KR102920107B1 - 촬상 소자 및 촬상 장치 - Google Patents

촬상 소자 및 촬상 장치

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Publication number
KR102920107B1
KR102920107B1 KR1020227032091A KR20227032091A KR102920107B1 KR 102920107 B1 KR102920107 B1 KR 102920107B1 KR 1020227032091 A KR1020227032091 A KR 1020227032091A KR 20227032091 A KR20227032091 A KR 20227032091A KR 102920107 B1 KR102920107 B1 KR 102920107B1
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South Korea
Prior art keywords
layer
electrode
photoelectric conversion
semiconductor layer
energy level
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KR1020227032091A
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English (en)
Korean (ko)
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KR20220160567A (ko
Inventor
마사히로 조에이
신타로우 히라타
토미유키 유카와
료스케 스즈키
히로시 나카노
토시히코 하야시
료타로 타카구치
이와오 야기
켄이치 무라타
Original Assignee
소니그룹주식회사
소니 세미컨덕터 솔루션즈 가부시키가이샤
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Publication of KR20220160567A publication Critical patent/KR20220160567A/ko
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F19/00Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
    • H10F19/50Integrated devices comprising at least one photovoltaic cell and other types of semiconductor or solid-state components
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/191Photoconductor image sensors
    • H10F39/193Infrared image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/18Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/18Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H10F39/182Colour image sensors
    • H10F39/1825Multicolour image sensors having stacked structure, e.g. NPN, NPNPN or multiple quantum well [MQW] structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/191Photoconductor image sensors
    • H10F39/192Colour image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/803Pixels having integrated switching, control, storage or amplification elements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/805Coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/809Constructional details of image sensors of hybrid image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/30Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains
    • H10K30/353Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains comprising blocking layers, e.g. exciton blocking layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80Constructional details
    • H10K30/84Layers having high charge carrier mobility
    • H10K30/85Layers having high electron mobility, e.g. electron-transporting layers or hole-blocking layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K39/00Integrated devices, or assemblies of multiple devices, comprising at least one organic radiation-sensitive element covered by group H10K30/00
    • H10K39/30Devices controlled by radiation
    • H10K39/32Organic image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/803Pixels having integrated switching, control, storage or amplification elements
    • H10F39/8037Pixels having integrated switching, control, storage or amplification elements the integrated elements comprising a transistor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/812Arrangements for transferring the charges in the image sensor perpendicular to the imaging plane, e.g. buried regions used to transfer generated charges to circuitry under the photosensitive region
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Light Receiving Elements (AREA)
KR1020227032091A 2020-03-31 2021-03-24 촬상 소자 및 촬상 장치 Active KR102920107B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2020064017 2020-03-31
JPJP-P-2020-064017 2020-03-31
JP2021045945 2021-03-19
JPJP-P-2021-045945 2021-03-19
PCT/JP2021/012401 WO2021200509A1 (ja) 2020-03-31 2021-03-24 撮像素子および撮像装置

Publications (2)

Publication Number Publication Date
KR20220160567A KR20220160567A (ko) 2022-12-06
KR102920107B1 true KR102920107B1 (ko) 2026-01-30

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Country Status (7)

Country Link
US (1) US12464829B2 (https=)
EP (1) EP4131386A4 (https=)
JP (1) JP7753193B2 (https=)
KR (1) KR102920107B1 (https=)
CN (1) CN115428157A (https=)
TW (1) TWI889786B (https=)
WO (1) WO2021200509A1 (https=)

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JP7524082B2 (ja) * 2019-02-15 2024-07-29 ソニーセミコンダクタソリューションズ株式会社 撮像素子および撮像装置
TW202347747A (zh) * 2022-02-14 2023-12-01 日商索尼半導體解決方案公司 光電轉換元件及光檢測裝置
US20260107624A1 (en) * 2022-09-30 2026-04-16 Sony Semiconductor Solutions Corporation Photoelectric conversion element and photodetector
CN121925965A (zh) * 2023-10-20 2026-04-24 索尼半导体解决方案公司 光检测装置

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WO2020017330A1 (ja) * 2018-07-17 2020-01-23 ソニーセミコンダクタソリューションズ株式会社 撮像素子、積層型撮像素子及び固体撮像装置
WO2020026851A1 (ja) * 2018-07-31 2020-02-06 ソニーセミコンダクタソリューションズ株式会社 撮像素子および撮像装置

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JP5460118B2 (ja) * 2008-05-14 2014-04-02 富士フイルム株式会社 光電変換素子、及び撮像素子
JP5325473B2 (ja) 2008-06-20 2013-10-23 富士フイルム株式会社 光電変換素子及び固体撮像素子
JP2013020998A (ja) 2011-07-07 2013-01-31 Renesas Electronics Corp 半導体装置およびその製造方法
JP2014127545A (ja) * 2012-12-26 2014-07-07 Sony Corp 固体撮像素子およびこれを備えた固体撮像装置
JP5925713B2 (ja) 2013-02-26 2016-05-25 株式会社東芝 固体撮像装置
JP2015043370A (ja) * 2013-08-26 2015-03-05 シャープ株式会社 光電変換装置
CN107851652A (zh) * 2015-11-12 2018-03-27 松下知识产权经营株式会社 光传感器
JP6780421B2 (ja) * 2016-03-01 2020-11-04 ソニー株式会社 撮像素子、積層型撮像素子及び固体撮像装置、並びに、固体撮像装置の駆動方法
WO2017208806A1 (ja) * 2016-06-02 2017-12-07 ソニー株式会社 撮像素子および撮像素子の製造方法ならびに撮像装置
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KR102491856B1 (ko) * 2017-12-18 2023-01-27 삼성전자주식회사 복수의 양자점층을 포함하는 광전 소자
WO2019151049A1 (ja) 2018-01-31 2019-08-08 ソニー株式会社 光電変換素子、固体撮像装置及び電子装置
WO2019150987A1 (ja) 2018-01-31 2019-08-08 ソニー株式会社 光電変換素子および撮像装置
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WO2020017330A1 (ja) * 2018-07-17 2020-01-23 ソニーセミコンダクタソリューションズ株式会社 撮像素子、積層型撮像素子及び固体撮像装置
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Publication number Publication date
US12464829B2 (en) 2025-11-04
EP4131386A4 (en) 2023-09-27
US20230215880A1 (en) 2023-07-06
JPWO2021200509A1 (https=) 2021-10-07
KR20220160567A (ko) 2022-12-06
EP4131386A1 (en) 2023-02-08
TWI889786B (zh) 2025-07-11
TW202143469A (zh) 2021-11-16
WO2021200509A1 (ja) 2021-10-07
CN115428157A (zh) 2022-12-02
JP7753193B2 (ja) 2025-10-14

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