KR102767094B1 - 다중-영상 레이저 빔 품질 측정의 초점 보정을 위한 방법 및 장치 - Google Patents

다중-영상 레이저 빔 품질 측정의 초점 보정을 위한 방법 및 장치 Download PDF

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KR102767094B1
KR102767094B1 KR1020217004044A KR20217004044A KR102767094B1 KR 102767094 B1 KR102767094 B1 KR 102767094B1 KR 1020217004044 A KR1020217004044 A KR 1020217004044A KR 20217004044 A KR20217004044 A KR 20217004044A KR 102767094 B1 KR102767094 B1 KR 102767094B1
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image
focus
laser beam
focal plane
slices
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KR20210024181A (ko
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폰 레이 브라운
제프 브라운
제드 시몬스
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오퍼 옵트로닉스 솔루션스 리미티드
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4228—Photometry, e.g. photographic exposure meter using electric radiation detectors arrangements with two or more detectors, e.g. for sensitivity compensation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/0214—Constructional arrangements for removing stray light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0422—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using light concentrators, collectors or condensers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/0014—Monitoring arrangements not otherwise provided for

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Lasers (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020217004044A 2018-07-20 2019-07-08 다중-영상 레이저 빔 품질 측정의 초점 보정을 위한 방법 및 장치 Active KR102767094B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862701244P 2018-07-20 2018-07-20
US62/701,244 2018-07-20
PCT/US2019/040891 WO2020018308A1 (en) 2018-07-20 2019-07-08 Method and apparatus for focus correction of multi-image laser beam quality measurements

Publications (2)

Publication Number Publication Date
KR20210024181A KR20210024181A (ko) 2021-03-04
KR102767094B1 true KR102767094B1 (ko) 2025-02-13

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KR1020217004044A Active KR102767094B1 (ko) 2018-07-20 2019-07-08 다중-영상 레이저 빔 품질 측정의 초점 보정을 위한 방법 및 장치

Country Status (6)

Country Link
US (1) US11965775B2 (cg-RX-API-DMAC7.html)
EP (1) EP3824259B1 (cg-RX-API-DMAC7.html)
JP (1) JP7564086B2 (cg-RX-API-DMAC7.html)
KR (1) KR102767094B1 (cg-RX-API-DMAC7.html)
CN (1) CN112334744B (cg-RX-API-DMAC7.html)
WO (1) WO2020018308A1 (cg-RX-API-DMAC7.html)

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CN113091898A (zh) * 2021-03-04 2021-07-09 南京理工大学 基于散射光成像法的激光光束质量测量方法
CN112924024A (zh) * 2021-03-12 2021-06-08 中国工程物理研究院激光聚变研究中心 一种新型高能激光光束质量测量装置
DE202021103431U1 (de) * 2021-06-28 2021-08-19 Trioptics Gmbh Vorrichtung zur Abbildung durch ein zu prüfendes optisches System und System zum Prüfen eines optischen Systems
WO2023283204A1 (en) * 2021-07-06 2023-01-12 Divergent Technologies, Inc. Exchangeable beam entry window for am system
DE102022101274A1 (de) 2022-01-20 2023-07-20 TRUMPF Werkzeugmaschinen SE + Co. KG Verfahren und Messanordnung zur Bestimmung der Eigenschaften einer Laserschmelzschneidvorrichtung
DE102023102206A1 (de) * 2023-01-31 2024-08-01 TRUMPF Laser SE Kontrastmessung zur Laserpulseinstellung
CN121364060A (zh) * 2025-12-23 2026-01-20 中国计量科学研究院 一种扫描散射式光束分析仪

Citations (5)

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US20060258942A1 (en) 2003-03-11 2006-11-16 Van Beek Michael C Spectroscopic analysis apparatus and method with excitation system and focus monitoring system
US20130016358A1 (en) 2010-03-23 2013-01-17 Ophir-Spiricon Llc Beam scattering laser monitor
US20140233022A1 (en) 2012-10-22 2014-08-21 Haas Laser Technologies, Inc. Apparatus for focus beam analysis of high power lasers
US20160341969A1 (en) 2014-01-31 2016-11-24 Carl Zeiss Smt Gmbh Beam propagation camera and method for light beam analysis
US20180029164A1 (en) 2015-02-06 2018-02-01 Primes Gmbh Messtechnik Fuer Die Produktion Mit Laserstrahlung Apparatus and method for beam diagnosis on laser processing optics

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JPS6295742A (ja) * 1985-10-19 1987-05-02 Hitachi Maxell Ltd レ−ザ露光装置
WO1990012999A1 (en) * 1989-04-27 1990-11-01 Coherent, Inc. Apparatus for measuring the mode quality of a laser beam
US5760901A (en) * 1997-01-28 1998-06-02 Zetetic Institute Method and apparatus for confocal interference microscopy with background amplitude reduction and compensation
JP4397549B2 (ja) * 2001-07-04 2010-01-13 株式会社リコー ビームプロファイル検証方法
IL148664A0 (en) 2002-03-13 2002-09-12 Yeda Res & Dev Auto-focusing method and device
IL156856A (en) * 2003-07-09 2011-11-30 Joseph Shamir Method for particle size and concentration measurement
EP1804100B1 (en) * 2005-12-30 2018-02-21 Datalogic IP TECH S.r.l. Device and method for focusing a laser light beam
US8520219B2 (en) * 2011-12-19 2013-08-27 Perceptron, Inc. Non-contact sensor having improved laser spot
AU2017281533B2 (en) * 2016-06-24 2019-06-27 Howard Hughes Medical Institute Automated adjustment of light sheet geometry in a microscope
CN106473702B (zh) 2016-09-11 2023-04-18 浙江大学 任意位置多点光聚焦及光斑优化的方法与系统
KR102778184B1 (ko) * 2019-06-22 2025-03-11 오퍼 옵트로닉스 솔루션스 리미티드 레이저 빔 프로파일링과 사용하기 위한 나노-텍스처 감쇠기 및 레이저 빔 특성화 시스템 및 사용 방법
JP7428672B2 (ja) * 2021-02-03 2024-02-06 株式会社日立製作所 粒子測定装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060258942A1 (en) 2003-03-11 2006-11-16 Van Beek Michael C Spectroscopic analysis apparatus and method with excitation system and focus monitoring system
US20130016358A1 (en) 2010-03-23 2013-01-17 Ophir-Spiricon Llc Beam scattering laser monitor
US20140233022A1 (en) 2012-10-22 2014-08-21 Haas Laser Technologies, Inc. Apparatus for focus beam analysis of high power lasers
US20160341969A1 (en) 2014-01-31 2016-11-24 Carl Zeiss Smt Gmbh Beam propagation camera and method for light beam analysis
US20180029164A1 (en) 2015-02-06 2018-02-01 Primes Gmbh Messtechnik Fuer Die Produktion Mit Laserstrahlung Apparatus and method for beam diagnosis on laser processing optics

Also Published As

Publication number Publication date
EP3824259A1 (en) 2021-05-26
EP3824259B1 (en) 2024-12-18
WO2020018308A1 (en) 2020-01-23
CN112334744A (zh) 2021-02-05
EP3824259A4 (en) 2022-03-30
CN112334744B (zh) 2024-09-13
KR20210024181A (ko) 2021-03-04
US11965775B2 (en) 2024-04-23
US20210199495A1 (en) 2021-07-01
JP2021530710A (ja) 2021-11-11
JP7564086B2 (ja) 2024-10-08

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