KR19990022135A - 박막이 부착된 기판의 제조 방법 및 제조 장치 - Google Patents
박막이 부착된 기판의 제조 방법 및 제조 장치 Download PDFInfo
- Publication number
- KR19990022135A KR19990022135A KR1019970708614A KR19970708614A KR19990022135A KR 19990022135 A KR19990022135 A KR 19990022135A KR 1019970708614 A KR1019970708614 A KR 1019970708614A KR 19970708614 A KR19970708614 A KR 19970708614A KR 19990022135 A KR19990022135 A KR 19990022135A
- Authority
- KR
- South Korea
- Prior art keywords
- film
- substrate
- thin film
- forming
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
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- 239000010409 thin film Substances 0.000 title claims abstract description 250
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- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 11
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- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
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- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
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- 238000003848 UV Light-Curing Methods 0.000 description 1
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- 230000003373 anti-fouling effect Effects 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- SYFOAKAXGNMQAX-UHFFFAOYSA-N bis(prop-2-enyl) carbonate;2-(2-hydroxyethoxy)ethanol Chemical compound OCCOCCO.C=CCOC(=O)OCC=C SYFOAKAXGNMQAX-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Physical Vapour Deposition (AREA)
- Inorganic Insulating Materials (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP96-78840 | 1996-04-01 | ||
| JP7884096 | 1996-04-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR19990022135A true KR19990022135A (ko) | 1999-03-25 |
Family
ID=13673031
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019970708614A Abandoned KR19990022135A (ko) | 1996-04-01 | 1997-03-27 | 박막이 부착된 기판의 제조 방법 및 제조 장치 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US5993614A (https=) |
| EP (1) | EP0834596B1 (https=) |
| KR (1) | KR19990022135A (https=) |
| AT (1) | ATE273403T1 (https=) |
| DE (1) | DE69730185T2 (https=) |
| TW (1) | TW320687B (https=) |
| WO (1) | WO1997037051A1 (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100323991B1 (ko) * | 1999-11-16 | 2002-02-16 | 이경희 | 박막 제조 방법 및 제조 장치 |
| KR101017187B1 (ko) * | 2004-08-31 | 2011-02-25 | 엘지디스플레이 주식회사 | 스토커 시스템 |
| KR101336225B1 (ko) * | 2012-05-30 | 2013-12-03 | 주식회사 선익시스템 | 기판의 이송속도 조절을 통해 고 증착효율을 갖는 인라인 증착 시스템 |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3370806B2 (ja) | 1994-11-25 | 2003-01-27 | 株式会社半導体エネルギー研究所 | Ｍｉｓ型半導体装置の作製方法 |
| US6742066B2 (en) * | 1999-05-17 | 2004-05-25 | Hewlett-Packard Development Company, L.P. | System and method for controlling remote console functionality assist logic |
| US6275744B1 (en) * | 1997-08-01 | 2001-08-14 | Kokusai Electric Co., Ltd. | Substrate feed control |
| EP1074907A4 (en) * | 1998-04-24 | 2005-11-16 | Nissha Printing | TOUCHSCREEN |
| JP4345158B2 (ja) * | 1999-10-15 | 2009-10-14 | ソニー株式会社 | 光学部品の製造装置及び製造方法 |
| TW490714B (en) * | 1999-12-27 | 2002-06-11 | Semiconductor Energy Lab | Film formation apparatus and method for forming a film |
| US20020011205A1 (en) | 2000-05-02 | 2002-01-31 | Shunpei Yamazaki | Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device |
| US6881269B2 (en) * | 2000-08-17 | 2005-04-19 | Novartis Ag | Lens plasma coating system |
| KR100572554B1 (ko) * | 2001-02-27 | 2006-04-24 | 세이코 엡슨 가부시키가이샤 | 다층막 컷 필터 및 그 제조 방법, uv 컷 필터, 방진 유리, 표시 패널 및 투사형 표시 장치 |
| JP2002363733A (ja) * | 2001-06-04 | 2002-12-18 | Nippon Sheet Glass Co Ltd | 被膜の形成方法 |
| JP4120546B2 (ja) * | 2002-10-04 | 2008-07-16 | 株式会社Ｉｈｉ | 薄膜形成方法及び装置並びに太陽電池の製造方法及び装置並びに太陽電池 |
| US20040121146A1 (en) * | 2002-12-20 | 2004-06-24 | Xiao-Ming He | Composite barrier films and method |
| JP4476073B2 (ja) * | 2004-04-08 | 2010-06-09 | 東北パイオニア株式会社 | 有機ｅｌ素子の製造方法及び製造装置 |
| JP2006058473A (ja) * | 2004-08-18 | 2006-03-02 | Oyokoden Lab Co Ltd | 誘電体多層膜フィルタ及びその製造方法 |
| WO2006024031A2 (en) | 2004-08-23 | 2006-03-02 | Hewlett-Packard Development Company, L.P. | Method and apparatus for redirection of video data |
| US20060181266A1 (en) * | 2005-02-14 | 2006-08-17 | Panelvision Technology, A California Corporation | Flat panel display inspection system |
| JP4462197B2 (ja) * | 2006-01-23 | 2010-05-12 | ソニー株式会社 | 光学ローパスフィルタ |
| DE102006057386A1 (de) * | 2006-12-04 | 2008-06-05 | Uhde Gmbh | Verfahren zum Beschichten von Substraten |
| FR2913116B1 (fr) * | 2007-02-23 | 2009-08-28 | Essilor Int | Procede de fabrication d'un article optique revetu d'un revetement anti-reflets ou reflechissant ayant des proprietes d'adhesion et de resistance a l'abrasion ameliorees |
| US8318245B2 (en) * | 2007-02-23 | 2012-11-27 | Essilor International (Compagnie Generale D'optique) | Method for producing an optical article coated with an antireflection or a reflective coating having improved adhesion and abrasion resistance properties |
| JP2008033341A (ja) * | 2007-08-21 | 2008-02-14 | Seiko Epson Corp | 多層膜カットフィルターの製造方法 |
| KR101933902B1 (ko) * | 2007-12-27 | 2018-12-31 | 엑사테크 엘.엘.씨. | 멀티-패스 진공 코팅 시스템 |
| JP5153410B2 (ja) * | 2008-03-31 | 2013-02-27 | Ｈｏｙａ株式会社 | レンズ成膜方法、蒸着装置及びレンズの製造方法 |
| TWI383207B (zh) | 2008-12-25 | 2013-01-21 | Chunghwa Picture Tubes Ltd | 背光模組之電路板固定結構 |
| CN101988186B (zh) * | 2009-08-04 | 2013-08-21 | 鸿富锦精密工业（深圳）有限公司 | 工件真空溅镀方法及装置 |
| JP2013104127A (ja) * | 2011-11-16 | 2013-05-30 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置 |
| JP6269064B2 (ja) * | 2011-11-21 | 2018-01-31 | 旭硝子株式会社 | 光学多層膜付きガラス部材及び近赤外線カットフィルタガラス |
| EP2839052A4 (en) | 2012-04-19 | 2015-06-10 | Intevac Inc | Dual-mask arrangement for solar cell fabrication |
| US10062600B2 (en) | 2012-04-26 | 2018-08-28 | Intevac, Inc. | System and method for bi-facial processing of substrates |
| EP2852469B1 (en) | 2012-04-26 | 2019-04-24 | Intevac, Inc. | System architecture for vacuum processing |
| JP6607923B2 (ja) | 2014-08-05 | 2019-11-20 | インテヴァック インコーポレイテッド | 注入マスク及びアライメント |
| EA034967B1 (ru) * | 2018-05-04 | 2020-04-13 | Общество С Ограниченной Ответственностью "Изовак Технологии" | Технологическая линия для формирования тонкопленочных покрытий в вакууме (варианты) |
| TWI774936B (zh) * | 2019-03-08 | 2022-08-21 | 台灣愛司帝科技股份有限公司 | 承載結構及承載設備 |
| DE102020003578A1 (de) | 2020-05-20 | 2021-11-25 | Schneider Gmbh & Co. Kg | Beschichtungsanlage, Spannring und Magazin für Brillengläser und Verfahren zum Beschichten von Brillengläsern |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62260059A (ja) * | 1986-05-02 | 1987-11-12 | Seiko Epson Corp | スパツタ装置 |
| US4859493A (en) * | 1987-03-31 | 1989-08-22 | Lemelson Jerome H | Methods of forming synthetic diamond coatings on particles using microwaves |
| JPS644472A (en) * | 1987-06-25 | 1989-01-09 | Toshiba Corp | Sputtering device |
| JPH0335216A (ja) * | 1989-06-30 | 1991-02-15 | Matsushita Electric Ind Co Ltd | 連続式スパッタ装置およびカラー液晶用基板の製造方法 |
| JPH03193873A (ja) * | 1989-12-21 | 1991-08-23 | Shinku Kikai Kogyo Kk | 連続真空薄膜形成方法および装置 |
| DE4111384C2 (de) * | 1991-04-09 | 1999-11-04 | Leybold Ag | Vorrichtung zur Beschichtung von Substraten |
| US5815396A (en) * | 1991-08-12 | 1998-09-29 | Hitachi, Ltd. | Vacuum processing device and film forming device and method using same |
| US5215420A (en) * | 1991-09-20 | 1993-06-01 | Intevac, Inc. | Substrate handling and processing system |
| US5250660A (en) * | 1991-11-12 | 1993-10-05 | Eli Lilly And Company | Peptide purification process |
| US5474611A (en) * | 1992-05-20 | 1995-12-12 | Yoichi Murayama, Shincron Co., Ltd. | Plasma vapor deposition apparatus |
| JPH0665724A (ja) * | 1992-05-20 | 1994-03-08 | Yoichi Murayama | インラインプラズマ蒸着装置 |
| JPH07278801A (ja) * | 1994-04-13 | 1995-10-24 | Idemitsu Material Kk | 真空成膜装置 |
-
1997
- 1997-03-26 TW TW086103845A patent/TW320687B/zh active
- 1997-03-27 EP EP97908528A patent/EP0834596B1/en not_active Expired - Lifetime
- 1997-03-27 US US08/973,312 patent/US5993614A/en not_active Expired - Fee Related
- 1997-03-27 KR KR1019970708614A patent/KR19990022135A/ko not_active Abandoned
- 1997-03-27 WO PCT/JP1997/001054 patent/WO1997037051A1/ja not_active Ceased
- 1997-03-27 AT AT97908528T patent/ATE273403T1/de not_active IP Right Cessation
- 1997-03-27 DE DE69730185T patent/DE69730185T2/de not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100323991B1 (ko) * | 1999-11-16 | 2002-02-16 | 이경희 | 박막 제조 방법 및 제조 장치 |
| KR101017187B1 (ko) * | 2004-08-31 | 2011-02-25 | 엘지디스플레이 주식회사 | 스토커 시스템 |
| KR101336225B1 (ko) * | 2012-05-30 | 2013-12-03 | 주식회사 선익시스템 | 기판의 이송속도 조절을 통해 고 증착효율을 갖는 인라인 증착 시스템 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE69730185T2 (de) | 2005-08-18 |
| WO1997037051A1 (fr) | 1997-10-09 |
| DE69730185D1 (de) | 2004-09-16 |
| EP0834596A1 (en) | 1998-04-08 |
| ATE273403T1 (de) | 2004-08-15 |
| EP0834596B1 (en) | 2004-08-11 |
| TW320687B (https=) | 1997-11-21 |
| US5993614A (en) | 1999-11-30 |
| EP0834596A4 (en) | 2003-03-26 |
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