KR102931569B1 - 착색 조성물, 착색 경화막 및 그의 제조 방법, 컬러 필터, 표시 소자, 그리고 수광 소자 - Google Patents

착색 조성물, 착색 경화막 및 그의 제조 방법, 컬러 필터, 표시 소자, 그리고 수광 소자

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KR102931569B1
KR102931569B1 KR1020200178165A KR20200178165A KR102931569B1 KR 102931569 B1 KR102931569 B1 KR 102931569B1 KR 1020200178165 A KR1020200178165 A KR 1020200178165A KR 20200178165 A KR20200178165 A KR 20200178165A KR 102931569 B1 KR102931569 B1 KR 102931569B1
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polymer
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coloring
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KR20210080243A (ko
Inventor
사토시 후쿠마
시게루 이카와
사토시 구라
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가부시끼가이샤 레조낙
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Structural Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Graft Or Block Polymers (AREA)
  • Electroluminescent Light Sources (AREA)
  • Liquid Crystal (AREA)
  • Light Receiving Elements (AREA)
KR1020200178165A 2019-12-20 2020-12-18 착색 조성물, 착색 경화막 및 그의 제조 방법, 컬러 필터, 표시 소자, 그리고 수광 소자 Active KR102931569B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020230108385A KR102858751B1 (ko) 2019-12-20 2023-08-18 착색 조성물, 착색 경화막 및 그의 제조 방법, 컬러 필터, 표시 소자, 수광 소자, 그리고 경화성 조성물

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019230963 2019-12-20
JPJP-P-2019-230963 2019-12-20

Related Child Applications (1)

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KR1020230108385A Division KR102858751B1 (ko) 2019-12-20 2023-08-18 착색 조성물, 착색 경화막 및 그의 제조 방법, 컬러 필터, 표시 소자, 수광 소자, 그리고 경화성 조성물

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KR20210080243A KR20210080243A (ko) 2021-06-30
KR102931569B1 true KR102931569B1 (ko) 2026-02-25

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KR1020230108385A Active KR102858751B1 (ko) 2019-12-20 2023-08-18 착색 조성물, 착색 경화막 및 그의 제조 방법, 컬러 필터, 표시 소자, 수광 소자, 그리고 경화성 조성물

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JP (2) JP7539010B2 (https=)
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WO2022138159A1 (ja) * 2020-12-24 2022-06-30 昭和電工株式会社 共重合体およびその共重合体の製造方法
JP7221348B1 (ja) 2021-09-13 2023-02-13 東洋インキＳｃホールディングス株式会社 感光性着色組成物、それを用いた硬化膜、カラーフィルタ、光学フィルタ、画像表示装置、固体撮像素子、及び赤外線センサ
JP7272397B2 (ja) 2021-10-12 2023-05-12 東洋インキＳｃホールディングス株式会社 感光性組成物、それを用いた硬化膜、光学フィルタ、画像表示装置及び固体撮像素子
JP7718220B2 (ja) * 2021-10-18 2025-08-05 ａｒｔｉｅｎｃｅ株式会社 感光性組成物、光学フィルタ、画像表示装置及び固体撮像素子
KR20250112780A (ko) 2022-12-01 2025-07-24 가부시끼가이샤 레조낙 공중합체 및 감광성 수지 조성물
KR20250125330A (ko) 2022-12-20 2025-08-21 가부시끼가이샤 레조낙 공중합체, 감광성 수지 조성물, 수지 경화막, 및 화상 표시 소자
JP7407330B1 (ja) 2023-03-06 2023-12-28 東洋インキＳｃホールディングス株式会社 感光性組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ
JP7605243B2 (ja) 2023-04-19 2024-12-24 ａｒｔｉｅｎｃｅ株式会社 感光性組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ
WO2025013355A1 (ja) 2023-07-13 2025-01-16 株式会社レゾナック 樹脂組成物、変性樹脂組成物、及び変性樹脂組成物の製造方法
JPWO2025013366A1 (https=) 2023-07-13 2025-01-16
WO2025047469A1 (ja) * 2023-08-30 2025-03-06 富士フイルム株式会社 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、赤外線センサ、カメラモジュールおよび化合物
KR20250168305A (ko) 2023-12-08 2025-12-02 가부시끼가이샤 레조낙 수지 조성물, 변성 수지 조성물, 및 변성 수지 조성물의 제조 방법
WO2025121032A1 (ja) 2023-12-08 2025-06-12 株式会社レゾナック 樹脂組成物、変性樹脂組成物、及び変性樹脂組成物の製造方法
WO2025163995A1 (ja) * 2024-01-29 2025-08-07 株式会社レゾナック 感光性樹脂組成物、樹脂硬化膜、及び画像表示素子

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JP2019011456A (ja) * 2017-03-13 2019-01-24 Jsr株式会社 着色組成物、着色硬化膜、カラーフィルタ、表示素子、受光素子、発光素子及び化合物
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JP2019120190A (ja) * 2018-01-05 2019-07-22 日本車輌製造株式会社 エンジン作業機

Also Published As

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TW202124595A (zh) 2021-07-01
JP7539010B2 (ja) 2024-08-23
CN116859670A (zh) 2023-10-10
TWI906241B (zh) 2025-12-01
CN113009784B (zh) 2025-02-18
TW202348741A (zh) 2023-12-16
JP2021102759A (ja) 2021-07-15
KR102858751B1 (ko) 2025-09-10
KR20210080243A (ko) 2021-06-30
TWI864987B (zh) 2024-12-01
KR20230125149A (ko) 2023-08-29
JP2023164445A (ja) 2023-11-10
JP7589776B2 (ja) 2024-11-26
CN113009784A (zh) 2021-06-22

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