JP2021530710A5 - - Google Patents

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Publication number
JP2021530710A5
JP2021530710A5 JP2021503009A JP2021503009A JP2021530710A5 JP 2021530710 A5 JP2021530710 A5 JP 2021530710A5 JP 2021503009 A JP2021503009 A JP 2021503009A JP 2021503009 A JP2021503009 A JP 2021503009A JP 2021530710 A5 JP2021530710 A5 JP 2021530710A5
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JP
Japan
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image
processing module
image processing
slices
focus
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JP2021503009A
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Japanese (ja)
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JP2021530710A (ja
JP7564086B2 (ja
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Priority claimed from PCT/US2019/040891 external-priority patent/WO2020018308A1/en
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Publication of JP2021530710A5 publication Critical patent/JP2021530710A5/ja
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JP2021503009A 2018-07-20 2019-07-08 複数画像レーザビーム品質測定の焦点補正のための方法及び装置 Active JP7564086B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862701244P 2018-07-20 2018-07-20
US62/701,244 2018-07-20
PCT/US2019/040891 WO2020018308A1 (en) 2018-07-20 2019-07-08 Method and apparatus for focus correction of multi-image laser beam quality measurements

Publications (3)

Publication Number Publication Date
JP2021530710A JP2021530710A (ja) 2021-11-11
JP2021530710A5 true JP2021530710A5 (cg-RX-API-DMAC7.html) 2022-06-13
JP7564086B2 JP7564086B2 (ja) 2024-10-08

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JP2021503009A Active JP7564086B2 (ja) 2018-07-20 2019-07-08 複数画像レーザビーム品質測定の焦点補正のための方法及び装置

Country Status (6)

Country Link
US (1) US11965775B2 (cg-RX-API-DMAC7.html)
EP (1) EP3824259B1 (cg-RX-API-DMAC7.html)
JP (1) JP7564086B2 (cg-RX-API-DMAC7.html)
KR (1) KR102767094B1 (cg-RX-API-DMAC7.html)
CN (1) CN112334744B (cg-RX-API-DMAC7.html)
WO (1) WO2020018308A1 (cg-RX-API-DMAC7.html)

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CN113091898A (zh) * 2021-03-04 2021-07-09 南京理工大学 基于散射光成像法的激光光束质量测量方法
CN112924024A (zh) * 2021-03-12 2021-06-08 中国工程物理研究院激光聚变研究中心 一种新型高能激光光束质量测量装置
DE202021103431U1 (de) * 2021-06-28 2021-08-19 Trioptics Gmbh Vorrichtung zur Abbildung durch ein zu prüfendes optisches System und System zum Prüfen eines optischen Systems
WO2023283204A1 (en) * 2021-07-06 2023-01-12 Divergent Technologies, Inc. Exchangeable beam entry window for am system
DE102022101274A1 (de) 2022-01-20 2023-07-20 TRUMPF Werkzeugmaschinen SE + Co. KG Verfahren und Messanordnung zur Bestimmung der Eigenschaften einer Laserschmelzschneidvorrichtung
DE102023102206A1 (de) * 2023-01-31 2024-08-01 TRUMPF Laser SE Kontrastmessung zur Laserpulseinstellung
CN121364060A (zh) * 2025-12-23 2026-01-20 中国计量科学研究院 一种扫描散射式光束分析仪

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JPS6295742A (ja) * 1985-10-19 1987-05-02 Hitachi Maxell Ltd レ−ザ露光装置
WO1990012999A1 (en) * 1989-04-27 1990-11-01 Coherent, Inc. Apparatus for measuring the mode quality of a laser beam
US5760901A (en) * 1997-01-28 1998-06-02 Zetetic Institute Method and apparatus for confocal interference microscopy with background amplitude reduction and compensation
JP4397549B2 (ja) * 2001-07-04 2010-01-13 株式会社リコー ビームプロファイル検証方法
IL148664A0 (en) 2002-03-13 2002-09-12 Yeda Res & Dev Auto-focusing method and device
WO2004081549A1 (en) * 2003-03-11 2004-09-23 Koninklijke Philips Electronics N.V. Spectroscopic analysis apparatus and method with excitation system and focus monitoring system
IL156856A (en) * 2003-07-09 2011-11-30 Joseph Shamir Method for particle size and concentration measurement
EP1804100B1 (en) * 2005-12-30 2018-02-21 Datalogic IP TECH S.r.l. Device and method for focusing a laser light beam
EP2567202B1 (en) 2010-03-23 2022-12-07 Ophir Optronics Solutions Ltd. Beam scattering laser monitoring apparatus
US8520219B2 (en) * 2011-12-19 2013-08-27 Perceptron, Inc. Non-contact sensor having improved laser spot
US8711343B1 (en) * 2012-10-22 2014-04-29 Haas Laser Technologies, Inc. Apparatus for focus beam analysis of high power lasers
DE102014201779B4 (de) * 2014-01-31 2016-12-15 Carl Zeiss Smt Gmbh Strahlpropagationskamera und Verfahren zur Lichtstrahlanalyse
DE102015001421B4 (de) * 2015-02-06 2016-09-15 Primes GmbH Meßtechnik für die Produktion mit Laserstrahlung Vorrichtung und Verfahren zur Strahldiagnose an Laserbearbeitungs-Optiken (PRl-2015-001)
AU2017281533B2 (en) * 2016-06-24 2019-06-27 Howard Hughes Medical Institute Automated adjustment of light sheet geometry in a microscope
CN106473702B (zh) 2016-09-11 2023-04-18 浙江大学 任意位置多点光聚焦及光斑优化的方法与系统
KR102778184B1 (ko) * 2019-06-22 2025-03-11 오퍼 옵트로닉스 솔루션스 리미티드 레이저 빔 프로파일링과 사용하기 위한 나노-텍스처 감쇠기 및 레이저 빔 특성화 시스템 및 사용 방법
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