012-09-27 Carl Zeiss Ag Ringförmiges Beleuchtungssystem

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI56451C (fi) * 1977-10-20 1980-01-10 Ahlstroem Oy Foerfarande och anordning foer maetning av traevirke
DE3233101C2 (de) * 1982-09-07 1985-05-15 Feinprüf Feinmeß- und Prüfgeräte GmbH, 3400 Göttingen Kolbenmeßmaschine
DE4033588A1 (de) * 1990-10-23 1992-04-30 Tropf Hermann Dr Ing Verfahren und vorrichtung zur kontrastreichen, konturgenauen darstellung, sowie zur vermessung von werkstueckoberflaechen, insbesondere profilquerschnitten, mittels kamera und beleuchtungseinheit
DE29503708U1 (de) * 1995-03-04 1995-05-04 Kliro Anlagenbau Gmbh & Co Kg Vorrichtung zum Messen von rotationssymmetrischen Teilen
DE19624040A1 (de) * 1995-06-15 1996-12-19 Vialog Visuelle Automations An Verfahren zur Ermittlung des Umfangsprofils eines Rotationskörpers

Also Published As

Publication number Publication date
DE19752509A1 (de) 1999-07-01
DE19752509C2 (de) 1999-09-30
SG72866A1 (en) 2000-05-23
TW365647B (en) 1999-08-01

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A201 Request for examination
E701 Decision to grant or registration of patent right
NORF Unpaid initial registration fee