KR102934426B1 - 하전 입자선 장치 - Google Patents

하전 입자선 장치

Info

Publication number
KR102934426B1
KR102934426B1 KR1020247008071A KR20247008071A KR102934426B1 KR 102934426 B1 KR102934426 B1 KR 102934426B1 KR 1020247008071 A KR1020247008071 A KR 1020247008071A KR 20247008071 A KR20247008071 A KR 20247008071A KR 102934426 B1 KR102934426 B1 KR 102934426B1
Authority
KR
South Korea
Prior art keywords
voltage
chip
filament
electrode
extraction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020247008071A
Other languages
English (en)
Korean (ko)
Other versions
KR20240043795A (ko
Inventor
게이고 가스야
슈헤이 이시까와
겐지 다니모또
슌이찌 와따나베
šœ이찌 와따나베
다까시 도이
유스께 사까이
Original Assignee
주식회사 히타치하이테크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 히타치하이테크 filed Critical 주식회사 히타치하이테크
Publication of KR20240043795A publication Critical patent/KR20240043795A/ko
Application granted granted Critical
Publication of KR102934426B1 publication Critical patent/KR102934426B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/07—Eliminating deleterious effects due to thermal effects or electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0473—Changing particle velocity accelerating
    • H01J2237/04735—Changing particle velocity accelerating with electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06341—Field emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
KR1020247008071A 2021-10-19 2021-10-19 하전 입자선 장치 Active KR102934426B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/038557 WO2023067681A1 (ja) 2021-10-19 2021-10-19 荷電粒子線装置

Publications (2)

Publication Number Publication Date
KR20240043795A KR20240043795A (ko) 2024-04-03
KR102934426B1 true KR102934426B1 (ko) 2026-03-06

Family

ID=86058909

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247008071A Active KR102934426B1 (ko) 2021-10-19 2021-10-19 하전 입자선 장치

Country Status (4)

Country Link
US (1) US12469665B2 (https=)
JP (1) JP7730916B2 (https=)
KR (1) KR102934426B1 (https=)
WO (1) WO2023067681A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007073521A (ja) 2005-09-05 2007-03-22 Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh 荷電粒子ビーム照射デバイス及び荷電粒子ビーム照射デバイスを動作させるための方法
US20140264019A1 (en) * 2013-03-15 2014-09-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik GmbH Electron gun arrangement
US20200312619A1 (en) * 2019-03-28 2020-10-01 Asml Netherlands B.V. Aperture array with integrated current measurement

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5012959A (https=) * 1973-04-13 1975-02-10
JPS50100964A (https=) * 1974-01-07 1975-08-11
JPS57165944A (en) * 1981-04-06 1982-10-13 Jeol Ltd Dallying method for emitter
JP6166910B2 (ja) 2013-02-26 2017-07-19 株式会社ニューフレアテクノロジー カソードの動作温度調整方法、及び描画装置
JP6463361B2 (ja) 2013-09-08 2019-01-30 コディアック サイエンシーズ インコーポレイテッドＫｏｄｉａｋ Ｓｃｉｅｎｃｅｓ Ｉｎｃ． 第ｖｉｉｉ因子両性イオンポリマーコンジュゲート
JP7068117B2 (ja) * 2018-09-18 2022-05-16 株式会社日立ハイテク 荷電粒子線装置
JP7666536B2 (ja) 2023-02-07 2025-04-22 株式会社セガ プログラム及び情報処理装置
JP2025012959A (ja) 2023-07-14 2025-01-24 前澤給装工業株式会社 止水栓操作ハンドル

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007073521A (ja) 2005-09-05 2007-03-22 Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh 荷電粒子ビーム照射デバイス及び荷電粒子ビーム照射デバイスを動作させるための方法
US20140264019A1 (en) * 2013-03-15 2014-09-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik GmbH Electron gun arrangement
US20200312619A1 (en) * 2019-03-28 2020-10-01 Asml Netherlands B.V. Aperture array with integrated current measurement

Also Published As

Publication number Publication date
US12469665B2 (en) 2025-11-11
US20240379318A1 (en) 2024-11-14
JPWO2023067681A1 (https=) 2023-04-27
JP7730916B2 (ja) 2025-08-28
WO2023067681A1 (ja) 2023-04-27
KR20240043795A (ko) 2024-04-03

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