KR102847132B1 - 처리 장치 및 처리 방법 - Google Patents
처리 장치 및 처리 방법Info
- Publication number
- KR102847132B1 KR102847132B1 KR1020227004426A KR20227004426A KR102847132B1 KR 102847132 B1 KR102847132 B1 KR 102847132B1 KR 1020227004426 A KR1020227004426 A KR 1020227004426A KR 20227004426 A KR20227004426 A KR 20227004426A KR 102847132 B1 KR102847132 B1 KR 102847132B1
- Authority
- KR
- South Korea
- Prior art keywords
- processing
- wafer
- eccentricity
- modified layer
- surface modification
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/0823—Devices involving rotation of the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
-
- H01L21/67092—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P34/00—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices
- H10P34/40—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation
- H10P34/42—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation with electromagnetic radiation, e.g. laser annealing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic materials other than metals or composite materials
- B23K2103/56—Inorganic materials other than metals or composite materials being semiconducting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Laser Beam Processing (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2019-133106 | 2019-07-18 | ||
| JP2019133106 | 2019-07-18 | ||
| PCT/JP2020/026885 WO2021010286A1 (ja) | 2019-07-18 | 2020-07-09 | 処理装置及び処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20220034190A KR20220034190A (ko) | 2022-03-17 |
| KR102847132B1 true KR102847132B1 (ko) | 2025-08-18 |
Family
ID=74210796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020227004426A Active KR102847132B1 (ko) | 2019-07-18 | 2020-07-09 | 처리 장치 및 처리 방법 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12397375B2 (https=) |
| JP (1) | JP7170879B2 (https=) |
| KR (1) | KR102847132B1 (https=) |
| CN (1) | CN114096373B (https=) |
| TW (1) | TWI857095B (https=) |
| WO (1) | WO2021010286A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI877184B (zh) * | 2019-07-18 | 2025-03-21 | 日商東京威力科創股份有限公司 | 處理裝置及處理方法 |
| US20230234164A1 (en) * | 2022-01-27 | 2023-07-27 | Ii-Vi Delaware, Inc. | Polycrystalline diamond (pcd) laser lapping machine |
| CN117182290A (zh) * | 2022-06-01 | 2023-12-08 | 华为数字能源技术有限公司 | 激光加工设备、加工方法以及晶圆薄片 |
| JP7843650B2 (ja) * | 2022-06-08 | 2026-04-10 | 東京エレクトロン株式会社 | 基板処理装置及び位置調整方法 |
| JP2024042807A (ja) * | 2022-09-16 | 2024-03-29 | キオクシア株式会社 | レーザー加工装置、レーザー剥離方法および半導体装置の製造方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008053341A (ja) | 2006-08-23 | 2008-03-06 | Disco Abrasive Syst Ltd | ウエーハの加工方法 |
| JP2010247189A (ja) | 2009-04-16 | 2010-11-04 | Shin Etsu Polymer Co Ltd | 半導体ウェーハの製造方法及びその装置 |
| JP2014082296A (ja) | 2012-10-16 | 2014-05-08 | Disco Abrasive Syst Ltd | 加工方法 |
| JP2018043340A (ja) | 2016-09-15 | 2018-03-22 | 株式会社荏原製作所 | 基板加工方法および基板加工装置 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4659300B2 (ja) * | 2000-09-13 | 2011-03-30 | 浜松ホトニクス株式会社 | レーザ加工方法及び半導体チップの製造方法 |
| JP4732934B2 (ja) * | 2006-03-20 | 2011-07-27 | 株式会社デンソー | レーザダイシング方法 |
| CN102317030B (zh) * | 2009-04-07 | 2014-08-20 | 浜松光子学株式会社 | 激光加工装置以及激光加工方法 |
| JP6044919B2 (ja) | 2012-02-01 | 2016-12-14 | 信越ポリマー株式会社 | 基板加工方法 |
| JP6523991B2 (ja) * | 2015-04-14 | 2019-06-05 | 株式会社荏原製作所 | 基板処理装置および基板処理方法 |
| JP6516184B2 (ja) * | 2015-05-19 | 2019-05-22 | パナソニックIpマネジメント株式会社 | 脆性基板のスライス装置及び方法 |
| JP6552898B2 (ja) * | 2015-07-13 | 2019-07-31 | 株式会社ディスコ | 多結晶SiCウエーハの生成方法 |
| JP6851040B2 (ja) * | 2016-03-29 | 2021-03-31 | 国立大学法人埼玉大学 | 基板加工方法および基板加工装置 |
| JP6779486B2 (ja) * | 2016-08-16 | 2020-11-04 | 国立大学法人埼玉大学 | 基板加工方法および基板加工装置 |
| JP6817761B2 (ja) * | 2016-09-21 | 2021-01-20 | 株式会社ディスコ | ウエーハの分割方法 |
| JP6844901B2 (ja) * | 2017-05-26 | 2021-03-17 | 株式会社ディスコ | レーザ加工装置及びレーザ加工方法 |
| JP6911277B2 (ja) * | 2017-09-22 | 2021-07-28 | 株式会社東京精密 | レーザー加工装置及びレーザー加工方法 |
-
2020
- 2020-07-06 TW TW109122710A patent/TWI857095B/zh active
- 2020-07-09 US US17/627,700 patent/US12397375B2/en active Active
- 2020-07-09 CN CN202080050499.0A patent/CN114096373B/zh active Active
- 2020-07-09 WO PCT/JP2020/026885 patent/WO2021010286A1/ja not_active Ceased
- 2020-07-09 KR KR1020227004426A patent/KR102847132B1/ko active Active
- 2020-07-09 JP JP2021533019A patent/JP7170879B2/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008053341A (ja) | 2006-08-23 | 2008-03-06 | Disco Abrasive Syst Ltd | ウエーハの加工方法 |
| JP2010247189A (ja) | 2009-04-16 | 2010-11-04 | Shin Etsu Polymer Co Ltd | 半導体ウェーハの製造方法及びその装置 |
| JP2014082296A (ja) | 2012-10-16 | 2014-05-08 | Disco Abrasive Syst Ltd | 加工方法 |
| JP2018043340A (ja) | 2016-09-15 | 2018-03-22 | 株式会社荏原製作所 | 基板加工方法および基板加工装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20220034190A (ko) | 2022-03-17 |
| TWI857095B (zh) | 2024-10-01 |
| US20220314373A1 (en) | 2022-10-06 |
| CN114096373B (zh) | 2023-12-01 |
| US12397375B2 (en) | 2025-08-26 |
| WO2021010286A1 (ja) | 2021-01-21 |
| TW202106428A (zh) | 2021-02-16 |
| JPWO2021010286A1 (https=) | 2021-01-21 |
| CN114096373A (zh) | 2022-02-25 |
| JP7170879B2 (ja) | 2022-11-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
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| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
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| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
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| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
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| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
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| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
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| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
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| F11 | Ip right granted following substantive examination |
Free format text: ST27 STATUS EVENT CODE: A-2-4-F10-F11-EXM-PR0701 (AS PROVIDED BY THE NATIONAL OFFICE) |
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| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
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| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U12-oth-PR1002 Fee payment year number: 1 |
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| U12 | Designation fee paid |
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| PG1601 | Publication of registration |
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| Q13 | Ip right document published |
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| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |